JP2967958B2 - Stamper for optical disk and method of manufacturing the same - Google Patents
Stamper for optical disk and method of manufacturing the sameInfo
- Publication number
- JP2967958B2 JP2967958B2 JP35963991A JP35963991A JP2967958B2 JP 2967958 B2 JP2967958 B2 JP 2967958B2 JP 35963991 A JP35963991 A JP 35963991A JP 35963991 A JP35963991 A JP 35963991A JP 2967958 B2 JP2967958 B2 JP 2967958B2
- Authority
- JP
- Japan
- Prior art keywords
- stamper
- optical disk
- manufacturing
- pure water
- pit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Moulds For Moulding Plastics Or The Like (AREA)
- Manufacturing Optical Record Carriers (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は光ディスク用スタンパー
及びその製法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a stamper for an optical disk and a method of manufacturing the stamper.
【０００２】[0002]
【従来の技術】一般に光ディスクの製造に用いられるス
タンパーは、一般に、ガラス基板上に塗布されたフォト
レジストをレーザービーム等で露光し、これを現像する
ことにより、凹凸パターンが形成された面に導電化処理
を施した後、Ｎｉ電鋳を施すことにより作製される。作
製されたスタンパーの表面には、通常若干のフォトレジ
ストが残留している。フォトレジストが表面に残留した
スタンパーを用いて、光ディスク基板を成形すると、成
形された基板には、残留フォトレジストによる凹凸が転
写される結果、基板ノイズが著しく増加し、Ｃ／Ｎが低
下する。この問題を解決するために、酸素プラズマアッ
シング装置等を用いて、スタンパー表面の残留フォトレ
ジストを酸化除去する（ドライ洗浄）工程がスタンパー
の作製工程に含まれているのが一般的である。2. Description of the Related Art In general, a stamper used for manufacturing an optical disk generally exposes a photoresist applied on a glass substrate to a laser beam or the like, and develops the photoresist to form a conductive pattern on the surface on which an uneven pattern is formed. It is produced by subjecting Ni to electroforming after the chemical treatment. Usually, a slight amount of photoresist remains on the surface of the manufactured stamper. When an optical disk substrate is formed using a stamper having a photoresist remaining on the surface, irregularities due to the remaining photoresist are transferred to the formed substrate, resulting in a significant increase in substrate noise and a decrease in C / N. In order to solve this problem, a process of oxidizing and removing the photoresist remaining on the surface of the stamper (dry cleaning) using an oxygen plasma ashing apparatus or the like is generally included in the stamper manufacturing process.
【０００３】[0003]
【発明が解決しようとする課題】スタンパーにドライ洗
浄を施すと、酸素プラズマがスタンパー表面のＮｉを酸
化させ、光ディスク基板の成形時に、樹脂に含まれる離
型剤の水酸基がスタンパー表面の酸化Ｎｉと結合するこ
とにより、表面の濡れ性が著しく低下し、樹脂とスタン
パーとの密着性が低下する。スタンパーと樹脂との密着
性が低下することにより、型開時（成形された光ディス
ク基板の離型時）より前にスタンパーから基板が剥離
し、そのために、ピットがずれて転写される。スタンパ
ー表面に結合した離型剤は、スタンパー表面の酸化Ｎｉ
と比較的結合力の強い水素結合等で結合し、成形時に離
脱することはなく、成形条件を変更してもピットずれの
ない光ディスク基板を得ることはできない。When the stamper is subjected to dry cleaning, oxygen plasma oxidizes Ni on the surface of the stamper, and at the time of molding the optical disk substrate, the hydroxyl groups of the release agent contained in the resin become Ni and Ni oxide on the surface of the stamper. By bonding, the wettability of the surface is significantly reduced, and the adhesion between the resin and the stamper is reduced. When the adhesion between the stamper and the resin is reduced, the substrate is separated from the stamper before the mold is opened (when the molded optical disk substrate is released), so that the pits are shifted and transferred. The release agent bonded to the stamper surface is Ni oxide oxidized on the stamper surface.
It is bonded by a hydrogen bond or the like having a relatively strong bonding force, does not separate during molding, and it is impossible to obtain an optical disk substrate without pit shift even if molding conditions are changed.
【０００４】本発明の１つの目的は、多数の成形ショッ
トにわたって、ピットがずれて転写されるピットずれを
発生させることのない光ディスク用スタンパーを提供す
ることにある。It is an object of the present invention to provide a stamper for an optical disc which does not generate a pit shift in which pits are shifted and transferred over a large number of molding shots.
【０００５】本発明の他の１つの目的は、上記ピットず
れを発生させることのない光ディスク用スタンパーを得
る方法を提供することにある。Another object of the present invention is to provide a method for obtaining a stamper for an optical disk which does not cause the pit shift.
【０００６】[0006]
【課題を解決するための手段】本発明によれば、上記の
１つの目的は、プレピットまたは案内溝に対応する凹凸
部と、鏡面部とを有し、該鏡面部における純水の接触角
が１０°〜７０°の範囲にあることを特徴とする光ディ
スク用スタンパーを提供することにより達成される。According to the present invention, it is an object of the present invention to provide a semiconductor device having a concave / convex portion corresponding to a prepit or a guide groove, and a mirror surface portion, wherein a contact angle of pure water at the mirror surface portion is reduced. This is attained by providing a stamper for an optical disc characterized by being in the range of 10 ° to 70 °.
【０００７】また、上記の他の１つの目的は、１８０〜
３００ｎｍの波長を有する紫外線を、空気中または酸素
ガス（雰囲気）中で照射する工程を含むことを特徴とす
る上記の光ディスク用スタンパーの製法を提供すること
により達成される。[0007] Another object of the present invention is as follows.
It is attained by providing a method for producing the stamper for an optical disc described above, which comprises a step of irradiating ultraviolet rays having a wavelength of 300 nm in the air or in an oxygen gas (atmosphere).
【０００８】なお、本発明における純水の接触角とは、
室温下で、スタンパー１上の純水の水滴２と空気３との
界面で形成される角度θ（図１）をいう。In the present invention, the contact angle of pure water is
It refers to the angle θ (FIG. 1) formed at the interface between the water drop 2 of pure water and the air 3 on the stamper 1 at room temperature.
【０００９】[0009]
【作用】空気中または酸素雰囲気中で、スタンパーの表
面に１８０〜３００ｎｍの波長を有する紫外線が照射さ
れると、スタンパーの表面に吸着した離型剤が分解し、
スタンパー表面の濡れ性が高められ、樹脂とスタンパー
との密着性が向上する。ここで酸素プラズマアッシング
を施すか、低真空下でスパッタエッチングを施すことに
よっても、スタンパー表面の濡れ性が高められるが、こ
れらの処理を施したスタンパーの表面は密着力が極めて
高く、成形時に離型剤が再び吸着し、ピットずれが発生
する。これに対し、上記の紫外線を照射した場合には、
適当な密着力を有するスタンパーが得られる。When the surface of the stamper is irradiated with ultraviolet rays having a wavelength of 180 to 300 nm in the air or oxygen atmosphere, the release agent adsorbed on the surface of the stamper is decomposed,
The wettability of the stamper surface is enhanced, and the adhesion between the resin and the stamper is improved. Here, the wettability of the stamper surface can also be increased by performing oxygen plasma ashing or sputter etching under a low vacuum, but the surface of the stamper subjected to these treatments has an extremely high adhesion force, and the stamper is separated during molding. The mold agent is adsorbed again, and a pit shift occurs. On the other hand, when the above ultraviolet rays are irradiated,
A stamper having an appropriate adhesion is obtained.
【００１０】[0010]
【実施例】以下、実施例により本発明を具体的に説明す
る。The present invention will be described below in detail with reference to examples.
【００１１】実施例１・２ 比較例１・２ Ｎｉ製のスタンパー（アドレス情報用ピットおよび案内
溝に対応する凹凸部を有する）に、種々の条件で酸素プ
ラズマアッシング処理を実施し、かかるスタンパーを用
いて光ディスク用ポリカーボネイト樹脂基板を射出成形
法により作製した。成形前のスタンパー表面の鏡面部に
おける純水の接触角と、ピットずれの発生状況とを表１
に示す。表１から純水の接触角が１０°〜７０°の範囲
にあるスタンパーを用いれば、多数の成形ショットを行
っても良好なピット転写がなされることがわかる。Examples 1.2 Comparative Examples 1.2 Oxygen plasma ashing was performed on Ni stampers (having irregularities corresponding to address information pits and guide grooves) under various conditions. Using this, a polycarbonate resin substrate for an optical disk was produced by an injection molding method. Table 1 shows the contact angle of pure water on the mirror surface of the stamper surface before molding and the occurrence of pit shift.
Shown in It can be seen from Table 1 that if a stamper having a contact angle of pure water in the range of 10 ° to 70 ° is used, good pit transfer can be performed even when a large number of molding shots are performed.
【００１２】実施例３〜６ 比較例３・４ 成形時にピットずれが発生するＮｉ製のスタンパー表面
に、空気中で１８５ｎｍおよび２５４ｎｍの発光ピーク
波長を有する紫外線を照射した。紫外線の照射時間とス
タンパー表面の鏡面部における純水の接触角とを表２に
示す。また、表２中にはかかるスタンパーを用いて光デ
ィスク用ポリカーボネイト樹脂基板を射出成形法により
作製した際のピークずれの発生状況をも示す。表２か
ら、ピットずれが発生するスタンパーに紫外線を照射
し、スタンパー表面の鏡面部における純水の接触角が１
０°〜７０°の範囲になるように調整したスタンパーを
用いれば、多数の成形ショットを行っても良好なピット
転写がなされることがわかる。Examples 3 to 6 Comparative Examples 3.4 The surface of a Ni stamper in which a pit shifts during molding was irradiated with ultraviolet rays having emission peak wavelengths of 185 nm and 254 nm in air. Table 2 shows the UV irradiation time and the contact angle of pure water on the mirror surface of the stamper surface. Table 2 also shows the occurrence of peak shift when a polycarbonate resin substrate for an optical disk is manufactured by injection molding using such a stamper. As shown in Table 2, the stamper in which the pit shift occurs is irradiated with ultraviolet light, and the contact angle of pure water on the mirror surface of the stamper surface is 1
It can be seen that when a stamper adjusted to be in the range of 0 ° to 70 ° is used, good pit transfer can be performed even when a large number of molding shots are performed.
【００１３】比較例５〜８ 成形時にピットずれが発生するＮｉ製のスタンパーを酸
素プラズマアッシング装置を用いて種々の条件で表面処
理を施した。処理条件と処理後のスタンパー表面の鏡面
部における純水の接触角、および各スタンパーを用いて
光ディスク用ポリカーボネイト樹脂基板を射出成形法に
より作製した際のピットずれの発生状況を表３に示す。
表３から酸素プラズマアッシング処理を施したスタンパ
ーの接触角は５°以下であり、少ない成形ショット数で
ピットずれが発生していることがわかる。Comparative Examples 5 to 8 A Ni stamper that generates pit shifts during molding was subjected to surface treatment under various conditions using an oxygen plasma ashing apparatus. Table 3 shows the processing conditions, the contact angle of pure water on the mirror portion of the surface of the stamper after the processing, and the occurrence of pit shifts when polycarbonate resin substrates for optical disks were produced by injection molding using each stamper.
From Table 3, it can be seen that the contact angle of the stamper subjected to the oxygen plasma ashing treatment was 5 ° or less, and pit deviation occurred with a small number of molding shots.
【００１４】[0014]
【発明の効果】本発明によれば、多数の成形ショットに
わたって、ピットずれを発生させることのない光ディス
ク用スタンパー及びその製法が提供される。According to the present invention, there is provided a stamper for an optical disk which does not cause a pit shift over a large number of molding shots, and a method of manufacturing the stamper.
【図１】純水の接触角を示す説明図である。FIG. 1 is an explanatory diagram showing a contact angle of pure water.
１ 光ディスク用スタンパー ２ 純水 ３ 空気 1 stamper for optical disk 2 pure water 3 air
【表１】 [Table 1]
【表２】 [Table 2]
【表３】 [Table 3]
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6，ＤＢ名) G11B 7/26 511 B29C 33/38 B29L 17:00 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 6 , DB name) G11B 7/26 511 B29C 33/38 B29L 17:00
Claims (2)
部と、鏡面部とを有し、該鏡面部における純水の接触角
が１０°〜７０°の範囲にあることを特徴とする光ディ
スク用スタンパー。1. A stamper for an optical disk, comprising: a concave / convex portion corresponding to a prepit or a guide groove; and a mirror surface, wherein a contact angle of pure water at the mirror surface is in a range of 10 ° to 70 °. .
線を、空気中または酸素雰囲気中で照射する工程を含む
ことを特徴とする請求項１記載の光ディスク用スタンパ
ーの製法。2. The method for producing an optical disk stamper according to claim 1, further comprising a step of irradiating ultraviolet light having a wavelength of 180 to 300 nm in air or an oxygen atmosphere.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35963991A JP2967958B2 (en) | 1991-12-26 | 1991-12-26 | Stamper for optical disk and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35963991A JP2967958B2 (en) | 1991-12-26 | 1991-12-26 | Stamper for optical disk and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05182259A JPH05182259A (en) | 1993-07-23 |
| JP2967958B2 true JP2967958B2 (en) | 1999-10-25 |
Family
ID=18465533
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP35963991A Expired - Fee Related JP2967958B2 (en) | 1991-12-26 | 1991-12-26 | Stamper for optical disk and method of manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2967958B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4566547B2 (en) * | 2003-11-13 | 2010-10-20 | Ｈｏｙａ株式会社 | Mask blank manufacturing method and transfer mask manufacturing method |
| JP4688966B2 (en) * | 2010-07-06 | 2011-05-25 | Ｈｏｙａ株式会社 | Mask blank manufacturing method and transfer mask manufacturing method |
-
1991
- 1991-12-26 JP JP35963991A patent/JP2967958B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05182259A (en) | 1993-07-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |