JP3080972B2 - Anisotropic conductive film - Google Patents

Anisotropic conductive film

Info

Publication number
JP3080972B2
JP3080972B2 JP02203924A JP20392490A JP3080972B2 JP 3080972 B2 JP3080972 B2 JP 3080972B2 JP 02203924 A JP02203924 A JP 02203924A JP 20392490 A JP20392490 A JP 20392490A JP 3080972 B2 JP3080972 B2 JP 3080972B2
Authority
JP
Japan
Prior art keywords
film
anisotropic conductive
solvent
conductive film
storage stability
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP02203924A
Other languages
Japanese (ja)
Other versions
JPH0495310A (en
Inventor
壽郎 小宮谷
政和 川田
泰郎 二宮
泰雄 松井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP02203924A priority Critical patent/JP3080972B2/en
Publication of JPH0495310A publication Critical patent/JPH0495310A/en
Application granted granted Critical
Publication of JP3080972B2 publication Critical patent/JP3080972B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/741Apparatus for manufacturing means for bonding, e.g. connectors
    • H01L24/743Apparatus for manufacturing layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/741Apparatus for manufacturing means for bonding, e.g. connectors
    • H01L2224/743Apparatus for manufacturing layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/06Polymers
    • H01L2924/078Adhesive characteristics other than chemical
    • H01L2924/0781Adhesive characteristics other than chemical being an ohmic electrical conductor
    • H01L2924/07811Extrinsic, i.e. with electrical conductive fillers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives

Abstract

PURPOSE:To enhance the storage stability and the adhesion strength of an anisotropic conductive film over a wide temperature range and also enable the film connected to a microcircuit to be peeled through heating by mixing a nonreactive diluent into a reaction product of imidazole derivative and an epoxy compound. CONSTITUTION:In manufacturing an anisotropic conductive film of thermosetting type, the film is manufactured from a mixture including a reactive elastomer, an epoxy resin, a solvent for dissolving the elastomer and the resin, an imidazole derivative epoxy compound, a nonreactive diluent, and conductive particles. The film can thus be formed irrespective of the kind of the solvent by means of dissolving and mixing together film forming agent and other blended materials for providing the film with various performance. Also the film can be connected to a microcircuit in a short time and is particularly excellent in storage stability and adhesion strength over the wide temperature range (-30 to 100 deg.C) and, when connected to the microcircuit, it can be peeled therefrom by heating above predetermined temperature.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、微細な回路同志の電気的接続、更に詳しく
はLCD(液晶ディスプレー)とフレキシブル回路基板の
接続や、半導体ICとIC搭載用回路基板のマイクロ接合等
に用いる事のできる事方導電フィルムに関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION (Industrial application field) The present invention relates to electrical connection between fine circuits, more specifically, connection between a liquid crystal display (LCD) and a flexible circuit board, and a circuit for mounting a semiconductor IC and an IC. The present invention relates to a conductive film which can be used for micro joining of substrates and the like.

(従来の技術) 最近の電子機器の小型化、薄型化に伴い、微細な回路
同志の接続、微小部品と微細回路の接続等の必要性が飛
躍的に増大してきており、その接続方法として、異方性
の導電性接着剤やフィルムが使用され始めてイる。(例
えば、特開昭59−120436、60−191228、61−274394、61
−287974、62−244142、63−153534、63−305591、64−
47084、64−81878、特開平1−46549、1−251787各号
公報等) この方法は、接続しようとする回路間に所定量の導電
粒子を含有する接着剤またはフィルムをはさみ、所定の
温度、圧力、時間により熱圧着することによって、回路
間の電気的接続を行うと同時に、隣接する回路間には絶
縁性を確保させるものである。
(Prior Art) With the recent miniaturization and thinning of electronic devices, the necessity of connection between minute circuits, connection between minute components and minute circuits, etc. has been dramatically increased. Anisotropic conductive adhesives and films have begun to be used. (For example, JP-A-59-120436, 60-191228, 61-274394, 61
−287974, 62−244142, 63−153534, 63−305591, 64−
47084, 64-81878, JP-A-1-46549, 1-251787, etc.) In this method, an adhesive or film containing a predetermined amount of conductive particles is sandwiched between circuits to be connected, and a predetermined temperature, By performing thermocompression bonding based on pressure and time, electrical connection between circuits is performed, and at the same time, insulation between adjacent circuits is ensured.

従来、この異方導電接着剤ないしは異方導電フィルム
には大別して熱可塑タイプと熱硬化タイプが有り、最近
では信頼性の優れているエポキシ樹脂系の熱硬化タイプ
が広く使用されつつある。ところが、実用上これら熱硬
化タイプのものは、150〜200℃程度の温度で30秒間前
後、加熱、硬化することを必要とされる。しかし、これ
らの多くは二液性であったり、貯蔵安定性が悪かった
り、あるいは貯蔵安定性に優れるものは硬化に長時間ま
たは高温を必要とし、低温短時間で硬化できるものは貯
蔵安定性に劣る等といった問題があった。
Conventionally, this anisotropic conductive adhesive or anisotropic conductive film is roughly classified into a thermoplastic type and a thermosetting type, and recently, an epoxy resin type thermosetting type having excellent reliability has been widely used. However, in practice, these thermosetting types need to be heated and cured at a temperature of about 150 to 200 ° C. for about 30 seconds. However, many of these are two-packs, have poor storage stability, or those with excellent storage stability require a long time or high temperature for curing, and those that can be cured in a low temperature for a short time have poor storage stability. There were problems such as inferiority.

これらの問題点を解決すべく、イミダゾール誘導体や
アミン誘導体をエポキシ樹脂と反応させたアダクトや、
更には、それらをマイクロカプセル化した硬化剤が市販
されている。しかし、これらのいずれもが耐溶剤性に劣
り、ほとんどの溶剤が使用できないため、溶剤を使用す
るとすれば、製膜上必要な溶剤類の種類が限られてくる
ばかりか、混合調整後、短時間のうちに製膜し、速やか
に溶剤を除去しなければならないといった作業性の問題
がある。
In order to solve these problems, an adduct obtained by reacting an imidazole derivative or an amine derivative with an epoxy resin,
Further, curing agents obtained by microencapsulating them are commercially available. However, all of these are inferior in solvent resistance and most of the solvents cannot be used. Therefore, if a solvent is used, not only the type of solvents required for film formation is limited, but also short after adjustment of mixing. There is a problem in workability that a film must be formed in a short time and the solvent must be promptly removed.

また、異方導電フィルムによる微細な回路同志の接続
作業において、位置ずれ等の原因によって一度接続した
ものを被接続部材を破損または損傷せずに剥離したいと
いった要求が多くある。しかし、熱硬化タイプのほとん
どのものが高接着力、高信頼性といった長所がある反
面、この様な要求に対しては適応不可能である。
Further, in the connection work between fine circuits using an anisotropic conductive film, there are many demands for peeling off a connected member without damaging or damaging a connected member due to a positional shift or the like. However, although most of the thermosetting types have advantages such as high adhesive strength and high reliability, they cannot be adapted to such requirements.

(発明が解決しようとする課題) 熱硬化タイプの異方導電フィルムを製作する際に、造
膜剤をはじめ、その他、諸性能を出すための配合物を溶
剤にて溶解、混合して製膜するが、上述のように低温短
時間で硬化可能な市販のマイクロカプセル化硬化剤やア
ミンアダクトを使用する際には、特に極性溶媒は使用で
きない。
(Problems to be Solved by the Invention) When producing a thermosetting type anisotropic conductive film, a film forming agent and other components for achieving various properties are dissolved and mixed with a solvent to form a film. However, when using a commercially available microencapsulated curing agent or amine adduct that can be cured at a low temperature in a short time as described above, a polar solvent cannot be used particularly.

また、一度接続したものを被接続部材を破損または損
傷せずに剥離したいといった要求に対しては、樹脂成分
がエポキシ樹脂等の熱硬化性樹脂単独では適応不可能で
ある。このような要求に対する性能をもたせるために、
反応性熱可塑エラストマーを混合するが、やはり特定の
溶剤に溶解するものであることが必要である。
Further, it is not possible to meet the requirement that a member once connected be peeled off without damaging or damaging the member to be connected, using only a thermosetting resin such as an epoxy resin as a resin component. In order to provide performance for such demands,
The reactive thermoplastic elastomer is mixed, but also needs to be soluble in a specific solvent.

本発明は、これらの問題点を解決し、貯蔵安定性およ
び広範囲の温度(−30〜100℃)における接着力にすぐ
れるとともに、一度接続したものを所定の温度以上に加
熱することによって剥離可能である熱硬化型異方導電フ
ィルムを提供することを目的とする。
The present invention solves these problems and has excellent storage stability and adhesive strength in a wide range of temperatures (−30 to 100 ° C.), and can be peeled by heating once connected to a predetermined temperature or higher. An object of the present invention is to provide a thermosetting anisotropic conductive film.

(課題を解決するための手段) 本発明は、反応性エラストマー、エポキシ樹脂、これ
らを溶解する溶剤、イミダゾール誘導体エポキシ化合
物、非反応性希釈剤、および導電性粒子を含む混合物よ
り製膜されてなることを特徴とする異方導電フィルムで
ある。
(Means for Solving the Problems) The present invention is formed from a mixture containing a reactive elastomer, an epoxy resin, a solvent for dissolving them, an imidazole derivative epoxy compound, a non-reactive diluent, and conductive particles. It is an anisotropic conductive film characterized by the above.

本発明において使用する反応性エラストマーとは、カ
ルボキシル基含有スチレン−ブタジエン共重合体、カル
ボキシル基含有スチレン−イソプレン共重合体、カルボ
キシル基含有スチルン−ブタジエン飽和共重合体、カル
ボキシル基含有スチレン−イソプレン飽和共重合体、カ
ルボキシル基含有スチレン−エチレン−ブテン−スチレ
ン共重合体、カルボキシル基含有スチレン−エチレン−
ブテン−スチレン飽和共重合体、カルボン酸末端アクリ
ロニトリル−ブタジエン共重合体、カルボン酸変性アク
リロニトリル−ブタジエン共重合体、水添カルボン酸変
性アクリロニトリル−ブタジエン共重合体、カルボン酸
変性アクリルゴム、ブチラール樹脂、ウレタン樹脂、ア
ミノ基変性ポリオール樹脂、アミノ基変性フェノキシ樹
脂、ヒドロキシ末端飽和共重合ポリエステル樹脂、カル
ボキシル末端飽和共重合体ポリエステル樹脂などが挙げ
られる。好ましくは、カルボキシル基含有スチレン−エ
チレン−ブテン−スチレン飽和共重合体である。
The reactive elastomer used in the present invention includes a carboxyl group-containing styrene-butadiene copolymer, a carboxyl group-containing styrene-isoprene copolymer, a carboxyl group-containing stilene-butadiene saturated copolymer, and a carboxyl group-containing styrene-isoprene saturated copolymer. Polymer, carboxyl group-containing styrene-ethylene-butene-styrene copolymer, carboxyl group-containing styrene-ethylene-
Butene-styrene saturated copolymer, carboxylic acid-terminated acrylonitrile-butadiene copolymer, carboxylic acid-modified acrylonitrile-butadiene copolymer, hydrogenated carboxylic acid-modified acrylonitrile-butadiene copolymer, carboxylic acid-modified acrylic rubber, butyral resin, urethane Resins, amino group-modified polyol resins, amino group-modified phenoxy resins, hydroxy-terminated saturated copolymer polyester resins, carboxyl-terminated saturated copolymer polyester resins, and the like. Preferably, it is a styrene-ethylene-butene-styrene saturated copolymer containing a carboxyl group.

また、本発明におけるエポキシ樹脂は、一分子中に少
なくとも二個以上のエポキシ基を有するエポキシ樹脂が
用いられる。具体例としては、ビスフエノールA型エポ
キシ樹脂、ビスフエノールF型エポキシ樹脂、ビスフエ
ノールS型エポキシ樹脂、フェノールノボラック型エポ
キシ樹脂、クレゾールノボラック型エポキシ樹脂、ダイ
マー酸ジグリシジルエステル、フタル酸ジグリシジルエ
ステル、テトラブロムビスフェノールAジグリシジルエ
ーテル、ビスフエノールヘキサフロロアセトンジグリシ
ジルエーテル、トリグリシジルイソシアヌレート、テト
ラグリシジルジアミノジフェニルメタンなどが挙げら
れ、単独あるいは二種以上を混合して用いられる。好ま
しくはビスフエノールA型エポキシ樹脂である。
Further, as the epoxy resin in the present invention, an epoxy resin having at least two or more epoxy groups in one molecule is used. Specific examples include bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol S epoxy resin, phenol novolak epoxy resin, cresol novolak epoxy resin, dimer acid diglycidyl ester, phthalic acid diglycidyl ester, Examples thereof include tetrabromobisphenol A diglycidyl ether, bisphenolhexafluoroacetone diglycidyl ether, triglycidyl isocyanurate, and tetraglycidyl diaminodiphenylmethane, which may be used alone or in combination of two or more. Preferred is a bisphenol A type epoxy resin.

溶剤としては、上記反応性エラストマーおよびエポキ
シ樹脂を完全に溶解する溶剤であれば使用可能である。
具体例として、アセトン、メチルエチルケトン、メチル
イソブチルケトン、ベンゼン、トルエン、キシレン、メ
チルアルコール、エチルアルコール、イソプロピルアル
コール、n−ブチルアルコール、酢酸エチル、テトラヒ
ドロフラン、メチルセロソルブ、エチルセロソルブ、ジ
アセトンエーテル、メチルセロソルブアセテート、エチ
ルセロソルブアセテート、ジメチルホルムアミド、ジメ
チルアセトアミドなどが挙げられ、単独あるいは二種以
上を混合して用いられる。
As the solvent, any solvent that can completely dissolve the reactive elastomer and the epoxy resin can be used.
Specific examples include acetone, methyl ethyl ketone, methyl isobutyl ketone, benzene, toluene, xylene, methyl alcohol, ethyl alcohol, isopropyl alcohol, n-butyl alcohol, ethyl acetate, tetrahydrofuran, methyl cellosolve, ethyl cellosolve, diacetone ether, methyl cellosolve acetate. , Ethyl cellosolve acetate, dimethylformamide, dimethylacetamide and the like, and these can be used alone or as a mixture of two or more.

イミダゾール誘導体エポキシ化合物とは、イミダゾー
ル化合物とエポキシ化合物との付加物である。そのイミ
ダゾール化合物としては、イミダゾール、2−メチルイ
ミダゾール、2−エチルイミダゾール、2−エチル−4
−メチルイミダゾール、2−フエニルイミダゾール、2
−フェニル−4−メチルイミダゾール、1−ベンジル−
2−メチルイミダゾール、1−ベンジル−2−エチルイ
ムダゾール、1−ベンジル−2−エチル−5−メチルイ
ミダゾール、2−フェニル−4−メチル−5−ヒドロキ
シメチルイミダゾール、2−フェニル−4、5−ジヒド
ロキシメチルイミダゾールなどが挙げられる。また、エ
ポキシ化合物としては、例えば、ビスフェノールA、フ
ェノールノボラック、ビスフェノールF、ブロム化ビス
フェノールAなどのグリシジルエーテル型エポキシ樹
脂、ダイマー酸シグリシジルエステル、フタル酸ジグリ
シジルエステルなどが挙げられる。好ましくは、ビスフ
ェノールA型エポキシ樹脂である。
The imidazole derivative epoxy compound is an adduct of the imidazole compound and the epoxy compound. Examples of the imidazole compound include imidazole, 2-methylimidazole, 2-ethylimidazole, and 2-ethyl-4.
-Methylimidazole, 2-phenylimidazole, 2
-Phenyl-4-methylimidazole, 1-benzyl-
2-methylimidazole, 1-benzyl-2-ethylimidazole, 1-benzyl-2-ethyl-5-methylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 2-phenyl-4,5- Dihydroxymethylimidazole and the like. Examples of the epoxy compound include glycidyl ether type epoxy resins such as bisphenol A, phenol novolac, bisphenol F, and brominated bisphenol A, diglycidyl dimer acid, and diglycidyl phthalate. Preferably, it is a bisphenol A type epoxy resin.

上述したイミダゾール誘導体とエポキシ化合物との反
応生成物は、微粉末として市販されている。さらにはイ
ソシアネート化合物と混合し、貯蔵安定性を高めたもの
や、マイクロカプセル化したものもある。好ましくは、
マイクロカプセル化したものである。しかし、これらは
前述したように耐溶剤性が悪い。本発明者らは、このよ
うな欠点がイミダゾール誘導体とエポキシ化合物との反
応生成物に対して5〜30%の非反応性希釈剤を混合する
だけで、簡単に改善できることを見いだし、この発明を
完成させた。これによって、熱硬化タイプの異方導電フ
ィルムを製作する際に、造膜剤をはじめ、その他、諸性
能を出すための配合物を溶剤にて溶解、混合して製膜す
ることができるようになり、低温短時間で硬化可能な市
販のマイクロカプセル化硬化剤やアミンアダクトを硬化
剤として、極性溶媒を使用して調整した配合物にも使用
できる。尚、非反応性希釈剤の添加量が5%以下では貯
蔵安定性に対して効果が乏しく、30%以上であれば硬化
物の諸物性、例えば、接着力や硬化度が著しく悪くな
る。
The reaction product of the above-mentioned imidazole derivative and epoxy compound is commercially available as a fine powder. Furthermore, there are also those which are mixed with an isocyanate compound to increase the storage stability and those which are microencapsulated. Preferably,
It is microencapsulated. However, these have poor solvent resistance as described above. The present inventors have found that such a disadvantage can be easily improved only by mixing 5 to 30% of a non-reactive diluent with respect to the reaction product of the imidazole derivative and the epoxy compound. Completed. With this, when producing a thermosetting type anisotropic conductive film, it is possible to form a film by dissolving and mixing a compound for obtaining various performances, including a film forming agent, with a solvent. It can also be used in formulations prepared using a commercially available microencapsulated curing agent or amine adduct that can be cured in a short time at a low temperature and using a polar solvent as a curing agent. If the amount of the non-reactive diluent is less than 5%, the effect on the storage stability is poor, and if it is more than 30%, the physical properties of the cured product, for example, the adhesive strength and the degree of curing are significantly deteriorated.

また、反応性希釈剤を非反応性希釈剤の代わりに用い
た場合、貯蔵安定性に対する効果は認められなかった。
When a reactive diluent was used in place of the non-reactive diluent, no effect on storage stability was observed.

非反応性希釈剤としては、フタル酸ジブチル、フタル
酸ジオクチル、フタル酸ヘプチルノニル、フタル酸ジト
リデシル、フタル酸ジエチル、フタル酸ジメチル、フタ
ル酸ブチルベンジルなどのフタル酸エステル系、リン酸
トリブチル、リン酸トリフェニル、リン酸ジフェニルモ
ノクレジルなどのリン酸エステル系、ステアリン酸ブチ
ル、オレイン酸メトキシエチル、グリセリントリヘプタ
ン酸エステルなどの脂肪酸エステル系などが挙げられ
る。好ましくは、フタル酸ジオクチルである。
Non-reactive diluents include phthalate esters such as dibutyl phthalate, dioctyl phthalate, heptyl nonyl phthalate, ditridecyl phthalate, diethyl phthalate, dimethyl phthalate, and butyl benzyl phthalate; tributyl phosphate; Phosphate esters such as phenyl and diphenylmonocresyl phosphate, and fatty acid esters such as butyl stearate, methoxyethyl oleate, and glycerin triheptanoate are exemplified. Preferably, it is dioctyl phthalate.

導電粒子としては、ニッケル、鉄、銅、アルミニウ
ム、錫、鉛、クロム、コバルト、銀、金、などの金属、
金属酸化物、半田をはじめとする合金や、カーボン、グ
ラファイト、あるいはガラスやセラミック、プラスチッ
クなどの核剤にメッキなどの方法によって金属をコーテ
ィングした導電粒子などが挙げられる。耐候性の点から
は、金、ニッケル、半田合金などが好ましい。
As conductive particles, metals such as nickel, iron, copper, aluminum, tin, lead, chromium, cobalt, silver, gold,
Examples thereof include metal oxides, alloys such as solder, and conductive particles obtained by coating a metal such as carbon, graphite, or a nucleating agent such as glass, ceramic, or plastic with plating. From the viewpoint of weather resistance, gold, nickel, a solder alloy or the like is preferable.

本発明に用いられる導電粒子径は、隣接する回路間の
絶縁性を確保するためと接続の高信頼性を確保するため
に5〜10μmが好ましい。
The diameter of the conductive particles used in the present invention is preferably 5 to 10 μm in order to ensure insulation between adjacent circuits and to ensure high reliability of connection.

また、導電粒子の配合量は、3〜10体積%が良い。3
体積%以下であると安定した導電信頼性が得られず、10
体積%以上では隣接回路間の絶縁信頼性が劣る。
The amount of the conductive particles is preferably 3 to 10% by volume. 3
If it is less than 10% by volume, stable conductive reliability cannot be obtained.
If the volume% or more, insulation reliability between adjacent circuits is inferior.

以下、実施例により本発明を具体的に説明する。 Hereinafter, the present invention will be described specifically with reference to examples.

(実施例1) 反応性エラストマーとして、カルボキシル基含有スチ
レン−エチレン−ブテン−スチレン飽和共重合体「タフ
テックM1913」(旭化成社製)を、MEX(メチルエチルケ
トン)とトルエンの(1:2)混合溶剤に溶解し、50%溶
液として調整した。この溶液60重量部にビスフェノール
A型エポキシ樹脂「エピコート828」(油化シェルエポ
キシ社製)を50重量部混合した。これとは別に、エポキ
シ樹脂「エピコート1004」(油化シェルエポキシ社製)
100重量部をMEX50重量部に溶解し、上記の反応性エラス
トマー溶液に加えて均一に混合した。この混合溶液に、
非反応性希釈剤としてフタル酸ジオクチル12.5重量部
と、イミダゾール誘導体とエポキシ化合物との反応生成
物として、HX3742(旭化成社製)50重量部を混合した。
更に、導電粒子として、平均粒径10μm、最大粒径20μ
m、最小粒径2μmの半田アトマイズ粉100gを均一分散
させ、離型フィルム(ポリエチレンテレフタレート)
に、乾燥後の厚みが25μmになるように塗膜を形成し、
50℃で1時間乾燥させて異方導電フィルムを得た。
(Example 1) As a reactive elastomer, a carboxyl group-containing styrene-ethylene-butene-styrene saturated copolymer “Tuftec M1913” (manufactured by Asahi Kasei Corporation) was mixed with a mixed solvent of MEX (methyl ethyl ketone) and toluene (1: 2). Dissolved and adjusted as a 50% solution. To 60 parts by weight of this solution, 50 parts by weight of a bisphenol A type epoxy resin “Epicoat 828” (manufactured by Yuka Shell Epoxy) was mixed. Separately, epoxy resin "Epicoat 1004" (manufactured by Yuka Shell Epoxy)
100 parts by weight were dissolved in 50 parts by weight of MEX, added to the above reactive elastomer solution, and mixed uniformly. In this mixed solution,
12.5 parts by weight of dioctyl phthalate as a non-reactive diluent and 50 parts by weight of HX3742 (manufactured by Asahi Kasei Corporation) as a reaction product of an imidazole derivative and an epoxy compound were mixed.
Furthermore, as conductive particles, the average particle size is 10 μm,
m, 100 g of solder atomized powder with a minimum particle size of 2 μm is uniformly dispersed, and a release film (polyethylene terephthalate)
To form a coating film so that the thickness after drying is 25 μm,
After drying at 50 ° C. for 1 hour, an anisotropic conductive film was obtained.

(実施例2) さらに、極性を高めた溶剤を用いた場合の特性を見る
ために、カルボキシル基含有スチレン−エチレン−ブテ
ン−スチレン飽和共重合体「タフテックM1913」(旭化
成社製)30重量部を、DMF(ジメチルホルムアミド)30
重量部に溶解し、この溶液に実施例1と同様にしてエポ
キシ樹脂、非反応性希釈剤、イミダゾール誘導体とエポ
キシ化合物との反応生成物、導電粒子をそれぞれ混合
し、塗膜形成後、乾燥して異方導電フィルムを得た。
(Example 2) Further, in order to see the characteristics when a solvent having an increased polarity was used, 30 parts by weight of a carboxyl group-containing styrene-ethylene-butene-styrene saturated copolymer “TUFTEC M1913” (manufactured by Asahi Kasei Corporation) was added. , DMF (dimethylformamide) 30
The epoxy resin, the non-reactive diluent, the reaction product of the imidazole derivative and the epoxy compound, and the conductive particles were mixed with each other in the same manner as in Example 1 to form a coating film. Thus, an anisotropic conductive film was obtained.

(実施例3) イミダゾール誘導体とエポキシ化合物との反応生成物
として、ビスフェノールAのグリシジルエーテル型エポ
キシ樹脂と2−メチルイミダゾールとを所定の方法で反
応させて得た粉末を5μm以下の粒度に粉砕したもの10
重量部を用いた以外は、実施例2と同様にして異方導電
フィルムを得た。
Example 3 As a reaction product of an imidazole derivative and an epoxy compound, a powder obtained by reacting a glycidyl ether type epoxy resin of bisphenol A with 2-methylimidazole by a predetermined method was pulverized to a particle size of 5 μm or less. Thing 10
An anisotropic conductive film was obtained in the same manner as in Example 2 except that parts by weight were used.

(実施例4) 反応性エラストマーとして、カルボン酸変性アクリロ
ニトリル−ブタジエン共重合体(日本合成ゴム社製)30
重量部を、DMF(ジメチルホルムアミド)30重量部とMEK
5重量部との混合溶剤に溶解して用いた以外は、実施例
1と同様にして異方導電フィルムを得た。
(Example 4) As a reactive elastomer, a carboxylic acid-modified acrylonitrile-butadiene copolymer (manufactured by Nippon Synthetic Rubber Co., Ltd.) 30
30 parts by weight of DMF (dimethylformamide) and MEK
An anisotropic conductive film was obtained in the same manner as in Example 1, except that it was used after being dissolved in a mixed solvent with 5 parts by weight.

(比較例1) 非反応性希釈剤の代わりに、反応性希釈剤として脂肪
族グリシジルエーテルを用いた以外は、実施例1と同様
にしてフィルムを形成したが、貯蔵安定性は非常に悪か
った。
Comparative Example 1 A film was formed in the same manner as in Example 1 except that aliphatic glycidyl ether was used as a reactive diluent instead of the non-reactive diluent, but the storage stability was very poor. .

(比較例2) 実施例1において、非反応性希釈剤の配合量をイミダ
ゾール誘導体とエポキシ化合物との反応生成物に対して
5%以下とするため、2gのフタル酸ジオクチルを用いて
フィルムを形成したが、このものも貯蔵安定性は非常に
悪かった。
(Comparative Example 2) In Example 1, a film was formed using 2 g of dioctyl phthalate in order to reduce the amount of the non-reactive diluent to 5% or less based on the reaction product of the imidazole derivative and the epoxy compound. However, this also had very poor storage stability.

(比較例3) 実施例1において、非反応性希釈剤の配合量がイミダ
ゾール誘導体とエポキシ化合物との反応生成物に対して
35%になるように、フタル酸ジオクチル17.5gを用いて
フィルムを形成したが、貯蔵安定性は非常に優れている
反面、接着力、接続信頼性に劣る結果となった。
(Comparative Example 3) In Example 1, the compounding amount of the non-reactive diluent was based on the reaction product of the imidazole derivative and the epoxy compound.
Although a film was formed using 17.5 g of dioctyl phthalate so as to have a concentration of 35%, the storage stability was very good, but the adhesion strength and connection reliability were poor.

これらの実施例及び比較例で得られた異方導電フィル
ムについて、貯蔵安定性、接着力、リペアー性、信頼性
の各テストを実施した結果は、第1表に示した通りであ
った。
With respect to the anisotropic conductive films obtained in these Examples and Comparative Examples, the results of the tests of storage stability, adhesive strength, repairability, and reliability were as shown in Table 1.

尚、試験片として用いた異方導電フィルムの厚みは25
μmであり、接着力のテストは90゜ピール試験によっ
た。被着体としては、銅箔35μmにニッケル5μm、金
0.5μmのメッキを施した2層フレキシブル回路基板
(ピッチ0.2mm、端子数250本)と面抵抗30Ωの全面電極
ITOガラスを用いた。
The thickness of the anisotropic conductive film used as the test piece was 25
μm, and the adhesion test was conducted by a 90 ° peel test. As the adherend, nickel 5 μm, gold 5
0.5μm plated 2-layer flexible circuit board (0.2mm pitch, 250 terminals) and full surface electrode with 30Ω sheet resistance
ITO glass was used.

リペアー性の評価は、一度熱圧着によって接続した試
験片を165℃に加熱して引き剥がし、被接続部材を損傷
なく剥離できるか否かを観察した。
For evaluation of repairability, the test piece once connected by thermocompression bonding was heated to 165 ° C. and peeled off, and it was observed whether or not the connected member could be peeled off without damage.

貯蔵安定性の評価としては、室温および40℃に1ヵ月
放置後、120℃熱板上で溶融することを確認し、さら
に、上記被着体に所定の条件にて熱圧着後、隣接する端
子間の接続抵抗を測定し、その値がすべての端子におい
て2Ω以下であれば○とした。
As for the evaluation of storage stability, after leaving at room temperature and 40 ° C. for 1 month, it was confirmed that the material was melted on a hot plate at 120 ° C. The connection resistance between them was measured, and if the value was 2Ω or less at all terminals, it was evaluated as ○.

信頼性試験としては、−30℃、30分⇔25℃、5分⇔85
℃、30分の温度サイクル試験を100サイクル行った後
の、隣接する端子間の接続抵抗を測定した。
As a reliability test, -30 ℃, 30min⇔25 ℃, 5min⇔85
After 100 cycles of a temperature cycle test at 30 ° C. for 30 minutes, the connection resistance between adjacent terminals was measured.

(発明の効果) 以上に記述したように、本発明によれば熱硬化タイプ
の異方導電フィルムを製作する際に、溶剤の種類に制約
されることなく、造膜剤をはじめ、その他、諸性能を出
すための配合物を溶解、混合して製膜することができ
る。また、短時間にて微細回路間を接続でき、特に貯蔵
安定性および広範囲の温度(−30〜100℃)における接
着力にすぐれるとともに、一度接続したものを所定の温
度以上に加熱することによって剥離可能である熱硬化型
異方導電フィルムを提供することができる。
(Effects of the Invention) As described above, according to the present invention, when producing a thermosetting anisotropic conductive film, various types of film forming agents, including film forming agents, are not limited by the type of solvent. It is possible to form a film by dissolving and mixing a compound for improving performance. In addition, microcircuits can be connected in a short period of time, and in particular, have excellent storage stability and adhesive strength in a wide range of temperatures (−30 to 100 ° C.), and by heating once connected to a predetermined temperature or higher. A peelable thermosetting anisotropic conductive film can be provided.

フロントページの続き (56)参考文献 特開 平1−113480(JP,A) 特開 昭63−265985(JP,A) 特開 昭64−81878(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01B 5/16 H01B 1/20 H01L 21/52 H05K 3/32 H05K 3/36 Continuation of front page (56) References JP-A-1-113480 (JP, A) JP-A-63-265885 (JP, A) JP-A-64-81878 (JP, A) (58) Fields investigated (Int) .Cl. 7 , DB name) H01B 5/16 H01B 1/20 H01L 21/52 H05K 3/32 H05K 3/36

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】反応性エラストマー、一分子中に少なくと
も二個以上のエポキシ基を有するエポキシ樹脂、これら
を溶解する溶剤、イミダゾール誘導体エポキシ化合物、
該イミダゾール誘導体エポキシ化合物に対して5〜30%
の非反応性希釈剤、および粒子径が5〜10μmの導電性
粒子を含む混合物で、該混合物中に占める導電粒子の配
合量が3〜10体積%である混合物より製膜されてなるこ
とを特徴とする異方導電フィルム。
1. A reactive elastomer, an epoxy resin having at least two epoxy groups in one molecule, a solvent for dissolving them, an imidazole derivative epoxy compound,
5 to 30% based on the imidazole derivative epoxy compound
A mixture containing conductive particles having a non-reactive diluent and a particle size of 5 to 10 μm, wherein the mixture is formed from a mixture in which the blending amount of the conductive particles in the mixture is 3 to 10% by volume. Characteristic anisotropic conductive film.
JP02203924A 1990-08-02 1990-08-02 Anisotropic conductive film Expired - Fee Related JP3080972B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02203924A JP3080972B2 (en) 1990-08-02 1990-08-02 Anisotropic conductive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02203924A JP3080972B2 (en) 1990-08-02 1990-08-02 Anisotropic conductive film

Publications (2)

Publication Number Publication Date
JPH0495310A JPH0495310A (en) 1992-03-27
JP3080972B2 true JP3080972B2 (en) 2000-08-28

Family

ID=16481951

Family Applications (1)

Application Number Title Priority Date Filing Date
JP02203924A Expired - Fee Related JP3080972B2 (en) 1990-08-02 1990-08-02 Anisotropic conductive film

Country Status (1)

Country Link
JP (1) JP3080972B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5136365A (en) * 1990-09-27 1992-08-04 Motorola, Inc. Anisotropic conductive adhesive and encapsulant material
JP4660880B2 (en) * 2000-04-25 2011-03-30 日立化成工業株式会社 Adhesive composition, adhesive film using the same, and adhesive method
WO2022224934A1 (en) * 2021-04-19 2022-10-27 昭和電工マテリアルズ株式会社 Adhesive composition and method for producing connection structure

Also Published As

Publication number Publication date
JPH0495310A (en) 1992-03-27

Similar Documents

Publication Publication Date Title
JP5151902B2 (en) Anisotropic conductive film
JP2009517498A (en) Anisotropic conductive adhesive composition
JP2008094908A (en) Adhesive for electrode connection
JPH10168412A (en) Anisotropically conductive adhesive
JP3418492B2 (en) Anisotropic conductive film
JPH09169958A (en) Anisotropically electroconductive film
JP3391870B2 (en) Anisotropic conductive film
JP2500826B2 (en) Anisotropic conductive film
JPH09143252A (en) Connection member for circuit
JP3080972B2 (en) Anisotropic conductive film
JP2509773B2 (en) Method for producing anisotropic conductive film
KR100845875B1 (en) Insulation-coated electroconductive particles
JP2680412B2 (en) Anisotropic conductive film
JP2500819B2 (en) Anisotropic conductive film
JPH10279903A (en) Electroconductive adhesive
JPH10273635A (en) Connecting member for circuit and production of circuit board
JP3075742B2 (en) Anisotropic conductive film
JP2018131569A (en) Resin composition comprising conductive particles
JP3480754B2 (en) Method for producing anisotropic conductive film
JP3022980B2 (en) Thermosetting film adhesive
JPH09165435A (en) Anisotropic conductive film
JPH0521094A (en) Anisotropic electric conductive adhesive agent
JP2680430B2 (en) Anisotropic conductive film
JP3363331B2 (en) Anisotropic conductive adhesive
JP3085714B2 (en) Anisotropic conductive film

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees