JP2934911B2 - Thermal spray coating manufacturing method - Google Patents

Thermal spray coating manufacturing method

Info

Publication number
JP2934911B2
JP2934911B2 JP33295890A JP33295890A JP2934911B2 JP 2934911 B2 JP2934911 B2 JP 2934911B2 JP 33295890 A JP33295890 A JP 33295890A JP 33295890 A JP33295890 A JP 33295890A JP 2934911 B2 JP2934911 B2 JP 2934911B2
Authority
JP
Japan
Prior art keywords
base material
thermal spray
spray coating
blast
adhesion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP33295890A
Other languages
Japanese (ja)
Other versions
JPH04201075A (en
Inventor
一成 内田
甫 伊庭
通裕 小沢
二千男 門田
正博 小野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Hitachi Nuclear Engineering Co Ltd
Original Assignee
Hitachi Ltd
Hitachi Nuclear Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Nuclear Engineering Co Ltd filed Critical Hitachi Ltd
Priority to JP33295890A priority Critical patent/JP2934911B2/en
Publication of JPH04201075A publication Critical patent/JPH04201075A/en
Application granted granted Critical
Publication of JP2934911B2 publication Critical patent/JP2934911B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、基盤材上に溶射皮膜を形成する方法に係
り、特に溶射皮膜と基盤材との密着力を高めるために、
基盤材の表面粗度を大きくする溶射皮膜製造方法に関す
る。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method of forming a thermal spray coating on a base material, and particularly to increasing the adhesion between the thermal spray coating and the base material.
The present invention relates to a method for producing a thermal spray coating that increases the surface roughness of a base material.

〔従来の技術〕[Conventional technology]

プラズマ溶射法は、熱源により溶融または半溶融状態
となった粉末を基盤材表面に吹きつけて皮膜を形成する
表面処理法のひとつであり、タービン翼、自動車エンジ
ン部品等に利用されている。プラズマ照射法により基盤
材表面に皮膜を形成する際、あらかじめ表面を粗面化す
ることによって皮膜と基盤材の機械的な結合を良くして
密着力を高めているのが普通である。
The plasma spraying method is one of surface treatment methods for forming a coating by spraying a powder in a molten or semi-molten state by a heat source onto the surface of a base material, and is used for turbine blades, automobile engine parts and the like. When a film is formed on the surface of a base material by a plasma irradiation method, the surface is generally roughened in advance to improve the mechanical coupling between the film and the base material to increase the adhesion.

表面粗面化の方法としては、基盤材面面を(1)粉末
体によってブラスト処理する方法(特開昭62−182261号
公報)、(2)機械加工により溝を形成させる方法(特
開昭60−230975号公報)及び(3)腐食液により腐食溝
を形成させる方法(特開昭60−50157号公報)が従来実
施されている。
As a method of surface roughening, (1) a method of blasting a surface of a base material with a powder body (Japanese Patent Application Laid-Open No. 62-182261), and (2) a method of forming grooves by machining (Japanese Patent Application Laid-Open No. Japanese Unexamined Patent Publication No. 60-230975) and (3) a method of forming a corroded groove with a corrosive liquid (Japanese Patent Application Laid-Open No. 50157/1985) has been conventionally practiced.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

溶射皮膜と基盤材の密着性向上は、皮膜の信頼性を向
上させるためにも必要不可欠である。しかしながら、従
来のブラスト処理法では基盤材の表面を均一に削り落と
すために表面の凹凸を大きくして表面粗度を高めること
はできず、皮膜と基盤材の密着性向上は望めない。これ
に対処するため、機械加工で溝を付けたり、腐食液によ
る蝕刻で溝を付けることにより、粗度の増大を図る方法
が考えられている。しかしながらの方法はグラファイト
の様に加工が困難で、かつ、吸湿性の材料への適用は難
しい。
Improving the adhesion between the thermal spray coating and the base material is indispensable for improving the reliability of the coating. However, in the conventional blasting method, the surface roughness of the base material cannot be increased by uniformly removing the surface of the base material so that the surface roughness cannot be increased, and the improvement of the adhesion between the film and the base material cannot be expected. To cope with this, there has been proposed a method of increasing the roughness by forming a groove by machining or forming a groove by etching with a corrosive liquid. However, this method is difficult to process like graphite, and is difficult to apply to a hygroscopic material.

本発明の目的は、上記の問題点を解消するため、ブラ
スト処理のみで基盤材表面に溶射皮膜の基盤材に対する
投錨効果を高めることのできる凹凸をつけ、高い密着力
を有する溶射皮膜を形成することのできる溶射皮膜製造
方法を提供することにある。
An object of the present invention is to form a thermal sprayed coating having high adhesion by forming irregularities on the surface of the base material that can enhance the anchoring effect of the sprayed coating on the base material only by blasting to solve the above problems. It is an object of the present invention to provide a method for producing a thermal sprayed coating that can be used.

〔課題を解決するための手段〕[Means for solving the problem]

本発明は、基盤表面に微粒子を吹きつけて小凹凸面を
形成する工程と、前記小凹凸面を有孔部材で覆う工程
と、微粒子を吹きつけて前記有孔部材の孔を通過した微
粒子によって前記小凹凸面を削って大凹凸面を形成する
工程と、溶融または半溶融状態の粉末を当該表面に溶射
して皮膜を形成する工程と、を含むことを特徴とする溶
射皮膜製造方法である。ここで、溶射皮膜の形成前の工
程を複数繰り返すのがよい。
The present invention provides a step of spraying fine particles on a substrate surface to form a small uneven surface, a step of covering the small uneven surface with a perforated member, and a step of spraying the fine particles and passing fine particles through the holes of the perforated member. A method of forming a large uneven surface by shaving the small uneven surface, and a step of spraying a powder in a molten or semi-molten state on the surface to form a coating, a method for producing a sprayed coating, comprising: . Here, it is preferable to repeat a plurality of steps before the formation of the thermal spray coating.

〔作用〕[Action]

基盤材と溶射皮膜の密着力は主に機械的なかみ込み効
果(投錨効果)により得られており、密着性を向上させ
るため、基盤材表面を粗面化することが有効であること
が知られている。本発明においては、基盤表面に微粒子
を吹きつけて小凹凸面を形成し、それから該凹凸面を有
孔部材、例えば複数の孔を有する平板もしくは金網等で
覆って、微粒子を吹き付けて小凹凸面を削って大凹凸面
を形成し、このように形成した凹部を有する基盤へ溶融
または半溶融の粉末を吹きつけて溶射皮膜を形成するこ
とにより、大きなかみ込み効果(投錨効果)が得られ、
基盤材と皮膜の密着力が向上する。
The adhesion between the base material and the sprayed coating is mainly obtained by the mechanical penetration effect (anchoring effect), and it is known that it is effective to roughen the base material surface to improve the adhesion. Have been. In the present invention, a fine uneven surface is formed by spraying fine particles on the substrate surface, and then the uneven surface is covered with a perforated member, for example, a flat plate or a wire mesh having a plurality of holes, and the fine uneven surface is sprayed with fine particles. To form a large uneven surface, and spray a molten or semi-molten powder onto a substrate having a concave portion formed in this way to form a thermal spray coating, thereby obtaining a large biting effect (anchoring effect),
The adhesion between the base material and the film is improved.

〔実施例〕〔Example〕

以下、本発明の実施例を説明する。 Hereinafter, embodiments of the present invention will be described.

第2図は基盤材をグラファイトとした場合の本発明に
よる溶射皮膜の形成方法を示している。第3図は基盤材
をブラスト処理して表面を粗面化するために使用するブ
ラストガン先端の移動経路を示している。
FIG. 2 shows a method of forming a thermal spray coating according to the present invention when the base material is graphite. FIG. 3 shows the movement path of the tip of the blast gun used for roughening the surface by blasting the base material.

まず、ブラスト処理の方法について説明する。基盤材
はグラファイト5(直径:20mm、厚さ:5mm)とし、ブラ
ストガン6の先端より圧力2kg/cm2の圧縮空気と共にAl2
O3粉末(#60)を基盤材表面に吹きつけて基盤材全面を
ブラスト処理し、粗面すなわち小凹凸面4を形成する。
この時ブラストガン6の先端と基盤材5の距離は約70m
m、ブラストガン移動速度は2000mm/minとした。また、
第3図に示す様にブラストガン先端が平行移動する経路
の巾であるピッチPは本実施例では約7mmとし、パス回
数は1回とした。
First, a blast processing method will be described. The base material is graphite 5 (diameter: 20 mm, thickness: 5 mm), and compressed air of 2 kg / cm 2 from the tip of the blast gun 6 with Al 2
O 3 powder (# 60) is sprayed on the surface of the base material to blast the entire surface of the base material to form a rough surface, that is, a small uneven surface 4.
At this time, the distance between the tip of the blast gun 6 and the base material 5 is about 70 m
m, the blast gun moving speed was 2000 mm / min. Also,
As shown in FIG. 3, the pitch P, which is the width of the path along which the tip of the blast gun moves in parallel, was about 7 mm in this embodiment, and the number of passes was one.

なお、パス回数は第3図に示すブラストガンの移動経
路において、ブラストガン先端がBからEまで移動した
時点で1パスと定めた。
The number of passes was determined to be one pass when the tip of the blast gun moved from B to E in the movement path of the blast gun shown in FIG.

次いで、グラファイト材5の表面を第4図に示すフッ
素樹脂(商品名:テフロン)の有孔平板7で覆う。この
場合、外径(D1)20mmの有孔平板には、孔径(D2)2mm
の孔10が複数個設けられている。その後、上記と同一条
件でブラストガンよりAl2O3粉末を吹きつけて、有孔平
板7に設けた複数の孔10の下側に位置する基盤材表面を
削り取ることにより、第2図に示す凹部3を形成し、全
体としては大凹凸面11を形成した。この場合、凹部3の
深さHはブラストのパス数を変えることにより変化させ
ることができる。今回はパス数を2,4及び6回実施した
試験片を作製した。さらに、孔径D2をφ1mmと小さくし
た有孔平板を作製し、基盤材表面を覆った後、ブラス処
理した試験片も作製した。これら本発明により作製した
試験片のパス回数とブラスト深さを表1に示す。
Next, the surface of the graphite material 5 is covered with a perforated flat plate 7 made of a fluororesin (trade name: Teflon) shown in FIG. In this case, for a perforated flat plate with an outer diameter (D 1 ) of 20 mm, a hole diameter (D 2 ) of 2 mm
A plurality of holes 10 are provided. Then, the surface of the base material located below the plurality of holes 10 provided in the perforated flat plate 7 is scraped by spraying Al 2 O 3 powder from a blast gun under the same conditions as described above, to thereby obtain the structure shown in FIG. The concave portion 3 was formed, and a large uneven surface 11 was formed as a whole. In this case, the depth H of the recess 3 can be changed by changing the number of blast passes. In this case, test pieces with 2, 4 and 6 passes were prepared. Further, the hole diameter D 2 to form a perforated flat plate as small as Ø1 mm, after covering the base material surface was also prepared brass treated test piece. Table 1 shows the number of passes and the blast depth of the test pieces manufactured according to the present invention.

前述した様に本発明の特徴は、あらかじめ基盤材表面
の全面にわたってブラスト処理して粗面化した後、複数
の細孔を有する平板で覆ってから再びブラスト処理する
点にある。これにより細孔に位置する基盤材粗面にさら
に凹部をつけ、粗度を高めることができる。表1の結果
はそれを示している。すなわち、孔径2mmの有孔平板で
基盤材を覆ってブラストした場合、パス数が2,4及び6
回の時、それぞれ45,60及び80μmのブラスト深さが得
られている。また、孔径1mmの有孔平板で基盤材を覆っ
てブラストした場合、パス数が2回の時、ブラスト深さ
は50μmが得られている。
As described above, the feature of the present invention resides in that the entire surface of the base material is previously blasted and roughened, then covered with a flat plate having a plurality of pores, and then blasted again. This makes it possible to further form a concave portion on the rough surface of the base material located at the pore, thereby increasing the roughness. The results in Table 1 show this. That is, when the base material is covered with a perforated flat plate having a hole diameter of 2 mm and blasted, the number of passes is 2, 4 and 6
In each case, blast depths of 45, 60 and 80 μm have been obtained, respectively. When blasting is performed by covering the base material with a perforated flat plate having a hole diameter of 1 mm, a blast depth of 50 μm is obtained when the number of passes is two.

次いで、上述した方法で作製した表1に示す4種類の
グラファイト基盤材の粗面に、別途準備したプラズマ溶
射装置を用いて、まず、高融点金属粉末を溶射して約10
0μmの厚さを有する高融点金属層8を形成した後、高
融点金属層の上表面に高融点酸化物セラミックス粉末を
溶射して約100μmの高融点酸化物セラミック層9を形
成した。
Next, high melting point metal powder was first sprayed onto the rough surfaces of the four types of graphite base materials shown in Table 1 prepared by the above-described method using a separately prepared plasma spraying apparatus.
After forming the refractory metal layer 8 having a thickness of 0 μm, refractory oxide ceramic powder was sprayed on the upper surface of the refractory metal layer to form a refractory oxide ceramic layer 9 of about 100 μm.

ここでは、比較のために有孔板を使用しないで、基盤
材の全領域を圧力2kg/cm2、ブラストガンと基盤材の距
離約70mm、ブラストガンの移動速度約2000mm/min、パス
数1回、ピッチ約7mmの条件でブラスト処理(従来方
法)したグラファイトを準備し、プラズマ溶射により約
100μmの高融点金属層を形成後、その表面上に約100μ
mの高融点酸化物セラミックス層を形成させた試験片を
作製し、前述した4種類の試験片と共に後述する密着力
試験に供試した。
Here, for the purpose of comparison, without using a perforated plate, the entire area of the base material was applied at a pressure of 2 kg / cm 2 , the distance between the blast gun and the base material was about 70 mm, the moving speed of the blast gun was about 2000 mm / min, and the number of passes was 1 First, prepare graphite blasted (conventional method) under the condition of a pitch of about 7 mm,
After forming a 100μm refractory metal layer, about 100μm
Specimens on which a high-melting-point oxide ceramic layer having a thickness of m were formed were prepared and subjected to an adhesion test described later together with the four types of specimens described above.

次に、本発明の効果を明確にするために基盤材と溶射
皮膜間の密着力を調べたので、その結果について述べ
る。
Next, in order to clarify the effects of the present invention, the adhesion between the base material and the sprayed coating was examined, and the results will be described.

ここでは、溶射皮膜と基盤材との密着力を測定する方
法として、JISH8666に記載されている付着力試験方法に
従った。この場合の試験条件としては、試験片温度は室
温、荷重速度は1000kgf/minとした。
Here, as a method for measuring the adhesion between the sprayed coating and the base material, an adhesion test method described in JISH8666 was used. As test conditions in this case, the test piece temperature was room temperature, and the load speed was 1000 kgf / min.

第5図は基盤材表面に形成したブラスト深さHと密着
力の関係を示したものである。今回は従来方法でブラス
トした時の深さを基準とするため、従来方法によるブラ
スト深さHは0μmとした。
FIG. 5 shows the relationship between the blast depth H formed on the base material surface and the adhesion. In this case, the blast depth H according to the conventional method was set to 0 μm because the blast depth according to the conventional method was used as a reference.

皮膜の密着力はブラスト深さを大きくすると共に増大
する傾向を示し、ブラスト深さ80μmでは従来方法に比
べ約40%密着力が向上している。また、基盤材を覆うた
めに用いた有孔平板に設けた孔の径が2mm及び1mmのいず
れであっても密着力の向上は認められ、孔径の違いによ
る有意差は差程ない。
The adhesion of the film shows a tendency to increase as the blast depth increases, and at a blast depth of 80 μm, the adhesion is improved by about 40% compared to the conventional method. In addition, even if the diameter of the hole provided in the perforated flat plate used to cover the base material was 2 mm or 1 mm, the improvement of the adhesion was observed, and there was no significant difference due to the difference in the hole diameter.

一般に基盤材表面に凹凸を形成すると溶射皮膜の密着
力が向上する理由は、機械的なかみ込み効果(投錨効
果)によると言われている。すなわち、基盤材表面に形
成された凹部に溶融または半溶融の粒子が入り込むこと
により、溶射皮膜と基盤材の機械的なかみ込み効果が大
きくなり、その結果、溶射皮膜と基盤材の密着力が向上
する。
Generally, it is said that the reason why the adhesion of the thermal spray coating is improved by forming irregularities on the surface of the base material is due to a mechanical biting effect (anchoring effect). In other words, the molten or semi-molten particles enter into the recesses formed on the surface of the base material, thereby increasing the effect of mechanically engaging the sprayed coating and the base material. As a result, the adhesion between the sprayed coating and the base material is reduced. improves.

本実施例で示したごとく、有孔平板を使用したブラス
ト処理で凹部を形成した場合は、ブラスト深さを深くし
たほど密着力が向上しているが、これはブラスト深さが
深いほど機械的なかみ込み効果が大きくなったことを示
している。
As shown in the present embodiment, when the recess is formed by blasting using a perforated flat plate, the adhesion is improved as the blast depth is increased, but this is because the mechanical strength increases as the blast depth increases. This indicates that the penetration effect has increased.

次に、本発明により形成した皮膜について耐熱試験を
実施した結果を述べる。基盤材上に溶射皮膜を形成した
材料は、加熱冷却を加えることにより基盤材と皮膜間に
両者の熱膨張係数差に起因する熱応力が発生し、その結
果皮膜の剥離やクラックが発生する現象が生ずる。本試
験では、これらの現象に及ぼす基盤材表面上に形成した
凹部の影響を調べた。
Next, the results of a heat resistance test performed on the film formed according to the present invention will be described. In a material with a thermal spray coating formed on a base material, thermal stress is generated between the base material and the coating due to the difference in thermal expansion coefficient between the base material and the coating by heating and cooling, and as a result, the coating peels or cracks occur. Occurs. In this test, the influence of the concave portion formed on the surface of the base material on these phenomena was examined.

耐熱試験方法としては、まず試験片を電気炉中にセッ
トして高温、かつ真空中に一定時間保持した後、室温ま
で冷却し、試験片を取り出した。次に、取り出した試験
片について外観観察及び光学顕微鏡による断面観察(倍
率:100〜400倍)を行った。この時の試験条件として
は、温度は1600K及び2000K、保持時間は1時間、真空度
は2〜3×10-5torrである。
As a heat resistance test method, first, a test piece was set in an electric furnace, kept at a high temperature and in a vacuum for a certain time, cooled to room temperature, and taken out. Next, the removed test piece was observed for appearance and cross-section observed with an optical microscope (magnification: 100 to 400 times). As test conditions at this time, the temperature is 1600K and 2000K, the holding time is 1 hour, and the degree of vacuum is 2-3 × 10 -5 torr.

試験終了後取り出した試験片について調査した結果、
目視による外観観察では温度1600K及び2000Kのいずれの
場合でも本発明によって作製した試験片では、皮膜の剥
離、クラックの発生は見られず健全であった。一方、従
来方法により作製した試験片の場合、温度1600Kでは外
観上健全であったが、2000Kでは皮膜に大きなクラック
が発生し、一部皮膜の剥離が生じた。
As a result of investigating the test piece taken out after the end of the test,
Visual observation of the external appearance showed that the test piece prepared according to the present invention was sound without any peeling or cracking of the film at any of the temperatures of 1600K and 2000K. On the other hand, in the case of the test piece produced by the conventional method, the appearance was sound at 1600 K, but at 2000 K, a large crack occurred in the film, and the film was partially peeled.

また、皮膚の断面観察では1600K及び2000Kのいずれの
場合でも本発明によって作製した試験片では、微細なク
ラック(10μm以下)が発生しているが、皮膜の剥離は
なかった。一方、従来方法によるものは1600K,2000Kの
両方で大きなクラックが発生していた。この様にクラッ
クが微細になる理由は、本発明では基盤材の凹凸により
基盤材と皮膜の界面がすべりにくくなり、応力が分散し
て剥離や大きなクラックは発生せず、微細のクラックと
なると思われる。
Further, in the cross-sectional observation of the skin, in each of the test pieces prepared according to the present invention at 1600K and 2000K, fine cracks (10 μm or less) were generated, but no peeling of the film was observed. On the other hand, according to the conventional method, large cracks occurred at both 1600K and 2000K. The reason why the cracks are fine in this way is that in the present invention, the interface between the base material and the film becomes difficult to slip due to the unevenness of the base material, the stress is dispersed, and peeling and large cracks do not occur, and it is considered to be fine cracks. It is.

なお、前記の実施例において、基盤材としてグラファ
イトを使用したが、本発明は金属、セラミックス等にも
適用可能である。また、本発明はプラズマ溶射に限ら
ず、フレーム溶射、アーク溶射等その他の溶射法にも適
用可能である。また、溶射材として高融点材料に限ら
ず、他の金属やセラミックス等にも適用可能である。
In the above embodiment, graphite is used as the base material. However, the present invention can be applied to metals, ceramics, and the like. Further, the present invention is not limited to plasma spraying, but can be applied to other spraying methods such as flame spraying and arc spraying. Further, the thermal spraying material is not limited to a high melting point material, but can be applied to other metals, ceramics, and the like.

さらに、ブラスト処理時に基盤材表面を覆う多孔板に
ついて、孔の径、孔の形状、孔の配置、多孔板の厚さ等
の変形が考えられ、また、金網等の他の材質の適用も可
能である。
Furthermore, regarding the perforated plate that covers the base material surface during blasting, deformation such as the hole diameter, hole shape, hole arrangement, and perforated plate thickness can be considered, and other materials such as wire mesh can be applied. It is.

さらに、ブラスト処理方法として、ブラスト材の粒
径、ブラスト材の材質、圧縮空気の圧力、ブラストガン
と基盤材の距離、ブラストガンの移動速度、ブラストガ
ンの移動経路、パス数等の変形が考えられる。
Furthermore, as the blasting method, deformation such as the particle size of the blast material, the material of the blast material, the pressure of the compressed air, the distance between the blast gun and the base material, the moving speed of the blast gun, the moving path of the blast gun, the number of passes, etc. are considered. Can be

〔発明の効果〕〔The invention's effect〕

本発明によれば、ブラスト処理時に基盤材表面をスポ
ット的に凹凸をつけられるので、基盤材と皮膜の機械的
なかみ込みが良くなり、密着力の向上及び皮膜の剥離防
止に効果がある。
ADVANTAGE OF THE INVENTION According to this invention, since the base material surface can be made uneven in spots at the time of blasting, the mechanical engagement between the base material and the film is improved, which is effective in improving the adhesion and preventing the film from peeling.

従って、本発明は基盤材と皮膜の間に高い密着力が要
求される部材や加熱冷却により基盤材と皮膜間に大きな
熱応力が発生する部材等の溶射皮膜形成方法として有効
である。
Therefore, the present invention is effective as a method for forming a thermal sprayed coating on a member requiring a high adhesion between the base material and the coating or a member generating a large thermal stress between the base material and the coating by heating and cooling.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明方法により形成した溶射皮膜の断面模式
図、第2図は本発明による溶射皮膜形成方法を示す図、
第3図はブラストガン先端の移動経路図、第4図は本発
明のブラスト処理に用いた有孔平板の平面図、第5図は
基盤材表面に形成したブラスト深さと密着力の関係を示
す図である。 1……基盤材、2……溶射皮膜層、 3……凹部、4……基盤材表面の凹凸部、 5……グラファイト基盤材、 6……ブラストガン、 7……テフロンの平板、 8……高融点金属層、 9……高融点酸化物セラミックス層、 T……ブラストガン移動方向、 G……Al2O3粉末の流れ、 H……凹部の深さ、 R……ブラストガン先端の移動経路、 B……ブラスト開始位置、 E……ブラスト終了位置、 P……ピッチ、 D1……テフロン平板の外径、 D2……孔の外径。
FIG. 1 is a schematic cross-sectional view of a thermal spray coating formed by the method of the present invention, FIG. 2 is a view showing a thermal spray coating forming method according to the present invention,
FIG. 3 is a diagram showing the movement path of the tip of the blast gun, FIG. 4 is a plan view of a perforated flat plate used in the blasting process of the present invention, and FIG. 5 shows the relationship between the blast depth formed on the surface of the base material and the adhesion force. FIG. DESCRIPTION OF SYMBOLS 1 ... Base material, 2 ... Thermal spray coating layer, 3 ... Depression, 4 ... Unevenness on the surface of base material, 5 ... Graphite base material, 6 ... Blast gun, 7 ... Teflon flat plate, 8 ... ... refractory metal layer, 9 ...... refractory oxide ceramic layer, T ...... blast gun moving direction, G ...... Al 2 O 3 powder flow, the depth of the H ...... recess, R ...... blast gun tip of movement path, the outer diameter of B ...... blasting starting position, E ...... blast end position, P ...... pitch, D 1 the outer diameter of the ...... Teflon flat, D 2 ...... hole.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 伊庭 甫 茨城県日立市幸町3丁目1番1号 日立 ニュークリアエンジニアリング株式会社 内 (72)発明者 小沢 通裕 茨城県日立市幸町3丁目1番1号 株式 会社日立製作所日立工場内 (72)発明者 門田 二千男 茨城県日立市幸町3丁目1番1号 株式 会社日立製作所日立工場内 (72)発明者 小野 正博 茨城県日立市幸町3丁目1番1号 株式 会社日立製作所日立工場内 (56)参考文献 特開 平2−15975(JP,A) 特開 昭58−109270(JP,A) 特開 昭60−44267(JP,A) 特開 平1−193003(JP,A) 特開 昭60−230975(JP,A) 特開 昭60−50157(JP,A) (58)調査した分野(Int.Cl.6,DB名) B24C 3/32 B24C 1/00 B24C 1/04 C23C 4/02 ──────────────────────────────────────────────────続 き Continuing from the front page (72) Inventor: Fu Iba 3-1-1, Sachimachi, Hitachi City, Ibaraki Prefecture Within Hitachi Nuclear Engineering Co., Ltd. (72) Michihiro Ozawa 3-1-1, Sachimachi, Hitachi City, Ibaraki Prefecture No. 1 Inside Hitachi, Ltd. Hitachi Plant (72) Inventor Fumio Kadota 3-1-1 Sachimachi, Hitachi City, Ibaraki Prefecture Inside Hitachi Plant, Hitachi Plant (72) Inventor Masahiro Ono, Sachimachi, Hitachi City, Ibaraki Prefecture JP-A-2-15975 (JP, A) JP-A-58-109270 (JP, A) JP-A-60-44267 (JP, A) JP-A-1-193003 (JP, A) JP-A-60-230975 (JP, A) JP-A-60-50157 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) B24C 3/32 B24C 1/00 B24C 1/04 C23C 4/02

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】基盤表面に微粒子を吹きつけて小凹凸面を
形成する工程と、前記小凹凸面を有孔部材で覆う工程
と、微粒子を吹き付けて前記有孔部材の孔を通過した微
粒子によって前記小凹凸面を削って大凹凸面を形成する
工程と、溶融または半溶融状態の粉末を当該表面に溶射
して皮膜を形成する工程と、を含むことを特徴とする溶
射皮膜製造方法。
1. A step of spraying fine particles on a substrate surface to form a small uneven surface, a step of covering the small uneven surface with a perforated member, and a step of spraying the fine particles and passing fine particles through the holes of the perforated member. A method for producing a thermal spray coating, comprising: shaving the small uneven surface to form a large uneven surface; and spraying a molten or semi-molten powder onto the surface to form a film.
【請求項2】請求項1において、溶射皮膜の形成前の工
程を複数回繰り返すことを特徴とする溶射皮膜製造方
法。
2. A method for producing a thermal spray coating according to claim 1, wherein a step before forming the thermal spray coating is repeated a plurality of times.
JP33295890A 1990-11-29 1990-11-29 Thermal spray coating manufacturing method Expired - Fee Related JP2934911B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33295890A JP2934911B2 (en) 1990-11-29 1990-11-29 Thermal spray coating manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33295890A JP2934911B2 (en) 1990-11-29 1990-11-29 Thermal spray coating manufacturing method

Publications (2)

Publication Number Publication Date
JPH04201075A JPH04201075A (en) 1992-07-22
JP2934911B2 true JP2934911B2 (en) 1999-08-16

Family

ID=18260717

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33295890A Expired - Fee Related JP2934911B2 (en) 1990-11-29 1990-11-29 Thermal spray coating manufacturing method

Country Status (1)

Country Link
JP (1) JP2934911B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002081143A (en) * 2000-09-05 2002-03-22 Riken Light Metal Ind Co Ltd Expansion joint for floor
GB0612399D0 (en) * 2006-06-23 2006-08-02 Johnson Matthey Plc Improvements in coated materials
JP4983213B2 (en) * 2006-11-13 2012-07-25 旭硝子株式会社 Electroformed brick with metal coating and method for producing the same
US8726874B2 (en) * 2012-05-01 2014-05-20 Ford Global Technologies, Llc Cylinder bore with selective surface treatment and method of making the same
US9511467B2 (en) 2013-06-10 2016-12-06 Ford Global Technologies, Llc Cylindrical surface profile cutting tool and process

Also Published As

Publication number Publication date
JPH04201075A (en) 1992-07-22

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