JP4087940B2 - Surface treatment method and surface treatment apparatus for glass substrate - Google Patents

Surface treatment method and surface treatment apparatus for glass substrate Download PDF

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Publication number
JP4087940B2
JP4087940B2 JP4979398A JP4979398A JP4087940B2 JP 4087940 B2 JP4087940 B2 JP 4087940B2 JP 4979398 A JP4979398 A JP 4979398A JP 4979398 A JP4979398 A JP 4979398A JP 4087940 B2 JP4087940 B2 JP 4087940B2
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Prior art keywords
glass substrate
surface treatment
support member
chuck
substrate
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JPH11246241A (en
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真理 日野
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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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Description

【０００１】
【発明の属する技術分野】
本発明はガラス基板の表面処理方法および表面処理装置に関する。さらに詳しくは、液晶ディスプレイ装置に用いられるＴＦＴアレイ基板の製造時におけるガラス基板の表面処理方法および表面処理装置に関する。
【０００２】
【従来の技術】
ＴＦＴアレイ基板の製造における写真製版工程では、ガラス基板に回路パターンを作成するために、レジストなどの液体状の薬品を塗布し、フォトマスクを通した紫外線でパターンを焼き付けたのち、現像液で余分なレジストを除去するという作業を行なっている。
【０００３】
従来の現像処理では、まず、図５（ａ）に示すように、ピンセット（図示しない）でガラス基板５０が回転チャック５１上に移載されたのち、ガラス基板５０を真空で回転チャック５１上に固定する。そののち、図５（ｂ）に示すように、回転チャック５１が下がり、現像カップ５２内に移動する。ついで、図５（ｃ）に示すように、ノズル５３により現像液５４が塗布され、ガラス基板５０上に現像液５４の液層が表面張力により形成される。一定時間経過後現像が完了したら、ガラス基板５０を回転させながら水洗いを行ない、現像液５４を洗い流す。そして、図５（ｄ）に示すように、高速回転でガラス基板５０を乾燥させる。
【０００４】
【発明が解決しようとする課題】
しかしながら、従来の現像処理に用いられる回転チャックは、通常円形のものを使用し、真空引きをするため、その直径はガラス基板の短辺より短くなっているため、ガラス基板のたわみにより長辺方向の水平が保てなくなり、現像液がこぼれやすく、現像液の使用量の増加、液が減ることによるパターン欠陥の発生、および液こぼれによる裏面汚れの原因となっていた。さらに、基板サイズが大きくなり、ガラスの厚さが薄くなるほど、たわみは発生しやすくなる。
【０００５】
一方、現像処理工程において、回転チャックの温度が基板に伝わりパターン寸法が不均一になることを防ぐために、現像液を塗布したのちに、所定の現像時間が経過するまで、チャックから基板を点接触の突起棒上に移すものがある（特開平７−２４５２５６号公報参照）。しかし、たわみの発生しやすいガラス基板でこの方法を採用すると、ガラス基板がチャックから離れた時点で基板中央部がへこんだ形となり、均等な現像液の液層は形成されなくなる。
【０００６】
本発明は、叙上の事情に鑑み、ガラス基板上に現像液などの表面処理液の液層を安定して形成させることができるガラス基板の表面処理方法および表面処理装置を提供することを目的とする。
【０００７】
【課題を解決するための手段】
本発明のガラス基板の表面処理方法は、ガラス基板の表面処理工程、洗浄工程および乾燥工程を含むガラス基板の表面処理方法であって、回転チャックに載置されるガラス基板上に、表面処理ノズルより表面処理液を塗布して液層を形成する際に、前記基板の短辺部の裏面に支えの支持部材を立てることにより、前記ガラス基板を回転チャックに載置した状態で、当該ガラス基板を平坦に保ち、表面処理液がこぼれることを防ぎ、ついでガラス基板の洗浄または回転時には、前記ガラス基板に支持部材が触れることがないように、前記回転チャックと支持部材とを相対的に移動させ、前記支持部材が、前記ガラス基板の四隅の下部位置にそれぞれ設置されるピンであり、前記ピンが上下および水平方向に移動可能にされており、液盛のときは、前記ピンが上昇し、ガラス基板を水平に支え、ついで洗浄または回転時には、前記ピンが下降および水平方向へ移動し、前記基板の外側へ退避し、回転チャックが定位置まで下がったときに、ガラス基板を水平になるようにピンで支えていることを特徴とする。
【０００８】
また本発明のガラス基板の表面処理装置は、ガラス基板を吸着し、回転自在に載置する回転チャックと、前記ガラス基板上に表面処理液を滴下する表面処理ノズルと、前記ガラス基板上の表面処理液を洗浄する洗浄ノズルと、前記ガラス基板を回転チャックに載置した状態で、前記ガラス基板の短辺部を平坦に支持する支持部材と、前記回転チャックと支持部材を相対的に移動させる移動手段とを備え、前記支持部材が、前記ガラス基板の四隅の下部位置にそれぞれ設置されるピンであり、
前記移動手段が、前記ピンを上下動させるとともに、水平方向に移動させる昇降および水平機構であり、
回転チャックが定位置まで下がったときに、ガラス基板が水平になるように支持部材で支えられてなることを特徴とする。
【０００９】
【発明の実施の形態】
以下、添付図面に基づいて、本発明のガラス基板の表面処理方法および表面処理装置を説明する。
【００１０】
図１は本発明のガラス基板の表面処理装置の一実施の形態を示す斜視図、図２は図１における表面処理装置の動作を示す説明図、図３は本発明の他の実施の形態にかかわる表面処理装置および動作を示す説明図、図４は本発明のさらに他の実施の形態にかかわる表面処理装置および動作を示す説明図である。
【００１１】
図１に示すように、本発明の一実施の形態にかかわる表面処理装置は、ガラス基板２を載置する円盤状の回転チャック３、表面処理ノズル、洗浄ノズル、前記ガラス基板２の短辺部２ａを平坦に支持する支持部材１、前記ガラス基板２に対し、支持部材１を相対的に上下動させる移動手段である昇降機構、および前記回転チャック３と支持部材１を囲み収納している現像カップ６とから構成されている。
【００１２】
前記支持部材１としては、前記ガラス基板２の四隅（コーナー部）Ｃ１〜Ｃ４の下部位置にそれぞれ設置される円柱形状のピンを用いることができるが、本発明においては、とくにこれに限定されるものではなく、たとえば短辺部２ａの裏面に沿って支持するためのＴ字形状の部材とすることもできる。支持部材１は、現像カップ６の下部に配置される、シリンダーやボールねじ装置などの昇降機構に連結されている。
【００１３】
前記回転チャック３は、現像カップ６の下部に配置されるモータと昇降機構に連結され、回転および上下方向の移動ができるようにされており、また、ガラス基板２を吸着できるように、上表面の吸引孔が配管を介して真空ポンプに接続されている。
【００１４】
つぎに本実施の形態の表面処理装置の動作を説明する。まず図２（ａ）に示すように、ガラス基板２が回転チャック３上に真空で固定した状態にされる。ついで図２（ｂ）に示すように、回転チャック３に固定されたガラス基板２は、上昇している支持部材１と接触する位置まで下がる。そののち、図２（ｃ）に示すように、表面処理ノズル４がガラス基板２上に移動して、表面処理液の現像液５を滴下して液層を形成する。このとき、ガラス基板２は、支持部材１により平坦に保たれているため、現像液５を盛っても液層がくずれることはなく、液も短辺部側からこぼれない。そして一定時間が経過し、現像が完了したのち、支持部材１がシリンダーなどの昇降機構によりガラス基板２に触れない位置まで下降し、回転チャック３とガラス基板２は回転し、洗浄および乾燥を行なう。
【００１５】
本実施の形態では、回転チャックと同じ高さになるように、ガラス基板の四隅にあたる位置に支持部材をカップ内に立て、回転チャックが定位置まで下がったときに、ガラス基板を水平になるように支持部材で支えている。そののち、現像液を盛り、静止しているあいだは支持部材で基板を支えているので、基板は平坦に保たれる。また、洗浄前には支持部材が下降することにより基板から離れ、洗浄時には支持部材の影響を受けないで回転ができるようにされている。
【００１６】
なお、本実施の形態では、支持部材を上下動させているが、支持部材はガラス基板に現像液の液層を形成する直前に基板を支え、現像液吐出（滴下）時から回転による液振り切り直前まで、ガラス基板を支え水平に保つことができるのであれば、本発明においては、これに限定されるものではなく、たとえば図３（ａ）、（ｂ）に示すように、前記支持部材１を固定式にして、ガラス基板２を載置する回転チャック３の上下動により、液盛のときは前記支持部材１で前記基板２を支えられる位置まで下げ、ついで洗浄や回転時には、回転チャック３を上げて前記基板２に前記支持部材１が触れることがないようにすることができる。または図４（ａ）、（ｂ）に示すように、支持部材１をシリンダーなどの昇降機構とスライドテーブルなどの水平機構で上下および水平方向に移動可能にして、洗浄時にガラス基板２の外側に退避させることもできる。
【００１７】
【発明の効果】
以上説明したとおり、本発明によれば、支持部材によりガラス基板を平坦に支持しているため、ガラス基板に現像液などの表面処理液を塗布し、液層を形成させるときに、表面処理液をこぼさずに安定した液層を形成することができる。これにより、現像液などの表面処理液の使用量を削減し、液が減ることによるバターン欠陥の発生や液こぼれによる裏面汚れを防ぐことができる。さらに、基板サイズが大きく、ガラスの厚さが薄いガラス基板に対しても液層を安定して形成することができる。
【図面の簡単な説明】
【図１】本発明のガラス基板の表面処理装置の一実施の形態を示す斜視図である。
【図２】図１における表面処理装置の動作を示す説明図である。
【図３】本発明の他の実施の形態にかかわる表面処理装置および動作を示す説明図である。
【図４】本発明のさらに他の実施の形態にかかわる表面処理装置および動作を示す説明図である。
【図５】従来の表面処理装置の一例を示す説明図である。
【符号の説明】
１ 支持部材
２ ガラス基板
２ａ 短辺部
３ 回転チャック
４ 表面処理ノズル
５ 現像液
６ 現像カップ[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a glass substrate surface treatment method and a surface treatment apparatus. More specifically, the present invention relates to a surface treatment method and a surface treatment apparatus for a glass substrate when manufacturing a TFT array substrate used in a liquid crystal display device.
[0002]
[Prior art]
In the photoengraving process in the manufacture of TFT array substrates, to create a circuit pattern on a glass substrate, liquid chemicals such as resist are applied, the pattern is baked with ultraviolet light through a photomask, and then extra with developer. The work of removing the resist is done.
[0003]
In the conventional development processing, first, as shown in FIG. 5A, after the glass substrate 50 is transferred onto the rotary chuck 51 by tweezers (not shown), the glass substrate 50 is placed on the rotary chuck 51 in a vacuum. Fix it. After that, as shown in FIG. 5B, the rotary chuck 51 is lowered and moved into the developing cup 52. Next, as shown in FIG. 5C, the developer 54 is applied by the nozzle 53, and a liquid layer of the developer 54 is formed on the glass substrate 50 by surface tension. When the development is completed after a certain period of time, the glass substrate 50 is rotated and washed with water to wash away the developer 54. And as shown in FIG.5 (d), the glass substrate 50 is dried by high speed rotation.
[0004]
[Problems to be solved by the invention]
However, since the rotary chuck used in the conventional development processing is usually a circular chuck and is evacuated, its diameter is shorter than the short side of the glass substrate. , And the developer tends to spill, increasing the amount of developer used, causing pattern defects due to a decrease in the solution, and causing backside contamination due to the spill. Further, as the substrate size increases and the glass thickness decreases, the deflection is more likely to occur.
[0005]
On the other hand, in the development process, the substrate is point-contacted from the chuck until a predetermined development time has elapsed after applying the developer in order to prevent the temperature of the rotary chuck from being transmitted to the substrate and making the pattern dimensions non-uniform. (See Japanese Patent Laid-Open No. 7-245256). However, when this method is adopted for a glass substrate that is likely to bend, the central portion of the substrate is recessed when the glass substrate is separated from the chuck, and a uniform developer layer is not formed.
[0006]
In view of the circumstances described above, an object of the present invention is to provide a glass substrate surface treatment method and a surface treatment apparatus capable of stably forming a liquid layer of a surface treatment liquid such as a developer on a glass substrate. And
[0007]
[Means for Solving the Problems]
The glass substrate surface treatment method of the present invention is a glass substrate surface treatment method including a glass substrate surface treatment step, a cleaning step, and a drying step, wherein the surface treatment nozzle is placed on the glass substrate placed on the rotating chuck. When the surface treatment liquid is applied to form a liquid layer, the glass substrate is placed in a state where the glass substrate is placed on a rotary chuck by raising a support member on the back surface of the short side portion of the substrate. The rotating chuck and the supporting member are relatively moved so that the surface treatment liquid is prevented from spilling and the supporting member does not touch the glass substrate when cleaning or rotating the glass substrate. , the support member is a pin which is installed respectively in the lower position of the four corners of the glass substrates, the pins being movable in the vertical and horizontal directions, when the solution heap Said pin rises, support the glass substrate horizontally, then during cleaning or rotation, the pin moves to the lowering and horizontally retracted to the outside of the substrate, when the rotating chuck is lowered into position, the glass The substrate is supported by pins so as to be horizontal.
[0008]
Further, the glass substrate surface treatment apparatus of the present invention includes a rotary chuck for adsorbing and rotating the glass substrate, a surface treatment nozzle for dropping a surface treatment liquid on the glass substrate, and a surface on the glass substrate. A cleaning nozzle that cleans the processing liquid, a support member that flatly supports the short side of the glass substrate in a state where the glass substrate is placed on the rotary chuck, and the rotary chuck and the support member are relatively moved. Moving means, and the support members are pins respectively installed at lower positions of the four corners of the glass substrate,
The moving means is an elevating and horizontal mechanism for moving the pin up and down and moving it horizontally.
When the rotary chuck is lowered to a fixed position, the glass substrate is supported by a support member so as to be horizontal.
[0009]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, a surface treatment method and a surface treatment apparatus for a glass substrate according to the present invention will be described with reference to the accompanying drawings.
[0010]
1 is a perspective view showing an embodiment of a surface treatment apparatus for a glass substrate according to the present invention, FIG. 2 is an explanatory view showing the operation of the surface treatment apparatus in FIG. 1, and FIG. 3 is another embodiment of the present invention. FIG. 4 is an explanatory view showing a surface treatment apparatus and operation according to still another embodiment of the present invention.
[0011]
As shown in FIG. 1, a surface treatment apparatus according to an embodiment of the present invention includes a disk-shaped rotary chuck 3 on which a glass substrate 2 is placed, a surface treatment nozzle, a cleaning nozzle, and a short side portion of the glass substrate 2. A support member 1 that flatly supports 2a, a lifting mechanism that is a moving means for moving the support member 1 up and down relative to the glass substrate 2, and a development that surrounds and houses the rotary chuck 3 and the support member 1 And a cup 6.
[0012]
As the support member 1, columnar pins respectively installed at the lower positions of the four corners (corner portions) C <b> 1 to C <b> 4 of the glass substrate 2 can be used, but the present invention is particularly limited to this. For example, it may be a T-shaped member for supporting along the back surface of the short side portion 2a. The support member 1 is connected to an elevating mechanism such as a cylinder or a ball screw device disposed under the developing cup 6.
[0013]
The rotating chuck 3 is connected to a motor and an elevating mechanism disposed below the developing cup 6 so as to be able to rotate and move in the vertical direction. The suction hole is connected to a vacuum pump through a pipe.
[0014]
Next, the operation of the surface treatment apparatus of the present embodiment will be described. First, as shown in FIG. 2A, the glass substrate 2 is fixed on the rotary chuck 3 by vacuum. Next, as shown in FIG. 2B, the glass substrate 2 fixed to the rotating chuck 3 is lowered to a position where it comes into contact with the rising support member 1. After that, as shown in FIG. 2C, the surface treatment nozzle 4 moves onto the glass substrate 2, and a developer 5 of the surface treatment liquid is dropped to form a liquid layer. At this time, since the glass substrate 2 is kept flat by the support member 1, the liquid layer does not collapse even when the developer 5 is deposited, and the liquid does not spill from the short side. Then, after a certain period of time has elapsed and the development is completed, the support member 1 is lowered to a position where it does not touch the glass substrate 2 by an elevating mechanism such as a cylinder, and the rotating chuck 3 and the glass substrate 2 rotate to perform cleaning and drying. .
[0015]
In the present embodiment, the support member is placed in the cup at positions corresponding to the four corners of the glass substrate so that it is at the same height as the rotating chuck, and the glass substrate is leveled when the rotating chuck is lowered to a fixed position. It is supported by a support member. After that, while the developer is piled up and is stationary, the support member supports the substrate, so that the substrate is kept flat. Further, before the cleaning, the support member descends to move away from the substrate, and at the time of cleaning, the support member can be rotated without being affected by the support member.
[0016]
In this embodiment, the support member is moved up and down, but the support member supports the substrate immediately before forming the developer liquid layer on the glass substrate, and the liquid is removed by rotation from the time of developer discharge (dropping). As long as the glass substrate can be supported and kept horizontal until just before, the present invention is not limited to this. For example, as shown in FIGS. Is fixed, and the rotary chuck 3 on which the glass substrate 2 is placed is moved up and down to a position where the substrate 2 can be supported by the support member 1 when the liquid is filled. The support member 1 can be prevented from touching the substrate 2 by raising the height. Alternatively, as shown in FIGS. 4A and 4B, the support member 1 can be moved up and down and horizontally by a lifting mechanism such as a cylinder and a horizontal mechanism such as a slide table so that it can be moved outside the glass substrate 2 during cleaning. It can be evacuated.
[0017]
【The invention's effect】
As described above, according to the present invention, since the glass substrate is flatly supported by the support member, the surface treatment liquid is applied when a surface treatment liquid such as a developer is applied to the glass substrate to form a liquid layer. A stable liquid layer can be formed without spilling. Thereby, the usage-amount of surface treatment liquids, such as a developing solution, can be reduced, and the generation | occurrence | production of the pattern defect by liquid reduction and the back surface dirt by liquid spilling can be prevented. Furthermore, a liquid layer can be stably formed even on a glass substrate having a large substrate size and a thin glass thickness.
[Brief description of the drawings]
FIG. 1 is a perspective view showing an embodiment of a surface treatment apparatus for a glass substrate according to the present invention.
FIG. 2 is an explanatory view showing the operation of the surface treatment apparatus in FIG. 1;
FIG. 3 is an explanatory view showing a surface treatment apparatus and operation according to another embodiment of the present invention.
FIG. 4 is an explanatory view showing a surface treatment apparatus and operation according to still another embodiment of the present invention.
FIG. 5 is an explanatory view showing an example of a conventional surface treatment apparatus.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Support member 2 Glass substrate 2a Short side part 3 Rotating chuck 4 Surface treatment nozzle 5 Developer 6 Developer cup

Claims (2)

ガラス基板の表面処理工程、洗浄工程および乾燥工程を含むガラス基板の表面処理方法であって、回転チャックに載置されるガラス基板上に、表面処理ノズルより表面処理液を塗布して液層を形成する際に、前記基板の短辺部の裏面に支えの支持部材を立てることにより、前記ガラス基板を回転チャックに載置した状態で、当該ガラス基板を平坦に保ち、表面処理液がこぼれることを防ぎ、ついでガラス基板の洗浄または回転時には、前記ガラス基板に支持部材が触れることがないように、前記回転チャックと支持部材とを相対的に移動させるガラス基板の表面処理方法であって、
前記支持部材が、前記ガラス基板の四隅の下部位置にそれぞれ設置されるピンであり、
前記ピンが上下および水平方向に移動可能にされており、液盛のときは、前記ピンが上昇し、ガラス基板を水平に支え、ついで洗浄または回転時には、前記ピンが下降および水平方向へ移動し、前記基板の外側へ退避し、
回転チャックが定位置まで下がったときに、ガラス基板を水平になるようにピンで支えている
ことを特徴とする表面処理方法。A glass substrate surface treatment method including a glass substrate surface treatment step, a washing step, and a drying step, wherein a surface treatment liquid is applied from a surface treatment nozzle onto a glass substrate placed on a rotary chuck to form a liquid layer. When forming, by supporting a supporting member on the back side of the short side of the substrate, the glass substrate is kept flat and the surface treatment liquid is spilled while the glass substrate is placed on a rotating chuck. A glass substrate surface treatment method for moving the rotating chuck and the support member relatively so that the support member does not touch the glass substrate during cleaning or rotation of the glass substrate,
The support members are pins respectively installed at lower positions of the four corners of the glass substrate;
The pin is movable up and down and horizontally, and when the liquid is filled, the pin rises and supports the glass substrate horizontally.Then, when cleaning or rotating, the pin moves down and moves horizontally. Evacuate to the outside of the substrate,
A surface treatment method characterized by supporting a glass substrate with pins so as to be horizontal when the rotating chuck is lowered to a predetermined position. ガラス基板を吸着し、回転自在に載置する回転チャックと、前記ガラス基板上に表面処理液を滴下する表面処理ノズルと、前記ガラス基板上の表面処理液を洗浄する洗浄ノズルと、前記ガラス基板を回転チャックに載置した状態で、前記ガラス基板の短辺部を平坦に支持する支持部材と、前記回転チャックと支持部材とを相対的に移動させる移動手段とを備えてなるガラス基板の表面処理装置であって、
前記支持部材が、前記ガラス基板の四隅の下部位置にそれぞれ設置されるピンであり、
前記移動手段が、前記ピンを上下動させるとともに、水平方向に移動させる昇降および水平機構であり、
回転チャックが定位置まで下がったときに、ガラス基板が水平になるように支持部材で支えられる
ことを特徴とする表面処理装置。A rotating chuck that adsorbs and rotatably mounts a glass substrate, a surface treatment nozzle that drops a surface treatment liquid onto the glass substrate, a cleaning nozzle that cleans the surface treatment liquid on the glass substrate, and the glass substrate The surface of the glass substrate comprising: a support member that flatly supports the short side portion of the glass substrate in a state where the rotary chuck is placed on the rotary chuck; and a moving means that relatively moves the rotary chuck and the support member. A processing device comprising:
The support members are pins respectively installed at lower positions of the four corners of the glass substrate;
The moving means is an elevating and horizontal mechanism for moving the pin up and down and moving it horizontally.
A surface treatment apparatus, wherein a glass substrate is supported by a support member so as to be horizontal when the rotary chuck is lowered to a predetermined position.
JP4979398A 1998-03-02 1998-03-02 Surface treatment method and surface treatment apparatus for glass substrate Expired - Fee Related JP4087940B2 (en)

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KR101557527B1 (en) 2012-10-23 2015-10-06 주식회사 엘지화학 Apparatus for forming flatness of glass substrate

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JP5439310B2 (en) * 2010-07-29 2014-03-12 東京応化工業株式会社 Coating method and coating apparatus
JP5891848B2 (en) * 2012-02-27 2016-03-23 ウシオ電機株式会社 Method and apparatus for bonding workpieces made of glass substrate or quartz substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101557527B1 (en) 2012-10-23 2015-10-06 주식회사 엘지화학 Apparatus for forming flatness of glass substrate

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