JP3475680B2 - Frame type crystal resonator and device element using the same - Google Patents

Frame type crystal resonator and device element using the same

Info

Publication number
JP3475680B2
JP3475680B2 JP30141096A JP30141096A JP3475680B2 JP 3475680 B2 JP3475680 B2 JP 3475680B2 JP 30141096 A JP30141096 A JP 30141096A JP 30141096 A JP30141096 A JP 30141096A JP 3475680 B2 JP3475680 B2 JP 3475680B2
Authority
JP
Japan
Prior art keywords
frame
crystal
type crystal
type
device element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP30141096A
Other languages
Japanese (ja)
Other versions
JPH10145179A (en
Inventor
孝行 宇賀神
雅子 田中
功 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Meidensha Corp
Original Assignee
Meidensha Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Meidensha Corp filed Critical Meidensha Corp
Priority to JP30141096A priority Critical patent/JP3475680B2/en
Publication of JPH10145179A publication Critical patent/JPH10145179A/en
Application granted granted Critical
Publication of JP3475680B2 publication Critical patent/JP3475680B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、耐落下衝撃性を向
上させた枠型水晶振動子及びそれをパッケージに収納し
たデバイス素子に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a frame-type crystal unit having improved drop impact resistance and a device element having the frame-type unit mounted in a package.

【0002】[0002]

【従来の技術】近年、コードレスフォン,携帯電話,ポ
ケットベル等の移動体通信分野の普及が著しい。これら
移動体通信機器に使用される発振用,水晶フィルタ用等
の水晶振動子は高周波対応の物が多く、またその特性
上、高い耐落下衝撃性が要求される。
2. Description of the Related Art In recent years, the field of mobile communications such as cordless phones, mobile phones, and pagers has been remarkably spread. Many of the crystal oscillators for oscillation and crystal filters used in these mobile communication devices are compatible with high frequencies, and due to their characteristics, high drop impact resistance is required.

【0003】更に、昨今、水晶振動子の高周波化,小型
化,高精度化,高安定化に伴い水晶振動子の製造を半導
体の製造工法であるフォトリソグラフイ・エッチングを
用いて行うことが盛んになってきた。これは、従来のブ
レードソーやワイヤーソーによる結晶の機械的切断に代
わって、任意の形状のマスクを用いてフォトリソ加工
し、不要の結晶部分をウェットエッチングにて溶解除去
する方法である。
Further, in recent years, with the increasing frequency of crystal oscillators, miniaturization, higher precision, and higher stability, it has become popular to manufacture crystal oscillators using photolithography etching, which is a semiconductor manufacturing method. Has become. This is a method of performing photolithography using a mask of an arbitrary shape and dissolving and removing unnecessary crystal parts by wet etching, instead of mechanical cutting of crystals by a conventional blade saw or wire saw.

【0004】一方、広い温度領域に対して発振周波数の
安定した水晶振動子を得るには一般にATカットの水晶
が用いられるが、ATカット水晶の発振周波数は厚みと
反比例するため、高周波の発振を得るためにはブランク
を非常に薄くする必要がある。
On the other hand, an AT-cut crystal is generally used to obtain a crystal unit having a stable oscillation frequency over a wide temperature range. However, since the oscillation frequency of an AT-cut crystal is inversely proportional to the thickness, a high-frequency oscillation is generated. The blank needs to be very thin to obtain.

【0005】周波数:f=1665/水晶厚み 機械加工による水晶の薄板化には取扱いの関係で限界が
あるが、前述のフォトリソグラフイ・エッチングを用い
れば、振動部分のみをエッチングにより薄板化すること
で100MHz以上の高周波を基本波で得ることも可能
である。この工程に従えば、 (1)加工精度が従来の機械加工に比べて優れている。 (2)任意の形状のマスクに従って加工ができる。 (3)高周波の基本波も薄板化エッチングにより得るこ
とができる。 等の利点が上げられる。
Frequency: f = 1665 / crystal thickness There is a limit to the thinning of the crystal by mechanical processing due to the handling, but if the photolithography etching is used, only the vibrating part can be thinned by etching. It is also possible to obtain a high frequency of 100 MHz or more as a fundamental wave. According to this process, (1) processing accuracy is superior to that of conventional machining. (2) It can be processed according to a mask having an arbitrary shape. (3) A high frequency fundamental wave can also be obtained by thinning etching. The advantages such as

【0006】図4にフォトリソ技術により製作した水晶
振動子の見取図を示し、図5にその振動子をシリンダ型
パッケージに収納した場合の支持構造を示す。
FIG. 4 shows a sketch of a crystal oscillator manufactured by the photolithography technique, and FIG. 5 shows a supporting structure when the oscillator is housed in a cylinder type package.

【0007】図4,図5において、1は水晶振動子、1
1はそのエッチングにより薄板化された振動部、12は枠
部、21,22は振動部に施された電界を発生させる電
極、31,32は電極の端子部、5はシリンダ型パッケー
ジのベース、71,72はベース外側の端子、61,62
端子71,72と一体のベース内側のリード、41,42
水晶振動子1をその端子部31,32においてパッケージ
のリード61,62に接着固定しているドータイトであ
る。
In FIGS. 4 and 5, 1 is a crystal oscillator, 1
1 is vibrating part which is thinned by its etching, 1 2 the frame section, 2 1, 2 2 electrodes for generating an electric field that is applied to the vibrating unit, 3 1, 3 2 terminal portion of the electrode, the 5 cylinder Type package base, 7 1 and 7 2 are terminals outside the base, 6 1 and 6 2 are leads inside the base integrated with the terminals 7 1 and 7 2 and 4 1 and 4 2 are the crystal units 1 at their terminal portions. 3 1 is a Dotite that adheres and fixes the 3 2 package leads 61 and 62 to 2.

【0008】[0008]

【発明が解決しようとする課題】上記従来の移動体通信
機器に使用される水晶振動子は、移動体製品の仕様とし
て高い耐落下衝撃性及び高周波化が要求されている。
The crystal unit used in the conventional mobile communication equipment is required to have high drop impact resistance and high frequency as specifications of mobile products.

【0009】しかしながら、一般に用いられるATカッ
ト水晶において発振周波数は厚みに反比例する関係にあ
り、従来水晶振動子には機械加工による薄板化加工によ
る限界と加工後のブランクのサポート方法に問題があ
り、高周波化と耐落下衝撃性を十分満足しているとは言
い難い状態である。
However, in the generally used AT-cut crystal, the oscillation frequency is inversely proportional to the thickness, and the conventional crystal resonator has problems in the limit of thinning by machining and the method of supporting the blank after machining. It is difficult to say that the high frequency and drop impact resistance are sufficiently satisfied.

【0010】一般に、自由落下(硬質木板上)で1.5
m×10回以上の耐落下衝撃性の仕様が要求されてい
る。
Generally, 1.5 in free fall (on a hard wood board)
Specifications of drop impact resistance of m × 10 times or more are required.

【0011】本発明は、従来のこのような問題点に鑑み
てなされたものであり、その目的とするところは、耐落
下衝撃性の仕様を十分満足することのできる水晶振動子
及びそれを用いたデバイス素子を提供することにある。
The present invention has been made in view of the above problems of the prior art, and an object of the present invention is to provide a crystal oscillator which can sufficiently satisfy the specifications of drop impact resistance and a crystal oscillator using the same. To provide the device element that was used.

【0012】[0012]

【課題を解決するための手段】本発明の枠型水晶振動子
は、水晶基板の周囲に枠部が残るように中央部分を薄板
エッチングにより薄板化して振動部とした枠型水晶振動
子において、前記枠部の内側下部のコーナ部分に0.2
mm以上の内R面又は内C面を設けたものである。また
は、前記枠型水晶振動子において、水晶基板の縦方向の
長さAと枠部の下側枠の縦方向の幅a1との比a1/Aを
25%以上とし、前記水晶基板の長さAと枠部の上側枠
の縦方向の幅a2との比a2/Aを20%以下とし、水晶
基板の横方向の長さBと枠部の左側及び右側枠の横方向
の幅bとの比b/Bを15%以上としたものである。
A frame-type crystal unit according to the present invention
Thin plate the central part so that the frame remains around the quartz substrate.
In a frame-type crystal unit, which is made into a vibrating portion by thinning it by etching , 0.2
The inner R surface or the inner C surface of mm or more is provided. Alternatively, in the frame-type crystal unit, the ratio a 1 / A of the vertical length A of the crystal substrate to the vertical width a 1 of the lower frame of the frame is set to 25% or more, The ratio a 2 / A between the length A and the vertical width a 2 of the upper frame of the frame portion is set to 20% or less, and the horizontal length B of the crystal substrate and the horizontal direction of the left and right frames of the frame portion The ratio b / B to the width b is set to 15% or more.

【0013】[0013]

【発明の実施の形態】図1に枠型水晶振動子の枠形状を
示す。図中、1は水晶振動子、11は振動部(薄板エッ
チングによる薄板部)、12は枠部、2は電極、3は電
極の端子部を示す。
DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows the frame shape of a frame-type crystal unit. In the figure, 1 is a crystal oscillator, 1 1 vibrating portion (thin portion by the thin etch), 1 2 the frame section, 2 electrode, 3 denotes a terminal portion of the electrode.

【0014】[0014]

【表1】 [Table 1]

【0015】水晶振動子として表1に示すような枠形状
及び面加工の試料(従来例,実施例1〜10)を作っ
た。図1および表1において、Aは水晶振動子の縦方向
の長さ、Bは横方向の幅、a1は下側枠の幅、a2は上側
枠の幅、bは左右の枠の幅を示す。また、表1のL,
R,Cは図1の枠部の内側下部のコーナ部分イ,ロの面
加工を示すもので、Lは枠12のコーナ部分イ,ロの角
度を直角形成するための直角加工したもの、R及びCは
それぞれコーナ部分に内R面及びC面を形成するための
薄板エッチングの角のR面加工及びC面加工したものを
示す(図2)。
As crystal oscillators, samples having frame shapes and surface processings (conventional examples, Examples 1 to 10) as shown in Table 1 were prepared. In FIG. 1 and Table 1, A is the length of the crystal unit in the vertical direction, B is the width in the horizontal direction, a 1 is the width of the lower frame, a 2 is the width of the upper frame, and b is the width of the left and right frames. Indicates. Also, L in Table 1
R, those C not indicate corner portion of the inner bottom of the frame portion of FIG. 1 b, the surface processing of the B, L is obtained by quadrature processing to a right angle forming the corner portion b, the angle of the B frame 1 2, R and C indicate the R-face processed and C-face processed corners of the thin plate etching for forming the inner R-face and the C-face at the corner portion, respectively (FIG. 2).

【0016】上記試料は水晶基板に80μmのものを使
用し、電極を付けて150MH帯の枠型高周波基本波振
動子とし、従来同様にシリンダー型パッケージ内にドー
タイトを用いて接着固定した。
The sample used was a quartz substrate having a thickness of 80 μm, and electrodes were attached to form a frame type high frequency fundamental wave oscillator of 150 MH band, which was adhered and fixed in a cylinder type package using dotite as in the conventional case.

【0017】表1に示した従来例,実施例1〜10のパ
ッケージされた各水晶振動子を仕様に基づいて落下試験
をした。
The packaged crystal units of the conventional example and Examples 1 to 10 shown in Table 1 were subjected to a drop test based on the specifications.

【0018】従来例の枠形状においては耐落下特性は7
5cm×5回程度しかなく、また、実施例1,3,5,
6のものは、1.5×10回の落下衝撃試験に耐えられ
なかった。それらのものは何れも図3に示す劈開部分で
劈開しており、水晶振動子の枠部内側の下部コーナ部分
に応力が集中したためと考えられる。
In the conventional frame shape, the drop resistance is 7
Only about 5 cm × 5 times, and in Examples 1, 3, 5,
No. 6 could not withstand a drop impact test of 1.5 × 10 times. It is considered that all of them were cleaved at the cleavage portion shown in FIG. 3, and stress was concentrated on the lower corner portion inside the frame portion of the crystal unit.

【0019】表1の実施例1〜6の落下試験の結果から
みて、1.5m×10回以上の耐落下衝撃性を満足させ
るには、以下の枠形状を採用する必要があることがわか
った。 (1)枠形状の辺比をa1/A=25%以上 (2)枠形状の辺比をa2=/A=20%以下 (3)枠形状の辺比をb/B=15%以上。
From the results of the drop tests of Examples 1 to 6 in Table 1, it was found that the following frame shapes must be adopted to satisfy the drop impact resistance of 1.5 m × 10 times or more. It was (1) The side ratio of the frame shape is a 1 / A = 25% or more (2) The side ratio of the frame shape is a 2 = / A = 20% or less (3) The side ratio of the frame shape is b / B = 15% that's all.

【0020】更に、実施例7〜10の落下試験の結果か
らみて、耐落下衝撃性の向上を求めるときは、上記辺比
形状に加えて、図3の応力集中部分とみられる図1の
イ,ロ部分における薄板エッチングの角を0.2mm以
上のR面加工あるいはC面加工構造を採用する必要があ
ることがわかった。
Furthermore, in view of the results of the drop tests of Examples 7 to 10, when it is desired to improve the drop impact resistance, in addition to the above side ratio shape, the stress concentration portion of FIG. It was found that it is necessary to adopt a R-face processing or C-face processing structure in which the angle of the thin plate etching in the portion B is 0.2 mm or more.

【0021】以上の実施例においては全て水晶振動子を
用いたが、MCF(MONOLITHIC CRYST
AL FILTER)においても同様の効果が得られ
る。
In all of the above embodiments, the crystal oscillator was used, but MCF (MONOLITHIC CRYST) was used.
The same effect can be obtained in AL FILTER).

【0022】更に、実施例については全てシリンダー型
パッケージを用いたが表面実装型(SMD)型パッケー
ジにおいても同様あるいはそれ以上の効果があった。
Further, in all the examples, the cylinder type package is used, but the surface mount type (SMD) type package also has the same or higher effect.

【0023】なお、実施例では水晶基板として80μm
mのものを使用したが、40〜300μmのものも本発
明が同様に適用できると考えられる。
In the embodiment, the crystal substrate is 80 μm.
However, it is considered that the present invention can be similarly applied to those having a thickness of 40 to 300 μm.

【0024】[0024]

【発明の効果】本発明は、上述のとおり構成されている
ので、次に記載する効果を奏する。
Since the present invention is configured as described above, it has the following effects.

【0025】(1)耐落下衝撃性が著しく向上した水晶
振動子が得られる。
(1) It is possible to obtain a crystal resonator having significantly improved drop impact resistance.

【0026】(2)水晶基板を薄板エッチングのフォト
マスクの形状を変えるだけでできる。
(2) The quartz substrate can be formed by simply changing the shape of the photomask for thin plate etching.

【図面の簡単な説明】[Brief description of drawings]

【図1】枠型水晶振動子の枠形状説明図。FIG. 1 is an explanatory view of a frame shape of a frame-type crystal oscillator.

【図2】図1のイ,ロ部分の拡大図。FIG. 2 is an enlarged view of portions a and b in FIG.

【図3】落下試験による水晶振動子の劈開箇所説明図。FIG. 3 is an explanatory view of a cleavage portion of a crystal unit by a drop test.

【図4】フォトリソ技術により試作した水晶振動子の見
取図。
FIG. 4 is a sketch of a crystal unit prototyped by photolithography technology.

【図5】シリンダ型水晶振動子の支持構造説明図。FIG. 5 is an explanatory view of a supporting structure of a cylinder type crystal unit.

【符号の説明】[Explanation of symbols]

1…水晶振動子 11…振動部(薄板部) 12…枠部 2,21,22…電極 3,31,32…電極の端子部 41,42…ドータイト 5…パッケージのペース 61,62…ベース内側のリード 71,72…ベース外側の端子。1 ... Crystal oscillator 1 1 ... Vibration part (thin plate part) 1 2 ... Frame part 2, 2 1 , 2 2 ... Electrode 3, 3 1 , 3 2 ... Electrode terminal part 4 1 , 4 2 ... DOTITE 5 ... Package Pace 6 1 , 6 2 ... Leads inside the base 7 1 , 7 2 ... Terminals outside the base.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平8−228124(JP,A) 特開 平8−228122(JP,A) 実開 平2−57625(JP,U) (58)調査した分野(Int.Cl.7,DB名) H03H 9/00 - 9/125 H03H 9/54 - 9/60 ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-8-228124 (JP, A) JP-A-8-228122 (JP, A) Fukuihei 2-57625 (JP, U) (58) Field (Int.Cl. 7 , DB name) H03H 9/00-9/125 H03H 9/54-9/60

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 水晶基板の周囲に枠部が残るように中央
部分を薄板エッチングにより薄板化して振動部とした枠
型水晶振動子において、前記枠部の内側下部のコーナ部分に0.2mm以上の内
R面又は内C面を設けた ことを特徴とする枠型水晶振動
子。
1. A frame-type crystal resonator in which a central part is thinned by thin plate etching to form a vibrating part so that a frame part remains around a quartz substrate, and a corner part of an inner lower part of the frame part is 0.2 mm or more. Of
A frame-type crystal unit provided with an R surface or an inner C surface .
【請求項2】 請求項1に記載の枠型水晶振動子におい
て、 水晶基板の縦方向の長さAと枠部の下側枠の縦方向の幅
1との比a1/Aを25%以上とし、前記水晶基板の長
さAと枠部の上側枠の縦方向の幅a2との比a2/Aを2
0%以下とし、水晶基板の横方向の長さBと枠部の左側
及び右側枠の横方向の幅bとの比b/Bを15%以上と
したことを特徴とする枠型水晶振動子。
2. The frame-type crystal unit according to claim 1.
Te, the ratio a 1 / A of the longitudinal width a 1 of the lower frame longitudinal length A and the frame portion of the quartz substrate was 25% or more, above the length A and the frame portion of the quartz substrate The ratio a 2 / A to the vertical width a 2 of the frame is 2
A frame-type crystal resonator characterized in that the ratio b / B of the lateral length B of the crystal substrate to the lateral widths b of the left and right frames of the frame is 15% or more. .
【請求項3】 請求項1または2のいずれか1項に記載
の枠型水晶振動子が、モノリシッククリスタルフイルタ
に適用されていることを特徴とする水晶振動子。
3. The method according to claim 1 or 2.
The crystal oscillator characterized in that the frame-type crystal oscillator of is applied to a monolithic crystal filter.
【請求項4】 請求項1ないし3のいずれか1項に記載
の枠型水晶振動子を、シリンダ型パッケージに収納して
構成したことを特徴とするデバイス素子。
4. The method according to any one of claims 1 to 3.
The frame-type crystal unit of is stored in a cylinder-type package.
A device element characterized by being configured .
【請求項5】 請求項1ないし3のいずれか1項に記載
の枠型水晶振動子を、表面実装型パッケージに収納収納
して構成したことを特徴とするデバイス素子。
5. The method according to any one of claims 1 to 3.
Storage storage of a frame-type quartz crystal resonator, the surface-mount package
A device element characterized by being configured as described above .
JP30141096A 1996-11-13 1996-11-13 Frame type crystal resonator and device element using the same Expired - Fee Related JP3475680B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30141096A JP3475680B2 (en) 1996-11-13 1996-11-13 Frame type crystal resonator and device element using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30141096A JP3475680B2 (en) 1996-11-13 1996-11-13 Frame type crystal resonator and device element using the same

Publications (2)

Publication Number Publication Date
JPH10145179A JPH10145179A (en) 1998-05-29
JP3475680B2 true JP3475680B2 (en) 2003-12-08

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Country Link
JP (1) JP3475680B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006121441A (en) * 2004-10-21 2006-05-11 Nippon Dempa Kogyo Co Ltd Method for manufacturing crystal oscillator, and crystal oscillator
JP5533213B2 (en) * 2010-05-10 2014-06-25 セイコーエプソン株式会社 Vibrating piece, vibrator and oscillator
JP5797961B2 (en) 2011-07-21 2015-10-21 日本電波工業株式会社 Piezoelectric vibrating piece and piezoelectric device
JP2014007538A (en) * 2012-06-25 2014-01-16 Daishinku Corp Quartz vibration device

Also Published As

Publication number Publication date
JPH10145179A (en) 1998-05-29

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