JP4110279B2 - Substrate coated with photocatalyst film and method for forming photocatalyst film on substrate - Google Patents
Substrate coated with photocatalyst film and method for forming photocatalyst film on substrate Download PDFInfo
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- JP4110279B2 JP4110279B2 JP2004025772A JP2004025772A JP4110279B2 JP 4110279 B2 JP4110279 B2 JP 4110279B2 JP 2004025772 A JP2004025772 A JP 2004025772A JP 2004025772 A JP2004025772 A JP 2004025772A JP 4110279 B2 JP4110279 B2 JP 4110279B2
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- film
- photocatalyst
- titanium dioxide
- base material
- substrate
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- 239000011941 photocatalyst Substances 0.000 title claims description 104
- 238000000034 method Methods 0.000 title claims description 51
- 239000000758 substrate Substances 0.000 title claims description 35
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 199
- 239000004408 titanium dioxide Substances 0.000 claims description 83
- 239000000463 material Substances 0.000 claims description 63
- 230000001699 photocatalysis Effects 0.000 claims description 48
- 229910000077 silane Inorganic materials 0.000 claims description 44
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 38
- 239000002245 particle Substances 0.000 claims description 38
- 230000000844 anti-bacterial effect Effects 0.000 claims description 30
- 239000004332 silver Substances 0.000 claims description 25
- 229910052709 silver Inorganic materials 0.000 claims description 25
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 20
- 150000001879 copper Chemical class 0.000 claims description 20
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 claims description 20
- 125000003545 alkoxy group Chemical group 0.000 claims description 19
- 229910052736 halogen Chemical group 0.000 claims description 18
- 150000002367 halogens Chemical group 0.000 claims description 18
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 17
- 229910052802 copper Inorganic materials 0.000 claims description 17
- 239000010949 copper Substances 0.000 claims description 17
- 239000012528 membrane Substances 0.000 claims description 16
- 239000003242 anti bacterial agent Substances 0.000 claims description 15
- 239000002994 raw material Substances 0.000 claims description 15
- 239000013078 crystal Substances 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 229910001868 water Inorganic materials 0.000 claims description 14
- 229940121375 antifungal agent Drugs 0.000 claims description 13
- 230000000843 anti-fungal effect Effects 0.000 claims description 12
- -1 silver ions Chemical class 0.000 claims description 12
- 230000001877 deodorizing effect Effects 0.000 claims description 11
- 125000000217 alkyl group Chemical group 0.000 claims description 10
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 10
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 10
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 10
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 claims description 9
- 229920003023 plastic Polymers 0.000 claims description 9
- 239000004033 plastic Substances 0.000 claims description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 8
- 239000003377 acid catalyst Substances 0.000 claims description 7
- 238000001035 drying Methods 0.000 claims description 7
- 239000003960 organic solvent Substances 0.000 claims description 7
- 239000003429 antifungal agent Substances 0.000 claims description 6
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 5
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 4
- 229910001431 copper ion Inorganic materials 0.000 claims description 4
- 238000012545 processing Methods 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- 239000005749 Copper compound Substances 0.000 claims 1
- 150000001880 copper compounds Chemical class 0.000 claims 1
- 229940100890 silver compound Drugs 0.000 claims 1
- 150000003379 silver compounds Chemical class 0.000 claims 1
- 238000012360 testing method Methods 0.000 description 28
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 17
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 16
- 239000011230 binding agent Substances 0.000 description 14
- 238000002845 discoloration Methods 0.000 description 13
- 238000010438 heat treatment Methods 0.000 description 12
- 230000000855 fungicidal effect Effects 0.000 description 11
- 238000000576 coating method Methods 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 238000006460 hydrolysis reaction Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 8
- 238000005452 bending Methods 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- 230000007062 hydrolysis Effects 0.000 description 8
- 229910001961 silver nitrate Inorganic materials 0.000 description 8
- 230000004888 barrier function Effects 0.000 description 7
- 238000004332 deodorization Methods 0.000 description 7
- 238000010304 firing Methods 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 241000894006 Bacteria Species 0.000 description 5
- 239000004215 Carbon black (E152) Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 229930195733 hydrocarbon Natural products 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000002609 medium Substances 0.000 description 5
- 238000006068 polycondensation reaction Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 5
- 229920001817 Agar Polymers 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- 239000008272 agar Substances 0.000 description 4
- 229910021529 ammonia Inorganic materials 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 150000002430 hydrocarbons Chemical group 0.000 description 4
- 230000002265 prevention Effects 0.000 description 4
- 239000011164 primary particle Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000005046 Chlorosilane Substances 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000001580 bacterial effect Effects 0.000 description 3
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 241000588724 Escherichia coli Species 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910002808 Si–O–Si Inorganic materials 0.000 description 2
- 239000013068 control sample Substances 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000002781 deodorant agent Substances 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000000417 fungicide Substances 0.000 description 2
- 238000001027 hydrothermal synthesis Methods 0.000 description 2
- 238000013032 photocatalytic reaction Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- CDOUZKKFHVEKRI-UHFFFAOYSA-N 3-bromo-n-[(prop-2-enoylamino)methyl]propanamide Chemical compound BrCCC(=O)NCNC(=O)C=C CDOUZKKFHVEKRI-UHFFFAOYSA-N 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 241001149955 Cladosporium cladosporioides Species 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 239000004278 EU approved seasoning Substances 0.000 description 1
- 241000588722 Escherichia Species 0.000 description 1
- 241000233866 Fungi Species 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229940116318 copper carbonate Drugs 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- 229960000355 copper sulfate Drugs 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 description 1
- SXTLQDJHRPXDSB-UHFFFAOYSA-N copper;dinitrate;trihydrate Chemical compound O.O.O.[Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O SXTLQDJHRPXDSB-UHFFFAOYSA-N 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000012136 culture method Methods 0.000 description 1
- 238000012258 culturing Methods 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 235000019329 dioctyl sodium sulphosuccinate Nutrition 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 235000011194 food seasoning agent Nutrition 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000011081 inoculation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000008363 phosphate buffer Substances 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 239000001965 potato dextrose agar Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- YPNVIBVEFVRZPJ-UHFFFAOYSA-L silver sulfate Chemical compound [Ag+].[Ag+].[O-]S([O-])(=O)=O YPNVIBVEFVRZPJ-UHFFFAOYSA-L 0.000 description 1
- 229910000367 silver sulfate Inorganic materials 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
Description
本発明は、消臭、抗菌、および防かび機能を有しかつ加工性・耐光性に優れた光触媒皮膜を塗布した基材、および光触媒皮膜を基材上に形成する方法に関するものである。 The present invention relates to a base material coated with a photocatalyst film having deodorant, antibacterial and antifungal functions and excellent in processability and light resistance, and a method for forming the photocatalyst film on the base material.
一般に、二酸化チタン等の光触媒に紫外線を含む光を照射すると、有機物が酸化分解することは古くから知られている。近年このような二酸化チタンの効果を利用した消臭、抗菌、防かび等の用途への応用が検討されている。二酸化チタンを基材に固定する方法として、基材に二酸化チタン粒子が水や有機溶媒に分散されたゾルを塗布し乾燥後、高温で処理し焼結させる方法と、二酸化チタン粒子をバインダーに混入する方法とがあるが、前者の焼結させる場合は、基材がタイルなどの高温焼成に耐えられるものに限定される。一方、バインダーを用いる方法では、比較的低温での焼成が可能であるため、様々な基材に塗布することができる。アルコキシシランやクロロシラン等の加水分解・重縮合生成物は、低温焼成が可能で、様々な基材に塗布することができ、比較的安価であるため、二酸化チタン粒子のバインダーとして優れている。 In general, it has been known for a long time that an organic substance is oxidatively decomposed when a photocatalyst such as titanium dioxide is irradiated with light containing ultraviolet rays. In recent years, application to applications such as deodorizing, antibacterial, and antifungal using the effect of titanium dioxide has been studied. As a method of fixing titanium dioxide to the base material, a method of applying a sol in which titanium dioxide particles are dispersed in water or an organic solvent to the base material, drying, processing at high temperature and sintering, and mixing the titanium dioxide particles into the binder However, when the former is sintered, the base material is limited to one that can withstand high-temperature firing such as tiles. On the other hand, the method using a binder can be applied to various substrates because it can be fired at a relatively low temperature. Hydrolysis / polycondensation products such as alkoxysilanes and chlorosilanes are excellent as a binder for titanium dioxide particles because they can be fired at a low temperature, can be applied to various substrates, and are relatively inexpensive.
そこで、従来、特開平８−１６４３３４号公報記載の光触媒用酸化チタン塗膜形成性組成物及びその製法の発明では、アルコキシシランやクロロシラン等の加水分解性ケイ素化合物を二酸化チタンのバインダーに用い、特許第２６１８２８７号公報記載の光反応性有害物質除去剤及びこれを用いる有害物質除去方法では、アルコキシシラン等の金属アルコキシドの加水分解生成物を二酸化チタンのバインダーに用いることにより、優れた光触媒効果を持つ皮膜が得られることが報告されている。 Therefore, conventionally, in the invention of the titanium oxide coating film-forming composition for photocatalyst described in JP-A-8-164334 and the production method thereof, a hydrolyzable silicon compound such as alkoxysilane or chlorosilane is used as a binder of titanium dioxide, The photoreactive harmful substance removing agent described in Japanese Patent No. 2618287 and the hazardous substance removing method using the same have excellent photocatalytic effect by using a hydrolysis product of metal alkoxide such as alkoxysilane as a binder of titanium dioxide. It has been reported that a film can be obtained.
しかしながら、前者の皮膜は、成分のすべてもしくはほとんどが無機成分からなるため、加工性に乏しく、また後者においても加工性に優れた皮膜が得られるという記載は見当たらない。また、加工性を必要としない用途においても、例えば従来の無機成分からなるバインダーと二酸化チタン粒子とを含んだ塗料は、薄く均一に塗布した場合は剥離しないが、膜厚が０．５〜１μｍ程度になるとクラックが生じ剥離しやすいため、皮膜を塗布する成形体の形状が複雑かもしくは平板への塗布でも均一な皮膜の形成が困難な方法の場合、膜が厚くなった部分からクラックが生じ剥離しやすいため、ポストコートへの利用も難しいという問題点があった。 However, the former film is poor in workability because all or most of the components are composed of inorganic components, and there is no description that a film excellent in workability can be obtained in the latter. Even in applications that do not require workability, for example, a conventional paint containing a binder composed of inorganic components and titanium dioxide particles does not peel off when applied thinly and uniformly, but the film thickness is 0.5 to 1 μm. Since cracks are likely to occur and peel off easily, cracks occur from the thickened part when the shape of the molded product to which the film is applied is complicated or when it is difficult to form a uniform film even when applied to a flat plate. There is a problem that it is difficult to use for post-coating because it is easy to peel off.
このようなアルコキシシランやクロロシラン等の加水分解性ケイ素化合物を二酸化チタンのバインダーの原料として用いた従来法の場合、加工性に優れた皮膜が得られないという問題点を解決するため、本発明者らは先に、式ＲＳｉ（Ｘ）３（式中、Ｒはアルキル基、フェニル基、またはビニル基よりなる炭化水素基、Ｘはアルコキシル基、またはハロゲンである）で表される３官能シランと、式Ｓｉ（Ｘ）４（式中、Ｘはアルコキシル基、またはハロゲンである）で表される４官能シランとの加水分解・重縮合物を、光触媒としての二酸化チタン粒子のバインダー原料とした加工性・耐光性に優れた光触媒皮膜の発明を提案した（例えば特願平１０−１８３６３１号参照）。 In order to solve the problem that a film excellent in processability cannot be obtained in the conventional method using such a hydrolyzable silicon compound such as alkoxysilane or chlorosilane as a raw material for a binder of titanium dioxide, the present inventor First, a trifunctional silane represented by the formula RSi (X) 3 (wherein R is a hydrocarbon group composed of an alkyl group, a phenyl group, or a vinyl group, and X is an alkoxyl group or a halogen) Processing using a hydrolysis / polycondensation product with a tetrafunctional silane represented by the formula Si (X) 4 (wherein X is an alkoxyl group or a halogen) as a binder raw material for titanium dioxide particles as a photocatalyst Invented a photocatalyst film having excellent properties and light resistance (see, for example, Japanese Patent Application No. 10-183631).
しかしながら、光触媒としての二酸化チタン粒子にバインダーを加えて作製した先提案の光触媒皮膜では、使用環境と用途によっては光触媒機能が不充分な場合が生じることも考えられ、特に紫外線量が少ない環境では、抗菌力が発揮でないという問題があった。 However, in the previously proposed photocatalyst film prepared by adding a binder to titanium dioxide particles as a photocatalyst, there may be cases where the photocatalytic function is insufficient depending on the use environment and application, particularly in an environment where the amount of ultraviolet rays is small, There was a problem that the antibacterial power was not exhibited.
一方、例えばP.Pichat,M.-N.Mozzanega,J.Disdier,and J.-M. Herrmann,Nouv.J.Chim.,6,559,(1982),やH.Harada,Chem.Express,6[12],961(1991),等の研究のように、光触媒に適当な金属を少量担持することにより、光触媒機能が向上することが既に知られている。ここで、光触媒に少量担持する金属としては、白金、銀、銅、鉄、コバルト等多数挙げられるが、これらのうち、銀、銅等は金属自体の抗菌力が大変強いことが古くから知られている。二酸化チタンによる光触媒反応は、太陽光、蛍光灯、紫外線ランプ等に含まれる紫外線を必要とするため、暗所においては抗菌効果を発揮することができないが、銀や銅を添加することにより、暗所における抗菌力を付与することができる。 On the other hand, for example, P. Pichat, M.-N. Mozzanega, J. Disdier, and J.-M. Herrmann, Nouv. J. Chim., 6, 559, (1982), H. Harada, Chem. Express, 6 [ 12], 961 (1991), etc., it is already known that the photocatalytic function is improved by supporting a small amount of an appropriate metal on the photocatalyst. Here, as the metal supported in a small amount on the photocatalyst, there are a large number of platinum, silver, copper, iron, cobalt and the like. Among these, silver, copper, etc. have long been known that the antibacterial power of the metal itself is very strong. ing. The photocatalytic reaction with titanium dioxide requires the ultraviolet rays contained in sunlight, fluorescent lamps, ultraviolet lamps, etc., and thus cannot exhibit an antibacterial effect in dark places. Antibacterial power can be imparted at the place.
ところで、二酸化チタンによる光触媒反応は、二酸化チタン表面で起こるため、防かびに利用した場合、二酸化チタンと接しているかびの部分は分解されるが、表面から少し離れた位置では、かびは分解せず、成長し続けるため、光照射下においても二酸化チタンのみで防かび効果を発揮するのは非常に困難である。これに対し、銀は、抗菌のみならず、防かびにも非常に効果があることから、防かびのために銀を添加して二酸化チタンを含む光触媒皮膜を作製することは非常に好ましい。 By the way, the photocatalytic reaction by titanium dioxide occurs on the surface of titanium dioxide, so when used for mold prevention, the mold part in contact with titanium dioxide is decomposed, but the mold is decomposed at a position slightly away from the surface. However, since it continues to grow, it is very difficult to exhibit the fungicidal effect with only titanium dioxide even under light irradiation. On the other hand, since silver is very effective not only for antibacterial activity but also for mold prevention, it is very preferable to add a silver for mold prevention to produce a photocatalytic film containing titanium dioxide.
二酸化チタンを含む光触媒皮膜に銀や銅を担持する場合、銀や銅は金属塩として原料に添加されるのが一般的であるが、銀イオンは光化学反応や酸化により金属銀の凝集体あるいは酸化物となり、褐色あるいは黒色に変化するという性質を有するため、防かび効果を発揮できる程度の銀を添加した場合には、皮膜焼成時の熱や皮膜使用時の紫外線により変色するという問題があり、特に美観を重視する用途においては使用できないという問題があった。一方、銅塩を使用した場合には、皮膜使用時の変色は小さいものの、防かび効果を発揮するのが困難であるという問題があった。 When silver or copper is supported on a photocatalyst film containing titanium dioxide, silver or copper is generally added to the raw material as a metal salt, but silver ions are aggregated or oxidized by a photochemical reaction or oxidation. Since it has the property of changing to brown or black, when adding silver to the extent that it can exhibit an antifungal effect, there is a problem of discoloration due to heat during film firing and ultraviolet light during film use, In particular, there is a problem that it cannot be used in applications where aesthetics are important. On the other hand, when a copper salt is used, although there is little discoloration when using the film, there is a problem that it is difficult to exhibit the fungicidal effect.
本発明の目的は、上記の本発明者らの先提案の発明技術の問題点を解決し、式ＲＳｉ（Ｘ）３（式中、Ｒはアルキル基、フェニル基、またはビニル基よりなる炭化水素基、Ｘはアルコキシル基、またはハロゲンである）で表される３官能シランと、式Ｓｉ（Ｘ）４（式中、Ｘはアルコキシル基、またはハロゲンである）で表される４官能シランとの加水分解・重縮合物を、光触媒としての二酸化チタン粒子のバインダー原料とした加工性・耐光性に優れた光触媒皮膜において、原料に銀塩と共に銅塩を添加することにより、作製した皮膜の抗菌、防かび、消臭などの光触媒機能を大幅に向上させ、光照射環境あるいは暗所のいずれにおいても、優れた抗菌、防かび、および消臭機能を有しかつ加工性・耐光性に優れた光触媒皮膜を塗布した基材提供すること、さらに、防かび効果を発揮できる程度の銀塩を添加した場合にも皮膜焼成時の熱や皮膜使用時の紫外線による変色が小さく、特に美観を重視する用途にも使用できるうえに、金属、プラスチックス等のあらゆる基材の表面に形成することができ、加工性に優れた基材であれば、プレコートにより光触媒皮膜の形成が可能である、光触媒皮膜を基材上に形成する方法を提供することにある。 The object of the present invention is to solve the above-mentioned problems of the inventive technique proposed by the present inventors, in which RSI (X) 3 (wherein R is a hydrocarbon comprising an alkyl group, a phenyl group, or a vinyl group) A trifunctional silane represented by the group, X is an alkoxyl group or halogen, and a tetrafunctional silane represented by the formula Si (X) 4 (wherein X is an alkoxyl group or halogen). In the photocatalyst film with excellent processability and light resistance using the hydrolysis / polycondensate as a binder raw material for titanium dioxide particles as a photocatalyst, by adding a copper salt together with a silver salt to the raw material, The photocatalyst functions such as mold prevention and deodorization are greatly improved, and it has excellent antibacterial, antifungal and deodorization functions in both light irradiation environment and dark place, and has excellent processability and light resistance. I applied the film Providing a base material, and even when a silver salt that can exhibit an antifungal effect is added, the discoloration due to heat at the time of film baking and ultraviolet light at the time of film use is small, and it can be used for applications that emphasize aesthetics in particular. In addition, the photocatalytic film can be formed on the base material by pre-coating if it can be formed on the surface of any base material such as metal, plastics, etc. It is to provide a method of forming.
上記の目的を達成するために、本発明による光触媒皮膜を塗布した基材は、消臭、抗菌、および防かび機能を有しかつ加工性・耐光性に優れた光触媒皮膜が、式ＲＳｉ（Ｘ）３ （式中、Ｒはアルキル基、フェニル基、またはビニル基よりなる炭化水素基、Ｘはアルコキシル基、またはハロゲンである）で表される３官能シランと、式Ｓｉ（Ｘ）４（式中、Ｘはアルコキシル基、またはハロゲンである）で表される４官能シランとの加水分解・重縮合物と、光触媒としての二酸化チタン粒子と、抗菌剤・防かび剤としての銀と、抗菌剤としての銅とよりなることを特徴としている。 In order to achieve the above object, the substrate coated with the photocatalyst film according to the present invention has a deodorizing, antibacterial and antifungal function, and a photocatalyst film excellent in processability and light resistance is represented by the formula RSi (X ) 3 (wherein R is a hydrocarbon group comprising an alkyl group, a phenyl group or a vinyl group, X is an alkoxyl group or a halogen), and a formula Si (X) 4 (formula In which X is an alkoxyl group or a halogen), a hydrolysis / polycondensation product with a tetrafunctional silane, titanium dioxide particles as a photocatalyst, silver as an antibacterial and antifungal agent, and an antibacterial agent It is made of copper.
つぎに、本発明による基材上に光触媒皮膜を形成する方法は、式ＲＳｉ（Ｘ）３（式中、Ｒはアルキル基、フェニル基、またはビニル基よりなる炭化水素基、Ｘはアルコキシル基、またはハロゲンである）で表される３官能シランと、式Ｓｉ（Ｘ）４（式中、Ｘはアルコキシル基、またはハロゲンである）で表される４官能シランとを、アルコールもしくはその他の有機溶媒、水、および酸触媒、抗菌剤・防かび剤としての銀塩、抗菌剤としての銅塩の存在下で、加水分解・重縮合して光触媒皮膜形成用ゾルを形成し、この光触媒皮膜形成用ゾルを光触媒としての二酸化チタン粒子と混合するか、または上記シラン化合物の反応開始時から二酸化チタン粒子を混合し、二酸化チタン粒子含有ゾルを金属板等の基材に塗布し、乾燥するか、または乾燥後さらに５００℃以下の温度で熱処理させることを特徴としている。 Next, a method of forming a photocatalytic film on a substrate according to the present invention has the formula RSi (X) 3 (wherein R is a hydrocarbon group comprising an alkyl group, a phenyl group, or a vinyl group, X is an alkoxyl group, Or a trifunctional silane represented by the formula Si (X) 4 (wherein X is an alkoxyl group or a halogen), an alcohol or other organic solvent Water, acid catalyst, silver salt as antibacterial agent / antifungal agent, copper salt as antibacterial agent, hydrolysis and polycondensation to form sol for photocatalyst film formation. The sol is mixed with titanium dioxide particles as a photocatalyst, or titanium dioxide particles are mixed from the beginning of the reaction of the silane compound, and the sol containing titanium dioxide particles is applied to a substrate such as a metal plate and dried. Alternatively, it is characterized by further heat treatment at a temperature of 500 ° C. or lower after drying.
本発明による光触媒皮膜を塗布した基材において、光触媒皮膜は、上述のように、式ＲＳｉ（Ｘ）３（式中、Ｒはアルキル基、フェニル基、またはビニル基よりなる炭化水素基、Ｘはアルコキシル基、またはハロゲンである）で表される３官能シランと、式Ｓｉ（Ｘ）４（式中、Ｘはアルコキシル基、またはハロゲンである）で表される４官能シランとの加水分解・重縮合物と、光触媒としての二酸化チタン粒子と、抗菌剤・防かび剤としての銀と、抗菌剤としての銅とよりなるもので、加工性・耐光性に優れ、しかも光照射下および光なしのいずれの環境においても優れた消臭、抗菌、および防かび機能を有するため、あらゆる環境下での使用に耐え得るものである。また本発明において、光触媒皮膜は、皮膜焼成時あるいは使用時において、変色が小さいため、特にパネル材等の美観を保つ必要のある用途の基材に塗布して、好適に用いることができるという効果を奏する。 In the substrate coated with the photocatalytic film according to the present invention, the photocatalytic film has the formula RSi (X) 3 (wherein R is a hydrocarbon group comprising an alkyl group, a phenyl group, or a vinyl group, and X is Hydrolysis and heavy reaction between a trifunctional silane represented by an alkoxyl group or a halogen and a tetrafunctional silane represented by the formula Si (X) 4 (wherein X is an alkoxyl group or a halogen) Condensate, titanium dioxide particles as a photocatalyst, silver as an antibacterial and antifungal agent, and copper as an antibacterial agent, with excellent workability and light resistance, and with and without light irradiation Since it has excellent deodorizing, antibacterial, and fungicidal functions in any environment, it can withstand use in any environment. Further, in the present invention, the photocatalyst film has a small discoloration when the film is baked or used, so that it can be suitably used by being applied to a base material for applications that need to keep the aesthetic appearance such as panel materials. Play.
また、本発明による基材上に光触媒皮膜を形成する方法は、上述のように、式ＲＳｉ（Ｘ）３（式中、Ｒはアルキル基、フェニル基、またはビニル基よりなる炭化水素基、Ｘはアルコキシル基、またはハロゲンである）で表される３官能シランと、式Ｓｉ（Ｘ）４（式中、Ｘはアルコキシル基、またはハロゲンである）で表される４官能シランとを、アルコールもしくはその他の有機溶媒、水、および酸触媒、抗菌剤・防かび剤としての銀塩、抗菌剤としての銅塩の存在下で、加水分解・重縮合して光触媒皮膜形成用ゾルを形成し、この光触媒皮膜形成用ゾルを光触媒としての二酸化チタン粒子と混合するか、または上記シラン化合物の反応開始時から二酸化チタン粒子を混合し、二酸化チタン粒子含有ゾルを金属板等の基材に塗布し、乾燥するか、または乾燥後さらに５００℃以下の温度で熱処理させることを特徴とするもので、本発明の方法によれば、加工性・耐光性に優れかつ消臭、抗菌、および防かび効果を持った光触媒皮膜を、金属、プラスチックス等のあらゆる基材の表面に形成することができ、また基材自体が加工性の良いものであれば、プレコートにより光触媒皮膜の形成が可能であるという効果を奏する。 In addition, as described above, the method for forming a photocatalytic film on a substrate according to the present invention has the formula RSi (X) 3 (wherein R is a hydrocarbon group comprising an alkyl group, a phenyl group, or a vinyl group, X Is an alkoxyl group or a halogen) and a tetrafunctional silane represented by the formula Si (X) 4 (wherein X is an alkoxyl group or a halogen), an alcohol or In the presence of other organic solvents, water, acid catalyst, silver salt as antibacterial agent and fungicide, and copper salt as antibacterial agent, hydrolysis and polycondensation are performed to form a sol for forming a photocatalyst film. The photocatalyst film-forming sol is mixed with titanium dioxide particles as a photocatalyst, or titanium dioxide particles are mixed from the start of the reaction of the silane compound, and the titanium dioxide particle-containing sol is applied to a substrate such as a metal plate and dried. It is characterized in that it is dried or heat-treated at a temperature of 500 ° C. or lower after drying. According to the method of the present invention, it has excellent processability and light resistance and has deodorant, antibacterial and antifungal effects. The photocatalytic film can be formed on the surface of any base material such as metal and plastics, and if the base material itself has good processability, the photocatalytic film can be formed by pre-coating. Play.
つぎに、本発明の実施の形態を説明する。 Next, an embodiment of the present invention will be described.
まず、本発明において、消臭、抗菌、および防かび機能を有しかつ加工性・耐光性に優れた光触媒皮膜は、二酸化チタンと３官能シランと４官能シランと、抗菌剤・防かび剤としての銀と、抗菌剤としての銅とを含んでいる。 First, in the present invention, a photocatalytic film having a deodorizing, antibacterial, and fungicidal function and excellent in processability and light resistance includes titanium dioxide, trifunctional silane, tetrafunctional silane, and antibacterial / antifungal agent. Silver and copper as an antibacterial agent.
本発明で用いられる二酸化チタンは、硫酸法、塩素法等の工業的手法により調製された粒子あるいは水熱法、ゾル−ゲル法により得られた粒子などのあらゆる手法で調製された物が用いられ、粒子の状態としては、粉末状あるいは粉末を液体に分散させた状態のいずれでもよい。 As titanium dioxide used in the present invention, particles prepared by industrial methods such as sulfuric acid method and chlorine method, or those prepared by all methods such as particles obtained by hydrothermal method and sol-gel method are used. The particle state may be either powdered or powder dispersed in a liquid.
なお、硫酸法および塩素法では、調製条件により一次粒子径が０．２〜０．３μｍ程度の顔料用二酸化チタンと、一次粒子径が１００ｎｍ未満の微粒子二酸化チタンが得られるが、一次粒子が小さく比表面積が大きい塩素法により調製した微粒子二酸化チタンが特に好ましい。 In the sulfuric acid method and the chlorine method, titanium dioxide for pigment having a primary particle size of about 0.2 to 0.3 μm and fine particle titanium dioxide having a primary particle size of less than 100 nm are obtained depending on the preparation conditions, but the primary particles are small. Particulate titanium dioxide prepared by a chlorine method having a large specific surface area is particularly preferred.
工業的に調製される二酸化チタンの結晶形は、ルチル型、アナターゼ型、あるいはルチル型とアナターゼ型の混合物であり、水熱法では、ブルカイト型の結晶が析出する場合がある。本発明では、いかなる結晶形の二酸化チタン粒子をも用いることができるが、場合によっては、無定形の酸化チタンが含まれていても良い。結晶形としては、アナターゼ型、あるいはルチル型とアナターゼ型との混合物が好ましく、量子効率の高いアナターゼ型を結晶成分中の比率で３０重量％以上含む物が、さらに好ましい。 The crystal form of titanium dioxide that is industrially prepared is a rutile type, anatase type, or a mixture of a rutile type and an anatase type, and a brookite type crystal may be precipitated by the hydrothermal method. In the present invention, any crystal form of titanium dioxide particles can be used, but in some cases, amorphous titanium oxide may be included. As the crystal form, an anatase type or a mixture of a rutile type and an anatase type is preferable, and a substance containing 30% by weight or more of an anatase type having a high quantum efficiency in a ratio in the crystal component is more preferable.
また、二酸化チタンは必要な皮膜特性に従って皮膜中濃度で８０重量％以下の好適な量が添加されるが、二酸化チタン粒子濃度が低い場合には光触媒効果が小さく、二酸化チタン粒子濃度が高い場合には皮膜の加工性が劣るため、二酸化チタン濃度は、皮膜中濃度において５〜６０重量％であるのが、好ましい。 In addition, titanium dioxide is added in a suitable amount of 80% by weight or less in the film according to the required film properties. However, when the titanium dioxide particle concentration is low, the photocatalytic effect is small, and when the titanium dioxide particle concentration is high. Since the processability of the film is inferior, the titanium dioxide concentration is preferably 5 to 60% by weight in the film concentration.
また上記において、本発明で用いる３官能シランは、式ＲＳｉ（Ｘ）３（式中、Ｒはアルキル基、フェニル基、またはビニル基よりなる炭化水素基、Ｘはアルコキシル基、またはハロゲンである）で表されるものである。 In the above, the trifunctional silane used in the present invention has the formula RSi (X) 3 (wherein R is a hydrocarbon group comprising an alkyl group, a phenyl group, or a vinyl group, and X is an alkoxyl group or a halogen). It is represented by
具体的には、メチルトリエトキシシラン、エチルトリエトキシシラン、フェニルトリエトキシシラン、ビニルトリエトキシシラン、メチルトリメトキシシラン、メチルトリクロロエシラン、エチルトリクロロエシラン、ビニルトリクロロエシラン等が挙げられ、少なくとも１種類以上用いられる。 Specific examples include methyltriethoxysilane, ethyltriethoxysilane, phenyltriethoxysilane, vinyltriethoxysilane, methyltrimethoxysilane, methyltrichloroesilane, ethyltrichloroesilane, vinyltrichloroesilane, etc. One or more types are used.
本発明で用いる４官能シランは、式Ｓｉ（Ｘ）４（式中、Ｘはアルコキシル基、またはハロゲンである）で表されものである。 The tetrafunctional silane used in the present invention is represented by the formula Si (X) 4 (wherein X is an alkoxyl group or halogen).
具体的には、テトラエトキシシラン、テトラメトキシシラン、テトラクロロシシラン等が挙げられ、少なくとも１種類以上用いられる。 Specific examples include tetraethoxysilane, tetramethoxysilane, and tetrachlorosilane, and at least one kind is used.
本発明においては上記３官能シランと４官能シランとを混合した後、加水分解・重縮合させた物をバインダーとして用いる場合と、上記３官能シランと４官能シランをそれぞれ加水分解・重縮合させた物、あるいはこれらのシラン化合物のオリゴマーを混合して加水分解・重縮合させた物を用いる場合がある。 In the present invention, the trifunctional silane and the tetrafunctional silane are mixed and then hydrolyzed and polycondensed, and the trifunctional silane and the tetrafunctional silane are hydrolyzed and polycondensed, respectively. Or a product obtained by mixing and hydrolyzing and polycondensing these silane compound oligomers.
本発明で用いる３官能シランと４官能シランの混合比は、３官能シラン：４官能シラン＝ｘ：（１−ｘ）のモル比で表すと、０．３≦ｘ＜０．７、好ましくは０．４≦ｘ≦０．６である。なお、上記シラン化合物のオリゴマーをバインダーの原料に用いる場合には、上記モル比はモノマー換算値に相当する。ここで、ｘの範囲を上記のように限定したのは、ｘが小さすぎると、皮膜中にＲ（炭化水素基）が少なくなるため皮膜の加工性が低下し、ｘが大きすぎると、二酸化チタン粒子表面が親水性である場合、上記シラン化合物より生成したバインダーを含んだゾル中での二酸化チタン粒子の分散性が低下するからである。 The mixing ratio of the trifunctional silane and the tetrafunctional silane used in the present invention is expressed by a molar ratio of trifunctional silane: tetrafunctional silane = x: (1-x), 0.3 ≦ x <0.7, preferably 0.4 ≦ x ≦ 0.6. In addition, when the oligomer of the said silane compound is used for the raw material of a binder, the said molar ratio is equivalent to a monomer conversion value. Here, the range of x is limited as described above. When x is too small, R (hydrocarbon group) is reduced in the film, so that the processability of the film is deteriorated. This is because when the surface of the titanium particles is hydrophilic, the dispersibility of the titanium dioxide particles in the sol containing the binder generated from the silane compound is lowered.
本発明において用いる銀塩および銅塩は、特に限定されないが、例えば硝酸銀、硫酸銀、硝酸銅、硫酸銅、塩化第一銅、塩化第二銅、炭酸銅があげられる。これらの中から少なくとも１種の銀塩および銅塩が用いられる。 The silver salt and copper salt used in the present invention are not particularly limited, and examples thereof include silver nitrate, silver sulfate, copper nitrate, copper sulfate, cuprous chloride, cupric chloride, and copper carbonate. Among these, at least one silver salt and copper salt is used.
本発明において、光触媒皮膜中における銀塩および銅塩の金属の存在状態は、不明であるが、銀成分として少なくとも銀イオンおよび／または金属銀を含み、さらに、酸化銀も含まれる場合もあると思われる。また、皮膜中の銅成分として少なくとも銅イオンおよび／または金属銅を含み、さらに、酸化銅も含まれる場合もあると思われる。作製した皮膜において、銀イオンおよび／または金属銀は抗菌剤・防かび剤として働き、銅イオンおよび／または金属銅は抗菌剤として働く。 In the present invention, the existence state of the silver salt and the copper salt metal in the photocatalytic film is unknown, but contains at least silver ions and / or metallic silver as a silver component, and may also contain silver oxide. Seem. In addition, it is considered that at least copper ions and / or metallic copper is contained as a copper component in the film, and copper oxide may be further contained. In the produced film, silver ions and / or metallic silver act as an antibacterial agent / fungicide, and copper ions and / or metallic copper act as an antibacterial agent.
上記組成において、銀塩を、金属銀換算にして二酸化チタンの０．０１〜５重量％、また銅塩を、金属銅換算にして二酸化チタンの０．１〜４０重量％添加する。 In the above composition, silver salt is added in an amount of 0.01 to 5% by weight of titanium dioxide in terms of metallic silver, and copper salt is added in an amount of 0.1 to 40% by weight of titanium dioxide in terms of metallic copper.
上記のように、金属塩として銀塩と銅塩を同時に添加するのは、銀塩のみを添加した場合には、抗菌、防かび力は充分であるが、皮膜が焼成あるいは使用時に変色するのに対し、銅塩のみを添加した場合には、皮膜の焼成あるいは使用時に変色が小さくかつ抗菌力はあるものの、充分な防かび効果が得られないからである。 As described above, the silver salt and the copper salt are added simultaneously as the metal salt. When only the silver salt is added, the antibacterial and antifungal properties are sufficient, but the film is discolored during firing or use. On the other hand, when only the copper salt is added, the discoloration is small and the antibacterial activity is small when the film is baked or used, but a sufficient fungicidal effect cannot be obtained.
銀塩の添加量が上記のように限定されるのは、下限未満の添加量では、防かび力が充分に発揮されず、上限より多量に添加すると、皮膜焼成および使用時の変色が大きいからである。 The addition amount of the silver salt is limited as described above, because if the addition amount is less than the lower limit, the fungicidal power is not sufficiently exerted, and if the addition amount is larger than the upper limit, the discoloration during film firing and use is large. It is.
銅塩の添加量が上記のように限定されるのは、下限未満の添加量では、銀塩の添加による皮膜焼成時あるいは使用時における変色を抑制することができず、上限より多量に添加すると、銅塩自体の添加による皮膜焼成時あるいは使用時における変色が大きくなるからである。 The addition amount of the copper salt is limited as described above. If the addition amount is less than the lower limit, discoloration at the time of film firing or use due to the addition of the silver salt cannot be suppressed, and if the addition amount is larger than the upper limit. This is because the discoloration at the time of firing the film or at the time of use due to the addition of the copper salt itself becomes large.
本発明において、光触媒の原料として、皮膜の結合力、および耐熱性を向上させるため、水酸化アルミニウムを添加するのが好ましい。水酸化アルミニウムは、これを多く添加しすぎると、皮膜中の二酸化チタンの比率が小さくなり、光触媒効果が低下するため、二酸化チタンに対して水酸化アルミニウムが０〜５０重量％の割合で含まれているのが、好ましい。 In the present invention, it is preferable to add aluminum hydroxide as a raw material for the photocatalyst in order to improve the bonding strength and heat resistance of the film. If too much aluminum hydroxide is added, the proportion of titanium dioxide in the film decreases and the photocatalytic effect decreases, so aluminum hydroxide is contained in a proportion of 0 to 50% by weight with respect to titanium dioxide. It is preferable.
なお、本発明において、光触媒皮膜の膜厚は、０．０５〜５μｍであるのが、好ましい。 In addition, in this invention, it is preferable that the film thickness of a photocatalyst membrane | film | coat is 0.05-5 micrometers.
つぎに、本発明の基材上に光触媒皮膜を形成する方法は、光触媒皮膜形成用ゾルの調製と皮膜形成とからなる。 Next, the method of forming a photocatalytic film on the substrate of the present invention comprises the preparation of a sol for forming a photocatalytic film and the formation of the film.
Ａ． 光触媒皮膜形成用ゾルの調製
本発明における光触媒皮膜形成用ゾルは、二酸化チタン粒子、３官能シランと、４官能シランとを、アルコールもしくはその他の有機溶媒、水、酸触媒、銀塩、および銅塩を、所定の比率で混合、攪拌することにより得られる。なお、上記原料に加えて、皮膜の結合力、および耐熱性を向上させるため、水酸化アルミニウムを添加することが好ましい。
A. Preparation of Photocatalyst Film Forming Sol In the present invention, the photocatalyst film formation sol comprises titanium dioxide particles, trifunctional silane, and tetrafunctional silane, alcohol or other organic solvent, water, acid catalyst, silver salt, and copper salt. Can be obtained by mixing and stirring at a predetermined ratio. In addition to the above raw materials, aluminum hydroxide is preferably added in order to improve the bond strength and heat resistance of the film.
ここで、酸触媒は、硫酸、硝酸、塩酸などの無機酸、酢酸、シュウ酸などの有機酸が用いられる。 Here, as the acid catalyst, inorganic acids such as sulfuric acid, nitric acid and hydrochloric acid, and organic acids such as acetic acid and oxalic acid are used.
なお、二酸化チタンのバインダーの原料である３官能シランと４官能シランとは、それぞれ加水分解・重縮合させたものあるいはこれらシラン化合物のオリゴマーを混合して用いても良く、二酸化チタン粒子はシランの反応前、反応後のいずれのタイミングで添加しても良い。 The trifunctional silane and tetrafunctional silane that are the raw materials for the titanium dioxide binder may be hydrolyzed / polycondensed or mixed with oligomers of these silane compounds. You may add at any timing before reaction after reaction.
上記ゾル原料の中で二酸化チタン、銀塩、銅塩および水酸化アルミニウム以外の原料の比率を、３官能シラン：４官能シラン：アルコールもしくはその他の有機溶媒：水：酸触媒＝ｘ：（１−ｘ）：ｙ：ｚ：ａのモル比で表すと、ｘ、ｙ、ｚ、ａの値がそれぞれ０．３≦ｘ＜０．７、０．５≦ｙ≦１０００、０．５≦ｚ≦１０００、０．００００１≦ａ≦１である。 In the sol raw material, the ratio of raw materials other than titanium dioxide, silver salt, copper salt and aluminum hydroxide is changed to trifunctional silane: tetrafunctional silane: alcohol or other organic solvent: water: acid catalyst = x: (1- x): When expressed in a molar ratio of y: z: a, the values of x, y, z, and a are 0.3 ≦ x <0.7, 0.5 ≦ y ≦ 1000, and 0.5 ≦ z ≦, respectively. 1000, 0.00001 ≦ a ≦ 1.
上記組成において、まずｘの値については前掲の通りである。ｙが０．５未満であれば、粒子を分散させるのが困難であり、ｙが１０００を越えると、調製した光触媒皮膜形成用ゾルの固形成分濃度が低すぎるため均一な皮膜形成が困難であるので、好ましくない。また、ｚが０．５未満であれば、シランの加水分解に時間がかゝり、ｚが１０００を越えると、ゾルが流動性を失い、ゲル化する可能性があるので、好ましくない。またａが０．００００１未満であれば、シランの加水分解反応の進行が遅くなり、ａが１を越えると、反応が早く進みすぎ、光触媒皮膜形成用ゾルを均一に塗布できる期間が短くなるため、好ましくない。 In the above composition, the value of x is as described above. If y is less than 0.5, it is difficult to disperse the particles, and if y exceeds 1000, the solid component concentration of the prepared photocatalyst film-forming sol is too low to form a uniform film. Therefore, it is not preferable. Further, if z is less than 0.5, it takes a long time to hydrolyze the silane, and if z exceeds 1000, the sol may lose fluidity and gel, which is not preferable. Further, if a is less than 0.00001, the progress of the hydrolysis reaction of silane becomes slow, and if a exceeds 1, the reaction proceeds too quickly, and the period during which the photocatalyst film-forming sol can be uniformly applied becomes short. It is not preferable.
上記光触媒皮膜形成用ゾルの調製に用いる二酸化チタンの製法は、とくに限定されないが、一次粒子が小さく比表面積が大きい塩素法により調製した微粒子二酸化チタンがとくに好ましい。 The production method of titanium dioxide used for the preparation of the sol for forming the photocatalyst film is not particularly limited, but fine particle titanium dioxide prepared by a chlorine method having a small primary particle and a large specific surface area is particularly preferable.
なお、液体に分散させた二酸化チタン粒子を用いる場合には、分散媒の液体も上記組成に含まれる。 In addition, when using the titanium dioxide particle disperse | distributed to the liquid, the liquid of a dispersion medium is also contained in the said composition.
上記光触媒皮膜形成用ゾルの調製に用いる二酸化チタンは、あらゆる結晶形の粒子を用いることができ、無定形の酸化チタンが含まれていても良いが、結晶形としては、アナターゼ型、あるいはルチル型とアナターゼ型との混合物が好ましく、量子効率の高いアナターゼ型を結晶成分中の比率で３０重量％以上含む物が、さらに好ましい。 Titanium dioxide used for the preparation of the photocatalyst film-forming sol can use particles of any crystal form and may contain amorphous titanium oxide. The crystal form may be anatase type or rutile type. And anatase type are preferable, and those containing 30% by weight or more of anatase type having high quantum efficiency in the ratio of the crystal component are more preferable.
また、二酸化チタンは必要な皮膜特性に従って皮膜中濃度で８０重量％以下の好適な量が添加されるが、二酸化チタン粒子濃度が低い場合には光触媒効果が小さく、二酸化チタン粒子濃度が高い場合には皮膜の加工性が劣るため、二酸化チタン濃度は、皮膜中濃度において５〜６０重量％であるのが、好ましい。 In addition, titanium dioxide is added in a suitable amount of 80% by weight or less in the film according to the required film properties. However, when the titanium dioxide particle concentration is low, the photocatalytic effect is small, and when the titanium dioxide particle concentration is high. Since the processability of the film is inferior, the titanium dioxide concentration is preferably 5 to 60% by weight in the film concentration.
なお、上記組成においてシラン中のＳｉ１個あたりのＲ（炭化水素基）の平均数が０．３個以上０．７個未満の範囲内であれば、本発明で用いる上記３官能シランの組成の一部を、一般式Ｒ２Ｓｉ（Ｘ）２（式中、Ｒはアルキル基、フェニル基、またはビニル基よりなる炭化水素基、Ｘはアルコキシル基、またはハロゲンである）で表される２官能シランにしても良い。 In the above composition, if the average number of R (hydrocarbon group) per Si in the silane is within the range of 0.3 to less than 0.7, the composition of the trifunctional silane used in the present invention A part thereof is represented by the general formula R 2 Si (X) 2 (wherein R is a hydrocarbon group comprising an alkyl group, a phenyl group, or a vinyl group, and X is an alkoxyl group or a halogen). Silane may be used.
Ｂ． 皮膜形成
本発明において、上記光触媒皮膜形成用ゾルは、金属板、パネル、タイル、プラスチックス等の基材に、直接あるいはバリヤー層を介して塗布される。塗布方法は、ディップコート、スプレーコート、バーコート、ロールコートなどいかなる方法をも用いることができる。
B. Film Formation In the present invention, the photocatalyst film-forming sol is applied directly or via a barrier layer to a substrate such as a metal plate, panel, tile, or plastics. As a coating method, any method such as dip coating, spray coating, bar coating, and roll coating can be used.
上記光触媒皮膜形成用ゾルを塗布した基材を、室温以上の温度で乾燥することにより、光触媒膜を得ることができる。短時間で皮膜を形成する場合には、乾燥に加えて５００℃以下で熱処理しても良いが、４００〜５００℃で長時間熱処理した場合、Ｓｉ原子に結合したＲ（炭化水素基）が焼成脱離し、皮膜の柔軟性が低下するため、加工性を保つためには３００℃以下の熱処理が好ましい。 A photocatalyst film can be obtained by drying the substrate coated with the photocatalyst film-forming sol at a temperature of room temperature or higher. When a film is formed in a short time, it may be heat-treated at 500 ° C. or lower in addition to drying. However, when heat-treated at 400 to 500 ° C. for a long time, R (hydrocarbon group) bonded to Si atoms is fired. Since it is detached and the flexibility of the film is lowered, heat treatment at 300 ° C. or lower is preferable in order to maintain processability.
光触媒皮膜の厚さはとくに限定されないが、膜厚が０．０５μｍ未満の場合、欠陥の無い皮膜の形成が困難であり、また必要以上に厚い場合は、厚さに見合う光触媒効果の向上がなく、不経済なため、膜厚は、０．０５〜５μｍであるのが、好ましい。ただし、二酸化チタンによる紫外線遮蔽などの機能も兼ねて使用する場合には、５μｍ以上の膜厚でも差し支えない。 The thickness of the photocatalyst film is not particularly limited, but if the film thickness is less than 0.05 μm, it is difficult to form a film without defects, and if it is thicker than necessary, the photocatalytic effect corresponding to the thickness is not improved. The film thickness is preferably 0.05 to 5 μm because it is uneconomical. However, when used also for functions such as ultraviolet shielding by titanium dioxide, a film thickness of 5 μm or more may be used.
なお、上記の皮膜形成において、基材がプラスチックスの場合は、二酸化チタンにより基材が分解されるため、一般的には基材と光触媒皮膜の間にバリヤー層を設けるが、光触媒皮膜中の二酸化チタン粒子が基材に触れる箇所が少なく、実際の使用においてチョーキングが起こらない場合には、バリヤー層を設けなくてもよい。 In the above film formation, when the base material is plastics, the base material is decomposed by titanium dioxide. Therefore, a barrier layer is generally provided between the base material and the photocatalyst film. In the case where there are few places where the titanium dioxide particles touch the substrate and no choking occurs in actual use, the barrier layer may not be provided.
本発明において、光触媒皮膜の製造は、光触媒ゾルの調製と皮膜作製とからなる。 In the present invention, the production of the photocatalytic film comprises the preparation of a photocatalytic sol and the production of the film.
なお、光触媒皮膜をプラスチックス基材に塗布する場合には、プラスチックスが直接二酸化チタンに触れて分解されるのを防止ぐため、プラスチックスと二酸化チタンを含む皮膜との間にバリヤー層を設ける。さらに、基材がソーダライムガラスの場合には、光触媒皮膜焼成時にナトリウムが光触媒膜中に拡散し、光触媒活性が低下するのを防止するため、バリヤー層を設けるものである。 When a photocatalytic film is applied to a plastic substrate, a barrier layer is provided between the plastic and the film containing titanium dioxide to prevent the plastics from directly contacting with titanium dioxide and being decomposed. . Further, when the base material is soda lime glass, a barrier layer is provided to prevent sodium from diffusing into the photocatalyst film at the time of firing the photocatalyst film and reducing the photocatalytic activity.
上記バリヤー層としては、主として二酸化ケイ素、無定形二酸化チタン等の無機物が利用できるが、本発明者らが先に提案した特願平１０−１８３６３２号に記載の光触媒皮膜用下地膜は、表面に凹凸を有する無機−有機複合体であることから、表面の凹凸により光触媒皮膜の密着性を向上させることができ、加工性に優れていることから、本発明の光触媒皮膜のバリヤー層として好適に利用でき、特に加工性を必要とする場合には、最適である。 As the barrier layer, inorganic substances such as silicon dioxide and amorphous titanium dioxide can be mainly used. However, the base film for photocatalyst film described in Japanese Patent Application No. 10-183632 previously proposed by the present inventors is formed on the surface. Since it is an inorganic-organic composite having irregularities, the adhesion of the photocatalyst film can be improved by the irregularities on the surface, and it is excellent in processability, so it is suitably used as a barrier layer of the photocatalyst film of the present invention. This is optimal, especially when workability is required.
上記において、本発明において、光触媒皮膜が、優れた加工性を有しているのは、３官能シランに由来するＳｉに結合したＲ（炭化水素基）が、皮膜中に残留し柔軟性を与えるからである。また、本発明において、光触媒皮膜が耐光性に優れているのは、皮膜中のＲよりなる有機基成分が、Ｓｉ−Ｏ−Ｓｉ成分よりなる無機骨格成分に比べて少なく、仮にバインダー中の有機基成分が二酸化チタンの光触媒効果により酸化分解されたとしても、皮膜中のバインダーの大部分は、二酸化チタンの光触媒効果によって分解されないＳｉ−Ｏ−Ｓｉ成分からなり、チョーキングが起こらないからである。 In the above, in the present invention, the photocatalytic film has excellent workability because R (hydrocarbon group) bonded to Si derived from trifunctional silane remains in the film to give flexibility. Because. In the present invention, the photocatalytic film is excellent in light resistance because the organic group component composed of R in the film is less than the inorganic skeleton component composed of the Si—O—Si component, This is because even if the base component is oxidatively decomposed by the photocatalytic effect of titanium dioxide, most of the binder in the film is composed of a Si—O—Si component that is not decomposed by the photocatalytic effect of titanium dioxide, and choking does not occur.
本発明において、光触媒皮膜は、加工性・耐光性に優れ、しかも光照射下および光なしのいずれの環境においても優れた消臭、抗菌、および防かび機能を有するため、あらゆる環境下での使用に耐え得るものである。 In the present invention, the photocatalytic film is excellent in processability and light resistance, and has excellent deodorizing, antibacterial, and antifungal functions in any environment with or without light irradiation. It can endure.
また本発明において、光触媒皮膜は、皮膜焼成時あるいは使用時において、変色が小さいため、特にパネル材等の美観を保つ必要のある用途の基材に塗布して、好適に用いることができる。 Further, in the present invention, the photocatalyst film has a small discoloration when the film is baked or used, and therefore, it can be suitably used by being applied to a substrate for a purpose such as a panel material that needs to maintain its aesthetic appearance.
なお、本発明において、光触媒皮膜をパネル表面材等の基材に塗布し、光を照射すると、酸化チタンの光触媒効果により臭気成分等有害物質を酸化分解して、空気清浄を図ることができる。また本発明において、光触媒皮膜は、無機成分を主とするため、例えば厨房等の壁や備品に本発明による光触媒皮膜を塗布した場合、汚れが付着しにくく、水洗いなどで残留した調味料などの汚れも光触媒効果により酸化分解できるため、長期において美しさを保つことができる。 In the present invention, when a photocatalytic film is applied to a substrate such as a panel surface material and irradiated with light, harmful substances such as odorous components can be oxidatively decomposed by the photocatalytic effect of titanium oxide to achieve air cleaning. In the present invention, since the photocatalyst film is mainly composed of inorganic components, for example, when the photocatalyst film according to the present invention is applied to walls and fixtures such as kitchens, it is difficult for dirt to adhere, such as seasonings remaining after washing. Dirt can also be oxidatively decomposed by the photocatalytic effect, so that beauty can be maintained for a long time.
つぎに、本発明の実施例を比較例と共に説明する。 Next, examples of the present invention will be described together with comparative examples.
実施例１
基材として、アルミニウム表面にポリエステルを主成分とする塗膜を設けたパネル表面材を用意した。まずこの基材の表面に光触媒皮膜用下地膜を、つぎのようにして形成させた。
Example 1
As a substrate, a panel surface material provided with a coating film mainly composed of polyester on an aluminum surface was prepared. First, a base film for a photocatalyst film was formed on the surface of the substrate as follows.
すなわち、メチルトリエトキシシランと、溶媒である２−プロパノールと、水と、塩酸と、２−プロパノールに分散させた粒径０．０１〜０．０２μｍのＳｉＯ２粒子を原料として用意した。なお、ＳｉＯ２粒子を分散させている２−プロパノールは溶媒の一部として用いた。メチルトリエトキシシラン、溶媒（２−プロパノール）、水、塩酸のモル比が１：５：４：０．００５、粒子濃度が１０重量％となるように原料を混合し、メチルトリエトキシシランを加水分解、縮合重合させることによりゾルを得た。ついで、このゾル中にアルミニウム表面にポリエステルを主成分とする皮膜を塗布したパネル表面材を浸漬し、２ｍｍ／秒の引き上げ速度で引き上げ、乾燥させた後、２００℃で５分間熱処理し、アルミニウム表面にポリエステルを主成分とする塗膜を設けたパネル表面材上に、膜厚０．６μｍの光触媒皮膜用下地膜を形成した。 Namely, methyltriethoxysilane, 2-propanol as a solvent, water, hydrochloric acid, and SiO 2 particles having a particle diameter of 0.01 to 0.02 μm dispersed in 2-propanol were prepared as raw materials. In addition, 2 -propanol in which SiO 2 particles are dispersed was used as a part of the solvent. The raw materials are mixed so that the molar ratio of methyltriethoxysilane, solvent (2-propanol), water and hydrochloric acid is 1: 5: 4: 0.005, and the particle concentration is 10% by weight. A sol was obtained by decomposition and condensation polymerization. Next, a panel surface material coated with a polyester-based film on the aluminum surface is immersed in this sol, pulled up at a lifting speed of 2 mm / second, dried, and then heat treated at 200 ° C. for 5 minutes to obtain an aluminum surface. A base film for a photocatalyst film having a film thickness of 0.6 μm was formed on a panel surface material provided with a coating film mainly composed of polyester.
ついで、この下地膜上に、以下の方法により光触媒皮膜を形成した。 Next, a photocatalytic film was formed on the base film by the following method.
二酸化チタン（商品名Ｐ−２５、日本アエロジル株式会社製）、その他の原料としてメチルトリエトキシシラン、テトラエトキシシラン、２−プロパノール、水、硝酸、水酸化アルミニウム、硝酸銅３水和物、硝酸銀を用意した。これらの割合は、メチルトリエトキシシラン：テトラエトキシシラン：２−プロパノール：水：硝酸＝０．５：０．５：５：４：０．００５（モル比）（水には硝酸銅の水和水も含まれる）とし、二酸化チタン濃度５重量％、水酸化アルミニウム濃度１重量％、硝酸銅濃度２重量％（水和水は除いた濃度）、硝酸銀濃度０．１重量％になるように混合し、攪拌して、光触媒皮膜形成用ゾルを調製した。 Titanium dioxide (trade name P-25, manufactured by Nippon Aerosil Co., Ltd.), methyltriethoxysilane, tetraethoxysilane, 2-propanol, water, nitric acid, aluminum hydroxide, copper nitrate trihydrate, silver nitrate as other raw materials Prepared. These ratios are methyltriethoxysilane: tetraethoxysilane: 2-propanol: water: nitric acid = 0.5: 0.5: 5: 4: 0.005 (molar ratio) (hydration of copper nitrate in water) (Including water) and mixed so that the titanium dioxide concentration is 5% by weight, the aluminum hydroxide concentration is 1% by weight, the copper nitrate concentration is 2% by weight (concentration excluding hydrated water), and the silver nitrate concentration is 0.1% by weight. Then, the mixture was stirred to prepare a photocatalyst film-forming sol.
つぎに、このゾルに上記下地膜付きパネル表面材を浸漬し、２ｍｍ／秒の引き上げ速度で引き上げ、５分間室温で乾燥させた後、５分間２００℃で熱処理し、光触媒皮膜を形成した。得られた光触媒皮膜の断面を走査型電子顕微鏡で観察したところ、膜厚は０．５μｍであった。 Next, the panel surface material with the base film was immersed in this sol, pulled up at a pulling rate of 2 mm / second, dried at room temperature for 5 minutes, and then heat treated at 200 ° C. for 5 minutes to form a photocatalytic film. When the cross section of the obtained photocatalyst film was observed with a scanning electron microscope, the film thickness was 0.5 μm.
実施例２
実施例１と同じパネル表面材上に、実施例１と同じ方法で光触媒皮膜用下地膜を形成した。ついで、ゾル中の硝酸銀濃度が０．０７５重量％であること以外は実施例１と同じ方法で下地膜付きパネル表面材上に、光触媒皮膜を形成した。得られた光触媒皮膜の膜厚は０．５μｍであった。
Example 2
A base film for a photocatalyst film was formed on the same panel surface material as in Example 1 by the same method as in Example 1. Subsequently, a photocatalytic film was formed on the panel surface material with the base film by the same method as in Example 1 except that the silver nitrate concentration in the sol was 0.075% by weight. The film thickness of the obtained photocatalyst film was 0.5 μm.
実施例３
実施例１と同じパネル表面材上に、実施例１と同じ方法で光触媒皮膜用下地膜を形成した。ついで、ゾル中の硝酸銀濃度が０．０５重量％であること以外は実施例１と同じ方法で下地膜付きパネル表面材上に、光触媒皮膜を形成した。得られた光触媒皮膜の膜厚は０．５μｍであった。
Example 3
A base film for a photocatalyst film was formed on the same panel surface material as in Example 1 by the same method as in Example 1. Next, a photocatalytic film was formed on the surface of the panel-coated panel by the same method as in Example 1 except that the silver nitrate concentration in the sol was 0.05% by weight. The film thickness of the obtained photocatalyst film was 0.5 μm.
実施例４
実施例１と同じパネル表面材上に、実施例１と同じ方法で光触媒皮膜用下地膜を形成した。ついで、ゾル中の硝酸銀濃度が０．０２５重量％であること以外は実施例１と同じ方法で下地膜付きパネル表面材上に、光触媒皮膜を形成した。得られた光触媒皮膜の膜厚は０．５μｍであった。
Example 4
A base film for a photocatalyst film was formed on the same panel surface material as in Example 1 by the same method as in Example 1. Subsequently, a photocatalytic film was formed on the panel surface material with the base film by the same method as in Example 1 except that the silver nitrate concentration in the sol was 0.025 wt%. The film thickness of the obtained photocatalyst film was 0.5 μm.
実施例５
実施例１と同じパネル表面材上に、実施例１と同じ方法で光触媒皮膜用下地膜を形成した。ついで、熱処理温度が１００℃であること以外は実施例３と同じ方法で下地膜付きパネル表面材上に、光触媒皮膜を形成した。得られた光触媒皮膜の膜厚は０．５μｍであった。
Example 5
A base film for a photocatalyst film was formed on the same panel surface material as in Example 1 by the same method as in Example 1. Next, a photocatalytic film was formed on the panel surface material with the base film by the same method as in Example 3 except that the heat treatment temperature was 100 ° C. The film thickness of the obtained photocatalyst film was 0.5 μm.
実施例６
実施例１と同じパネル表面材上に、実施例１と同じ方法で光触媒皮膜用下地膜を形成した。ついで、熱処理を行なわずに２４時間乾燥させたこと以外は実施例３と同じ方法で下地膜付きパネル表面材上に、光触媒皮膜を形成した。得られた光触媒皮膜の膜厚は０．５μｍであった。
Example 6
A base film for a photocatalyst film was formed on the same panel surface material as in Example 1 by the same method as in Example 1. Next, a photocatalytic film was formed on the panel surface material with the base film by the same method as in Example 3 except that the film was dried for 24 hours without performing heat treatment. The film thickness of the obtained photocatalyst film was 0.5 μm.
実施例７
実施例１と同じパネル表面材上に、実施例１と同じ方法で光触媒皮膜用下地膜を形成した。ついで、ゾル中の硝酸銅濃度が１重量％であること以外は実施例４と同じ方法で下地膜付きパネル表面材上に、光触媒皮膜を形成した。得られた光触媒皮膜の膜厚は０．５μｍであった。
Example 7
A base film for a photocatalyst film was formed on the same panel surface material as in Example 1 by the same method as in Example 1. Next, a photocatalytic film was formed on the panel surface material with the base film by the same method as in Example 4 except that the copper nitrate concentration in the sol was 1% by weight. The film thickness of the obtained photocatalyst film was 0.5 μm.
比較例１
実施例１と同じパネル表面材上に、実施例１と同じ方法で光触媒皮膜用下地膜を形成した。ついで、ゾル中に硝酸銅を添加しないこと以外は実施例５と同じ方法で下地膜付きパネル表面材上に、光触媒皮膜を形成した。得られた光触媒皮膜の膜厚は０．５μｍであった。
Comparative Example 1
A base film for a photocatalyst film was formed on the same panel surface material as in Example 1 by the same method as in Example 1. Next, a photocatalytic film was formed on the panel surface material with the base film by the same method as in Example 5 except that copper nitrate was not added to the sol. The film thickness of the obtained photocatalyst film was 0.5 μm.
比較例２
実施例１と同じパネル表面材上に、実施例１と同じ方法で光触媒皮膜用下地膜を形成した。ついで、ゾル中に硝酸銀を添加しないこと以外は実施例５と同じ方法で下地膜付きパネル表面材上に、光触媒皮膜を形成した。得られた光触媒皮膜の膜厚は０．５μｍであった。
Comparative Example 2
A base film for a photocatalyst film was formed on the same panel surface material as in Example 1 by the same method as in Example 1. Next, a photocatalytic film was formed on the panel surface material with the base film by the same method as in Example 5 except that silver nitrate was not added to the sol. The film thickness of the obtained photocatalyst film was 0.5 μm.
比較例３
実施例１と同じパネル表面材上に、実施例１と同じ方法で光触媒皮膜用下地膜を形成した。ついで、ゾル中に硝酸銀および硝酸銅を添加しないこと以外は実施例５と同じ方法で下地膜付きパネル表面材上に、光触媒皮膜を形成した。得られた光触媒皮膜の膜厚は０．５μｍであった。
Comparative Example 3
A base film for a photocatalyst film was formed on the same panel surface material as in Example 1 by the same method as in Example 1. Next, a photocatalytic film was formed on the panel surface material with the base film by the same method as in Example 5 except that silver nitrate and copper nitrate were not added to the sol. The film thickness of the obtained photocatalyst film was 0.5 μm.
評価試験
上記実施例と比較例で得られた光触媒皮膜について、耐屈曲性（加工性）試験、皮膜熱処理時の変色試験、耐光性試験、抗菌力試験および消臭試験を行なった。
Evaluation Test About the photocatalyst membrane | film | coat obtained by the said Example and comparative example, the bending resistance (workability) test, the discoloration test at the time of film | membrane heat processing, the light resistance test, the antibacterial power test, and the deodorizing test were done.
まず耐屈曲性（加工性）試験は、ＪＩＳ Ｋ５４００の方法に従い、直径２ｍｍの心棒を用いて１８０°曲げ、目視により割れ、剥がれがないかを確認して、評価した。得られた耐屈曲性試験の結果を下記表１にまとめて示した。 First, the bending resistance (workability) test was evaluated in accordance with the method of JIS K5400 by bending 180 ° using a mandrel having a diameter of 2 mm and visually checking for cracking and peeling. The results of the obtained bending resistance test are summarized in Table 1 below.
つぎに、皮膜熱処理時の変色試験は実施例および比較例における光触媒皮膜の熱処理前後の基材のＬａｂ系における色差ΔＥを、スガ試験器株式会社製カラーテスターＳＣ−３−ＣＨ型を用いて測定することにより評価した。なお実施例６は熱処理を行なわず２４時間乾燥させているため、本試験は実施しなかった。得られた皮膜熱処理時の変色試験の結果を下記表１にまとめて示した。 Next, the discoloration test at the time of heat treatment of the film was performed by measuring the color difference ΔE in the Lab system of the base material before and after the heat treatment of the photocatalyst film in Examples and Comparative Examples using a color tester SC-3-CH type manufactured by Suga Test Instruments Co., Ltd. It was evaluated by doing. Since Example 6 was dried for 24 hours without heat treatment, this test was not performed. The results of the discoloration test during the heat treatment of the obtained film are summarized in Table 1 below.
つぎに、耐光性試験は、ＪＩＳ Ｂ７７５１規定の紫外線カーボンアーク燈式耐光試験機を用いて光触媒を塗布した基材に紫外線を３００時間照射した後、皮膜にチョーキングが起こっていないかを確認するとともに、紫外線照射前後の基材のＬａｂ系における色差ΔＥを、スガ試験器株式会社製カラーテスターＳＣ−３−ＣＨ型を用いて測定し評価した。得られた耐光性試験の結果を下記表１にまとめて示した。 Next, in the light resistance test, the substrate coated with the photocatalyst was irradiated with ultraviolet rays for 300 hours using a JIS B7751 prescribed ultraviolet carbon arc lamp type light resistance tester, and then the film was checked for choking. The color difference ΔE in the Lab system of the base material before and after UV irradiation was measured and evaluated using a color tester SC-3-CH type manufactured by Suga Test Instruments Co., Ltd. The results of the obtained light resistance test are summarized in Table 1 below.
抗菌力試験は、大腸菌（Escherichia coil IFO 3972）、クロカワカビ（Cladosporium cladosporioides IFO 6348）について行なった。菌液は大腸菌に関しては、普通寒天培地で３７℃、１６〜２４時間前培養した試験菌液を普通寒天培地に再度接種し、３７℃、１６〜２０時間培養した菌体をリン酸緩衝液に均一に分散差せ、１ｍｌ当たりの菌数が２．０×１０５〜１．０×１０６となるように調製し、クロカワカビに関しては、ポテトデキストロース寒天培地で２５℃、７〜１０日間培養した後、胞子（分生子）を０．００５％スルホコハク酸ジオクチルナトリウム溶液に浮遊させ、ガーゼで濾過後、１ｍｌ当たりの菌数が２．０×１０５〜１．０×１０６となるように調製し、下地膜を塗布した後さらに最表面に光触媒皮膜を塗布した基材（大きさ：５ｃｍ×５ｃｍ）を、予め９９．５％エタノールをしみこませた脱脂綿でかるく拭いたのち、風乾したものを試料とした。 The antibacterial activity test was performed on Escherichia coil IFO 3972 and black mold (Cladosporium cladosporioides IFO 6348). For Escherichia coli, the bacterial cells cultured in a normal agar medium at 37 ° C. for 16 to 24 hours and pre-incubated with the test bacterial solution are again inoculated into the normal agar medium, and the cells cultured at 37 ° C. for 16 to 20 hours in a phosphate buffer. Disperse uniformly and prepare so that the number of bacteria per ml becomes 2.0 × 10 5 to 1.0 × 10 6. Regarding black mold, after culturing on potato dextrose agar medium at 25 ° C. for 7 to 10 days The spore (conidia) is suspended in 0.005% dioctyl sodium sulfosuccinate solution, filtered through gauze, and prepared so that the number of bacteria per ml is 2.0 × 10 5 to 1.0 × 10 6. After the base film was coated, the substrate (size: 5 cm x 5 cm) coated with the photocatalyst film on the outermost surface was wiped lightly with absorbent cotton soaked with 99.5% ethanol in advance and then air-dried. Was .
各試料の表面にそれぞれ菌液１ｍｌを添加した。これらを昼白色蛍光灯照射下あるいは光を完全に遮断して、細菌は３５℃、カビは２５℃で保存した。なお、蛍光灯で光を照射する場合は照度計で試験面が１０００ルクスとなるように照射位置を調整した。またポリエチレンフィルムを対照試料として、同様に試験した。４時間後にＳＣＤＬＰ培地で試料から生残菌を洗い出し、この洗い出し液の生菌数を、大腸菌は標準寒天培地、クロカワカビはを用いた寒天平板培養法（大腸菌は３５℃、２日間培養、クロカワカビは２５℃、７日間培養）により測定し、試料１個当たりに換算した。また接種直後の測定は対照試料で行なった。抗菌力試験の結果を、下記表２に示した。 1 ml of the bacterial solution was added to the surface of each sample. These were stored at 35 ° C. for bacteria and 25 ° C. for fungi under irradiation with daylight white fluorescent light or completely blocked from light. In addition, when irradiating light with a fluorescent lamp, the irradiation position was adjusted with an illuminometer so that the test surface was 1000 lux. A polyethylene film was used as a control sample and tested in the same manner. After 4 hours, the surviving bacteria were washed out from the sample with the SCDLP medium, and the number of viable bacteria in this washing solution was determined using the agar plate culture method using Escherichia coli for the standard agar medium and the black mold for 35 days at 35 ° C. Measured at 25 ° C. for 7 days) and converted per sample. The measurement immediately after inoculation was performed with a control sample. The results of the antibacterial activity test are shown in Table 2 below.
消臭試験は、光触媒皮膜を塗布した基材（有効面積２００ｃｍ２）をポリフッ化ビニル製の袋に固定した後、袋をヒートシールにより密封し、ついでアンモニア１００ｐｐｍを含んだ空気３リットルを封入し、この上から２０Ｗブラックライトにより光を照射し、光照射下開始から２４時間後にガス検知管により袋内のガス濃度を測定する方法により行ない、２４時間後のアンモニア除去率％を測定した。 In the deodorization test, a base material (effective area 200 cm 2 ) coated with a photocatalyst film is fixed to a polyvinyl fluoride bag, the bag is sealed by heat sealing, and then 3 liters of air containing 100 ppm of ammonia is enclosed. Then, light was irradiated with a 20 W black light from above, and the gas concentration in the bag was measured with a gas detector tube 24 hours after the start of light irradiation, and the ammonia removal rate% after 24 hours was measured.
なお、基材とブラックライトの距離は３０ｃｍとし、光触媒皮膜を塗布した基材を入れずに同様に光照射後のガス濃度を測定し、これを空試験とした。また、光を完全に遮断すること以外は上記と同様にして皮膜の消臭試験を行なった。形成した皮膜の消臭試験の結果を、下記表３に示した。
上記表１〜３から明らかなように、実施例１〜７による光触媒皮膜は、耐屈曲性（加工性）、耐光性にも優れており、かつ光照射下および光なしのいずれの環境においても優れた消臭、抗菌、および防かび機能を有するものであった。また光触媒皮膜を熱処理した実施例１〜５および実施例７の基材は熱処理前後の変色が非常に小さいものであった。なお、光を照射した場合には、光触媒効果が発揮されるため、光照射なしの場合に比べ消臭力がより優れた結果となった。これに対し、比較例１による光触媒皮膜は、耐屈曲性（加工性）、消臭、抗菌、および防かび効果には優れており、耐光性試験後にチョーキングは起こらなかったものの、銅塩を添加せずに銀塩を添加したため、耐光性試験前後の色差や皮膜熱処理前後の色差が大きくなった。また比較例２による光触媒皮膜は、耐屈曲性（加工性）、耐光性、消臭、抗菌効果は優れており、皮膜熱処理前後の色差も小さいが、銀塩を添加せずに銅塩を添加したため、防かび効果がほとんど見られなかった。比較例３による光触媒皮膜は、耐屈曲性（加工性）、耐光性、消臭効果は優れており、皮膜熱処理前後の色差も小さいが、銀塩および銅塩を添加していないため、今回の試験条件では、抗菌および防かび効果はほとんど見られなかった。 As is clear from Tables 1 to 3 above, the photocatalyst films according to Examples 1 to 7 are excellent in bending resistance (workability) and light resistance, and in any environment with or without light irradiation. It had excellent deodorizing, antibacterial, and fungicidal functions. Moreover, the base materials of Examples 1 to 5 and Example 7 in which the photocatalyst film was heat-treated had very little discoloration before and after the heat treatment. In addition, since the photocatalytic effect was exhibited when irradiated with light, the deodorizing power was more excellent than that without light irradiation. On the other hand, the photocatalyst film according to Comparative Example 1 is excellent in bending resistance (workability), deodorization, antibacterial effect, and fungicidal effect, and although no choking occurred after the light resistance test, a copper salt was added. Without adding silver salt, the color difference before and after the light resistance test and the color difference before and after the film heat treatment increased. In addition, the photocatalyst film according to Comparative Example 2 has excellent bending resistance (workability), light resistance, deodorization, and antibacterial effect, and the color difference before and after the film heat treatment is small, but a copper salt is added without adding a silver salt. Therefore, the fungicidal effect was hardly seen. The photocatalyst film according to Comparative Example 3 has excellent bending resistance (workability), light resistance, and deodorizing effect, and the color difference before and after the film heat treatment is small, but silver salt and copper salt are not added. Under the test conditions, almost no antibacterial and antifungal effects were seen.
なお、消臭試験において、空試験では、アンモニアの除去率が３４％であった。これは試験に用いた袋に、アンモニアが吸着するためと考えられる。 In the deodorization test, the removal rate of ammonia was 34% in the blank test. This is probably because ammonia is adsorbed on the bag used in the test.
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