JP3103676B2 - Vacuum evaporation method - Google Patents
Vacuum evaporation methodInfo
- Publication number
- JP3103676B2 JP3103676B2 JP04194526A JP19452692A JP3103676B2 JP 3103676 B2 JP3103676 B2 JP 3103676B2 JP 04194526 A JP04194526 A JP 04194526A JP 19452692 A JP19452692 A JP 19452692A JP 3103676 B2 JP3103676 B2 JP 3103676B2
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- metal
- mask
- shutter
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION
【０００１】[0001]
【産業上の利用分野】本発明は金属の蒸着方法に関し、
特にＣｏまたはＣｏ合金の蒸着方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for depositing a metal.
In particular, it relates to a method for depositing Co or a Co alloy.
【０００２】[0002]
【従来の技術】真空室内において、電子銃から電子ビー
ムを発生させ、これをレンズにより絞ってスポットと
し、るつぼ内に収容された蒸発すべき金属に衝突させて
これを溶解させ、溶解した高温度金属から金属蒸気を蒸
発させて基体に蒸着させる方法が行われている。このよ
うな技術は特公平３−４１８９７号、特公平３−３８３
４０号、特開昭５９−１７８６２６、特開平３−１２６
８２３号等に記載されている。BACKGROUND OF THE INVENTION vacuum chamber to generate an electron beam from an electron gun, which squeezed the lens and the spot, by colliding the metal to be evaporated contained in a crucible
This is dissolved, the metal vapor evaporated from lysed high temperature metal process for depositing to the substrate is performed. Such technology is disclosed in Japanese Patent Publication No. Hei 3-41897 and Japanese Patent Publication No. Hei 3-383.
No. 40, JP-A-59-178626, JP-A-3-126
823, etc.
【０００３】このような電子銃を使用する真空蒸着装置
では、電子銃から出た高エネルギー電子ビームをるつぼ
に向けて直進させる。るつぼは通常基体の幅方向に細長
く延びた長方形をしており、電子ビームはるつぼの金属
表面をほぼ均一に加熱する目的で偏向磁界または電界の
作用下にるつぼの長さ方向に走査される。例えば、斜め
配向型の蒸着金属磁気記録媒体を製造する場合には、Ｃ
ｏまたはＣｏ合金金属を数十ｃｍの長さの高純度マグネ
シア（ＭｇＯ）製のるつぼ（ボート）に収容し、電子銃
から最大３０ｋＶ程度の加速電圧で電子ビームをるつぼ
に向けて直進させて金属に衝突させる。その際に、電子
ビームをるつぼの長さ方向に（場合により更に幅方向に
も）走査させて金属を均一に加熱する。In a vacuum deposition apparatus using such an electron gun, a high-energy electron beam emitted from the electron gun travels straight toward a crucible. The crucible is usually a rectangular shape elongated in the width direction of the substrate, and the electron beam is scanned along the length of the crucible under the action of a deflecting magnetic field or electric field in order to heat the metal surface of the crucible almost uniformly. For example, when manufacturing an obliquely oriented vapor-deposited metal magnetic recording medium, C
The o or Co alloy metal is accommodated in a crucible (boat) made of high-purity magnesia (MgO) having a length of several tens of cm, and the electron beam is directed straight from the electron gun toward the crucible at an acceleration voltage of about 30 kV at the maximum. Collision. At this time, the metal is uniformly heated by scanning the electron beam in the length direction of the crucible (and in some cases also in the width direction).
【０００４】このような従来の蒸着方法では、蒸着金属
の基体への十分な接着強度が確保できず、十分な耐久性
のある蒸着膜を提供できない。その原因は、電子ビーム
の電力を約１２０〜１５０ｋＷ（３０ｋＶで４〜５Ａ程
度）以上にすると、溶融金属表面から金属蒸気と共に飛
び出す電子と電子銃からの電子が互いに反発して電子の
収束ができず、実効電力を約１００ｋＷ以上には出来
ず、蒸気速度を十分に向上させることができなかったか
らである。なおここに実効電力とは蒸発速度が電子銃の
電力に依存して変化する範囲の電力である（例えば、１
００〜１５０ｋＷ加えても蒸発速度が変化しない場合、
最大実効電力は１００ｋＷである）。[0004] In such a conventional vapor deposition method, a sufficient adhesion strength of the vapor deposition metal to the substrate cannot be secured, and a vapor deposition film having sufficient durability cannot be provided. The cause is that when the power of the electron beam is about 120 to 150 kW (about 4 to 5 A at 30 kV), the electrons that fly out together with the metal vapor from the surface of the molten metal and the electrons from the electron gun repel each other and converge. This is because the effective power could not be increased to about 100 kW or more, and the steam speed could not be sufficiently improved. Here, the effective power is a power in a range where the evaporation rate changes depending on the power of the electron gun (for example, 1
When the evaporation rate does not change even when 00 to 150 kW is added,
The maximum effective power is 100 kW).
【０００５】この問題は、蒸発すべき金属を収容する細
長いるつぼ、及び前記るつぼ内に指向する電子ビームを
発生させるための電子銃を具備した真空蒸着装置を使用
した蒸着方法において、前記電子銃を１５０〜３００ｋ
Ｗ（実効電力１２０〜２４０ｋＷ）で駆動し、前記電子
銃が放出する電子ビームの軸線を前記長方形るつぼの中
心と前記開口の中心を結ぶ軸線とをほぼ直角に交差して
配置し、前記電子ビームを磁界によりほぼ直角に偏向し
て前記るつぼ内に結像させることにより解決できる。[0005] This problem arises in a vapor deposition method using an elongate crucible containing a metal to be evaporated and an electron gun for generating an electron beam directed into the crucible. 150-300k
W (effective power: 120 to 240 kW), the electron beam emitted by the electron gun is arranged so that the axis of the electron beam emitted from the electron gun crosses the axis connecting the center of the rectangular crucible and the center of the opening substantially at right angles. Can be solved by deflecting the light at a substantially right angle by a magnetic field to form an image in the crucible.
【０００６】このような装置は、より具体的には、蒸発
すべき金属を収容する細長いるつぼ、前記るつぼ内に指
向する電子ビームを発生させるための電子銃、前記るつ
ぼに対向して設けられた回転ドラム、前記回転ドラムの
面に沿ってプラスチック基体を送るための供給及び巻取
り手段、前記回転ドラムの面に沿って設けられ一部が前
記るつぼに対向した開口を有するマスク、及び前記マス
クを開閉するためのシャッタ部材よりなる真空蒸着装置
において実現できる。このような蒸着装置は、例えばＣ
ｏまたはＣｏ合金をポリエステル（ＰＥＴ等）に斜め蒸
着して斜めの異方性を有する磁気記録媒体を製造するの
に使用できる。More specifically, such an apparatus is provided with an elongated crucible containing a metal to be evaporated, an electron gun for generating an electron beam directed into the crucible, and provided opposite the crucible. A rotating drum, supply and winding means for feeding a plastic substrate along the surface of the rotating drum, a mask provided along the surface of the rotating drum and having an opening partially facing the crucible, and the mask This can be realized in a vacuum deposition apparatus including a shutter member for opening and closing. Such a deposition apparatus is, for example, C
An o or Co alloy can be used for producing a magnetic recording medium having oblique anisotropy by obliquely depositing it on polyester (PET or the like).
【０００７】[0007]
【発明が解決しようとする課題】しかし、電子銃を大電
力化すると、シャッタまたはマスクのうちの前記るつぼ
側にある部材に付着した蒸着金属は液滴となって滴り落
ち、るつぼの外部の各種部材、例えば搬送系等に付着し
て蒸着作業の続行を不可能にする。また、シャッタまた
はマスクのうちの前記るつぼ側にある部材に付着した蒸
着金属の液滴のたれ落ち箇所はランダムに生じる。した
がって、垂れ落ちをまったく生じさせないか、より好ま
しくは垂れ落ち箇所を一部に局限して、垂れ落ちた液滴
がるつぼに帰還するようにすることが望ましい。However, when the power of the electron gun is increased, the deposited metal adhered to the member on the crucible side of the shutter or the mask is dripped as droplets, and various kinds of components outside the crucible are exposed. It adheres to a member, for example, a transport system, and makes it impossible to continue the vapor deposition operation. In addition, the places where the droplets of the vapor-deposited metal adhere to the members on the crucible side of the shutter or the mask are randomly generated. Therefore, it is desirable that no drooling occurs, or more preferably, that the dripping point be partially localized so that the dripping droplets return to the crucible.
【０００８】[0008]
【課題を解決するための手段】本発明は、真空容器内に
配置された細長いるつぼに蒸着すべき金属を収容し、前
記金属に実効電力１２０〜２４０ｋＷで駆動される電子
銃から指向される電子ビームを衝突させて前記金属を蒸
発させ、前記るつぼに対向して設けられた回転ドラムの
面に沿って送られるプラスチック基体に、前記るつぼに
対向した開口を有するマスクを通して前記蒸発させた金
属を蒸着する蒸着方法において、前記マスクを開閉する
ためのシャッタが、前記マスクの前記開口の前記るつぼ
側又は前記回転ドラム側に設けられ、前記シャッタ及び
マスクのうちるつぼ側にあるものを０℃以下の冷媒で冷
却した状態で前記蒸着を実行することを特徴とする。こ
のようにすれば、シャッタ等に付着する蒸着金属は冷却
されて垂れ落ちを生じない高粘度になる。SUMMARY OF THE INVENTION The present invention provides a vacuum vessel
Place the metal to be deposited in the elongated crucible placed
Electrons driven by an effective power of 120 to 240 kW on the metal
The metal is steamed by colliding an electron beam directed from a gun.
Of the rotating drum provided opposite to the crucible.
The plastic substrate sent along the surface, the crucible
The evaporated gold through a mask having opposed openings
Opening and closing the mask in a deposition method for depositing a metal
Shutter for the crucible in the opening of the mask
The vapor deposition is performed in a state where the shutter and the mask, which are provided on the rotating drum side and which are on the crucible side, are cooled by a refrigerant of 0 ° C. or less. In this case, the deposited metal adhering to the shutter or the like is cooled and has a high viscosity that does not cause dripping.
【０００９】シャッター等に付着した金属をるつぼに還
流させ得るならば、効率が上がるからより好ましい。こ
れを達成するには、るつぼの上方に相当する部分の冷却
を緩め、その他の部分を０℃以下の冷媒で冷却すれば良
い。It is more preferable that the metal adhered to the shutter or the like can be returned to the crucible because the efficiency is increased. In order to achieve this, the cooling of the portion corresponding to the upper part of the crucible may be slowed down, and the other portions may be cooled with a refrigerant of 0 ° C. or less.
【００１０】このようなシャッタ等の冷却は、シャッタ
等の内部または裏面に蛇行する冷媒通路を設けて冷媒を
流すことにより行うことができる。The cooling of the shutter or the like can be performed by providing a meandering coolant passage inside or on the back surface of the shutter or the like and allowing the coolant to flow.
【００１１】[0011]
【実施例】以下図面を参照して本発明の実施例を詳しく
説明する。図１は本発明の蒸着装置１を示す。ただし図
示の部分は図示しない真空チャンバーに収容されてお
り、所定の排気装置を有するものとする。３は矢印の方
向（またはその逆方向）に回転する回転ドラムで、蒸着
基体を構成するポリエステル等の基体フィルム５がその
周りにかけて通され、繰り出しロール９から回転ドラム
３の周面を通って巻き取りロール７に巻き取られる。回
転ドラム３に近接して一部が開口したマスク１１が設け
てあり、蒸着金属が所定の角度以外ではフィルム５に蒸
着しないようにしている。マスク１１の外面（または内
面）に沿ってシャッタ１３が設けてあり、蒸着の初期及
び終期に矢印の方向にスライドしてマスク１１の開口を
遮蔽することにより不要な蒸着を防止する。マスク１１
の開口の寸法は回転ドラム３の軸線方向にはフィルム５
上に所定の蒸着幅が得られるように、また回転ドラムの
周方向にはフィルム上に所定の蒸着角度θが得られるよ
うに選択する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below in detail with reference to the drawings. FIG. 1 shows a vapor deposition apparatus 1 of the present invention. However, the illustrated portion is housed in a vacuum chamber (not shown) and has a predetermined exhaust device. 3 is a rotating drum that rotates in the direction of the arrow (or vice versa), the base film 5 such as polyester constituting the deposition substrate is passed over around it, through a peripheral surface of the rotating drum 3 from the feed roll 9 It is taken up by a take-up roll 7. A mask 11 partially open is provided in the vicinity of the rotating drum 3 so that the deposited metal is not deposited on the film 5 except at a predetermined angle. A shutter 13 is provided along the outer surface (or inner surface) of the mask 11, and slides in the directions of arrows at the beginning and end of the vapor deposition to shield the opening of the mask 11, thereby preventing unnecessary vapor deposition. Mask 11
The opening dimension of the film 5 is in the axial direction of the rotating drum 3.
It is selected so that a predetermined vapor deposition width can be obtained above, and a predetermined vapor deposition angle θ can be obtained on the film in the circumferential direction of the rotating drum.
【００１２】マスク１１の開口に対向して高純度マグネ
シア（ＭｇＯ）製等のるつぼ１５が配置され、その内部
に蒸着すべき原料金属１７が装入されている。るつぼ１
５は必要な蒸着幅を得るのに十分なだけ回転ドラム３の
軸線方向に細長く伸びている。るつぼ１５は所定の蒸着
角度θ（マスクの開口内の位置により若干変動する）が
得られるように配置される。るつぼ１５に装入した原料
金属１７は電子銃１９から放出される電子ビーム２１に
より加熱される。電子銃１９の電子ビーム２１の放出は
るつぼ１５とマスク１１の開口を結ぶ線に対してほぼ９
０度をなす方向に行う。この電子ビームは図示しない適
当なコンデンサレンズ、収束レンズ、及び偏向コイルに
よる磁界２３の作用により約９０度曲げられると同時に
小スポット状に収束されて原料金属１７に衝突する。実
験によると、図１の鎖線位置に配置された従来の直進型
電子銃１９’に比較して、大幅な電力増大が達成できる
ことが分かった。A crucible 15 made of high-purity magnesia (MgO) or the like is arranged opposite to the opening of the mask 11, and a raw material metal 17 to be vapor-deposited therein is charged therein. Crucible 1
Numeral 5 extends in the axial direction of the rotating drum 3 elongate enough to obtain a required vapor deposition width. The crucible 15 is arranged such that a predetermined vapor deposition angle θ (which slightly varies depending on the position in the opening of the mask) is obtained. The raw metal 17 charged in the crucible 15 is heated by an electron beam 21 emitted from an electron gun 19. The emission of the electron beam 21 of the electron gun 19 is approximately 9 lines with respect to the line connecting the crucible 15 and the opening of the mask 11.
Perform in the direction of 0 degrees. This electron beam is bent by about 90 degrees by the action of a magnetic field 23 by a suitable condenser lens, converging lens, and deflection coil (not shown), and at the same time is converged into a small spot and collides with the raw metal 17. According to an experiment, it was found that a great increase in power can be achieved as compared with the conventional straight-through electron gun 19 'arranged at the position of the chain line in FIG.
【００１３】最小入射角度θｍｉｎは用途により最適角
度は異なるが、特に磁気記録媒体としてＣｏ、またはＣ
ｏ−Ｎｉ合金をポリエチレンテレフタレート等のポリエ
ステル等の基体フィルムに斜め蒸着して、磁化容易方向
を基体に対して斜めにしたい場合には、最小入射角θｍ
ｉｎを１０°〜６０°、好ましくは２０°〜５０°とす
る。The minimum angle of incidence .theta.min is different from the optimum angle depending on the application.
o-Ni alloy by oblique evaporation on a substrate film such as a polyester such as polyethylene terephthalate, if you want to obliquely easy magnetization direction with respect to the substrate, the minimum incident angle θm
in is 10 ° to 60 °, preferably 20 ° to 50 °.
【００１４】この構成によると、電子銃１９を電力が約
３００ｋＷまでの値で駆動した時最大２４０ｋＷ程度の
実効電力が得られることが分かった。なお上限３００ｋ
Ｗを越えると、るつぼ１５内の溶融金属が激しく踊り、
均一な蒸着が期待できなくなる。先に述べたように、こ
の値は従来の直進型電子銃（図１に鎖線で表示した電子
銃１９’）では到底不可能であった。このため、蒸着膜
の基体への結合力（接着性）が向上し、例えば磁気記録
媒体の磁気ヘッドやガイド部分との接触・摩擦による摩
耗、剥離が減少し、耐久性が向上する。According to this configuration, it has been found that when the electron gun 19 is driven at a value of up to about 300 kW, an effective power of up to about 240 kW can be obtained. Note that the upper limit is 300k
Exceeds W, molten metal in the crucible 15 is dancing vigorously,
Uniform deposition cannot be expected. As described above, this value was impossible at all with a conventional straight-through electron gun (the electron gun 19 'indicated by a chain line in FIG. 1). For this reason, the bonding strength (adhesion) of the deposited film to the substrate is improved, and, for example, wear and peeling due to contact and friction with the magnetic head and the guide portion of the magnetic recording medium are reduced, and the durability is improved.
【００１５】上記のように接着性の向上のほか、更に、
プラスチック基体の走行速度を従来の１００ｍ／ｍｉｎ
程度であったものを、最大２５０ｍ／ｍｉｎの移動速度
に出来、製造を迅速化できる。[0015] In addition to improving the adhesiveness as described above,
The traveling speed of the plastic substrate is 100 m / min.
The speed can be increased to a maximum of 250 m / min, which can speed up the production.
【００１６】図１の装置において、平均の最小入射角θ
min を３０度、るつぼの液面と回転ドラム３の蒸着面の
平均距離を約３００ｍｍ、マスクの開口幅を５００ｍｍ
とし、真空チャンバーを１×１０-5Ｔｏｒｒに排気し、
厚さ７μｍのポリエチレンテレフタレートフィルム（Ｐ
ＥＴ）を１００〜２５０ｍ／ｍｉｎで走行させ、Ｃｏ−
Ｎｉ合金（８０：２０）のペレットをるつぼ１５に間欠
供給しながら、電子銃１９の駆動電力４０ｋＶ×（３〜
５Ａ）＝１２０〜２００ｋＷで溶解し、蒸着を行い、電
子銃電力を一定に保ちながらフィルム搬送速度を調整し
て蒸着膜厚を例えば約１８００Åに調整する。また蒸着
時に導入する酸素主成分のガス量も適宜調整して同等の
磁気特性が得られるように成膜する。In the apparatus of FIG. 1, the average minimum incident angle θ
min is 30 degrees, the average distance between the liquid surface of the crucible and the deposition surface of the rotating drum 3 is about 300 mm, and the opening width of the mask is 500 mm.
And the vacuum chamber is evacuated to 1 × 10 −5 Torr,
7 μm thick polyethylene terephthalate film (P
ET) at a speed of 100 to 250 m / min.
While intermittently supplying the Ni alloy (80:20) pellets to the crucible 15, the driving power of the electron gun 19 is 40 kV × (3 to
5A) = Dissolving at 120 to 200 kW, performing vapor deposition, and adjusting the film transport speed while keeping the power of the electron gun constant to adjust the vapor deposition film thickness to, for example, about 1800 °. In addition, the film is formed so as to obtain the same magnetic characteristics by appropriately adjusting the amount of the gas of the oxygen main component introduced at the time of vapor deposition.
【００１７】電子銃の電力が増加し、実効電力が大きく
なると、蒸発した金属蒸気は高温度であり、図１にｄで
示したようにるつぼに最も近い部分においてシャッタ
（マスクの外面側にあるとき。内側にある時にはマス
ク）の表面に付着し、やがて垂れ落ちを生じることが分
かった。金属液滴がるつぼの外に落ちるとるつぼの支持
構造物、搬送系等に付着してそれらの機能を阻害してし
まう。したがって、（１）垂れ落ちが生じないような条
件で蒸着を行うか、（２）垂れ落ちがるつぼ内に限定さ
れるような条件で蒸着を行うかの対策が考えられる。When the power of the electron gun increases and the effective power increases, the evaporated metal vapor has a high temperature, and a shutter (located on the outer surface side of the mask) at a portion closest to the crucible as shown in FIG. When it was inside, it was found to adhere to the surface of the mask) and eventually sag. When the metal droplets fall out of the crucible, they adhere to the supporting structure of the crucible, the transport system, and the like, and impair their functions. Therefore, it is conceivable to take measures against (1) vapor deposition under conditions that do not cause dripping, or (2) vapor deposition under conditions that restrict dripping within the crucible.
【００１８】本発明では、図２〜３に示すようにシャッ
タ１３の内部に、０℃以下の冷媒で冷却することを特徴
とする。すなわち、シャッタ１３は２枚の円弧状に湾曲
した金属板の間に金属パイプを入口３３、分配管２７、
多数の平行な管３１、収集管２９、出口３５の順にめぐ
らす。２５はマスク１１の開口側のエッジである。冷媒
はシャッタの開口の反対側から開口側に流れてくる間に
温められる。この冷媒による冷却が蒸着金属（磁性薄膜
を形成する場合にはＣｏまたはＣｏ合金）を凝固させる
に十分な程度であればたれ落ちを防止できる。また、冷
媒の供給温度または供給量を調整するならばシャッタの
開口側のエッジ近傍のみに垂れ落ちを生じるように調整
できる。この調整を垂れ落ちが丁度るつぼ内になるよう
に定めるならば、冷媒をより有効に利用しながら原料金
属回収ができることになり、プロセスの効率が上がる。The present invention is characterized in that the inside of the shutter 13 is cooled by a refrigerant of 0 ° C. or less as shown in FIGS. That is, the shutter 13 inserts the metal pipe between the two arc-shaped curved metal plates into the inlet 33, the distribution pipe 27,
A number of parallel tubes 31, collection tubes 29 and outlets 35 are cycled in that order. Reference numeral 25 denotes an edge of the mask 11 on the opening side. The refrigerant is heated while flowing from the side opposite to the opening of the shutter to the opening side. If the cooling by the coolant is sufficient to solidify the deposited metal (Co or Co alloy in the case of forming a magnetic thin film), dripping can be prevented. Further, if the supply temperature or the supply amount of the refrigerant is adjusted, it can be adjusted so as to cause dripping only near the edge on the opening side of the shutter. If this adjustment is determined so that the dripping is just in the crucible, the raw material metal can be recovered while using the refrigerant more effectively, and the efficiency of the process is increased.
【００１９】例えば、蒸発すべき金属がＣｏまたはＣｏ
合金であるばあいには、電子銃の実効出力をＰ（ｋ
Ｗ）、るつぼの液面の表面積をＳ（ｍ2 ）、るつぼの液
面からシャッタ（マスクがるつぼ側にある時はマスク）
の最近接点までの距離をｄ（ｍ）としたとき、Ｐ／（Ｓ
・ｄ）＞１１０３０では電子銃が大電力化し、シャッタ
（またはマスク）に付着した蒸着金属は液滴となって滴
り落ちるが、本発明によって、冷却を行えば垂れ落ちが
生じないかあるいは、垂れ落ちをるつぼ内に局限でき
る。For example, if the metal to be evaporated is Co or Co
In the case of an alloy, the effective output of the electron gun is P (k
W), the surface area of the liquid surface of the crucible is S (m 2 ), the shutter from the liquid surface of the crucible (when the mask is on the crucible side, the mask)
Is the distance to the closest point of d (m), P / (S
D) At> 11030, the power of the electron gun is increased, and the deposited metal adhered to the shutter (or mask) drops as droplets. However, according to the present invention, if the cooling is performed, no dripping occurs or the dripping occurs. The fall can be localized within the crucible.
【００２０】[0020]
【発明の効果】以上のように、本発明によると、シャッ
タまたはマスクのうちるつぼ側のものを０℃以下の冷媒
により冷却することにより蒸着金属がマスク等に付着す
ることによる垂れ落ちを防止でき、あるいは垂れ落ちが
生じても確実にるつぼ内に回収することができる。As described above, according to the present invention, the crucible side of the shutter or the mask is cooled by the refrigerant of 0 ° C. or less, whereby dripping caused by the deposition metal adhering to the mask can be prevented. Alternatively, even if dripping occurs, it can be reliably collected in the crucible.
【図１】本発明を実施するための蒸着装置の実施例を示
す図である。FIG. 1 is a diagram showing an embodiment of a vapor deposition apparatus for carrying out the present invention.
【図２】本発明のシャッタを示す平面図である。FIG. 2 is a plan view showing a shutter according to the present invention.
【図３】本発明のシャッタを示す正面図である。FIG. 3 is a front view showing a shutter according to the present invention.
１：蒸着装置 ３：回転ドラム ５：基体フィルム ７：巻き取りロール ９：繰り出しロール １１：マスク １３：シャッタ １５：るつぼ １７：原料金属 １９：電子銃 ２１：電子ビーム ２３：偏向磁界 ２５：エッジ ２７、３１、２９：冷却管 ３３：入口 ３５：出口 1: evaporation apparatus 3: rotating drum 5: base film 7: take-up roll 9: pay-out roll 11: mask 13: shutter 15: crucible 17: raw metal 19: electron gun 21: electron beam 23: deflection magnetic field 25: edge 27 , 31, 29: Cooling pipe 33: Inlet 35: Outlet
フロントページの続き (72)発明者 大塚 俊幸 東京都中央区日本橋一丁目13番１号ティ ーディーケイ株式会社内 (72)発明者 宮崎 真司 東京都中央区日本橋一丁目13番１号ティ ーディーケイ株式会社内 (56)参考文献 特開 昭62−17176（ＪＰ，Ａ) 特開 平１−263263（ＪＰ，Ａ) 特開 昭62−71029（ＪＰ，Ａ) 特開 昭62−185871（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) C23C 14/00 - 14/58 Continuation of the front page (72) Inventor Toshiyuki Otsuka 1-1-13 Nihonbashi, Chuo-ku, Tokyo TDK Corporation (72) Inventor Shinji Miyazaki 1-1-13 Nihonbashi, Chuo-ku, Tokyo TDK Corporation (56) References JP-A-62-17176 (JP, A) JP-A-1-263263 (JP, A) JP-A-62-171029 (JP, A) JP-A-62-185871 (JP, A) ( 58) Field surveyed (Int. Cl. 7 , DB name) C23C 14/00-14/58
Claims (3)
蒸着すべき金属を収容し、前記金属に実効電力１２０〜
２４０ｋＷで駆動される電子銃から指向される電子ビー
ムを衝突させて前記金属を蒸発させ、前記るつぼに対向
して設けられた回転ドラムの面に沿って送られるプラス
チック基体に、前記るつぼに対向した開口を有するマス
クを通して前記蒸発させた金属を蒸着する蒸着方法にお
いて、前記マスクを開閉するためのシャッタが、前記マ
スクの前記開口の前記るつぼ側又は前記回転ドラム側に
設けられ、前記シャッタ及びマスクのうちるつぼ側にあ
るものを０℃以下の冷媒で冷却した状態で前記蒸着を実
行することを特徴とする、真空蒸着方法。1. An elongated crucible disposed in a vacuum vessel.
The metal to be deposited is accommodated, and the metal has an effective power of 120 to
Electronic beam directed from an electron gun driven at 240 kW
The metal is evaporated by colliding with the crucible, facing the crucible.
Plus sent along the surface of the rotating drum provided
A mass having an opening facing the crucible on a tick substrate
The above-mentioned evaporation method for evaporating the evaporated metal through a
A shutter for opening and closing the mask.
On the crucible side or the rotating drum side of the opening of the disc
The vapor deposition is performed in a state where the one on the crucible side of the shutter and the mask is cooled by a refrigerant of 0 ° C. or less.
Performing a vacuum deposition method.
けた蛇行通路に冷媒を流すことにより行われる請求項１
に記載の真空蒸着方法。2. The cooling is performed by flowing a coolant through a meandering passage provided inside a shutter or a mask.
The vacuum deposition method according to 1.
蒸着すべき金属を収容し、前記金属に実効電力１２０〜
２４０ｋＷで駆動される電子銃から指向される電子ビー
ムを衝突させて前記金属を蒸発させ、前記るつぼに対向
して設けられた回転ドラムの面に沿って送られるプラス
チック基体に、前記るつぼに対向した開口を有するマス
クを通して前記蒸発させた金属を蒸着する蒸着方法にお
いて、前記マスクを開閉するためのシャッタが、前記マ
スクの前記開口の前記るつぼ側又は前記回転ドラム側に
設けられ、前記シャッタ及びマスクのうちるつぼ側にあ
るものを、前記るつぼの上方に位置した部分を除いて０
℃以下の冷媒で冷却した状態で前記蒸着を実行すること
を特徴とする、真空蒸着方法。3. An elongated crucible disposed in a vacuum vessel.
The metal to be deposited is accommodated, and the metal has an effective power of 120 to
Electronic beam directed from an electron gun driven at 240 kW
The metal is evaporated by colliding with the crucible, facing the crucible.
Plus sent along the surface of the rotating drum provided
A mass having an opening facing the crucible on a tick substrate
The above-mentioned evaporation method for evaporating the evaporated metal through a
A shutter for opening and closing the mask.
On the crucible side or the rotating drum side of the opening of the disc
Provided on the crucible side of the shutter and the mask.
, Except for the part located above the crucible,
A vacuum vapor deposition method , wherein the vapor deposition is performed in a state where the vapor deposition is performed by cooling with a refrigerant of not more than ° C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04194526A JP3103676B2 (en) | 1992-06-30 | 1992-06-30 | Vacuum evaporation method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04194526A JP3103676B2 (en) | 1992-06-30 | 1992-06-30 | Vacuum evaporation method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0617238A JPH0617238A (en) | 1994-01-25 |
| JP3103676B2 true JP3103676B2 (en) | 2000-10-30 |
Family
ID=16326005
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP04194526A Expired - Fee Related JP3103676B2 (en) | 1992-06-30 | 1992-06-30 | Vacuum evaporation method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3103676B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005336533A (en) * | 2004-05-26 | 2005-12-08 | Toppan Printing Co Ltd | Inorganic oxide vapor-deposited film, and method for manufacturing the same |
| JP5248001B2 (en) * | 2006-09-13 | 2013-07-31 | 株式会社ミツバ | Vacuum film forming apparatus and vacuum film forming method |
| CN116875954A (en) * | 2023-09-07 | 2023-10-13 | 纳狮新材料有限公司杭州分公司 | Equipment and method for preparing lithium battery composite current collector |
-
1992
- 1992-06-30 JP JP04194526A patent/JP3103676B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0617238A (en) | 1994-01-25 |
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