JP4638679B2 - Gas hydrate production equipment - Google Patents
Gas hydrate production equipment Download PDFInfo
- Publication number
- JP4638679B2 JP4638679B2 JP2004072900A JP2004072900A JP4638679B2 JP 4638679 B2 JP4638679 B2 JP 4638679B2 JP 2004072900 A JP2004072900 A JP 2004072900A JP 2004072900 A JP2004072900 A JP 2004072900A JP 4638679 B2 JP4638679 B2 JP 4638679B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- gas hydrate
- raw material
- partition plate
- powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
本発明は、ガスハイドレートの濃度を短時間で50%台から90%台に高めるガスハイドレート製造装置に関するものである。 The present invention relates to a gas hydrate manufacturing apparatus that increases the concentration of gas hydrate from 50% to 90% in a short time.
従来、濃度が90%以上、即ち、水分が10%以下となる高濃度(高純度)のガスハイドレートを製造する場合において、ガスハイドレートの濃度を50%程度から90%以上に増加させる方法として、次の2つの方法がある。 Conventionally, when producing a high concentration (high purity) gas hydrate having a concentration of 90% or more, that is, moisture of 10% or less, a method for increasing the concentration of the gas hydrate from about 50% to 90% or more. There are the following two methods.
すなわち、(1)濃度50%のガスハイドレートを濃度70%まで遠心分離、或いは、圧縮濾過等の機械脱水を行い、続いて、濃度70%から濃度90%まで原料ガスと残留水分とを気液接触させてガスハイドレートを生成増加させる方法(例えば、図3又は特許文献1参照。)。 (1) Centrifugation of gas hydrate having a concentration of 50% to a concentration of 70%, or mechanical dehydration such as compression filtration, and subsequently gasifying the source gas and residual moisture from a concentration of 70% to a concentration of 90%. A method of increasing the generation of gas hydrate by contact with a liquid (for example, see FIG. 3 or Patent Document 1).
(2)濃度50%から濃度90%まで、圧力容器内で機械攪拌によって原料ガスと残留水分とを気液接触させてガスハイドレートを生成増加させる方法(図4参照。)。
しかしながら、前者の方法は、細粒ガスハイドレートが脱水機の篩下に漏洩するため、歩留りが低下する。また、脱水機を高圧(例えば、30〜50kg/cm2 )に対応させるため、過大な設備となる。 However, in the former method, since the fine gas hydrate leaks under the screen of the dehydrator, the yield decreases. Moreover, since it makes a dehydrator respond | correspond to a high voltage | pressure (for example, 30-50 kg / cm < 2 >), it will be an excessive installation.
他方、後者の方法は、ガスハイドレート濃度が50%以上になると、ほぼ粉体状であるので、機械攪拌の効率が低くなり、ガスハイドレートの濃度を増加させるために長時間を必要とする。また、ガスハイドレートの生成熱を除去するには、除去するには、外壁ジャケットからの冷却以外に有効な手段がない。所定の除熱量を得ようとすれば、装置が過大なサイズとなる。 On the other hand, in the latter method, when the gas hydrate concentration is 50% or more, it is almost in the form of powder, so the efficiency of mechanical stirring is lowered, and a long time is required to increase the gas hydrate concentration. . Further, in order to remove the heat generated by the gas hydrate, there is no effective means other than cooling from the outer wall jacket. If a predetermined amount of heat removal is to be obtained, the apparatus becomes excessively large.
本発明は、上記のような問題を解消するためになされたものであり、その目的とするところは、過大な装置を要することなく、短時間でガスハイドレートの濃度を50%から90%以上に高めることができるガスハイドレートの製造装置を提供することにある。 The present invention has been made to solve the above-described problems, and the object of the present invention is to reduce the gas hydrate concentration from 50% to 90% or more in a short time without requiring an excessive apparatus. An object of the present invention is to provide a gas hydrate production apparatus that can be increased.
本発明は、係る目的を達成するため、本発明は、次のように形成されている。 In order to achieve the object, the present invention is formed as follows.
本願の請求項1に係るガスハイドレート製造装置は、湿潤状態のガスハイドレート粉体に含まれている水分と原料ガスとを反応させてほぼ乾燥したガスハイドレート粉体を製造するガスハイドレート製造装置において、反応容器内に無数のガス噴出孔を有する仕切板を設け、該仕切板の下方をガス充填室とすると共にその上方を流動層室とし、該流動層室内に導入した湿潤状態のガスハイドレート粉体に対し、前記仕切板に設けた無数のガス噴出孔から原料ガスを噴出して前記ガスハイドレート粉体を上下に流動化させ、前記ガスハイドレート粉体に含まれている水分と原料ガスとの接触効率を高めることを特徴とするものである。 A gas hydrate production apparatus according to claim 1 of the present application is a gas hydrate for producing a substantially dried gas hydrate powder by reacting moisture contained in a wet gas hydrate powder with a raw material gas. In the production apparatus, a partition plate having an infinite number of gas ejection holes is provided in the reaction vessel, and a gas filling chamber is provided below the partition plate and a fluidized bed chamber is provided above the partition, and a wet state is introduced into the fluidized bed chamber. The gas hydrate powder is contained in the gas hydrate powder by jetting a raw material gas from countless gas ejection holes provided in the partition plate to fluidize the gas hydrate powder up and down. It is characterized by increasing the contact efficiency between moisture and source gas .
本願の請求項2に係るガスハイドレート製造装置は、反応容器から飛散したガスハイドレート粒子を、捕集装置によって原料ガスから分離した後、前記反応容器に戻すことを特徴とするものである。 The gas hydrate production apparatus according to claim 2 of the present application is characterized in that the gas hydrate particles scattered from the reaction vessel are separated from the raw material gas by the collecting device and then returned to the reaction vessel .
本願の請求項3に係るガスハイドレート製造装置は、反応容器に冷却ジャケット又は冷却管を設けたことを特徴とするものである。 The gas hydrate production apparatus according to claim 3 of the present application is characterized in that a reaction jacket is provided with a cooling jacket or a cooling pipe .
上記のように、本願の請求項1に係る発明は、湿潤状態のガスハイドレート粉体に含まれている水分と原料ガスとを反応させてほぼ乾燥したガスハイドレート粉体を製造するガスハイドレート製造装置において、反応容器内に無数のガス噴出孔を有する仕切板を設け、該仕切板の下方をガス充填室とすると共にその上方を流動層室とし、該流動層室内に導入した湿潤状態のガスハイドレート粉体に対し、前記仕切板に設けた無数のガス噴出孔から原料ガスを噴出して前記ガスハイドレート粉体を上下に流動化させ、前記ガスハイドレート粉体に含まれている水分と原料ガスとの接触効率を高めるので、次のような効果を有する。すなわち、
(1)ガスハイドレートの攪拌を原料ガスで流動化して行なうため、湿潤状態のガスハイドレートに含まれている水分と原料ガスとの接触度が高まり、ガスハイドレートの生成反応時間を短縮できる。
As described above, the invention according to claim 1 of the present application is a gas hydrate for producing a substantially dried gas hydrate powder by reacting moisture contained in a wet gas hydrate powder with a raw material gas. In the rate production apparatus, a wet state in which a partition plate having an infinite number of gas ejection holes is provided in the reaction vessel, a gas filling chamber is provided below the partition plate, and a fluidized bed chamber is provided above the partition plate. The gas hydrate powder is contained in the gas hydrate powder by jetting a raw material gas from countless gas ejection holes provided in the partition plate to fluidize the gas hydrate powder up and down. Since the contact efficiency between the moisture and the source gas is increased, the following effects are obtained. That is,
(1) Since the gas hydrate is stirred by fluidizing with the raw material gas, the contact degree between the moisture contained in the wet gas hydrate and the raw material gas is increased, and the gas hydrate production reaction time can be shortened. .
(2)ガスハイドレート生成熱の除熱を原料ガスの顕熱で行なっているので、直接冷却となり、冷却効果を高くすることができる。そのため、ガスハイドレートの反応時間を短縮できる。 (2) Since the heat removal of the gas hydrate generation heat is performed by sensible heat of the raw material gas, direct cooling is performed, and the cooling effect can be enhanced. Therefore, the reaction time of gas hydrate can be shortened.
(3)原料ガスのバブリングによってガスハイドレート全体が攪拌状態となるため、ガスハイドレートの壁面への付着、堆積を防止できる。 (3) Since the entire gas hydrate is agitated by the bubbling of the raw material gas, it is possible to prevent the gas hydrate from adhering to and depositing on the wall surface.
以下、本発明の実施の形態を図面を用いて説明する。
(1)実施形態1
図1に示すように、このガスハイドレート製造装置は、圧力容器(反応容器ともいう。)1、サイクロン2、循環ガス冷却器3および循環ガスブロワ4を備えている。
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
(1) Embodiment 1
As shown in FIG. 1, the gas hydrate production apparatus includes a pressure vessel (also referred to as a reaction vessel) 1, a cyclone 2, a circulating gas cooler 3, and a circulating gas blower 4.
圧力容器1は、筒形に形成され、その断面は、円形又は矩形断面となっている。この圧力容器1は、大断面部1aと、小断面部1bと、これらを接続する漏斗状部1cにより形成され、小断面部1bの上端に多孔板や焼結板等から成る仕切板5を設けている。そして、仕切板5より下方をガス充填室6と称すると共に、仕切板5より上方を流動層室7と称している。 The pressure vessel 1 is formed in a cylindrical shape and has a circular or rectangular cross section. This pressure vessel 1 is formed by a large cross-sectional portion 1a, a small cross-sectional portion 1b, and a funnel-like portion 1c connecting them, and a partition plate 5 made of a porous plate, a sintered plate or the like is provided at the upper end of the small cross-sectional portion 1b. Provided. A portion below the partition plate 5 is referred to as a gas filling chamber 6 and a portion above the partition plate 5 is referred to as a fluidized bed chamber 7.
更に、この圧力容器1は、その外側に循環ガスブロワ4を備え、圧力容器1内の原料ガスgを循環するようにしている。そして、圧力容器1の大断面部1aの上部部分に設けたダクト8から流出したガスハイドレート粒子aをサイクロン(捕集装置ともいう。)2によって捕集して圧力容器1の大断面部1aの下部部分に戻すようにしている。 Further, the pressure vessel 1 is provided with a circulation gas blower 4 on the outside thereof, and circulates the raw material gas g in the pressure vessel 1. And the gas hydrate particle | grains a which flowed out from the duct 8 provided in the upper part of the large cross-sectional part 1a of the pressure vessel 1 are collected by the cyclone (it is also called a collection apparatus) 2, and the large cross-sectional part 1a of the pressure vessel 1 is collected. It is trying to return to the lower part of.
そして、サイクロン2の頂部2aと圧力容器1のガス充填室6とを接続する管路9には、循環ガス冷却器3と循環ガスブロワ4とを、この順に配し、圧力容器1の外に取り出した原料ガスgを循環ガス冷却器3によって所定温度に冷却した後、圧力容器1のガス充填室6に供給するようにしている。 A circulation gas cooler 3 and a circulation gas blower 4 are arranged in this order in a pipe line 9 connecting the top 2a of the cyclone 2 and the gas filling chamber 6 of the pressure vessel 1 and taken out of the pressure vessel 1. The raw material gas g is cooled to a predetermined temperature by the circulating gas cooler 3 and then supplied to the gas filling chamber 6 of the pressure vessel 1.
また、サイクロン2から循環ガス冷却器3に至る管路9の途中に原料ガス補給管10を設け、ガスハイドレートの水和脱水反応の進行状況にしたがって原料ガスgを補給するようにしている。 In addition, a raw material gas supply pipe 10 is provided in the middle of a pipe line 9 extending from the cyclone 2 to the circulating gas cooler 3 to supply the raw material gas g according to the progress of the hydrated dehydration reaction of the gas hydrate.
更に、圧力容器1の大断面部1aに原料供給管11を設け、圧力容器1の漏斗部1cに製品排出管12を設けている。 Further, a raw material supply pipe 11 is provided in the large cross section 1 a of the pressure vessel 1, and a product discharge pipe 12 is provided in the funnel portion 1 c of the pressure vessel 1.
次に、このガスハイドレート製造装置の作用について説明する。 Next, the operation of this gas hydrate production apparatus will be described.
上記循環ガス冷却器3および循環ガスブロワ4を稼働すると、所定温度に冷却された原料ガス(天然ガス)gが圧力容器1のガス充填室6に供給され、仕切板5に設けられている微細な無数の孔15から圧力容器1の流動層室7内に噴出する。 When the circulating gas cooler 3 and the circulating gas blower 4 are operated, the raw material gas (natural gas) g cooled to a predetermined temperature is supplied to the gas filling chamber 6 of the pressure vessel 1 and is finely provided on the partition plate 5. The fluid is ejected from the innumerable holes 15 into the fluidized bed chamber 7 of the pressure vessel 1.
その時、原料供給管11から圧力容器1の流動層室7に湿潤状態(例えば、純度50%程度)のガスハイドレート粉体Aを供給すると、湿潤状態のガスハイドレート粉体Aは、仕切板5に設けられている微細な無数の孔15から噴出する原料ガスgによって吹き上げられ、上下に激しく流動する。その間に、湿潤状態のガスハイドレート粉体Aに含まれている未反応水と原料ガス(天然ガス)gが反応し、新規にガスハイドレートが生成される。 At that time, when the gas hydrate powder A in a wet state (for example, a purity of about 50%) is supplied from the raw material supply pipe 11 to the fluidized bed chamber 7 of the pressure vessel 1, the gas hydrate powder A in the wet state is separated from the partition plate. 5 is blown up by the raw material gas g ejected from the innumerable fine holes 15 provided in 5 and vigorously flows up and down. Meanwhile, the unreacted water contained in the wet gas hydrate powder A reacts with the raw material gas (natural gas) g to newly generate gas hydrate.
従って、この新規なガスハイドレートの生成によってガスハイドレート粉体Aに含まれている未反応水が減少し、ガスハイドレートの純度が高くなる(例えば、純度90%程度)。純度の上がったガスハイドレート粉体A’は、製品排出管12から図示しない次工程に送出される。 Therefore, the generation of the new gas hydrate reduces the unreacted water contained in the gas hydrate powder A, and the purity of the gas hydrate is increased (for example, the purity is about 90%). The gas hydrate powder A 'having increased purity is sent from the product discharge pipe 12 to the next process (not shown).
この例では、ガスハイドレート生成熱を循環ガス(原料ガス)の顕熱を利用して除去している。
(2)実施形態2
図2は、本発明に係るガスハイドレート製造装置の第2の実施形態を示しており、圧力容器1の流動層室7内に設けた伝熱管13にブラインbを通してガスハイドレートの生成熱を除去するようにしている。また、伝熱管13の代わりに圧力容器1の外側に冷却ジャケット(図示せず)を設けてガスハイドレートの生成熱を除去しても良い。その他の部位は、第1の実施形態と相違がないので、同じ部位に同じ符合を付け、詳細な説明を省略する。
In this example, the gas hydrate generation heat is removed using the sensible heat of the circulating gas (raw material gas).
(2) Embodiment 2
FIG. 2 shows a second embodiment of the gas hydrate production apparatus according to the present invention, wherein the heat generated from the gas hydrate is passed through the heat transfer pipe 13 provided in the fluidized bed chamber 7 of the pressure vessel 1 through the brine b. Try to remove. Further, instead of the heat transfer tube 13, a cooling jacket (not shown) may be provided outside the pressure vessel 1 to remove the heat generated by the gas hydrate. Other parts are the same as those in the first embodiment, and therefore, the same reference numerals are given to the same parts, and detailed description thereof is omitted.
A 湿潤状態のガスハイドレート粉体
A’乾燥したガスハイドレート粉体
g 原料ガス
1 反応容器
5 仕切板
6 ガス充填室
7 流動層室
15 ガス噴出孔
A Wet gas hydrate powder A 'Dry gas hydrate powder g Raw material gas 1 Reaction vessel 5 Partition plate 6 Gas filling chamber 7 Fluidized bed chamber 15 Gas ejection hole
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004072900A JP4638679B2 (en) | 2004-03-15 | 2004-03-15 | Gas hydrate production equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004072900A JP4638679B2 (en) | 2004-03-15 | 2004-03-15 | Gas hydrate production equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005255945A JP2005255945A (en) | 2005-09-22 |
JP4638679B2 true JP4638679B2 (en) | 2011-02-23 |
Family
ID=35081992
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004072900A Expired - Fee Related JP4638679B2 (en) | 2004-03-15 | 2004-03-15 | Gas hydrate production equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4638679B2 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080072495A1 (en) * | 1999-12-30 | 2008-03-27 | Waycuilis John J | Hydrate formation for gas separation or transport |
JP4303666B2 (en) * | 2004-09-29 | 2009-07-29 | 三井造船株式会社 | Fluidized bed reactor for gas hydrate slurry |
JP2006096865A (en) * | 2004-09-29 | 2006-04-13 | Mitsui Eng & Shipbuild Co Ltd | Apparatus for producing hydrate slurry and plant for producing hydrate |
JP2007217600A (en) * | 2006-02-17 | 2007-08-30 | Mitsui Eng & Shipbuild Co Ltd | Apparatus and method for producing gas hydrate |
JP2007238697A (en) * | 2006-03-07 | 2007-09-20 | Mitsui Eng & Shipbuild Co Ltd | Methods of production and regasification and apparatus for production and regasification of gas hydrate |
JP4796412B2 (en) * | 2006-03-10 | 2011-10-19 | 三井造船株式会社 | Production equipment in a natural gas hydrate production plant |
WO2007110919A1 (en) * | 2006-03-28 | 2007-10-04 | Mitsui Engineering And Shipbuilding Co., Ltd. | Fluidized-bed gas hydrate generator and method of generating gas hydrate |
WO2007141833A1 (en) * | 2006-06-02 | 2007-12-13 | Mitsui Engineering & Shipbuilding Co., Ltd. | Hydrate post treatment apparatus and hydrate particle diameter control method |
JP5167716B2 (en) * | 2007-03-29 | 2013-03-21 | Jfeエンジニアリング株式会社 | Method and apparatus for producing clathrate hydrate slurry |
CN107542431B (en) * | 2017-01-11 | 2020-02-07 | 西南石油大学 | Method for gas-liquid-solid multiphase fluidization separation of natural gas hydrate on seabed |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001072615A (en) * | 1999-09-01 | 2001-03-21 | Ishikawajima Harima Heavy Ind Co Ltd | Method and apparatus for producing hydrate |
JP2001342473A (en) * | 2000-03-30 | 2001-12-14 | Mitsubishi Heavy Ind Ltd | Apparatus for producing gas hydrate and apparatus for dehydrating gas hydrate |
JP2003073679A (en) * | 2001-08-31 | 2003-03-12 | Mitsubishi Heavy Ind Ltd | Dehydrator for gas hydrate slurry |
JP2004035840A (en) * | 2002-07-08 | 2004-02-05 | Mitsui Eng & Shipbuild Co Ltd | Gas-hydrate dehydrator |
JP2004099831A (en) * | 2002-09-12 | 2004-04-02 | Mitsui Eng & Shipbuild Co Ltd | Method for producing gas-hydrate and apparatus therefor |
JP2006095438A (en) * | 2004-09-29 | 2006-04-13 | Mitsui Eng & Shipbuild Co Ltd | Fluidized bed type reaction column for gas hydrate slurry |
JP2006095417A (en) * | 2004-09-29 | 2006-04-13 | Mitsui Eng & Shipbuild Co Ltd | Dehydrating tower of gas hydrate slurry |
-
2004
- 2004-03-15 JP JP2004072900A patent/JP4638679B2/en not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001072615A (en) * | 1999-09-01 | 2001-03-21 | Ishikawajima Harima Heavy Ind Co Ltd | Method and apparatus for producing hydrate |
JP2001342473A (en) * | 2000-03-30 | 2001-12-14 | Mitsubishi Heavy Ind Ltd | Apparatus for producing gas hydrate and apparatus for dehydrating gas hydrate |
JP2003073679A (en) * | 2001-08-31 | 2003-03-12 | Mitsubishi Heavy Ind Ltd | Dehydrator for gas hydrate slurry |
JP2004035840A (en) * | 2002-07-08 | 2004-02-05 | Mitsui Eng & Shipbuild Co Ltd | Gas-hydrate dehydrator |
JP2004099831A (en) * | 2002-09-12 | 2004-04-02 | Mitsui Eng & Shipbuild Co Ltd | Method for producing gas-hydrate and apparatus therefor |
JP2006095438A (en) * | 2004-09-29 | 2006-04-13 | Mitsui Eng & Shipbuild Co Ltd | Fluidized bed type reaction column for gas hydrate slurry |
JP2006095417A (en) * | 2004-09-29 | 2006-04-13 | Mitsui Eng & Shipbuild Co Ltd | Dehydrating tower of gas hydrate slurry |
Also Published As
Publication number | Publication date |
---|---|
JP2005255945A (en) | 2005-09-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4638679B2 (en) | Gas hydrate production equipment | |
JP4355600B2 (en) | Method and apparatus for manufacturing gas hydrate | |
EP0630683A1 (en) | Method and apparatus for treating or ultilizing a hot gas flow | |
CN104390439A (en) | Drying device for chemical raw materials and medicine | |
CN205099601U (en) | System for hydrogenation device and production hydrogen peroxide | |
JPH10182587A (en) | Improved synthesis of urea and apparatus therefor | |
KR101458500B1 (en) | Manufacture of high-strength, low-salt sodium hypochlorite bleach | |
CN108602763A (en) | The combination unit of urea synthesis | |
JP4303666B2 (en) | Fluidized bed reactor for gas hydrate slurry | |
CN1039593C (en) | Calcining system and technique for fluidized bed-mobile bed mixed reactor | |
CN109140905B (en) | Drying device and drying method for vibrating fluidized bed | |
CN206843088U (en) | Magnesium desulfurization byproduct refines the processing system of epsom salt technique | |
KR101466671B1 (en) | Fluidized bed drying device with dehumidifying fluidizing-gas | |
CN1732276A (en) | Method and plant for the heat treatment of sulfidic ores using annular fluidized | |
CN105061344B (en) | A kind of melamine slow cooling crystallizes production method | |
JP2006096865A (en) | Apparatus for producing hydrate slurry and plant for producing hydrate | |
CN214552487U (en) | Benzoic acid forming process contains acid dust tail gas processing apparatus | |
CN101670261A (en) | Hydroxyhexyl sodium sulfonate synthesizing device | |
JP2003104949A (en) | Method for synthesizing urea | |
CN206910989U (en) | A kind of Fischer Tropsch waxes tank discharges Flash Gas Compression Skid System | |
JP4724418B2 (en) | System unit for removing carbon dioxide from methanol | |
JP2007217585A (en) | Gas hydrate production apparatus | |
CN111606589A (en) | Method and equipment for producing building gypsum powder from industrial by-product gypsum | |
CN205462118U (en) | Produce device of granular lithium chloride | |
WO2007110919A1 (en) | Fluidized-bed gas hydrate generator and method of generating gas hydrate |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060322 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20090810 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090818 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091016 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20101102 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20101126 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131203 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20141203 Year of fee payment: 4 |
|
LAPS | Cancellation because of no payment of annual fees |