JP4425815B2 - Color unevenness inspection method and apparatus - Google Patents

Color unevenness inspection method and apparatus Download PDF

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JP4425815B2
JP4425815B2 JP2005046914A JP2005046914A JP4425815B2 JP 4425815 B2 JP4425815 B2 JP 4425815B2 JP 2005046914 A JP2005046914 A JP 2005046914A JP 2005046914 A JP2005046914 A JP 2005046914A JP 4425815 B2 JP4425815 B2 JP 4425815B2
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luminance deviation
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JP2006234470A (en
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恭史 小山
久容 田嶋
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Toray Engineering Co Ltd
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    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B17/00—Guiding record carriers not specifically of filamentary or web form, or of supports therefor
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    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B19/00—Driving, starting, stopping record carriers not specifically of filamentary or web form, or of supports therefor; Control thereof; Control of operating function ; Driving both disc and head
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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
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Description

本発明は、カラーフィルターの製造工程などにおいて、基板上に形成されたカラー皮膜の色むらの有無、程度などを検査するための方法およびその装置に関する。   The present invention relates to a method and an apparatus for inspecting the presence / absence, degree, etc. of color unevenness of a color film formed on a substrate in a color filter manufacturing process or the like.

従来から、フラットパネルディスプレイに用いられるカラーフィルターの製造工程などにおいて、顔料分散の不均一や、成分凝集、膜厚変動による色むらが発生する事が知られている。その色むらが生じたままで製造作業を継続するという不都合の発生を防止するために、カメラと光源とを用いて、色むらの有無、程度などを検査することが行われていた。   2. Description of the Related Art Conventionally, it has been known that non-uniform pigment dispersion, component aggregation, and color unevenness due to film thickness variation occur in a manufacturing process of a color filter used for a flat panel display. In order to prevent the inconvenience of continuing the manufacturing operation with the color unevenness occurring, the presence or absence, degree, etc. of color unevenness has been inspected using a camera and a light source.

また、ＬＣＤなどの被検査表示素子の表示画面を、ＣＣＤなどを備えた撮像装置で撮像して、被検査表示素子の良否を検査する方法が提案されている（特許文献１参照）。特許文献１の方法は、撮像画像にモアレが発生したことを目視により認識した場合に、撮像装置のレンズのピント（フォーカス）を調整することによって、ＬＣＤパネルの周波数特性をキャンセルして、モアレを除去する方法である。
特開平８−１４９３５８号公報 In addition, a method has been proposed in which a display screen of a display element to be inspected such as an LCD is imaged by an imaging device having a CCD or the like to inspect the quality of the display element to be inspected (see Patent Document 1). The method of Patent Document 1 cancels the frequency characteristics of the LCD panel by adjusting the focus (focus) of the lens of the image pickup device and visually confirms that the moire has occurred in the picked-up image. It is a method of removing.
JP-A-8-149358

特許文献１の方法を採用して色むらの有無、程度などを検査する場合には、モアレを除去することによって色むらの有無、程度、位置などを精度よく検査できると思われるが、モアレが発生したことをオペレータが目視により認識するので、必然的に個人差が生じ、また、撮像装置のレンズのピント（フォーカス）を調整する程度についても、オペレータが目視しながらピントを調整するので、必然的に個人差が生じ、この結果、オペレータが変わると色むらの有無、程度などの検査結果がばらついてしまうという不都合がある。具体的には、モアレを十分には除去できなかったり、色むらまでも除去されたりするという不都合がある。   When the method of Patent Document 1 is used to inspect the presence / absence, degree, and the like of color unevenness, it is considered that the presence / absence, degree, position, etc. of color unevenness can be accurately inspected by removing moire. Since the operator visually recognizes the occurrence of the occurrence, there is inevitably an individual difference, and the degree of adjustment of the focus (focus) of the lens of the imaging apparatus is also inevitably adjusted by the operator while visually observing. Individual differences occur, and as a result, when the operator changes, there is an inconvenience that inspection results such as the presence or absence of color unevenness and the like vary. Specifically, there are inconveniences that moire cannot be sufficiently removed or even uneven color is removed.

また、オペレータが変わらない場合であっても、例えば、朝と夕方とでは視力、集中力などが変化するので、検査結果がばらついてしまうという不都合がある。   Further, even if the operator does not change, for example, the visual acuity and concentration change between morning and evening, so that there is an inconvenience that inspection results vary.

さらに、カラー皮膜の色、基板上のパターン、カラー皮膜の積層順序が品種毎に異なる為、モアレの発生条件が変化するという不都合がある。   Further, since the color of the color coating, the pattern on the substrate, and the order of stacking the color coating are different for each type, there is a disadvantage that the condition for generating moire changes.

本発明は上記の問題点に鑑みてなされたものであり、個人差、品種による差、個人の状態差の影響を受けることなく、色むらの有無、程度などを精度よく検査することができる色むら検査方法およびその装置を提供することを目的としている。   The present invention has been made in view of the above-described problems, and is capable of accurately inspecting the presence / absence, degree, and the like of color unevenness without being affected by individual differences, varietal differences, or individual state differences. An object of the present invention is to provide an unevenness inspection method and an apparatus therefor.

本発明の色むら検査方法は、カラー皮膜が形成された基板に対して光源により光を照射
し、カラー皮膜が形成された基板面を、焦点調節可能な集光光学系を通して撮像装置によ
り撮像し、撮像結果に基づいて色むらを検査する方法であって、
検査開始時に、基板を元に、撮像画像のマトリックス化を行い、各マトリックスの輝度偏差を計算し、計算により得た輝度偏差を所定の閾値と比較し、輝度偏差が所定の閾値よりも大きいことを条件として、集光光学系に対して焦点調節指令を供給する処理、モアレを除去するように、行って、この自動調節後の撮像画像のマトリックス化を行う処理、各マトリックスの輝度偏差を計算する処理、計算により得た輝度偏差を所定の閾値と比較する処理を集光光学系の焦点を自動調整する処理を輝度偏差が所定の閾値よりも小さくなるまで繰り返し行い、輝度偏差が所定の閾値よりも大きくないことを条件に次工程に移行する方法である。
本発明の色むら検査方法は、また、カラー皮膜が形成された基板に対して光源により光を照射し、カラー皮膜が形成された基板面を、焦点調節可能な集光光学系を通して撮像装置により撮像し、撮像結果に基づいて色むらを検査する方法であって、
検査開始時に、基板を元に、撮像画像のマトリックス化を行い、各マトリックスの輝度偏差を計算し、計算により得た輝度偏差を所定の閾値と比較し、輝度偏差が所定の閾値よりも大きいことを条件として、集光光学系に対して焦点調節指令を供給する処理、基板の被測定面を中心とする被写界深度の外になるように、集光光学系の焦点を自動調整する処理を行って、この自動調整後の撮像画像のマトリックス化を行う処理、各マトリックスの輝度偏差を計算する処理、計算により得た輝度偏差を所定の閾値と比較する処理を集光光学系の焦点を自動調整する処理を輝度偏差が所定の閾値よりも小さくなるまで繰り返し行い、輝度偏差が所定の閾値よりも大きくないことを条件に次工程に移行する方法である。 According to the method for inspecting color unevenness of the present invention, light is emitted from a light source to a substrate on which a color film is formed, and the surface of the substrate on which the color film is formed is imaged by an imaging device through a focusing optical system capable of adjusting the focus. A method for inspecting color unevenness based on an imaging result,
At the start of inspection, the captured image is matrixed based on the substrate, the luminance deviation of each matrix is calculated, the luminance deviation obtained by the calculation is compared with a predetermined threshold, and the luminance deviation is larger than the predetermined threshold As a condition, a process for supplying a focus adjustment command to the condensing optical system, a process for removing moire, and a process for forming a matrix of captured images after the automatic adjustment , and calculating a luminance deviation of each matrix The process of comparing the brightness deviation obtained by the calculation with a predetermined threshold is repeatedly performed until the brightness deviation becomes smaller than the predetermined threshold, and the process of automatically adjusting the focus of the condensing optical system is performed . It is a method for shifting to the next process on condition that the value is not larger than the above.
The method for inspecting color unevenness of the present invention also irradiates a substrate on which a color film is formed with a light source, and the substrate surface on which the color film is formed by an imaging device through a condensing optical system capable of adjusting the focus. A method of imaging and inspecting color unevenness based on the imaging result,
At the start of inspection, the captured image is matrixed based on the substrate, the luminance deviation of each matrix is calculated, the luminance deviation obtained by the calculation is compared with a predetermined threshold, and the luminance deviation is larger than the predetermined threshold Processing to supply a focus adjustment command to the condensing optical system, and to automatically adjust the focus of the condensing optical system so that it is outside the depth of field centered on the measurement surface of the substrate The process of forming the matrix of the captured image after the automatic adjustment , the process of calculating the luminance deviation of each matrix, and the process of comparing the luminance deviation obtained by the calculation with a predetermined threshold are performed on the focusing optical system. The automatic adjustment process is repeated until the luminance deviation becomes smaller than a predetermined threshold value, and the process proceeds to the next process on condition that the luminance deviation is not larger than the predetermined threshold value.

この構成を採用すれば、検査開始時に集光光学系の焦点を自動調整することによって、カラー皮膜が透光性のあるカラー皮膜であり、基板が透光性のある基板である場合に、モアレが存在しない状態での撮像結果から色むらの有無、程度などを精度よく検査することができる。 By this configuration, by automatically adjusting the focus of the converging optical system at test start, a color film color film is light-transmitting, if the substrate is a substrate having light-transmitting property, moire The presence or absence of color unevenness, the degree, etc. can be inspected with high accuracy from the imaging result in the absence of the image .

ただし、透過光で検出可能なむら（カラー皮膜の厚みむらなどに起因する、むら部を透過する光と正常部を透過する光の波長および／または強度が違う。）の場合、集光光学系が基板及びカラー皮膜を透過した光を集光するものであることが好ましい。   However, in the case of non-uniformity that can be detected by transmitted light (the wavelength and / or intensity of light transmitted through the non-uniform part differs from that transmitted through the normal part due to uneven thickness of the color film, etc.), the condensing optical system It is preferable that the light condenses light transmitted through the substrate and the color film.

また、反射光で検出可能なむら（カラー皮膜の劣化むらなどに起因する、むら部で反射する光と正常部で反射する光の波長および／または強度が違う。）の場合、集光光学系がカラー皮膜で反射した光を集光するものであることが好ましい。   Also, in the case of unevenness that can be detected by reflected light (the wavelength and / or intensity of the light reflected from the uneven part and the light reflected from the normal part due to unevenness in the deterioration of the color film is different), the condensing optical system It is preferable to collect light reflected by the color film.

さらに、透過光固有のむら、及び反射光固有のむらを同時に測定する場合、光源が基板を基準とし、互いに対称的に配置された光学系を形成し、択一的に基板に対して、光を照射する事により、カラー皮膜を透過する光のむら及びカラー皮膜で反射される光のむらを検査することが出来る。また、択一的な検査方法の為、集光光学系の台数を増やすことなく検査できる。しかも、連続的に切り替えることにより、一度にカラー皮膜を透過する光のむら及びカラー皮膜で反射される光のむらを検査することが出来、合成した結果を算出することも出来る。   Furthermore, when measuring unevenness specific to transmitted light and unevenness specific to reflected light, an optical system in which light sources are arranged symmetrically with respect to the substrate as a reference is formed, and light is selectively applied to the substrate. By doing so, it is possible to inspect the unevenness of the light transmitted through the color film and the unevenness of the light reflected by the color film. Further, because of the alternative inspection method, inspection can be performed without increasing the number of condensing optical systems. In addition, by switching continuously, it is possible to inspect the unevenness of light transmitted through the color film at once and the unevenness of light reflected by the color film, and the combined result can be calculated.

本発明の色むら検査装置は、カラー皮膜が形成された基板に対して光を照射する光源と
、カラー皮膜が形成された基板面を、焦点調節可能な集光光学系を通して撮像する撮像装
置と、撮像結果に基づいて色むらを検査する検査手段とを含むものであって、
検査手段は、検査開始時に、基板を元に、撮像画像のマトリックス化を行い、各マトリックスの輝度偏差を計算し、計算により得た輝度偏差を所定の閾値と比較し、輝度偏差が所定の閾値よりも大きいことを条件として、集光光学系に対し焦点調節指令を供給して、モアレを除去するように集光光学系の焦点を自動調整し、この自動調整後の撮像画像のマトリックス化、各マトリックスの輝度偏差の計算、計算により得た輝度偏差を所定の閾値との比較、を集光光学系の焦点を自動調整する処理を輝度偏差が所定の閾値よりも小さくなるまで繰り返し行い、輝度偏差が所定の閾値よりも大きくないことを条件に次動作に移る制御を行うものである。
本発明の色むら検査装置は、また、カラー皮膜が形成された基板に対して光を照射する光源と、カラー皮膜が形成された基板面を、焦点調節可能な集光光学系を通して撮像する撮像装置と、撮像結果に基づいて色むらを検査する検査手段とを含む色むら検査装置であって、
検査手段は、検査開始時に、基板を元に、撮像画像のマトリックス化を行い、各マトリックスの輝度偏差を計算し、計算により得た輝度偏差を所定の閾値と比較し、輝度偏差が所定の閾値よりも大きいことを条件として、集光光学系に対し焦点調節指令を供給して、基板の被測定面を中心とする被写界深度の外になるように、集光光学系の焦点を自動調整し、この自動調整後の撮像画像のマトリックス化、各マトリックスの輝度偏差の計算、計算により得た輝度偏差を所定の閾値との比較、を集光光学系の焦点を自動調整する処理を輝度偏差が所定の閾値よりも小さくなるまで繰り返し行い、輝度偏差が所定の閾値よりも大きくないことを条件に次動作に移る制御を行うものである。 A color unevenness inspection apparatus according to the present invention includes a light source that irradiates light onto a substrate on which a color film is formed, an imaging device that images the substrate surface on which the color film is formed through a condensing optical system that can be adjusted in focus. And inspection means for inspecting color unevenness based on the imaging result,
The inspection means forms a matrix of the captured image based on the substrate at the start of inspection, calculates the luminance deviation of each matrix, compares the luminance deviation obtained by the calculation with a predetermined threshold, and the luminance deviation is a predetermined threshold condition is greater than, by supplying the pair to focus point adjustment command to the focusing optical system, the focus of the focusing optical system so as to eliminate moire is automatically adjusted, the matrix of the captured image after the automatic adjustment , Calculating the luminance deviation of each matrix, comparing the luminance deviation obtained by the calculation with a predetermined threshold, and repeatedly adjusting the focus of the condensing optical system until the luminance deviation becomes smaller than the predetermined threshold The control to move to the next operation is performed on condition that the luminance deviation is not larger than a predetermined threshold value .
The color unevenness inspection apparatus according to the present invention also includes an imaging device that images a light source that irradiates light to a substrate on which a color film is formed and a substrate surface on which the color film is formed through a focusing optical system that can adjust a focus. A color unevenness inspection apparatus including an apparatus and inspection means for inspecting color unevenness based on an imaging result,
The inspection means forms a matrix of the captured image based on the substrate at the start of inspection, calculates the luminance deviation of each matrix, compares the luminance deviation obtained by the calculation with a predetermined threshold, and the luminance deviation is a predetermined threshold condition is greater than, by supplying the pair to focus point adjustment command to the focusing optical system, so that the outside of the depth of field around the surface to be measured of the substrate, the focus of the focusing optical system This process automatically adjusts the focal point of the condensing optical system by making a matrix of the captured image after this automatic adjustment , calculating the luminance deviation of each matrix, and comparing the luminance deviation obtained by the calculation with a predetermined threshold. Is repeated until the luminance deviation becomes smaller than a predetermined threshold value, and control is performed to move to the next operation on condition that the luminance deviation is not larger than the predetermined threshold value .

この構成を採用すれば、検査開始時に集光光学系の焦点を自動調整することによって、カラー皮膜が透光性のあるカラー皮膜であり、基板が透光性のある基板である場合に、モアレが存在しない状態での撮像結果から色むらの有無、程度などを精度よく検査することができる。
ただし、透過光で検出可能なむら（カラー皮膜の厚みむらなどに起因する、むら部を透過する光と正常部を透過する光の波長および／または強度が違う）の場合、集光光学系が基板及びカラー皮膜を透過した光を集光するものであることが好ましい。 By this configuration, by automatically adjusting the focus of the converging optical system at test start, a color film color film is light-transmitting, if the substrate is a substrate having light-transmitting property, moire The presence or absence of color unevenness, the degree, etc. can be inspected with high accuracy from the imaging result in the absence of the image .
However, in the case of non-uniformity that can be detected by transmitted light (the wavelength and / or intensity of the light transmitted through the uneven part and the light transmitted through the normal part are different due to uneven thickness of the color film) It is preferable that the light transmitted through the substrate and the color film is collected.

また、反射光で検出可能なむら（カラー皮膜の劣化むらなどに起因する、むら部で反射する光と正常部で反射する光の波長および／または強度が違う。）の場合、集光光学系が基板またはカラー皮膜で反射した光を集光するものであることが好ましい。   Also, in the case of unevenness that can be detected by reflected light (the wavelength and / or intensity of the light reflected from the uneven part and the light reflected from the normal part due to unevenness of the color film is different), the condensing optical system It is preferable to collect light reflected by the substrate or the color film.

さらに、透過光固有のむら、及び反射光固有のむらを同時に測定する場合、光源が基板を基準とし、互いに対称的に配置された光学系を形成し、択一的に基板に対して、光を照射する事により、カラー皮膜を透過する光のむら及びカラー皮膜で反射される光のむらを検査することが出来る。また、択一的な検査方法の為、集光光学系の台数を増やすことなく検査できる。しかも、連続的に切り替えることにより、一度にカラー皮膜を透過する光のむら及びカラー皮膜で反射される光のむらを検査することが出来、合成した結果を算出することも出来る。   Furthermore, when measuring unevenness specific to transmitted light and unevenness specific to reflected light, an optical system in which light sources are arranged symmetrically with respect to the substrate as a reference is formed, and light is selectively applied to the substrate. By doing so, it is possible to inspect the unevenness of the light transmitted through the color film and the unevenness of the light reflected by the color film. Further, because of the alternative inspection method, inspection can be performed without increasing the number of condensing optical systems. In addition, by switching continuously, it is possible to inspect the unevenness of light transmitted through the color film at once and the unevenness of light reflected by the color film, and the combined result can be calculated.

本発明の色むら検査方法は、色むらの有無、程度、位置などを精度よく検査することができるという特有の効果を奏する。   The method for inspecting color unevenness according to the present invention has a specific effect that the presence / absence, degree, and position of color unevenness can be inspected with high accuracy.

本発明の色むら検査装置も、色むらの有無、程度、位置などを精度よく検査することができるという特有の効果を奏する。   The color unevenness inspection apparatus of the present invention also has a unique effect that it can accurately inspect the presence, degree, position, etc. of color unevenness.

以下、添付図面を参照して、本発明の色むら検査方法およびその装置の実施の形態を詳細に説明する。   DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of a method for inspecting color unevenness and an apparatus therefor according to the present invention will be described below in detail with reference to the accompanying drawings.

図１は本発明の色むら検査方法が適用される、フラットパネルディスプレイ用のカラーフィルター製造装置の主要部を示す概略図である。   FIG. 1 is a schematic view showing a main part of a color filter manufacturing apparatus for a flat panel display to which the color unevenness inspection method of the present invention is applied.

本カラーフィルター製造装置は、ガラスなど、透光性のある基板上に透光性のあるカラー皮膜を塗布する塗布装置１と、塗布されたカラー皮膜を乾燥させる乾燥器２と、乾燥されたカラー皮膜の色むらの有無、程度、位置などを検査する色むら検査装置３とを有している。   The color filter manufacturing apparatus includes a coating device 1 that applies a light-transmitting color film onto a light-transmitting substrate such as glass, a dryer 2 that dries the applied color film, and a dried color. A color unevenness inspection device 3 for inspecting the presence / absence, degree, position, etc. of color unevenness of the film is provided.

例えば、カラーフィルターの場合、少なくとも３原色をマトリックス状に配置してなるものであるから、塗布装置１と、乾燥器２と、色むら検査装置３とが色毎に設けられている。   For example, in the case of a color filter, since at least three primary colors are arranged in a matrix, a coating device 1, a dryer 2, and a color unevenness inspection device 3 are provided for each color.

図２は色むら検査装置３を詳細に示す概略図である。   FIG. 2 is a schematic diagram showing the color unevenness inspection apparatus 3 in detail.

本色むら検査装置３は、カラー皮膜が形成された基板３１を水平方向に搬送する搬送装置３２と、所定位置において下方から基板３１に光を照射する光源３３と、基板３１を透過した光を受光するように配置された集光光学系３４および撮像装置３５と、撮像装置３５により得られた画像データに基づいて所定の画像処理を行う画像処理装置３６と、画像処理結果などに基づいて搬送装置３２、集光光学系３４などに対する指令データを生成して供給する制御装置３７と、基板３１の搬送距離を検出するエンコーダー３８とを有している。なお、３０は、プログラマブルロジックコントローラーである。   The color unevenness inspection apparatus 3 receives a light transmitted through the substrate 31, a transport device 32 that transports the substrate 31 on which the color film is formed in a horizontal direction, a light source 33 that irradiates the substrate 31 with light from below at a predetermined position. The condensing optical system 34 and the imaging device 35 arranged so as to perform, an image processing device 36 that performs predetermined image processing based on image data obtained by the imaging device 35, and a conveying device based on the image processing result 32, a control device 37 that generates and supplies command data for the condensing optical system 34 and the like, and an encoder 38 that detects the transport distance of the substrate 31. Reference numeral 30 denotes a programmable logic controller.

前記搬送装置３２は、例えば、複数のコンベヤローラーを有し、一部の原動コンベヤローラーを回転駆動することにより、基板３１を所定方向に送り、残余の従動ローラーにより基板３１をスムーズに案内するものである。ただし、上流側コンベヤと下流側コンベヤとで構成されていることが好ましく、この場合には、上流側コンベヤと下流側コンベヤとの間隙において基板３１に光を照射し、かつ基板３１を透過した光を受光させることができる。   The transport device 32 has, for example, a plurality of conveyor rollers, and rotationally drives some of the driving conveyor rollers to feed the substrate 31 in a predetermined direction and smoothly guide the substrate 31 with the remaining driven rollers. It is. However, it is preferable that it is composed of an upstream conveyor and a downstream conveyor. In this case, light that irradiates the substrate 31 at the gap between the upstream conveyor and the downstream conveyor and transmits the substrate 31. Can be received.

前記光源３３は、点光源、線光源、面光源の何れであってもよい。   The light source 33 may be a point light source, a line light source, or a surface light source.

前記集光光学系３４は、モータなどを駆動源として焦点距離を調節可能なものである。   The condensing optical system 34 can adjust the focal length using a motor or the like as a drive source.

前記撮像装置３５は、１次元の撮像装置、２次元の撮像装置の何れであってもよい。また、撮像装置３５としては、ラインセンサー、ＣＣＤカメラ、ＣＭＯＳカメラなどが例示できる。   The imaging device 35 may be either a one-dimensional imaging device or a two-dimensional imaging device. Examples of the imaging device 35 include a line sensor, a CCD camera, and a CMOS camera.

また、前記集光光学系３４および前記撮像装置３５は、色むらに起因する微弱な輝度値の差を検出できるように、外光を遮断できる遮光ケーシング（図示せず）に収容されている。   Further, the condensing optical system 34 and the imaging device 35 are accommodated in a light shielding casing (not shown) that can block outside light so as to detect a faint luminance value difference caused by color unevenness.

前記画像処理装置３６は、例えば、エンコーダー３８からの搬送距離検出出力を入力とし、撮像装置３５による撮像データを合成して基板３１の全範囲に対応する画像データを生成する処理、生成された画像データをマトリックス状に細分化する処理、マトリックス毎の平均輝度、および輝度偏差を算出する処理、算出された輝度偏差と所定の閾値とを比較する処理などを行うものである。そして、前記画像処理装置３６は、撮像装置３５からの生撮像データを入力として所定の前処理を行う前処理装置からのデータに基づいて必要な処理を行うものであってもよい。   The image processing device 36 receives, for example, the transport distance detection output from the encoder 38, generates image data corresponding to the entire range of the substrate 31 by synthesizing the imaging data from the imaging device 35, and the generated image. A process of subdividing data into a matrix, a process of calculating an average luminance and a luminance deviation for each matrix, a process of comparing the calculated luminance deviation with a predetermined threshold value, and the like are performed. The image processing device 36 may perform necessary processing based on data from a preprocessing device that performs predetermined preprocessing using raw image data from the imaging device 35 as an input.

なお、所定の閾値は、例えば、モアレが存在する場合には、撮像装置により撮影された画像内の最大輝度と最小輝度との差が大きく、逆にモアレが存在しない場合には、撮像装置により撮影された画像内の最大輝度と最小輝度との差が小さいため、経験的に求めることができる（図４、および図５参照）。具体的には、例えば、撮像画像の輝度（例えば、十字の線上の輝度をヒストグラムで表しておき、モアレが存在する位置にポインターを移動させて輝度差を測定し（ヒストグラムで確認し）、測定された輝度差を元に閾値を決定する。   Note that the predetermined threshold value is, for example, a large difference between the maximum luminance and the minimum luminance in the image captured by the imaging device when moiré is present, and conversely by the imaging device when no moiré is present. Since the difference between the maximum luminance and the minimum luminance in the photographed image is small, it can be obtained empirically (see FIGS. 4 and 5). Specifically, for example, the brightness of the captured image (for example, the brightness on the cross line is represented by a histogram, the pointer is moved to a position where moire exists, and the brightness difference is measured (confirmed by the histogram). A threshold value is determined based on the luminance difference.

前記制御装置３７は、例えば、画像処理装置３６における比較結果などを入力として、必要な場合に、焦点を調節する指令を集光光学系３４に供給し、搬送装置３２に基板搬送指令を供給し、撮像装置３５に撮像指令を供給するものである。そして、制御装置３７と画像処理装置３６とは、共に１台のコンピュータで構成することも可能である。
次いで、図３に示すフローチャートを参照して、色むら検査装置をさらに説明する。 The control device 37 receives, for example, a comparison result in the image processing device 36 as an input, supplies a focus adjustment command to the condensing optical system 34 when necessary, and supplies a substrate transfer command to the transfer device 32. The imaging command is supplied to the imaging device 35. The control device 37 and the image processing device 36 can both be configured by a single computer.
Next, the color unevenness inspection apparatus will be further described with reference to the flowchart shown in FIG.

搬送装置３２に基板３１がセットされたことを図示しないセンサーにより検出したことに応答して、ステップＳＰ１において、制御装置３７から画像処理装置３６に対して処理開始指令を供給する。次いで、ステップＳＰ２において、制御装置３７から撮像装置３５に対して撮像指令を供給する。次いで、ステップＳＰ３において、撮像装置３５によって撮像を行う。次いで、ステップＳＰ４において、前処理装置によって画像入出力を行う。次いで、ステップＳＰ５において、画像処理装置３６によって画像のマトリックス化を行う。次いで、ステップＳＰ６において、画像処理装置３６によって各マトリックスの輝度偏差を計算する。次いで、ステップＳＰ７において、輝度偏差と所定の閾値とを比較する。   In response to detecting that the substrate 31 is set on the transport device 32 by a sensor (not shown), a processing start command is supplied from the control device 37 to the image processing device 36 in step SP1. Next, in step SP2, an imaging command is supplied from the control device 37 to the imaging device 35. Next, in step SP3, imaging is performed by the imaging device 35. Next, in step SP4, image input / output is performed by the preprocessing device. Next, in step SP5, the image processing device 36 forms an image into a matrix. Next, in step SP6, the image processor 36 calculates the luminance deviation of each matrix. Next, in step SP7, the luminance deviation is compared with a predetermined threshold value.

そして、ステップＳＰ７において輝度偏差が所定の閾値よりも大きいと判定された場合には、ステップＳＰ８において、制御装置３７から集光光学系３４に対して焦点調節指令を供給する。次いで、ステップＳＰ９において、集光光学系３４が焦点を調節し、ステップＳＰ１０において、制御装置３７から撮像装置３５に対して撮像指令を供給する。具体的には、図６に示すように、基板３１の表面にピントを合わせた状態における被写界深度の外にピントを合わせるように、集光光学系３４が焦点を調節する。   If it is determined in step SP7 that the luminance deviation is larger than the predetermined threshold value, a focus adjustment command is supplied from the control device 37 to the condensing optical system 34 in step SP8. Next, in step SP9, the condensing optical system 34 adjusts the focus, and in step SP10, an imaging command is supplied from the control device 37 to the imaging device 35. Specifically, as shown in FIG. 6, the condensing optical system 34 adjusts the focus so that the depth of field is in focus when the surface of the substrate 31 is in focus.

次いで、ステップＳＰ１１において、焦点が調節された集光光学系３４を通して撮像装置３５によって撮像を行う。その後、再び、ステップＳＰ４の処理を行う。   Next, in step SP11, imaging is performed by the imaging device 35 through the condensing optical system 34 whose focus is adjusted. Thereafter, the process of step SP4 is performed again.

逆に、ステップＳＰ７において輝度偏差が所定の閾値よりも大きくないと判定された場合には、ステップＳＰ１２において、制御装置３７から搬送装置３２に対して、次のエリアの撮像のために必要な距離だけ基板３１を搬送する指令を供給する。次いで、ステップＳＰ１３において、搬送装置３２によって、次のエリアの撮像のために必要な距離だけ基板３１を搬送する。その後、再び、ステップＳＰ２の処理を行う。   Conversely, when it is determined in step SP7 that the luminance deviation is not larger than the predetermined threshold, in step SP12, the distance required for imaging the next area from the control device 37 to the transport device 32. Only a command to transport the substrate 31 is supplied. Next, in step SP13, the transport device 32 transports the substrate 31 by a distance necessary for imaging the next area. Thereafter, the process of step SP2 is performed again.

なお、図３のフローチャートには示していないが、基板３１の全範囲が撮像されたことを条件として、輝度偏差などを用いて従来公知の処理を行って色むらの有無、程度などを検査し、検査結果を表示し、基板３１を次工程へ搬出するとともに、一連の処理を終了し、次の基板３１の搬入に備えるようにしている。ただし、全ての基板３１に対して上記一連の処理を行なうと効率が低下することになるので、品種が変わる毎に上記一連の処理を行なうことが好ましい。   Although not shown in the flowchart of FIG. 3, on the condition that the entire range of the substrate 31 has been imaged, a conventionally known process is performed using luminance deviation and the like, and the presence / absence, level, etc. of color unevenness is inspected. The inspection result is displayed, and the substrate 31 is carried out to the next process, and a series of processes are completed to prepare for the next substrate 31 to be carried in. However, if the above-described series of processing is performed on all the substrates 31, the efficiency is lowered. Therefore, it is preferable to perform the above-described series of processing every time the product type is changed.

以上の説明から分かるように、モアレを除去できるように集光光学系３４の焦点を調節して撮像し、撮像データに基づいて色むらの有無、程度、位置などを検査するので、検査精度を高めることができる。具体的には、色むらがモアレの影響により検出困難であっても（図７参照）、モアレを除去するように集光光学系３４の焦点を調整することにより、色むらを確実に検出することが可能となる（図８参照）。   As can be seen from the above description, the focus of the condensing optical system 34 is adjusted so that moire can be removed, and the presence / absence, degree, and position of color unevenness are inspected based on the imaging data. Can be increased. Specifically, even if the color unevenness is difficult to detect due to the influence of moire (see FIG. 7), the color unevenness is reliably detected by adjusting the focus of the condensing optical system 34 so as to remove the moire. (See FIG. 8).

上記実施形態においては、輝度偏差と所定の閾値とを比較し、比較結果に基づいて集光光学系３４の焦点を調節する（具体的には、例えば、全てのマトリックスの輝度偏差が閾値を越えないように集光光学系３４の焦点を調節する）ようにしているが、撮影された画像の指定エリアの輝度偏差を設定した閾値と比較し、輝度偏差が設定した閾値内に入るように集光光学系３４の焦点を調節することが可能である。   In the above embodiment, the luminance deviation is compared with a predetermined threshold, and the focus of the condensing optical system 34 is adjusted based on the comparison result (specifically, for example, the luminance deviation of all matrices exceeds the threshold). The focus of the condensing optical system 34 is adjusted so that the brightness deviation of the designated area of the photographed image is compared with the set threshold value, and the brightness deviation is within the set threshold value. The focus of the optical optical system 34 can be adjusted.

図９は本発明の色むら検査装置の他の実施形態を示す概略図である。
本色むら検査装置が図２の色むら検査装置と異なる点は、所定位置において上方から基板３１に光を照射する光源３９をさらに設けた点、光源３３、３９のそれぞれの光放射側に光シャッター３３ａ、３９ａをさらに設けた点のみである。 FIG. 9 is a schematic view showing another embodiment of the color unevenness inspection apparatus of the present invention.
The color unevenness inspection apparatus is different from the color unevenness inspection apparatus of FIG. 2 in that a light source 39 for irradiating light onto the substrate 31 from above is further provided at a predetermined position, and an optical shutter on each light emission side of the light sources 33 and 39. Only 33a and 39a are provided.

前記光シャッター３３ａ、３９ａは、光源からの光を基板３１に照射する状態と光源からの光の照射を確実に阻止できる状態とを選択できるものであればよく、機械的シャッター、液晶シャッターなど従来公知の種々のものが使用可能である。また、撮像装置３５は、一方の光源に起因する光のみを受光する必要があるので、少なくとも一方が光源からの光の照射を確実に阻止するように制御されることもあり得る。   The optical shutters 33a and 39a only need to be able to select a state in which the substrate 31 is irradiated with light from the light source and a state in which irradiation of light from the light source can be reliably prevented. Various known ones can be used. Further, since the imaging device 35 needs to receive only light originating from one of the light sources, at least one of the imaging devices 35 may be controlled to reliably prevent irradiation of light from the light source.

また、光源にＬＥＤ、ストロボ、レーザーダイオード等を用いれば、上記の各種シャッターは必要とせず、光源の点灯を制御する事で、同様の効果が得られる。   If an LED, strobe, laser diode, or the like is used as the light source, the above various shutters are not necessary, and the same effect can be obtained by controlling the lighting of the light source.

上記の構成の色むら検査装置によれば、反射光に基づく色むら、および透過光に基づく色むらを、基板３１を一度所定方向に搬送するだけで、精度よく検査することができる。   According to the color unevenness inspection apparatus having the above configuration, color unevenness based on reflected light and color unevenness based on transmitted light can be inspected with high accuracy by only transporting the substrate 31 once in a predetermined direction.

本発明の色むら検査方法が適用される、フラットパネルディスプレイ用のカラーフィルター製造装置の主要部を示す概略図である。It is the schematic which shows the principal part of the color filter manufacturing apparatus for flat panel displays to which the uneven color inspection method of this invention is applied. 色むら検査装置を詳細に示す概略図である。It is the schematic which shows a color nonuniformity inspection apparatus in detail. 色むら検査装置の処理の一例を説明するフローチャートである。It is a flowchart explaining an example of a process of a color nonuniformity inspection apparatus. モアレが存在する状態における複数のマトリックスの輝度偏差と所定の閾値との関係を示す概略図である。It is the schematic which shows the relationship between the brightness | luminance deviation of a some matrix in a state with a moire, and a predetermined threshold value. モアレが存在しない状態における複数のマトリックスの輝度偏差と所定の閾値との関係を示す概略図である。It is the schematic which shows the relationship between the brightness | luminance deviation of a some matrix in a state where a moire does not exist, and a predetermined threshold value. 集光光学系のピントを基板表面に設定した状態における被写界深度と、調節後の焦点位置とを示す概略図である。It is the schematic which shows the depth of field in the state which set the focus of the condensing optical system to the board | substrate surface, and the focus position after adjustment. 集光光学系のピントを基板表面に設定した状態における撮像例を示す図である。It is a figure which shows the example of an imaging in the state which set the focus of the condensing optical system to the substrate surface. 集光光学系のピントを基板表面からずらせた状態における撮像例を示す図である。It is a figure which shows the example of an imaging in the state which shifted the focus of the condensing optical system from the substrate surface. 本発明の色むら検査装置の他の実施形態を示す概略図である。It is the schematic which shows other embodiment of the color nonuniformity test | inspection apparatus of this invention.

符号の説明Explanation of symbols

３１ 基板
３３ ３９ 光源
３４ 集光光学系
３５ 撮像装置
３６ 検査手段

31 Substrate 33 39 Light source 34 Condensing optical system 35 Imaging device 36 Inspection means

Claims (14)

カラー皮膜が形成された基板に対して光源により光を照射し、カラー皮膜が形成された基板面を、焦点調節可能な集光光学系を通して撮像装置により撮像し、撮像結果に基づいて色むらを検査する方法であって、
検査開始時に、基板を元に、撮像画像のマトリックス化を行い、各マトリックスの輝度偏差を計算し、計算により得た輝度偏差を所定の閾値と比較し、輝度偏差が所定の閾値よりも大きいことを条件として、集光光学系に対して焦点調節指令を供給する処理、モアレを除去するように、集光光学系の焦点を自動調整する処理を行って、この自動調節後の撮像画像のマトリックス化を行う処理、各マトリックスの輝度偏差を計算する処理、計算により得た輝度偏差を所定の閾値と比較する処理を輝度偏差が所定の閾値よりも小さくなるまで繰り返し行い、輝度偏差が所定の閾値よりも大きくないことを条件に次工程に移行することを特徴とする色むら検査方法。 The substrate on which the color coating is formed is irradiated with light from a light source, and the substrate surface on which the color coating is formed is imaged by an imaging device through a focusing optical system that can adjust the focus, and color unevenness is determined based on the imaging result. A method of inspecting,
At the start of inspection, the captured image is matrixed based on the substrate, the luminance deviation of each matrix is calculated, the luminance deviation obtained by the calculation is compared with a predetermined threshold, and the luminance deviation is larger than the predetermined threshold As a condition, a process of supplying a focus adjustment command to the condensing optical system, a process of automatically adjusting the focus of the condensing optical system so as to remove moire, and a matrix of captured images after the automatic adjustment The process of calculating the luminance deviation of each matrix, the process of comparing the luminance deviation obtained by calculation with the predetermined threshold value are repeated until the luminance deviation becomes smaller than the predetermined threshold value, and the luminance deviation is the predetermined threshold value. The method for inspecting color unevenness, characterized in that the process proceeds to the next process on condition that the size is not larger than the above . カラー皮膜が形成された基板に対して光源により光を照射し、カラー皮膜が形成された基板面を、焦点調節可能な集光光学系を通して撮像装置により撮像し、撮像結果に基づいて色むらを検査する方法であって、
検査開始時に、基板を元に、撮像画像のマトリックス化を行い、各マトリックスの輝度偏差を計算し、計算により得た輝度偏差を所定の閾値と比較し、輝度偏差が所定の閾値よりも大きいことを条件として、集光光学系に対して焦点調節指令を供給する処理、基板の被測定面を中心とする被写界深度の外になるように、集光光学系の焦点を自動調整する処理を行って、この自動調整後の撮像画像のマトリックス化を行う処理、各マトリックスの輝度偏差を計算する処理、計算により得た輝度偏差を所定の閾値と比較する処理を輝度偏差が所定の閾値よりも小さくなるまで繰り返し行い、輝度偏差が所定の閾値よりも大きくないことを条件に次工程に移行することを特徴とする色むら検査方法。 The substrate on which the color coating is formed is irradiated with light from a light source, and the substrate surface on which the color coating is formed is imaged by an imaging device through a focusing optical system that can adjust the focus, and color unevenness is determined based on the imaging result. A method of inspecting,
At the start of inspection, the captured image is matrixed based on the substrate, the luminance deviation of each matrix is calculated, the luminance deviation obtained by the calculation is compared with a predetermined threshold, and the luminance deviation is larger than the predetermined threshold Processing to supply a focus adjustment command to the condensing optical system, and to automatically adjust the focus of the condensing optical system so that it is outside the depth of field centered on the measurement surface of the substrate The process of forming the matrix of the captured image after the automatic adjustment , the process of calculating the luminance deviation of each matrix, and the process of comparing the luminance deviation obtained by the calculation with a predetermined threshold The color unevenness inspection method is characterized in that the process is repeated until the value becomes smaller and the process proceeds to the next process on condition that the luminance deviation is not larger than a predetermined threshold value . カラー皮膜が透光性のあるカラー皮膜であり、基板が透光性のある基板であり、集光光学系が基板およびカラー皮膜を透過した光を集光するものである請求項１または請求項２に記載の色むら検査方法。 Color coating is a color coating is light-transmitting, a substrate in which the substrate is a light-transmitting property, according to claim 1 or claim converging optical system is one that condenses the light transmitted through the substrate and the color film 2. The method for inspecting uneven color according to 2 . カラー皮膜が透光性のあるカラー皮膜であり、基板が透光性のある基板であり、集光光学系がカラー皮膜で反射した光を集光するものである請求項１または請求項２に記載の色むら検査方法。 Color coating is a color coating is light-transmitting, a substrate in which the substrate is a light-transmitting property, a light converging optical system is reflected by the color coating is to collect light in claim 1 or claim 2 Color unevenness inspection method described. カラー皮膜が透光性のあるカラー皮膜であり、基板が透光性のある基板であり、光源が基板を基準として互いに反対側に配置されてあり、集光光学系が基板およびカラー皮膜を透過した光、カラー皮膜で反射した光を集光するものである請求項１または請求項２に記載の色むら検査方法。 The color coating is a translucent color coating, the substrate is a translucent substrate, the light sources are arranged on opposite sides of the substrate, and the condensing optical system transmits the substrate and the color coating. The method for inspecting color unevenness according to claim 1, wherein the reflected light and the light reflected by the color film are collected. 基板を基準として互いに反対側に配置された光源が、択一的に、基板に対して光を照射するものである請求項５に記載の色むら検査方法。 The color unevenness inspection method according to claim 5 , wherein the light sources arranged on opposite sides of the substrate alternatively irradiate the substrate with light. カラー皮膜が形成された基板に対して光を照射する光源と、カラー皮膜が形成された基板面を、焦点調節可能な集光光学系を通して撮像する撮像装置と、撮像結果に基づいて色むらを検査する検査手段とを含む色むら検査装置であって、
検査手段は、検査開始時に、基板を元に、撮像画像のマトリックス化を行い、各マトリックスの輝度偏差を計算し、計算により得た輝度偏差を所定の閾値と比較し、輝度偏差が所定の閾値よりも大きいことを条件として、集光光学系に対し焦点調節指令を供給して、モアレを除去するように集光光学系の焦点を自動調整し、この自動調整後の撮像画像のマトリックス化、各マトリックスの輝度偏差の計算、計算により得た輝度偏差を所定の閾値との比較、を輝度偏差が所定の閾値よりも小さくなるまで繰り返し行い、輝度偏差が所定の閾値よりも大きくないことを条件に次動作に移る制御を行うことを特徴とする色むら検査装置。 A light source that emits light to a substrate on which a color coating is formed, an imaging device that images the substrate surface on which the color coating is formed through a focusing optical system that can adjust the focus, and color unevenness based on the imaging result An uneven color inspection device including an inspection means for inspecting,
The inspection means forms a matrix of the captured image based on the substrate at the start of inspection, calculates the luminance deviation of each matrix, compares the luminance deviation obtained by the calculation with a predetermined threshold, and the luminance deviation is a predetermined threshold condition is greater than, by supplying the pair to focus point adjustment command to the focusing optical system, the focus of the focusing optical system so as to eliminate moire is automatically adjusted, the matrix of the captured image after the automatic adjustment , Calculating the luminance deviation of each matrix, and comparing the luminance deviation obtained by the calculation with a predetermined threshold until the luminance deviation is smaller than the predetermined threshold , and the luminance deviation is not larger than the predetermined threshold A color unevenness inspection apparatus characterized by performing control to move to the next operation on the condition . カラー皮膜が形成された基板に対して光を照射する光源と、カラー皮膜が形成された基板面を、焦点調節可能な集光光学系を通して撮像する撮像装置と、撮像結果に基づいて色むらを検査する検査手段とを含む色むら検査装置であって、
検査手段は、検査開始時に、基板を元に、撮像画像のマトリックス化を行い、各マトリックスの輝度偏差を計算し、計算により得た輝度偏差を所定の閾値と比較し、輝度偏差が所定の閾値よりも大きいことを条件として、集光光学系に対し焦点調節指令を供給して、基板の被測定面を中心とする被写界深度の外になるように、集光光学系の焦点を自動調整し、この自動調整後の撮像画像のマトリックス化、各マトリックスの輝度偏差の計算、計算により得た輝度偏差を所定の閾値との比較、を輝度偏差が所定の閾値よりも小さくなるまで繰り返し行い、輝度偏差が所定の閾値よりも大きくないことを条件に次動作に移る制御を行うことを特徴とする色むら検査装置。 A light source that emits light to a substrate on which a color coating is formed, an imaging device that images the substrate surface on which the color coating is formed through a focusing optical system that can adjust the focus, and color unevenness based on the imaging result An uneven color inspection device including an inspection means for inspecting,
The inspection means forms a matrix of the captured image based on the substrate at the start of inspection, calculates the luminance deviation of each matrix, compares the luminance deviation obtained by the calculation with a predetermined threshold, and the luminance deviation is a predetermined threshold condition is greater than, by supplying the pair to focus point adjustment command to the focusing optical system, so that the outside of the depth of field around the surface to be measured of the substrate, the focus of the focusing optical system Is automatically adjusted, the matrix of the captured image after this automatic adjustment , the calculation of the luminance deviation of each matrix, the comparison of the luminance deviation obtained by the calculation with a predetermined threshold , until the luminance deviation becomes smaller than the predetermined threshold An apparatus for inspecting unevenness of color, which is repeatedly performed and performs control to move to the next operation on condition that the luminance deviation is not larger than a predetermined threshold value . カラー皮膜が透光性のあるカラー皮膜であり、基板が透光性のある基板であり、集光光学系が基板およびカラー皮膜を透過した光を集光するものである請求項７または請求項８に記載の色むら検査装置。 Color coating is a color coating is light-transmitting, a substrate in which the substrate is a light-transmitting property, according to claim 7 or claim converging optical system is one that condenses the light transmitted through the substrate and the color film The color unevenness inspection apparatus according to 8. カラー皮膜が透光性のあるカラー皮膜であり、基板が透光性のある基板であり、集光光学系がカラー皮膜で反射した光を集光するものである請求項７または請求項８に記載の色むら検査装置。 Color coating is a color coating is light-transmitting, a substrate in which the substrate is a light-transmitting property, a light converging optical system is reflected by the color coating to claim 7 or claim 8 in which condenses Color unevenness inspection device as described. カラー皮膜が透光性のあるカラー皮膜であり、基板が透光性のある基板であり、光源が基板を基準として互いに反対側に配置されてあり、集光光学系が基板およびカラー皮膜を透過した光、カラー皮膜で反射した光を集光するものである請求項７または請求項８に記載の色むら検査装置。 The color coating is a translucent color coating, the substrate is a translucent substrate, the light sources are arranged on opposite sides of the substrate, and the condensing optical system transmits the substrate and the color coating. The color unevenness inspection apparatus according to claim 7 or 8, wherein the light reflected by the color film is collected. 基板を基準として互いに反対側に配置された光源が、択一的に、基板に対して光を照射するものである請求項１１に記載の色むら検査装置。 The color unevenness inspection apparatus according to claim 11, wherein the light sources arranged on opposite sides with respect to the substrate alternatively irradiate the substrate with light. 焦点自動調整手段は、モアレを除去するように集光光学系の焦点の自動調整を行うものである請求項８から請求項１２の何れかに記載の色むら検査装置。 The color unevenness inspection apparatus according to any one of claims 8 to 12, wherein the focus automatic adjustment unit performs automatic adjustment of a focus of the condensing optical system so as to remove moire. 焦点自動調整手段は、基板の被測定面を中心とする被写界深度の外になるように集光光学系の焦点の自動調整を行うものである請求項８から請求項１２の何れかに記載の色むら検査装置。



The automatic focus adjustment means performs automatic adjustment of the focus of the condensing optical system so as to be outside the depth of field centered on the measurement surface of the substrate. Color unevenness inspection device as described.



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