JP4508738B2 - 熱安定化装置 - Google Patents
熱安定化装置 Download PDFInfo
- Publication number
- JP4508738B2 JP4508738B2 JP2004179608A JP2004179608A JP4508738B2 JP 4508738 B2 JP4508738 B2 JP 4508738B2 JP 2004179608 A JP2004179608 A JP 2004179608A JP 2004179608 A JP2004179608 A JP 2004179608A JP 4508738 B2 JP4508738 B2 JP 4508738B2
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- JP
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- Prior art keywords
- ultraviolet
- stage
- opening
- ultraviolet lamp
- processing
- Prior art date
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- Expired - Fee Related
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- 239000012760 heat stabilizer Substances 0.000 title description 2
- 239000000758 substrate Substances 0.000 claims description 26
- 230000006641 stabilisation Effects 0.000 claims description 18
- 238000011105 stabilization Methods 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 9
- 238000001514 detection method Methods 0.000 claims description 5
- 230000006866 deterioration Effects 0.000 claims description 3
- 238000011109 contamination Methods 0.000 claims description 2
- 238000007747 plating Methods 0.000 description 6
- 230000003028 elevating effect Effects 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000010926 purge Methods 0.000 description 3
- 230000000087 stabilizing effect Effects 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
即ち、熱安定化装置は高温下で使用されるため、紫外線ランプの劣化が早く、この劣化は徐々に起こるため、ランプの交換時期の見極めが遅れると、耐熱性に優れた被膜が得られず、交換が早いとコスト的に不利が生じ、更に処理空間内における反応によって紫外線が透過する透明板の内面が汚れ、紫外線が劣化していないにも拘らず、紫外線強度が不足することがある。
真空引き用の通路5はチューブ7を介して図示しない真空源(真空ポンプ)に接続され、パージ用の通路6には不活性ガス供給配管8が接続されている。
Claims (1)
- 少なくとも一部を透明板とした蓋体でテーブルに形成した開口部の上面が閉塞され、前記開口部に処理基板を載置したステージを下方から臨ませ、ステージに設けた加熱部材で処理基板を加熱し、また蓋体上方に配置した紫外線ランプから紫外線を照射しつつ、前記ステージ上面と蓋体下面と開口部側面とで形成される処理空間内で処理基板を減圧処理する熱安定化装置において、前記紫外線ランプはテーブルに対し昇降可能とされた保持部に取り付けられ、また前記処理空間内の紫外線照度を検出するセンサと、前記紫外線ランプのハウジング内側に紫外線照度を検出するセンサとを備え、これらセンサの検出値に基づいて、紫外線ランプの劣化および処理空間内の汚れを判断することを特徴とする熱安定化装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004179608A JP4508738B2 (ja) | 2004-06-17 | 2004-06-17 | 熱安定化装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004179608A JP4508738B2 (ja) | 2004-06-17 | 2004-06-17 | 熱安定化装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006003608A JP2006003608A (ja) | 2006-01-05 |
JP4508738B2 true JP4508738B2 (ja) | 2010-07-21 |
Family
ID=35772047
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004179608A Expired - Fee Related JP4508738B2 (ja) | 2004-06-17 | 2004-06-17 | 熱安定化装置 |
Country Status (1)
Country | Link |
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JP (1) | JP4508738B2 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8398816B1 (en) | 2006-03-28 | 2013-03-19 | Novellus Systems, Inc. | Method and apparatuses for reducing porogen accumulation from a UV-cure chamber |
KR102055014B1 (ko) * | 2011-03-23 | 2020-01-22 | 노벨러스 시스템즈, 인코포레이티드 | 자외선 경화 툴의 동-위치 자외선 강도 측정 |
JP6596257B2 (ja) * | 2015-08-03 | 2019-10-23 | 東京応化工業株式会社 | 紫外線照射装置及び紫外線照射方法 |
US10388546B2 (en) | 2015-11-16 | 2019-08-20 | Lam Research Corporation | Apparatus for UV flowable dielectric |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63248710A (ja) * | 1987-04-06 | 1988-10-17 | Tokyo Ohka Kogyo Co Ltd | シリコン酸化膜の形成方法及び装置 |
JPS63260028A (ja) * | 1986-11-19 | 1988-10-27 | Tokyo Ohka Kogyo Co Ltd | ホトレジストの熱安定化装置 |
JPH06104169A (ja) * | 1992-09-21 | 1994-04-15 | Fujitsu Ltd | 半導体製造装置 |
JP2004073981A (ja) * | 2002-08-15 | 2004-03-11 | Tokyo Ohka Kogyo Co Ltd | 熱安定化装置の内部洗浄方法 |
-
2004
- 2004-06-17 JP JP2004179608A patent/JP4508738B2/ja not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63260028A (ja) * | 1986-11-19 | 1988-10-27 | Tokyo Ohka Kogyo Co Ltd | ホトレジストの熱安定化装置 |
JPS63248710A (ja) * | 1987-04-06 | 1988-10-17 | Tokyo Ohka Kogyo Co Ltd | シリコン酸化膜の形成方法及び装置 |
JPH06104169A (ja) * | 1992-09-21 | 1994-04-15 | Fujitsu Ltd | 半導体製造装置 |
JP2004073981A (ja) * | 2002-08-15 | 2004-03-11 | Tokyo Ohka Kogyo Co Ltd | 熱安定化装置の内部洗浄方法 |
Also Published As
Publication number | Publication date |
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JP2006003608A (ja) | 2006-01-05 |
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