JP3995089B2 - 重イオンビームアプリケーションシステムにおいて使用されるイオンビームを予備加速する装置 - Google Patents
重イオンビームアプリケーションシステムにおいて使用されるイオンビームを予備加速する装置 Download PDFInfo
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- JP3995089B2 JP3995089B2 JP2002563747A JP2002563747A JP3995089B2 JP 3995089 B2 JP3995089 B2 JP 3995089B2 JP 2002563747 A JP2002563747 A JP 2002563747A JP 2002563747 A JP2002563747 A JP 2002563747A JP 3995089 B2 JP3995089 B2 JP 3995089B2
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- rfq
- accelerator
- frequency quadrupole
- radio frequency
- ion beam
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/04—Irradiation devices with beam-forming means
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/04—Magnet systems, e.g. undulators, wigglers; Energisation thereof
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/08—Arrangements for injecting particles into orbits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2277/00—Applications of particle accelerators
- H05H2277/10—Medical devices
- H05H2277/11—Radiotherapy
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- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Engineering & Computer Science (AREA)
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- Particle Accelerators (AREA)
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Description
図2は、高周波4重極の構造の略図である。
図3は、完備したタンク間マッチング部の略図である。
図4は、低エネルギービーム輸送システムにおけるビームエンベロープの他の例を示す図である。
図5は、RFQに沿う高周波4重極(RFQ)構造パラメータを示す図である。
図6は、RFQ電極の始点での粒子分布の位相空間投影図である。
図7は、IH−DTLの入射部での粒子分布の位相空間投影図である。
図8は、RFQに一体化されたリバンチング間隙における種々の全間隙電圧についての、IH−DTLの入射部でのシミュレートされた位相幅を示す図である。
図9は、RFQ電極の一部およびRFQに一体化された2つのドリフトチューブのrfモデルの写真である。
図10は、図9の前記モデルを用いてビード摂動測定を行なった結果である。
ECRIS1 12C4+または16C6+のような重イオン用の第1電子サイクロトロン共鳴イオン源
ECRIS2 H2 +、H3 +または3He +のような軽イオン用の第2電子サイクロトロン共鳴イオン源
SOL ECRIS1およびECRIS2の出口および高周波4重極加速器(RFQ)の入射部のソレノイド電磁石
BD プロファイルグリッドおよび/またはファラデーカップおよび/またはビーム変圧器および/または容量性位相プローブを備えるビーム診断ブロック
SL スリット
QS1 第1分岐の磁気4重極シングレット
QS2 第2分岐の磁気4重極シングレット
QD 磁気4重極ダブレット
QT 磁気4重極トリプレット
SP1 第1分岐の分光計電磁石
SP2 第2分岐の分光計電磁石
SM 切換え電磁石
CH マクロパルスチョッパ
RFQ 高周波4重極加速器
IH−DTL IH型ドリフトリニアック
SF ストリッパフォイル
EL RFQ構造の電極
ST RFQ電極を保持する支持ステム
BP RFQ構造のベースプレート
a)(図4) 開口半径
b)(図4) 変調パラメータ
c)(図4) 同期位相
d)(図4) 横方向のゼロ電流位相進み
e)(図4) 縦方向のゼロ電流位相進み
ECRIS2 H2 +、H3 +または3He +のような軽イオン用の第2電子サイクロトロン共鳴イオン源
SOL ECRIS1およびECRIS2の出口および高周波4重極加速器(RFQ)の入射部のソレノイド電磁石
BD プロファイルグリッドおよび/またはファラデーカップおよび/またはビーム変圧器および/または容量性位相プローブを備えるビーム診断ブロック
SL スリット
QS1 第1分岐の磁気4重極シングレット
QS2 第2分岐の磁気4重極シングレット
QD 磁気4重極ダブレット
QT 磁気4重極トリプレット
SP1 第1分岐の分光計電磁石
SP2 第2分岐の分光計電磁石
SM 切換え電磁石
CH マクロパルスチョッパ
RFQ 高周波4重極加速器
IH−DTL IH型ドリフトリニアック
SF ストリッパフォイル
EL RFQ構造の電極
ST RFQ電極を保持する支持ステム
BP RFQ構造のベースプレート
a)(図4) 開口半径
b)(図4) 変調パラメータ
c)(図4) 同期位相
d)(図4) 横方向のゼロ電流位相進み
e)(図4) 縦方向のゼロ電流位相進み
Claims (9)
- 重イオンビームアプリケーションシステムにおいて使用されるイオンビームを予備加速し、ビームパラメータを最適にマッチングさせる装置であって、
高周波4重極加速器(RFQ)であって、イオンを加速する複数の交互ステム(ST)によって支持される2つのミニベーン(mini vane)対(EL)を有し、該高周波4重極加速器(RFQ)構造の端部に向かって増大する開口を有し、該高周波4重極加速器(RFQ)構造の端部に向かって0°へと増加する同期位相を有する、高周波4重極加速器と、
前記高周波4重極加速器(RFQ)からもたらされるイオンビームのパラメータを、後続のドリフトチューブ線形加速器(DTL)によって要求されるパラメータにマッチングさせる完備したタンク間マッチング部とを備える装置。 - 重イオンビームアプリケーションシステムにおいて使用されるイオンビームを予備加速し、ビームパラメータを最適にマッチングさせる装置であって、
高周波4重極加速器(RFQ)であって、イオンを加速する複数の交互ステム(ST)によって支持される2つのミニベーン対(EL)を有し、該高周波4重極加速器(RFQ)構造の端部に向かって増加する同期位相を有する、高周波4重極加速器と、
前記高周波4重極加速器(RFQ)からもたらされるイオンビームのパラメータを、後続のドリフトチューブ線形加速器(DTL)によって要求されるパラメータにマッチングさせる完備したタンク間マッチング部と、
前記高周波4重極加速器(RFQ)の出口に位置し、前記高周波4重極加速器(RFQ)タンクに一体化されている2つのリバンチャ・ドリフトチューブとを備える装置。 - 前記高周波4重極加速器は、イオンを8keV/uから400keV/uに加速することを特徴とする請求項1または2に記載の装置。
- 前記交互ステム(ST)は、前記RFQ内の共通水冷ベースプレート(BP)上に取り付けられることを特徴とする前記請求項1〜3のいずれか1に記載の装置。
- 前記交互ステム(ST)は、インダクタンス(inductivity)として働き、電極(EL)を形成する前記ミニベーン対は、λ/2共振構造に対するキャパシタンスとして働くことを特徴とする前記請求項1〜4のいずれか1に記載の装置。
- 前記高周波4重極加速器(RFQ)は、下流に位置するIHドリフトチューブ・リニアック(DTL)と同じ周波数で運転されることを特徴とする前記請求項1〜5のいずれか1に記載の装置。
- 前記タンク間マッチング部は、前記RFQの下流のxy操向電磁石を備えることを特徴とする前記請求項1〜6のいずれか1に記載の装置。
- 前記タンク間マッチング部は、4重極ダブレットを備えることを特徴とする前記請求項1〜7のいずれか1に記載の装置。
- 前記タンク間マッチング部は、容量性位相プローブを収容する診断チャンバおよび/または前記タンク間マッチング部の端部にあるビーム変圧器を備えることを特徴とする前記請求項1〜8のいずれか1に記載の装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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EP01102194 | 2001-02-05 | ||
EP01102192 | 2001-02-05 | ||
PCT/EP2002/001166 WO2002063933A1 (en) | 2001-02-05 | 2002-02-05 | Apparatus for pre-acceleration of ion beams used in a heavy ion beam application system |
Publications (3)
Publication Number | Publication Date |
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JP2004523068A JP2004523068A (ja) | 2004-07-29 |
JP2004523068A5 JP2004523068A5 (ja) | 2007-08-02 |
JP3995089B2 true JP3995089B2 (ja) | 2007-10-24 |
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Application Number | Title | Priority Date | Filing Date |
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JP2002563747A Expired - Fee Related JP3995089B2 (ja) | 2001-02-05 | 2002-02-05 | 重イオンビームアプリケーションシステムにおいて使用されるイオンビームを予備加速する装置 |
JP2002563493A Withdrawn JP2004525486A (ja) | 2001-02-05 | 2002-02-05 | 重イオン癌治療施設で使用されるイオンを生成し、選択する装置 |
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JP2002563493A Withdrawn JP2004525486A (ja) | 2001-02-05 | 2002-02-05 | 重イオン癌治療施設で使用されるイオンを生成し、選択する装置 |
Country Status (7)
Country | Link |
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US (3) | US6855942B2 (ja) |
EP (2) | EP1358782B1 (ja) |
JP (2) | JP3995089B2 (ja) |
AT (2) | ATE392797T1 (ja) |
DE (2) | DE60226124T2 (ja) |
ES (1) | ES2301631T3 (ja) |
WO (2) | WO2002063637A1 (ja) |
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US7138771B2 (en) | 2006-11-21 |
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