JP4162566B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP4162566B2 JP4162566B2 JP2003352212A JP2003352212A JP4162566B2 JP 4162566 B2 JP4162566 B2 JP 4162566B2 JP 2003352212 A JP2003352212 A JP 2003352212A JP 2003352212 A JP2003352212 A JP 2003352212A JP 4162566 B2 JP4162566 B2 JP 4162566B2
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- JP
- Japan
- Prior art keywords
- conductivity type
- junction
- semiconductor device
- plug
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004065 semiconductor Substances 0.000 title claims description 26
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 43
- 229920005591 polysilicon Polymers 0.000 claims description 43
- 239000012535 impurity Substances 0.000 claims description 31
- 239000000758 substrate Substances 0.000 claims description 26
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- 238000009751 slip forming Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- -1 for example Inorganic materials 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/417—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Description
この発明の半導体装置は、配線がプラグを有する。また、この発明の半導体装置は、配線接続部を有する。さらに、この発明の半導体装置は、第一導電型の不純物領域の上面と第二導電型のポリシリコンプラグの底面が同じ輪郭形状を有している。これらの特徴により、この発明の半導体装置は、図1に示すような多層の配線を有する構造として最良の形態となっている。
102:N+領域
103:上面
104、110:絶縁膜
106、112:開口部
107:底面
108:P+ポリシリコン膜
108a:PN接合プラグ部
108b:配線接続部
109:P+ポリシリコンプラグ
111:頂面
113:PN接合
114:配線(導電層)
114a:導電層プラグ
114b:導電層配線部
Claims (5)
- シリコン基板と、
該シリコン基板の一方の主表面に上面を露出させて該シリコン基板中に設けられている第一導電型の不純物領域と、
該第一導電型の不純物領域の前記上面と接して設けられていてPN接合を形成している第二導電型のポリシリコンプラグと、
該第二導電型のポリシリコンプラグの頂面に接続された配線とを具える半導体装置であって、
前記第二導電型のポリシリコンプラグは、前記第一導電型の不純物領域とPN接合を形成するPN接合プラグ部と、該PN接合プラグ部と一体的に連続構成されていて前記配線と接続されている配線接続部とを有しており、
前記配線は、前記配線接続部と接続されたプラグを有しており、
前記第一導電型の不純物領域の上面と前記第二導電型のポリシリコンプラグの底面は、面積が等しく、同じ輪郭形状を有していることを特徴とする半導体装置。 - 請求項1に記載の半導体装置において、
前記第一導電型の不純物領域の不純物濃度と第二導電型のポリシリコンプラグの不純物濃度とが同じであることを特徴とする半導体装置。 - 請求項1に記載の半導体装置において、
前記第一導電型をN導電型とし及び前記第二導電型をP導電型とすることを特徴とする半導体装置。 - 請求項3に記載の半導体装置において、
前記第一導電型の不純物領域の不純物濃度を1.0E15cm-3の値とし及び前記第二導電型のポリシリコンプラグの不純物濃度を5.0E14cm-3から5.0E15cm-3までの範囲内の値とすることを特徴とする半導体装置。 - 請求項1に記載の半導体装置において、
前記第一導電型をP導電型とし及び前記第二導電型をN導電型とすることを特徴とする半導体装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003352212A JP4162566B2 (ja) | 2003-10-10 | 2003-10-10 | 半導体装置 |
US10/760,503 US7309921B2 (en) | 2003-10-10 | 2004-01-21 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003352212A JP4162566B2 (ja) | 2003-10-10 | 2003-10-10 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005116947A JP2005116947A (ja) | 2005-04-28 |
JP4162566B2 true JP4162566B2 (ja) | 2008-10-08 |
Family
ID=34419834
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003352212A Expired - Fee Related JP4162566B2 (ja) | 2003-10-10 | 2003-10-10 | 半導体装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7309921B2 (ja) |
JP (1) | JP4162566B2 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5114865B2 (ja) * | 2006-04-26 | 2013-01-09 | 日産自動車株式会社 | 半導体装置 |
TWI415316B (zh) * | 2008-11-07 | 2013-11-11 | Macronix Int Co Ltd | 一記憶胞存取裝置具有多晶及單晶半導體區域的pn接面 |
US8664689B2 (en) * | 2008-11-07 | 2014-03-04 | Macronix International Co., Ltd. | Memory cell access device having a pn-junction with polycrystalline plug and single-crystal semiconductor regions |
US8907316B2 (en) * | 2008-11-07 | 2014-12-09 | Macronix International Co., Ltd. | Memory cell access device having a pn-junction with polycrystalline and single crystal semiconductor regions |
US8089137B2 (en) | 2009-01-07 | 2012-01-03 | Macronix International Co., Ltd. | Integrated circuit memory with single crystal silicon on silicide driver and manufacturing method |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5234674A (en) | 1975-09-12 | 1977-03-16 | Toshiba Corp | Semiconductor device |
JPH0642555B2 (ja) | 1989-06-20 | 1994-06-01 | 株式会社東芝 | 半導体装置 |
JPH0469939A (ja) * | 1990-07-11 | 1992-03-05 | Sony Corp | 絶縁ゲート型電界効果トランジスタ |
JP3255698B2 (ja) | 1992-03-30 | 2002-02-12 | 新日本無線株式会社 | 高安定ツェナーダイオード |
JPH06350108A (ja) * | 1993-06-10 | 1994-12-22 | Nec Corp | 半導体装置およびその製造方法 |
US6093615A (en) * | 1994-08-15 | 2000-07-25 | Micron Technology, Inc. | Method of fabricating a contact structure having a composite barrier layer between a platinum layer and a polysilicon plug |
US5998837A (en) * | 1995-06-02 | 1999-12-07 | Siliconix Incorporated | Trench-gated power MOSFET with protective diode having adjustable breakdown voltage |
US6294426B1 (en) * | 2001-01-19 | 2001-09-25 | Taiwan Semiconductor Manufacturing Company | Method of fabricating a capacitor under bit line structure with increased capacitance without increasing the aspect ratio for a dry etched bit line contact hole |
US6838692B1 (en) * | 2003-06-23 | 2005-01-04 | Macronix International Co., Ltd. | Chalcogenide memory device with multiple bits per cell |
-
2003
- 2003-10-10 JP JP2003352212A patent/JP4162566B2/ja not_active Expired - Fee Related
-
2004
- 2004-01-21 US US10/760,503 patent/US7309921B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US7309921B2 (en) | 2007-12-18 |
JP2005116947A (ja) | 2005-04-28 |
US20050077631A1 (en) | 2005-04-14 |
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