JP4374330B2 - 一酸化珪素系蒸着材料及びその製造方法 - Google Patents
一酸化珪素系蒸着材料及びその製造方法 Download PDFInfo
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- JP4374330B2 JP4374330B2 JP2005176244A JP2005176244A JP4374330B2 JP 4374330 B2 JP4374330 B2 JP 4374330B2 JP 2005176244 A JP2005176244 A JP 2005176244A JP 2005176244 A JP2005176244 A JP 2005176244A JP 4374330 B2 JP4374330 B2 JP 4374330B2
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- Prior art keywords
- vapor deposition
- silicon monoxide
- deposition material
- sio
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- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 title claims description 134
- 238000007740 vapor deposition Methods 0.000 title claims description 63
- 239000000463 material Substances 0.000 title claims description 61
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 238000005245 sintering Methods 0.000 claims description 32
- 239000000843 powder Substances 0.000 claims description 23
- 230000008020 evaporation Effects 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 230000001376 precipitating effect Effects 0.000 claims 1
- 239000002994 raw material Substances 0.000 description 21
- 238000002441 X-ray diffraction Methods 0.000 description 19
- 238000000034 method Methods 0.000 description 14
- 230000002776 aggregation Effects 0.000 description 8
- 239000011230 binding agent Substances 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 238000005054 agglomeration Methods 0.000 description 6
- 230000015271 coagulation Effects 0.000 description 6
- 238000005345 coagulation Methods 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 238000001556 precipitation Methods 0.000 description 6
- 208000010392 Bone Fractures Diseases 0.000 description 5
- 206010017076 Fracture Diseases 0.000 description 5
- 230000004931 aggregating effect Effects 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 238000009766 low-temperature sintering Methods 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- 230000008021 deposition Effects 0.000 description 4
- 206010010214 Compression fracture Diseases 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000011835 investigation Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 238000005019 vapor deposition process Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000003631 expected effect Effects 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/14—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silica
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/42—Non metallic elements added as constituents or additives, e.g. sulfur, phosphor, selenium or tellurium
- C04B2235/428—Silicon
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/656—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes characterised by specific heating conditions during heat treatment
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
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- Chemical & Material Sciences (AREA)
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- Chemical Kinetics & Catalysis (AREA)
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- Ceramic Engineering (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Structural Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Theoretical Computer Science (AREA)
- Physical Vapour Deposition (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Liquid Crystal (AREA)
Description
2 凝集室
Claims (2)
- 一酸化珪素の蒸着膜の形成に使用される粉末焼結型の一酸化珪素系蒸着材料において、XRDにより得られた生データグラフをデータ特定数3で移動平均近似曲線に変換したとき、その曲線上で2θ=28°付近に発生するSiピーク点におけるピーク強度P1と、ピーク点前後の平均勾配から想定したピーク点におけるベース強度P2との関係が、P1/P2≦3を満足し、且つ圧縮破壊強度が5MPa以上である一酸化珪素系蒸着材料。
- 一酸化珪素の蒸着膜の形成に使用される粉末焼結型の一酸化珪素系蒸着材料を製造する際に、析出SiOからなる原料粉末を700〜1000℃で焼結すると共に、真空凝集装置で製造された析出SiOを選別使用することにより、圧縮破壊強度が5MPa以上の一酸化珪素系蒸着材料を製造する一酸化珪素系蒸着材料の製造方法。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005176244A JP4374330B2 (ja) | 2005-06-16 | 2005-06-16 | 一酸化珪素系蒸着材料及びその製造方法 |
US11/916,452 US8142751B2 (en) | 2005-06-16 | 2006-06-05 | Silicon monoxide vapor deposition material and process for producing the same |
PCT/JP2006/311190 WO2006134792A1 (ja) | 2005-06-16 | 2006-06-05 | 一酸化珪素系蒸着材料及びその製造方法 |
EP06747170A EP1892313A4 (en) | 2005-06-16 | 2006-06-05 | SILICON OXIDE VAPOR DEPOSITION MATERIAL AND METHOD FOR PRODUCING THE SAME |
KR1020077029332A KR100970345B1 (ko) | 2005-06-16 | 2006-06-05 | 일산화규소계 증착 재료 및 이의 제조방법 |
TW095121338A TWI322189B (en) | 2005-06-16 | 2006-06-15 | Sio-based deposition material and the process thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005176244A JP4374330B2 (ja) | 2005-06-16 | 2005-06-16 | 一酸化珪素系蒸着材料及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006348348A JP2006348348A (ja) | 2006-12-28 |
JP4374330B2 true JP4374330B2 (ja) | 2009-12-02 |
Family
ID=37532154
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005176244A Expired - Fee Related JP4374330B2 (ja) | 2005-06-16 | 2005-06-16 | 一酸化珪素系蒸着材料及びその製造方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8142751B2 (ja) |
EP (1) | EP1892313A4 (ja) |
JP (1) | JP4374330B2 (ja) |
KR (1) | KR100970345B1 (ja) |
TW (1) | TWI322189B (ja) |
WO (1) | WO2006134792A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4993297B2 (ja) * | 2007-11-30 | 2012-08-08 | 株式会社大阪チタニウムテクノロジーズ | SiO焼結蒸着材料 |
JP4666184B2 (ja) * | 2008-03-12 | 2011-04-06 | 信越化学工業株式会社 | フィルム蒸着用酸化珪素焼結体の製造方法、及び酸化珪素蒸着フィルムの製造方法 |
JP2010235966A (ja) * | 2009-03-30 | 2010-10-21 | Toppan Printing Co Ltd | SiOx成形体、およびガスバリア性フィルム |
JP5533049B2 (ja) * | 2010-03-08 | 2014-06-25 | 凸版印刷株式会社 | 蒸着材料およびその製造方法 |
CN114822230B (zh) * | 2021-01-29 | 2023-09-19 | 云谷(固安)科技有限公司 | 显示面板 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA650156A (en) * | 1962-10-09 | S. Wagener Johann | Method of making silicon monoxide articles | |
US3010839A (en) * | 1959-07-01 | 1961-11-28 | Union Carbide Corp | Method of making silicon monoxide articles |
US3728436A (en) * | 1970-11-09 | 1973-04-17 | V Kokin | Method of obtaining silicon monoxide |
JPS63166965A (ja) * | 1986-12-27 | 1988-07-11 | Koujiyundo Kagaku Kenkyusho:Kk | 蒸着用タ−ゲツト |
JPS63310961A (ja) | 1987-06-11 | 1988-12-19 | Canon Inc | 蒸着用材料 |
JPH0428858A (ja) * | 1990-05-24 | 1992-01-31 | Mitsubishi Heavy Ind Ltd | 蒸着用材料の製造方法 |
JP3725200B2 (ja) * | 1995-04-26 | 2005-12-07 | 住友チタニウム株式会社 | 蒸着用材料とその成形体の製造方法 |
US20040182700A1 (en) * | 2001-07-26 | 2004-09-23 | Yoshitake Natsume | Silicon monoxide sintered prroduct and method for production thereof |
EP1443126B1 (en) * | 2001-09-17 | 2008-05-07 | OSAKA Titanium Technologies Co., Ltd. | Silicon monoxide vapor deposition material and method for preparation thereof |
JP3828434B2 (ja) * | 2002-02-22 | 2006-10-04 | 住友チタニウム株式会社 | 一酸化ケイ素の焼結体およびその製造方法 |
JP2004076120A (ja) * | 2002-08-21 | 2004-03-11 | Shin Etsu Chem Co Ltd | フィルム蒸着用酸化珪素及びその製造方法 |
JP3930452B2 (ja) * | 2003-04-28 | 2007-06-13 | 住友チタニウム株式会社 | 一酸化珪素焼結体およびスパッタリングターゲット |
CN101014534B (zh) * | 2004-09-01 | 2011-05-18 | 株式会社大阪钛技术 | SiO蒸镀材料、SiO原料用Si粉末及SiO的制造方法 |
-
2005
- 2005-06-16 JP JP2005176244A patent/JP4374330B2/ja not_active Expired - Fee Related
-
2006
- 2006-06-05 WO PCT/JP2006/311190 patent/WO2006134792A1/ja active Application Filing
- 2006-06-05 KR KR1020077029332A patent/KR100970345B1/ko not_active IP Right Cessation
- 2006-06-05 EP EP06747170A patent/EP1892313A4/en not_active Withdrawn
- 2006-06-05 US US11/916,452 patent/US8142751B2/en not_active Expired - Fee Related
- 2006-06-15 TW TW095121338A patent/TWI322189B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US8142751B2 (en) | 2012-03-27 |
WO2006134792A1 (ja) | 2006-12-21 |
US20090117023A1 (en) | 2009-05-07 |
KR100970345B1 (ko) | 2010-07-16 |
EP1892313A1 (en) | 2008-02-27 |
KR20080025681A (ko) | 2008-03-21 |
TW200706668A (en) | 2007-02-16 |
EP1892313A4 (en) | 2010-01-27 |
JP2006348348A (ja) | 2006-12-28 |
TWI322189B (en) | 2010-03-21 |
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