JP4297424B2 - プラズモン発生装置 - Google Patents
プラズモン発生装置 Download PDFInfo
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- JP4297424B2 JP4297424B2 JP2003330562A JP2003330562A JP4297424B2 JP 4297424 B2 JP4297424 B2 JP 4297424B2 JP 2003330562 A JP2003330562 A JP 2003330562A JP 2003330562 A JP2003330562 A JP 2003330562A JP 4297424 B2 JP4297424 B2 JP 4297424B2
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- plasmon
- dielectric constant
- thickness
- negative dielectric
- thin film
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Description
Kx=(ε1 )1/2 ・(ω・sin θ)/C …(1)
Kp=ω・{(ε2 ε3 )/(ε2 +ε3 )}1/2 /C …(2)
但し、
ω:入射光の角振動数
θ:入射光の入射角度
C:光速度
ε1 :プリズムの誘電率
ε2 :金属薄膜の誘電率
ε3 :包囲材料の誘電率
である。上記KxとKpが一致するように入射光の入射角度θを調整することにより、プラズモンを励起することができる。
T.Yatsui, M.Kourogi and M.Ohtsu, "Plasmon waveguide for optical far/near-field conversion", Applied Physics Letters, vol.79, No.27, p4583-4585, (2001)
32 金属薄膜
34 包囲材料
40 入射光
42 エバネッセント光
Claims (3)
- 基材の表面に負誘電率材料膜を形成し、基材界面で全反射する入射光によりプラズモンを励起し、励起されたプラズモンが負誘電率材料膜上を伝搬する構造のプラズモン発生装置において、負誘電率材料膜の厚さがプラズモン伝搬方向で変化し、励起部分の負誘電率材料膜の厚さは30nm以下、伝搬部分の負誘電率材料膜の厚さは50nm以上に設定されていることを特徴とするプラズモン発生装置。
- 励起部分の負誘電率材料膜の厚さは20nm以下であり、伝搬部分の負誘電率材料膜の厚さは70nm以上であって、両者は徐々に厚みが変わる結合区間を経て連続している請求項1記載のプラズモン発生装置。
- 負誘電率材料膜が、金、銀、銅、アルミニウムのいずれか1種以上の薄膜からなる請求項1又は2記載のプラズモン発生装置。
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JP2003330562A JP4297424B2 (ja) | 2003-09-22 | 2003-09-22 | プラズモン発生装置 |
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JP2003330562A JP4297424B2 (ja) | 2003-09-22 | 2003-09-22 | プラズモン発生装置 |
Publications (2)
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JP2005098756A JP2005098756A (ja) | 2005-04-14 |
JP4297424B2 true JP4297424B2 (ja) | 2009-07-15 |
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JP2003330562A Expired - Fee Related JP4297424B2 (ja) | 2003-09-22 | 2003-09-22 | プラズモン発生装置 |
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2003
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