JP4294050B2 - 半導体装置およびその製造方法 - Google Patents
半導体装置およびその製造方法 Download PDFInfo
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- 239000004065 semiconductor Substances 0.000 title claims description 76
- 238000004519 manufacturing process Methods 0.000 title claims description 23
- 239000012535 impurity Substances 0.000 claims description 54
- 239000000758 substrate Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 18
- 229910052785 arsenic Inorganic materials 0.000 description 27
- -1 arsenic ions Chemical class 0.000 description 25
- 238000009792 diffusion process Methods 0.000 description 23
- 239000000523 sample Substances 0.000 description 21
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 14
- 229910052710 silicon Inorganic materials 0.000 description 14
- 239000010703 silicon Substances 0.000 description 14
- 238000005530 etching Methods 0.000 description 9
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 9
- 229910052753 mercury Inorganic materials 0.000 description 9
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 8
- 238000009826 distribution Methods 0.000 description 8
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 8
- 229920005591 polysilicon Polymers 0.000 description 8
- 229910004298 SiO 2 Inorganic materials 0.000 description 7
- 230000015556 catabolic process Effects 0.000 description 7
- 238000002474 experimental method Methods 0.000 description 7
- 150000002500 ions Chemical class 0.000 description 7
- HAYXDMNJJFVXCI-UHFFFAOYSA-N arsenic(5+) Chemical compound [As+5] HAYXDMNJJFVXCI-UHFFFAOYSA-N 0.000 description 6
- 229910052796 boron Inorganic materials 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 238000005468 ion implantation Methods 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 4
- 238000001020 plasma etching Methods 0.000 description 4
- 239000000969 carrier Substances 0.000 description 3
- 230000000994 depressogenic effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004151 rapid thermal annealing Methods 0.000 description 3
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000002513 implantation Methods 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- RLOWWWKZYUNIDI-UHFFFAOYSA-N phosphinic chloride Chemical compound ClP=O RLOWWWKZYUNIDI-UHFFFAOYSA-N 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
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Description
図1は、本発明の第1実施形態による半導体装置1の断面図である。図2は、本発明の第1実施形態による半導体装置1の平面図である。なお、図1は、図2の100−100線に沿った断面図を表している。
図12は、ゲート絶縁膜に打ち込まれたイオンが、ゲート絶縁膜の絶縁耐圧に及ぼす影響を確認するために行った実験に用いたサンプルの断面図である。
図14は、本発明の第2実施形態による半導体装置2の構造を示した断面図である。この半導体装置2では、上記第1実施形態と異なり、ゲート電極41のゲート絶縁膜17に接触する部分の上端部41aは、略円弧形状を有する。
図15は、本発明の第3実施形態による半導体装置3の構造を示した断面図である。この半導体装置3では、上記第2実施形態と異なり、ゲート電極42に開口部42cが形成されている。
16 溝部
17 ゲート絶縁膜(絶縁膜)
18 ゲート電極
18a、41a、42a、43a、44a 上端部
41b、42b 最上端
42c 開口部
Claims (5)
- 半導体基板の主表面に形成された溝部と、
前記溝部の表面上に形成された絶縁膜と、
前記溝部内の前記絶縁膜に接触するように形成されたゲート電極と、
前記溝部に隣接するように形成されたソース不純物領域とを備え、
前記ゲート電極の前記絶縁膜に接触する部分の上端部は、前記ソース不純物領域を形成するために前記半導体基板の表面上から導入される不純物の前記絶縁膜に対する飛程以上深い位置で、かつ、前記ソース不純物領域の下面より上に位置する、半導体装置。 - 前記ゲート電極の前記絶縁膜に接触する部分の上端部は、略円弧形状を有する、請求項1に記載の半導体装置。
- 前記ゲート電極の前記絶縁膜に接触する部分以外の部分の最上端は、前記不純物の前記絶縁膜に対する飛程の深さよりも高い位置に配置され、前記ゲート電極の前記略円弧形状の絶縁膜に接触する部分は、前記飛程以上深い位置に位置する、請求項2に記載の半導体装置。
- 前記ゲート電極は、前記絶縁膜に接触する部分以外に、前記溝部の底面に位置する前記絶縁膜まで達する開口部が形成されている、請求項1〜3のいずれか1項に記載の半導体装置。
- 半導体基板の主表面に溝部を形成する工程と、
前記溝部の表面上に絶縁膜を形成する工程と、
前記溝部内の前記絶縁膜に接触するように、ゲート電極を形成する工程と、
前記溝部に隣接するように、前記半導体基板の表面に不純物をイオン注入することによりソース不純物領域を形成する工程とを備え、
前記ゲート電極を形成する工程は、前記ゲート電極の前記絶縁膜に接触する部分の上端部が、前記イオン注入される不純物の前記絶縁膜に対する飛程以上深い位置で、かつ、前記ソース不純物領域の下面より上に位置するように、前記ゲート電極を形成する工程を含む、半導体装置の製造方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
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JP2006353305A JP4294050B2 (ja) | 2006-12-27 | 2006-12-27 | 半導体装置およびその製造方法 |
CNA2007101865738A CN101211974A (zh) | 2006-12-27 | 2007-12-12 | 半导体装置及其制造方法 |
US11/965,536 US8319281B2 (en) | 2006-12-27 | 2007-12-27 | Semiconductor device with insulated gate formed within grooved portion formed therein |
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JP2006353305A JP4294050B2 (ja) | 2006-12-27 | 2006-12-27 | 半導体装置およびその製造方法 |
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JP2008166434A JP2008166434A (ja) | 2008-07-17 |
JP4294050B2 true JP4294050B2 (ja) | 2009-07-08 |
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US (1) | US8319281B2 (ja) |
JP (1) | JP4294050B2 (ja) |
CN (1) | CN101211974A (ja) |
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EP2985790B1 (en) | 2013-04-11 | 2021-06-09 | Fuji Electric Co., Ltd. | Semiconductor device and semiconductor device manufacturing method |
WO2014192234A1 (ja) * | 2013-05-31 | 2014-12-04 | 富士電機株式会社 | 半導体装置の製造方法 |
JP2017107895A (ja) * | 2015-12-07 | 2017-06-15 | サンケン電気株式会社 | 半導体装置 |
JP6744270B2 (ja) * | 2017-09-20 | 2020-08-19 | 株式会社東芝 | 半導体装置及びその製造方法 |
TWI686903B (zh) * | 2019-02-01 | 2020-03-01 | 綠星電子股份有限公司 | 斷閘極金氧半場效電晶體的閘極結構及其製造方法 |
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US5898207A (en) | 1996-02-13 | 1999-04-27 | Matsushita Electric Industrial Co., Ltd. | Method for making a semiconductor device |
JP2003224272A (ja) | 1996-02-13 | 2003-08-08 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法および半導体装置 |
JP2000349289A (ja) | 1999-03-29 | 2000-12-15 | Fuji Electric Co Ltd | 半導体装置およびその製造方法 |
US6657254B2 (en) * | 2001-11-21 | 2003-12-02 | General Semiconductor, Inc. | Trench MOSFET device with improved on-resistance |
KR100553703B1 (ko) * | 2003-10-01 | 2006-02-24 | 삼성전자주식회사 | 반도체 소자 및 그 형성 방법 |
JP2006080177A (ja) * | 2004-09-08 | 2006-03-23 | Sanyo Electric Co Ltd | 半導体装置およびその製造方法 |
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2006
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US20080185638A1 (en) | 2008-08-07 |
US8319281B2 (en) | 2012-11-27 |
JP2008166434A (ja) | 2008-07-17 |
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