JP3288464B2 - Ultrasonic cleaning method for development residue - Google Patents
Ultrasonic cleaning method for development residueInfo
- Publication number
- JP3288464B2 JP3288464B2 JP6644593A JP6644593A JP3288464B2 JP 3288464 B2 JP3288464 B2 JP 3288464B2 JP 6644593 A JP6644593 A JP 6644593A JP 6644593 A JP6644593 A JP 6644593A JP 3288464 B2 JP3288464 B2 JP 3288464B2
- Authority
- JP
- Japan
- Prior art keywords
- residue
- ultrasonic
- image pattern
- liquid
- glass substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Description
【０００１】[0001]
【産業上の利用分野】本発明は、フォトエッチング、パ
ターンエッチング等のフォトファブリケーションにおい
て、ガラス板、金属板等の基板に塗布された感光膜を露
光現像処理する場合に、基板面に現像除去できずに残留
する感光膜等の不必要な残滓を超音波により洗浄除去す
るための現像残滓の超音波洗浄方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for exposing and developing a photosensitive film applied to a substrate such as a glass plate or a metal plate in photofabrication such as photoetching and pattern etching. The present invention relates to an ultrasonic cleaning method for developing residues for cleaning and removing unnecessary residues such as a photosensitive film remaining without being formed by ultrasonic waves.
【０００２】[0002]
【従来の技術】従来、例えばフォトファブリケーション
によるカラーフィルターの着色パターンのパターン形成
として、ガラス基板上にスピンコーティング法（高速回
転スピナーによる回転塗布法）等の回転塗布法、ディピ
ング塗布法（引上げ塗布法）などにより感光性の着色剤
を塗布して乾燥させた後に、該着色剤の乾燥塗布膜に所
定のフィルターパターンを露光して現像処理することに
より、着色パターンを形成することが行われている。2. Description of the Related Art Conventionally, for example, as a pattern formation of a color pattern of a color filter by photofabrication, a spin coating method such as a spin coating method (a spin coating method using a high-speed spinner) or a dipping coating method (pull coating) on a glass substrate. After a photosensitive colorant is applied and dried by a method, for example, a predetermined filter pattern is exposed to a dry applied film of the colorant and developed to form a colored pattern. I have.
【０００３】[0003]
【発明が解決しようとする課題】上記ガラス基板上に回
転塗布法やディッピング塗布法によって感光性着色剤を
塗布した場合には、そのガラス基板と感光性着色剤（カ
ラーフォトレジスト液）の液体表面張力等の関係から特
にガラス基板の端縁部における着色剤の膜厚が厚くなる
傾向がある。When a photosensitive colorant is applied to the above glass substrate by a spin coating method or a dipping application method, the liquid surface of the glass substrate and the photosensitive colorant (color photoresist liquid) is applied. From the relation of tension and the like, the thickness of the colorant particularly at the edge of the glass substrate tends to increase.
【０００４】これを適宜パターン露光した後に、現像液
にて現像処理（水洗処理を含む）すると、図３に示すよ
うに、ガラス基板１面には、必要とする画像パターン４
の他に、ガラス基板１の周辺端部２に膜厚の厚い着色剤
が現像除去しきれずに残滓３として残留する場合があ
る。[0004] After this is appropriately exposed to a pattern, and then subjected to a developing process (including a water washing process) with a developing solution, as shown in FIG.
In addition, a thick colorant may remain on the peripheral edge 2 of the glass substrate 1 as a residue 3 without being developed and removed completely.
【０００５】そのため従来は手作業によって、その残滓
を研磨シートあるいは剃刀やカッターナイフで削り取っ
たり、小型ドリル等の回転研磨用工具を用いて研磨によ
って除去するのが実情であるが、残滓が完全には除去し
きれなかったり、その削り滓が粉体となって飛散した
り、基板側に再度付着するなどの不都合があった。Conventionally, however, the residue is manually removed with a polishing sheet, a razor or a cutter knife, or removed by polishing using a rotary polishing tool such as a small drill. However, the residue is completely removed. However, there were inconveniences such as that it could not be completely removed, that the shavings were scattered as powder, and that they adhered again to the substrate side.
【０００６】本発明は、ガラス板や金属板等の基板面に
塗布された感光材の現像処理等において、処理後に基板
面に残留する残滓を、残滓残りなく容易に除去すること
にある。An object of the present invention is to remove residues remaining on a substrate surface after processing in a developing process or the like of a photosensitive material applied to a substrate surface such as a glass plate or a metal plate without any residue.
【０００７】[0007]
【課題を解決するための手段】本発明は、感光膜を現像
処理して必要とする画像パターンを形成したガラス基板
等の基板端部に現像除去できずに残留する感光膜等の残
滓付着個所に、水、若しくは適宜溶媒を用いた仲介液を
介して超音波発振ホーン先端部を接近させ、必要とする
画像パターン以外の現像除去できずに残留付着する前記
残滓を超音波振動により除去することを特徴とする現像
残滓の超音波洗浄方法である。また本発明は、上記現像
残滓の超音波洗浄方法であって、必要とする前記画像パ
ターンが仲介液によって浸漬されず、前記残滓のみが仲
介液に浸漬するように仲介液供給領域を設定して、水、
若しくは適宜溶媒を用いた仲介液を介して超音波発振ホ
ーン先端部を接近させ、必要とする画像パターン以外の
現像除去できずに残留付着する前記残滓を超音波振動に
より除去することを特徴とする現像残滓の超音波洗浄方
法である。 According to the present invention, a photosensitive film is developed.
Glass substrate processed to form the required image pattern
Residue of photosensitive film etc. that cannot be removed by development at the edge of the substrate
At the place where the slag adheres, apply water or an intermediary liquid using a suitable solvent.
Through the ultrasonic oscillation horn tip through the need
The above-mentioned residual adhesion which cannot be removed by development except for the image pattern
An ultrasonic cleaning method for developing residues, wherein the residues are removed by ultrasonic vibration . The present invention also relates to the development
An ultrasonic cleaning method for the residue, comprising the steps of:
The turn is not immersed in the intermediary liquid and only the residue
Set the intermediary liquid supply area so that it is immersed in
Alternatively, an ultrasonic oscillation filter may be provided through an intermediary liquid using a suitable solvent.
Close the tip of the image pattern.
The residue that remains without being developed and removed is converted to ultrasonic vibration
Ultrasonic cleaning of development residue characterized by more removal
Is the law.
【０００８】[0008]
【実施例】本発明の現像残滓の超音波洗浄方法を、以下
に詳細に説明すれば、図１（ａ）は、本発明方法の一実
施例を説明する側面図である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The ultrasonic cleaning method of the development residue of the present invention will be described in detail below. FIG. 1A is a side view illustrating an embodiment of the method of the present invention.
【０００９】適宜現像処理後のガラス基板１の上面に
は、必要とする所定の画像パターン４が形成されてお
り、その基板１の端部２等には、現像処理によって現像
除去しきれなかった残滓３が付着している。A required predetermined image pattern 4 is formed on the upper surface of the glass substrate 1 which has been appropriately developed, and the end 2 and the like of the substrate 1 cannot be completely removed by the developing process. Residue 3 is attached.
【００１０】この残滓３の発生している個所、例えば、
図１（ａ）においてはガラス基板１の端部２，２におけ
る残滓３発生個所に、まず、液供給ノズル等の液供給手
段Ｂより、水若しくは適宜無機溶媒、又は、有機溶媒等
の仲介液２１を供給して、残滓３を仲介液２１によって
浸漬する。Where the residue 3 is generated, for example,
In FIG. 1A, first, at a position where the residue 3 is generated at the end portions 2 and 2 of the glass substrate 1, a liquid supply means B such as a liquid supply nozzle or the like is used to supply water or an appropriate inorganic solvent or an organic solvent. 21 is supplied, and the residue 3 is immersed in the intermediary liquid 21.
【００１１】続いて、仲介液２１の供給されている間
に、ガラス基板１の前記端部２の近傍に超音波発振手段
Ａを用いてその超音波発振ホーン１２を接近させ、その
先端部にある超音波を発振する超音波発振ホーン先端部
１１を、前記端部２の残滓３を浸漬している仲介液２１
内に差し入れて、残滓３の真上相当部に、例えば、０．
３ｍｍ〜２．０ｍｍ程度（あるいは仲介液２１の液面よ
り超音波発振ホーン先端部１１が離脱しない程度）の間
隔（ギャップ）をあけて位置決め設定する。なお超音波
発振ホーン先端部１１は、なるべく画像パターン４に対
して十分距離をおいて位置決め設定する。Subsequently, while the intermediary liquid 21 is being supplied, the ultrasonic oscillation horn 12 is brought close to the end portion 2 of the glass substrate 1 using the ultrasonic oscillation means A, and An ultrasonic oscillation horn tip 11 for oscillating a certain ultrasonic wave is connected to the intermediate liquid 21 in which the residue 3 at the end 2 is immersed.
, And in a portion corresponding to the position directly above the residue 3, for example,
Positioning is set at an interval (gap) of about 3 mm to 2.0 mm (or such an extent that the ultrasonic oscillation horn tip 11 does not separate from the liquid surface of the intermediary liquid 21). The ultrasonic oscillation horn tip 11 is positioned and set at a sufficient distance from the image pattern 4 as much as possible.
【００１２】なお、本発明方法に使用する超音波発振手
段Ａは、図１（ａ）に示すように、超音波発振ホーン１
２と、該超音波発振ホーン１２の発振出力を増幅調整す
る発振ブースター１３と、発振用の電気信号を音波に変
換するコンバータ１４と、該コンバータ１４に発振用の
電気信号を出力する発振回路部１５とを備えた公知の発
振手段を用いて行なうことができる。The ultrasonic oscillation means A used in the method of the present invention comprises an ultrasonic oscillation horn 1 as shown in FIG.
2, an oscillation booster 13 for amplifying and adjusting the oscillation output of the ultrasonic oscillation horn 12, a converter 14 for converting an electric signal for oscillation into a sound wave, and an oscillation circuit section for outputting an electric signal for oscillation to the converter 14. 15 can be performed by using a known oscillating means provided with.
【００１３】続いて、差し入れられた上記超音波発振ホ
ーン先端部１１より超音波振動ｓを発振させ、発振する
超音波振動ｓは、該仲介液２１を介して端部２の残滓３
に伝達され、固形状態の該残滓３を超音波振動させて、
その振動ｓにより残滓３をガラス基板１面より剥離さ
せ、又は、微粒子状態に粉砕して破壊し、ガラス基板１
より遊離させて、ガラス基板１を洗浄除去する。なお、
発振所要時間は３秒〜１０秒程度が適当であるがこれに
限定されるものではない。Subsequently, the ultrasonic vibration s is oscillated from the inserted ultrasonic oscillation horn tip 11, and the oscillating ultrasonic vibration s is transmitted through the intermediary liquid 21 to the residue 3 at the end 2.
And ultrasonically vibrates the residue 3 in a solid state,
Due to the vibration s, the residue 3 is peeled off from the surface of the glass substrate 1 or is crushed into fine particles and broken, and the glass substrate 1
Then, the glass substrate 1 is washed away. In addition,
The time required for oscillation is suitably about 3 to 10 seconds, but is not limited thereto.
【００１４】下記に、本発明方法の一実施例における超
音波振動手段Ａの残滓洗浄除去における設定条件を記
す。 条件； 発振ブースター出力 １：１ 又は１：２ 超音波発振ホーン出力音波周波数 ２０ｋＨｚ，４０ｋＨｚ ギャップ ０．５〜１．５ｍｍ 発振所要時間 ５秒The following is a description of the set conditions for cleaning and removing the residue of the ultrasonic vibrating means A in one embodiment of the method of the present invention. Conditions: Oscillation booster output 1: 1 or 1: 2 Ultrasonic oscillation horn output Sound frequency 20 kHz, 40 kHz Gap 0.5-1.5 mm Oscillation time 5 seconds
【００１５】ガラス基板１より遊離した残滓３は、仲介
液２１中に分散あるいは溶解し、仲介液２１とともに洗
浄廃液として適宜排出される。The residue 3 released from the glass substrate 1 is dispersed or dissolved in the intermediary liquid 21 and is discharged together with the intermediary liquid 21 as a washing waste liquid.
【００１６】なお、超音波発振ホーン先端部１１は画像
パターン４部分より離間する位置に設定してあるため、
画像パターン４部分は超音波の振動ｓの影響は受けず剥
離は生じない。図１（ｂ）は、端部２に残留していた残
滓３を洗浄除去した後のガラス基板１の側断面である。Since the ultrasonic oscillation horn tip 11 is set at a position apart from the image pattern 4 portion,
The image pattern 4 is not affected by the ultrasonic vibration s, and does not peel off. FIG. 1B is a side sectional view of the glass substrate 1 after the residue 3 remaining on the end 2 has been removed by washing.
【００１７】本発明方法においては、必要とする画像パ
ターン４が超音波発振ホーン先端部１１の振動ｓの影響
を受けないように、仲介液２１の浸漬領域を制御するこ
とが必要であるが、その浸漬領域は、できるかぎり画像
パターン４に掛からないように設定して供給することが
のぞましい。In the method of the present invention, it is necessary to control the immersion area of the intermediary liquid 21 so that the required image pattern 4 is not affected by the vibration s of the ultrasonic oscillation horn tip 11. It is preferable that the immersion area is set and supplied so as not to overlap the image pattern 4 as much as possible.
【００１８】また、本発明方法に使用する仲介液２１
は、水溶媒若しくはアルカリ性溶媒、酸性溶媒等の水性
無機溶媒、又は水性、油性の有機溶媒等が使用でき、残
滓３を溶解可能な溶媒であることが適当である。Further, the intermediary liquid 21 used in the method of the present invention
As the solvent, an aqueous inorganic solvent such as an aqueous solvent or an alkaline solvent or an acidic solvent, or an aqueous or oily organic solvent or the like can be used, and a solvent that can dissolve the residue 3 is suitable.
【００１９】図２（ａ）は、本発明方法における液供給
手段Ｂによる仲介液２１の供給領域設定の一実施例を示
すもので、矩形状のガラス基板１の一辺の端部２に付着
する残滓３のみが仲介液２１によって浸漬するように、
水平面（Ｘ−Ｙ面）に対して、矩形状のガラス基板１の
角隅部１ａを他の角隅部より低く傾斜（Ｘ方向に対する
傾斜角度θx ，Ｙ方向に対するθy ）するように配置
し、該ガラス基板１の他の角隅部１ｂの上側に液供給手
段Ｂを設定し、該角隅部１ｂから角隅部１ａに向かって
仲介液２１を流下させて、画像パターン４が仲介液２１
によって浸漬されないようにして液供給領域を設定した
場合を示すものである。FIG. 2A shows an embodiment of setting the supply area of the intermediary liquid 21 by the liquid supply means B in the method of the present invention, which adheres to the end 2 of one side of the rectangular glass substrate 1. As only the residue 3 is immersed in the intermediary liquid 21,
With respect to the horizontal plane (XY plane), the corner 1a of the rectangular glass substrate 1 is arranged to be inclined lower than the other corners (the inclination angle θ x in the X direction and θ y in the Y direction). Then, the liquid supply means B is set above the other corner 1b of the glass substrate 1, and the intermediary liquid 21 flows down from the corner 1b toward the corner 1a, so that the image pattern 4 is interposed. Liquid 21
3 shows a case where the liquid supply region is set so as not to be immersed.
【００２０】図２（ｂ）は、水平面（Ｘ−Ｙ面）に対し
て、矩形状のガラス基板１の一辺の端部２に付着する残
滓３のみが仲介液２１によって浸漬するように、そのガ
ラス基板１の一辺を挟む両角隅部１ａ，１ｂを平行に設
定し、その他の角隅部より低く傾斜するようにガラス基
板１を配置し、両角隅部１ａ，１ｂが挟む一辺に仲介液
２１を流下させるようにしたものである。FIG. 2 (b) shows that only the residue 3 adhered to one end 2 of one side of the rectangular glass substrate 1 is immersed in the horizontal plane (XY plane) by the intermediary liquid 21. The two corners 1a, 1b sandwiching one side of the glass substrate 1 are set in parallel, the glass substrate 1 is arranged so as to be inclined lower than the other corners, and the intermediary liquid 21 is placed on one side sandwiched by the two corners 1a, 1b. Is made to flow down.
【００２１】なお本発明方法における仲介液２１の供給
は、上記のような液供給ノズル等による送流供給方式に
よる供給の他に、洗浄槽方式を採用することは可能であ
り、槽内に貯溜若しくは循環供給される仲介液２１内
に、ガラス基板１の端部２に付着する残滓３部分を浸漬
した後、超音波発振ホーン先端部１１を該仲介液２１内
に差し入れて洗浄除去するようにしてもよい。The supply of the intermediary liquid 21 in the method of the present invention can be carried out by a cleaning tank system in addition to the above-described supply system using a liquid supply nozzle or the like. Alternatively, after the residue 3 attached to the end 2 of the glass substrate 1 is immersed in the circulating-supplied intermediary liquid 21, the ultrasonic oscillation horn tip 11 is inserted into the intermediary liquid 21 for cleaning and removal. You may.
【００２２】次に、本発明の他の実施例を説明すれば、
図３（ａ）、超音波発振手段Ａの超音波発振ホーン１２
の振動するホーン先端部１１の側面１１ａに、図３
（ｂ）、ガラス基板１の端部２の側面部に付着する残滓
３を仲介液２１を介して当てがい、接触させることによ
って、ガラス基板１側面部に付着する残滓３を除去する
ものである。なお、ガラス基板１の端部２側面部に付着
する残滓３は、図３（ａ）に示すように、ホーン先端部
１１の側面１１ａの領域１１ｂに接触させる。Next, another embodiment of the present invention will be described.
FIG. 3A, the ultrasonic oscillation horn 12 of the ultrasonic oscillation means A.
FIG. 3 shows the side surface 11a of the horn tip 11 that vibrates.
(B) The residue 3 adhering to the side surface of the end portion 2 of the glass substrate 1 is applied through the intermediary liquid 21 and brought into contact with the residue 3 to remove the residue 3 adhering to the side surface of the glass substrate 1. . The residue 3 attached to the side surface of the end 2 of the glass substrate 1 is brought into contact with a region 11b of the side surface 11a of the horn tip 11, as shown in FIG.
【００２３】[0023]
【作用】本発明の現像残滓の超音波洗浄方法は、基板１
における残滓３の付着する個所のみに、水若しくは適宜
溶媒を用いた仲介液２１を介して超音波発振ホーン先端
部１１を接近させて洗浄除去するようにしたので、現像
除去しきれずに付着する固体状の残滓３部分のみが洗浄
除去されて、基板１の必要とする画像パターン４は超音
波振動によって破損することがなく、洗浄除去残りなく
正確に短時間で能率的に洗浄できる。According to the present invention, there is provided a method for ultrasonically cleaning development residues, comprising the steps of:
The ultrasonic oscillation horn tip portion 11 is washed and removed only through the intermediary liquid 21 using water or an appropriate solvent only in the portion where the residue 3 adheres in the above, so that the solid adhered without being completely removed by development. Only the three residue-like residues are cleaned and removed, and the image pattern 4 required for the substrate 1 is not damaged by the ultrasonic vibration, and the cleaning can be accurately and efficiently performed in a short time without any cleaning removal.
【００２４】また、本発明方法における除去された残滓
は仲介液中に取り込まれるので、従来のように粉体とな
って飛散したり、基板側に再度付着することがない。Further, the residue removed in the method of the present invention is taken into the intermediary liquid, so that it does not become a powder and scatter or adhere to the substrate side as in the prior art.
【００２５】[0025]
【発明の効果】本発明の現像残滓の超音波洗浄方法は、
ガラス、金属、プラスチック等の基板面に塗布された感
光材の現像処理後において、基板面に残留する現像残滓
を残滓残りなく、短時間で能率的に洗浄除去できる効果
がある。According to the ultrasonic cleaning method of the development residue of the present invention,
After the development processing of the photosensitive material applied to the substrate surface such as glass, metal or plastic, there is an effect that the development residue remaining on the substrate surface can be efficiently cleaned and removed in a short time without leaving any residue.
【図１】（ａ）は、本発明の現像残滓の超音波洗浄方法
を説明する概要斜視図であり、（ｂ）は、洗浄後の基板
の側面図である。FIG. 1A is a schematic perspective view illustrating an ultrasonic cleaning method of a development residue of the present invention, and FIG. 1B is a side view of a substrate after cleaning.
【図２】（ａ）は、本発明の現像残滓の超音波洗浄方法
の一実施例を説明する概要斜視図であり、（ｂ）は、他
の実施例を説明する概要斜視図である。FIG. 2A is a schematic perspective view illustrating one embodiment of the ultrasonic cleaning method of the development residue of the present invention, and FIG. 2B is a schematic perspective view illustrating another embodiment.
【図３】（ａ）は、本発明の現像残滓の超音波洗浄方法
のその他の実施例を説明する概要斜視図であり、（ｂ）
は、概要側面図である。FIG. 3A is a schematic perspective view illustrating another embodiment of the ultrasonic cleaning method of the development residue of the present invention, and FIG.
Is a schematic side view.
【図４】現像処理後において現像残滓の付着する一般的
なガラス基板の平面図である。FIG. 4 is a plan view of a general glass substrate to which development residues adhere after development processing.
Ａ…超音波発振手段 Ｂ…仲介液供給手段 ｓ…超音波
振動 １…基板 １ａ，１ｂ…角隅部 ２…端部 ３…残滓
４…画像パターン １１…超音波発振ホーン先端部 １１ａ…側面 １１ｂ
…当接領域 １２…超音波発振ホーン １３…発振ブースター １４
…コンバータ １５…発振回路部 ２１…仲介液A: Ultrasonic oscillation means B: Intermediate liquid supply means s: Ultrasonic vibration 1: Substrates 1a, 1b: Corners 2: Ends 3: Residue
4 ... Image pattern 11 ... Ultrasonic oscillation horn tip 11a ... Side 11b
... Abutment area 12 ... Ultrasonic oscillation horn 13 ... Oscillation booster 14
... Converter 15 ... Oscillation circuit 21 ... Intermediate liquid
───────────────────────────────────────────────────── フロントページの続き 審査官 遠藤 謙一 (56)参考文献 特開 昭54−56255（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) B08B 3/12 G03F 7/40 521 ────────────────────────────────────────────────── ─── Continuation of the front page Examiner Kenichi Endo (56) References JP-A-54-56255 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) B08B 3/12 G03F 7 / 40 521
Claims (2)
ーンを形成したガラス基板等の基板端部に現像除去でき
ずに残留する感光膜等の残滓付着個所に、水、若しくは
適宜溶媒を用いた仲介液を介して超音波発振ホーン先端
部を接近させ、必要とする画像パターン以外の現像除去
できずに残留付着する前記残滓を超音波振動により除去
することを特徴とする現像残滓の超音波洗浄方法。 An image pattern required by developing a photosensitive film.
Can be developed and removed at the edge of the substrate such as a glass substrate
Water or other residue on the photosensitive film,
Ultrasonic oscillation horn tip through intermediary liquid using appropriate solvent
Close the area and remove development other than the required image pattern
Remove the residue that cannot be adhered by ultrasonic vibration
Ultrasonic cleaning method of developing residues, characterized by.
であって、必要とする前記画像パターンが仲介液によっ
て浸漬されず、前記残滓のみが仲介液に浸漬するように
仲介液供給領域を設定して、水、若しくは適宜溶媒を用
いた仲介液を介して超音波発振ホーン先端部を接近さ
せ、必要とする画像パターン以外の現像除去できずに残
留付着する前記残滓を超音波振動により除去することを
特徴とする現像残滓の超音波洗浄方法。 2. An ultrasonic cleaning method for developing residues according to claim 1.
Wherein the required image pattern is
So that only the residue is immersed in the intermediary liquid.
Set the intermediary liquid supply area and use water or an appropriate solvent.
Approach the tip of the ultrasonic horn through the intervening liquid
Of the image pattern other than the required image pattern
Removing the residue adhering by ultrasonic vibration.
Ultrasonic cleaning method for development residue.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6644593A JP3288464B2 (en) | 1993-03-25 | 1993-03-25 | Ultrasonic cleaning method for development residue |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6644593A JP3288464B2 (en) | 1993-03-25 | 1993-03-25 | Ultrasonic cleaning method for development residue |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0910714A JPH0910714A (en) | 1997-01-14 |
| JP3288464B2 true JP3288464B2 (en) | 2002-06-04 |
Family
ID=13315985
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6644593A Expired - Fee Related JP3288464B2 (en) | 1993-03-25 | 1993-03-25 | Ultrasonic cleaning method for development residue |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3288464B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20200393754A1 (en) * | 2019-06-17 | 2020-12-17 | Asahi Kasei Kabushiki Kaisha | Method for producing multi-layered type microchannel device using photosenitive resin laminate |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19859023B4 (en) * | 1998-12-21 | 2005-12-15 | Robert Bosch Gmbh | Method and device for separating layers and components |
| US7287537B2 (en) * | 2002-01-29 | 2007-10-30 | Akrion Technologies, Inc. | Megasonic probe energy director |
| JP4939950B2 (en) * | 2006-01-16 | 2012-05-30 | セイコーインスツル株式会社 | Manufacturing method of near-field light generating element |
-
1993
- 1993-03-25 JP JP6644593A patent/JP3288464B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20200393754A1 (en) * | 2019-06-17 | 2020-12-17 | Asahi Kasei Kabushiki Kaisha | Method for producing multi-layered type microchannel device using photosenitive resin laminate |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0910714A (en) | 1997-01-14 |
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