JP4207158B2 - Top plate for cooker and method for manufacturing the same - Google Patents

Top plate for cooker and method for manufacturing the same Download PDF

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JP4207158B2
JP4207158B2 JP2004126334A JP2004126334A JP4207158B2 JP 4207158 B2 JP4207158 B2 JP 4207158B2 JP 2004126334 A JP2004126334 A JP 2004126334A JP 2004126334 A JP2004126334 A JP 2004126334A JP 4207158 B2 JP4207158 B2 JP 4207158B2
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film
vapor deposition
top plate
masking member
glass plate
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JP2004342609A (en
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敏正 金井
努 今村
耕司 池上
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Nippon Electric Glass Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering

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  • Life Sciences & Earth Sciences (AREA)
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  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Induction Heating Cooking Devices (AREA)

Description

本発明は、調理器用トッププレート及びその製造方法に係り、特に結晶化ガラス等でなるガラス板の少なくとも片面側に着色した蒸着膜を形成するための技術に関する。   The present invention relates to a cooker top plate and a method for manufacturing the same, and more particularly to a technique for forming a colored vapor deposition film on at least one side of a glass plate made of crystallized glass or the like.

近年においては、家庭用や業務用の調理器として、従来のガスコンロを用いたガス調理器等に代えて又はこれと共に、ラジアントヒータやハロゲンヒータを用いた赤外線加熱調理器、並びにＩＨと称される電磁加熱調理器が用いられるに至っている。   In recent years, an infrared cooking device using a radiant heater or a halogen heater, or IH, as a cooking device for home use or business use, instead of or together with a conventional gas cooking device using a gas stove, etc. Electromagnetic cooking devices have been used.

この赤外加熱調理器や電磁加熱調理器に使用されるトッププレートとしては、可視光に対する遮光性を有する有色の低膨張結晶化ガラス（例えば、日本電気硝子社製のＧＣ−１９０並びにショット社製のセラン）や、可視光に対する透光性に優れた無色の低膨張結晶化ガラス（日本電気硝子社製のＮ−０）からなるガラス板（基板）が使用される。   As a top plate used in this infrared heating cooker or electromagnetic heating cooker, a colored low expansion crystallized glass having a light-shielding property against visible light (for example, GC-190 manufactured by Nippon Electric Glass Co., Ltd. and manufactured by Shot Corporation) Or a glass plate (substrate) made of colorless low expansion crystallized glass (N-0 manufactured by Nippon Electric Glass Co., Ltd.) excellent in translucency for visible light.

一方、これらの調理器に使用されるトッププレートに関しては、利用者が温度や火力を表面側から一目で把握できるようにするとの要請に応じて、液晶や発光ダイオードからなるインジケータを視認可能に配設したものが試作され或いはその使用が試みられている。   On the other hand, with respect to the top plate used in these cookers, an indicator made up of a liquid crystal or light-emitting diode is visibly arranged in response to a request that the user can grasp the temperature and heating power at a glance from the surface side. The installed one has been prototyped or is being used.

詳述すると、トッププレートとして、その表面側から裏面が明確に見えるように、透光性に優れた無色の低膨張結晶化ガラスからなるガラス板を基板として使用し、そのガラス板の裏面側に、上述の液晶や発光ダイオードからなるインジケータを配設することが行なわれている。   Specifically, as a top plate, a glass plate made of colorless, low-expansion crystallized glass excellent in translucency is used as a substrate so that the back surface can be clearly seen from the front surface side, and on the back surface side of the glass plate An indicator composed of the above-described liquid crystal or light emitting diode is provided.

その場合に、ガラス板における液晶やインジケータの配設部を除く領域では、加熱装置や配線等の調理器の内部構造を隠蔽できるように、ガラス板の表裏面の少なくとも片面、例えば裏面に遮光膜を形成することが必要となるが、この遮光膜は、耐熱性が低く且つ熱が篭りやすい等の理由から、ガラス板における赤外線加熱部（ラジアントヒータ部）や電磁加熱部（ＩＨ部）についても、遮光膜を形成しないことが有利となる。   In that case, in the region excluding the liquid crystal and indicator arrangement portions on the glass plate, a light shielding film is formed on at least one side of the front and back surfaces of the glass plate, for example, the back surface so that the internal structure of the cooking device such as a heating device and wiring can be concealed This light-shielding film is also used for the infrared heating part (radiant heater part) and the electromagnetic heating part (IH part) of the glass plate because of its low heat resistance and easy heat generation. It is advantageous not to form a light shielding film.

ところで、この種のトッププレートにおいて、調理器の内部構造を隠蔽すべく透明な低膨張ガラスの表面に上記例示の所要領域を除外して遮光膜を形成する手法としては、印刷法が採用されているのが通例である。   By the way, in this kind of top plate, a printing method is adopted as a method of forming the light shielding film on the surface of the transparent low-expansion glass so as to conceal the internal structure of the cooker, excluding the above-described required region. It is customary.

その具体例として、下記の特許文献１によれば、透明な低膨張結晶化ガラスからなる基板の表面に、ガラスと無機顔料とからなる遮光膜を形成したトッププレートが開示されている。この遮光膜は、低膨張結晶化ガラスからなる基板よりも熱膨張係数が高いため、これを多孔質に形成するという対策を講じることによって、膜にクラックが発生することを抑制している。   As a specific example, according to the following Patent Document 1, a top plate is disclosed in which a light shielding film made of glass and an inorganic pigment is formed on the surface of a substrate made of transparent low expansion crystallized glass. Since this light-shielding film has a higher thermal expansion coefficient than a substrate made of low-expansion crystallized glass, the occurrence of cracks in the film is suppressed by taking a measure of forming it porous.

また、他の具体例として、下記の特許文献２によれば、透明な低膨張結晶化ガラスからなる基板の表面に、貴金属と卑金属とからなるラスター彩の皮膜を設けたトッププレートが開示されている。   As another specific example, according to the following Patent Document 2, a top plate in which a raster-colored film made of a noble metal and a base metal is provided on the surface of a substrate made of a transparent low expansion crystallized glass is disclosed. Yes.

特開平１０−２７３３４２号公報Japanese Patent Laid-Open No. 10-273342 特公平７−１７４０９号公報Japanese Patent Publication No. 7-17409

しかしながら、上記の特許文献１、２に開示されているように遮光膜を印刷法により形成する手法によれば、その形成された遮光膜の耐摩耗性が非常に低く、簡単に剥がれてしまうことから、取り扱いが極めて困難になる等の種々の問題を招くことになる。   However, according to the method of forming the light shielding film by the printing method as disclosed in Patent Documents 1 and 2, the formed light shielding film has very low wear resistance and can be easily peeled off. Therefore, various problems such as handling becomes extremely difficult.

そこで、本出願人は、先の特許出願（特願2002-141309、特願2002-232490、特願2002-362502、特願2003-060841）において、スパッタ法に代表される蒸着法によって遮光膜を低膨張ガラス板の少なくとも片面に形成することを提案した。この蒸着法による遮光膜の形成手法によれば、従来の印刷法に比して、ガラス板との密着性が高いことから、遮光膜が剥がれ難いという利点を享受できる。しかしながら、この手法によるにしても、未だ解決すべき課題が残存している。   Therefore, the applicant of the present invention applied the light-shielding film by the vapor deposition method represented by the sputtering method in the previous patent applications (Japanese Patent Application Nos. 2002-141309, 2002-232490, 2002-362502, and 2003-060841). It was proposed to form it on at least one side of a low expansion glass plate. According to the method for forming a light shielding film by this vapor deposition method, since the adhesiveness with the glass plate is high as compared with the conventional printing method, it is possible to enjoy the advantage that the light shielding film is hardly peeled off. However, even with this method, problems to be solved still remain.

すなわち、この種の蒸着法により遮光膜（着色した遮光膜）を形成する場合には、既述の液晶やインジケータの配設に対応する領域等のように遮光膜を形成すべきではない領域を、図９に示すようにマスキング部材８'で覆い、このマスキング部材８'で覆われた領域を除くガラス板２'の裏面に、蒸着法による遮光膜３'が形成される。   That is, when a light shielding film (colored light shielding film) is formed by this kind of vapor deposition method, an area where the light shielding film should not be formed, such as an area corresponding to the arrangement of the liquid crystal or the indicator described above, is formed. As shown in FIG. 9, a light shielding film 3 ′ is formed by vapor deposition on the back surface of the glass plate 2 ′ excluding the region covered with the masking member 8 ′ and covered with the masking member 8 ′.

このように、マスキング部材８'を使用した蒸着法（例えばスパッタ法）によると、熱変形等を考慮すれば、マスキング部材８'の厚みを遮光膜３'の厚みよりも大幅に厚くする必要がある。そして、蒸着法による遮光膜３'の形成時には、原料粒子（イオン）が様々な方向に飛散して遮光膜３'が形成されるものであるから、遮光膜３'におけるマスキング部材８'の周辺には、その帯域の幅寸法が１０〜１５ｍｍ程度の膜厚漸減部3a'が形成される。   Thus, according to the vapor deposition method (for example, sputtering method) using the masking member 8 ′, it is necessary to make the thickness of the masking member 8 ′ significantly larger than the thickness of the light shielding film 3 ′ in consideration of thermal deformation and the like. is there. When the light shielding film 3 ′ is formed by the vapor deposition method, since the raw material particles (ions) are scattered in various directions to form the light shielding film 3 ′, the periphery of the masking member 8 ′ in the light shielding film 3 ′ is formed. Is formed with a gradually decreasing thickness portion 3a ′ having a width dimension of about 10 to 15 mm.

この膜厚漸減部3a'は、膜厚が徐々に薄くなるに連れて遮光性が阻害され、所謂ぼかしが入ったような状態になるため、見栄えが悪化することに加えて、その膜厚が徐々に薄くなっていく態様には必然的にバラツキが生じるため、綺麗なグラデーションとはなり得ず、より一層見栄え或いは外観性が損なわれて、製品の品質低下を招くという問題がある。   The film thickness gradually decreasing portion 3a ′ has a light-shielding effect that is gradually reduced as the film thickness is gradually reduced, so that the film is in a so-called blurred state. Since the gradual thinning inevitably varies, there is a problem that the gradation cannot be beautiful and the appearance or appearance is further deteriorated and the quality of the product is deteriorated.

しかも、上記のように、幅寸法が３ｍｍ程度又はそれ以上で膜厚が徐々に薄くなる膜厚漸減部3a'が形成されていると、膜厚の薄い部分が裏面側での摺動や摩耗等に起因して剥がれ或いは傷が付き、その損傷部分を表面側から見た場合に目立つおそれがあると共に、最も膜厚が薄くなっている境界輪郭部分では、そのような損傷部分の目立ちが顕著となり、境界輪郭線が歪み或いは崩れを生じ、デザイン上好ましくない等の不具合を招く。   In addition, as described above, when the film thickness gradually decreasing portion 3a ′ having a width dimension of about 3 mm or more and gradually decreasing in thickness is formed, the thin film thickness portion is slid or worn on the back surface side. When the damaged part is seen from the surface side, the damaged part may be noticeable, and at the boundary contour part where the film thickness is the thinnest, the noticeable part of the damaged part is remarkable. As a result, the boundary contour line is distorted or collapsed, leading to problems such as undesirable design.

本発明は、上記事情に鑑みてなされたものであり、ガラス板に対する蒸着法による遮光膜（蒸着膜）の形成部と非形成部との境界における見栄え及び外観性を向上させて調理器用トッププレートの品質改善を図ることを技術的課題とする。   The present invention has been made in view of the above circumstances, and improves the appearance and appearance at the boundary between the formed part and the non-formed part of the light shielding film (deposited film) by the vapor deposition method for the glass plate, and is a top plate for a cooker. The technical challenge is to improve the quality of

上記技術的課題を解決するためになされた本発明は、ガラス板の表裏面の少なくとも片面に蒸着膜が形成されてなる調理器用トッププレートであって、前記ガラス板の片面に、着色された蒸着膜の形成部と、該蒸着膜の非形成部とを有し、該非形成部との境界に存する蒸着膜の膜厚漸減部の幅寸法が１ｍｍ以下とされていることを特徴とするものである。ここで、「膜厚漸減部」とは、蒸着膜の周縁輪郭線から３ｍｍ幅を除外した領域における膜厚の平均値の９５％となる位置であり且つ膜厚が周縁側に向かって漸減していく領域内の位置を基準部として、この基準部から周縁輪郭線に至る部位を意味している。   The present invention made in order to solve the above technical problem is a top plate for a cooker in which a vapor deposition film is formed on at least one side of the front and back surfaces of a glass plate, and the vapor deposition is colored on one side of the glass plate. It has a film formation part and a non-formation part of the vapor deposition film, and the width dimension of the film thickness gradually decreasing part of the vapor deposition film existing at the boundary with the non-formation part is 1 mm or less. is there. Here, the “film thickness gradually decreasing portion” is a position that is 95% of the average value of the film thickness in the region excluding the 3 mm width from the peripheral edge of the vapor deposition film, and the film thickness gradually decreases toward the peripheral edge. With the position in the going region as a reference part, it means a part from the reference part to the peripheral contour line.

このような構成によれば、例えば低膨張ガラスでなるガラス板の少なくとも片面（好ましくは裏面）に形成される蒸着膜が着色されていることから、ガラス板の下に存する加熱装置や配線類等の調理器の内部構造を蒸着膜によって隠蔽することができる。なお、この蒸着膜の膜厚は、例えば５０ｎｍ〜８００ｎｍとされる。しかも、蒸着膜の形成部と非形成部との境界に存する蒸着膜の膜厚漸減部の幅寸法、つまり帯状域である膜厚漸減部の帯域幅寸法は、１ｍｍ以下とされていることから、上記の境界周辺で膜厚が相対的に薄くなっている領域が狭小になり、裏面側で摺動や摩耗等が生じても、膜の浅層部のみで剥がれや傷等が生じるに過ぎず、表面側から視認できる程度の剥がれや傷に至る確率が激減する。加えて、このような損傷が原因となって蒸着膜の形成部と非形成部との境界輪郭線が歪む等の不具合も生じ難くなる。これにより、優れた品質を有する調理器用トッププレートが得られる。   According to such a configuration, for example, a vapor deposition film formed on at least one side (preferably the back side) of a glass plate made of low expansion glass is colored, so that a heating device, wiring, etc. existing under the glass plate The internal structure of the cooking device can be concealed by the deposited film. In addition, the film thickness of this vapor deposition film shall be 50 nm-800 nm, for example. Moreover, the width dimension of the film thickness gradually decreasing portion of the deposited film existing at the boundary between the deposited film forming part and the non-formed part, that is, the bandwidth dimension of the film thickness gradually decreasing part which is a band-like region is 1 mm or less. The area where the film thickness is relatively thin around the boundary is narrowed, and even if sliding or abrasion occurs on the back side, only the shallow layer part of the film is peeled off or scratched. In addition, the probability of peeling or scratching that is visible from the surface side is drastically reduced. In addition, problems such as distortion of the boundary contour line between the deposited film forming part and the non-formed part due to such damage are less likely to occur. Thereby, the top plate for cookers which has the outstanding quality is obtained.

この場合、前記蒸着膜は、スパッタ法により形成された膜であることが好ましい。   In this case, the vapor deposition film is preferably a film formed by a sputtering method.

このスパッタ法としては、例えば３００ｍｍ×４００ｍｍ〜６００ｍｍ×１０００ｍｍのサイズでなる矩形の複数枚のガラス板、又はこれと同等の大きさの面積を有する多角形もしくは円形等の複数枚のガラス板が、槽内で連続して搬送されながら原料粒子（イオン）がそれらのガラス板の片面全域に一挙に密着して、それぞれのガラス板の片面に順次蒸着膜が形成されていく形式のスパッタ法を採用することが好ましい。このようにすれば、槽内に一枚ずつガラス板を投入して蒸着膜が形成される度にそのガラス板を取り出すというような面倒且つ煩雑な作業が不要になり、単位枚数当たりの蒸着膜の形成に要する時間が大幅に短縮されると共に、製造コストも削減され、量産化に大きく寄与することができる。   As this sputtering method, for example, a plurality of rectangular glass plates having a size of 300 mm × 400 mm to 600 mm × 1000 mm, or a plurality of glass plates such as polygons or circles having an area equivalent to this, Adopts a sputtering method in which raw material particles (ions) are brought into close contact with the entire area of one side of each glass plate while being continuously conveyed in the tank, and a deposited film is sequentially formed on one side of each glass plate. It is preferable to do. In this way, the troublesome and troublesome work of taking out the glass plates one by one into the tank and taking out the glass plates each time a vapor deposition film is formed becomes unnecessary. The time required for forming the film is greatly reduced, and the manufacturing cost is also reduced, which can greatly contribute to mass production.

また、前記非形成部は、ＩＨ部、赤外線加熱部、液晶表示部、及び発光素子表示部の中から選択した一または二以上の領域であることが好ましい。   Moreover, it is preferable that the said non-formation part is one or two or more area | regions selected from IH part, an infrared heating part, a liquid crystal display part, and a light emitting element display part.

このようにすれば、蒸着膜（遮光膜）が熱に左程強いものでなくても、例えばＩＨ部と、赤外線加熱部（ラジアントヒータ部）とを非形成部とすることにより、蒸着膜の熱による特性悪化や変色等が生じ難くなると共に、熱の篭りも生じ難くなる。また、蒸着膜が形成されているか否かに応じて、上記列挙した各部の位置を正確に把握できるため、ＩＨ部及び赤外線加熱部にそれぞれ被加温体を載置する際に、それらの間で載置ズレが生じなくなると共に、液晶表示部及び発光素子表示部を非形成部とすることにより、蒸着膜（遮光膜）により邪魔されることなくこれらの各部が示す情報をガラス板の表面側から明確に知得することができる。   In this way, even if the vapor deposition film (light-shielding film) is not as strong to the left as possible, for example, by forming the IH part and the infrared heating part (radiant heater part) as a non-forming part, Deterioration of characteristics and discoloration due to heat are less likely to occur, and heat distortion is less likely to occur. In addition, since the position of each of the above-mentioned parts can be accurately grasped depending on whether or not a vapor deposition film is formed, when the heated body is placed on the IH part and the infrared heating part, respectively, In this case, the liquid crystal display unit and the light emitting element display unit are not formed, so that the information indicated by each unit is not obstructed by the vapor deposition film (light-shielding film). It can be clearly understood from.

更に、前記非形成部に耐熱塗膜を形成すると共に、該耐熱塗膜の周縁部をオーバーラップして覆うように蒸着膜を形成し、且つ前記耐熱塗膜と蒸着膜とのオーバーラップ部の幅寸法を５ｍｍ以下とすることが好ましい。   Further, a heat-resistant coating film is formed on the non-formed part, a vapor deposition film is formed so as to overlap and cover a peripheral part of the heat-resistant coating film, and an overlap part of the heat-resistant coating film and the vapor deposition film is formed. The width dimension is preferably 5 mm or less.

すなわち、ガラス板の前記非形成部、特にＩＨ部と赤外線加熱部（ラジアントヒータ部）とについては、耐熱塗料からなる膜を、例えば塗布や印刷、特にスクリーン印刷によって形成することが好ましく、このように耐熱塗料からなる膜を形成した場合には、その耐熱塗膜の周縁部をオーバーラップして覆うように蒸着膜を形成することが、双方の膜の密着性や熱影響を考慮すれば好ましいものとなる。   That is, for the non-formation part of the glass plate, particularly the IH part and the infrared heating part (radiant heater part), it is preferable to form a film made of a heat-resistant paint by, for example, coating or printing, particularly screen printing. When a film made of a heat-resistant paint is formed, it is preferable to form a vapor-deposited film so as to overlap and cover the peripheral edge of the heat-resistant coating film in consideration of the adhesion and heat effect of both films. It will be a thing.

この場合、既述のように、蒸着膜の膜厚漸減部の幅寸法が１ｍｍ以下であることから、そのオーバーラップ部の幅寸法を５ｍｍ以下（好ましくは３ｍｍ以下）としても、双方の膜のオーバーラップ部以外の箇所に、蒸着膜の不当に薄い部分が形成されるという事態を有効に回避することができる。これにより、双方の膜の境界部にトータル膜厚の大きなバラツキが生じることを阻止でき、膜の耐久性の向上が図られると共に、耐熱塗膜の形成箇所周辺の温度分布に不当な片寄りが生じ難くなり、調理時に優れた加熱効率を確保することができる。なお、このオーバーラップ部の幅寸法は、１ｍｍ以上、更には０．５ｍｍ以上とされる。   In this case, as described above, since the width dimension of the gradually decreasing thickness portion of the deposited film is 1 mm or less, even if the width dimension of the overlap portion is 5 mm or less (preferably 3 mm or less), both films It is possible to effectively avoid a situation in which an unreasonably thin portion of the vapor deposition film is formed at a place other than the overlap portion. This prevents large variations in the total film thickness at the boundary between the two films, improving the durability of the film and improperly shifting the temperature distribution around the heat-resistant coating film formation site. It becomes difficult to occur, and excellent heating efficiency can be ensured during cooking. In addition, the width dimension of this overlap part shall be 1 mm or more, and also 0.5 mm or more.

因みに、従来における蒸着膜の膜厚漸減部の幅寸法は３ｍｍ程度またはそれ以上であったことから、耐熱塗膜と蒸着膜とのオーバーラップ幅は１５ｍｍ程度とされていた。この事を勘案しても、上記の本発明における耐熱塗膜と蒸着膜とのオーバーラップ幅は、極めて小さくなっており、双方の膜の成膜性や調理時の加熱効率が大幅に改善されることが期待できる。   Incidentally, since the width dimension of the film thickness gradually decreasing portion of the conventional deposited film was about 3 mm or more, the overlap width between the heat-resistant coating film and the deposited film was about 15 mm. Even if this is taken into consideration, the overlap width between the heat-resistant coating film and the deposited film in the present invention is extremely small, and the film-forming properties of both films and the heating efficiency during cooking are greatly improved. Can be expected.

以上の構成において、蒸着膜がスパッタ膜であると、このスパッタ膜が、平滑且つ緻密な構造を有しているのみならず、ガラスの裏面及び／又は表面に高い密着性で強固に形成されることになるため、その基本的特性として、蒸着膜が剥がれ難くなるという利点を有する。   In the above configuration, if the vapor deposition film is a sputtered film, the sputtered film not only has a smooth and dense structure, but is firmly formed on the back surface and / or front surface of the glass with high adhesion. Therefore, as a basic characteristic, there is an advantage that the deposited film is hardly peeled off.

この場合、蒸着膜が、Ｓｉ、Ｔｉ、Ａｌ、Ｎｂ、Ｗ、Ｍｏ、Ｓｎ、Ｃｒ、Ｐｔ及びＡｕからなる群より選択された一種の金属、または、ステンレス、ハステロイ、インコネル及びニクロムからなる群より選択された一種の合金、もしくは、ステンレス、ハステロイ、インコネル及びニクロムからなる群より選択された一種の合金の窒化物、または、Ｔｉ、Ｎｂ、Ｗ及びＭｏからなる群より選択された一種或いは二種以上の金属の窒化物を含む遮光膜であると、着色がなされ且つ優れた遮光能力が得られるため、加熱装置や配線等の調理器の内部構造を適切に隠蔽することができる。しかも、このような蒸着膜は、正反射率が高く、且つ金属光沢を有するため、外観上、調理器周囲に存するステンレス等の金属製の調理台や壁と良好に調和するという利点を享受できる。   In this case, the deposited film is a kind of metal selected from the group consisting of Si, Ti, Al, Nb, W, Mo, Sn, Cr, Pt and Au, or from the group consisting of stainless steel, Hastelloy, Inconel and Nichrome. One kind of alloy selected, nitride of one kind alloy selected from the group consisting of stainless steel, Hastelloy, Inconel and Nichrome, or one or two kinds selected from the group consisting of Ti, Nb, W and Mo Since the light-shielding film containing the above-described metal nitride is colored and has excellent light-shielding ability, the internal structure of the cooking device such as a heating device and wiring can be appropriately concealed. Moreover, since such a deposited film has a high regular reflectance and has a metallic luster, it can enjoy the advantage of being well matched with a metal kitchen table or wall such as stainless steel existing around the cooking device. .

更に、蒸着膜が、遮光膜（着色された膜）と酸化防止膜とからなり、且つ、遮光膜の上、または低膨張ガラスからなるガラス板の面と遮光膜との間に、酸化防止膜を形成すれば、遮光膜が酸化され難くなると共に、熱による遮光膜の変質を抑制できる。すなわち、酸化防止膜が遮光膜の上に空気と接触して形成されている場合には、空気中の酸素による遮光膜の酸化が阻止される一方において、酸化防止膜が低膨張ガラスからなるガラス板と遮光膜との間に形成されている場合には、酸化防止膜の特質によって、低膨張ガラス中の酸素による遮光膜の酸化が阻止されるからである。特に、トッププレートの裏面（非使用面）に酸化防止膜が形成され、且つその上に遮光膜が形成されていると、膜材質や膜厚を調整することによって、光の干渉を利用した種々の色調を得ることができる。   Furthermore, the vapor deposition film includes a light shielding film (colored film) and an antioxidant film, and the antioxidant film is formed on the light shielding film or between the surface of the glass plate made of low expansion glass and the light shielding film. When the film is formed, the light shielding film is hardly oxidized and the alteration of the light shielding film due to heat can be suppressed. That is, when the antioxidant film is formed on the light shielding film in contact with air, the oxidation of the light shielding film by oxygen in the air is prevented, while the antioxidant film is a glass made of low expansion glass. This is because, when it is formed between the plate and the light shielding film, the oxidation of the light shielding film by oxygen in the low expansion glass is prevented by the characteristics of the antioxidant film. In particular, when an anti-oxidation film is formed on the back surface (non-use surface) of the top plate and a light-shielding film is formed on the anti-oxidation film, various materials utilizing light interference can be obtained by adjusting the film material and film thickness. Can be obtained.

この場合、酸化防止膜が、Ｓｉ、Ｔｉ、Ａｌ、Ｎｂ、Ｗ、Ｍｏ、Ｔａ及びＳｎからなる群より選択された一種もしくは二種以上の金属の酸化物、またはＳｉ、ＡｌもしくはＴｉの酸化物を含んでいれば、遮光膜の酸化防止能力が高いため好ましい。   In this case, the antioxidant film is an oxide of one or more metals selected from the group consisting of Si, Ti, Al, Nb, W, Mo, Ta, and Sn, or an oxide of Si, Al, or Ti If it contains, since the antioxidant capability of a light shielding film is high, it is preferable.

また、遮光膜や酸化防止膜が、結晶化ガラス中に含まれる成分、具体的には、Ｔｉ、Ｓｉ或いはＡｌの金属、またはそれらの窒化物、もしくはそれらの酸化物からなる場合には、ガラス材料を原料として再溶融する際に、ガラスを着色させたり、或いはブツ等のガラス欠陥を発生させたりすることがないため好ましい。   Further, when the light-shielding film or the antioxidant film is made of a component contained in the crystallized glass, specifically, a metal of Ti, Si or Al, a nitride thereof, or an oxide thereof, glass When the material is remelted as a raw material, it is preferable because the glass is not colored or glass defects such as blisters are not generated.

このトッププレートにおける蒸着膜の膜構成の具体的な第１の例として、低膨張ガラス（無色透明）でなるガラス板の片面（裏面）から順に、１０〜１０００ｎｍ、好ましくは１５〜７００ｎｍの幾何学的厚みを有する遮光膜（着色膜）からなる第１の層と、１０〜１０００ｎｍ、好ましくは１５〜７００ｎｍの幾何学的厚みを有する酸化防止膜からなる第２の層とを形成することが挙げられる。   As a specific first example of the film configuration of the vapor deposition film on the top plate, a geometry of 10 to 1000 nm, preferably 15 to 700 nm, in order from one side (back side) of a glass plate made of low expansion glass (colorless and transparent). Forming a first layer made of a light-shielding film (colored film) having a desired thickness and a second layer made of an antioxidant film having a geometric thickness of 10 to 1000 nm, preferably 15 to 700 nm. It is done.

また、第２の例として、低膨張ガラス（無色透明）でなるガラス板の片面（裏面）から順に、１０〜１０００ｎｍ、好ましくは２０〜７００ｎｍの幾何学的厚みを有する酸化防止膜からなる第１の層と、１０〜１０００ｎｍ、好ましくは１５〜７００ｎｍの幾何学的厚みを有する遮光膜（着色膜）からなる第２の層と、１０〜１０００ｎｍ、好ましくは２０〜７００ｎｍの幾何学的厚みを有する酸化防止膜からなる第３の層とを形成することが挙げられる。   As a second example, a first anti-oxidation film having a geometric thickness of 10 to 1000 nm, preferably 20 to 700 nm, in order from one surface (back surface) of a glass plate made of low expansion glass (colorless and transparent). A second layer composed of a light-shielding film (colored film) having a geometric thickness of 10 to 1000 nm, preferably 15 to 700 nm, and a geometric thickness of 10 to 1000 nm, preferably 20 to 700 nm. Forming a third layer made of an antioxidant film.

上記の第１及び第２の例において、特に、遮光膜（着色膜）が、ＴｉＮ、Ｓｉ、Ｔｉ、ＡｌＴｉＮ、Ｗ或いはＷＮを含むと、耐熱性に優れた特性を有する観点から好ましい。また、酸化防止膜が、ＳｉＮ、ＡｌＮ、ＳｉＯ2、Ａｌ2Ｏ3、もしくはＴｉＯ2を含むと、遮光膜の酸化防止効果に優れた特性を有する観点から好ましい。 In the first and second examples, it is particularly preferable that the light-shielding film (colored film) contains TiN, Si, Ti, AlTiN, W, or WN from the viewpoint of having excellent heat resistance. In addition, it is preferable that the antioxidant film contains SiN, AlN, SiO 2 , Al 2 O 3 , or TiO 2 from the viewpoint that the light-shielding film has an excellent antioxidant effect.

上記の低膨張ガラスとしては、６００℃からの急冷に耐えることが可能な所謂耐熱衝撃性の高い材料を使用することができ、具体的には５０×１０-7／℃以下の熱膨張係数を有する材料が好適であり、低膨張の硼珪酸ガラス、石英ガラス或いはβ―石英固溶体を主結晶とする低膨張結晶化ガラスが使用可能である。特に、３０〜５００℃における平均熱膨張係数が、−１０〜＋３０×１０-7／℃、更に好ましくは−１０〜＋２０×１０-7／℃のガラスは、耐熱衝撃性が更に高く、燃焼時に、低膨張ガラスからなるガラス板内で温度分布が大きくなっても、ストレスが発生し難く割れ難いという観点から好ましい。 As the low-expansion glass, a material having a high thermal shock resistance capable of withstanding rapid cooling from 600 ° C. can be used. Specifically, a thermal expansion coefficient of 50 × 10 −7 / ° C. or less is used. It is preferable to use a low-expansion crystallized glass whose main crystal is a low-expansion borosilicate glass, quartz glass, or β-quartz solid solution. In particular, a glass having an average coefficient of thermal expansion at 30 to 500 ° C. of −10 to + 30 × 10 −7 / ° C., more preferably −10 to + 20 × 10 −7 / ° C. has higher thermal shock resistance, so that it can be burned. Even if the temperature distribution is increased in a glass plate made of low expansion glass, it is preferable from the viewpoint that stress is hardly generated and cracking is difficult.

上記技術的課題を解決するためになされた本発明に係る方法は、ガラス板の表裏面の少なくとも片面に蒸着膜を形成する蒸着工程を含む調理器用トッププレートの製造方法であって、前記ガラス板の片面における蒸着膜の非形成部となるべき領域に、外周側に向かって厚み高さが漸次低くなるテーパ部を外周縁に有するマスキング部材を着脱可能に固定した状態で、該ガラス板の片面に蒸着法により蒸着膜を形成することを特徴とするものである。   The method according to the present invention made to solve the above technical problem is a method of manufacturing a top plate for a cooker including a vapor deposition step of forming a vapor deposition film on at least one surface of the front and back surfaces of the glass plate, the glass plate One surface of the glass plate in a state where a masking member having a taper portion whose thickness height gradually decreases toward the outer peripheral side is detachably fixed to a region to be a non-deposition portion of the vapor deposition film on one surface of A vapor deposition film is formed by vapor deposition.

このような構成によれば、蒸着膜の形成時に原料粒子（イオン）がガラス板の片面に向かって様々な方向性をもって飛んで来た場合には、マスキング部材の外周縁が外周側に向かって低くなるテーパ部とされていることから、原料粒子はマスキング部材の外周縁を左程邪魔とすることなく該マスキング部材の周辺に到達することができる。したがって、ガラス板のマスキング部材周辺に形成される蒸着膜の膜厚漸減部の幅寸法を、例えば１ｍｍ程度以下に大幅に狭小にできることになり、既に述べた事項（膜厚漸減部の幅寸法を１ｍｍ以下とした場合の事項）と同様の作用効果を得ることができる。   According to such a configuration, when the raw material particles (ions) fly in various directions toward one side of the glass plate when forming the vapor deposition film, the outer peripheral edge of the masking member is directed toward the outer peripheral side. Since the tapered portion is lowered, the raw material particles can reach the periphery of the masking member without obstructing the outer peripheral edge of the masking member to the left. Therefore, the width dimension of the film thickness gradually decreasing portion of the vapor deposition film formed around the masking member of the glass plate can be greatly reduced to, for example, about 1 mm or less. The same effect as in the case of 1 mm or less) can be obtained.

この場合にも、前記蒸着膜を形成する方法は、スパッタ法であることが好ましく、このようにすれば、既述のスパッタ法による事項と同様の作用効果を得ることができる。   Also in this case, the method for forming the vapor deposition film is preferably a sputtering method, and in this way, the same operational effects as those obtained by the sputtering method described above can be obtained.

また、前記非形成部となるべき領域に、印刷により耐熱塗膜を形成した後、該耐熱塗膜上の外周縁部５ｍｍ以内の幅を除く領域に、前記マスキング部材を着脱可能に固定することが好ましい。   Moreover, after forming a heat-resistant coating film by printing in the region to be the non-formed part, the masking member is detachably fixed to the region excluding the width within 5 mm of the outer peripheral edge on the heat-resistant coating film. Is preferred.

このようにすれば、先ずガラス板の片面における非形成部となるべき領域（例えば、ＩＨ部、赤外線加熱部、液晶表示部、及び発光素子表示部の中から選択した一または二以上の領域）に、スクリーン印刷等により耐熱塗料でなる膜が形成される。この後、その耐熱塗膜上の外周縁部５ｍｍ以内の幅を除く領域に、マスキング部材が固定され、このような状態の下で、既述のスパッタ法等により蒸着膜が形成される。この結果、ガラス板の片面の非形成部に耐熱塗膜を形成され、且つ該耐熱塗膜の外周縁部５ｍｍ以内の領域がオーバーラップした状態で蒸着膜が形成される。   If it does in this way, the area | region which should become a non-formation part in the single side | surface of a glass plate first (for example, one or two or more area | regions selected from IH part, an infrared heating part, a liquid crystal display part, and a light emitting element display part) In addition, a film made of a heat-resistant paint is formed by screen printing or the like. Thereafter, a masking member is fixed to a region excluding the width within 5 mm of the outer peripheral edge on the heat-resistant coating film, and a vapor deposition film is formed by the above-described sputtering method or the like under such a state. As a result, a heat-resistant coating film is formed on the non-formation part on one side of the glass plate, and a vapor deposition film is formed in a state where the regions within 5 mm of the outer peripheral edge of the heat-resistant coating film overlap.

この場合、前記ガラス板の片面に対する前記マスキング部材のテーパ部のテーパ角θは、１０°〜４５°であることが好ましい。   In this case, the taper angle θ of the taper portion of the masking member with respect to one side of the glass plate is preferably 10 ° to 45 °.

このようにすれば、蒸着膜の非形成部との境界に存する蒸着膜の膜厚漸減部の幅寸法を、支障なく１ｍｍ以下とすることができる。すなわち、上記のテーパ角θが４５°を超えると、ガラス板におけるマスキング部材の外周縁周辺に到達し得る原料粒子が、マスキング部材のテーパ部によって邪魔されるため、蒸着膜の膜厚漸減部の幅寸法が１ｍｍを超えるおそれがある。これとは逆に、上記のテーパ角θが１０°未満であると、テーパ部の幅が不当に広くなり過ぎ、マスキング部材が全体的に薄肉になることから、マスキング部材のテーパ部の外周縁が熱により反りを生じる等の不具合を招く。したがって、テーパ角θを上記の数値範囲内に設定しておけば、このような不具合が生じず、好適な膜厚漸減部を形成することが可能となる。そして、このマスキング部材を、上述のＩＨ部、赤外線加熱部、液晶表示部、及び発光素子表示部の中から選択した一または二以上の領域に使用すれば、マスキング部材が熱により反ることに起因して蒸着膜がマスキング部材とガラス板との間にまわりこむという事態が生じ難くなり、上述の各領域と蒸着膜形成部との境界が明瞭になるばかりでなく、マスキング部材の取り扱い時に破損や変形が生じ難くなるという利点を享受できる。   If it does in this way, the width dimension of the thickness reduction | decrease part of the vapor deposition film which exists in the boundary with the non-formation part of a vapor deposition film can be 1 mm or less without trouble. That is, when the taper angle θ exceeds 45 °, the raw material particles that can reach the periphery of the outer peripheral edge of the masking member in the glass plate are obstructed by the taper portion of the masking member. The width dimension may exceed 1 mm. On the contrary, if the taper angle θ is less than 10 °, the width of the taper portion becomes excessively wide and the masking member becomes thin as a whole. Causes problems such as warping due to heat. Therefore, if the taper angle θ is set within the above numerical range, such a problem does not occur, and a suitable thickness gradually decreasing portion can be formed. And if this masking member is used in one or two or more areas selected from the above-mentioned IH part, infrared heating part, liquid crystal display part, and light emitting element display part, the masking member will be warped by heat. As a result, the situation where the vapor deposition film wraps around between the masking member and the glass plate is less likely to occur, and not only the boundary between each of the above-mentioned regions and the vapor deposition film forming part is clarified, but also the masking member is damaged during handling. And it is possible to enjoy the advantage that deformation is less likely to occur.

また、前記マスキング部材は開孔部を有し、該開孔部を通じてポリイミドテープ及び／またはアルミ耐熱テープで前記マスキング部材をガラス板の片面側に着脱可能に固定することが好ましい。   Moreover, it is preferable that the said masking member has an opening part and fixes the said masking member to the single side | surface side of a glass plate with a polyimide tape and / or an aluminum heat-resistant tape through this opening part.

すなわち、ガラス板の片面における大きな非形成部、例えば直径が１０ｍｍ〜５００ｍｍの円形領域またはこれと同等の面積を有する矩形領域や多角形領域でなる非形成部に、これと同等の大きさ及び形状を有するマスキング部材を固定するには、マスキング部材を厚み０．５ｍｍ〜２．０ｍｍ、好ましくは１ｍｍ程度の板状体とし、その外周縁部以外の位置を利用してガラス板の片面に着脱可能に粘着固定或いは接着固定することが好ましい。   That is, a large non-formed portion on one side of a glass plate, for example, a circular region having a diameter of 10 mm to 500 mm, or a non-formed portion formed of a rectangular region or a polygonal region having an area equivalent to this, is equivalent in size and shape. In order to fix the masking member having a thickness, the masking member is formed into a plate-like body having a thickness of 0.5 mm to 2.0 mm, preferably about 1 mm, and can be attached to and detached from one side of the glass plate by using a position other than the outer peripheral edge. It is preferable to perform adhesive fixing or adhesive fixing.

したがって、本発明では、マスキング部材の中央部またはその周辺部等に開孔部（貫通孔）を形成し、マスキング部材のガラス板との接触面と反対側の面と、開孔部を通じて露出状態となっているガラス板の片面とに跨って、重合させた状態にあるポリイミドテープとアルミ耐熱テープ又は何れか一方のテープを貼着することにより、マスキング部材をガラス板の片面に固定するという方法が採用される。この場合、ポリイミドテープ及びアルミ耐熱テープは何れも、蒸着が行なわれる槽内の熱（約１５０℃）に耐えることができ、接着力が劣化せず、且つ槽内の雰囲気を悪化させひいては蒸着膜に不純物を混入させるようなガス（分解によるガス）が発生せず、しかも蒸着膜の形成後に容易に支障なく剥がすことができる等の利点を有している。   Therefore, in the present invention, an opening (through hole) is formed in the central portion of the masking member or its peripheral portion, etc., and is exposed through the opening on the surface opposite to the contact surface with the glass plate of the masking member. A method of fixing a masking member to one side of a glass plate by sticking a polyimide tape and an aluminum heat-resistant tape or one of the tapes in a polymerized state across one side of the glass plate. Is adopted. In this case, both the polyimide tape and the aluminum heat-resistant tape can withstand the heat (about 150 ° C.) in the tank in which the vapor deposition is performed, the adhesive force is not deteriorated, and the atmosphere in the tank is deteriorated. There is an advantage that no gas (gas due to decomposition) is generated in which impurities are mixed in, and it can be easily peeled off after formation of the deposited film.

この場合、マスキング部材の材料は、鉄、アルミニウウム、ステンレス、またはこれらの合金等の金属であれば、耐熱性に優れていることから使用可能である。特に、アルミニウムは、熱伝導性が高いことから、成膜時に容易に均一な温度となり、これに伴って熱変形が小さく、しかも安価で加工が容易である等の利点を有している。また、上記金属以外にも、テフロン（登録商標）樹脂やポリプロピレン樹脂などの耐熱性樹脂がマスキング部材として使用可能である。マスキング部材をテフロン（登録商標）樹脂やポリプロピレン樹脂から成形すると、成膜後にマスキング部材をガラス板から剥がす際にその端部が蒸着膜又は耐熱塗膜に接触しても蒸着膜が削れにくいという利点がある。   In this case, if the material of the masking member is a metal such as iron, aluminum, stainless steel, or an alloy thereof, it can be used because of its excellent heat resistance. In particular, since aluminum has high thermal conductivity, it has a uniform temperature at the time of film formation, and has advantages such as low thermal deformation, low cost, and easy processing. In addition to the above metals, heat resistant resins such as Teflon (registered trademark) resin and polypropylene resin can be used as the masking member. The advantage of molding the masking member from Teflon (registered trademark) resin or polypropylene resin is that the deposited film is less likely to be scraped even if the edge of the masking member contacts the deposited film or heat-resistant coating film when the masking member is peeled off from the glass plate after film formation. There is.

以上のように本発明に係る調理器用トッププレートによれば、着色された蒸着膜の形成部と、該蒸着膜の非形成部とを備え、該非形成部との境界に存する蒸着膜の膜厚漸減部の幅寸法を１ｍｍ以下としたから、着色された蒸着膜によってガラス板の下に存する加熱装置や配線類等の調理器の内部構造が隠蔽されると共に、蒸着膜非形成部との境界における膜厚が相対的に薄くなっている領域が狭小になり、蒸着膜に裏面側で摺動や摩耗等が生じても、表面側から視認できる程度の剥がれや傷に至る確率が激減する。しかも、このような損傷が原因となって蒸着膜の非形成部との境界輪郭線が歪む等の不具合も生じ難くなり、優れた品質を有する調理器用トッププレートが得られる。   As described above, according to the top plate for a cooker according to the present invention, the film thickness of the vapor deposition film is provided with a colored vapor deposition film forming part and a non-formation part of the vapor deposition film, and exists at the boundary with the non-formation part. Since the width of the gradually decreasing portion is set to 1 mm or less, the colored vapor deposition film conceals the internal structure of the cooking device such as a heating device and wiring existing under the glass plate, and the boundary with the vapor deposition film non-formation portion. The region in which the film thickness is relatively thin becomes narrow, and even if the vapor deposition film slides or wears on the back surface side, the probability of peeling or scratching to the extent that it can be seen from the front surface side is drastically reduced. Moreover, it is difficult to cause problems such as distortion of the boundary contour line with the non-deposited portion of the deposited film due to such damage, and a top plate for a cooker having excellent quality can be obtained.

また、本発明に係る調理器用トッププレートの製造方法によれば、外周側に向かって厚み高さが漸次低くなるテーパ部を外周縁に有するマスキング部材をガラス板に着脱可能に固定した状態で、蒸着法により蒸着膜を形成するようにしたから、蒸着膜の形成時に原料粒子（イオン）がガラス板に向かって様々な方向性をもって飛んで来ても、原料粒子はマスキング部材の外周縁を左程邪魔とすることなく該マスキング部材の周辺に到達することができる。したがって、ガラス板のマスキング部材周辺に形成される蒸着膜の膜厚漸減部の幅寸法を、例えば１ｍｍ程度以下に大幅に狭小にできることになり、上述と同様の作用効果を得ることが可能となる。   Moreover, according to the manufacturing method of the top plate for a cooker according to the present invention, in a state where the masking member having a taper portion whose thickness height is gradually reduced toward the outer peripheral side is detachably fixed to the glass plate, Since the vapor deposition method is used to form the vapor deposition film, even if the raw material particles (ions) fly toward the glass plate in various directions when forming the vapor deposition film, the raw material particles are left on the outer periphery of the masking member. It is possible to reach the periphery of the masking member without disturbing. Therefore, the width dimension of the film thickness gradually decreasing portion of the vapor deposition film formed around the masking member of the glass plate can be greatly reduced to, for example, about 1 mm or less, and the same effect as described above can be obtained. .

以下、本発明の実施形態に係る調理器用トッププレート（以下、単にトッププレートともいう）及びその製造方法を図面に基づいて説明する。図１(a)は、本発明の実施形態に係るトッププレートを裏面側より見た底面図、図１(b)は、その部分拡大図、図２(a)は、図１(b)のａ−ａ線断面図、図２(b)は、図１(b)のｂ−ｂ線断面図である。   Hereinafter, a top plate for a cooker according to an embodiment of the present invention (hereinafter, also simply referred to as a top plate) and a manufacturing method thereof will be described with reference to the drawings. 1 (a) is a bottom view of the top plate according to the embodiment of the present invention as viewed from the back side, FIG. 1 (b) is a partially enlarged view thereof, and FIG. 2 (a) is a diagram of FIG. 1 (b). FIG. 2B is a sectional view taken along the line aa, and FIG. 2B is a sectional view taken along the line bb of FIG.

図１(a)に示すように、この実施形態に係るトッププレート１は、透明結晶化ガラス（日本電気硝子株式会社製Ｎ−０、３０〜５００℃における平均線熱膨張係数が−５×１０-7／℃）からなる厚み４ｍｍのガラス板２を基板とし、このガラス板２に、赤外線加熱部としての単一のラジアントヒータ部Ａと、一対のＩＨ部Ｂ、Ｂと、単一の発光素子表示部Ｃと、一対の液晶表示部Ｄ、Ｄとが平面的に配設されている。 As shown in FIG. 1 (a), the top plate 1 according to this embodiment has a transparent crystallized glass (N-0 manufactured by Nippon Electric Glass Co., Ltd., and an average linear thermal expansion coefficient at 30 to 500 ° C. is −5 × 10 -7 / ° C) of a 4 mm thick glass plate 2 as a substrate, a single radiant heater portion A as an infrared heating portion, a pair of IH portions B and B, and a single light emission The element display part C and a pair of liquid crystal display parts D and D are arranged in a plane.

このガラス板２の非使用面である裏面には、上述のラジアントヒータ部Ａ、ＩＨ部Ｂ、発光素子表示部Ｃ、及び液晶表示部Ｄを除外した領域に、着色された蒸着膜としてのスパッタ膜３が形成されている。更に、このガラス板２の裏面におけるラジアントヒータ部ＡとＩＨ部Ｂとには、厚みが約５μｍの円形を呈する耐熱塗膜４が形成され、これらの耐熱塗膜４の外周縁部を覆うように上述のスパッタ膜３がオーバーラップした状態で形成されている。   On the back surface, which is a non-use surface of the glass plate 2, a sputter as a colored vapor deposition film is formed in a region excluding the radiant heater part A, IH part B, light emitting element display part C, and liquid crystal display part D described above. A film 3 is formed. Furthermore, the radiant heater part A and the IH part B on the back surface of the glass plate 2 are formed with a heat-resistant coating film 4 having a circular shape with a thickness of about 5 μm so as to cover the outer peripheral edge of the heat-resistant coating film 4. The above-mentioned sputtered film 3 is formed in an overlapping state.

この場合、図２(a)に示すように、ガラス板２の裏面におけるスパッタ膜３と液晶表示部Ｄとの境界部（スパッタ膜３と発光素子表示部Ｃとの境界部も同様）においては、スパッタ膜３の周縁部における膜厚漸減部（テーパ部）3aの幅寸法ｔが、０．５ｍｍとされている。この膜厚漸減部3aは、スパッタ膜３の周縁輪郭線3bから３ｍｍ幅を除外した領域における膜厚の平均値の９５％となる位置であり且つ膜厚が周縁側に向かって漸減していく領域内の位置を基準部3xとして、この基準部3xから周縁輪郭線3bに至る部位とされている。   In this case, as shown in FIG. 2A, at the boundary between the sputtered film 3 and the liquid crystal display D on the back surface of the glass plate 2 (the boundary between the sputtered film 3 and the light emitting element display C is the same). The width dimension t of the gradually decreasing portion (tapered portion) 3a at the peripheral edge of the sputtered film 3 is 0.5 mm. The film thickness gradually decreasing portion 3a is a position that is 95% of the average film thickness in a region excluding the 3 mm width from the peripheral edge 3b of the sputtered film 3, and the film thickness gradually decreases toward the peripheral edge. A position in the region is defined as a reference portion 3x, which is a portion extending from the reference portion 3x to the peripheral outline 3b.

また、図１(b)及び図２(b)に示すように、ガラス板２の裏面における耐熱塗膜４とスパッタ膜３と境界部においては、両膜３、４のオーバーラップ部の幅寸法Ｔが、２．０ｍｍとされると共に、スパッタ膜３の周縁部における膜厚漸減部3aの幅寸法ｔは、上記と同様に０．５ｍｍとされている。なお、詳細は図示しないが、スパッタ膜３は、６５ｎｍのＴｉの遮光膜と、それを覆うように形成される１００ｎｍのＳｉＮの酸化防止膜とから構成されている。   Further, as shown in FIGS. 1 (b) and 2 (b), the width dimension of the overlap portion of the two films 3 and 4 at the boundary between the heat-resistant coating film 4 and the sputtered film 3 on the back surface of the glass plate 2 is shown. T is set to 2.0 mm, and the width dimension t of the gradually decreasing thickness portion 3a at the peripheral edge portion of the sputtered film 3 is set to 0.5 mm as described above. Although not shown in detail, the sputtered film 3 is composed of a 65 nm Ti light shielding film and a 100 nm SiN antioxidant film formed so as to cover it.

以上のような構成であると、例えば図２(a)に示すスパッタ膜３と膜非形成部（液晶表示部Ｄや発光素子表示部Ｃ）との境界部分を、ガラス板２の表面側から見た場合には、膜厚漸減部3aの幅寸法が０．５ｍｍと狭小であり且つ膜厚の漸減度合いが大きい（ガラス板２の裏面に対するテーパ角が大きい）ことから、この境界部分にぼかしが入ったような状態にはならず、明瞭な境界として視認することができる。   With the configuration as described above, for example, the boundary portion between the sputtered film 3 and the non-film forming portion (liquid crystal display portion D or light emitting element display portion C) shown in FIG. When viewed, since the width dimension of the film thickness gradually decreasing portion 3a is as narrow as 0.5 mm and the film thickness gradually decreases (the taper angle with respect to the back surface of the glass plate 2 is large), the boundary portion is blurred. It is not in a state that contains, but can be visually recognized as a clear boundary.

しかも、このトッププレート１の搬送時や取り扱い時等に、スパッタ膜３の周縁部に摺動や摩耗が生じても、その剥がれや傷付きはスパッタ膜３の奥深くまでは到達せず、したがってトッププレート１を表面側から見た場合には、膜の剥がれや傷付きを視認することができず、外観が損なわれることはない。   Moreover, even if the peripheral edge of the sputtered film 3 slides or wears during transport or handling of the top plate 1, the peeling or scratching does not reach the depth of the sputtered film 3. When the plate 1 is viewed from the surface side, peeling or scratching of the film cannot be visually recognized, and the appearance is not impaired.

更に、例えば図２(b)に示す耐熱塗膜４とスパッタ膜３との境界部分では、両膜３、４のオーバーラップ部の幅寸法Ｔが２．０ｍｍと狭小であることから、不当に広い不要な部分にスパッタ膜３が形成されるという事態が回避される。   Further, for example, at the boundary portion between the heat-resistant coating film 4 and the sputtered film 3 shown in FIG. 2 (b), the width T of the overlap portion of the two films 3 and 4 is as narrow as 2.0 mm. A situation in which the sputtered film 3 is formed on a wide unnecessary portion is avoided.

次に、上記実施形態に係るトッププレート１の製造方法を説明する。   Next, a method for manufacturing the top plate 1 according to the embodiment will be described.

先ず、既述のものと同様の結晶化ガラスからなるガラス板２の裏面におけるラジアントヒータ部Ａ及びＩＨ部Ｂ、Ｂに、スクリーン印刷により耐熱塗膜４を形成する。次に、図３に示すように、ラジアントヒータ部Ａ、ＩＨ部Ｂ、Ｂ、発光素子表示部Ｃ、及び液晶表示部Ｄ、Ｄにそれぞれマスキング部材5、6、6、7、8、8を固定し、このような状態とした複数枚のガラス板２を、スパッタ法を実行するための槽内で連続的に搬送していくことにより、順々にガラス板２の裏面にスパッタ膜３を蒸着していく。   First, the heat-resistant coating film 4 is formed by screen printing on the radiant heater part A and the IH parts B and B on the back surface of the glass plate 2 made of the same crystallized glass as described above. Next, as shown in FIG. 3, masking members 5, 6, 6, 7, 8, 8 are provided on the radiant heater part A, IH part B, B, light emitting element display part C, and liquid crystal display part D, D, respectively. The plurality of glass plates 2 fixed and in such a state are continuously conveyed in a tank for performing the sputtering method, whereby the sputtered film 3 is sequentially applied to the back surface of the glass plate 2. Evaporate.

図４(a)、(b)は、ラジアントヒータ部Ａ及びＩＨ部Ｂ、Ｂに使用するマスキング部材5(6)を例示するものである。このマスキング部材5(6)は、例えば、アルミニウムやテフロン（登録商標）からなる円形の板状体5a(6a)の中心部に矩形の開孔部（貫通孔）5b(6b)を穿設したものであって、その外周縁部は、全周に亘ってテーパ部5x(6x)とされている。この場合、マスキング部材5(6)の底面に対するテーパ部5x(6x)のテーパ角θは、３０°とされている。そして、図７(a)に示すように、重合状態とされたポリイミドテープ９及びアルミ耐熱テープ10が、マスキング部材5(6)の開孔部5b(6b)を覆うようにしてそのマスキング部材5(6)と耐熱塗膜４とに亘って接着されることにより、耐熱塗膜４上にマスキング部材5(6)が固定された状態となる。この時点において、マスキング部材5(6)の開孔部5b(6b)はポリイミドテープ９及びアルミ耐熱テープ10によって完全に閉鎖された状態になると共に、下層のポリイミドテープ９がマスキング部材5(6)を耐熱塗膜４に粘着固定させた状態となる。   FIGS. 4A and 4B illustrate the masking member 5 (6) used for the radiant heater part A and the IH parts B and B. FIG. This masking member 5 (6) has a rectangular opening (through hole) 5b (6b) in the center of a circular plate body 5a (6a) made of, for example, aluminum or Teflon (registered trademark). The outer peripheral edge portion is a tapered portion 5x (6x) over the entire circumference. In this case, the taper angle θ of the taper portion 5x (6x) with respect to the bottom surface of the masking member 5 (6) is 30 °. Then, as shown in FIG. 7 (a), the masking member 5 is formed so that the polyimide tape 9 and the aluminum heat-resistant tape 10 in a polymerized state cover the opening 5b (6b) of the masking member 5 (6). By adhering over (6) and the heat-resistant coating film 4, the masking member 5 (6) is fixed on the heat-resistant coating film 4. At this time, the opening 5b (6b) of the masking member 5 (6) is completely closed by the polyimide tape 9 and the aluminum heat-resistant tape 10, and the lower polyimide tape 9 is masked by the masking member 5 (6). Is in a state of being adhesively fixed to the heat-resistant coating film 4.

図５(a)、(b)は、液晶表示部Ｄに使用するマスキング部材８を例示するものである。このマスキング部材８は、例えば、アルミニウムやテフロン（登録商標）からなる細長矩形の板状体8aの中心部に細長矩形の開孔部（貫通孔）8bを穿設したものであって、その四周縁部は全てがテーパ部8xとされ、そのテーパ角θは上記と同様に３０°とされている。このマスキング部材８も、重合状態とされたポリイミドテープ９及びアルミ耐熱テープ10によって、ガラス板２の裏面に固定されるが、ポリイミドテープ10がマスキング部材８をガラス板２の裏面に粘着固定させている点のみが、図７(a)に示す構成と相違しており、その他の構成は、図７(a)に基づいて既に説明した事項と同一である。   5A and 5B illustrate the masking member 8 used for the liquid crystal display unit D. FIG. The masking member 8 is formed by, for example, forming an elongated rectangular opening (through hole) 8b at the center of an elongated rectangular plate 8a made of aluminum or Teflon (registered trademark). The entire peripheral portion is a tapered portion 8x, and the taper angle θ is 30 ° as described above. The masking member 8 is also fixed to the back surface of the glass plate 2 by the polyimide tape 9 and the aluminum heat-resistant tape 10 in a polymerized state, and the polyimide tape 10 causes the masking member 8 to be adhesively fixed to the back surface of the glass plate 2. Only the differences are different from the configuration shown in FIG. 7A, and the other configurations are the same as those already described with reference to FIG.

図６(a)、(b)は、発光素子表示部Ｃに使用されるマスキング部材７を例示している。このマスキング部材７は、四角錐状のブロック体7aの先端に凸部7bを一体形成したものであって、四角錐状部の全周が３０°のテーパ角θを有するテーパ部7xとされている。そして、このマスキング部材７は、図７(b)に示すように、薄肉の両面テープ11を介してガラス板２の裏面に固定されている。この場合、両面テープ11は、マスキング部材７の四角錐状部の底面とガラス板２の裏面とによって覆われ、外部雰囲気に対して殆ど露出していないため、ガスの発生等のおそれがないことから、その材質は特に限定されるものではない。   6A and 6B illustrate the masking member 7 used in the light emitting element display unit C. FIG. This masking member 7 is formed by integrally forming a convex portion 7b at the tip of a quadrangular pyramid block body 7a, and the entire circumference of the quadrangular pyramid portion is a tapered portion 7x having a taper angle θ of 30 °. Yes. And this masking member 7 is being fixed to the back surface of the glass plate 2 via the thin double-sided tape 11, as shown in FIG.7 (b). In this case, the double-sided tape 11 is covered with the bottom surface of the quadrangular pyramidal portion of the masking member 7 and the back surface of the glass plate 2 and is hardly exposed to the external atmosphere, so there is no risk of gas generation or the like. Therefore, the material is not particularly limited.

以上のようなマスキング部材5、6、7、8を使用することにより、蒸着時に様々な方向に原料粒子が飛散しても、図８に示すように、マスキング部材8（5、6、7）の外周縁部はテーパ部8x（5x、6x、7x）とされているため、ガラス板２の裏面におけるマスキング部材8（5、6、7）の近傍に原料粒子が到達することを邪魔しなくなる。したがって、この実施形態では、既に述べたように、スパッタ膜３の膜厚漸減部3aの幅寸法ｔ（図２(a)、(b)参照）が０．５ｍｍであり、且つ、スパッタ膜３と耐熱塗膜４とのオーバーラップ部の幅寸法Ｔ（図２(b)参照）が２．０ｍｍである。これに対して、図９に示すような従来のテーパ角が９０°のマスキング部材8'（5'、6'、7'）を使用した場合には、スパッタ膜３'の膜厚漸減部3a'の幅寸法ｔ'（図10(a)、(b)参照）が３．０ｍｍであり、且つ、スパッタ膜３'と耐熱塗膜４'とのオーバーラップ部の幅寸法Ｔ'（図10(b)参照）が１３．０ｍｍであった。   By using the masking members 5, 6, 7, and 8 as described above, even if the raw material particles are scattered in various directions during vapor deposition, as shown in FIG. 8, the masking member 8 (5, 6, 7) Since the outer peripheral edge portion is a tapered portion 8x (5x, 6x, 7x), it does not obstruct the arrival of the raw material particles near the masking member 8 (5, 6, 7) on the back surface of the glass plate 2 . Therefore, in this embodiment, as already described, the width dimension t (see FIGS. 2A and 2B) of the gradually decreasing portion 3a of the sputtered film 3 is 0.5 mm, and the sputtered film 3 The width dimension T (see FIG. 2 (b)) of the overlap portion between the heat-resistant coating film 4 and the heat-resistant coating film 4 is 2.0 mm. On the other hand, when the conventional masking member 8 ′ (5 ′, 6 ′, 7 ′) having a taper angle of 90 ° as shown in FIG. 9 is used, the film thickness gradually decreasing portion 3a of the sputtered film 3 ′ is used. The 'width dimension t' (see FIGS. 10A and 10B) is 3.0 mm, and the width dimension T ′ of the overlap portion between the sputtered film 3 ′ and the heat-resistant coating film 4 ′ (FIG. 10). (See (b)) was 13.0 mm.

なお、上記実施形態では、各マスキング部材5、6、7、8のテーパ部5x、6x、7x、8xの縦断面形状が直線とされているが、これらのテーパ部5x、6x、7x、8xの縦断面形状は、湾曲線（好ましくは凹状の湾曲線）、または段階的に外周側に向かって高さが低くなる形状であってもよい。そして、このようにテーパ部が湾曲線または段階的な曲線である場合は、それらのテーパ部の始端（上述の基準部）と外周端とを結ぶ直線に基づいてテーパ角θが決められる。   In the above embodiment, the longitudinal sectional shapes of the taper portions 5x, 6x, 7x, 8x of the masking members 5, 6, 7, 8 are linear, but these taper portions 5x, 6x, 7x, 8x The vertical cross-sectional shape may be a curved line (preferably a concave curved line) or a shape whose height gradually decreases toward the outer peripheral side. When the tapered portion is a curved line or a stepped curve as described above, the taper angle θ is determined based on a straight line connecting the start end (the reference portion) of the tapered portion and the outer peripheral end.

図１(a)は、本発明の実施形態に係る調理器用トッププレートを裏面側から見た底面図、図１(b)は、その部分拡大図である。Fig.1 (a) is the bottom view which looked at the top plate for cookers which concerns on embodiment of this invention from the back surface side, FIG.1 (b) is the elements on larger scale. 図２(a)は、図１(b)のａ−ａ線に従って切断した縦断正面図、図２(b)は、図１(b)のｂ−ｂ線に従って切断した縦断正面図である。2A is a longitudinal front view cut along line aa in FIG. 1B, and FIG. 2B is a vertical front view cut along line bb in FIG. 1B. 本発明の実施形態に係る調理器用トッププレートの製造方法の一工程におけるガラス板の裏面の状態を示す概略図である。It is the schematic which shows the state of the back surface of the glass plate in 1 process of the manufacturing method of the top plate for cookers which concerns on embodiment of this invention. 図４(a)は、本発明の実施形態に係る調理器用トッププレートの製造に用いるマスキング部材の第１の例を示す平面図、図４(b)は、そのマスキング部材の縦断正面図である。FIG. 4 (a) is a plan view showing a first example of a masking member used for manufacturing the top plate for a cooking device according to the embodiment of the present invention, and FIG. 4 (b) is a longitudinal front view of the masking member. . 図５(a)は、本発明の実施形態に係る調理器用トッププレートの製造に用いるマスキング部材の第２の例を示す平面図、図５(b)は、そのマスキング部材の縦断正面図である。Fig.5 (a) is a top view which shows the 2nd example of the masking member used for manufacture of the top plate for cookers which concerns on embodiment of this invention, FIG.5 (b) is a vertical front view of the masking member. . 図６(a)は、本発明の実施形態に係る調理器用トッププレートの製造に用いるマスキング部材の第３の例を示す平面図、図６(b)は、そのマスキング部材の縦断正面図である。FIG. 6A is a plan view showing a third example of a masking member used for manufacturing the top plate for a cooking device according to the embodiment of the present invention, and FIG. 6B is a longitudinal front view of the masking member. . 図７(a)は、本発明の実施形態に係る調理器用トッププレートの製造方法の一工程におけるガラス板の第１の状態を示す縦断正面図、図７(b)は、本発明の実施形態に係る調理器用トッププレートの製造方法の一工程におけるガラス板の第２の状態を示す縦断正面図である。FIG. 7 (a) is a longitudinal front view showing a first state of the glass plate in one step of the method for manufacturing a top plate for a cooker according to the embodiment of the present invention, and FIG. 7 (b) is an embodiment of the present invention. It is a vertical front view which shows the 2nd state of the glass plate in 1 process of the manufacturing method of the top plate for cookers which concerns on. 本発明の実施形態に係る調理器用トッププレートの製造方法の一工程におけるガラス板の状態を示す拡大縦断正面図である。It is an enlarged vertical front view which shows the state of the glass plate in 1 process of the manufacturing method of the top plate for cookers which concerns on embodiment of this invention. 従来の調理器用トッププレートの製造方法の一工程におけるガラス板の状態を示す拡大縦断正面図である。It is an enlarged vertical front view which shows the state of the glass plate in 1 process of the manufacturing method of the conventional top plate for cookers. 図１０(a)は、従来の調理器用トッププレートの第１の状態を示す拡大縦断正面図、図１０(b)は、従来の調理器用トッププレートの第２の状態を示す拡大縦断正面図である。10 (a) is an enlarged vertical front view showing a first state of a conventional cooker top plate, and FIG. 10 (b) is an enlarged vertical front view showing a second state of the conventional cooker top plate. is there.

符号の説明Explanation of symbols

１ 調理器用トッププレート
２ ガラス板
３ スパッタ膜（蒸着膜）
3a 膜厚漸減部
3b 周縁輪郭線
3x 基準部
４ 耐熱塗膜
５ マスキング部材
5b 開孔部
5x テーパ部
６ マスキング部材
6b 開孔部
6x テーパ部
７ マスキング部材
7x テーパ部
８ マスキング部材
8b 開孔部
8x テーパ部
９ ポリイミドテープ
10 アルミ耐熱テープ
11 両面テープ 1 Top plate for cooker 2 Glass plate 3 Sputtered film (deposition film)
3a Thickness reduction part
3b Perimeter contour
3x Reference part 4 Heat-resistant coating film 5 Masking material
5b Hole
5x Taper part 6 Masking member
6b Opening
6x Taper 7 Masking material
7x Taper 8 Masking material
8b Opening
8x Taper 9 Polyimide tape
10 Aluminum heat resistant tape
11 Double-sided tape

Claims (9)

ガラス板の表裏面の少なくとも片面に蒸着膜が形成されてなる調理器用トッププレートであって、
前記ガラス板の片面に、着色された蒸着膜の形成部と、該蒸着膜の非形成部とを有し、該非形成部との境界に存する蒸着膜の膜厚漸減部の幅寸法が１ｍｍ以下とされていることを特徴とする調理器用トッププレート。 A top plate for a cooker in which a deposited film is formed on at least one side of the front and back surfaces of a glass plate,
One side of the glass plate has a colored vapor deposition film forming part and a non-deposition part of the vapor deposition film, and the width dimension of the film thickness gradually decreasing part of the vapor deposition film existing at the boundary with the non-formation part is 1 mm or less. A top plate for a cooking device, characterized in that 前記蒸着膜は、スパッタ法により形成された膜であることを特徴とする請求項１に記載の調理器用トッププレート。   The top plate for a cooking appliance according to claim 1, wherein the vapor deposition film is a film formed by a sputtering method. 前記非形成部は、ＩＨ部、赤外線加熱部、液晶表示部、及び発光素子表示部の中から選択した一または二以上の領域であることを特徴とする請求項１または２に記載の調理器用トッププレート。   The cooker according to claim 1 or 2, wherein the non-forming part is one or two or more regions selected from an IH part, an infrared heating part, a liquid crystal display part, and a light emitting element display part. Top plate. 前記非形成部に耐熱塗膜が形成されると共に、該耐熱塗膜の周縁部をオーバーラップして覆うように蒸着膜が形成され、且つ前記耐熱塗膜と蒸着膜とのオーバーラップ部の幅寸法が５ｍｍ以下とされていることを特徴とする請求項１〜３の何れかに記載の調理器用トッププレート。   A heat-resistant coating film is formed on the non-formed part, a vapor deposition film is formed so as to overlap and cover a peripheral part of the heat-resistant coating film, and a width of an overlap part between the heat-resistant coating film and the vapor deposition film The top plate for a cooking appliance according to any one of claims 1 to 3, wherein the size is 5 mm or less. ガラス板の表裏面の少なくとも片面に蒸着膜を形成する蒸着工程を含む調理器用トッププレートの製造方法であって、
前記ガラス板の片面における蒸着膜の非形成部となるべき領域に、外周側に向かって厚み高さが漸次低くなるテーパ部を外周縁に有するマスキング部材を着脱可能に固定した状態で、該ガラス板の片面に蒸着法により蒸着膜を形成することを特徴とする調理器用トッププレートの製造方法。 A method for producing a top plate for a cooker including a vapor deposition step of forming a vapor deposition film on at least one side of the front and back surfaces of a glass plate,
In a state where a masking member having a taper portion whose thickness height is gradually reduced toward the outer peripheral side is detachably fixed to an area to be a non-deposition portion of the vapor deposition film on one side of the glass plate, A method for producing a top plate for a cooking device, wherein a vapor deposition film is formed on one surface of the plate by a vapor deposition method. 前記蒸着膜を形成する方法は、スパッタ法であることを特徴とする請求項５に記載の調理器用トッププレートの製造方法。   6. The method of manufacturing a top plate for a cooking device according to claim 5, wherein the method for forming the vapor deposition film is a sputtering method. 前記非形成部となるべき領域に、印刷により耐熱塗膜を形成した後、該耐熱塗膜上の周縁部５ｍｍ以下の幅を除く領域に、前記マスキング部材を着脱可能に固定することを特徴とする請求項５または６に記載の調理器用トッププレートの製造方法。   After the heat-resistant coating film is formed by printing on the region to be the non-forming part, the masking member is detachably fixed to the region excluding the width of 5 mm or less on the heat-resistant coating film. The manufacturing method of the top plate for cookers of Claim 5 or 6. 前記ガラス板の片面に対する前記マスキング部材のテーパ部のテーパ角θが、１０°〜４５°であることを特徴とする請求項５〜７の何れかに記載の調理器用トッププレートの製造方法。   The method of manufacturing a top plate for a cooking device according to any one of claims 5 to 7, wherein a taper angle θ of the taper portion of the masking member with respect to one side of the glass plate is 10 ° to 45 °. 前記マスキング部材は開孔部を有し、該開孔部を通じてポリイミドテープ及び／またはアルミ耐熱テープで前記マスキング部材をガラス板の片面側に着脱可能に固定することを特徴とする請求項５〜８の何れかに記載の調理器用トッププレートの製造方法。   The said masking member has an opening part, The said masking member is fixed to the single side | surface side of a glass plate with a polyimide tape and / or an aluminum heat-resistant tape through this opening part so that attachment or detachment is possible. The manufacturing method of the top plate for cookers in any one of.
JP2004126334A 2003-04-25 2004-04-22 Top plate for cooker and method for manufacturing the same Expired - Lifetime JP4207158B2 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11370698B2 (en) 2016-11-04 2022-06-28 Corning Incorporated Masking and fixturing of a glass-based article during a coating process and articles produced thereby

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005046570B4 (en) * 2005-10-01 2010-01-21 Schott Ag Bottom coated glass ceramic plate
DE102006017250A1 (en) † 2006-04-12 2007-10-18 BSH Bosch und Siemens Hausgeräte GmbH disk unit
JP2010113846A (en) * 2008-11-04 2010-05-20 Mitsubishi Electric Corp Induction heating cooker
JP7177683B2 (en) * 2018-12-19 2022-11-24 日本電気硝子株式会社 top plate for cooker

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11370698B2 (en) 2016-11-04 2022-06-28 Corning Incorporated Masking and fixturing of a glass-based article during a coating process and articles produced thereby

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