JP4764197B2 - Manufacturing method of substrate for liquid crystal display - Google Patents
Manufacturing method of substrate for liquid crystal display Download PDFInfo
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本発明は、電極を設けた基板上に光配向膜を形成した液晶表示用基板を使用し、露光マスクを介して光を照射して配向方向が異なる複数の配向領域を分割形成する液晶表示用基板の製造方法に関し、詳しくは、上記光配向膜に配向方向が異なる複数の配向領域を容易に分割形成しようとする液晶表示用基板の製造方法に係るものである。 The present invention uses a liquid crystal display substrate in which a photo-alignment film is formed on a substrate provided with an electrode, and irradiates light through an exposure mask to separately form a plurality of alignment regions having different alignment directions. More specifically, the present invention relates to a method for manufacturing a liquid crystal display substrate in which a plurality of alignment regions having different alignment directions are easily formed on the photo-alignment film.
従来、この種の液晶表示用基板の製造方法は、電極を形成した基板上に配向方向が光の照射により制御可能な光配向膜を形成し、基板の大きさと略等しい大きさを有し、且つ複数の開口部を所定間隔で並べて設けた露光マスクを介して上記光配向膜に光を一定の方向から照射し、その照射領域を一定方向に配向して複数の第１の配向領域を形成し、次に、上記露光マスクを複数の開口部の並び方向にその間隔分だけずらして露光位置を変位させ、上記光の照射方向とは反対の方向から光を照射して隣り合う第１の配向領域間に配向方向の異なる第２の配向領域を形成するようになっていた（例えば、特許文献１参照）。
しかし、このような従来の液晶表示用基板の製造方法においては、複数の開口部を所定間隔で並べて設けた露光マスクを開口部の並び方向にその間隔分だけずらして、光配向膜に配向方向の異なる複数の配向領域を分割形成するものであったので、露光マスクのずらし量（アライメント）を高精度に制御しないと未露光領域が生じ、液晶の配向を乱すおそれがあった。 However, in such a conventional method for manufacturing a liquid crystal display substrate, an exposure mask in which a plurality of openings are arranged at a predetermined interval is shifted in the arrangement direction of the openings by the interval, and the alignment direction is applied to the photo-alignment film. Therefore, if the shift amount (alignment) of the exposure mask is not controlled with high accuracy, an unexposed area is generated and the alignment of the liquid crystal may be disturbed.
また、上記露光マスクにおいて、開口部の並び方向の幅と、隣り合う開口部間の遮光部の幅とが高精度に形成されていないと、上述と同様に未露光領域が生じることがあり、液晶の配向を乱すおそれがあった。 In addition, in the exposure mask, if the width in the alignment direction of the openings and the width of the light-shielding portion between the adjacent openings are not formed with high accuracy, an unexposed area may occur as described above. There was a risk of disturbing the alignment of the liquid crystal.
したがって、露光マスクのアライメントや複数の開口部の形成に高精度が要求され、光配向膜に配向方向の異なる複数の配向領域を容易に分割形成することができなかった。 Therefore, high precision is required for alignment of the exposure mask and formation of the plurality of openings, and a plurality of alignment regions having different alignment directions cannot be easily divided and formed in the photo-alignment film.
そこで、本発明は、このような問題点に対処し、上記光配向膜に配向方向が異なる複数の配向領域を容易に分割形成しようとする液晶表示用基板の製造方法を提供することを目的とする。 SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a method for manufacturing a liquid crystal display substrate that addresses such problems and easily splits and forms a plurality of alignment regions having different alignment directions in the photo-alignment film. To do.
上記目的を達成するために、本発明による液晶表示用基板の製造方法は、電極を設けた基板上に光配向膜を形成した液晶表示用基板を一定方向に搬送しながら、前記基板の前記搬送方向の長さよりも短い幅に形成され、且つ前記基板面に平行な面内にて前記搬送方向と直交する方向に前記基板の幅と略等しい長さの開口部を設けた第１の露光マスクを介して前記光配向膜の全面に光を斜め上方から照射する第１の配向処理工程と、前記基板の前記搬送方向の長さよりも短い幅に形成され、且つ前記基板面に平行な面内にて前記搬送方向と直交する方向に複数の開口部を一定間隔で設けた第２の露光マスクを介して前記光配向膜に光を前記照射方向と異なる方向から照射する第２の配向処理工程と、を含み、前記光配向膜に配向方向が異なる複数の配向領域を分割形成するものである。このような構成により、液晶表示用基板上に形成した光配向膜の全面に光を一定方向に照射する配向処理、及び複数の開口部を一定間隔で設けた露光マスクを介して光配向膜に光を上記照射方向と異なる方向に照射する配向処理を行い、光配向膜に配向方向が異なる複数の配向領域を分割形成する。 In order to achieve the above object, a method for manufacturing a substrate for liquid crystal display according to the present invention includes: transporting the substrate while transporting a liquid crystal display substrate in which a photo-alignment film is formed on a substrate provided with electrodes in a certain direction. A first exposure mask formed with a width shorter than the length of the direction and having an opening having a length substantially equal to the width of the substrate in a direction perpendicular to the transport direction in a plane parallel to the substrate surface A first alignment treatment step of irradiating light on the entire surface of the photo-alignment film through obliquely from above , and a width shorter than the length of the substrate in the transport direction and parallel to the substrate surface A second alignment treatment step of irradiating the photo-alignment film with light from a direction different from the irradiation direction through a second exposure mask having a plurality of openings provided at regular intervals in a direction orthogonal to the transport direction. And a plurality of different alignment directions in the photo-alignment film. It is to the alignment regions divided form. With such a configuration, the photo-alignment film is formed on the photo-alignment film through an alignment process in which light is irradiated in a certain direction on the entire surface of the photo-alignment film formed on the liquid crystal display substrate and an exposure mask provided with a plurality of openings at regular intervals. An alignment treatment in which light is irradiated in a direction different from the irradiation direction is performed, and a plurality of alignment regions having different alignment directions are dividedly formed in the optical alignment film.
この場合、配向方向が光の照射方向に応じて可逆的に変化する光配向膜を使用し、該光配向膜の全面に光を一定方向に照射して前記第１の配向処理工程を実施した後、前記露光マスクを介して前記光配向膜に光を前記照射方向と異なる方向に照射して前記第２の配向処理工程を実施してもよく、又は配向方向が光の照射方向に対して非可逆性を有する光配向膜を使用し、前記露光マスクを介して前記光配向膜に光を一定方向に照射して前記第２の配向処理工程を実施した後、前記光配向膜の全面に光を前記照射方向と異なる方向に照射して前記第１の配向処理工程を実施してもよい。これにより、光配向膜に配向方向が異なる複数の配向領域を分割形成する。In this case, the first alignment treatment step was performed by using a photo-alignment film in which the alignment direction reversibly changes according to the light irradiation direction, and irradiating the entire surface of the photo-alignment film with light in a certain direction. Thereafter, the second alignment treatment step may be performed by irradiating the photo-alignment film with light in a direction different from the irradiation direction through the exposure mask, or the alignment direction is relative to the light irradiation direction. After using the photo-alignment film having irreversibility, irradiating the photo-alignment film with light in a certain direction through the exposure mask and performing the second alignment treatment step, the entire surface of the photo-alignment film is formed. The first alignment treatment step may be performed by irradiating light in a direction different from the irradiation direction. Thereby, a plurality of alignment regions having different alignment directions are formed separately in the photo-alignment film.
そして、前記第１の配向処理工程と第２の配向処理工程とは、前記基板を一方の配向処理工程における基板配置状態から該基板面内にて一定角度だけ回転させた状態で搬送して行なう。これにより、基板を第１の配向処理工程及び第２の配向処理工程のいずれか一方の配向処理における基板配置状態から該基板面内にて一定角度だけ回転させた状態で搬送して第１の配向処理工程又は第２の配向処理工程を行なう。 The first alignment processing step and the second alignment processing step are performed by transporting the substrate in a state where the substrate is rotated by a certain angle within the substrate plane from the substrate arrangement state in one alignment processing step . . As a result, the substrate is transported in a state where the substrate is rotated by a certain angle within the substrate plane from the substrate arrangement state in either one of the first alignment processing step and the second alignment processing step . An alignment treatment step or a second alignment treatment step is performed.
請求項１、及び２又は３に係る発明によれば、露光マスクのアライメントは、第２の配向処理工程においてのみ行えばよく、露光マスクのアライメントや複数の開口部の形成には、従来技術の場合のような高精度は要求されない。したがって、たとえ露光マスクのアライメント精度や複数の開口部の形成精度が従来技術よりも劣っていても液晶の配向を乱すおそれのある未露光領域を生じさせることなく配向処理を行なうことができるこれにより、光配向膜に配向方向が異なる複数の配向領域を容易に分割形成することができ、製造コストを低減することができる。また、基板を一定方向に搬送しながら露光することができ、使用する露光マスクの形状を小さくすることができる。したがって、大型の液晶表示用基板を製造する露光マスクのコストを安価にすることができる。さらに、光の照射方向を変更する必要が無いので露光光学系を共通化することができ、露光装置のコストを安価にすることができる。 According to the first, second, and third aspects of the invention, the alignment of the exposure mask only needs to be performed in the second alignment processing step. For the alignment of the exposure mask and the formation of the plurality of openings, the conventional technique is used. High precision as in the case is not required. Therefore, even if the alignment accuracy of the exposure mask and the formation accuracy of the plurality of openings are inferior to those of the prior art, the alignment process can be performed without causing an unexposed region that may disturb the alignment of the liquid crystal. A plurality of alignment regions having different alignment directions can be easily divided and formed in the photo-alignment film, and the manufacturing cost can be reduced. Moreover, it can expose while conveying a board | substrate in a fixed direction, and the shape of the exposure mask to be used can be made small. Therefore, the cost of the exposure mask for manufacturing a large liquid crystal display substrate can be reduced. Furthermore, since it is not necessary to change the light irradiation direction, the exposure optical system can be shared, and the cost of the exposure apparatus can be reduced.
以下、本発明の実施形態を添付図面に基づいて詳細に説明する。図１は本発明による液晶表示用基板の製造方法の第１の実施形態を説明する平面図であり、図２はその縦断面図である。この液晶表示用基板の製造方法は、電極を設けた基板上に光配向膜を形成した液晶表示用基板を使用し、露光マスクを介して光を照射して配向方向が異なる複数の配向領域を分割形成するものであり、第１の配向処理工程と、第２の配向処理工程と、を行なう。 Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a plan view for explaining a first embodiment of a method for producing a liquid crystal display substrate according to the present invention, and FIG. 2 is a longitudinal sectional view thereof. This liquid crystal display substrate manufacturing method uses a liquid crystal display substrate in which a photo-alignment film is formed on a substrate provided with electrodes, and irradiates light through an exposure mask to form a plurality of alignment regions having different alignment directions. Dividing and forming are performed, and a first alignment treatment step and a second alignment treatment step are performed.
先ず、図１（ａ）又は図２（ａ）に示すように、図示省略の電極を形成した基板１上に配向方向が光の照射方向に応じて可逆的に変化する、例えばアゾベンゼン誘導体、桂皮酸エステル、クマリン、カルコン、ベンゾフェノン又はポリイミド等のフォトレジストからなる光配向膜２を塗布形成した液晶表示用基板を準備する。 First, as shown in FIG. 1 (a) or FIG. 2 (a), the orientation direction reversibly changes in accordance with the direction of light irradiation on the substrate 1 on which an electrode (not shown) is formed. A liquid crystal display substrate on which a photo-alignment film 2 made of a photoresist such as acid ester, coumarin, chalcone, benzophenone or polyimide is applied is prepared.
具体的には、次のようにして光配向膜２を塗布形成する。即ち、先ず、スピンコータ等を使用して、その回転可能なステージ上に上記基板１を吸着保持し、該基板１上に上記フォトレジストを適量滴下する。そして、上記ステージを一定の回転数で回転し、遠心力によりフォトレジストを基板１の全面に引き延ばして一定の厚みの光配向膜２を形成する。次に、約100℃に加熱されたホットプレート上に上記光配向膜２が形成された基板１を約１分間置いて上記光配向膜２を乾燥させる。 Specifically, the photo-alignment film 2 is applied and formed as follows. That is, first, using a spin coater or the like, the substrate 1 is sucked and held on the rotatable stage, and an appropriate amount of the photoresist is dropped on the substrate 1. Then, the stage is rotated at a constant rotational speed, and the photoresist is stretched over the entire surface of the substrate 1 by centrifugal force to form the photo-alignment film 2 having a constant thickness. Next, the substrate 1 having the photo-alignment film 2 formed thereon is placed on a hot plate heated to about 100 ° C. for about 1 minute to dry the photo-alignment film 2.
次に、第１の配向処理工程においては、図２（ｂ）に示すように、光配向膜２の全面に光を同図に矢印Ａで示すように斜め上方から、例えば基板面の垂線に対して45°の角度で例えば基板１の長手方向に照射して、図１（ｂ）に示すようにその全面を同一方向（矢印Ｂ方向）に配向する。ここで、照射される光は、例えば超高圧水銀ランプから放射される光をフィルタにより波長選択して得られた365nm付近の紫外光であり、例えばコリメータミラーで平行光とした後、偏光フィルタに通して直線偏光とされたものである。 Next, in the first alignment treatment step, as shown in FIG. 2B, light is applied to the entire surface of the photo-alignment film 2 from an obliquely upward direction as indicated by an arrow A in FIG. On the other hand, irradiation is performed in the longitudinal direction of the substrate 1 at an angle of 45 °, for example, and the entire surface is oriented in the same direction (arrow B direction) as shown in FIG. Here, the irradiated light is, for example, ultraviolet light around 365 nm obtained by selecting the wavelength of light radiated from an ultra-high pressure mercury lamp using a filter. For example, the light is collimated by a collimator mirror and then applied to a polarizing filter. In this way, the light is linearly polarized.
次に、第２の配向処理工程においては、図１（ｃ）に示すように、例えば基板１の長手方向の幅に略等しい長さのストライプ状の複数の開口部３を一定間隔で並べて設けた露光マスク４を介して光配向膜２に光を図２（ｃ）に示すように同図（ｂ）の矢印Ａで示す照射方向とは反対の矢印Ｃ方向に照射する。これにより、図１（ｃ）に示すように、その照射領域の配向が矢印Ｂ方向から反転して矢印Ｄ方向となる。このようにして、図１（ｃ）に示すように、基板１の光配向膜２には、配向方向の異なる第１の配向領域５と第２の配向領域６とが交互に並んで形成されることとなる。 Next, in the second alignment processing step, as shown in FIG. 1C, for example, a plurality of stripe-shaped openings 3 having a length substantially equal to the width in the longitudinal direction of the substrate 1 are provided at regular intervals. As shown in FIG. 2C, light is irradiated through the exposure mask 4 in the direction of arrow C opposite to the irradiation direction indicated by arrow A in FIG. Thereby, as shown in FIG.1 (c), the orientation of the irradiation area | region reverses from the arrow B direction, and becomes the arrow D direction. In this way, as shown in FIG. 1C, the first alignment region 5 and the second alignment region 6 having different alignment directions are formed alternately on the optical alignment film 2 of the substrate 1. The Rukoto.
図３及び図４は、本発明による液晶表示用基板の製造方法の第２の実施形態を説明する図である。
先ず、第１の配向処理工程においては、図４（ａ）に示す矢印Ｅ方向に移動可能にされた露光装置のステージ７上に上記光配向膜２の形成された基板１を光配向膜２の形成面を上側にして載置する。さらに、該基板１の一方の端面１ａを先頭として矢印Ｅ方向に一定の速度で搬送しながら、図３（ａ）に示すように基板１の搬送方向（矢印Ｅ方向）の長さよりも短い幅に形成され、且つ基板１の面に平行な面内にて上記搬送方向と直交する方向に基板１の幅と略等しい長さの開口部８を設けた第１の露光マスク９を介して上記光配向膜２の全面に光を図４（ａ）に矢印Ａで示すように斜め上方から照射し、図３（ａ）に示すように光配向膜２の全面を同一方向（矢印Ｂ方向）に配向する。
3 and 4 are diagrams for explaining a second embodiment of the method for manufacturing a liquid crystal display substrate according to the present invention.
First, in the first alignment processing step, the substrate 1 on which the photo-alignment film 2 is formed on the stage 7 of the exposure apparatus that is movable in the direction of arrow E shown in FIG. Is placed with the formation surface of the upper side facing up. Further, a width shorter than the length of the substrate 1 in the transport direction (arrow E direction) as shown in FIG. 3A while transporting at a constant speed in the direction of arrow E with one end face 1a of the substrate 1 as the head. And a first exposure mask 9 provided with an opening 8 having a length substantially equal to the width of the substrate 1 in a direction perpendicular to the transport direction in a plane parallel to the surface of the substrate 1. The entire surface of the photo-alignment film 2 is irradiated with light obliquely from above as shown by arrow A in FIG. 4A, and the entire surface of the photo-alignment film 2 is directed in the same direction (direction of arrow B) as shown in FIG. Oriented to
次に、第２の配向処理工程においては、図４（ｂ）に示すように、上記基板１を上記第１の配向処理工程の基板配置状態から基板１の面内にて180°回転した状態でステージ７上に載置する。さらに、他方の端面１ｂを先頭にして矢印Ｅ方向に一定の速度で搬送しながら、図３（ｂ）に示すように基板１の搬送方向（矢印Ｅ方向）の長さよりも短い幅に形成され、且つ基板１の面に平行な面内にて矢印Ｅで示す搬送方向と直交する方向に複数の開口部１０を一定間隔で並べて設けた第２の露光マスク１１を介して上記光配向膜２に光を照射する。この場合、基板１を反転しているので、光の照射方向は、図４（ｂ）に示すように上記第１の配向処理工程と同じ矢印Ａ方向となる。これにより、図３（ｂ）に示すように、光配向膜２の照射領域が第１の配向処理工程による配向方向（矢印Ｂ方向）と異なる矢印Ｄ方向に配向される。このようにして、基板１の光配向膜２には、配向方向の異なる第１の配向領域５と第２の配向領域６とが交互に並んで形成されることとなる。なお、上記第１の配向処理工程と第２の配向処理工程とでは、基板１の向きが互いに反対向きとなっているため、矢印Ｂで示す配向方向が反転して示されている。 Next, in the second alignment treatment step, as shown in FIG. 4B, the substrate 1 is rotated 180 ° in the plane of the substrate 1 from the substrate arrangement state in the first alignment treatment step. Then, it is placed on the stage 7. Further, while being transported at a constant speed in the direction of arrow E with the other end face 1b as the head, the width is shorter than the length of the substrate 1 in the transport direction (arrow E direction) as shown in FIG. 3B. And the photo-alignment film 2 through a second exposure mask 11 provided with a plurality of openings 10 arranged at regular intervals in a direction perpendicular to the transport direction indicated by the arrow E in a plane parallel to the surface of the substrate 1. Irradiate light. In this case, since the substrate 1 is inverted, the light irradiation direction is the same as the arrow A direction in the first alignment treatment step as shown in FIG. 4B. Thereby, as shown in FIG.3 (b), the irradiation area | region of the photo-alignment film 2 is orientated in the arrow D direction different from the orientation direction (arrow B direction) by a 1st orientation process process. In this way, the first alignment regions 5 and the second alignment regions 6 having different alignment directions are formed alternately on the photo-alignment film 2 of the substrate 1. In the first alignment treatment step and the second alignment treatment step, since the directions of the substrate 1 are opposite to each other, the alignment direction indicated by the arrow B is shown reversed.
なお、上記実施形態においては、第１の配向領域５と第２の配向領域６の配向方向が180°異なる場合について説明したが、これに限られず、両領域の配向方向が異なっていればそのずれ角度は何度でもよい。この場合、第２の配向処理工程において、基板１をその面内にて一定角度だけ回転して搬送すればよい。 In the above embodiment, the case where the alignment directions of the first alignment region 5 and the second alignment region 6 are different by 180 ° has been described. However, the present invention is not limited to this. The shift angle may be any number of times. In this case, in the second alignment processing step, the substrate 1 may be rotated and conveyed by a certain angle within the plane.
そして、本発明の液晶表示用基板の製造方法においては、配向方向が光の照射方向に応じて可逆的に変化する光配向膜２を用いた場合について説明したが、これに限られず、配向方向が光の照射方向に対して非可逆性を有する光配向膜を用いてもよい。この場合、第１の配向処理工程においては、複数の開口部を一定間隔で設けた露光マスクを介して光配向膜に光を一定方向に照射して複数の第１の配向領域５を形成し、次に、光配向膜２の全面に光を上記照射方向と異なる方向に照射して、第１の配向領域５と配向方向の異なる第２の配向領域６を形成するようにするとよい。 In the method for manufacturing a liquid crystal display substrate of the present invention, the case where the photo-alignment film 2 whose reversal direction changes reversibly according to the light irradiation direction has been described. Alternatively, a photo-alignment film having irreversibility with respect to the light irradiation direction may be used. In this case, in the first alignment treatment step, a plurality of first alignment regions 5 are formed by irradiating the photo-alignment film with light in a certain direction through an exposure mask having a plurality of openings provided at regular intervals. Next, it is preferable to irradiate the entire surface of the photo-alignment film 2 with light in a direction different from the irradiation direction to form the second alignment region 6 having a different alignment direction from the first alignment region 5.
１…基板
２…光配向膜
３，８，１０…開口部
４…露光マスク
５…第１の配向領域
６…第２の配向領域
９…第１の露光マスク
１１…第２の露光マスク
DESCRIPTION OF SYMBOLS 1 ... Substrate 2 ... Photo-alignment film 3, 8, 10 ... Opening 4 ... Exposure mask 5 ... 1st alignment area 6 ... 2nd alignment area 9 ... 1st exposure mask 11 ... 2nd exposure mask
Claims (4)
前記基板の前記搬送方向の長さよりも短い幅に形成され、且つ前記基板面に平行な面内にて前記搬送方向と直交する方向に前記基板の幅と略等しい長さの開口部を設けた第１の露光マスクを介して前記光配向膜の全面に光を斜め上方から照射する第１の配向処理工程と、
前記基板の前記搬送方向の長さよりも短い幅に形成され、且つ前記基板面に平行な面内にて前記搬送方向と直交する方向に複数の開口部を一定間隔で設けた第２の露光マスクを介して前記光配向膜に光を前記照射方向と異なる方向から照射する第２の配向処理工程と、
を含み、前記光配向膜に配向方向が異なる複数の配向領域を分割形成することを特徴とする液晶表示用基板の製造方法。 While transporting a liquid crystal display substrate in which a photo-alignment film is formed on a substrate provided with electrodes in a certain direction,
An opening having a length shorter than the length of the substrate in the transport direction and having a length substantially equal to the width of the substrate is provided in a direction perpendicular to the transport direction in a plane parallel to the substrate surface. A first alignment treatment step of irradiating light on the entire surface of the photo-alignment film from obliquely above through a first exposure mask ;
A second exposure mask formed with a width shorter than the length of the substrate in the transport direction and provided with a plurality of openings at a constant interval in a direction perpendicular to the transport direction in a plane parallel to the substrate surface. A second alignment treatment step of irradiating the photo-alignment film with light from a direction different from the irradiation direction via
A plurality of alignment regions having different alignment directions are formed in the photo-alignment film in a divided manner.
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