JP4574261B2 - 半導体装置の作製方法 - Google Patents
半導体装置の作製方法 Download PDFInfo
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- JP4574261B2 JP4574261B2 JP2004210815A JP2004210815A JP4574261B2 JP 4574261 B2 JP4574261 B2 JP 4574261B2 JP 2004210815 A JP2004210815 A JP 2004210815A JP 2004210815 A JP2004210815 A JP 2004210815A JP 4574261 B2 JP4574261 B2 JP 4574261B2
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- semiconductor
- electrode
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Description
を形成し加熱して、触媒元素を結晶性半導体膜から除去した後、逆スタガ型TFTを形成することを要旨とする。なお、該結晶性半導体膜に5族元素(15族元素)を有する半導
体膜を形成した場合、5族元素(15族元素)を有する半導体膜をソース領域及びドレイ
ン領域として用いて、nチャネル型TFTを形成する。また、5族元素(15族元素)を
有する半導体膜に3族元素(13族元素)を添加して、pチャネル型TFTを形成する。
さらには、希ガス元素を有する半導体膜を形成した場合、加熱の後に希ガス元素を有する半導体膜を除去し、ソース領域及びドレイン領域を形成して、nチャネル型TFT又はpチャネル型TFTを形成する。
本実施形態においては、結晶性半導体膜を有する逆スタガ型TFTの作製工程を図1を用いて説明する。
示す。)が含まれる第2の半導体膜112を形成する。珪化物気体にリン、ヒ素のようなドナー型元素を有する気体を加えたプラズマCVD法で成膜してもよい。このような手法により第2の半導体膜を形成することで、第1の結晶性半導体膜と第2の半導体膜との界面が形成される。また、ドナー型元素が含まれる第2の半導体膜112としては、第1の半導体膜と同様の半導体膜を形成した後、ドナー型元素をイオンドープ法又はイオン注入法により添加して形成することができる。このときの、第2の半導体膜112では、リンの濃度が1×1019〜3×1021/cm3であることが好ましい。
本実施形態では、ドナー型元素を有する半導体膜の代わりに、希ガス元素を有する半導体膜を用いて触媒元素をゲッタリングしてTFTを形成する工程について、図2を用いて説明する。
実施形態1と同様の工程により、第1の半導体領域をエッチングしてソース領域及びドレイン領域242、及びチャネル形成領域として機能する第3の半導体領域241を形成することができる。
本実施形態では、nチャネルTFTとpチャネルTFTとを同一基板に形成する工程を図3を用いて形成する。
ー元素と示す。)を添加し、p型不純物領域324を形成する。このとき第1のマスク322に覆われる領域は、n型不純物領域325として残存する。
本実施形態では、実施形態3と異なるゲッタリング工程により形成された結晶性半導体膜を有するnチャネル型TFT及びpチャネル型の作製工程について、図4を用いて説明する。
本実施形態においては、実施形態2を用いてゲッタリング工程を行った結晶性半導体膜を用いてnチャネルTFTとpチャネルTFTとを同一基板に形成する工程を図5を用いて形成する。
本実施形態では実施形態3の変形例を用いて、nチャネルTFTとpチャネルTFTとを同一基板に形成する工程を、図6を用いて形成する。
本実施形態では、上記実施形態において、ゲート電極とソース電極及びドレイン電極との端部の位置関係、即ちゲート電極の幅とチャネル長の大きさの関係について、図7及び図8を用いて説明する。
上記実施形態1乃至3、及び6において、ドナー型元素が含まれる半導体膜を、図25に示すように、低濃度のドナー型元素が含まれる半導体膜145、及び高濃度のドナー型元素が含まれる半導体膜142の2層構造としても良い。このような積層構造にすることにより、図25に示すように、LDD領域145を有するTFTを形成することが可能となる。この結果、電界の緩和効果が大きくなり、ホットキャリア耐性を高めたTFTを形成することが可能となる。
上記実施形態において、チャネル形成領域表面に対して垂直な端部を有するソース電極及びドレイン電極を示したが、この構造に限定されない。図26(A)に示すように、チャネル形成領域表面に対して90度より大きく、180度未満、好ましくは95〜135度を有する端部であってもよい。また、ソース電極とチャネル形成領域表面との角度をθ1、ドレイン電極とチャネル形成領域表面との角度をθ2とすると、θ1とθ2が等しくてもよい。また、異なっていてもよい。このような形状のソース電極及びドレイン電極は、ドライエッチング法により形成することが可能である。
本実施形態では、上記実施形態に適応可能な半導体膜の結晶化工程を図27及び図28を用いて説明する。図27(A)に示すように半導体膜106上に絶縁膜で形成されるマスク2701を形成し、選択的に触媒元素層2705を形成して、半導体膜の結晶化を行っても良い。半導体膜を加熱すると、図27(B)の矢印で示すように、触媒元素層と半導体膜との接触部分から、基板の表面に平行な方向へ結晶成長が発生する。なお、触媒元素層2705から、かなり離れた部分では結晶化は行われず、非晶質部分が残存する。
横成長により大粒径の結晶粒を形成することができるため、より高い移動度を有するTFTを形成することができる。
Claims (6)
- 基板上にゲート電極を形成し、
前記ゲート電極上にゲート絶縁膜を形成し、
前記ゲート絶縁膜上に第1の半導体膜を形成し、
前記第1の半導体膜に触媒元素を添加した後に加熱して、第1の結晶性半導体膜を形成し、
前記第1の結晶性半導体膜上に不純物元素を有する第2の半導体膜を形成した後、前記第1の結晶性半導体膜及び前記第2の半導体膜を加熱することにより、前記第1の結晶性半導体膜に含まれる前記触媒元素を前記第2の半導体膜に移動させるとともに、第2の結晶性半導体膜及び第3の結晶性半導体膜を形成し、
前記第2の結晶性半導体膜及び前記第3の結晶性半導体膜をエッチングして、第1の半導体領域及び第2の半導体領域を形成し、
前記第2の半導体領域に接するソース電極及びドレイン電極を形成し、
前記ソース電極及び前記ドレイン電極をマスクとして前記第2の半導体領域の露出部をエッチングして、ソース領域及びドレイン領域を形成することを特徴とする半導体装置の作製方法。 - 請求項1において、前記不純物元素はリン、窒素、ヒ素、アンチモン、ビスマスから選ばれた元素であることを特徴とする半導体装置の作製方法。
- 基板上にゲート電極を形成し、
前記ゲート電極上にゲート絶縁膜を形成し、
前記ゲート絶縁膜上に第1の半導体膜を形成し、
前記第1の半導体膜に触媒元素を添加した後に加熱して、第1の結晶性半導体膜を形成し、
前記第1の結晶性半導体膜上に希ガス元素を有する第2の半導体膜を形成した後、前記第1の結晶性半導体膜及び前記第2の半導体膜を加熱することにより、前記第1の結晶性半導体膜に含まれる前記触媒元素を前記第2の半導体膜に移動させるとともに、第2の結晶性半導体膜及び第3の結晶性半導体膜を形成し、
前記第3の結晶性半導体膜を除去し、
前記第2の結晶性半導体膜上に導電性を有する第3の半導体膜を形成し、
前記第2の結晶性半導体膜及び前記第3の半導体膜をエッチングして、第1の半導体領域及び第2の半導体領域を形成し、
前記第2の半導体領域に接するソース電極及びドレイン電極を形成し、
前記ソース電極及び前記ドレイン電極をマスクとして前記第2の半導体領域の露出部をエッチングして、ソース領域及びドレイン領域を形成することを特徴とする半導体装置の作製方法。 - 請求項3において、前記導電性を有する第3の半導体膜は、13族元素または15族元素を含むことを特徴とする半導体装置の作製方法。
- 請求項3または4において、前記希ガス元素は、He、Ne、Ar、Kr、Xeから選ばれた一種または複数種であることを特徴とする半導体装置の作製方法。
- 請求項1乃至5のいずれか一において、前記触媒元素は、タングステン、モリブデン、ジルコニウム、ハフニウム、バナジウム、ニオブ、タンタル、クロム、コバルト、ニッケル、及び白金から選ばれる一つ又は複数であることを特徴とする半導体装置の作製方法。
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JPH114001A (ja) * | 1997-06-11 | 1999-01-06 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
JPH11103068A (ja) * | 1997-09-29 | 1999-04-13 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
JP2002324808A (ja) * | 2001-01-19 | 2002-11-08 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
JP2004047514A (ja) * | 2002-07-08 | 2004-02-12 | Semiconductor Energy Lab Co Ltd | 半導体装置及びその作製方法並びに半導体製造装置 |
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JPH11103068A (ja) * | 1997-09-29 | 1999-04-13 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
JP2002324808A (ja) * | 2001-01-19 | 2002-11-08 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
JP2004047514A (ja) * | 2002-07-08 | 2004-02-12 | Semiconductor Energy Lab Co Ltd | 半導体装置及びその作製方法並びに半導体製造装置 |
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