JP2888185B2 - UV oxidation equipment - Google Patents
UV oxidation equipmentInfo
- Publication number
- JP2888185B2 JP2888185B2 JP8009918A JP991896A JP2888185B2 JP 2888185 B2 JP2888185 B2 JP 2888185B2 JP 8009918 A JP8009918 A JP 8009918A JP 991896 A JP991896 A JP 991896A JP 2888185 B2 JP2888185 B2 JP 2888185B2
- Authority
- JP
- Japan
- Prior art keywords
- ultraviolet
- oxidation
- lamp
- pure water
- wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007254 oxidation reaction Methods 0.000 title claims description 38
- 230000003647 oxidation Effects 0.000 title claims description 37
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 36
- 238000007539 photo-oxidation reaction Methods 0.000 claims description 24
- 239000003054 catalyst Substances 0.000 claims description 19
- 239000000126 substance Substances 0.000 claims description 14
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 13
- 238000005342 ion exchange Methods 0.000 claims description 11
- 230000005587 bubbling Effects 0.000 claims description 6
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 6
- 239000012498 ultrapure water Substances 0.000 claims description 6
- 230000001590 oxidative effect Effects 0.000 claims description 5
- 230000002093 peripheral effect Effects 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000007800 oxidant agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 27
- 238000000034 method Methods 0.000 description 8
- 239000005416 organic matter Substances 0.000 description 7
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 5
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 4
- 239000003456 ion exchange resin Substances 0.000 description 4
- 229920003303 ion-exchange polymer Polymers 0.000 description 4
- 150000001450 anions Chemical class 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- -1 for example Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000006864 oxidative decomposition reaction Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 239000003957 anion exchange resin Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011437 continuous method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、超純水の製造工程
において、純水中に含まれる有機物の紫外線酸化処理に
用いる紫外線酸化装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultraviolet oxidizing apparatus used for an ultraviolet oxidizing treatment of an organic substance contained in pure water in a process of producing ultrapure water.
【０００２】[0002]
【従来の技術】半導体製造工業等において、洗浄水等の
用途に有機物、各種イオン等の不純物を極めて低いレベ
ルにまで低下させた純水の利用が盛んになってきてお
り、純水を更に高純度化した超純水も利用されるに至っ
ている。2. Description of the Related Art In the semiconductor manufacturing industry and the like, pure water in which impurities such as organic substances and various ions have been reduced to extremely low levels has been actively used for cleaning water and the like, and the use of pure water has been further increased. Purified ultrapure water has also been used.
【０００３】超純水の製造工程においては、ｐｐｂレベ
ルの全有機炭素（ＴＯＣ）での有機物の混入までも問題
視されるようになってきており、近年微量有機分の除去
方法についての種々の検討がなされ、その結果として、
紫外線（ＵＶ）酸化処理を利用した有機物の分解除去工
程が盛んに導入されている。[0003] In the production process of ultrapure water, it has become a problem to mix organic substances in total organic carbon (TOC) at the ppb level, and in recent years, various methods for removing trace organic components have been considered. Was considered, and as a result,
2. Description of the Related Art Organic matter decomposition and removal processes using ultraviolet (UV) oxidation have been actively introduced.
【０００４】純水の製造装置は一般的にはイオン交換装
置を主体として構成されており、ｐｐｂレベルでの有機
物の除去効果は期待できない。そこで、イオン交換装置
での各種イオンを除去して得られる純水中に含まれる有
機物に、紫外線を照射してこれを酸化分解し、ＣＯＯＨ
-、Ｈ2ＣＯ3 -等の陰イオンに変化させる工程を紫外線
（ＵＶ）酸化装置によって行い、この紫外線酸化処理に
よって生じたイオンを後段に設けたイオン交換装置で除
去することでＴＯＣのｐｐｂレベルまでの低下を実現す
る方法が注目されている。[0004] A pure water producing apparatus is generally constituted mainly of an ion exchange apparatus, and an effect of removing organic substances at a ppb level cannot be expected. Therefore, the organic matter contained in pure water obtained by removing various ions in the ion exchange device is irradiated with ultraviolet rays to oxidize and decompose the organic matter, thereby obtaining COOH.
-, H 2 CO 3 - or the like is performed by the step of changing the anion ultraviolet (UV) oxidation apparatus, ppb level TOC by removing ions produced by the UV oxidation process with an ion exchange device provided in the subsequent stage Attention has been focused on how to achieve this.
【０００５】ＵＶ酸化装置自体の構造は、図３に示すと
おりで、ステンレス製のＵＶ処理層３１の中に管状の高
圧紫外線（ＵＶ）ランプ３２が設置されており、被処理
水中の微量有機物がＵＶ照射により分解される。また、
その酸化分解を促進する目的で、被処理水中には槽の前
段の過酸化水素注入口３０から過酸化水素が混合され、
さらには、槽内に設けたエアバブラ３３からエアまたは
オゾンが槽内の被処理水中にバブリングされる。[0005] The structure of the UV oxidation apparatus itself is as shown in FIG. 3, in which a tubular high-pressure ultraviolet (UV) lamp 32 is installed in a stainless steel UV treatment layer 31, and trace organic substances in the water to be treated are removed. Decomposed by UV irradiation. Also,
For the purpose of accelerating the oxidative decomposition, hydrogen peroxide is mixed into the water to be treated from the hydrogen peroxide injection port 30 in the former stage of the tank,
Further, air or ozone is bubbled from the air bubbler 33 provided in the tank into the water to be treated in the tank.
【０００６】ＵＶ酸化装置内で処理された水は、処理槽
３１の後段に設置されたイオン交換装置３４に送り込ま
れ、有機物の酸化分解で生じた陰イオンがイオン交換樹
脂３５によって除去される。[0006] The water treated in the UV oxidizer is sent to an ion exchanger 34 provided at a stage subsequent to the treatment tank 31, and anions generated by oxidative decomposition of organic substances are removed by an ion exchange resin 35.
【０００７】[0007]
【発明が解決しようとする課題】上述したＵＶ酸化装置
における紫外線照射手段としての紫外線（ＵＶ）ランプ
としては、通常、高圧ＵＶランプが使われている。しか
し、高圧ＵＶランプを用いた酸化処理では、 ａ）高圧ＵＶランプの消費電力が大きい、 ｂ）高圧ＵＶランプには寿命があり、定期的な交換が必
要であるにも拘らず単価が高い、 ｃ）高圧ＵＶランプによる紫外線照射での酸化効果を十
分なものにするためには過酸化水素の混合や、エアやオ
ゾンのバプリングが必要である、等の理由によってラン
ニングコストが高いという問題があった。A high-pressure UV lamp is usually used as an ultraviolet (UV) lamp as an ultraviolet irradiation means in the above-mentioned UV oxidation apparatus. However, in the oxidation treatment using a high-pressure UV lamp, a) the power consumption of the high-pressure UV lamp is large, b) the high-pressure UV lamp has a life, and the unit price is high despite the need for periodic replacement. c) There is a problem that the running cost is high due to reasons such as mixing of hydrogen peroxide and bubbling of air or ozone in order to make the oxidation effect by ultraviolet irradiation by the high-pressure UV lamp sufficient. Was.
【０００８】本発明はかかる従来技術における問題に鑑
みなされたものであり、その目的はランニングコストの
低減を可能とするＵＶ酸化装置を提供することにある。The present invention has been made in view of the problems in the prior art, and an object of the present invention is to provide a UV oxidizer capable of reducing running costs.
【０００９】[0009]
【課題を解決するための手段】上記目的を達成し得る本
発明の紫外線（ＵＶ）酸化装置は、半導体製造に用いら
れる純水を処理水とし、その純水中に含まれる有機物を
酸化分解する紫外線ランプと、前記純水を内包し、前記
紫外線ランプの中心軸と同軸をなした内壁に光酸化触媒
を保持させた紫外線処理槽と、前記紫外線ランプ近傍で
空気のバブリングを発生させて前記有機物の酸化を促進
して該有機物をイオン化させるエアバブラとを有するこ
とを特徴とする。SUMMARY OF THE INVENTION An ultraviolet (UV) oxidizing apparatus according to the present invention, which can achieve the above object, is used in semiconductor manufacturing.
And pure water treated water, and the ultraviolet lamp decomposes oxidation organic matter contained in the pure water, and containing the pure water, is held a photooxidation catalyst to the central axis and an inner wall which forms a coaxial of the UV lamp Bubbling of air near the ultraviolet treatment tank and the ultraviolet lamp to promote oxidation of the organic matter
And an air bubbler for ionizing the organic substance .
【００１０】ＵＶ処理槽内壁に光酸化触媒を保持させた
ことで、ＵＶランプの近傍だけでなくＵＶ処理槽内壁表
面においても有機物のＵＶ酸化が効率的に行われ、被処
理水としての微量有機物を含む純水の単位処理流量当り
のＵＶランプの出力を低減させたり、前段で混合する過
酸化水素の量や被処理水にバブリングするエアやオゾン
の量を低減させることが可能となる。また、同一照射条
件において、光酸化触媒をＵＶ処理槽内壁に保持させな
い場合と比べて、本発明のＵＶ酸化装置では酸化処理時
間を短縮したり、ＵＶ処理槽の容積を拡大でき、単位時
間当りの処理量を増大させることが可能となる。その結
果、ＵＶ酸化処理におけるランニングコストの総合的な
低減が可能となる。[0010] By holding the photo-oxidation catalyst on the inner wall of the UV processing tank, UV oxidation of organic substances is efficiently performed not only in the vicinity of the UV lamp but also on the inner wall surface of the UV processing tank. It is possible to reduce the output of the UV lamp per unit processing flow rate of pure water containing, and to reduce the amount of hydrogen peroxide mixed in the preceding stage and the amount of air and ozone bubbled into the water to be treated. In addition, under the same irradiation conditions, compared with the case where the photo-oxidation catalyst is not held on the inner wall of the UV treatment tank, the UV oxidation apparatus of the present invention can shorten the oxidation treatment time and enlarge the volume of the UV treatment tank, and Can be increased. As a result, the running cost in the UV oxidation treatment can be reduced overall.
【００１１】[0011]
【発明の実施の形態】光酸化触媒としては、例えばＴｉ
Ｏ2等を挙げることができる。ＵＶ処理槽内壁への光酸
化触媒の保持は、光酸化触媒自体が吸着性のものであれ
ば、それを適当な方法で処理槽内壁に吸着させて行うこ
とができる。また、光酸化触媒がそれ自身吸着性を有さ
ない場合でも、本発明の効果を損なわない範囲内で、吸
着性を有する適当な担体やバインダーと混合して処理槽
内壁への保持を達成できる。バインダーとしては、例え
ばポリテトラフルオロエチレン（例えばデュポン社の商
品名：テフロン）等を用いることができる。光酸化触媒
のＵＶ処理槽内壁への保持には、例えば、適当な溶媒
に、光酸化触媒を、必要に応じてバインダーと共に分散
あるいは溶解させた塗布用液を調製し、これをＵＶ処理
槽内壁の所定の位置に塗布して乾燥等の処理によって被
膜化させる方法などが利用できる。DETAILED DESCRIPTION OF THE INVENTION As a photo-oxidation catalyst, for example, Ti
O 2 and the like can be mentioned. The holding of the photo-oxidation catalyst on the inner wall of the UV treatment tank can be performed by adsorbing the photo-oxidation catalyst on the inner wall of the treatment tank by an appropriate method as long as the photo-oxidation catalyst itself is adsorbent. Further, even when the photooxidation catalyst does not itself have adsorptivity, it can be retained on the inner wall of the treatment tank by mixing with a suitable carrier or binder having adsorptivity within a range that does not impair the effects of the present invention. . As the binder, for example, polytetrafluoroethylene (for example, trade name: Teflon of DuPont) or the like can be used. To hold the photo-oxidation catalyst on the inner wall of the UV treatment tank, for example, a coating solution in which the photo-oxidation catalyst is dispersed or dissolved together with a binder, if necessary, in an appropriate solvent is prepared, and this is coated on the inner wall of the UV treatment tank. And a method of forming a film by a treatment such as drying.
【００１２】ＵＶ処理槽内壁への光酸化触媒の保持にお
いては、光酸化触媒が関与する酸化反応がＵＶ処理装置
内の広範にわたって生じる、すなわち、被処理水と光酸
化触媒との接触面積ができる限り広くなる位置に保持さ
せることが好ましい。更に、ＵＶ処理槽の構造自体をそ
の内壁面積が、ＵＶランプと内壁との距離が必要以上に
遠くならない範囲内で最大となるようにすることで、よ
り効率良い酸化処理を達成することができる。In holding the photo-oxidation catalyst on the inner wall of the UV treatment tank, an oxidation reaction involving the photo-oxidation catalyst occurs over a wide range in the UV treatment apparatus, that is, a contact area between the water to be treated and the photo-oxidation catalyst is formed. It is preferable to keep the position as wide as possible. Further, by making the structure of the UV treatment tank itself such that the inner wall area is maximized within a range in which the distance between the UV lamp and the inner wall does not become longer than necessary, more efficient oxidation treatment can be achieved. .
【００１３】本発明のＵＶ酸化装置での処理は、有機物
を含む純水からの有機物の除去工程に好適に利用でき、
なかでも、純水のＴＯＣをｐｐｂレベルにまで低下させ
るための処理に特に好適である。処理する純水のグレー
ドとしては、例えばＡＳＴＭＤ ５１２７−９０で規定
されているＴｙｐｅ Ｅ−１レベルの超純水での純度向
上に有効である。[0013] The treatment in the UV oxidation apparatus of the present invention can be suitably used in a step of removing organic substances from pure water containing organic substances.
Above all, it is particularly suitable for processing for reducing the TOC of pure water to the ppb level. As a grade of the pure water to be treated, for example, it is effective in improving the purity of ultrapure water of Type E-1 level specified in ASTM D5127-90.
【００１４】[0014]
【実施例】以下、実施例により本発明を更に詳細に説明
する。 実施例１ 図１は、本発明の第１の実施例の概要をイオン交換装置
との接続状態において示す図である。このＵＶ酸化装置
は、過酸化水素注入口１０、ステンレス等の材料で構成
されたＵＶ処理槽１１、高圧ＵＶランプ１２、エアバブ
ラ１３及びＴｉＯ2膜１４を有して構成されている。過
酸化水素注入口にはバルブが設置されており、被処理水
に混合される過酸化水素の供給量が調節できるようにな
っている。エアバブラ１３はポンプ等を有する気体供給
手段と接続されており、酸化処理を促進可能な空気を、
所定の圧力及び通気量で被処理水中へバブリング可能と
なっている。The present invention will be described in more detail with reference to the following examples. Embodiment 1 FIG. 1 is a diagram showing an outline of a first embodiment of the present invention in a state of connection with an ion exchange device. The UV oxidizing apparatus includes a hydrogen peroxide inlet 10, a UV treatment tank 11 made of a material such as stainless steel, a high-pressure UV lamp 12, an air bubbler 13, and a TiO 2 film 14. A valve is provided at the hydrogen peroxide inlet so that the supply amount of hydrogen peroxide mixed with the water to be treated can be adjusted. The air bubbler 13 is connected to gas supply means having a pump or the like, and supplies air capable of promoting oxidation treatment to air.
It is possible to bubble into the water to be treated at a predetermined pressure and air flow rate.
【００１５】ＵＶ処理槽１１は、長管状の高圧ＵＶラン
プの中心軸と同軸をなす、すなわち周側面内壁の各点が
ＵＶランプと等距離をなす円筒状の形状を有する。高圧
ＵＶランプとＵＶ処理槽の円筒状部分における周側面内
壁との距離は、ＴｉＯ2膜による光酸化触媒作用が効果
的に得られる距離とされ、ＵＶランプの照射強度、被処
理水中の有機物量等に応じて設定される。The UV processing tank 11 has a cylindrical shape that is coaxial with the central axis of the long tubular high-pressure UV lamp, that is, each point on the inner wall on the peripheral side is equidistant from the UV lamp. The distance between the high-pressure UV lamp and the inner peripheral wall of the cylindrical portion of the UV treatment tank is a distance at which the photooxidation catalysis by the TiO 2 film can be effectively obtained, the irradiation intensity of the UV lamp, and the amount of organic matter in the water to be treated. It is set according to the like.
【００１６】この装置では、酸化槽内壁全面にＴｉＯ2
膜を設けたことで、酸化槽内壁に設けられたＴｉＯ2膜
上でも光酸化が行われ、ＴｉＯ2膜がない場合に比べて
より効率的な光酸化処理が可能となる。その結果、Ｔｉ
Ｏ2膜を設けない場合に比較して、処理時間の短縮、過
酸化水素やバブリングの量の低減、ＵＶランプ出力の低
減あるいは酸化槽容積の拡大などを図ることができ、ラ
ンニングコストの効果的な低減が可能となる。In this apparatus, TiO 2 is applied to the entire inner wall of the oxidation tank.
By providing the film, photo-oxidation is also performed on the TiO 2 film provided on the inner wall of the oxidation tank, so that more efficient photo-oxidation treatment can be performed as compared with the case where no TiO 2 film is provided. As a result, Ti
Compared to the case without an O 2 film, the processing time can be reduced, the amount of hydrogen peroxide and bubbling can be reduced, the output of the UV lamp can be reduced, or the volume of the oxidation tank can be increased, and the running cost can be reduced. It is possible to achieve a significant reduction.
【００１７】ＵＶ処理槽の内壁に設けられたＴｉＯ2膜
は、塗布法により形成されたものである。The TiO 2 film provided on the inner wall of the UV processing tank is formed by a coating method.
【００１８】この装置におけるＵＶ酸化処理は、例え
ば、過酸化水素注入口１０のバルブを開放して、過酸化
水素溶液の所定量を注入しつつＵＶ処理槽１１内にイオ
ン交換処理等によって得た微量の有機物を含む純水を充
填し、ポンプを作動してエアバブラ１３からエアまたは
オゾンを所定の通気量でバブリングしながらＵＶランプ
１２からＵＶ照射することによって行うことができる。The UV oxidation treatment in this apparatus is performed by, for example, opening the valve of the hydrogen peroxide injection port 10 and injecting a predetermined amount of the hydrogen peroxide solution into the UV treatment tank 11 by ion exchange treatment or the like. It can be performed by filling pure water containing a trace amount of organic matter, and irradiating UV from the UV lamp 12 while operating the pump and bubbling air or ozone from the air bubbler 13 at a predetermined air flow rate.
【００１９】この酸化処理は、所定の処理時間経過後に
処理済みの純水の全量を後段のイオン交換工程へ移行さ
せるバッチ式、槽内への被処理水の供給と処理済み水の
排出を所定の滞留時間が得られるように調節して連続的
に行う連続式などの種々の制御方式で行うことができ
る。This oxidation treatment is a batch type in which the whole amount of treated pure water is transferred to a subsequent ion exchange step after a lapse of a prescribed treatment time, and the supply of treated water into the tank and the discharge of treated water are controlled by a prescribed method. , And a variety of control methods such as a continuous method in which the residence time is continuously adjusted.
【００２０】ＵＶ酸化処理された純水は、後段のイオン
交換装置３４に送られ、ＵＶ酸化で有機物から生じた陰
イオンが陰イオン交換樹脂３５によって除去され、ｐｐ
ｂレベルまでＴＯＣが低下した超純水を得ることができ
る。The pure water that has been subjected to the UV oxidation is sent to an ion exchange unit 34 at the subsequent stage, where anions generated from organic substances by the UV oxidation are removed by an anion exchange resin 35, and pp
It is possible to obtain ultrapure water whose TOC has decreased to the b level.
【００２１】実施例２ 図２は本発明の第２の実施例の概要をイオン交換装置と
の接続状態において示す図である。このＵＶ酸化装置
は、基本的には図１で示した装置と同じ構成を有する
が、ＵＶ処理槽２１の円筒状部分の周側面の内壁部分に
凹凸を設けることで、被処理水とＴｉＯ2膜との接触面
積をより大きくして、更に効果的な酸化処理を可能とし
たものである。Embodiment 2 FIG. 2 is a diagram showing an outline of a second embodiment of the present invention in a state of connection with an ion exchange device. This UV oxidation apparatus has basically the same configuration as the apparatus shown in FIG. 1, but by providing irregularities on the inner wall portion of the peripheral side surface of the cylindrical portion of the UV processing tank 21, the water to be treated and the TiO 2 The contact area with the film is made larger to enable more effective oxidation treatment.
【００２２】図２の例では、円筒形状部分の軸方向にお
ける断面が波形となるようにその周側面を成型したもの
が利用されているが、この凹凸形状はこれに限定され
ず、例えば、円筒状部分の中心軸に垂直な断面において
波形を形成するものであってもよい。更に、凹凸の形状
自身も、凸部の頂部や凹部の底部が曲面を構成するもの
や、角部からなるものなど種々の形状とすることができ
る。加工性等を考慮した場合は、図２に示すような断面
が波形のものが好ましい。In the example shown in FIG. 2, a shape in which the peripheral side surface is molded so that the cross section in the axial direction of the cylindrical portion has a waveform is used. However, this uneven shape is not limited to this. A waveform may be formed in a cross section perpendicular to the central axis of the shape portion. Further, the shape of the unevenness itself can be various shapes such as a shape in which the top of the projection or the bottom of the recess forms a curved surface, or a shape in which the top has a corner. In consideration of workability and the like, it is preferable that the cross section as shown in FIG. 2 is corrugated.
【００２３】凹凸を設ける場合のこれらの間隔あるいは
凹部と凸部との高低差は、高圧ＵＶランプとの距離が最
大となる位置において所望の光酸化触媒効果が得られ、
しかもＴｉＯ2膜と被処理水との接触面積を最大にする
ことができるものが好ましい。このように、ＵＶ処理槽
の内壁面に凹凸を設けたことにより、ＴｉＯ2膜の表面
積をより大きく、すなわち被処理水とＴｉＯ2膜との接
触面積をより大きくして、酸化処理効率を更に上昇させ
ることができる。In the case where the unevenness is provided, these gaps or the difference in height between the concave portion and the convex portion are such that a desired photo-oxidation catalytic effect can be obtained at a position where the distance from the high-pressure UV lamp is maximized.
In addition, a material that can maximize the contact area between the TiO 2 film and the water to be treated is preferable. As described above, the unevenness is provided on the inner wall surface of the UV treatment tank, so that the surface area of the TiO 2 film is increased, that is, the contact area between the water to be treated and the TiO 2 film is increased, thereby further improving the oxidation treatment efficiency. Can be raised.
【００２４】[0024]
【発明の効果】以上説明したように、本発明のＵＶ酸化
装置によれば、ＵＶ処理槽内壁面に光酸化触媒を保持さ
せたことにより、光酸化反応をＵＶランプ近傍だけでな
くＵＶ処理槽内壁面上でも盛んに進行させることがで
き、従来法に比較し、単位流量当りのＵＶランプの出力
を減少させることができ、更には酸化促進のために前段
で混合される過酸化水素量及びエアもしくはオゾンのバ
ブリング量を減少させることが可能となる。また、同一
出力のＵＶランプを用いた場合にはＵＶ処理槽の容積を
より大きくしたり、処理時間を短縮することで単位時間
当りの処理量を増加させることができる。その結果、Ｕ
Ｖ酸化処理で問題となっているランニングコストの総合
的な低減を図ることができる。As described above, according to the UV oxidation apparatus of the present invention, since the photooxidation catalyst is held on the inner wall surface of the UV processing tank, the photooxidation reaction can be performed not only near the UV lamp but also in the UV processing tank. It can be actively promoted even on the inner wall surface, the output of the UV lamp per unit flow can be reduced as compared with the conventional method, and the amount of hydrogen peroxide mixed in the former stage to promote oxidation and The amount of bubbling of air or ozone can be reduced. When a UV lamp having the same output is used, the volume per unit time can be increased by increasing the volume of the UV processing tank or shortening the processing time. As a result, U
The running cost, which is a problem in the V oxidation treatment, can be reduced comprehensively.
【図１】本発明の第１の実施例の概要を示す断面図であ
る。FIG. 1 is a sectional view showing an outline of a first embodiment of the present invention.
【図２】本発明の第２の実施例の概要を示す断面図であ
る。FIG. 2 is a sectional view showing an outline of a second embodiment of the present invention.
【図３】従来におけるＵＶ酸化装置の概要を示す断面図
である。FIG. 3 is a sectional view showing an outline of a conventional UV oxidation apparatus.
１０ 過酸化水素注入口 １１ ＵＶ処理槽 １２ 高圧ＵＶランプ １３ エアバブラ １４ ＴｉＯ2膜 １５ イオン交換装置 １６ イオン交換樹脂 ２０ 過酸化水素注入口 ２１ ＵＶ処理槽 ２２ 高圧ＵＶランプ ２３ エアバブラ ２４ ＴｉＯ2膜 ２５ イオン交換装置 ２６ イオン交換樹脂 ３０ 過酸化水素注入口 ３１ ＵＶ処理槽 ３２ 高圧ＵＶランプ ３３ エアバブラ ３４ イオン交換装置 ３５ イオン交換樹脂DESCRIPTION OF SYMBOLS 10 Hydrogen peroxide injection port 11 UV processing tank 12 High pressure UV lamp 13 Air bubbler 14 TiO 2 film 15 Ion exchange device 16 Ion exchange resin 20 Hydrogen peroxide injection port 21 UV processing tank 22 High pressure UV lamp 23 Air bubbler 24 TiO 2 film 25 ions Exchange device 26 Ion exchange resin 30 Hydrogen peroxide injection port 31 UV treatment tank 32 High pressure UV lamp 33 Air bubbler 34 Ion exchange device 35 Ion exchange resin
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6，ＤＢ名) C02F 1/32 B01J 21/06 B01J 35/02 C02F 1/42 C02F 1/74 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 6 , DB name) C02F 1/32 B01J 21/06 B01J 35/02 C02F 1/42 C02F 1/74
Claims (6)
る有機物を酸化分解する紫外線ランプと、前記純水を内
包し、前記紫外線ランプの中心軸と同軸をなした内壁に
光酸化触媒を保持させた紫外線処理槽と、前記紫外線ラ
ンプ近傍で空気のバブリングを発生させて前記有機物の
酸化を促進して該有機物をイオン化させるエアバブラと
を有することを特徴とする紫外線酸化装置。Holding a 1. A semiconductor organic ultraviolet decomposing oxidation lamp contained in the pure water used in the production, it encloses the pure water, the photooxidation catalyst to the central axis and an inner wall which forms a coaxial of the UV lamp An ultraviolet oxidation apparatus, comprising: an ultraviolet treatment tank that has been processed; and an air bubbler that generates air bubbling near the ultraviolet lamp to promote oxidation of the organic substance and ionize the organic substance .
凹凸を設け、前記純水と前記光酸化触媒との接触面積を
より大きくした請求項１に記載の紫外線酸化装置。2. The ultraviolet oxidizing apparatus according to claim 1, wherein irregularities are provided on the inner wall on the peripheral side surface of the ultraviolet processing tank to increase a contact area between the pure water and the photooxidation catalyst.
項１または２に記載の紫外線酸化装置。3. The ultraviolet oxidation apparatus according to claim 1, wherein the photo-oxidation catalyst is TiO 2 .
壁上に形成した被膜中に含まれる請求項１〜３のいずれ
かに記載の紫外線酸化装置。4. The ultraviolet oxidation apparatus according to claim 1, wherein the photooxidation catalyst is contained in a film formed on an inner wall of the ultraviolet treatment tank.
壁上に被膜を形成している請求項１〜４のいずれかに記
載の紫外線酸化装置。5. The ultraviolet oxidation apparatus according to claim 1, wherein the photooxidation catalyst forms a coating on the inner wall of the ultraviolet treatment tank.
酸化装置と、該紫外線酸化装置から供給される純水をイ
オン交換処理して超純水を得るためのイオン交換装置と
を有することを特徴とする純水からの有機物除去装置。6. An ultraviolet oxidizer according to any one of claims 1 to 5, and an ion exchanger for ion-exchanging pure water supplied from the ultraviolet oxidizer to obtain ultrapure water. An apparatus for removing organic substances from pure water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8009918A JP2888185B2 (en) | 1996-01-24 | 1996-01-24 | UV oxidation equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8009918A JP2888185B2 (en) | 1996-01-24 | 1996-01-24 | UV oxidation equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09192659A JPH09192659A (en) | 1997-07-29 |
| JP2888185B2 true JP2888185B2 (en) | 1999-05-10 |
Family
ID=11733483
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8009918A Expired - Fee Related JP2888185B2 (en) | 1996-01-24 | 1996-01-24 | UV oxidation equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2888185B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011105205A1 (en) | 2010-02-24 | 2011-09-01 | 宇部興産株式会社 | Ultraviolet oxidation device, ultrapure water production device using same, ultraviolet oxidation method, and ultrapure water production method |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR19990045899A (en) * | 1999-02-08 | 1999-06-25 | 임정욱 | Aaaaa |
| WO2004046038A2 (en) * | 2002-11-20 | 2004-06-03 | Povl Kaas | A method and an apparatus for purifying water by photo-chemical oxidation |
| KR100661373B1 (en) * | 2004-12-30 | 2006-12-27 | 매그나칩 반도체 유한회사 | Ashing method and appartus using Photocatalyst |
| NO328918B1 (en) * | 2008-08-18 | 2010-06-14 | Sinvent As | Method and system for removing organic matter in liquids |
| JP6016114B2 (en) * | 2013-01-18 | 2016-10-26 | 株式会社リコー | Fluid purification device |
| CN107129020A (en) * | 2017-06-27 | 2017-09-05 | 苏州艾特斯环保材料有限公司 | A kind of device of novel process industrial wastewater organic matter |
| JP6906259B1 (en) * | 2020-08-06 | 2021-07-21 | Ｆｋｋ株式会社 | Sterilizer |
| DE102020126529A1 (en) | 2020-10-09 | 2022-04-14 | TruTraTec GmbH | Wastewater treatment reactor |
-
1996
- 1996-01-24 JP JP8009918A patent/JP2888185B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011105205A1 (en) | 2010-02-24 | 2011-09-01 | 宇部興産株式会社 | Ultraviolet oxidation device, ultrapure water production device using same, ultraviolet oxidation method, and ultrapure water production method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH09192659A (en) | 1997-07-29 |
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