JP3620545B2 - Fiber structure with good light resistance and method for producing the same - Google Patents

Fiber structure with good light resistance and method for producing the same Download PDF

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Publication number
JP3620545B2
JP3620545B2 JP16585491A JP16585491A JP3620545B2 JP 3620545 B2 JP3620545 B2 JP 3620545B2 JP 16585491 A JP16585491 A JP 16585491A JP 16585491 A JP16585491 A JP 16585491A JP 3620545 B2 JP3620545 B2 JP 3620545B2
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Japan
Prior art keywords
fiber structure
resin
ultraviolet absorber
light resistance
good light
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Expired - Fee Related
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JP16585491A
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Japanese (ja)
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JPH059870A (en
Inventor
京子 横井
慈朗 天野
俊六 遠山
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Toray Industries Inc
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Toray Industries Inc
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Description

【0001】
【産業上の利用分野】
本発明は、高度な耐光性を有する繊維構造物およびその製造方法に関する。
【0002】
【従来の技術】
ポリエステルやポリアミドなどの合成繊維は衣料および各種産業資材として広く利用されており、高度な耐光性を要求される自動車内装材としても重要性を増しているが、近年の自動車内装材の高級化指向に伴って自動車業界はこれら内装材の耐光性の基準を高めてきている。
【0003】
従来、合成繊維の耐光性を向上させる試みとしては、耐光性の良好な染料を選択するか、あるいは染色中や後加工工程中において、ベンゾトリアゾール系、ベンゾフェノン系等の紫外線吸収剤を付与する方法が一般に行なわれている。
【0004】
また、特開平1ー77623号や特開平3ー14621号などでは芯鞘構造の繊維の鞘成分を構成するポリマ中にマンガン化合物で被覆した二酸化チタン等の無機微粒子や酸化亜鉛微粒子を含有させる方法が提案されている。
【0005】
【発明が解決しようとする課題】
前者の方法では、含有できる紫外線吸収剤量は少なく、それなりの効果は有るものの高度な耐光性の要求される分野においては不十分であった。さらに、後者の方法では、染色後色相がくすんだり、染色中に微粒子が脱落するなどの問題があり、また、ポリマ中に微粒子を多量に含有させると紡糸性が悪くなるという問題があった。
【0006】
本発明は、紫外線吸収剤を多量に含有しても良好な色調を保ち、かつ高度な耐光性を有する繊維構造物を提供せんとするものである。
【0007】
【課題を解決するための手段】
かかる目的を達成するために、本発明は下記の構成を採用する。すなわち、本発明の耐光性良好な繊維構造物は、表面が樹脂によって被覆されている繊維構造物において、該樹脂が紫外線吸収剤を含有し、かつ、該紫外線吸収剤の分散サイズの平均粒径が0.4μ以下であることを特徴とするものであり、また、本発明の耐光性良好な繊維構造物の製造方法は、分散サイズの平均粒径が0.4μ以下である紫外線吸収剤を含有する樹脂溶液に、繊維構造物を浸漬するかまたは樹脂溶液で該繊維構造物をコーティングすることを特徴とするものである。
【0008】
【作用】
本発明は、特定な粒子径を有する紫外線吸収剤を含有する樹脂被膜を繊維表面に形成させることによって、着色繊維の色相を変化させることなく耐光性を改善することができることを究明したものである。
【0009】
本発明でいう繊維構造物としては、一般に使用されるポリエステル、ポリアミド、ポリオレフィン、ポリアクリルニトリル等の合成樹脂からなる繊維や天然繊維、さらにこれら繊維からなる糸条、布帛などを使用することができる。
本発明における樹脂としては、特に限定されるものではないが、溶剤可溶性の弗素系、ウレタン系、アクリル系、シリコーン系樹脂などが好ましく、特に樹脂自体の耐光性が良好な弗素含有量20重量%以上の溶剤可溶性弗素系樹脂が好ましい。かかる樹脂被膜の厚さは、厚いほど耐光性は良くなるが、風合いをできるだけソフトに維持するためには、好ましくは被膜の平均厚さが3μ以下であるのがよい。
【0010】
本発明における紫外線吸収剤としては、一般に使用される紫外線吸収剤を使用することができる。たとえば、ベンゾトリアゾール系、ベンゾフェノン系、サリチル酸誘導体系などの紫外線吸収剤を使用することができる。これらの紫外線吸収剤の中でも、溶剤可溶性であるものが好ましく、特に2個以上のエチレングリコール単位からなるポリエチレングリコール側鎖を有する紫外線吸収剤が好ましく使用される。かかる紫外線吸収剤としては、たとえばチヌビン1130(ベンゾトリアゾール系紫外線吸収剤:チバガイギー社製)などを使用することができる。
かかる紫外線吸収剤において、平均粒径0.4μ以下の分散サイズに分散させて樹脂に含有させることが必須であり、特に好ましくは、2個以上のエチレングリコール単位からなるポリエチレングリコール側鎖を有する紫外線吸収剤が分散系で処理しても溶液系で処理しても、得られる樹脂被膜内では0.4μ以下の分散状態を保持する性能を有するので本発明には好適なものである。
【0011】
すなわち、紫外線吸収剤の分散サイズの平均粒径0.4μ以下に制御することにより、繊維表面に被覆させた場合においても色相に悪影響を及ぼさない特徴を発揮させることができるが、0.4μを越えると紫外線吸収剤の含有量が多い場合には、得られる繊維はくすんでくる傾向を示し、色相に悪影響を及ぼす傾向がある。かかる紫外線吸収剤は、樹脂の重量に対して少なくとも40重量%含有させることが好ましい。紫外線吸収剤の含有量は、多いほど同じ程度の耐光性を得るのに必要な樹脂の膜厚は薄くすることができ、風合いの面で有利である。
【0012】
浸漬またはコーティングする方法は通常の方法でよい。本発明の方法においては、繊維または糸条の状態で浸漬法で紫外線吸収剤含有樹脂被膜を形成したものが、風合いが柔軟であり、特に、染色後において樹脂被膜を形成するのが好ましい。
【0013】
【実施例】
以下、本発明を実施例によりさらに具体的に説明する。
【0014】
実施例1〜5
ポリエステルフィラメント糸(75D−24F)をチーズ染色した。染色条件は、染料として、ND Super Auto Blue S−GL 1%owf を用い、130℃×60分の条件を使用した。染色後、乾燥し、糸条1本ずつに、下記の紫外線吸収剤含有樹脂組成物溶液をキスロールにて付与した後、連続して雰囲気温度80℃で乾燥後PVA系糊剤を用いサイジングを行なった後、巻取り、得られた糸条を用いて、経糸密度97本/インチ緯糸密度82本/インチでタフタ織物を製織した。
【0015】
ここで使用した樹脂は、ルミフロンLF200(弗素系樹脂、弗素含有量約25%、60%キシレン溶液、旭硝子社製)、クリスコートP1120(架橋剤としてクリスボンNXを含有するアクリル樹脂;大日本インキ社製)およびDY38ー034(シリコーン樹脂;東レダウコーニング社製)ならびに紫外線吸収剤としてはチヌビン1130(ポリエチレングリコール側鎖を有するベンゾトリアゾール系紫外線吸収剤;チバガイギー社製)を混合した混合樹脂組成物を使用した。得られた織物の構成繊維の表面の被膜を剥離させて顕微鏡観察した結果、含有されている紫外線吸収剤の平均粒径は表1に示すとおりであった。ただし、実施例1〜3については、4000倍で観察しても粒子が観測されなかったので、0.1μ以下と表示した。
【0016】
上述のようにして得られたタフタ織物をフェードメーター(スタンダード紫外線ロングライフフェードメータ:スガ試験機)ブラックパネル83℃で300時間照射して耐光性を調べた結果を表1に示す。
【0017】
【表1】

Figure 0003620545
【0018】
比較例1〜5
比較例1として、染色後未処理の糸条を用意し、また、比較例2として、Cibatex LFN(紫外線吸収剤;チバガイギー社製)2%owf のみを染色中に付与した糸条、比較例3としては配合樹脂がルミフロンのみの糸条、比較例4および比較例5は紫外線吸収剤の代りにZrO微粒子を使用した糸条を用意した。それぞれの分散後の平均粒子径は表2のとおりであった。
【0019】
かかる糸条は、上述の実施例と同様にして製織し、耐光性テストをした結果を表2に示す。
【0020】
【表2】
Figure 0003620545
【0021】
表1に示すごとく実施例1〜6は外観に影響を及ぼさず良好な耐光性が得られるのに比べ、表2に示す比較例1〜5は良好な耐光性が得られないか、あるいは外観にくすみが生じるなど品位の低下が見られ。
【0022】
【発明の効果】
本発明によれば、色相に影響を与えず、優れた耐光性を有する繊維構造物を提供することができる。[0001]
[Industrial application fields]
The present invention relates to a fiber structure having high light resistance and a method for producing the same.
[0002]
[Prior art]
Synthetic fibers such as polyester and polyamide are widely used as garments and various industrial materials, and are becoming increasingly important as automotive interior materials that require high light resistance. Along with this, the automobile industry has raised the standards of light resistance of these interior materials.
[0003]
Conventionally, as an attempt to improve the light resistance of synthetic fibers, a method of selecting a dye having good light resistance, or applying a UV absorber such as benzotriazole or benzophenone during dyeing or in a post-processing step Is generally done.
[0004]
In JP-A-1-77623, JP-A-3-14621, and the like, a method of incorporating inorganic fine particles such as titanium dioxide coated with a manganese compound or zinc oxide fine particles into a polymer constituting a sheath component of a fiber having a core-sheath structure. Has been proposed.
[0005]
[Problems to be solved by the invention]
In the former method, the amount of the ultraviolet absorber that can be contained is small, and although there is a certain effect, it is insufficient in a field where high light resistance is required. Further, the latter method has problems such as a dull hue after dyeing or dropping of fine particles during dyeing, and a problem that spinnability deteriorates when a large amount of fine particles are contained in the polymer.
[0006]
The present invention is intended to provide a fiber structure that maintains a good color tone and has high light resistance even when containing a large amount of an ultraviolet absorber.
[0007]
[Means for Solving the Problems]
In order to achieve this object, the present invention adopts the following configuration. That is, the fiber structure having good light resistance of the present invention is a fiber structure whose surface is coated with a resin, the resin contains an ultraviolet absorber, and the average particle size of the dispersed size of the ultraviolet absorber. Is 0.4 μm or less, and the method for producing a fiber structure having good light resistance according to the present invention uses an ultraviolet absorber having an average particle size of a dispersion size of 0.4 μm or less. The fiber structure is immersed in the resin solution to be contained , or the fiber structure is coated with the resin solution.
[0008]
[Action]
The present invention has been clarified that the light resistance can be improved without changing the hue of the colored fiber by forming a resin film containing an ultraviolet absorber having a specific particle diameter on the fiber surface. .
[0009]
As the fiber structure referred to in the present invention, generally used fibers made of synthetic resins such as polyester, polyamide, polyolefin, polyacrylonitrile, natural fibers, and yarns and fabrics made of these fibers can be used. .
The resin in the present invention is not particularly limited, but a solvent-soluble fluorine-based, urethane-based, acrylic-based, silicone-based resin, or the like is preferable, and in particular, the fluorine content is 20% by weight with good light resistance of the resin itself. The above solvent-soluble fluorine resins are preferred. The thicker the resin coating, the better the light resistance. However, in order to keep the texture as soft as possible, the average thickness of the coating is preferably 3 μm or less.
[0010]
As the ultraviolet absorber in the present invention, a commonly used ultraviolet absorber can be used. For example, ultraviolet absorbers such as benzotriazole, benzophenone, and salicylic acid derivatives can be used. Among these ultraviolet absorbers, those which are soluble in a solvent are preferable, and in particular, an ultraviolet absorber having a polyethylene glycol side chain composed of two or more ethylene glycol units is preferably used. As such an ultraviolet absorber, for example, Tinuvin 1130 (benzotriazole ultraviolet absorber: manufactured by Ciba Geigy Co., Ltd.) can be used.
In such an ultraviolet absorber, it is essential to disperse the resin in a dispersion size having an average particle size of 0.4 μm or less , and particularly preferably, an ultraviolet ray having a polyethylene glycol side chain composed of two or more ethylene glycol units. Even if the absorbent is treated with a dispersion system or a solution system, it has a performance of maintaining a dispersion state of 0.4 μm or less in the obtained resin film, which is suitable for the present invention.
[0011]
That is, by controlling the average particle size of the dispersion size of the ultraviolet absorber to 0.4 μm or less , it is possible to exhibit characteristics that do not adversely affect the hue even when the fiber surface is coated. If the content of the UV absorber is too high, the resulting fibers tend to be dull and tend to adversely affect the hue. Such an ultraviolet absorber is preferably contained at least 40% by weight based on the weight of the resin. The greater the content of the ultraviolet absorber, the thinner the resin film necessary to obtain the same level of light resistance, which is advantageous in terms of texture.
[0012]
The dipping or coating method may be a normal method. In the method of the present invention, the resin film containing the ultraviolet absorber formed by the dipping method in the state of fiber or yarn has a soft texture, and it is particularly preferable to form the resin film after dyeing.
[0013]
【Example】
Hereinafter, the present invention will be described more specifically with reference to examples.
[0014]
Examples 1-5
A polyester filament yarn (75D-24F) was cheese-dyed. As the dyeing conditions, ND Super Auto Blue S-GL 1% owf was used as a dye, and conditions of 130 ° C. × 60 minutes were used. After dyeing and drying, the following UV absorber-containing resin composition solution is applied to each yarn with a kiss roll, followed by continuous drying at an ambient temperature of 80 ° C. and sizing using a PVA paste. After that, a taffeta woven fabric was woven at a warp density of 97 yarns / inch and a weft yarn density of 82 yarns / inch using the yarn obtained by winding.
[0015]
The resin used here is Lumiflon LF200 (fluorine resin, fluorine content of about 25%, 60% xylene solution, manufactured by Asahi Glass Co., Ltd.), Criscoat P1120 (acrylic resin containing Crisbon NX as a cross-linking agent; Dainippon Ink, Inc. And DY38-034 (silicone resin; manufactured by Toray Dow Corning Co., Ltd.) and TINUVIN 1130 (benzotriazole UV absorber having polyethylene glycol side chain; manufactured by Ciba Geigy) as a UV absorber. used. As a result of peeling the film on the surface of the constituent fibers of the obtained woven fabric and observing under a microscope, the average particle size of the contained ultraviolet absorber was as shown in Table 1. However, in Examples 1 to 3, since particles were not observed even when observed at a magnification of 4000, it was displayed as 0.1 μm or less.
[0016]
Table 1 shows the results of examining the light resistance of the taffeta fabric obtained as described above by irradiating it with a fade meter (standard ultraviolet long life fade meter: Suga test machine) at a black panel of 83 ° C. for 300 hours.
[0017]
[Table 1]
Figure 0003620545
[0018]
Comparative Examples 1-5
As Comparative Example 1, an untreated yarn after dyeing was prepared, and as Comparative Example 2, a yarn in which only Cibatex LFN (UV absorber; manufactured by Ciba Geigy) 2% owf was applied during dyeing, Comparative Example 3 As for the compounded resin, a yarn using only Lumiflon was prepared. In Comparative Examples 4 and 5, a yarn using ZrO 2 fine particles instead of the ultraviolet absorber was prepared. The average particle diameter after each dispersion was as shown in Table 2.
[0019]
Table 2 shows the results of weaving the yarn in the same manner as in the above-described Examples and conducting a light resistance test.
[0020]
[Table 2]
Figure 0003620545
[0021]
As shown in Table 1, Examples 1 to 6 do not affect the appearance and good light resistance is obtained, but Comparative Examples 1 to 5 shown in Table 2 do not provide good light resistance, or appearance. Degradation is seen, such as dullness.
[0022]
【The invention's effect】
According to the present invention, it is possible to provide a fiber structure having excellent light resistance without affecting the hue.

Claims (5)

表面が樹脂によって被覆されている繊維構造物において、該樹脂が紫外線吸収剤を含有し、かつ、該紫外線吸収剤の分散サイズの平均粒径が0.4μ以下であることを特徴とする耐光性良好な繊維構造物。In a fiber structure whose surface is coated with a resin, the resin contains an ultraviolet absorber, and the average particle size of the dispersion size of the ultraviolet absorber is 0.4 μm or less. Good fiber structure. 紫外線吸収剤が、2個以上のエチレングリコール単位からなるポリエチレングリコール側鎖を有する紫外線吸収剤であることを特徴とする請求項1記載の耐光性良好な繊維構造物。2. The fiber structure having good light resistance according to claim 1, wherein the ultraviolet absorber is an ultraviolet absorber having a polyethylene glycol side chain composed of two or more ethylene glycol units. 該紫外線吸収剤が、樹脂の重量に対して少なくとも40重量%含有することを特徴とする請求項1または2記載の耐光性良好な繊維構造物。3. The fiber structure having good light resistance according to claim 1, wherein the ultraviolet absorber is contained at least 40% by weight based on the weight of the resin. 該樹脂が、弗素含有量20重量%以上の弗素系樹脂であることを特徴とする請求項1〜3のいずれかに記載の耐光性良好な繊維構造物。The fiber structure according to any one of claims 1 to 3, wherein the resin is a fluorine-based resin having a fluorine content of 20% by weight or more. 分散サイズの平均粒径が0.4μ以下である紫外線吸収剤を含有する樹脂溶液に、繊維構造物を浸漬するかまたは樹脂溶液で該繊維構造物をコーティングすることを特徴とする耐光性良好な繊維構造物の製造方法。A resin solution having an average particle size of the dispersed size containing an ultraviolet absorber is less than 0.4 micron, or immersing the fiber structure, or characterized by coating the fibrous structure with the resin solution lightfastness For producing a fiber structure having good properties.
JP16585491A 1991-07-05 1991-07-05 Fiber structure with good light resistance and method for producing the same Expired - Fee Related JP3620545B2 (en)

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JP3221207B2 (en) * 1994-02-23 2001-10-22 アイシン精機株式会社 Headless equipment
FR2770542B1 (en) * 1997-10-31 2001-03-23 Dhj Internat TEXTILE SUPPORT FILTERING ULTRA-PURPLE RAYS, PREPARATION METHOD THEREOF, USES THEREOF
WO2005007966A1 (en) * 2003-07-08 2005-01-27 Scheidler Karl J Methods and compositions for improving light-fade resistance and soil repellency of textiles and leathers
US7884146B2 (en) 2007-02-20 2011-02-08 Fujifilm Corporation Polymer material containing ultraviolet absorbent
US20100130638A1 (en) 2007-03-30 2010-05-27 Fujifilm Corporation Ultraviolet absorbent composition
US8039532B2 (en) 2007-08-16 2011-10-18 Fujifilm Corporation Heterocyclic compound, ultraviolet absorbent and composition containing the same
JP5244437B2 (en) 2008-03-31 2013-07-24 富士フイルム株式会社 UV absorber composition
JP5250289B2 (en) 2008-03-31 2013-07-31 富士フイルム株式会社 UV absorber composition
JP2009270062A (en) 2008-05-09 2009-11-19 Fujifilm Corp Ultraviolet absorbent composition

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