JP2888697B2 - Hard substrate coating / prebaking equipment - Google Patents
Hard substrate coating / prebaking equipmentInfo
- Publication number
- JP2888697B2 JP2888697B2 JP14096692A JP14096692A JP2888697B2 JP 2888697 B2 JP2888697 B2 JP 2888697B2 JP 14096692 A JP14096692 A JP 14096692A JP 14096692 A JP14096692 A JP 14096692A JP 2888697 B2 JP2888697 B2 JP 2888697B2
- Authority
- JP
- Japan
- Prior art keywords
- coating
- substrate
- hard substrate
- drying
- bar
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Coating Apparatus (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ガラス基板を用いた液
晶表示板などの製造に用いられ、フォトレジストなどの
塗布液を硬基板に薄く均一に塗布した後、乾燥炉でプリ
ベ−クするための硬基板塗布・プリベ−ク装置に関する
ものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is used for manufacturing a liquid crystal display panel or the like using a glass substrate. A coating solution such as a photoresist is thinly and uniformly applied on a hard substrate and then prebaked in a drying oven. For applying and pre-baking a hard substrate.
【０００２】[0002]
【従来の技術】液晶板の製造工程の中には、ガラス基板
などの硬基板にフォトレジストなどの塗布液を薄く均一
な厚さに塗布する工程がある。例えばカラー液晶板の製
造においては、透明電極を予め形成したガラス基板に、
フォトレジストの機能を有する赤のカラ−モザイク液を
均一に塗布した後、露光して赤に対応するカラ−モザイ
クを硬化させ、余分の液を除去することにより赤のカラ
ーモザイクを形成している。そしてこれと同様な処理を
緑、青などの他の色について繰り返している。このよう
にフォトレジストとなる塗布液を塗布する場合、この液
は均一な厚さ（例えば２μ±５％程度）に厳密に管理し
て薄く塗布する必要がある。この塗布の厚さが不均一で
あると、光の透過率のむらが生じ、品質の低下を招くこ
とになるからである。2. Description of the Related Art In a manufacturing process of a liquid crystal plate, there is a process of applying a coating liquid such as a photoresist to a thin and uniform thickness on a hard substrate such as a glass substrate. For example, in the production of a color liquid crystal plate, a transparent electrode is formed on a glass substrate in advance,
After uniformly applying a red color mosaic liquid having the function of a photoresist, the color mosaic corresponding to red is cured by exposure, and a red color mosaic is formed by removing excess liquid. . The same processing is repeated for other colors such as green and blue. When a coating liquid to be a photoresist is applied as described above, it is necessary to strictly control this liquid to a uniform thickness (for example, about 2 μ ± 5%) and to apply the thin liquid. This is because if the thickness of the coating is non-uniform, the light transmittance becomes uneven, which leads to a deterioration in quality.
【０００３】従来はこの塗布のためにスピンコータが用
いられていた。このスピンコータは回転させた基板の回
転中心付近に塗布液を滴下し、この液を遠心力を利用し
て飛散させることにより塗布するものである。しかしこ
のスピンコータを用いる方法では基板の交換に手間取り
作業能率が悪くなるばかりでなく、飛散して捨てられる
液の量が増えることになる。このためコストアップにな
るという問題があった。Conventionally, a spin coater has been used for this coating. In this spin coater, a coating liquid is dropped near a rotation center of a rotated substrate, and the liquid is applied by scattering using a centrifugal force. However, in the method using the spin coater, not only the time and labor efficiency for replacing the substrate are deteriorated, but also the amount of the liquid scattered and discarded increases. For this reason, there was a problem that the cost was increased.
【０００４】そこで水平に配設された上下一対のローラ
間に基板を挟んで塗布する装置を用いることが考えられ
ている。この装置は下のローラとなるバーの下部を塗布
液に浸漬し、このバーとこの上方に位置する押圧ロ−ル
との間に基板を挟んで送りながら、バーにより基板の下
面に塗布するものである。In view of this, it has been considered to use an apparatus for coating a substrate between a pair of upper and lower rollers disposed horizontally. In this apparatus, the lower part of a bar serving as a lower roller is immersed in a coating liquid, and the substrate is sandwiched between the bar and a pressing roll located above the bar, and is fed onto the lower surface of the substrate by a bar. It is.
【０００５】またこのように塗布した硬基板は、乾燥炉
においてプリベ−クされてからラック（収納棚）にスト
ックされる。このプリベ−ク工程は、約９０℃の温度雰
囲気内で加熱して、塗布液の揮発性成分を除去するもの
である。なおこの硬基板は現像の前にもう一度ベ−クさ
れる。The hard substrate thus coated is prebaked in a drying oven and then stocked on a rack (storage shelf). In this prebaking step, heating is performed in an atmosphere at a temperature of about 90 ° C. to remove volatile components of the coating solution. The hard substrate is baked again before development.
【０００６】このプリベ−ク工程において、硬基板の塗
布面を下にして下から複数のピンで支持しながら間欠的
に順送りする間欠搬送手段を用いることが考えられてい
る。この搬送手段によれば、所定時間ごとに硬基板を送
るので、パスロ−ルなどの連続搬送手段に比べてゴミの
発生が少なくなり、製品の歩止まりが向上するからであ
る。In this pre-baking step, it has been considered to use an intermittent conveying means for intermittently feeding the hard substrate intermittently while supporting the substrate with a plurality of pins from below. According to this transport means, since the hard substrate is fed at predetermined time intervals, the generation of dust is reduced as compared with a continuous transport means such as a pass roll, and the yield of products is improved.
【０００７】[0007]
【従来技術の問題点】しかしこのプリベ−ク工程では、
間欠搬送手段のピンなどの支持体が硬基板の下面に接触
したまま加熱されるため、硬基板はこの支持体の接触部
付近で温度分布が不均一になる。このために塗布が不均
一になり品質低下を招くという問題があった。However, in this prebaking process,
Since the support such as a pin of the intermittent transfer means is heated while being in contact with the lower surface of the hard substrate, the hard substrate has an uneven temperature distribution near the contact portion of the support. For this reason, there has been a problem that the coating becomes non-uniform and the quality is reduced.
【０００８】なお前記スピンコ−タを用いた場合には高
速回転に伴って塗布面の自然乾燥が行われて半乾燥状態
となる。このため前記のような間欠搬送による問題はほ
とんど発生しない。しかし前記のロ−ラを用いた塗布の
場合にはこの問題が顕著になる。When the above-mentioned spin coater is used, the coating surface is naturally dried with a high-speed rotation to be in a semi-dry state. Therefore, the problem caused by the intermittent conveyance hardly occurs. However, this problem becomes remarkable in the case of application using the above-mentioned rollers.
【０００９】[0009]
【発明の目的】本発明はこのような事情に鑑みなされた
ものであり、バ−と押圧ロ−ルとを用いて塗布液を塗布
した後、間欠搬送手段を有する乾燥炉においてプリベ−
クする場合に、間欠搬送手段の支持材が基板に接触する
ことにより塗布が不均一になることを防止し、品質を向
上させることができる硬基板塗布・プリベ−ク装置を提
供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and after applying a coating solution using a bar and a pressing roll, the pre-coating is performed in a drying furnace having intermittent conveying means.
The object of the present invention is to provide a hard substrate coating / prebaking apparatus capable of preventing uneven application due to contact of a support material of an intermittent conveying means with a substrate when the substrate is contacted and improving quality. And
【００１０】[0010]
【発明の構成】本発明によればこの目的は、塗布液槽に
上部を残して水平に浸漬されたバーと、このバーの上方
に配設された押圧ロ−ルとの間に硬基板を挟持して送る
ことにより、前記硬基板の下面に塗布液を塗布する塗布
部と、前記硬基板をプリベ−クする乾燥炉とを備える硬
基板塗布・プリベ−ク装置において、前記乾燥炉に設け
られ前記硬基板の非塗布面を第１および第２の支持体に
より交互に下から支持し両支持体の相対移動により前記
硬基板を間欠的に送る間欠搬送手段と、前記塗布部と乾
燥炉との間に設けられ前記硬基板の塗布面を加熱せずに
乾燥する予備乾燥部とを備えることを特徴とする硬基板
塗布・プリベ−ク装置、により達成される。ここに予備
乾燥は、塗布した基板を所定時間待機させたり所定距離
移動させながら自然乾燥させることができる。また送風
機により塗布面を強制的に乾燥させるようにしてもよ
い。According to the present invention, an object of the present invention is to provide a hard substrate between a bar immersed horizontally leaving its upper part in a coating solution tank and a pressing roll disposed above the bar. A hard substrate coating and pre-baking apparatus including a coating unit for coating the lower surface of the hard substrate with a coating solution and a drying furnace for pre-baking the hard substrate. An intermittent transporting means for alternately supporting the non-coated surface of the hard substrate from below with a first and a second support and sending the hard substrate intermittently by relative movement of the two supports; the coating unit and a drying furnace And a pre-drying unit for drying the coated surface of the hard substrate without heating the coating surface. Here, in the preliminary drying, the coated substrate can be naturally dried while waiting for a predetermined time or moving a predetermined distance. Further, the application surface may be forcibly dried by a blower.
【００１１】[0011]
【実施例】図１は本発明の実施例を示す図、図２は間欠
搬送手段の概念を示す図である。FIG. 1 is a view showing an embodiment of the present invention, and FIG. 2 is a view showing the concept of an intermittent conveying means.
【００１２】図１において符号１０はラックであり、一
定間隔を保持しつつ多数のガラス基板１２を収容する。
ガラス基板１２は搬入ロボット（図示せず）によって上
から１枚づつ取り出され（搬入Ａ）、反転装置（図示せ
ず）で表裏が反転される（反転Ｂ）。この反転されたガ
ラス基板１２はパスロ−ル１４によって塗布部１６に搬
送される。In FIG. 1, reference numeral 10 denotes a rack for accommodating a large number of glass substrates 12 while maintaining a constant interval.
The glass substrate 12 is taken out one by one from above by a carry-in robot (not shown) (load-in A), and turned upside down by a reversing device (not shown) (reversal B). The inverted glass substrate 12 is conveyed to a coating unit 16 by a pass roll 14.
【００１３】塗布部１６は本願の出願人が特願平３−１
３０７０号、同３−１３０７１、同３−１３０７２、同
３−１３０７３、同３−１３０７４等において提案した
ものと基本的には同じ構造を有する。すなわち小径のバ
−１８と、その上方に対向する大径の押圧ロ−ル２０
と、バ−１８の上部を残してほぼ全体が浸漬される塗布
液槽２２とを有する。ガラス基板１２はその下面の左右
縁をパスロ−ル１４のロ−ラに載せた状態で図１で左か
ら右に送られる。The coating section 16 is disclosed in Japanese Patent Application No. Hei.
No. 3070, No. 3-13071, No. 3-13072, No. 3-13073, and No. 3-13074 have basically the same structure. That is, a small-diameter bar 18 and a large-diameter pressing roll 20 opposing thereabove.
And a coating liquid tank 22 in which almost the entirety of the coating liquid except for the upper part of the bar 18 is immersed. The glass substrate 12 is fed from left to right in FIG. 1 with the left and right edges of the lower surface placed on rollers of a pass roll 14.
【００１４】ここに用いる塗布液としては、例えばＥＣ
Ａ（エキル・セルソルブモノエチル・アセテ−ト）を溶
剤とし、２４〜２５重量％の顔料などを溶かし込んだカ
ラ−モザイク液が用いられる。The coating solution used here is, for example, EC
Color mosaic solution in which 24 to 25% by weight of a pigment or the like is dissolved using A (equill cellosolve monoethyl acetate) as a solvent is used.
【００１５】バ−１８の一端は塗布液槽２２から突出
し、この突出端には自在継手を介して電動モ−タが接続
されている。このモ−タにより、バ−１８に接触して送
られるガラス基板１２の送り速度が、パスロ−ル１４と
同速になるように制御される。押圧ロ−ル２０の表面は
導電性ゴムで作られ、バ−１８との間にガラス基板１２
を所定の挟圧力で挟むように保持されている。One end of the bar 18 protrudes from the coating solution tank 22, and an electric motor is connected to the protruding end via a universal joint. By this motor, the feeding speed of the glass substrate 12 sent in contact with the bar 18 is controlled so as to be the same as the pass roll 14. The surface of the pressing roll 20 is made of conductive rubber, and the glass substrate 12 is located between the pressing roll 20 and the bar 18.
Is held so as to be held at a predetermined holding pressure.
【００１６】従ってパスロ−ル１４により図１で左側か
ら右側へ送られるガラス基板１２は、バ−１８と押圧ロ
−ル２０との間に進入する。バ−１８の表面にはその回
転により塗布液槽２２の塗布液が付着しているから、こ
のバ−１８の回転に伴いガラス基板１２の下面にこの塗
布液が塗布されて行く。塗布液槽２２の液面のレベル
と、押圧ロ−ル２０による挟圧力とは一定に管理されて
いるから、ガラス基板１２の下面の塗布される液の厚さ
は十分に薄くかつ高精度に管理され得る（塗布Ｃ）。Accordingly, the glass substrate 12 sent from the left to the right in FIG. 1 by the pass roll 14 enters between the bar 18 and the pressing roll 20. Since the coating liquid in the coating liquid tank 22 adheres to the surface of the bar 18 due to its rotation, the coating liquid is applied to the lower surface of the glass substrate 12 with the rotation of the bar 18. Since the level of the liquid surface of the coating liquid tank 22 and the pinching pressure by the pressing roll 20 are controlled to be constant, the thickness of the liquid to be coated on the lower surface of the glass substrate 12 is sufficiently thin and accurately. Can be controlled (application C).
【００１７】このように塗布液が塗布されると反転装置
によって再び表裏が反転される（反転Ｄ）。従って塗布
面が上に、非塗布面が下になる。この状態で予備乾燥部
２４に入る（予備乾燥Ｅ）。When the coating liquid is applied in this manner, the reversing device reverses the front and back sides (reversal D). Therefore, the application surface is on the top and the non-application surface is on the bottom. In this state, it enters the preliminary drying section 24 (preliminary drying E).
【００１８】この予備乾燥部２４は塗布面を上にしたガ
ラス基板１２Ａの上方を覆うケ−ス２６と、このケ−ス
２６の上面に設けられ周囲の空気をケ−ス２６内に送り
込む送風機２８とを備える。この送風機２８は周囲の空
気すなわち非加熱空気をガラス基板１２Ａの塗布面に導
く。このため塗布部１６で塗布された直後のガラス基板
１２Ａから揮発成分を速やかに除去し、半乾燥状態にす
る。ここに送風機２８による風が塗布面上の塗布液に風
紋を発生させないように、風量や風の強さなどを設定す
る。The pre-drying section 24 includes a case 26 which covers the upper side of the glass substrate 12A with the coating surface facing upward, and a blower which is provided on the upper surface of the case 26 and sends ambient air into the case 26. 28. The blower 28 guides ambient air, that is, unheated air, to the coating surface of the glass substrate 12A. For this reason, volatile components are immediately removed from the glass substrate 12A immediately after being applied by the application unit 16, and the glass substrate 12A is brought into a semi-dry state. Here, the amount of air, the strength of the wind, and the like are set so that the wind from the blower 28 does not generate wind ripples on the application liquid on the application surface.
【００１９】このようにして塗布液が半乾燥されたガラ
ス基板１２は乾燥炉３０に入る。この乾燥炉３０は間欠
搬送手段３２により間欠的に送られるガラス基板１２
を、赤外線ランプ等のヒ−タ３４によって加熱し乾燥す
る。この乾燥工程は約９０℃に加熱して行われ、露光前
のベ−クと区別するためプリベ−クという（Ｆ）。The glass substrate 12 on which the coating liquid has been semi-dried enters the drying furnace 30. The drying furnace 30 is provided with the glass substrate 12 which is intermittently fed by the intermittent conveying means 32.
Is dried by heating with a heater 34 such as an infrared lamp. This drying step is performed by heating to about 90 ° C., which is called a pre-bake (F) to distinguish it from the bake before exposure.
【００２０】間欠搬送手段３２は、図２に示すように、
ガラス基板１２の非塗布面（下面）を支持する第１の支
持材としての複数のピン３６と、第２の支持材としての
左右一対の可動ビ−ム３８とを有する。ピン３６は基台
と一体の支持板４０に植設され、１枚のガラス基板１２
は複数のピン３６で水平に支持される。As shown in FIG. 2, the intermittent conveying means 32
It has a plurality of pins 36 as a first support member for supporting the non-coating surface (lower surface) of the glass substrate 12 and a pair of left and right movable beams 38 as a second support member. The pins 36 are implanted on a support plate 40 integrated with the base, and the glass substrate 12
Is horizontally supported by a plurality of pins 36.
【００２１】可動ビ−ム３８は支持板４０の両側に位置
し、全体が一体となって上下および前後進する。すなわ
ち左右の可動ビ−ム３８を貫通する適宜数のロッド４２
は、ガイドレ−ル４４上を前後進する一方、このガイド
レ−ル４４はカム４６によって上下動する。ここにガイ
ドレ−ル４４にはプ−リ４８、４８が取付けられ、ここ
に巻掛けたワイヤ５０がロッド４２に固定され、一方の
プ−リ４８がサ−ボモ−タ５２で回転駆動される。この
ためモ−タ５２、プ−リ４８の回転によりワイヤ５０が
往復動し、これと共にロッド４２、可動ビ−ム３８が前
後に往復動する。The movable beam 38 is located on both sides of the support plate 40 and moves up and down and back and forth as a whole. That is, an appropriate number of rods 42 penetrating the left and right movable beams 38
Moves forward and backward on the guide rail 44, and the guide rail 44 is moved up and down by a cam 46. Here, pulleys 48, 48 are attached to the guide rail 44, and a wire 50 wound around the guide rail 44 is fixed to the rod 42. One pulley 48 is driven to rotate by a servo motor 52. . Therefore, the wire 50 reciprocates by the rotation of the motor 52 and the pulley 48, and the rod 42 and the movable beam 38 reciprocate back and forth.
【００２２】またガイドレ−ル４４の下面にはカム４
６、４６が接触し、両カム４６、４６はリンク５４によ
り同期して回動する。一方のカム４６はサ−ボモ−タ５
６により駆動される。従ってモ−タ５６により一方のカ
ム４６が回動すると他方のカム４６も同期して回動し、
ガイドレ−ル４４を水平に保ったまま上下動させる。A cam 4 is provided on the lower surface of the guide rail 44.
6 and 46 come into contact with each other, and both cams 46 and 46 are synchronously rotated by the link 54. One cam 46 is a servo motor 5
6 driven. Therefore, when one of the cams 46 is rotated by the motor 56, the other cam 46 is also rotated synchronously,
The guide rail 44 is moved up and down while being kept horizontal.
【００２３】このようにして可動ビ−ム３８は、図２に
矢印ａ、ｂ、ｃ、ｄで示すように、上昇、前進、下降、
後退の各動作を行う。この結果上昇ａでビ−ム３８は基
板１２の下面に接触して基板１２をピン３６から浮かせ
て持ち上げる。次の前進ｂではビ−ム３８と共に基板１
２が前進し、下降ｃではビ−ム３８は基板１２から離れ
基板１２を一定距離送り方向に離れたピン３６に支持さ
せる。そして基板１２をここに残してビ−ム３８は後退
ｄにおいて最初の位置に復帰する。以上のようにビ−ム
３８を移動させることにより基板１２を間欠的に送る。In this manner, the movable beam 38 is raised, moved forward, lowered, as shown by arrows a, b, c, d in FIG.
Perform each retreat operation. As a result, the beam 38 comes into contact with the lower surface of the substrate 12 and lifts the substrate 12 by lifting the substrate 12 from the pins 36 at the rise a. In the next advance b, the substrate 1 is moved together with the beam 38.
2 moves forward and in the descending c, the beam 38 is separated from the substrate 12 and the substrate 12 is supported by the pins 36 which are separated by a predetermined distance in the feed direction. The beam 38 returns to the initial position in the retreat d while leaving the substrate 12 here. The substrate 12 is intermittently fed by moving the beam 38 as described above.
【００２４】乾燥炉３０で約９０℃の雰囲気中でプリベ
−クされた基板１２は、ロボット（図示せず）によって
ラック５８に収納されストックされる（ストックＧ）。
このようにラック５８に入った基板は、さらにベ−クさ
れてから露光工程に入る。露光された後洗浄され所定パ
タ−ンのカラ−モザイクが形成される。The substrate 12 prebaked in the drying furnace 30 at about 90 ° C. is stored in a rack 58 by a robot (not shown) and stocked (stock G).
The substrate that has entered the rack 58 in this manner is further baked before entering the exposure process. After exposure, it is washed to form a color mosaic of a predetermined pattern.
【００２５】この実施例は予備乾燥部２４では送風機２
８により風を強制的に送って基板１２の塗布面を乾燥さ
せるから、予備乾燥に要する時間を短縮でき、装置の稼
働率を向上できる。しかし本発明は送風機２８を用いる
ことなく放置したり一定速度で移動させながら自然乾燥
させるものであってもよい。In this embodiment, in the preliminary drying section 24, the blower 2
Since the air is forcibly sent by 8 to dry the coated surface of the substrate 12, the time required for the preliminary drying can be reduced, and the operation rate of the apparatus can be improved. However, the present invention may be a device that is left without using the blower 28 or is naturally dried while moving at a constant speed.
【００２６】図３はこのように自然乾燥させる実施例を
示す図である。この実施例において予備乾燥部２４Ａは
十分に長い搬送路６０を持ち、ここに基板１２を移動さ
せることにより自然乾燥させるものである。なおこの実
施例では予備乾燥（Ｅ）の後で基板１２を反転（Ｄ）さ
せているが、予備乾燥（Ｅ）の前に反転（Ｄ）させても
よい。FIG. 3 is a diagram showing an embodiment in which air is thus dried naturally. In this embodiment, the preliminary drying section 24A has a sufficiently long transport path 60, and the substrate 12 is moved here to dry naturally. In this embodiment, the substrate 12 is inverted (D) after the preliminary drying (E), but may be inverted (D) before the preliminary drying (E).
【００２７】[0027]
【実験例】３００ｍｍ×３００ｍｍの基板１２にカラ−
モザイク液をタクト３０秒で塗布する場合について実験
を行った。図３に示した自然乾燥の場合には予備乾燥部
２４Ａには約４．５ｍの距離（２４０秒に相当）を設け
ることにより均一な乾燥が可能であった。また図１に示
した送風機２８を用いた場合には、予備乾燥部２４は約
２．４ｍ（９０秒に相当）の距離で足りた。[Experimental example] A substrate 12 of 300 mm x 300 mm was colored.
An experiment was conducted on a case where the mosaic liquid was applied in a tact time of 30 seconds. In the case of natural drying shown in FIG. 3, uniform drying was possible by providing a distance of about 4.5 m (corresponding to 240 seconds) in the preliminary drying section 24A. When the blower 28 shown in FIG. 1 was used, the preliminary drying unit 24 was sufficient at a distance of about 2.4 m (corresponding to 90 seconds).
【００２８】[0028]
【発明の効果】請求項１の発明は以上のように、ロ−ラ
を用いた塗布部と、間欠搬送手段を用いた乾燥炉との間
に、加熱せずに塗布面を乾燥する予備乾燥部を設けたか
ら、間欠搬送手段の第１、第２の支持体が基板に接触す
ることにより不均一な温度分布が発生しても、塗布面が
不均一になることがなくなる。このため製品の品質を向
上できる。According to the first aspect of the present invention, there is provided a predrying method for drying a coating surface without heating between a coating unit using a roller and a drying furnace using an intermittent conveying means. Since the unit is provided, even if an uneven temperature distribution occurs due to the first and second supports of the intermittent conveying means coming into contact with the substrate, the coating surface does not become uneven. Therefore, the quality of the product can be improved.
【００２９】ここに予備乾燥は、周囲の雰囲気中に所定
時間放置して自然乾燥させてもよいが（請求項２）、送
風機により風を強制的に当てれば乾燥時間は短縮でき装
置の稼働率が向上し生産性が向上する（請求項３）。Here, the preliminary drying may be carried out by allowing it to stand in the surrounding atmosphere for a predetermined period of time to dry naturally (claim 2). And productivity is improved (claim 3).
【００３０】[0030]
【図１】本発明の一実施例を示す図FIG. 1 shows an embodiment of the present invention.
【図２】間欠搬送手段を示す図FIG. 2 is a diagram showing an intermittent transport unit.
【図３】他の実施例を示す図FIG. 3 is a diagram showing another embodiment.
１２ ガラス基板 １６ 塗布部 １８ バ− ２０ 押圧ロ−ル ２２ 塗布液槽 ２４、２４Ａ 予備乾燥部 ２８ 送風機 ３０ 乾燥炉 ３２ 間欠搬送手段 ３６ 第１の支持材としてのピン ３８ 第２の支持材としての可動ビ−ム DESCRIPTION OF SYMBOLS 12 Glass substrate 16 Coating part 18 Bar 20 Pressing roll 22 Coating liquid tank 24, 24A Predrying part 28 Blower 30 Drying furnace 32 Intermittent conveyance means 36 Pin as a first support material 38 Pin as a second support material Movable beam
フロントページの続き (51)Int.Cl.6 識別記号 ＦＩ Ｈ０１Ｌ 21/30 ５６６ (72)発明者 尾崎 正文 神奈川県綾瀬市小園1005番地 富士マイ クログラフイックス株式会社内 (72)発明者 江本 辰弥 神奈川県綾瀬市小園1005番地 富士マイ クログラフイックス株式会社内 (56)参考文献 特開 平３−101294（ＪＰ，Ａ) (58)調査した分野(Int.Cl.6，ＤＢ名) B05C 1/02 102 B05C 9/12 - 9/14 B05C 13/00 G03F 7/16 501 H01L 21/027 Continued on the front page (51) Int.Cl. 6 Identification symbol FI H01L 21/30 566 (72) Inventor Masafumi Ozaki 1005 Kozono, Ayase-shi, Kanagawa Prefecture Inside Fuji My Chromaix Inc. (72) Inventor Tatsuya Emoto Kanagawa 1005 Koizono, Ayase-shi, Japan Fujimi Chromaix Co., Ltd. (56) References JP-A-3-101294 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) B05C 1/02 102 B05C 9/12-9/14 B05C 13/00 G03F 7/16 501 H01L 21/027
Claims (3)
たバーと、このバーの上方に配設された押圧ロ−ルとの
間に硬基板を挟持して送ることにより、前記硬基板の下
面に塗布液を塗布する塗布部と、前記硬基板をプリベ−
クする乾燥炉とを備える硬基板塗布・プリベ−ク装置に
おいて、前記乾燥炉に設けられ前記硬基板の非塗布面を
第１および第２の支持体により交互に下から支持し両支
持体の相対移動により前記硬基板を間欠的に送る間欠搬
送手段と、前記塗布部と乾燥炉との間に設けられ前記硬
基板の塗布面を加熱せずに乾燥する予備乾燥部とを備え
ることを特徴とする硬基板塗布・プリベ−ク装置。1. A hard substrate is sandwiched and sent between a bar immersed horizontally with its upper part left in a coating solution tank and a pressing roll disposed above the bar. A coating section for coating a coating liquid on the lower surface of the substrate;
A non-coating surface of the hard substrate provided in the drying furnace, the first and second supports alternately supporting the non-coated surface of the hard substrate from below. An intermittent transport unit for intermittently sending the hard substrate by relative movement, and a preliminary drying unit provided between the coating unit and a drying furnace and drying the coated surface of the hard substrate without heating. Substrate coating and pre-baking apparatus.
自然乾燥する請求項１の硬基板塗布・プリベ−ク装置。2. The hard substrate coating / prebaking apparatus according to claim 1, wherein the preliminary drying section naturally dries the coated hard substrate for a predetermined time.
送風機を備える請求項１の硬基板塗布・プリベ−ク装
置。3. The hard substrate coating / prebaking apparatus according to claim 1, wherein the preliminary drying section includes a blower for sending unheated air to the coating surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14096692A JP2888697B2 (en) | 1992-05-06 | 1992-05-06 | Hard substrate coating / prebaking equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14096692A JP2888697B2 (en) | 1992-05-06 | 1992-05-06 | Hard substrate coating / prebaking equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05309301A JPH05309301A (en) | 1993-11-22 |
| JP2888697B2 true JP2888697B2 (en) | 1999-05-10 |
Family
ID=15280966
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14096692A Expired - Fee Related JP2888697B2 (en) | 1992-05-06 | 1992-05-06 | Hard substrate coating / prebaking equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2888697B2 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008311250A (en) * | 2007-06-12 | 2008-12-25 | Tokyo Electron Ltd | Reflow system and reflow method |
| JP4936567B2 (en) * | 2009-09-18 | 2012-05-23 | 東京エレクトロン株式会社 | Heat treatment equipment |
| JP2011120991A (en) * | 2009-12-09 | 2011-06-23 | Tdk-Lambda Corp | Curing device |
| WO2012008218A1 (en) * | 2010-07-12 | 2012-01-19 | シャープ株式会社 | Heating/drying apparatus for manufacturing film, film manufacturing apparatus provided with the heating/drying apparatus, and film manufacturing method |
| CN107321568A (en) * | 2017-08-18 | 2017-11-07 | 嘉兴亿豪新材料有限公司 | A kind of aluminium sheet gradation roll-on device |
| CN110124931A (en) * | 2019-05-29 | 2019-08-16 | 瑞安市佳源机械有限公司 | Splash guard gluing special production line |
-
1992
- 1992-05-06 JP JP14096692A patent/JP2888697B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05309301A (en) | 1993-11-22 |
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