JP3451391B2 - Plating equipment - Google Patents
Plating equipmentInfo
- Publication number
- JP3451391B2 JP3451391B2 JP8036398A JP8036398A JP3451391B2 JP 3451391 B2 JP3451391 B2 JP 3451391B2 JP 8036398 A JP8036398 A JP 8036398A JP 8036398 A JP8036398 A JP 8036398A JP 3451391 B2 JP3451391 B2 JP 3451391B2
- Authority
- JP
- Japan
- Prior art keywords
- plated
- plating
- plate
- positioning
- positioning pin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Description
【発明の詳細な説明】
【０００１】
【発明の属する技術分野】本発明は位置決めしてめっき
する装置に関する。
【０００２】
【従来の技術】めっきには被めっき材の所定箇所への部
分めっき或は全面的なめっきがある。例えばリードフレ
ームは全面めっきされることもあるが、半導体チップを
搭載するパッド、及びワイヤ−ボンディングされるイン
ナーリード先端部に貴金属が部分めっきされる。
【０００３】リードフレームは半導体装置の高集積度
化、高機能化、小型化等により多ピンになりリ−ドピッ
チが微細化している。これらリードフレームへの部分め
っきは所定箇所だけに位置精度よく行う必要があるか
ら、めっき時に位置決めピンを用いてリードフレーム材
を位置決めして部分めっきを施している。
【０００４】
【この発明が解決しようとする課題】被めっきリードフ
レーム材の位置決めピンが入出するリードフレームのガ
イドホ−ルは、めっき位置精度を高めるために位置決め
ピンとなすクリアランスを小さくして穿設されている。
従って、めっきに際して位置決めピンを被めっきリード
フレーム材のガイドホ−ルに挿入する場合、当該ガイド
ホ−ルにキズがついたりバリを生じることがある。ま
た、めっき後、ガイドホ−ルから位置決めピンを抜く場
合に、当該ガイドホ−ルから抜けず、或は被めっきリー
ドフレーム材の前後を位置決めしている片方が抜けず、
被めっきリードフレーム材が腰折れする等の問題があ
る。
【０００５】また、前記のように半導体装置の多ピン化
に応じてリードフレームは板厚が薄い金属板からプレス
或はエッチングにより形成されているので、機械的強度
が低くく前記腰折れが多発し易い。かかる問題から多ピ
ンの被めっきリードフレームは帯状材としてリ−ルツ−
リ−ルめっきラインでめっきするのが非常に難しく生産
性を高めるが難しい問題がある。
【０００６】本発明は機械的強度の弱い被めっき材例え
ばリードフレーム材に腰折れやガイドホ−ルにキズやバ
リを生じさせることなく、精度よく位置決めして所定箇
所にめっきする装置を目的とする。また、めっきの生産
性を高め得るめっき装置を目的とする。
【０００７】本発明の要旨は、被めっき材を位置決めピ
ンにより位置決めしてめっきする装置において、マスク
プレートに前記位置決めピンとロケータを設け、被めっ
き材の通板ガイド部を設けたガイドレールに前記位置決
めピンとロケータがそれぞれ入出するパイロット孔とガ
イド孔を設け、且つ該ガイドレールをバックプレート部
に弾性体を介在して設けためっき装置にある。
【０００８】
【発明の実施の形態】本発明の１実施例について図面を
参照して説明する。図面において、１はマスクプレ−ト
で、被めっき材２に当接する部分にはマスクゴム３が設
けられている。マスクプレ−ト１及びマスクゴム３は被
めっき材２にめっきする部分は公知のように開口されて
いる。４は位置決めピンで、被めっき材２をめっきする
際に位置決めするものでマスクゴム３を挟んで上下に、
且つ通板方向に間隔をおいてマスクプレ−ト１に設けら
れている。
【０００９】５はロケータで、被めっき材２の通板時に
上下方向の位置決め案内するものであり、該ロケータ５
はマスクプレート１に設けている。この実施例のように
ロケータ５を前記位置決めピン４ともどもマスクプレー
ト１内に設けると、被めっき材２の上下方向すなわち幅
方向の揺動が規制され位置決めが一層容易となる。
【００１０】６はスパ−ジャで、前記マスクプレ−ト１
が設置されているとともに、めっき液噴射装置（図示し
ない）が内部に設けられている。該スパ−ジャ６は被め
っき材２側に進退駆動装置（図示しない）により進退自
在である。
【００１１】７はガイドレールで、被めっき材２の通板
ラインの上下に、且つ通板方向に間隔をおいてバックプ
レートホルダー１３に設けられ、被めっき材２の通板を
ガイドするとともにめっきに際して前記位置決めピン４
と共同して位置決めするものである。該ガイドレール７
には通板ガイド部８と、前記位置決めピン４が入出する
パイロット孔９と、この実施例では前記ロケータ５が入
出するガイド孔１０が設けられている。
【００１２】該ガイドレ−ル７は弾性体１１例えばスプ
リングを取付け杆１２に介在させてバックプレ−トホル
ダ−１３に設けられ、外力が付加すると前記弾性体１１
の反発力に抗して前記バックプレ−トホル−ダ１３側に
移行し、外力が解けると元の状態に戻るようになってい
る。
【００１３】１４はバックプレ−トで、被めっき材２を
めっきする際に前記マスクプレ−ト１とで挟持するもの
であり、被めっき材２との当接部にはバックゴム１５が
設けられている。
【００１４】前記ガイドレ−ル７及びバックプレ−ト１
４が設けられたバックプレ−トホルダ−１３は、被めっ
き材２の通板ラインに対して進退駆動装置（図示しな
い）により進退自在である。
【００１５】１６は被めっき材２への通電電極で、前記
スパ−ジャ６の前後の通板ラインに設けられ、めっきの
際に被めっき材２に通電し、一方、スパ−ジャ６に設け
ためっき液噴射装置（図示せず）からめっき液を被めっ
き材２に噴出してめっきを施すようになっている。
【００１６】次に、作用について述べる。被めっき材２
が間欠的に搬送されめっき装置１７内に設けたガイドレ
−ル７の通板ガイド部８で案内されて来ると、スパ−ジ
ャ６を被めっき通板ライン側へ前進させることにより、
位置決めピン４が前記ガイドレ−ル７に穿設したパイロ
ット孔９に入り込む。また、この実施例ではロケ−タ５
がガイド孔１０に入り込んで行く。さらに位置決めピン
４、ロケ−タ５が前進して、当該位置決めピン４は被め
っき材２のガイドホ−ル２ａに入り位置決めを開始し、
ロケ−タ５は被めっき材２の上下方向の動きを規制す
る。さらに前進し、当該位置決めピン４、ロケ−タ５を
設けたマスクプレ−ト１がガイドレ−ル７の頭部に当り
弾性体１１の反発力に抗して進み、位置決めピン４とパ
イロット孔９により被めっき材２が位置決めされる。こ
の位置決め時、ガイドレ−ル７は弾性体１１を介在して
バックプレ−トホルダ−１３に設けられ被めっき材通板
ラインの直交方向に動けるので、位置決めピン４とパイ
ロット孔９のクリアランスが小さくともキズやバリを生
じることなく位置決めピン４が入り込んで行く。
【００１７】位置決めし且つマスクプレ−ト１のマスク
ゴム３とバックプレ−ト１４のバックゴム１５で被めっ
き材７を挟持してから、めっき液がスパ−ジャ６のめっ
き液噴射装置（図示しない）よりめっき必要箇所に噴出
してめっきされる。
【００１８】めっき後、マスクプレ−ト１とバックプレ
−ト１４による前記被めっき材２の挟持を解くため、前
記マスクプレ−ト１をバックプレ−ト１４に対してスパ
−ジャ６とともに退行させる。また必要に応じてバック
プレ−ト１４を退行させる。該退行により位置決めピン
４がパイロット孔９から抜け初めるとき、ガイドレ−ル
７に設けた弾性体１１の反発力により該ガイドレ−ル７
の頭部が当たっていたマスクプレ−ト１を押し或は微小
振動し、被めっき材２に接していたマスクプレ−ト１の
マスクゴム３との接触が全面的に解かれる。またバック
プレ−ト１４のバックゴム１５も被めっき材２より離れ
る。従って、被めっき材２は機械的強度が弱いもので腰
折れ等は生じない。
【００１９】位置決めピン４がパイロット孔９から退出
したら、被めっき材２は間欠搬送され、次のめっき箇所
に前述と同様にしてめっきされる。
【００２０】
【発明の効果】本発明によると、マスクプレ−トに設け
た位置決めピンが入出するパイロット孔を設け且つ被め
っき材の通板ガイド部を設けたガイドレ−ルを、バック
プレ−トに弾性体を介在して設けているので、めっきに
際してマスクプレ−トとバックプレ−トを被めっき材の
通板ライン側へ互いに前進させ、前記位置決めピンを前
記ガイドレ−ルのパイロット孔に入れ込んで位置決めす
るとき、弾性体の反発力に抗してその進行方向と反方向
に当該ガイドレ−ルが退行するから位置決めピンが被め
っき材のガイドホ−ルにキズやバリを生じることなく位
置決めできる。また、めっき後に位置決めピンをパイロ
ット孔から抜き出す際には、前記ガイドレ−ルに設けた
弾性体の反発力によりマスクプレ−トを被めっき材より
全面的に同時に離し腰折れ等が生じない。機械的強度が
弱い被めっき材でも腰折れが生じないので、リ−ルツ−
リ−ル方式でめっきが生産性よくできる等の効果があ
る。
【００２１】また、前記ロケ−タがマスクプレ−トに位
置決めピンとともに設けられ、前記ガイドレ−ルにロケ
−タが入出するガイド孔を設けた場合は、被めっき材の
通板時に上下方向の揺動が規制され、位置決めの精度、
及び作業性が向上する。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a positioning and plating apparatus. 2. Description of the Related Art Plating includes partial plating or full plating on a predetermined portion of a material to be plated. For example, the lead frame may be plated on the entire surface, but the noble metal is partially plated on the pad for mounting the semiconductor chip and the tip of the inner lead to be wire-bonded. The lead frame has a large number of pins due to the high integration, high functionality, miniaturization, etc. of the semiconductor device, and the lead pitch has been reduced. Since it is necessary to perform partial plating on these lead frames only at predetermined positions with high positional accuracy, the plating is performed by positioning the lead frame material using positioning pins during plating. [0004] A guide hole of a lead frame into which a positioning pin of a lead frame material to be plated enters and exits is formed with a small clearance between the positioning pin and the positioning hole in order to enhance plating position accuracy. ing.
Therefore, when the positioning pins are inserted into the guide holes of the lead frame material to be plated during plating, the guide holes may be scratched or burr. In addition, when the positioning pin is removed from the guide hole after plating, the positioning pin does not come off from the guide hole, or one of the front and back positioning members of the lead frame material to be plated does not come off.
There is a problem that the lead frame material to be plated breaks. Further, as described above, since the lead frame is formed from a thin metal plate by pressing or etching in accordance with the increase in the number of pins of the semiconductor device, the mechanical strength is low and the buckling occurs frequently. easy. Due to such a problem, a multi-pin plated lead frame is used as a strip material.
There is a problem that it is very difficult to perform plating on a reel plating line and it is difficult to increase productivity. SUMMARY OF THE INVENTION It is an object of the present invention to provide an apparatus for accurately positioning and plating a predetermined portion of a material to be plated having a low mechanical strength, such as a lead frame material, without causing breakage in a buckle or scratches or burrs on a guide hole. Another object of the present invention is to provide a plating apparatus capable of increasing plating productivity. The gist of the present invention is to provide an apparatus for positioning and plating a material to be plated by a positioning pin, wherein the positioning pin and a locator are provided on a mask plate, and the positioning is performed on a guide rail provided with a guide plate for the material to be plated. A plating apparatus is provided with a pilot hole and a guide hole through which a pin and a locator enter and exit, respectively, and the guide rail is provided on a back plate portion via an elastic body. An embodiment of the present invention will be described with reference to the drawings. In the drawings, reference numeral 1 denotes a mask plate, and a mask rubber 3 is provided at a portion in contact with a material 2 to be plated. The portions of the mask plate 1 and the mask rubber 3 to be plated on the material to be plated 2 are opened as is known. Reference numeral 4 denotes a positioning pin, which is positioned when plating the material to be plated 2 and is vertically positioned with the mask rubber 3 interposed therebetween.
In addition, they are provided on the mask plate 1 at intervals in the passing direction. Reference numeral 5 denotes a locator which guides the positioning in the vertical direction when the material to be plated 2 is passed.
Are provided on the mask plate 1. When the locator 5 is provided together with the positioning pins 4 in the mask plate 1 as in this embodiment, the swinging of the plated material 2 in the vertical direction, that is, in the width direction is restricted, and the positioning is further facilitated. Reference numeral 6 denotes a sparger.
And a plating solution spraying device (not shown) is provided inside. The sparger 6 can be moved back and forth toward the material to be plated 2 by a drive device (not shown). Reference numeral 7 denotes a guide rail, which is provided on the back plate holder 13 above and below the passing line of the material to be plated 2 and at intervals in the direction of the plate passing. The positioning pin 4
The positioning is performed in cooperation with. The guide rail 7
Are provided with a guide plate 8, a pilot hole 9 through which the positioning pin 4 enters and exits, and a guide hole 10 through which the locator 5 enters and exits in this embodiment. The guide rail 7 is provided on the back plate holder 13 with an elastic body 11, for example, a spring, interposed between the mounting rods 12, and when an external force is applied, the elastic body 11 is provided.
When the external force is released, it returns to the original state. Reference numeral 14 denotes a back plate, which is sandwiched between the mask plate 1 when plating the material 2 to be plated and a back rubber 15 is provided at a contact portion with the material 2 to be plated. ing. The guide rail 7 and the back plate 1
The back plate holder 13 provided with 4 can be moved back and forth with respect to the threading line of the material to be plated 2 by a back and forth driving device (not shown). Reference numeral 16 denotes a current-carrying electrode for the material 2 to be plated, which is provided on a threading line before and after the sparger 6, and supplies electricity to the material 2 to be plated during plating, and is provided on the sparger 6 on the other hand. A plating solution is jetted from a plating solution jetting device (not shown) to the material to be plated 2 to perform plating. Next, the operation will be described. Plated material 2
Is intermittently conveyed and guided by the passing plate guide portion 8 of the guide rail 7 provided in the plating apparatus 17, the sparger 6 is advanced to the plate passing line side by plating.
The positioning pin 4 enters a pilot hole 9 formed in the guide rail 7. In this embodiment, the locator 5 is used.
Enters the guide hole 10. Further, the positioning pin 4 and the locator 5 advance, and the positioning pin 4 enters the guide hole 2a of the material to be plated 2 and starts positioning.
The locator 5 regulates the vertical movement of the material 2 to be plated. Further, the mask plate 1 provided with the positioning pin 4 and the locator 5 hits the head of the guide rail 7 and advances against the repulsive force of the elastic body 11, and is moved by the positioning pin 4 and the pilot hole 9. The material to be plated 2 is positioned. At the time of this positioning, the guide rail 7 is provided on the back plate holder 13 with the elastic body 11 interposed therebetween and can move in the direction orthogonal to the plate material passing line, so that the clearance between the positioning pin 4 and the pilot hole 9 is small. The positioning pins 4 enter without causing scratches or burrs. After positioning and sandwiching the material 7 to be plated between the mask rubber 3 of the mask plate 1 and the back rubber 15 of the back plate 14, a plating solution is sprayed onto the sparger 6 (not shown). It is squirted out to the more plating-necessary parts and plated. After plating, the mask plate 1 is retracted with respect to the back plate 14 together with the sparger 6 in order to release the material to be plated 2 from being sandwiched between the mask plate 1 and the back plate 14. Further, the back plate 14 is retreated as required. When the positioning pin 4 starts to fall out of the pilot hole 9 due to the retreat, the guide rail 7 is repelled by the elastic body 11 provided on the guide rail 7.
Pressing or micro-vibrating the mask plate 1 hit by the head, the contact between the mask plate 1 and the mask rubber 3 in contact with the material to be plated 2 is completely released. Also, the back rubber 15 of the back plate 14 is separated from the plated material 2. Therefore, the material to be plated 2 has a low mechanical strength, and does not break. When the positioning pin 4 has retreated from the pilot hole 9, the material to be plated 2 is intermittently conveyed and plated at the next plating location in the same manner as described above. According to the present invention, a guide rail provided with a pilot hole through which a positioning pin provided on a mask plate enters and exits, and a guide plate portion for passing a material to be plated is provided on a back plate. Since the elastic plate is interposed between the mask plate and the back plate during plating, the mask plate and the back plate are advanced toward each other to the plate passing line of the material to be plated, and the positioning pin is inserted into the pilot hole of the guide rail. At the time of positioning, the guide rail retreats in the traveling direction and in the opposite direction against the repulsive force of the elastic body, so that the positioning pin can be positioned without causing scratches or burrs on the guide hole of the material to be plated. Further, when the positioning pin is pulled out from the pilot hole after plating, the mask plate is completely and simultaneously separated from the material to be plated due to the repulsive force of the elastic body provided on the guide rail, so that no buckling or the like occurs. Even if the material to be plated has low mechanical strength, no buckling will occur.
The effect is that plating can be performed with high productivity by the reel system. In the case where the locator is provided on the mask plate together with the positioning pin and the guide rail is provided with a guide hole through which the locator enters and exits, when the plate to be plated is passed through, the rocker moves vertically. Movement is regulated, positioning accuracy,
And workability is improved.
【図面の簡単な説明】
【図１】本発明の１実施例におけるめっき装置の断面
図。
【図２】本発明の１実施例におけるめっき装置の上面
図。
【符号の説明】
１ マスクプレ−ト
２ 被めっき材
３ マスクゴム
４ 位置決めピン
５ ロケ−タ
６ スパ−ジャ
７ ガイドレ−ル
８ 通板ガイド部
９ パイロット孔
１０ ガイド孔
１１ 弾性体
１２ 取付け杆
１３ バックプレ−トホルダ−
１４ バックプレ−ト
１５ バックゴム
１６ 通電電極
１７ めっき装置BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a sectional view of a plating apparatus according to one embodiment of the present invention. FIG. 2 is a top view of a plating apparatus according to one embodiment of the present invention. [Description of Signs] 1 Mask plate 2 Plated material 3 Mask rubber 4 Locating pin 5 Locator 6 Sparger 7 Guide rail 8 Passing plate guide section 9 Pilot hole 10 Guide hole 11 Elastic body 12 Mounting rod 13 Back plate -Plate holder-14 Back plate 15 Back rubber 16 Conductive electrode 17 Plating device
フロントページの続き (56)参考文献 特開 昭58−185793（ＪＰ，Ａ) 特開 昭56−96063（ＪＰ，Ａ) 特開 昭53−83936（ＪＰ，Ａ) 特開 平９−316685（ＪＰ，Ａ) 特開 平６−338580（ＪＰ，Ａ) 特開 平２−107796（ＪＰ，Ａ) 実開 昭53−94913（ＪＰ，Ｕ) 実開 昭53−94912（ＪＰ，Ｕ) (58)調査した分野(Int.Cl.7，ＤＢ名) C25D 5/02 C25D 7/06 C25D 7/12 H01L 23/50 Continuation of the front page (56) References JP-A-58-185793 (JP, A) JP-A-56-96063 (JP, A) JP-A-53-83936 (JP, A) JP-A-9-316685 (JP, A) JP-A-6-338580 (JP, A) JP-A-2-107796 (JP, A) JP-A-53-94913 (JP, U) JP-A-53-94912 (JP, U) (58) Field surveyed (Int.Cl. 7 , DB name) C25D 5/02 C25D 7/06 C25D 7/12 H01L 23/50
Claims (1)
めしてめっきする装置において、 マスクプレートに前記位置決めピンとロケータを設け、 被めっき材の通板ガイド部を設けたガイドレールに前記
位置決めピンとロケータがそれぞれ入出するパイロット
孔とガイド孔を設け、 且つ該ガイドレールをバックプレート部に弾性体を介在
して設けたことを特徴とするめっき装置。(57) [Claim 1] In an apparatus for positioning and plating a material to be plated by a positioning pin, the positioning pin and a locator are provided on a mask plate, and a guide plate for passing the material to be plated is provided. A plating apparatus, wherein a pilot hole and a guide hole through which the positioning pin and the locator enter and exit respectively are provided on a guide rail, and the guide rail is provided on a back plate portion via an elastic body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8036398A JP3451391B2 (en) | 1998-03-11 | 1998-03-11 | Plating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8036398A JP3451391B2 (en) | 1998-03-11 | 1998-03-11 | Plating equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11256392A JPH11256392A (en) | 1999-09-21 |
| JP3451391B2 true JP3451391B2 (en) | 2003-09-29 |
Family
ID=13716187
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8036398A Expired - Fee Related JP3451391B2 (en) | 1998-03-11 | 1998-03-11 | Plating equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3451391B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3553461B2 (en) * | 2000-04-27 | 2004-08-11 | 新光電気工業株式会社 | Partial plating equipment |
| KR101029369B1 (en) | 2009-01-23 | 2011-04-13 | (주) 에스에스피 | Material aligner of automatic apparatus |
| KR102377775B1 (en) * | 2017-11-06 | 2022-03-24 | 주식회사 오럼머티리얼 | Jig for power supplying |
-
1998
- 1998-03-11 JP JP8036398A patent/JP3451391B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH11256392A (en) | 1999-09-21 |
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