JP4672996B2 - Atomization equipment for film formation - Google Patents

Atomization equipment for film formation Download PDF

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JP4672996B2
JP4672996B2 JP2004122836A JP2004122836A JP4672996B2 JP 4672996 B2 JP4672996 B2 JP 4672996B2 JP 2004122836 A JP2004122836 A JP 2004122836A JP 2004122836 A JP2004122836 A JP 2004122836A JP 4672996 B2 JP4672996 B2 JP 4672996B2
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container
film
atomizing
film formation
forming
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JP2005305233A (en
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浩之 西中
敏幸 川原村
静雄 藤田
喜男 増田
圭介 亀谷
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Honda Electronics Co Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • B05B17/04—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
    • B05B17/06—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
    • B05B17/0607—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers
    • B05B17/0615—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers spray being produced at the free surface of the liquid or other fluent material in a container and subjected to the vibrations

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Description

本発明は、成膜に用いられる霧化装置であって、振動子の振動により液体を霧化する成膜用霧化装置に関するものである。   The present invention relates to an atomization apparatus used for film formation, which relates to an atomization apparatus for film formation that atomizes a liquid by vibration of a vibrator.

従来の霧化装置は、霧化用液体を収容した容器の底面壁を凸湾曲状に突出した形状に形成し、この容器の底面から側面にかけた下部領域を水槽の水に浸漬させながら、水槽の底面に設けられた超音波振動子から超音波を容器の底面壁方向に照射する構成にされている。この構成よれば、超音波振動子から照射された超音波が、水槽内の水を伝播した後、容器の底面壁を通過して容器内の霧化用液体に伝播することによって、霧化用液体を超音波により振動させて霧化することができる。さらに、この構成によれば、超音波の振動により容器の底面壁に気泡が発生したときに、この気泡を凸湾曲状の底面壁に沿って移動させることにより排除することができる（特許文献１）。   A conventional atomization device is formed in a shape in which a bottom wall of a container containing an atomizing liquid is protruded in a convex curved shape, and a lower region applied from a bottom surface to a side surface of the container is immersed in water in the water tank. The ultrasonic vibrator is radiated in the direction of the bottom wall of the container from the ultrasonic vibrator provided on the bottom surface of the container. According to this configuration, after the ultrasonic wave irradiated from the ultrasonic transducer propagates the water in the water tank, the ultrasonic wave passes through the bottom wall of the container and propagates to the atomizing liquid in the container. The liquid can be atomized by vibrating with ultrasonic waves. Furthermore, according to this configuration, when bubbles are generated on the bottom wall of the container due to the vibration of ultrasonic waves, the bubbles can be eliminated by moving along the bottom wall of the convex curve (Patent Document 1). ).

登録実用新案第３００９５０５号公報Registered Utility Model No. 3009505

しかしながら、上記従来のように、容器の底面壁を凸湾曲状に形成した構成では、この形状を維持するように底面壁の強度を高める必要があることから、所定以上の厚みを有したプラスチック材料等により底面壁を形成する必要がある。この結果、超音波が底面壁を通過するときの減衰量が大きくなるため、霧化用液体を霧化する効率が低下し易いという問題がある。   However, in the configuration in which the bottom wall of the container is formed in a convex curve shape as in the conventional case, it is necessary to increase the strength of the bottom wall so as to maintain this shape. It is necessary to form the bottom wall by, for example. As a result, the amount of attenuation when the ultrasonic wave passes through the bottom wall increases, and there is a problem in that the efficiency of atomizing the atomizing liquid tends to decrease.

本発明は上記問題点に着目してなされたものであって、十分に高い効率で霧化用液体を霧化することができる霧化装置を提供することを目的としている。   The present invention has been made paying attention to the above-mentioned problems, and an object thereof is to provide an atomizing apparatus capable of atomizing an atomizing liquid with sufficiently high efficiency.

本発明は、成膜に用いられる成膜用霧化装置であり、霧化用液体を収容し、底面部が高分子材料の薄膜で形成された容器と、前記容器および中間溶液を収容し、該中間溶液に少なくとも前記容器の底面部を浸漬させる溶液槽と、前記溶液槽に設けられ、前記容器の底面部に対して超音波を照射する超音波振動子とを有し、前記容器は、前記溶液槽内で回動機構により回動可能にされることで、当該容器の中心軸が鉛直方向に一致する直立姿勢と、当該容器の中心軸が鉛直方向に対して傾斜する傾斜姿勢とに切り替え可能であり、当該容器が当該傾斜姿勢の時は、当該容器の底面部が水平面に対して傾斜した状態となることを特徴とする成膜用霧化装置であります。 The present invention is an atomizing apparatus for film formation used for film formation, containing an atomizing liquid, a container having a bottom surface part formed of a thin film of a polymer material, the container and an intermediate solution, a solution tank for immersing the bottom portion of at least the container intermediate solution, provided in the solution tank, have a ultrasonic transducer for irradiating ultrasonic waves to the bottom portion of said container, said container, By being made rotatable by the rotation mechanism in the solution tank, an upright posture in which the central axis of the container coincides with the vertical direction and an inclined posture in which the central axis of the container is inclined with respect to the vertical direction. The film-forming atomizer is characterized in that, when the container is in the inclined posture, the bottom surface of the container is inclined with respect to the horizontal plane .

さらに、超音波を透過する底面部が高分子材料の薄膜で形成されていることから、超音波を高い効率で透過して霧化用液体に伝播させることができるため、十分に高い効率で霧化用液体を霧化することができるものであります。   Furthermore, since the bottom surface part that transmits ultrasonic waves is formed of a thin film of a polymer material, ultrasonic waves can be transmitted with high efficiency and propagated to the atomizing liquid. It can atomize the chemical liquid.

また、本発明における前記容器の底面部の高分子材料の薄膜は、弾性率が１．５ＧＰａ〜７．０ＧＰａの範囲に設定されていても良い。この場合には、一層高い効率で霧化用液体を霧化することができる。   In the present invention, the polymer material thin film on the bottom surface of the container may have an elastic modulus in a range of 1.5 GPa to 7.0 GPa. In this case, the atomizing liquid can be atomized with higher efficiency.

本発明は、容器が、溶液槽内で回動機構により回動可能にされることで、容器の中心軸が鉛直方向に一致する直立姿勢と、容器の中心軸が鉛直方向に対して傾斜する傾斜姿勢とに切り替え可能であり、容器が傾斜姿勢の時は、容器の底面部が水平面に対して傾斜した状態となるので、気泡がたまることがなく、また、超音波を透過する底面部が高分子材料の薄膜で形成することによって、超音波を高い効率で透過して霧化用液体に伝播させて十分に高い効率で霧化用液体を霧化することができるという効果を奏する。 In the present invention, the container can be rotated by a rotation mechanism in the solution tank, so that the vertical axis of the container coincides with the vertical direction, and the central axis of the container is inclined with respect to the vertical direction. When the container is tilted, the bottom surface of the container is inclined with respect to the horizontal plane, so that bubbles do not accumulate and the bottom surface that transmits ultrasonic waves By forming the thin film of the polymer material, the ultrasonic wave can be transmitted with high efficiency and propagated to the atomizing liquid, and the atomizing liquid can be atomized with sufficiently high efficiency.

本発明の実施形態を図１ないし図３に基づいて以下に説明する。
本実施形態に係る成膜用霧化装置は、図１に示すように、薄膜製造装置の一部を構成している。薄膜製造装置は、酢酸亜鉛水溶液等の霧化用液体４を霧化する成膜用霧化装置１と、霧化用液体４に含まれる物質を成膜する成膜装置２と、これら各装置１・２を制御する制御装置３とを有している。成膜用霧化装置１は、霧化用液体４を収容しながら霧化されたミストを排出する収容機構５と、エタノール等の中間溶液６を収容した溶液槽７とを有している。 An embodiment of the present invention will be described below with reference to FIGS.
The film-forming atomization apparatus according to the present embodiment constitutes a part of a thin film manufacturing apparatus as shown in FIG. The thin film manufacturing apparatus includes an atomizing apparatus 1 for atomizing an atomizing liquid 4 such as a zinc acetate aqueous solution, a film forming apparatus 2 for forming a substance contained in the atomizing liquid 4, and each of these apparatuses. And a control device 3 for controlling 1 and 2. The film-forming atomizer 1 includes a storage mechanism 5 that discharges atomized mist while storing the atomizing liquid 4, and a solution tank 7 that stores an intermediate solution 6 such as ethanol.

尚、本実施形態において、霧化用液体４として酢酸亜鉛水溶液を例示しているが、これに限定されるものではない。また、本実施形態において、中間溶液６としてエタノールを例示しているが、これに限定されるものではなく、例えば水やメタノール等であっても良い。また、中間溶液６は、超音波を伝播させ易い粘度、即ち、１．０〜１．２４Pa・sであることが好ましい。   In addition, in this embodiment, although the zinc acetate aqueous solution is illustrated as the atomization liquid 4, it is not limited to this. In the present embodiment, ethanol is illustrated as the intermediate solution 6, but is not limited thereto, and may be water, methanol, or the like, for example. Moreover, it is preferable that the intermediate solution 6 has a viscosity at which ultrasonic waves can easily propagate, that is, 1.0 to 1.24 Pa · s.

上記の収容機構５は、霧化用液体４を収容した容器８を備えている。容器８は、上面および下面が開口された筒形状の側面部材８ａと、側面部材８ａの下端側の開口を密封するように設けられた平板状の底面部材８ｂとを有している。側面部材８ａは、多少の外力が付与されても形状を維持する材料で形成されている。具体的には、霧化用液体４に対して耐蝕性を備えた金属やプラスチック材料、ガラス、金属表面にプラスチック材料をコーティングした材料等により側面部材８ａが形成されている。   The storage mechanism 5 includes a container 8 that stores the atomizing liquid 4. The container 8 includes a cylindrical side member 8a having an upper surface and a lower surface opened, and a flat bottom member 8b provided so as to seal the opening on the lower end side of the side member 8a. The side member 8a is formed of a material that maintains its shape even when a slight external force is applied. Specifically, the side member 8a is formed of a metal or plastic material that has corrosion resistance to the atomizing liquid 4, glass, a material obtained by coating a metal surface with a plastic material, or the like.

一方、底面部材８ｂは、超音波を透過させ易い高分子材料で形成されている。具体的には、高密度ポリエチレンやポリ塩化ビニリデン、ポリエチレンテレフタレート（ＰＥＴ）等で形成されている。また、底面部材８ｂは、超音波を透過させ易い厚みを有したフィルム状の薄膜で形成されている。即ち、底面部材８ｂは、高密度ポリエチレンを用いた場合、５μｍ〜１５０μｍの厚み範囲、好ましくは５μｍ〜５０μｍの厚み範囲、より好ましくは８μｍ〜１２μｍの厚み範囲に設定されている。ここで、厚み範囲の最小値は、高密度ポリエチレンをフィルム状に形成して底面部材８ｂとしたときに、正常な霧化動作で破断しない強度を発揮する最小の厚みを意味する。   On the other hand, the bottom surface member 8b is formed of a polymer material that easily transmits ultrasonic waves. Specifically, it is made of high-density polyethylene, polyvinylidene chloride, polyethylene terephthalate (PET), or the like. The bottom member 8b is formed of a film-like thin film having a thickness that allows easy transmission of ultrasonic waves. That is, when the high-density polyethylene is used, the bottom surface member 8b is set to a thickness range of 5 μm to 150 μm, preferably a thickness range of 5 μm to 50 μm, more preferably a thickness range of 8 μm to 12 μm. Here, the minimum value of the thickness range means the minimum thickness that exhibits strength that does not break during normal atomization operation when high-density polyethylene is formed into a film shape to form the bottom member 8b.

さらに、底面部材８ｂは、弾性率が０．４ＧＰａ〜７．０ＧＰａ（ポリスチレン、ポリオキシメチレン）の範囲、好ましくは１．５ＧＰａ〜５．５ＧＰａ（低密度ポリエチレン、ポリフッ化ビニリデン）の範囲、より好ましくは４．０ＧＰａ〜５．０ＧＰａ（高密度ポリエチレン）の範囲に設定されている。これにより、底面部材８ｂは、超音波の十分な透過が確保されている。   Further, the bottom member 8b has an elastic modulus in the range of 0.4 GPa to 7.0 GPa (polystyrene, polyoxymethylene), preferably in the range of 1.5 GPa to 5.5 GPa (low density polyethylene, polyvinylidene fluoride), and more preferably. Is set in the range of 4.0 GPa to 5.0 GPa (high density polyethylene). Thereby, the bottom member 8b ensures sufficient transmission of ultrasonic waves.

上記の容器８は、蓋部材９により上面の開口が封止されている。蓋部材９は、容器８の開口よりも僅かに大きな径の上面部９ａと、上面部９ａの周縁部から垂下された側面部９ｂとを有している。側面部９ｂは、容器８の周縁部に気密状に接合されていると共に、ガス供給口９ｃが形成されている。ガス供給口９ｃは、窒素ガスボンベ１１に流量制御弁１２を介して接続されている。そして、窒素ガスボンベ１１は、流量制御弁１２の開度に応じた供給量で窒素ガスを収容機構５内に供給するようになっている。一方、上面部９ａの中心部には、筒状部材１０が貫設されている。筒状部材１０は、後述の成膜装置２に配管１４を介して接続されており、霧化用液体４を霧化して生成されたミストを窒素ガスと共に成膜装置２に流出させるようになっている。   The opening of the upper surface of the container 8 is sealed by the lid member 9. The lid member 9 has an upper surface portion 9a having a diameter slightly larger than the opening of the container 8, and a side surface portion 9b suspended from the peripheral edge portion of the upper surface portion 9a. The side surface portion 9b is joined to the peripheral portion of the container 8 in an airtight manner, and a gas supply port 9c is formed. The gas supply port 9 c is connected to the nitrogen gas cylinder 11 via the flow control valve 12. The nitrogen gas cylinder 11 supplies nitrogen gas into the housing mechanism 5 at a supply amount corresponding to the opening degree of the flow control valve 12. On the other hand, the cylindrical member 10 is penetrated by the center part of the upper surface part 9a. The cylindrical member 10 is connected to a film forming apparatus 2 to be described later via a pipe 14 and causes the mist generated by atomizing the atomizing liquid 4 to flow out to the film forming apparatus 2 together with nitrogen gas. ing.

上記のように構成された収容機構５は、溶液槽７内に設けられている。これにより、収容機構５は、底面部材８ｂから側面部材８ａの一部にかけた領域が溶液槽７の中間溶液６に浸漬可能にされている。また、収容機構５は、溶液槽７内で図示しない回動機構により回動可能にされている。回動機構は、モータやギア等を備えており、収容機構５を直立姿勢と傾斜姿勢とに切替え可能になっている。ここで、直立姿勢とは、収容機構５の中心軸が鉛直方向に一致する姿勢であり、傾斜姿勢とは、収容機構５の中心軸が鉛直方向に対して傾斜する姿勢である。これにより、収容機構５は、直立姿勢時に底面部材８ｂを水平方向に一致した状態となる。また、収容機構５は、傾斜姿勢時に底面部材８ｂを水平面に対して傾斜（図示ニ点鎖線）した状態となり、底面部材８ｂに発生した気泡を浮力により除去することが可能になっている。   The accommodation mechanism 5 configured as described above is provided in the solution tank 7. As a result, the storage mechanism 5 is configured such that a region extending from the bottom surface member 8 b to a part of the side surface member 8 a can be immersed in the intermediate solution 6 in the solution tank 7. In addition, the storage mechanism 5 is rotatable in the solution tank 7 by a rotation mechanism (not shown). The rotation mechanism includes a motor, a gear, and the like, and the accommodation mechanism 5 can be switched between an upright posture and an inclined posture. Here, the upright posture is a posture in which the central axis of the housing mechanism 5 coincides with the vertical direction, and the inclined posture is a posture in which the central axis of the housing mechanism 5 is inclined with respect to the vertical direction. Thereby, the accommodation mechanism 5 will be in the state which matched the bottom face member 8b in the horizontal direction at the time of an upright posture. The accommodation mechanism 5 is in a state in which the bottom surface member 8b is inclined with respect to the horizontal plane (two-dot chain line in the drawing) during the inclined posture, and the bubbles generated in the bottom surface member 8b can be removed by buoyancy.

上記の収容機構５を中間溶液６と共に収容した溶液槽７の底面部には、超音波振動子１３が設けられている。超音波振動子１３は、超音波の照射方向が鉛直方向となるように設置されている。また、超音波振動子１３は、超音波を照射する発振面１３ａが直立姿勢をとる収容機構５の底面部材８ｂに対向するように配置されている。発振面１３ａと底面部材８ｂとの距離は、発振面１３ａから放射状に出力された超音波のほぼ全量が底面部材８ｂに到達するように設定されていると共に、収容機構５の傾斜姿勢時に収容機構５の端部が超音波振動子１３に接触しないように設定されている。   An ultrasonic transducer 13 is provided on the bottom surface of the solution tank 7 that accommodates the accommodation mechanism 5 together with the intermediate solution 6. The ultrasonic transducer 13 is installed so that the direction of ultrasonic irradiation is the vertical direction. Further, the ultrasonic transducer 13 is arranged so that the oscillation surface 13 a that radiates ultrasonic waves faces the bottom surface member 8 b of the housing mechanism 5 that takes an upright posture. The distance between the oscillating surface 13a and the bottom surface member 8b is set so that almost the entire amount of ultrasonic waves radiated from the oscillating surface 13a reaches the bottom surface member 8b. The end of 5 is set so as not to contact the ultrasonic transducer 13.

上記のように構成された成膜用霧化装置１は、配管１４を介して成膜装置２に接続されている。尚、配管１４の途中には、閉栓バルブが設けられていても良い。成膜装置２は、中空状の上部隔壁体２１と、上部隔壁体２１の下面を支持した基台２２とを有している。上部隔壁体２１の上面壁には、ガス導入部２１ａが形成されている。ガス導入部２１ａには、上述の成膜用霧化装置１に連絡された配管１４が接続されており、成膜用霧化装置１から霧化用液体４を霧化したミストが供給されるようになっている。   The film-forming atomizing apparatus 1 configured as described above is connected to the film-forming apparatus 2 via a pipe 14. A plug valve may be provided in the middle of the pipe 14. The film forming apparatus 2 includes a hollow upper partition body 21 and a base 22 that supports the lower surface of the upper partition body 21. A gas introduction part 21 a is formed on the upper wall of the upper partition body 21. The gas inlet 21a is connected to the pipe 14 connected to the above-described film-forming atomizer 1 and supplied with mist obtained by atomizing the atomizing liquid 4 from the film-forming atomizer 1. It is like that.

上部隔壁体２１の内部には、予熱室２３が形成されている。予熱室２３は、上部隔壁体２１の上端部から下端部にかけて垂直方向に形成されている。予熱室２３の上端部は、上述のガス導入部２１ａに連絡されており、成膜用霧化装置１からのミストが導入されるようになっている。また、予熱室２３は、上端部から上部側の中間位置にかけた範囲がガス導入部２１ａと同一の断面形状および断面積（流路面積）となる管形状に形成された後、上部側の中間位置から下端部までの範囲が大きな断面積であって長辺が上部隔壁体２１の幅方向に一致する長方形状となるように形成されている。これにより、予熱室２３は、ガス導入部２１ａよりも流路面積が拡大することによって、ガス導入部２１ａから導入されたミストの流速を低下させ、ミストに対して所望の熱量を付与することを可能にしている。尚、予熱室２３は、後述の成膜室２４側から伝達される熱でミストを予熱しても良いし、予熱室２３専用の予熱ヒータにより予熱しても良い。   A preheating chamber 23 is formed inside the upper partition wall 21. The preheating chamber 23 is formed in the vertical direction from the upper end portion to the lower end portion of the upper partition body 21. The upper end part of the preheating chamber 23 is connected to the gas introduction part 21a described above, and mist from the film-forming atomizer 1 is introduced. In addition, the preheating chamber 23 is formed in a tube shape in which the range from the upper end portion to the intermediate position on the upper side has the same cross-sectional shape and cross-sectional area (channel area) as the gas introduction portion 21a, and then the intermediate portion on the upper side. The range from the position to the lower end is a large cross-sectional area, and the long side is formed in a rectangular shape that matches the width direction of the upper partition wall 21. Thereby, the preheating chamber 23 reduces the flow rate of the mist introduced from the gas introduction part 21a by enlarging the flow path area as compared with the gas introduction part 21a, and imparts a desired amount of heat to the mist. It is possible. The preheating chamber 23 may preheat the mist with heat transmitted from the film forming chamber 24 described later, or may be preheated by a preheating heater dedicated to the preheating chamber 23.

上記の予熱室２３の下端部は、成膜室２４の一端部に連通されている。成膜室２４は、上部隔壁体２１と基台２２との間に水平方向に形成されている。成膜室２４は、予熱室２３から均一にミストが導入されるように、縦断面（流路断面）の幅が予熱室２３の幅に一致されている。また、成膜室２４の近傍には、加熱ヒータ２５が設けられている。加熱ヒータ２５は、成膜室２４の温度を成膜処理に適した温度範囲に維持する機能を備えている。具体的には、酢酸亜鉛と溶媒（水）とのミストを用いて酸化亜鉛（ＺｎＯ）の成膜処理を実施する場合においては２８０℃〜４３０℃の温度範囲に維持する機能を備えている。   The lower end portion of the preheating chamber 23 communicates with one end portion of the film forming chamber 24. The film forming chamber 24 is formed in the horizontal direction between the upper partition wall 21 and the base 22. In the film forming chamber 24, the width of the vertical cross section (flow channel cross section) matches the width of the preheating chamber 23 so that mist is uniformly introduced from the preheating chamber 23. A heater 25 is provided in the vicinity of the film forming chamber 24. The heater 25 has a function of maintaining the temperature of the film forming chamber 24 in a temperature range suitable for the film forming process. Specifically, in the case where a zinc oxide (ZnO) film forming process is performed using a mist of zinc acetate and a solvent (water), a function of maintaining a temperature range of 280 ° C. to 430 ° C. is provided.

また、成膜室２４は、他端部が開口されている。これにより、成膜室２４は、予熱室２３から導入されたミストを一端側（予熱室側）から水平方向に流動させた後、他端側の開口から排出するようになっている。成膜室２４には、成膜処理が施される平板状の基板２６が載置台２７により搬入可能にされている。載置台２７は、図示しない移動機構に連結されており、成膜室２４と機外との間を進退移動可能にされている。   The film formation chamber 24 is open at the other end. As a result, the film formation chamber 24 causes the mist introduced from the preheating chamber 23 to flow in the horizontal direction from one end side (preheating chamber side), and then is discharged from the opening on the other end side. A flat substrate 26 to be subjected to a film forming process can be carried into the film forming chamber 24 by a mounting table 27. The mounting table 27 is connected to a moving mechanism (not shown), and can be moved back and forth between the film forming chamber 24 and the outside of the apparatus.

上記のように構成された成膜用霧化装置１および成膜装置２は、制御装置３により動作が制御されている。制御装置３は、演算部や記憶部、入出力部等を備えており、手動運転や自動運転で各装置１・２を単独や連動させながら作動させる各種の処理機能を有している。   The operations of the film-forming atomizer 1 and the film-forming apparatus 2 configured as described above are controlled by the control device 3. The control device 3 includes a calculation unit, a storage unit, an input / output unit, and the like, and has various processing functions for operating each device 1 or 2 independently or in conjunction with manual operation or automatic operation.

具体的には、成膜用霧化装置１を単独で運転する機能としては、成膜用霧化装置１の傾動動作を定期的に実施する機能や、中間溶液６の温度や粘度を超音波の伝播にとって最適な状態となるように調整する機能、霧化用液体４の収容量を検知して補充時期を報知したり、自動補充する機能、窒素ガスの供給量を所定値とするように流量制御弁１２の開度を調整する機能等がある。また、成膜装置２を単独で運転する機能としては、成膜室２４の温度を所望の温度に維持するように加熱ヒータ２５を制御する機能や、基板２６を成膜室２４内で往復移動させて載置台２７全体に均等に成膜させる機能等がある。成膜用霧化装置１と成膜装置２とを連動させながら運転する機能としては、成膜用霧化装置１のミストの生成量と、成膜装置２における成膜室２４の温度およびミストの流速とを連動させながら、成膜処理の好適な条件を出現させる機能等がある。   Specifically, as a function of operating the film-forming atomizer 1 alone, a function of periodically performing the tilting operation of the film-forming atomizer 1, and the temperature and viscosity of the intermediate solution 6 are measured by ultrasonic waves. Function for adjusting to an optimal state for the propagation of the liquid, detecting the amount of the atomizing liquid 4 and notifying the replenishment timing, automatically replenishing, and the supply amount of nitrogen gas to a predetermined value There is a function of adjusting the opening degree of the flow control valve 12. In addition, as a function of operating the film forming apparatus 2 alone, a function of controlling the heater 25 so as to maintain the temperature of the film forming chamber 24 at a desired temperature, or a reciprocating movement of the substrate 26 in the film forming chamber 24. Thus, there is a function of uniformly forming the film on the entire mounting table 27. The functions of operating the film formation atomizer 1 and the film formation apparatus 2 in conjunction with each other include the amount of mist generated by the film formation atomizer 1, the temperature of the film formation chamber 24 in the film formation apparatus 2, and the mist. There is a function of causing suitable conditions for the film forming process to appear while interlocking with the flow rate of the film.

上記の構成において、薄膜製造装置における成膜用霧化装置１の動作を説明する。
エタノールが溶液槽７に中間溶液６として投入され、容器８の底面部材８ｂが中間溶液６に完全に浸漬される。この後、蓋部材９が容器８から取り外され、０．０５Ｍ等の所定濃度の酢酸亜鉛溶液が霧化用液体４として容器８に投入される。尚、霧化用液体４の投入は、蓋部材９に図示しない投入口を開閉可能に形成しておき、この投入口から行っても良い。この後、蓋部材９が容器８に冠着され、霧化用液体４および中間溶液６が図示しない熱交換装置で加熱や冷却されることによって、超音波の伝播にとって好適な温度および粘度に調整される。 In the above configuration, the operation of the atomizing apparatus 1 for film formation in the thin film manufacturing apparatus will be described.
Ethanol is introduced into the solution tank 7 as the intermediate solution 6, and the bottom member 8 b of the container 8 is completely immersed in the intermediate solution 6. Thereafter, the lid member 9 is removed from the container 8, and a zinc acetate solution having a predetermined concentration of 0.05 M or the like is put into the container 8 as the atomizing liquid 4. It should be noted that the atomizing liquid 4 may be introduced from an inlet port (not shown) that can be opened and closed in the lid member 9. Thereafter, the lid member 9 is attached to the container 8, and the atomization liquid 4 and the intermediate solution 6 are heated and cooled by a heat exchange device (not shown) to adjust the temperature and viscosity to be suitable for the propagation of ultrasonic waves. Is done.

次に、成膜用霧化装置１が直立姿勢であることが確認された後、超音波振動子１３が作動され、例えば２．４ＭＨｚの超音波が発振される。尚、この超音波の発振周波数は、成膜処理にとって最適なミストの粒径となるように適宜変更される。超音波は、中間溶液６を伝播し、容器８の底面部材８ｂを透過して霧化用液体４に伝播する。この結果、霧化用液体４は、超音波により振動され、液体同士の結合が外れることによりミストとなって放出される。尚、この場合におけるミストは、酢酸亜鉛と水との混合物である。ところで、底面部材８ｂは、超音波を透過させ易い高密度ポリエチレン等の材料を薄膜化したフィルム状に形成されている。従って、超音波は、底面部材８ｂでの減衰が極めて小さな状態で霧化用液体４に伝播して霧化用液体４を振動させるため、高い効率でミストを生成することができる。   Next, after it is confirmed that the film-forming atomizer 1 is in the upright posture, the ultrasonic vibrator 13 is operated, and, for example, 2.4 MHz ultrasonic waves are oscillated. Note that the oscillation frequency of this ultrasonic wave is appropriately changed so as to obtain the optimum mist particle size for the film forming process. The ultrasonic wave propagates through the intermediate solution 6, passes through the bottom member 8 b of the container 8, and propagates to the atomizing liquid 4. As a result, the atomizing liquid 4 is vibrated by ultrasonic waves and released as a mist when the coupling between the liquids is released. In this case, the mist is a mixture of zinc acetate and water. By the way, the bottom surface member 8b is formed in a film shape obtained by thinning a material such as high-density polyethylene that easily transmits ultrasonic waves. Therefore, since the ultrasonic wave propagates to the atomizing liquid 4 and vibrates the atomizing liquid 4 in a state where the attenuation at the bottom surface member 8b is extremely small, mist can be generated with high efficiency.

上記のようにしてミストが生成されると、この生成タイミングに一致したタイミングや僅かに前後したタイミングで流量制御弁１２が開栓される。そして、窒素ガスボンベ１１の窒素ガスが流量制御弁１２の開度に応じた供給量で容器８内に供給される。これにより、ミストは、窒素ガスと共に筒状部材１０から排出され、配管１４を介して成膜装置２に供給される。この後、成膜装置２において、ミストは、予熱室２３で予熱された後、成膜室２４に流動され、基板２６の表面に沿って流動されながら加熱により酸化亜鉛（ＺｎＯ）を生成し、酸化亜鉛（ＺｎＯ）の膜を基板２６の表面に形成する。   When the mist is generated as described above, the flow control valve 12 is opened at a timing that coincides with this generation timing or at a timing that is slightly around. Then, nitrogen gas in the nitrogen gas cylinder 11 is supplied into the container 8 with a supply amount corresponding to the opening degree of the flow control valve 12. Thus, the mist is discharged from the cylindrical member 10 together with the nitrogen gas, and is supplied to the film forming apparatus 2 through the pipe 14. Thereafter, in the film forming apparatus 2, the mist is preheated in the preheating chamber 23, then flows into the film forming chamber 24, and generates zinc oxide (ZnO) by heating while flowing along the surface of the substrate 26, A film of zinc oxide (ZnO) is formed on the surface of the substrate 26.

また、上記のようにして成膜用霧化装置１がミストを生成し始めてから所定時間が経過したり、底面部材８ｂの下面において多量の気泡の発生が作業者により確認されると、成膜用霧化装置１が直立姿勢（図示実線）から傾斜姿勢（図示ニ点鎖線）に切り替えられる。これにより、底面部材８ｂが水平状態から傾斜した状態に切り替わるため、底面部材８ｂに付着している気泡が浮力により底面部材８ｂに沿って上昇し、底面部材８ｂから排除される。そして、時間の経過や目視による確認によって、底面部材８ｂの気泡が十分に除去されたときに、成膜用霧化装置１が傾斜姿勢から直立姿勢に回動される。この結果、気泡による超音波の減衰が解消されることによって、ミストの高効率の生成を長期間に亘って維持することができる。また、このようにミストを生成しているときに、超音波振動子１３の振動により溶液槽７の壁面が剥離したり、超音波振動子１３の構成材料が中間溶液６に溶け出した場合でも、容器８に収容された霧化用液体４が汚染されることがない。   Further, when a predetermined time elapses after the film-forming atomizer 1 starts generating mist as described above, or when the generation of a large amount of bubbles on the lower surface of the bottom surface member 8b is confirmed by the operator, the film is formed. The atomizing apparatus 1 is switched from an upright posture (solid line in the drawing) to an inclined posture (two-dot chain line in the drawing). Thereby, since the bottom face member 8b switches from the horizontal state to the inclined state, the bubbles adhering to the bottom face member 8b rise along the bottom face member 8b by buoyancy and are excluded from the bottom face member 8b. Then, when the bubbles on the bottom surface member 8b are sufficiently removed by the passage of time or visual confirmation, the film-forming atomizer 1 is rotated from the inclined posture to the upright posture. As a result, since the attenuation of the ultrasonic wave due to the bubbles is eliminated, high-efficiency generation of mist can be maintained over a long period of time. Further, even when the mist is generated in this way, even when the wall surface of the solution tank 7 is peeled off by the vibration of the ultrasonic vibrator 13 or the constituent material of the ultrasonic vibrator 13 is dissolved in the intermediate solution 6. The atomizing liquid 4 accommodated in the container 8 is not contaminated.

以上のように、本実施形態の成膜用霧化装置１は、霧化用液体４を収容し、底面部材８ｂ（底面部）が高分子材料の薄膜で形成された容器８と、容器８および中間溶液６を収容し、中間溶液６に少なくとも容器８の底面部材８ｂを浸漬させる溶液槽７と、溶液槽７に設けられ、容器８の底面部材８ｂに対して超音波を照射する超音波振動子１３とを有した構成にされている。これにより、超音波を透過する底面部材８ｂが高分子材料の薄膜で形成されていることから、超音波を高い効率で透過して霧化用液体４に伝播させることができるため、十分に高い効率で霧化用液体４を霧化することができる。   As described above, the film-forming atomizer 1 of the present embodiment accommodates the atomizing liquid 4 and the container 8 in which the bottom member 8b (bottom part) is formed of a thin film of a polymer material, and the container 8. And a solution tank 7 that contains the intermediate solution 6 and immerses at least the bottom member 8b of the container 8 in the intermediate solution 6, and an ultrasonic wave that is provided in the solution tank 7 and irradiates the bottom member 8b of the container 8 with ultrasonic waves. The vibrator 13 is provided. Accordingly, since the bottom member 8b that transmits ultrasonic waves is formed of a thin film made of a polymer material, the ultrasonic waves can be transmitted with high efficiency and propagated to the atomizing liquid 4, and thus sufficiently high. The atomizing liquid 4 can be atomized with efficiency.

以上、本発明を好適な実施の形態に基づいて説明したが、本発明はその趣旨を超えない範囲において変更が可能である。即ち、本実施形態における容器８は、成膜用霧化装置１が直立姿勢であるときに、底面部材８ｂが水平面に対して一致するように設定されているが、これに限定されるものではなく、底面部材８ｂが水平面に対して交差するように形成されていても良い。   As mentioned above, although this invention was demonstrated based on suitable embodiment, this invention can be changed in the range which does not exceed the meaning. That is, the container 8 in the present embodiment is set so that the bottom surface member 8b coincides with the horizontal plane when the film-forming atomizer 1 is in the upright posture, but is not limited to this. Alternatively, the bottom member 8b may be formed so as to intersect the horizontal plane.

具体的には、図２に示すように、容器８の底面部材８ｂが水平面に対して傾斜されていても良い。この場合には、成膜用霧化装置１を直立姿勢に維持しながら、底面部材８ｂの下面に発生した気泡を浮力のより移動させて排除することができる。さらに、図３に示すように、容器８の側面部材８ａがＬ字形状に曲折され、側面部材８ａが水平面に対して直交されていても良い。この場合には、側面部材８ａに発生した気泡を効率良く排除することができると共に、作業者が側面部材８ａや超音波振動子１３の状態を容易に観察することができる。   Specifically, as shown in FIG. 2, the bottom member 8b of the container 8 may be inclined with respect to the horizontal plane. In this case, the bubbles generated on the lower surface of the bottom surface member 8b can be moved away by buoyancy while the film-forming atomizer 1 is maintained in an upright posture. Furthermore, as shown in FIG. 3, the side member 8a of the container 8 may be bent in an L shape, and the side member 8a may be orthogonal to the horizontal plane. In this case, air bubbles generated in the side member 8a can be efficiently removed, and the operator can easily observe the state of the side member 8a and the ultrasonic transducer 13.

また、本実施形態においては、図１に示すように、成膜用霧化装置１を傾斜姿勢にすることにより気泡を除去しているが、これに限定されるものでもなく、配管１４を閉栓し、成膜用霧化装置１内を窒素ガスで加圧することによって、容器８の底面部材８ｂを凸湾曲状に突出するように変形させても良い。この場合には、凸湾曲状に突出した底面部材８ｂに沿って気泡を移動させて除去することができる。   Moreover, in this embodiment, as shown in FIG. 1, although the bubble formation is removed by making the film-forming atomizer 1 into an inclined posture, the present invention is not limited to this. The bottom member 8b of the container 8 may be deformed so as to protrude in a convex curve by pressurizing the atomizing apparatus 1 for film formation with nitrogen gas. In this case, the bubbles can be removed by moving along the bottom surface member 8b protruding in a convex curve.

本実施形態においては、成膜用霧化装置１を薄膜製造装置に搭載し、酸化亜鉛を成膜する用途に適用した場合について説明しているが、これに限定されるものではない。酸化亜鉛以外に、アルミナ系、ジルコニア系、シリカ系、ペロブスカイト系などの酸化物や、さらに酸窒化物の成膜にも適用できる。   In the present embodiment, the case where the film-forming atomizing apparatus 1 is mounted on a thin film manufacturing apparatus and applied to the use for forming a zinc oxide film is described, but the present invention is not limited to this. In addition to zinc oxide, the present invention can be applied to oxides of alumina, zirconia, silica, perovskite, and oxynitrides.

図１の成膜用霧化装置において、底面部材８ｂとして高分子材料の薄膜を採用した容器８と、側面部材及び底面部材ともにガラスを採用したガラス容器を用いた場合とを比較した。
ガラス容器を用いた場合、超音波は反射若しくは吸収されてしまい、伝わらず、霧化用液体４は霧化されなかった。
一方、底面部材８ｂとして高分子材料の薄膜を採用した容器８を用いた場合霧化用液体４は効率良く霧化された。 In the atomization apparatus for film formation of FIG. 1, the container 8 which employs a thin film of a polymer material as the bottom member 8b was compared with the case where a glass container employing glass for both the side member and the bottom member was used.
When the glass container was used, the ultrasonic wave was reflected or absorbed, and was not transmitted, and the atomizing liquid 4 was not atomized.
On the other hand, when the container 8 which employs a thin film of a polymer material is used as the bottom member 8b, the atomizing liquid 4 is efficiently atomized.

尚、本発明は、上記の好ましい実施形態に記載されているが、本発明はそれだけに制限されない。本発明の精神と範囲から逸脱することのない様々な実施形態が他になされることは理解されよう。さらに、本実施形態において、本発明の構成による作用および効果を述べているが、これら作用および効果は、一例であり、本発明を限定するものではない。   In addition, although this invention is described in said preferable embodiment, this invention is not restrict | limited only to it. It will be understood that various other embodiments may be made without departing from the spirit and scope of the invention. Furthermore, in this embodiment, although the effect | action and effect by the structure of this invention are described, these effect | actions and effects are examples and do not limit this invention.

薄膜製造装置の概略構成を示す説明図である。It is explanatory drawing which shows schematic structure of a thin film manufacturing apparatus. 成膜用霧化装置の概略構成を示す説明図である。It is explanatory drawing which shows schematic structure of the atomization apparatus for film-forming. 成膜用霧化装置の概略構成を示す説明図である。It is explanatory drawing which shows schematic structure of the atomization apparatus for film-forming.

１ 成膜用霧化装置
２ 成膜装置
３ 制御装置
４ 霧化用液体
５ 収容機構
６ 中間溶液
７ 溶液槽
８ 容器
８ａ 側面部材
８ｂ 底面部材
９ 蓋部材
１０ 筒状部材
１１ 窒素ガスボンベ
１２ 流量制御弁
１３ 超音波振動子
１４ 配管
２１ 上部隔壁体
２２ 基台
２３ 予熱室
２４ 成膜室
２５ 加熱ヒータ
２６ 基板
２７ 載置台 DESCRIPTION OF SYMBOLS 1 Film formation atomizer 2 Film formation apparatus 3 Control apparatus 4 Atomization liquid 5 Storage mechanism 6 Intermediate solution 7 Solution tank 8 Container 8a Side member 8b Bottom member 9 Lid member 10 Cylindrical member 11 Nitrogen gas cylinder 12 Flow control valve 13 Ultrasonic vibrator 14 Pipe 21 Upper partition body 22 Base 23 Preheating chamber 24 Film forming chamber 25 Heater 26 Substrate 27 Mounting table

Claims (2)

成膜に用いられる霧化装置であって、
霧化用液体を収容し、底面部が高分子材料の薄膜で形成された容器と、
前記容器および中間溶液を収容し、該中間溶液に少なくとも前記容器の底面部を浸漬させる溶液槽と、
前記溶液槽に設けられ、前記容器の底面部に対して超音波を照射する超音波振動子とを有し、
前記容器は、前記溶液槽内で回動機構により回動可能にされることで、当該容器の中心軸が鉛直方向に一致する直立姿勢と、当該容器の中心軸が鉛直方向に対して傾斜する傾斜姿勢とに切り替え可能であり、当該容器が当該傾斜姿勢の時は、当該容器の底面部が水平面に対して傾斜した状態となることを特徴とする成膜用霧化装置。 An atomizing device used for film formation,
A container containing an atomizing liquid and having a bottom surface formed of a thin film of a polymer material;
A solution tank containing the container and the intermediate solution, and dipping at least the bottom surface of the container in the intermediate solution;
An ultrasonic transducer that is provided in the solution tank and radiates ultrasonic waves to the bottom surface of the container;
The container is made rotatable by a rotation mechanism in the solution tank, so that an upright posture in which the central axis of the container coincides with the vertical direction and the central axis of the container is inclined with respect to the vertical direction. An atomizing apparatus for film formation , which can be switched to an inclined posture, and when the container is in the inclined posture, the bottom surface of the container is inclined with respect to a horizontal plane . 前記容器の底面部の高分子材料の薄膜は、弾性率が１．５ＧＰａ〜７．０ＧＰａの範囲に設定されていることを特徴とする請求項１に記載の成膜用霧化装置。   2. The atomizing apparatus for film formation according to claim 1, wherein the thin film of the polymer material on the bottom surface of the container has an elastic modulus set in a range of 1.5 GPa to 7.0 GPa.
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