JP4257425B2 - 新規な無機化合物、それを用いた超硬材料及びその製造方法 - Google Patents
新規な無機化合物、それを用いた超硬材料及びその製造方法 Download PDFInfo
- Publication number
- JP4257425B2 JP4257425B2 JP2004070349A JP2004070349A JP4257425B2 JP 4257425 B2 JP4257425 B2 JP 4257425B2 JP 2004070349 A JP2004070349 A JP 2004070349A JP 2004070349 A JP2004070349 A JP 2004070349A JP 4257425 B2 JP4257425 B2 JP 4257425B2
- Authority
- JP
- Japan
- Prior art keywords
- niobium
- producing
- oxycarbide
- material according
- carbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 title claims description 21
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 150000002484 inorganic compounds Chemical class 0.000 title description 4
- 229910010272 inorganic material Inorganic materials 0.000 title description 4
- 239000010955 niobium Substances 0.000 claims description 33
- 229910052758 niobium Inorganic materials 0.000 claims description 32
- 239000000758 substrate Substances 0.000 claims description 32
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 31
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 16
- 229910052799 carbon Inorganic materials 0.000 claims description 13
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 10
- 239000001301 oxygen Substances 0.000 claims description 10
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 8
- 239000001569 carbon dioxide Substances 0.000 claims description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 8
- 239000004215 Carbon black (E152) Substances 0.000 claims description 6
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 6
- 238000002441 X-ray diffraction Methods 0.000 claims description 6
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 6
- 229930195733 hydrocarbon Natural products 0.000 claims description 6
- 150000002430 hydrocarbons Chemical class 0.000 claims description 6
- 238000009832 plasma treatment Methods 0.000 claims description 6
- 238000005240 physical vapour deposition Methods 0.000 claims description 5
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 238000002294 plasma sputter deposition Methods 0.000 claims description 3
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 claims description 2
- 239000001273 butane Substances 0.000 claims description 2
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 claims description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 claims description 2
- 239000001294 propane Substances 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 description 15
- 238000000576 coating method Methods 0.000 description 15
- 239000007789 gas Substances 0.000 description 15
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 229910052786 argon Inorganic materials 0.000 description 7
- 239000012495 reaction gas Substances 0.000 description 7
- 238000005546 reactive sputtering Methods 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 239000010935 stainless steel Substances 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- -1 metal oxycarbide Chemical class 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 150000002821 niobium Chemical class 0.000 description 1
- 229910052704 radon Inorganic materials 0.000 description 1
- SYUHGPGVQRZVTB-UHFFFAOYSA-N radon atom Chemical compound [Rn] SYUHGPGVQRZVTB-UHFFFAOYSA-N 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Physical Vapour Deposition (AREA)
Description
本発明のニオブオキシカーバイドは、文献未載の新規な無機化合物であって、基板上に(200)方向に配向した立方晶(格子定数0.452nm)結晶層として形成される。このニオブオキシカーバイドは、特定のX線回折パターンを有し、炭素含有量が多い点に特徴がある。
このものは、基板温度を300〜450℃に保ち、一酸化炭素又は二酸化炭素或いはその両方の存在下、ニオブをプラズマ処理又はスパッタリング処理により物理蒸着させることによって形成される。
このプラズマ処理は、例えば炭素供給源及び酸素供給源として、二酸化炭素及び一酸化炭素の中から選ばれた少なくとも1種すなわち二酸化炭素単独、一酸化炭素単独又は二酸化炭素と一酸化炭素との混合物からなる反応ガスを用いて行われる。この際、二酸化炭素又は一酸化炭素は炭素供給源及び酸素供給源の両方の役割を果すが、炭素供給源と酸素供給源とを別々に用いてもよい。
また、この反応ガス中には、所望の被覆中の酸素量を調節するために、少量例えば反応ガス全体に対する流量比で10体積%以下の酸素を加えることもできる。
他方、スパッタリング処理による物理蒸着は、反応性スパッタリング法、高周波励起反応性スパッタリング法(以下RF反応性スパッタリング法という)などによって行われる。反応性スパッタリング法においては基板電極に負の直流バイアスを印加するため、接地しないような条件を用いると、膜質が向上するので好ましい。
この物理蒸着に際しては、基板温度を300〜450℃、好ましくは350〜400℃に保つことが必要である。この範囲を逸脱すると十分な膜厚の被覆が得られない。
真空度;0.7Pa
スパッタ電源出力;0.3kW
基板温度;400℃
RF出力;40W
基板バイアス;−250V
ガス流量比;Ar:CO2:CH4:He=10.8:1.2:0.3:4.2(sccm)
処理時間;1時間
Claims (9)
- ニオブ28%、炭素61%及び酸素11%の原子割合を有する立方晶ニオブオキシカーバイド。
- 皮膜のX線回折パターンにおいて(111)、(200)及び(220)反射が認められる請求項1記載の立方晶ニオブオキシカーバイド。
- 基体表面に請求項1又は2記載の立方晶ニオブオキシカーバイド被覆層を形成させてなる超硬材料。
- 300〜450℃に保った基板に、炭素供給源及び酸素供給源の存在下、ニオブを物理蒸着させることを特徴とする請求項3記載の超硬材料の製造方法。
- 物理蒸着がプラズマ処理又はスパッタリング処理により行われる請求項4記載の超硬材料の製造方法。
- 炭素供給源及び酸素供給源が一酸化炭素又は二酸化炭素或いはその両方である請求項4又は5記載の超硬材料の製造方法。
- さらに低級炭化水素を存在させて行う請求項4、5又は6記載の超硬材料の製造方法。
- 低級炭化水素が炭素数4以下の炭化水素である請求項7記載の超硬材料の製造方法。
- 炭素数4以下の炭化水素がメタン、エタン、プロパン又はブタンである請求項8記載の超硬材料の製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004070349A JP4257425B2 (ja) | 2004-03-12 | 2004-03-12 | 新規な無機化合物、それを用いた超硬材料及びその製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004070349A JP4257425B2 (ja) | 2004-03-12 | 2004-03-12 | 新規な無機化合物、それを用いた超硬材料及びその製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2005255472A JP2005255472A (ja) | 2005-09-22 |
JP2005255472A5 JP2005255472A5 (ja) | 2007-03-29 |
JP4257425B2 true JP4257425B2 (ja) | 2009-04-22 |
Family
ID=35081568
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004070349A Expired - Lifetime JP4257425B2 (ja) | 2004-03-12 | 2004-03-12 | 新規な無機化合物、それを用いた超硬材料及びその製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4257425B2 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008014434A2 (en) | 2006-07-28 | 2008-01-31 | Caracal, Inc. | Crystal growth method and reactor design |
JP5779317B2 (ja) * | 2009-12-24 | 2015-09-16 | イーエイチエス レンズ フィリピン インク | 光学物品の製造方法 |
-
2004
- 2004-03-12 JP JP2004070349A patent/JP4257425B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2005255472A (ja) | 2005-09-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6083570A (en) | Synthetic diamond coatings with intermediate amorphous metal bonding layers and methods of applying such coatings | |
US7563509B2 (en) | Article with protective film | |
Inspektor et al. | Superhard coatings for metal cutting applications | |
EP2201154B1 (en) | Method of producing a layer by arc-evaporation from ceramic cathodes | |
US8962100B2 (en) | Method for making diamond composite materials | |
Narayan | Laser processing of diamond-like carbon–metal composites | |
EP0474369A1 (en) | Diamond-like carbon coatings | |
Gaydaychuk et al. | Influence of Al-Si-N interlayer on residual stress of CVD diamond coatings | |
JPH09510500A (ja) | 立方晶窒化硼素より成る層を形成する方法 | |
Zywitzki et al. | Structure and properties of Al2O3 layers deposited by plasma activated electron beam evaporation | |
US6200649B1 (en) | Method of making titanium boronitride coatings using ion beam assisted deposition | |
JP4257425B2 (ja) | 新規な無機化合物、それを用いた超硬材料及びその製造方法 | |
US20110223332A1 (en) | Method for depositing cubic boron nitride thin film | |
JPH06183890A (ja) | 人工ダイヤモンド被覆材 | |
JP2003231962A (ja) | 高硬質表面をもつ金属、合金又はセラミックス成形体の製造方法 | |
JP3353239B2 (ja) | ダイヤモンド類被覆部材の製造方法 | |
JP3260157B2 (ja) | ダイヤモンド類被覆部材の製造方法 | |
JP3417902B2 (ja) | 高硬質金属製品の製造方法 | |
JPH07268607A (ja) | ダイヤモンドライクカーボン薄膜を有する物品およびその製造方法 | |
JP4189490B2 (ja) | 金属オキシカーバイド単結晶被覆を有する超硬材料及びその製造方法 | |
JP2006169614A (ja) | 金属複合ダイヤモンドライクカーボン(dlc)皮膜、その形成方法、及び摺動部材 | |
JP3260156B2 (ja) | ダイヤモンド類被覆部材の製造方法 | |
JP4133150B2 (ja) | ダイヤモンド膜被覆部材の製造方法 | |
JPH05263251A (ja) | 被覆焼結体 | |
Sidelev et al. | Stripping of carbon coatings in radio-frequency inductively coupled plasma of H2/Ar |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20051004 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070207 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20080331 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080807 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081003 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20081118 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081209 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20081225 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4257425 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
EXPY | Cancellation because of completion of term |