JP4392677B2 - Printed wiring board - Google Patents

Printed wiring board Download PDF

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Publication number
JP4392677B2
JP4392677B2 JP01024299A JP1024299A JP4392677B2 JP 4392677 B2 JP4392677 B2 JP 4392677B2 JP 01024299 A JP01024299 A JP 01024299A JP 1024299 A JP1024299 A JP 1024299A JP 4392677 B2 JP4392677 B2 JP 4392677B2
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JP
Japan
Prior art keywords
opening
wiring board
printed wiring
resist film
conductor pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP01024299A
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Japanese (ja)
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JP2000208900A (en
Inventor
良彦 桐谷
裕二 井川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ibiden Co Ltd
Original Assignee
Ibiden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibiden Co Ltd filed Critical Ibiden Co Ltd
Priority to JP01024299A priority Critical patent/JP4392677B2/en
Publication of JP2000208900A publication Critical patent/JP2000208900A/en
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Publication of JP4392677B2 publication Critical patent/JP4392677B2/en
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  • Structures For Mounting Electric Components On Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、導体パターンの表面にレジスト被膜を形成し、レジスト被膜に形成した開口部を介して導体パターンの表面にめっき被膜を形成したプリント配線板に関する。
【0002】
【従来の技術】
従来、プリント配線板に外部接続用パッドを形成する場合には、導体パターンの表面に液体レジストを塗布し、紫外線露光した後、Na2CO3によるアルカリ現像を行い、数回の水洗を行った後、熱硬化してレジスト被膜を形成している。そして、パッドの位置に開口部を形成した後、全体にNi或いは金めっき処理を行い、導体パターンの表面にめっき被膜を形成している。
【0003】
【発明が解決しようとする課題】
然しながら、紫外線露光による開口部は、下端部が導体パターンに対して直角に形成されているので、めっき液の流れの関係上、めっき被膜と導体パターンとの接着強度が十分でないという問題がある。
【0004】
本発明は、上記の事情に鑑みてなされたもので、その目的は、外部接続用パッドの導体パターンに対する接着強度が十分に確保できるプリント配線板を提供するにある。
【0005】
【課題を解決するための手段】
この課題を解決するために本発明が採った手段は、実施例で使用する符号を付して説明すると、導体パターン3の表面にレジストを塗布し、露光・現像後熱硬化したレジスト被膜4の所定の部位に開口部5を形成したプリント配線板1において、
レジスト被膜4は、下端開口部5aの大きさを上端開口部5bよりも5〜50μm大に形成したので、めっき膜6は、レジスト被膜4の下に根が生えたように形成されて導体パターン3との密着力が高くなる。同時にレジスト被膜4もめっき膜6と強固に結合する。
【0006】
【発明の実施の形態】
以下、本発明の一実施例につき図面を参照して説明する。
【0007】
図2は本発明のレジスト被膜4が形成されたプリント配線板1の断面図を表すもので、基板2の表面に導体パターン3が形成されており、これの表面にレジスト被膜4が後述の工程を経て形成されている。このレジスト被膜4には所定の位置に開口部5が形成されている。
【0008】
この開口部5の大きさは、図1(a)に示すように、導体パターン3に接する下端開口部5a(寸法A)が若干大きい。そして、その径の差(A−B)は、5〜50μmで、好ましくは、10〜40μmである。
【0009】
このように、下端部5aを径大に形成した本実施例によれば、開口部5を外部接続用端子として利用するため、導体パターン3の上にNiめっき或いは金めっきを施すと、図1(b)に示すように、めっき膜6は、レジスト被膜4の下に根が生えたように形成されて導体パターン3との密着力が高くなる。同時にレジスト被膜4もめっき膜6と強固に結合するという効果を奏するものである。
【0010】
尚、下端開口部5aの広がり状態は、上端開口部5bに対して径の差が5μm以下の場合は、導体パターン3とめっき膜6との密着力が十分でなく、また、その差が50μm以上ある場合は、レジスト被膜4自体の接着力が急激に弱くなって剥離する虞がある。
【0011】
尚、開口部5の形状は、図3に示す形状であっても良い。
【0012】
次に、レジスト被膜4の下端開口部5aを径大に形成するレジスト被膜の製造方法に関して説明する。図5に示すように、導体パターン3を前処理した後、その表面に液体レジストを印刷する。そして、これを紫外線で300〜900mJ露光する。
【0013】
つぎに、Na2CO3によるアルカリ現像を行い、この溶液をリンスした後、それぞれ5〜30秒間の水洗を数回行う。この水洗用の溶液は、イオン交換により生成された純水(以降単にイオン水という)にCaCl2 等を添加してCaイオン濃度を17〜20mg/Lにした水溶液が利用される。この水溶液は、Mg,Sr,Ba,Raを含む同じイオン濃度でもよい。
【0014】
そして、液切りして乾燥し、最後に紫外線硬化、熱硬化を行う。
【0015】
本発明のレジスト被膜の製造方法は、水洗用液のCaイオン濃度を17〜20mg/Lにしたことにより、レジスト被膜4の下端開口部5aは、上端開口部5bよりも広がり状態に形成され、Naが完全に排除されたときには、図1(a)に示すように、上端開口部5bよりも5〜50μm径大に形成される。
【0016】
つぎに、水洗溶液のCaイオン濃度とNaとの関係に関して説明する。図6は、Caイオン濃度とNa残渣量との関係を示す。これによれば、Caイオン濃度を17mg/L以上に設定すれば、Naの残渣量を0にすることができる。
【0017】
しかし、Caイオン濃度が20mg/Lであっても、水溶液を繰り返し使用すると、図7に示すようにNa残渣量は漸次増加するので、水溶液の使用限度を設定して常時管理する必要がある。
【0018】
図8〜図10は、Caイオン濃度と開口部5の下端開口部5aの広がりとの関係を示したものである。これによれば、Na残渣量及び下端開口部5aの広がりと、ともにCaイオン濃度を17mg/L〜20mg/Lに設定すれば、良好な結果を得ることができる。
【0019】
【発明の効果】
本発明は、導体パターンの表面にレジストを塗布し、露光・現像後熱硬化したレジスト被膜の所定の部位に開口部を形成したプリント配線板において、
前記レジスト被膜は、下端開口部の大きさを上端開口部よりも5〜50μm大に形成したので、外部接続用パッドを形成するためにめっき膜を形成する場合には、導体パターンとの密着力を高くするとともにめっき膜とレジスト被膜とを強固に結合することができるという効果を奏するものである。
【図面の簡単な説明】
【図1】 図2における円形部の拡大断面図であり、(a)は開口部の断面図、(b)は導体パターンにめっき膜を形成した図である。
【図2】 プリント配線板の断面図である。
【図3】 開口部の他の実施例における断面図である。
【図4】 開口部の異なる実施例における断面図である。
【図5】 レジスト被膜の製造工程を示す図である。
【図6】 水洗溶液のCaイオン濃度とNa残渣量の関係を示す図である。
【図7】 処理枚数に対するNa残渣量の関係を示す図である。
【図8】 水洗溶液のCaイオン濃度とレジスト被膜開口部の広がりの関係を示す図である。
【図9】 処理枚数に対するレジスト被膜開口部の広がりの関係を示す図である。
【図10】 処理枚数に対するレジスト被膜開口部の広がりの関係を示す図である。
【符号の説明】
1 プリント配線板
2 基板
3 導体パターン
4 レジスト被膜
5 開口部
5a下端開口部
5b上端開口部
6 めっき膜
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a printed wiring board in which a resist film is formed on the surface of a conductor pattern, and a plating film is formed on the surface of the conductor pattern through an opening formed in the resist film.
[0002]
[Prior art]
Conventionally, when forming an external connection pad on a printed wiring board, a liquid resist is applied to the surface of the conductor pattern, exposed to ultraviolet light, then alkali developed with Na 2 CO 3 and washed with water several times. Thereafter, the resist film is formed by thermosetting. And after forming an opening part in the position of a pad, Ni or gold plating processing is performed to the whole, and the plating film is formed in the surface of a conductor pattern.
[0003]
[Problems to be solved by the invention]
However, since the lower end of the opening by ultraviolet exposure is formed at right angles to the conductor pattern, there is a problem that the adhesive strength between the plating film and the conductor pattern is not sufficient due to the flow of the plating solution.
[0004]
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a printed wiring board capable of sufficiently securing the adhesive strength of the external connection pad to the conductor pattern.
[0005]
[Means for Solving the Problems]
The means taken by the present invention to solve this problem will be described with reference numerals used in the examples. When the resist film 4 is coated with a resist on the surface of the conductor pattern 3 and is thermally cured after exposure and development, In the printed wiring board 1 in which the opening 5 is formed in a predetermined part,
Since the resist film 4 is formed so that the size of the lower end opening 5a is 5 to 50 μm larger than that of the upper end opening 5b, the plating film 6 is formed so as to have roots under the resist film 4 to form a conductor pattern. Adhesion with 3 is increased. At the same time, the resist film 4 is firmly bonded to the plating film 6.
[0006]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
[0007]
FIG. 2 shows a cross-sectional view of the printed wiring board 1 on which the resist coating 4 of the present invention is formed. The conductor pattern 3 is formed on the surface of the substrate 2, and the resist coating 4 is formed on the surface of the conductive coating 3 as will be described later. It is formed through. Openings 5 are formed in the resist film 4 at predetermined positions.
[0008]
The size of the opening 5 is slightly larger at the lower end opening 5a (dimension A) in contact with the conductor pattern 3, as shown in FIG. And the difference (AB) of the diameter is 5-50 micrometers, Preferably, it is 10-40 micrometers.
[0009]
As described above, according to the present embodiment in which the lower end portion 5a is formed to have a large diameter, when the opening portion 5 is used as an external connection terminal, when Ni plating or gold plating is applied on the conductor pattern 3, FIG. As shown in (b), the plating film 6 is formed as if roots have grown under the resist film 4, and the adhesion with the conductor pattern 3 is increased. At the same time, the resist film 4 also has the effect of being firmly bonded to the plating film 6.
[0010]
In addition, when the difference in diameter with respect to the upper end opening 5b is 5 μm or less, the lower end opening 5a is not sufficiently adhered to the conductive pattern 3 and the plating film 6, and the difference is 50 μm. In the case described above, the adhesive force of the resist coating 4 itself may be weakened and peeled off.
[0011]
The shape of the opening 5, but it may also have the shape shown in FIG.
[0012]
Next, a method for manufacturing a resist film in which the lower end opening 5a of the resist film 4 is formed in a large diameter will be described. As shown in FIG. 5, after the conductor pattern 3 is pretreated, a liquid resist is printed on the surface thereof. Then, this is exposed to 300 to 900 mJ with ultraviolet rays.
[0013]
Next, alkali development with Na 2 CO 3 is performed, and the solution is rinsed, followed by washing with water for 5 to 30 seconds several times. As this washing solution, an aqueous solution in which CaCl 2 or the like is added to pure water generated by ion exchange (hereinafter simply referred to as ionic water) to a Ca ion concentration of 17 to 20 mg / L is used. This aqueous solution may have the same ion concentration including Mg, Sr, Ba, and Ra.
[0014]
Then, the liquid is drained and dried, and finally UV curing and heat curing are performed.
[0015]
In the method for producing a resist film of the present invention, the Ca ion concentration of the washing solution is set to 17 to 20 mg / L, whereby the lower end opening 5a of the resist film 4 is formed to be wider than the upper end opening 5b. When Na is completely removed, as shown in FIG. 1A, it is formed to have a diameter of 5 to 50 μm larger than the upper end opening 5b.
[0016]
Next, the relationship between the Ca ion concentration of the water washing solution and Na will be described. FIG. 6 shows the relationship between the Ca ion concentration and the amount of Na residue. According to this, if the Ca ion concentration is set to 17 mg / L or more, the amount of Na residue can be reduced to zero.
[0017]
However, even when the Ca ion concentration is 20 mg / L, if the aqueous solution is repeatedly used, the amount of Na residue gradually increases as shown in FIG. 7, and therefore it is necessary to set the use limit of the aqueous solution and always manage it.
[0018]
8 to 10 show the relationship between the Ca ion concentration and the spread of the lower end opening 5 a of the opening 5. According to this, if the Ca ion concentration is set to 17 mg / L to 20 mg / L together with the amount of Na residue and the spread of the lower end opening 5a, good results can be obtained.
[0019]
【The invention's effect】
The present invention is a printed wiring board in which a resist is applied to the surface of a conductor pattern, and an opening is formed in a predetermined portion of a resist film that is thermally cured after exposure and development.
The resist film has a lower end opening 5-50 μm larger than the upper end opening. Therefore, when forming a plating film to form an external connection pad, the adhesion strength with the conductor pattern As a result, the plating film and the resist film can be firmly bonded together.
[Brief description of the drawings]
1 is an enlarged sectional view of a circular portion in FIG. 2, (a) is a sectional view of an opening, and (b) is a diagram in which a plating film is formed on a conductor pattern.
FIG. 2 is a cross-sectional view of a printed wiring board.
FIG. 3 is a cross-sectional view of another embodiment of the opening.
FIG. 4 is a cross-sectional view of different examples of openings.
FIG. 5 is a diagram showing a resist film manufacturing process.
FIG. 6 is a diagram showing the relationship between the Ca ion concentration of the water washing solution and the amount of Na residue.
FIG. 7 is a diagram showing the relationship of the amount of Na residue to the number of processed sheets.
FIG. 8 is a diagram showing the relationship between the Ca ion concentration of the water washing solution and the spread of the resist coating opening.
FIG. 9 is a diagram showing the relationship of the opening of a resist film opening to the number of processed sheets.
FIG. 10 is a diagram showing the relationship between the spread of resist film openings and the number of processed sheets.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Printed wiring board 2 Board | substrate 3 Conductor pattern 4 Resist film 5 Opening part 5a Lower end opening part 5b Upper end opening part 6 Plating film

Claims (5)

導体パターンの表面にレジストを塗布し、露光・現像後熱硬化したレジスト被膜の所定の部位に外部接続用端子として利用される開口部を形成したプリント配線板において、
前記レジスト被膜は、下端開口部の大きさを上端開口部よりも5〜50μm大である開口部を有し、前記開口部の大きさが漸次増加されることを特徴とするプリント配線板。
In a printed wiring board in which an opening used as an external connection terminal is formed in a predetermined part of a resist film which is applied to the surface of the conductor pattern and thermally cured after exposure and development,
The printed circuit board according to claim 1, wherein the resist film has an opening having a size of a lower end opening of 5 to 50 μm larger than the upper end opening, and the size of the opening is gradually increased.
前記開口部の大きさが、上端開口部から下端開口部にかけて漸次増加されることを特徴とする請求項1に記載のプリント配線板。  The printed wiring board according to claim 1, wherein the size of the opening is gradually increased from the upper end opening to the lower end opening. 前記開口部において、前記導体パターンの表面にめっき被膜が形成されてなることを特徴とする請求項1又は2に記載のプリント配線板。 The printed wiring board according to claim 1 , wherein a plating film is formed on the surface of the conductor pattern in the opening . 前記めっき被膜が、Ni又は金めっきからなることを特徴とする請求項3に記載のプリント配線板。  The printed wiring board according to claim 3, wherein the plating film is made of Ni or gold plating. 前記レジスト被膜が、紫外線硬化型の樹脂からなることを特徴とする請求項1から4のいずれかに記載のプリント配線板。  The printed wiring board according to claim 1, wherein the resist film is made of an ultraviolet curable resin.
JP01024299A 1999-01-19 1999-01-19 Printed wiring board Expired - Lifetime JP4392677B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP01024299A JP4392677B2 (en) 1999-01-19 1999-01-19 Printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP01024299A JP4392677B2 (en) 1999-01-19 1999-01-19 Printed wiring board

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JP2000208900A JP2000208900A (en) 2000-07-28
JP4392677B2 true JP4392677B2 (en) 2010-01-06

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006005112A (en) * 2004-06-17 2006-01-05 Shinko Electric Ind Co Ltd Semiconductor device and circuit board used therefor
CN102045939B (en) * 2009-10-19 2014-04-30 巨擘科技股份有限公司 Metal layer structure of flexible multilayer base plate and preparation method thereof

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