JP4438932B2 - Disinfectant vaporizer - Google Patents

Disinfectant vaporizer Download PDF

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JP4438932B2
JP4438932B2 JP2003298149A JP2003298149A JP4438932B2 JP 4438932 B2 JP4438932 B2 JP 4438932B2 JP 2003298149 A JP2003298149 A JP 2003298149A JP 2003298149 A JP2003298149 A JP 2003298149A JP 4438932 B2 JP4438932 B2 JP 4438932B2
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heating surface
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sterilizing liquid
dropping
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正一 稲葉
和美 大山
和之 黒澤
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Toyo Seikan Kaisha Ltd
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本発明は、殺菌液の気化ガスを食品容器等の殺菌対象物の表面で凝縮させて殺菌を行う際に用いられる殺菌液の気化装置に関する。   The present invention relates to an apparatus for vaporizing a sterilizing liquid used when sterilizing by condensing a vaporized gas of a sterilizing liquid on the surface of an object to be sterilized such as a food container.

食品容器等の殺菌対象物を過酢酸溶液や過酸化水素溶液等の殺菌液を用いて殺菌する方法として、殺菌液の気化ガスを殺菌対象物の表面に凝着させた後、熱風等によって乾燥させることによって行うものが知られている。この方法は、殺菌対象物を殺菌液中に浸漬したり殺菌対象物に殺菌液を噴霧して乾燥させる方法に比較して、形状が複雑な殺菌対象物であっても殺菌液を均一に塗布することができると共に乾燥も速く、殺菌液の使用量も少量で済むという優れた特徴を有する。   As a method of sterilizing food objects such as food containers using a sterilizing solution such as peracetic acid solution or hydrogen peroxide solution, the vaporized gas of the sterilizing solution is adhered to the surface of the sterilized material and then dried with hot air or the like What is done by doing is known. Compared with the method of immersing the sterilization object in the sterilization liquid or spraying the sterilization liquid on the sterilization liquid and drying it, the sterilization liquid is uniformly applied even if the sterilization target has a complicated shape. In addition, it has excellent characteristics that it can be dried quickly and the amount of sterilizing solution used is small.

このような方法において殺菌液を気化させる気化装置として、特許文献１に開示のごときものがある。   As a vaporizer for vaporizing a sterilizing liquid in such a method, there is one disclosed in Patent Document 1.

これは、図４に概念図を示すように、下側に熱源４１Ｃによって加熱される伝熱体４１Ａを備えると共に上側に滴下ノズル４１Ｂを備えるチャンバー４１に、搬送空気供給パイプ４２と誘導管４３が接続されて構成されており、薬液タンク４４内の殺菌液をポンプ４５によって滴下ノズル４１Ｂに供給し、殺菌液を滴下ノズル４１Ｂから伝熱体４１Ａの表面（蒸発面）に滴下させて蒸発気化させ、その気化ガスを搬送空気供給パイプ４２から供給される搬送空気によって誘導管４３を介して殺菌対象物に搬送するようになっているものである。
特公平５−６６１４２号公報 As shown in the conceptual diagram of FIG. 4, a carrier air supply pipe 42 and a guide pipe 43 are provided in a chamber 41 having a heat transfer body 41 </ b> A heated by a heat source 41 </ b> C on the lower side and a dropping nozzle 41 </ b> B on the upper side. The sterilizing liquid in the chemical tank 44 is supplied to the dropping nozzle 41B by the pump 45, and the sterilizing liquid is dropped from the dropping nozzle 41B onto the surface (evaporation surface) of the heat transfer body 41A to be evaporated. The vaporized gas is conveyed to the object to be sterilized via the induction pipe 43 by the carrier air supplied from the carrier air supply pipe 42.
Japanese Patent Publication No. 5-66142

しかしながら、上記従来の構成の気化装置では、平坦で水平な伝熱体の上面に、固定された滴下ノズルから殺菌液の滴を落下供給するものであるため、常に伝熱体の同一位置に殺菌液が滴下されることとなり、その殺菌液の滴下部位の温度が気化熱によって局部的に低下して気化効率が悪化する。   However, in the vaporizer having the above-described conventional configuration, the sterilizing liquid droplet is dropped and supplied from the fixed dropping nozzle onto the upper surface of the flat and horizontal heat transfer body, so that the sterilization is always performed at the same position of the heat transfer body. A liquid will be dripped, the temperature of the dripping site | part of the disinfection liquid will fall locally by heat of vaporization, and vaporization efficiency will deteriorate.

また、伝熱体は温度センサ等の温度検知手段からの温度情報に基づいてフィードバック制御されて所定の温度を維持するように構成されるが、局部的な温度低下に対しては応答遅れによって温度変化の振幅が大きくなり、この温度変化に対応して気化量も変化するために気化量が安定しない。   In addition, the heat transfer body is feedback-controlled based on temperature information from a temperature detection means such as a temperature sensor, and is configured to maintain a predetermined temperature. Since the amplitude of the change becomes large and the vaporization amount also changes in response to this temperature change, the vaporization amount is not stable.

つまり、気化効率が悪く気化量が不安定であるという問題を有するものである。その結果、殺菌液の気化ガスの濃度が変化することとなって、安定した殺菌能力が得られない。   That is, there is a problem that the vaporization efficiency is poor and the vaporization amount is unstable. As a result, the concentration of the vaporized gas in the sterilizing liquid changes, and a stable sterilizing ability cannot be obtained.

本発明は、上記問題に鑑みてなされたものであって、殺菌液を効率良く安定して気化することのできる殺菌液の気化装置を提供することを目的とする。   This invention is made | formed in view of the said problem, Comprising: It aims at providing the vaporizer of the sterilization liquid which can vaporize a sterilization liquid efficiently and stably.

上記目的を達成する請求項１に係る発明の殺菌液の気化装置は、加熱面に滴下ノズルから殺菌液を滴下して殺菌液を蒸発気化させる気化装置において、
前記加熱面は、水平から所定角度で傾斜して配設され、前記加熱面の前記滴下ノズルからの殺菌液の滴下部位には液溜りが形成されるとともに、前記加熱面には、前記滴下ノズルから滴下された殺菌液を拡散流下させる拡散案内手段が設けられており、前記滴下ノズルから滴下された殺菌液が前記液溜りに留まった後前記拡散案内手段により前記加熱面に拡散して前記加熱面を流下しつつ蒸発気化するように構成されており、前記拡散案内手段は、前記滴下ノズルからの殺菌液の滴下部位から前記加熱面の上流部位に至る凹溝が、前記滴下部位を中心として複数放射状に形成されて構成されていることを特徴とする。 The vaporizer for sterilizing liquid of the invention according to claim 1 that achieves the above object is a vaporizing apparatus that evaporates the sterilizing liquid by dropping the sterilizing liquid from a dropping nozzle onto a heating surface.
The heating surface is disposed to be inclined at a predetermined angle from the horizontal, said the dropping portion of the sterilizing liquid from the dropping nozzle of the heating surface puddle is formed Rutotomoni, on the heating surface, the dropping nozzle Diffusion guide means for diffusing and flowing down the sterilizing liquid dropped from the dropping nozzle, the sterilizing liquid dropped from the dropping nozzle stays in the liquid reservoir, and then diffuses to the heating surface by the diffusion guiding means. The diffusion guide means is configured such that a concave groove extending from the dropping portion of the sterilizing liquid from the dropping nozzle to the upstream portion of the heating surface is centered on the dropping portion. A plurality of radial shapes are formed .

この構成によれば、殺菌液は加熱面を流下して広がり、広い範囲で加熱されて気化する。従って、滴下量を一定として加熱面が平坦な場合と比較すると単位面積当たりの気化量は少なくなり、加熱面の局部的な温度低下が小さく従って温度変化も小さくなる。また滴下ノズルから滴下された殺菌液は液溜りに留まった後に分散して広い範囲に流下しつつ気化する。また殺菌液は拡散案内手段によって案内されて拡散案内手段の各凹溝に沿って放射状に加熱面に拡散して流下しつつ気化する。 According to this configuration, the sterilizing liquid spreads down the heating surface and is heated and vaporized in a wide range. Therefore, the amount of vaporization per unit area is smaller than when the heating surface is flat with a constant amount of dripping, the local temperature drop on the heating surface is small, and the temperature change is also small. The sterilizing liquid dropped from the dropping nozzle is dispersed in the liquid pool and then vaporized while flowing down to a wide range. Further, the sterilizing liquid is guided by the diffusion guide means and is vaporized while diffusing and flowing down the heating surface radially along the respective concave grooves of the diffusion guide means.

また、請求項２に係る発明の殺菌液の気化装置は、前記加熱面は略円錐状であって前記滴下ノズルはその頂点部位に殺菌液を滴下するように配設されていることを特徴とする。   Further, in the sterilizing liquid vaporizing apparatus according to claim 2, the heating surface is substantially conical, and the dropping nozzle is disposed so as to drop the sterilizing liquid at the apex portion. To do.

この構成により、殺菌液は略円錐状の周囲に広く拡散して流下し、広い範囲で加熱されて気化する。   With this configuration, the sterilizing liquid diffuses and flows down around a substantially conical shape, and is heated and vaporized in a wide range.

また請求項３に係る発明による殺菌液の気化装置は、前記拡散案内手段は、前記液溜りに接続して液溜りの周方向に等角度間隔で設けられていることを特徴とする。According to a third aspect of the present invention, there is provided the sterilizing liquid vaporizing apparatus, wherein the diffusion guide means is connected to the liquid reservoir and provided at equiangular intervals in the circumferential direction of the liquid reservoir.

請求項１に係る発明によれば、前記滴下ノズルから滴下された殺菌液は加熱面の傾斜に沿って流下しつつ広い範囲で加熱されて蒸発気化するため、加熱面の局部的な温度低下が小さい。従って、温度変化も小さく、殺菌液を効率良く安定して気化させることができる。その結果、一定濃度の殺菌液の気化ガスを安定して生成することができ、これを用いることで安定した殺菌能力の殺菌装置を構成できるものである。また滴下ノズルから滴下された殺菌液は液溜りに留まった後に分散して広い範囲に流下するため、より広い範囲で加熱されて蒸発気化し、より一層加熱面の局部的な温度低下及び温度変化が少なく、殺菌液を効率良く安定して気化できる。また殺菌液は拡散案内手段によって案内されて加熱面に拡散して流下しつつ気化するため、加熱面の局部的な温度低下がなく、殺菌液を効率良く安定して気化できる。また滴下ノズルから滴下された殺菌液は各凹溝に沿って放射状に拡散した後、更に加熱面を拡散して流下し、より広く均等に拡散して気化する。このため、殺菌液を効率良く安定して気化できるものである。 According to the first aspect of the present invention, since the sterilizing liquid dropped from the dropping nozzle is heated in a wide range while flowing down along the inclination of the heating surface, and evaporates, the local temperature decrease of the heating surface is caused. small. Therefore, the temperature change is small and the sterilizing liquid can be efficiently and stably vaporized. As a result, the vaporized gas of the sterilizing liquid having a constant concentration can be stably generated, and by using this, a sterilizing apparatus having a stable sterilizing ability can be configured. In addition, the sterilizing solution dropped from the dropping nozzle stays in the liquid pool and then disperses and flows down to a wide range. Therefore, the sterilizing solution is heated in a wider range to evaporate, and the temperature of the heating surface is further decreased locally and the temperature changes. The sterilizing solution can be efficiently and stably vaporized. Further, since the sterilizing liquid is guided by the diffusion guide means and diffuses and flows down to the heating surface and vaporizes, there is no local temperature drop on the heating surface, and the sterilizing liquid can be efficiently and stably vaporized. The sterilizing liquid dropped from the dropping nozzle diffuses radially along each concave groove, and then further diffuses and flows down the heating surface, and diffuses and vaporizes more widely. Therefore, the sterilizing liquid can be efficiently and stably vaporized.

また、請求項２に係る発明によれば、滴下ノズルから滴下された殺菌液は略円錐状の熱面の周囲に広く拡散して流下しつつ加熱されて蒸発気化する。このため、加熱面の局部的な温度低下及び温度変化が極めて少なく、殺菌液を効率良く安定して気化できる。   According to the second aspect of the present invention, the sterilizing liquid dropped from the dropping nozzle diffuses and flows down around the substantially conical hot surface and is evaporated and evaporated. For this reason, the local temperature drop and temperature change of the heating surface are extremely small, and the sterilizing liquid can be efficiently and stably vaporized.

また、請求項３に係る発明によれば、滴下ノズルから滴下された殺菌液は液溜りに留まった後に分散して広い範囲に流下するため、より広い範囲で加熱されて蒸発気化し、より一層加熱面の局部的な温度低下及び温度変化が少なく、殺菌液を効率良く安定して気化できる。   According to the invention of claim 3, since the sterilizing liquid dropped from the dropping nozzle stays in the liquid reservoir and then disperses and flows down to a wide range, it is heated in a wider range to be evaporated and evaporated. There is little local temperature drop and temperature change on the heating surface, and the sterilizing liquid can be efficiently and stably vaporized.

以下、添付図面を参照して本発明を実施するための最良の形態について説明する。
図１は本発明に係る殺菌液気化装置の一構成例の平面図，図２はそのＡ−Ａ断面図である。 The best mode for carrying out the present invention will be described below with reference to the accompanying drawings.
FIG. 1 is a plan view of a configuration example of a sterilizing liquid vaporizer according to the present invention, and FIG.

図示殺菌液気化装置１は、殺菌液として過酸化水素溶液（例えば過酸化水素３５％溶液）を用い、その気化ガスを食品容器に凝着させて殺菌する殺菌装置の一部を構成するものであり、気化装置１０と、この気化装置１０に過酸化水素溶液を供給する供給装置３０とから構成され、供給装置３０から供給される過酸化水素溶液を気化装置１０によって蒸発気化させて過酸化水素ガスを生成するものである。   The illustrated sterilizing liquid vaporizer 1 constitutes a part of a sterilizing apparatus that uses a hydrogen peroxide solution (for example, a 35% hydrogen peroxide solution) as a sterilizing liquid and sterilizes the vaporized gas by adhering it to a food container. A vaporizer 10 and a supply device 30 for supplying a hydrogen peroxide solution to the vaporizer 10. The hydrogen peroxide solution supplied from the supply device 30 is evaporated and evaporated by the vaporizer 10. It produces gas.

気化装置１０は、加熱装置１２の熱板２０を底板としてその上側を外板で囲って所定容量の略立方体状の密閉されたチャンバー１１が構築され、このチャンバー１１の上面に、搬送エア管路１３と、誘導管路１４と、滴下ノズル１５が設けられて構成されている。   In the vaporizer 10, a substantially cubic sealed chamber 11 having a predetermined capacity is constructed with the hot plate 20 of the heating device 12 as a bottom plate and the upper side thereof surrounded by an outer plate, and a carrier air line is formed on the upper surface of the chamber 11 13, a guide line 14, and a dropping nozzle 15 are provided.

加熱装置１２は、所定厚さの円盤状でその上面が加熱面２１として形成されたステンレス鋼製の熱板２０の内部に、複数の電熱体２４が挿置されると共に温度センサ２５が設けられて構成されており、温度センサ２５による温度検知情報に基づいて電熱体２４への通電がフィードバック制御されて加熱面１２が所定一定温度（例えば２００゜Ｃ）に加熱制御されるようになっている。   The heating device 12 includes a plurality of electric heating elements 24 and a temperature sensor 25 in a hot plate 20 made of stainless steel having a disk shape with a predetermined thickness and an upper surface formed as a heating surface 21. The heating surface 12 is controlled to be heated to a predetermined constant temperature (for example, 200 ° C.) by feedback control of energization to the electric heating body 24 based on temperature detection information by the temperature sensor 25. .

搬送エア管路１３の他端は図示しない搬送エア供給装置に接続され、また、誘導管路１４の他端は図示しない凝着装置に接続されている。   The other end of the carrier air conduit 13 is connected to a carrier air supply device (not shown), and the other end of the guide conduit 14 is connected to an adhesion device (not shown).

滴下ノズル１５は、先端が熱板２０（加熱面２１）の中央上側所定間隔に位置して配設され、薬液供給管路１６を介して供給装置３０に接続されている。   The dripping nozzle 15 is disposed such that its tip is located at a predetermined distance above the center of the hot plate 20 (heating surface 21), and is connected to the supply device 30 via the chemical solution supply line 16.

供給装置３０は、貯槽３１の上部に定量ポンプ３２を備えて構成され、貯槽３１に収容された過酸化水素溶液を定量ポンプ３２によって所定流量（例えば３〜５ｃｃ／ｍｉｎ）で薬液供給路１６を介して気化装置１０（滴下ノズル１５）に圧送するようになっている。   The supply device 30 is configured to include a metering pump 32 in the upper part of the storage tank 31, and the hydrogen peroxide solution stored in the storage tank 31 is passed through the chemical solution supply path 16 at a predetermined flow rate (for example, 3 to 5 cc / min) by the metering pump 32. Via the vaporizer 10 (dropping nozzle 15).

そして、殺菌液気化装置１は、供給装置３０から供給される過酸化水素溶液を、所定温度に加熱された気化装置１０の加熱面２１に滴下ノズル１５から所定流量で滴下し、蒸発気化させて過酸化水素ガスを生成する。この過酸化水素ガスは搬送エア管路１３からチャンバー１１内に供給される乾燥空気によって誘導管路１４を介して凝着装置に搬送されるものである。   The sterilizing liquid vaporizer 1 drops the hydrogen peroxide solution supplied from the supply device 30 at a predetermined flow rate from the dropping nozzle 15 onto the heating surface 21 of the vaporizer 10 heated to a predetermined temperature to evaporate it. Generate hydrogen peroxide gas. This hydrogen peroxide gas is transported to the adhesion device via the induction conduit 14 by dry air supplied into the chamber 11 from the transport air conduit 13.

ここで、加熱装置１２の熱板２０は、図２のＢ−Ｂ断面図である図３（Ａ）及び斜視図である（Ｂ）に示すように、その加熱面２１が所定勾配（例えば頂角１５０゜）の円錐状となっており、その中央頂部に液溜り２２が形成されると共に、この液溜り２２を中心として拡散案内手段としての案内溝２３が放射状に設けられている。   Here, the heating plate 20 of the heating device 12 has a heating surface 21 having a predetermined gradient (for example, a peak) as shown in FIG. 3A which is a BB cross-sectional view of FIG. 2 and FIG. The liquid reservoir 22 is formed at the central top of the conical shape, and guide grooves 23 serving as diffusion guide means are provided radially around the liquid reservoir 22.

液溜り２２は所定直径で所定深さの逆円錐状の凹部で、案内溝２３は所定幅のスリット状でその底部は液溜り２２の最深部から水平に形成され、周方向に等角度間隔で８条（即ち４５゜間隔で）設けられている。尚、液溜り２２は殺菌液を一旦保持することができれば、凹状に限らず平坦であっても良い。   The liquid reservoir 22 is an inverted conical recess having a predetermined diameter and a predetermined depth, the guide groove 23 is a slit having a predetermined width, and its bottom is formed horizontally from the deepest portion of the liquid reservoir 22 and is equiangularly spaced in the circumferential direction. There are 8 strips (ie at 45 ° intervals). The liquid reservoir 22 is not limited to the concave shape and may be flat as long as it can once hold the sterilizing liquid.

滴下ノズル１５は前述のごとくその先端を加熱面２１の中央上側として配設されており、従って、過酸化水素溶液はその液溜り２２に滴下されるようになっている。液溜り２２を設けることによって、滴下ノズル１５を円錐形状加熱面２１の正確な中央上側に位置づけなくても済む。   As described above, the dripping nozzle 15 has its tip disposed on the center upper side of the heating surface 21, so that the hydrogen peroxide solution is dripped into the liquid reservoir 22. By providing the liquid reservoir 22, the dripping nozzle 15 does not have to be positioned at the exact upper center of the conical heating surface 21.

このような構成の加熱装置１２によれば、熱板２０の液溜り２２に滴下ノズル１５から滴下された過酸化水素溶液は、液溜り２２から案内溝２３に沿って八方周囲に分散して案内溝２３の外端から加熱面２１を拡散しつつ流下する。その結果、過酸化水素溶液は加熱面２１の広い範囲に拡がって加熱されるため、滴下量を一定として加熱面２１が平坦な場合と比較すると単位面積当たりの気化量は少なくなって加熱面２１の局部的な温度低下を招くことなく蒸発気化する。これにより、加熱面２１の温度変化を小さく抑制することができ、過酸化水素ガスを効率良く安定して発生することができるものである。従って、一定濃度の殺菌液の気化ガスを安定して凝着装置に供給することができ、これを用いることで安定した殺菌能力の殺菌装置を構成できるものである。   According to the heating device 12 having such a configuration, the hydrogen peroxide solution dropped from the dropping nozzle 15 into the liquid reservoir 22 of the hot plate 20 is dispersed and guided around the all sides along the guide groove 23 from the liquid reservoir 22. The heating surface 21 flows down from the outer end of the groove 23 while diffusing. As a result, the hydrogen peroxide solution spreads over the wide area of the heating surface 21 and is heated, so that the amount of vaporization per unit area is reduced compared to the case where the heating surface 21 is flat with a constant amount of dripping. It evaporates without incurring a local temperature drop. Thereby, the temperature change of the heating surface 21 can be suppressed small, and hydrogen peroxide gas can be generated efficiently and stably. Therefore, the vaporized gas of the sterilizing liquid having a constant concentration can be stably supplied to the adhesion apparatus, and by using this, a sterilizing apparatus having a stable sterilizing ability can be configured.

尚、加熱面２１の形状は、上記構成例に限定されるものではなく、例えば、一方に傾斜する平面としてその上部に殺菌液を滴下するように構成しても良く、傾斜面の勾配の大きさも殺菌液の滴下流量などの条件に応じて最適な値を選択できる。また、上記構成例における案内溝２３の数や形状及び深さ等も適宜変更可能なものであり、更に、殺菌液の流下を案内する案内手段は溝に限らず凸状としても良いものである。   The shape of the heating surface 21 is not limited to the above configuration example. For example, the heating surface 21 may be configured such that the sterilizing liquid is dropped on the top as a flat surface inclined to one side, and the gradient of the inclined surface is large. In addition, an optimum value can be selected according to conditions such as the dropping flow rate of the sterilizing liquid. Further, the number, shape, depth, and the like of the guide grooves 23 in the above configuration example can be changed as appropriate, and the guide means for guiding the flow of the sterilizing liquid is not limited to the grooves but may be convex. .

本発明に係る殺菌液気化装置の一構成例の平面図である。It is a top view of the example of 1 composition of the sterilization liquid vaporizer concerning the present invention. 図１のＡ−Ａ断面図である。It is AA sectional drawing of FIG. 図２のＢ−Ｂ断面図である。It is BB sectional drawing of FIG. 従来例としての気化装置の概念図である。It is a conceptual diagram of the vaporization apparatus as a prior art example.

符号の説明Explanation of symbols

１０ 気化装置
１２ 加熱装置
１５ 滴下ノズル
２１ 加熱面
２２ 液溜り
２３ 案内溝（拡散案内手段）

DESCRIPTION OF SYMBOLS 10 Vaporizer 12 Heating device 15 Dripping nozzle 21 Heating surface 22 Liquid reservoir 23 Guide groove (diffusion guide means)

Claims (3)

加熱面に滴下ノズルから殺菌液を滴下して殺菌液を蒸発気化させる気化装置において、
前記加熱面は、水平から所定角度で傾斜して配設され、前記加熱面の前記滴下ノズルからの殺菌液の滴下部位には液溜りが形成されるとともに、前記加熱面には、前記滴下ノズルから滴下された殺菌液を拡散流下させる拡散案内手段が設けられており、前記滴下ノズルから滴下された殺菌液が前記液溜りに留まった後前記拡散案内手段により前記加熱面に拡散して前記加熱面を流下しつつ蒸発気化するように構成されており、前記拡散案内手段は、前記滴下ノズルからの殺菌液の滴下部位から前記加熱面の上流部位に至る凹溝が、前記滴下部位を中心として複数放射状に形成されて構成されていることを特徴とする殺菌液の気化装置。 In the vaporizer that evaporates the sterilizing liquid by dropping the sterilizing liquid from the dropping nozzle onto the heating surface,
The heating surface is disposed to be inclined at a predetermined angle from the horizontal, said the dropping portion of the sterilizing liquid from the dropping nozzle of the heating surface puddle is formed Rutotomoni, on the heating surface, the dropping nozzle Diffusion guide means for diffusing and flowing down the sterilizing liquid dropped from the dropping nozzle, the sterilizing liquid dropped from the dropping nozzle stays in the liquid reservoir, and then diffuses to the heating surface by the diffusion guiding means. The diffusion guide means is configured such that a concave groove extending from the dropping portion of the sterilizing liquid from the dropping nozzle to the upstream portion of the heating surface is centered on the dropping portion. A device for vaporizing a sterilizing liquid, characterized in that it is formed in a plurality of radial shapes. 前記加熱面は、略円錐状であって前記滴下ノズルはその頂点部位に殺菌液を滴下するように配設されていることを特徴とする請求項１に記載の殺菌液の気化装置。     2. The sterilizing liquid vaporizer according to claim 1, wherein the heating surface has a substantially conical shape, and the dropping nozzle is disposed so as to drop the sterilizing liquid at the apex portion thereof. 前記拡散案内手段は、前記液溜りに接続して液溜りの周方向に等角度間隔で設けられていることを特徴とする請求項１または２に記載の殺菌液の気化装置。 The diffusion guide means, sterilizing solution vaporizing apparatus according to claim 1 or 2, characterized in that provided at equal angular intervals in the circumferential direction of the liquid pool and connected to the liquid reservoir.
JP2003298149A 2003-08-22 2003-08-22 Disinfectant vaporizer Expired - Lifetime JP4438932B2 (en)

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US7713473B2 (en) * 2005-06-30 2010-05-11 Ethicon, Inc. Sterilization system and vaporizer therefor
DE102007034205A1 (en) * 2007-07-23 2009-01-29 Krones Ag Evaporator for sterilizing plastic containers
JP5856568B2 (en) * 2010-12-08 2016-02-10 四国化工機株式会社 Sterilizer gasifier
ITUB20152718A1 (en) * 2015-07-31 2017-01-31 Gea Procomac Spa STERILIZATION SYSTEM OF CONTAINERS
DE102016118475A1 (en) 2016-09-29 2018-03-29 Krones Ag Apparatus for vaporizing a liquid medium in a filling product filling plant
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FI128723B (en) * 2018-09-09 2020-11-13 Cleamix Oy Disinfection method and disinfection device
FI128353B (en) * 2018-09-09 2020-03-31 Cleamix Oy Disinfection method and disinfection device
FI128526B (en) * 2018-09-09 2020-07-15 Cleamix Oy Disinfection method and disinfection device
FI20187124A1 (en) * 2018-09-09 2020-03-10 Cleamix Oy Disinfection method and disinfection device
WO2020049224A1 (en) * 2018-09-09 2020-03-12 Cleamix Oy Disinfection method and disinfection device
KR102348142B1 (en) * 2020-01-02 2022-01-06 주식회사 휴온스메디케어 Hydrogen Peroxide Steam Generator Using Air Cushion
US20230040630A1 (en) * 2020-01-02 2023-02-09 Huons Meditech Co., Ltd. Hydrogen peroxide vapor generation device, space sterilization apparatus including same, and space sterilization method

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