JP2833762B2 - Glass substrate drying equipment - Google Patents
Glass substrate drying equipmentInfo
- Publication number
- JP2833762B2 JP2833762B2 JP63234832A JP23483288A JP2833762B2 JP 2833762 B2 JP2833762 B2 JP 2833762B2 JP 63234832 A JP63234832 A JP 63234832A JP 23483288 A JP23483288 A JP 23483288A JP 2833762 B2 JP2833762 B2 JP 2833762B2
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- drying
- rotating plate
- gas
- center
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Drying Of Solid Materials (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
【発明の詳細な説明】 （産業上の利用分野） 本発明は、液晶表示板（以下LCD）などに用いるガラ
ス基板を回転させて両面同時に乾燥する乾燥装置に関す
るものである。Description: TECHNICAL FIELD The present invention relates to a drying apparatus for rotating a glass substrate used for a liquid crystal display (hereinafter, referred to as an LCD) or the like to simultaneously dry both surfaces thereof.
（発明の背景） LCDの製造過程においては、LCDのガラス基板を純水
（蒸留水等）の洗浄液で洗浄する工程がある。例えば、
その表面に樹脂（例えばポリビニルアルコールやポリイ
ミド）の配向膜を塗布して焼成した後に洗浄する。ま
た、LCDのガラス基板に薄膜トランジスタなどの素子を
一体に形成する場合には、真空蒸着や電子ビーム蒸着、
スパッタリングなど種種の処理が行われ、その間におい
てガラス基板を洗浄する必要が度々生じる。BACKGROUND OF THE INVENTION In the process of manufacturing an LCD, there is a step of cleaning a glass substrate of the LCD with a cleaning solution of pure water (such as distilled water). For example,
The surface is coated with an alignment film of a resin (for example, polyvinyl alcohol or polyimide), baked, and then washed. In addition, when an element such as a thin film transistor is integrally formed on a glass substrate of an LCD, vacuum evaporation, electron beam evaporation,
Various processes such as sputtering are performed, during which time it is often necessary to clean the glass substrate.
このように洗浄したガラス基板は洗浄液（純水）中に
漬けておき、次の工程に入る前に洗浄液中から取り出し
て乾燥しなければならないが、従来はガラス基板を洗浄
液から取り出して回転板に保持し、この状態で回転板を
高速で回転させ、この時の遠心力により表裏両面に付着
した洗浄液を除去するようにしていた。しかしこの方法
ではガラス基板の回転中心には遠心力が発生しないた
め、この回転中心に洗浄液が残ってしまうという問題が
あった。またこのガラス基板を回転板に固定するのにガ
ラス基板の下面を真空を利用して吸引するものもある
が、この場合には真空吸引する吸盤が当る部分で乾燥が
不完全になるという問題があった。The glass substrate thus cleaned must be immersed in a cleaning liquid (pure water) and taken out of the cleaning liquid and dried before entering the next step. Conventionally, the glass substrate is taken out of the cleaning liquid and put on a rotating plate. The rotating plate was rotated at a high speed in this state, and the washing liquid attached to the front and back surfaces was removed by the centrifugal force at this time. However, in this method, there is no centrifugal force generated at the center of rotation of the glass substrate, and there is a problem that the cleaning liquid remains at the center of rotation. In order to fix the glass substrate to the rotating plate, there is also a method in which the lower surface of the glass substrate is suctioned by using a vacuum, but in this case, there is a problem that drying is incomplete at a portion where a suction cup to be suctioned is applied. there were.
（発明の目的） 本発明はこのような事情に鑑みなされたものであり、
ガラス基板を高速で回転させることによりガラス基板の
表裏両面を同時に乾燥させる場合に、回転中心も確実に
乾燥させ、かつ裏面も確実に乾燥させることができるガ
ラス基板の乾燥装置を提供することを目的とするもので
ある。(Object of the Invention) The present invention has been made in view of such circumstances,
An object of the present invention is to provide a drying apparatus for a glass substrate that can surely dry both the center of rotation and the back side when the front and back surfaces of the glass substrate are simultaneously dried by rotating the glass substrate at a high speed. It is assumed that.
（発明の構成） 本発明によればこの目的は、四角形のガラス基板の表
裏両面を同時に乾燥するガラス基板の乾燥装置におい
て、垂直な軸を中心に回転し上面が平坦かつ前記ガラス
基板の短辺長よりも大径な円形の回転板と、この回転板
の周縁付近から放射状に延び前記ガラス基板をその４隅
の直交する２辺で水平方向に挟みかつ４隅の下面を下方
から支持することにより前記回転板の上方に所定の間隙
をあけて水平に保持する４本の支持腕と、このガラス基
板の表および裏の回転中心付近に向ってほぼ垂直に乾燥
用の気体を噴出する上下一対の噴出ノズルとを備え、上
噴出ノズルからガラス基板の上面に噴出される乾燥用の
気体の圧力を下噴出ノズルからガラス基板の下面に噴出
される乾燥用の気体の圧力よりも大きくしたことを特徴
とするガラス基板の乾燥装置により達成される。(Constitution of the Invention) According to the present invention, an object of the present invention is to provide a glass substrate drying apparatus for simultaneously drying both front and back surfaces of a rectangular glass substrate, wherein the glass substrate is rotated about a vertical axis, has a flat upper surface, and has a short side of the glass substrate. A circular rotating plate having a diameter larger than the length thereof, and the glass substrate extending radially from the periphery of the rotating plate, horizontally sandwiching the glass substrate between two orthogonal sides of the four corners, and supporting the lower surface of the four corners from below. And a pair of upper and lower arms for ejecting a drying gas substantially vertically toward the vicinity of the center of rotation on the front and back of the glass substrate, and four support arms for holding horizontally horizontally with a predetermined gap above the rotating plate. And that the pressure of the drying gas ejected from the upper ejection nozzle to the upper surface of the glass substrate is higher than the pressure of the drying gas ejected from the lower ejection nozzle to the lower surface of the glass substrate. Feature This is achieved by an apparatus for drying a glass substrate.
（実施例） 第１図は本発明の一実施例の一部を断面した側面図、
第２図は平面図である。(Embodiment) FIG. 1 is a side sectional view of a part of one embodiment of the present invention,
FIG. 2 is a plan view.
これらの図で符号10は水平な回転板であり、この回転
板10は電動モータ12により回転される。このモータ12の
回転軸14は中空な筒状であり、回転軸14の上端が回転板
10の裏面中心に接続されている。回転軸14内の通路14a
はこの回転板10の中心に向って垂直上向きに開口する下
噴出ノズル16に連通している。In these figures, reference numeral 10 denotes a horizontal rotating plate, which is rotated by an electric motor 12. The rotating shaft 14 of the motor 12 is a hollow cylinder, and the upper end of the rotating shaft 14 is a rotating plate.
It is connected to the center of the back of 10. Passage 14a in rotating shaft 14
Communicates with a lower ejection nozzle 16 that opens vertically upward toward the center of the rotary plate 10.
回転板10は上面が平坦かつ円形でありその直径は後記
ガラス基板26の短辺長よりも大きい。この回転板10の周
縁付近には４個の支持腕18が略放射状に固定されてい
る。各支持腕18の先端には横腕20が固定され、支持腕18
と横腕20とが略Ｔ字型を形成する。各支持腕18にはほぼ
垂直に起立する支持ピン22が植設され、また横腕20の両
端には支持ピン22よりも長いピン24が植設されている。
26は長方形のガラス基板であり、このガラス基板26の４
隅の直交する２辺を、各横腕20の２本のピン24で水平方
向に挟むことによって回転板10に保持される。この時ガ
ラス基板26の下面は４本の支持ピン22の上端に当接し、
ガラス基板26と回転板10との間に所定の間隙が形成され
る。従ってこのガラス基板26は回転板10と一体となって
垂直な軸を中心にして水平面上で回転する。The rotating plate 10 has a flat upper surface and a circular shape, and the diameter thereof is larger than the short side length of the glass substrate 26 described later. Near the periphery of the rotating plate 10, four support arms 18 are fixed substantially radially. At the tip of each support arm 18, a horizontal arm 20 is fixed.
And the lateral arm 20 form a substantially T-shape. A support pin 22 that stands substantially vertically is implanted in each support arm 18, and pins 24 longer than the support pin 22 are implanted at both ends of the lateral arm 20.
Reference numeral 26 denotes a rectangular glass substrate.
The two orthogonal sides of the corner are held by the rotating plate 10 by sandwiching the two pins 24 of each lateral arm 20 in the horizontal direction. At this time, the lower surface of the glass substrate 26 contacts the upper ends of the four support pins 22,
A predetermined gap is formed between the glass substrate 26 and the rotating plate 10. Accordingly, the glass substrate 26 rotates integrally with the rotating plate 10 on a horizontal plane about a vertical axis.
28は上噴出ノズルであり、ガラス基板26の上方からそ
の回転中心に向って垂直下向きに開口している。前記下
噴出ノズル16とこの上噴出ノズル28には乾燥用の気体、
例えば不活性ガス（窒素ガス、アルゴンガスなど）が供
給され、これらの気体はガラス基板26の下面と上面の中
心に向って垂直に噴出する。なおこの時、上噴出ノズル
28から噴出する気体圧力は下噴出ノズル16の気体圧力よ
り高く設定し、ガラス基板26が両ノズル28、16からの気
体圧力差を利用して回転板10に押圧されるようにすれ
ば、真空吸引力を利用する従来装置のようにガラス基板
26下面に吸盤を吸着させることなく、ガラス基板26を回
転板10に確実に固定できる。Reference numeral 28 denotes an upper ejection nozzle which opens vertically downward from above the glass substrate 26 toward the rotation center thereof. A gas for drying is provided to the lower ejection nozzle 16 and the upper ejection nozzle 28,
For example, an inert gas (nitrogen gas, argon gas, or the like) is supplied, and these gases are ejected vertically toward the center of the lower surface and the upper surface of the glass substrate 26. At this time, the upper ejection nozzle
If the gas pressure ejected from the nozzle 28 is set higher than the gas pressure of the lower ejection nozzle 16 and the glass substrate 26 is pressed against the rotating plate 10 using the gas pressure difference between the two nozzles 28 and 16, a vacuum A glass substrate like a conventional device that uses suction
The glass substrate 26 can be reliably fixed to the rotating plate 10 without sucking the suction cup to the lower surface 26.
また下噴出ノズル16からガラス基板10の下面に噴出さ
れた気体はガラス基板26と回転板10との間隙に案内され
て周囲に飛散するが、回転板10はガラス基板26の短辺長
より大径でこの間隙の周辺部には大きな遠心力が作用し
てこの大きな遠心力が間隙を介して中央付近にも作用す
るから、下噴出ノズル16から噴出される気体は少ない流
量でガラス基板10の下面を効率良く乾燥させることがで
きる。このため下噴出ノズル16からの気体圧力を上噴出
ノズル28の気体圧力より低く設定してもガラス基板10の
下面の乾燥が不十分になるなどの不都合が生じることが
ない。The gas ejected from the lower ejection nozzle 16 to the lower surface of the glass substrate 10 is guided to the gap between the glass substrate 26 and the rotating plate 10 and scatters around, but the rotating plate 10 is longer than the short side of the glass substrate 26. Since a large centrifugal force acts on the periphery of this gap in the diameter and this large centrifugal force also acts near the center through the gap, the gas ejected from the lower ejection nozzle 16 can reduce the flow rate of the glass substrate 10 with a small flow rate. The lower surface can be dried efficiently. For this reason, even if the gas pressure from the lower ejection nozzle 16 is set lower than the gas pressure of the upper ejection nozzle 28, no inconvenience such as insufficient drying of the lower surface of the glass substrate 10 occurs.
次にこの実施例の動作を説明する。例えばLCDの製造
過程において洗浄したガラス基板26を洗浄液中から取り
出して乾燥するためには、このガラス基板26を回転板10
上に置き、ピン24により４辺を挟むと共に下面を支持ピ
ン22上端に当接させる。この状態で必要があればさらに
ガラス基板26に純水などの洗浄液をスプレーした後、モ
ータ12を始動する。これと共に各噴出ノズル16、28から
乾燥用の気体を所定圧力で噴出されれば、気体はガラス
基板26の回転中心に当たる。このためガラス基板26の表
裏両面の中心に付着していた洗浄液はこの気体により周
囲に飛散される。ガラス基板26は高速で回転しているか
らその表裏両面に付着した洗浄液は遠心力によって速や
かに周囲に飛散する。この結果回転中心に洗浄液が残る
ことなく両面を確実かつ均一に乾燥させることができ
る。Next, the operation of this embodiment will be described. For example, in order to take out the glass substrate 26 that has been cleaned during the LCD manufacturing process from the cleaning liquid and dry it,
It is placed on the upper side, the four sides are sandwiched by the pins 24, and the lower surface is brought into contact with the upper ends of the support pins 22. In this state, if necessary, the cleaning liquid such as pure water is sprayed on the glass substrate 26, and then the motor 12 is started. At the same time, if a gas for drying is ejected from the ejection nozzles 16 and 28 at a predetermined pressure, the gas hits the rotation center of the glass substrate 26. Therefore, the cleaning liquid adhering to the center of the front and back surfaces of the glass substrate 26 is scattered around by the gas. Since the glass substrate 26 is rotating at a high speed, the cleaning liquid adhering to the front and back surfaces is quickly scattered around by the centrifugal force. As a result, both surfaces can be surely and uniformly dried without the cleaning liquid remaining at the rotation center.
ここにガラス基板26と回転板10との間には水平な間隙
が形成されているので、下噴出ノズル16から噴出される
気体はこの間隙に導かれて外径方向に高速で飛散する。
この時回転板10の直径が十分大きいので、ガラス基板下
面の中心付近には、回転板の周縁付近に発生する大きな
遠心力がこの間隙によって導かれるから、ガラス基板10
の下面の気体を外径方向に円滑に流動させることができ
る。このため下噴出ノズル16から噴出する気体圧力を上
噴出ノズル28から噴出する気体圧力よりも低くすること
が可能になり、両噴出ノズル16、28の噴出圧力の差を利
用してガラス基板26をピン22、24に確実に保持しつつ乾
燥処理を行うことができる。Here, since a horizontal gap is formed between the glass substrate 26 and the rotating plate 10, the gas ejected from the lower ejection nozzle 16 is guided to this gap and scatters at high speed in the outer diameter direction.
At this time, since the diameter of the rotating plate 10 is sufficiently large, a large centrifugal force generated near the periphery of the rotating plate is guided near the center of the lower surface of the glass substrate by this gap.
Can smoothly flow in the outer diameter direction. Therefore, the gas pressure ejected from the lower ejection nozzle 16 can be made lower than the gas pressure ejected from the upper ejection nozzle 28, and the difference between the ejection pressures of the two ejection nozzles 16 and 28 is used to reduce the glass substrate 26. The drying process can be performed while securely holding the pins 22 and 24.
次にこの実施例の実験例を説明する。次表はLCDの製
造過程において、配向膜を焼成した後のガラス基板（N
o.1）と、この基板に薄膜トランジスタを形成した後の
ガラス基板（No.2）とに対して、それぞれ気体の噴出
（ブロー）を行った場合と（ブロー有）と行わなかった
場合（ブロー無）、回転速度（R.P.M.）を変えた場合、
回転時間（sec）を変えた場合の各条件下での表面状態
の変化を表わすものである。Next, an experimental example of this embodiment will be described. The following table shows the glass substrate (N
o.1) and the glass substrate (No.2) after the thin film transistor was formed on this substrate, when the gas was blown (blown) and when it was not blown (with blow) No), when the rotation speed (RPM) is changed,
It shows the change of the surface state under each condition when the rotation time (sec) is changed.
この実施例ではLCDのガラス基板につき説明している
が、本発明は他のガラス基板、例えば感熱紙に印字を行
うサーマルヘッドにおいて発熱素子を形成したガラス基
板など、種々のガラス基板の乾燥に使用でき、本発明は
これらを包含する。 Although this embodiment describes a glass substrate of an LCD, the present invention is used for drying various glass substrates, for example, a glass substrate having a heating element formed in a thermal head for printing on thermal paper. Yes, and the invention encompasses these.
（発明の効果） 本発明は以上のように、ガラス基板を高速回転させて
その表裏両面を同時に乾燥させる場合に、ガラス基板の
上下両面の回転中心に向って気体をほぼ垂直に噴出させ
るものであるから、遠心力が発生しない回転中心にある
洗浄液もこの気体により周囲に飛散され中心から外れる
と以後は遠心力により速やかに除去され得る。このため
上下両面を確実かつ均一に乾燥させることができる。(Effects of the Invention) As described above, in the present invention, when a glass substrate is rotated at a high speed and both front and back surfaces are simultaneously dried, gas is ejected almost vertically toward the center of rotation of the upper and lower surfaces of the glass substrate. Therefore, the cleaning liquid at the center of rotation where no centrifugal force is generated is scattered around by this gas and deviates from the center, and thereafter can be quickly removed by centrifugal force. Therefore, both the upper and lower surfaces can be surely and uniformly dried.
ここにガラス基板は四角形であり、このガラス基板の
４隅の２辺を水平方向に挟みかつ４隅の下面を支持する
支持腕を上面が平坦な回転板の周縁から放射状に延出さ
せ、この回転板の上面をガラス基板の中心付近下方に所
定間隔をあけて対向させたので、ガラス基板の下面に噴
出された気体は、ガラス基板の下面と回転板との間に形
成される間隙に案内されて周囲に導かれ効率良く高い流
速で飛散する。ここにガラス基板の中心付近に作用する
遠心力は外周付近よりも著しく小さい。しかし回転板は
ガラス基板の短辺長より大径として十分に大きくしたか
ら、回転板の周縁付近に作用する遠心力は十分大きくな
り、このためガラス基板下面の回転中心付近には回転板
の周縁付近に発生する大きな遠心力が回転板との間隙に
よって導かれ、回転中心付近の気体が円滑に外径方向に
流れる。このためガラス基板が四角形であってもガラス
基板の下面で気体を高速かつ円滑に流動させることがで
き、下噴出ノズルから噴出される気体の圧力が低くても
ガラス基板下面を効率良くを十分に乾燥させることがで
きる。このため下噴出ノズルの気体圧力を上噴出ノズル
の気体圧力よりも低くすることが可能となり、このよう
に気体圧力を設定することによりガラス基板を吸盤など
を用いることなく回転板に確実に保持することができ
る。Here, the glass substrate is a quadrangle, and a support arm that sandwiches the two sides of the four corners of the glass substrate in the horizontal direction and supports the lower surfaces of the four corners extends radially from the periphery of the rotating plate having a flat upper surface. Since the upper surface of the rotating plate is opposed to the lower portion near the center of the glass substrate at a predetermined interval, the gas ejected to the lower surface of the glass substrate is guided to a gap formed between the lower surface of the glass substrate and the rotating plate. It is guided to the surroundings and scatters efficiently at a high flow velocity. Here, the centrifugal force acting near the center of the glass substrate is significantly smaller than that near the outer periphery. However, since the rotating plate has a diameter larger than the short side length of the glass substrate and is sufficiently large, the centrifugal force acting near the periphery of the rotating plate becomes sufficiently large. A large centrifugal force generated in the vicinity is guided by the gap with the rotating plate, and the gas in the vicinity of the rotation center flows smoothly in the outer diameter direction. For this reason, even if the glass substrate is rectangular, the gas can flow at high speed and smoothly on the lower surface of the glass substrate, and even if the pressure of the gas ejected from the lower ejection nozzle is low, the lower surface of the glass substrate can be efficiently efficiently. Can be dried. For this reason, it is possible to make the gas pressure of the lower ejection nozzle lower than the gas pressure of the upper ejection nozzle. By setting the gas pressure in this way, the glass substrate is securely held on the rotating plate without using a suction cup or the like. be able to.
第１図は本発明の一実施例の一部を断面した側面図、第
２図は平面図である。 10……回転板、 16……下噴出ノズル、 18……支持腕、 20……横腕、 22……支持ピン、 24……ピン、 26……ガラス基板、 28……上噴出ノズル。FIG. 1 is a side view of a part of one embodiment of the present invention, and FIG. 2 is a plan view. 10 ... rotating plate, 16 ... lower jet nozzle, 18 ... support arm, 20 ... horizontal arm, 22 ... support pin, 24 ... pin, 26 ... glass substrate, 28 ... upper jet nozzle.
Claims (1)
燥するガラス基板の乾燥装置において、垂直な軸を中心
に回転し上面が平坦かつ前記ガラス基板の短辺長よりも
大径な円形の回転板と、この回転板の周縁付近から放射
状に延び前記ガラス基板をその４隅の直交する２辺で水
平方向に挟みかつ４隅の下面を下方から支持することに
より前記回転板の上方に所定の間隙をあけて水平に保持
する４本の支持腕と、このガラス基板の表および裏の回
転中心付近に向ってほぼ垂直に乾燥用の気体を噴出する
上下一対の噴出ノズルとを備え、上噴出ノズルからガラ
ス基板の上面に噴出される乾燥用の気体の圧力を下噴出
ノズルからガラス基板の下面に噴出される乾燥用の気体
の圧力よりも大きくしたことを特徴とするガラス基板の
乾燥装置。1. A glass substrate drying apparatus for simultaneously drying both front and back surfaces of a rectangular glass substrate, wherein a circular rotation is performed about a vertical axis, the upper surface is flat, and the diameter is larger than the short side length of the glass substrate. A glass plate extending radially from the vicinity of the periphery of the rotary plate, sandwiching the glass substrate in the horizontal direction between two orthogonal sides of the four corners, and supporting the lower surfaces of the four corners from below to thereby provide a predetermined position above the rotary plate. It is provided with four supporting arms for holding horizontally with a gap, and a pair of upper and lower ejection nozzles for ejecting a drying gas substantially vertically toward the vicinity of the center of rotation on the front and back of the glass substrate. A drying apparatus for drying a glass substrate, wherein the pressure of the drying gas ejected from the nozzle to the upper surface of the glass substrate is higher than the pressure of the drying gas ejected from the lower ejection nozzle to the lower surface of the glass substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63234832A JP2833762B2 (en) | 1988-09-21 | 1988-09-21 | Glass substrate drying equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63234832A JP2833762B2 (en) | 1988-09-21 | 1988-09-21 | Glass substrate drying equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0283927A JPH0283927A (en) | 1990-03-26 |
| JP2833762B2 true JP2833762B2 (en) | 1998-12-09 |
Family
ID=16977079
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63234832A Expired - Lifetime JP2833762B2 (en) | 1988-09-21 | 1988-09-21 | Glass substrate drying equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2833762B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100382343B1 (en) * | 2001-03-06 | 2003-05-09 | 엘지전자 주식회사 | A spin dryer |
| JP2007180185A (en) * | 2005-12-27 | 2007-07-12 | Disco Abrasive Syst Ltd | Cleaning device |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54167678U (en) * | 1978-05-16 | 1979-11-26 | ||
| JPS613493Y2 (en) * | 1981-02-16 | 1986-02-03 | ||
| JPS57194070A (en) * | 1981-05-22 | 1982-11-29 | Hitachi Ltd | Double side coating device |
| JPS58100425A (en) * | 1981-12-11 | 1983-06-15 | Hitachi Ltd | Apparatus for uniformly applying resist film on wafer surfaces |
| JPS58194070A (en) * | 1982-05-10 | 1983-11-11 | Ricoh Co Ltd | Developing device |
| JPS6118958A (en) * | 1984-07-04 | 1986-01-27 | Mitsubishi Electric Corp | Cleaning method of glass mask for semiconductor device |
| JPS61125045U (en) * | 1985-01-23 | 1986-08-06 | ||
| JPS6281718A (en) * | 1985-10-07 | 1987-04-15 | Oki Electric Ind Co Ltd | Substrate drying device |
| JPH0135470Y2 (en) * | 1985-11-19 | 1989-10-30 | ||
| JPS62181718A (en) * | 1986-02-05 | 1987-08-10 | 株式会社 バイルハツクエンジニヤリング | Granular culture soil |
-
1988
- 1988-09-21 JP JP63234832A patent/JP2833762B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0283927A (en) | 1990-03-26 |
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