JP2822096B2 - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JP2822096B2 JP2822096B2 JP13192390A JP13192390A JP2822096B2 JP 2822096 B2 JP2822096 B2 JP 2822096B2 JP 13192390 A JP13192390 A JP 13192390A JP 13192390 A JP13192390 A JP 13192390A JP 2822096 B2 JP2822096 B2 JP 2822096B2
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive composition
- compound
- acrylate
- methyl
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は感光性組成物に関する。更に詳しくはレリー
フ画像形成のため感光性組成物に関する。本発明に関わ
る感光性組成物は、エレクトロニクス分野の部品加工や
印刷産業における製版材料などの一般のフォトレジスト
の応用分野に用いることができる。Description: TECHNICAL FIELD The present invention relates to a photosensitive composition. More specifically, the present invention relates to a photosensitive composition for forming a relief image. The photosensitive composition according to the present invention can be used in general photoresist application fields such as component processing in the electronics field and plate making materials in the printing industry.
[従来の技術] 従来、エレクトロニクス分野の部品加工や印刷産業に
おける製版材料に常用されている感光性組成物には、0
−ナフトキノンジアジドスルホン酸エステルあるいは0
−ナフトキノンジアジドスルホン酸アミドなどのキノン
ジアジド類を感光成分としてフェノール樹脂と組み合わ
せた感光性組成物、2,6−ジ(4−アジドベンザル)−
4−メチルシクロヘキサノンなどのアジド化合物を感光
成分としてフェノール樹脂と組み合わせた感光組成物が
ある。[Prior art] Conventionally, photosensitive compositions commonly used in plate processing materials in the processing of parts in the electronics field and the printing industry include 0.
-Naphthoquinonediazidesulfonic acid ester or 0
A photosensitive composition in which a quinonediazide such as naphthoquinonediazidesulfonic acid amide is combined as a photosensitive component with a phenol resin, 2,6-di (4-azidobenzal)-
There is a photosensitive composition in which an azide compound such as 4-methylcyclohexanone is combined as a photosensitive component with a phenol resin.
0−ナフトキノンジアジドスルホン酸系化合物は光の
作用により分解してカルボン酸基を有する化合物を生成
し露光部と未露光部の溶解性に差異を生じる。モノアジ
ド、ジアジド化合物はフェノール基と光架橋性を有し、
光の作用により露光部が硬化し溶解性に差異を生じる。The 0-naphthoquinonediazidosulfonic acid-based compound is decomposed by the action of light to form a compound having a carboxylic acid group, and causes a difference in solubility between the exposed part and the unexposed part. Monoazide and diazide compounds have a phenol group and photocrosslinkability,
The exposed portion is cured by the action of light, causing a difference in solubility.
この性質を利用してこれらのキノンジアジド化合物、
アジド化合物を感光成分として含有する感光性組成物を
適当な支持体上に設置した感光材料に露光を与えアルカ
リ水溶性あるいは有機溶剤を用いて現像処理することに
より前者においては露光部を、また後者においては未露
光部を溶解除去しそれぞれの像露光に用いた原画像に対
してポジ型あるいはネガ型のレリーフ像を得ることがで
きる。Utilizing this property, these quinonediazide compounds,
A photosensitive composition containing an azide compound as a photosensitive component is exposed to a photosensitive material provided on a suitable support and developed with an alkali water-soluble or organic solvent to thereby expose the exposed portion and the latter. In the above method, the unexposed portion is dissolved and removed, and a positive or negative relief image can be obtained for the original image used for each image exposure.
[発明が解決しようとする課題] しかし、感光性組成物の構成成分として従来から用い
られているフェノール樹脂であるノボラック樹脂は比較
的低分子量のため、得られるレリーフ像の機械的強度が
十分でないという問題点がある。又ポリビニルフェノー
ル樹脂はレリーフ像の機械的強度は良好であるものの、
ネガ型のレリーフ像を形成する際に紫外光に対し感度が
十分でないという問題点があった。[Problems to be Solved by the Invention] However, the novolak resin, which is a phenol resin conventionally used as a component of the photosensitive composition, has a relatively low molecular weight, so that the mechanical strength of the obtained relief image is not sufficient. There is a problem. Also, although the mechanical strength of the relief image of the polyvinyl phenol resin is good,
When forming a negative relief image, there is a problem that the sensitivity to ultraviolet light is not sufficient.
[問題点を解決するための手段] 本発明者は下記一般式で表される化合物を有効成分と
して重合せしめて得られる高分子化合物と感光性付与剤
としてアジド化合物を含有する感光性組成物が前記の問
題点を解決することを見出した。[Means for Solving the Problems] The present inventors have developed a photosensitive composition containing a polymer compound obtained by polymerizing a compound represented by the following general formula as an active ingredient and an azide compound as a photosensitizer. It has been found that the above problem is solved.
即ち、本発明は、 一般式 (式中、R1は水素原子、CH3またはC2H5基を表し、nは
1以上の整数であり、mは1〜4までの整数を表す。) で表される構造単位を分子構造中に有する高分子化合物
に、感光性付与剤としてアジド化合物を添加してなるこ
とを特徴とする感光性組成物である。That is, the present invention relates to the general formula (Wherein, R 1 represents a hydrogen atom, a CH 3 or a C 2 H 5 group, n is an integer of 1 or more, and m represents an integer of 1 to 4). A photosensitive composition obtained by adding an azide compound as a photosensitizing agent to a polymer compound having a structure.
本発明の組成物中の高分子化合物は、その分子構造中
に前記一般式で示される構造単位を有する事が特徴であ
り、該構造単位のみからなる単独重合体あるいは該構造
単位と他のビニル系単量体の不飽和二重結合を開裂せし
めた構造で示される構造単位一種類以上とを組み合わせ
た繰り返し構造を有する共重合体型の構造を有するもの
である。The polymer compound in the composition of the present invention is characterized in that it has a structural unit represented by the above general formula in its molecular structure, and a homopolymer composed only of the structural unit or the structural unit and another vinyl It has a copolymer type structure having a repeating structure obtained by combining at least one type of structural unit represented by a structure obtained by cleaving an unsaturated double bond of a system monomer.
共重合体型の構造を有する本発明の高分子化合物にお
いて前記一般式で示される構造単位と組み合わせて用い
られる構造単位としては、例えばスチレン、メチルスチ
レンなどのスチレン類、アクリル酸、メタクリル酸、例
えば(メタ)アクリル酸メチル、(メタ)アクリル酸エ
チル、(メタ)アクリル酸n−ブチル、(メタ)アクリ
ル酸イソブチルなどのα−メチレン脂肪族モノカルボン
酸のエステル類、酢酸ビニルなどのビニルエステル類な
どのビニル系単量体の不飽和二重結合を開裂せしめた構
造で示されるものをあげることができる。Examples of the structural unit used in combination with the structural unit represented by the above general formula in the polymer compound of the present invention having a copolymer type structure include styrenes such as styrene and methylstyrene, acrylic acid, and methacrylic acid such as ( Esters of α-methylene aliphatic monocarboxylic acids such as methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate and isobutyl (meth) acrylate, and vinyl esters such as vinyl acetate And those having a structure in which the unsaturated double bond of the vinyl monomer is cleaved.
[1]式で表される化合物の重合方法、または[1]
式で表される化合物とビニル系単量体の共重合方法は、
溶液重合、けん濁重合、乳化重合のいずれでも良い。
[1]式で表される化合物とビニル系単量体を共重合し
た場合に生成する共重合物の重合形態はとくに制限され
ず、ランダム共重合体、ブロック共重合体、グラフト共
重合体などのいずれでも良い。[1] A method for polymerizing a compound represented by the formula, or [1]
The method of copolymerizing the compound represented by the formula and the vinyl monomer is as follows:
Any of solution polymerization, suspension polymerization, and emulsion polymerization may be used.
[1] The polymerization form of the copolymer formed when the compound represented by the formula and the vinyl monomer are copolymerized is not particularly limited, and a random copolymer, a block copolymer, a graft copolymer, and the like can be used. Either may be used.
本発明の組成物に係る高分子化合物の分子量に特に制
限はないが、感光性組成物を支持体上に均一な膜として
塗布することが必要であるため通常ポリスチレン換算重
量平均分子量が、5,000〜500,000程度が好ましい。しか
し形成する膜の厚さ、塗布方法、使用目的に応じて上記
の範囲以外のポリスチレン換算重量平均分子量を選択す
ることも可能である。Although the molecular weight of the polymer compound according to the composition of the present invention is not particularly limited, the photosensitive composition usually needs to be coated as a uniform film on a support, so that the weight average molecular weight in terms of polystyrene is usually 5,000 to About 500,000 is preferable. However, it is also possible to select a weight average molecular weight in terms of polystyrene outside the above range according to the thickness of the film to be formed, the coating method, and the purpose of use.
本発明に用いられる感光性付与剤としてのアジド化合
物としては公知の化合物が有効に用いられる。第1表に
その代表的具体例をあげる。As the azide compound as the photosensitizer used in the present invention, known compounds are effectively used. Table 1 shows typical examples.
本発明の感光性組成物における感光性付与剤の配合量
は、特に制限は無いが通常高分子化合物100重量部あた
りキノンジアジド類の場合は10〜30重量部、アジド類の
場合5〜10重量部の範囲が好ましい。それぞれの感光性
付与剤の重量部範囲未満では、アルカリ溶媒に対する溶
解阻止効果が十分でない(キノンジアジド類)、皮膜の
硬化速度が不十分である(アジド類)などの欠点があ
り、該範囲を超えると感光性付与剤の析出などの問題が
生じて来る。 The amount of the photosensitizer in the photosensitive composition of the present invention is not particularly limited, but is usually 10 to 30 parts by weight for quinonediazides and 5 to 10 parts by weight for azides per 100 parts by weight of the polymer compound. Is preferable. If the amount is less than the range of the respective parts by weight of the photosensitizer, there are drawbacks such as an insufficient dissolution inhibiting effect on an alkali solvent (quinonediazides) and an insufficient curing rate of the film (azides). This causes problems such as precipitation of the photosensitizer.
本発明における感光性組成物には、上述したモノアジ
ド類、ジアジド類に対し必要に応じて増感剤を添加する
ことができる。増感剤の具体的な例としては、1−メチ
ル−2−ベンゾイルメチレン−β−ナフトチアゾリンに
代表されるナフトチアゾリン類及びベンゾチアゾリン
類、3,3′−カルボニルビス(7−ジエチルアミノクマ
リン)に代表されるケトクマリン類が好ましい。A sensitizer may be added to the photosensitive composition of the present invention, if necessary, for the above-described monoazides and diazides. Specific examples of the sensitizer include naphthothiazolines represented by 1-methyl-2-benzoylmethylene-β-naphthothiazoline and benzothiazolines, and 3,3′-carbonylbis (7-diethylaminocoumarin). Representative ketocoumarins are preferred.
増感剤の配合量は特に制限はないが、通常高分子化合
物100重量部当たり0.2〜15重量部の範囲であり、好まし
くは0.5〜10重量部の範囲である。0.2重量部未満では増
感剤の効果が小さく、硬化速度は未添加時と比較して速
くならない。15重量部を超えると未露光部のアルカリ水
溶液への溶解性が低下してくる。以上の各構成材料の各
所定量を混合することにより感光材料すなわち、本発明
の感光性組成物が得られる。The amount of the sensitizer is not particularly limited, but is usually in the range of 0.2 to 15 parts by weight, preferably 0.5 to 10 parts by weight, per 100 parts by weight of the polymer compound. If the amount is less than 0.2 parts by weight, the effect of the sensitizer is small, and the curing speed does not increase as compared with the case where no sensitizer is added. If the amount exceeds 15 parts by weight, the solubility of the unexposed portion in an aqueous alkali solution decreases. A photosensitive material, that is, the photosensitive composition of the present invention, can be obtained by mixing predetermined amounts of each of the above constituent materials.
前記の感光材料の使用に際しては従来常用の方法が適
用され、例えば線画像などを有する透明原画を感光面に
密着して露光し、次いでアルカリ水溶液で現像すること
により原画に対してポジ型、ネガ型のレリーフ像が得ら
れる。When the above-mentioned photosensitive material is used, a conventional method is conventionally applied, for example, a transparent original having a line image or the like is brought into close contact with the photosensitive surface and exposed, and then developed with an aqueous alkali solution to obtain a positive or negative photosensitive material. A relief image of the mold is obtained.
本発明の感光性組成物は、支持体上に通常の塗布方法
を用いて塗布した後紫外線を照射してアジド類の架橋性
から目的のレリーフ像を形成することができる。The photosensitive composition of the present invention can be coated on a support by a usual coating method and then irradiated with ultraviolet rays to form an intended relief image from the crosslinking property of azides.
このようにして得られたレリーフ像は耐薬品性が大き
く機械的強度が優れている。また支持体に対する密着性
が強固である。The relief image thus obtained has high chemical resistance and excellent mechanical strength. Further, the adhesion to the support is strong.
このように本発明に係わる感光性組成物は極めて有用
なものである。Thus, the photosensitive composition according to the present invention is extremely useful.
次に本発明を実施例を挙げて例証するが本発明の実施
がこれにより限定されるものではない。Next, the present invention will be illustrated by way of examples, but the practice of the present invention is not limited thereto.
実施例1 2−(2−ヒドロキシエトキシ)フェノール154gとメ
タクリル酸430gとヒドロキノンモノメチルエーテル3g、
フェノチアジン3gを撹拌付フラスコに入れ50℃まで加熱
し撹拌溶解する。次いでの濃硫酸3g加えて150℃で6時
間加熱撹拌した。反応進行につれ水が生成される。その
後過剰なメタクリル酸を減圧下留去した。この残物にエ
タノール+水1:1の混合液を加え活性炭にて処理した後
さらに水を加えて再結晶した。この工程を刺激臭が無く
なるまで行い、ついでヘキサンにて2回再結晶しmp=63
℃〜64℃の2−(2−ヒドロキシフェノキシ)エチルメ
タクリラート108gを得た。Example 1 154 g of 2- (2-hydroxyethoxy) phenol, 430 g of methacrylic acid and 3 g of hydroquinone monomethyl ether,
3 g of phenothiazine is placed in a flask with stirring and heated to 50 ° C. to dissolve with stirring. Then, 3 g of concentrated sulfuric acid was added, and the mixture was heated and stirred at 150 ° C. for 6 hours. Water is generated as the reaction proceeds. Thereafter, excess methacrylic acid was distilled off under reduced pressure. A mixture of ethanol and water (1: 1) was added to the residue, and the mixture was treated with activated carbon. After that, water was further added to recrystallize the residue. This step was performed until the pungent odor disappeared, and then recrystallized twice with hexane to obtain mp = 63.
There were obtained 108 g of 2- (2-hydroxyphenoxy) ethyl methacrylate at a temperature of from 64C to 64C.
次に2−(2−ヒドロキシフェノキシ)エチルメタク
リレート20g及びα,α′−アゾビスイソブチロニトリ
ル0.1gをメチルセロソルブ60gに溶解し窒素ガス置換し
た封管中65℃6時間加熱すると重合体溶液が得られた。
この重合体溶液をヘキサン1200ml中に注ぎ、生じた白色
の沈殿物をろ過し乾燥して白色重合体12gを得た。Next, 20 g of 2- (2-hydroxyphenoxy) ethyl methacrylate and 0.1 g of α, α'-azobisisobutyronitrile were dissolved in 60 g of methyl cellosolve and heated in a sealed tube purged with nitrogen gas at 65 ° C. for 6 hours to obtain a polymer solution. was gotten.
The polymer solution was poured into 1200 ml of hexane, and the resulting white precipitate was filtered and dried to obtain 12 g of a white polymer.
得られたポリマー1.5gをメチルセロソルブ9mlに撹拌
溶解した。さらに(a−1)のモノアジド化合物0.045g
をN−メチル−2−ピロリドン1mlに溶解したものを先
の溶液と混合溶解してろ過した後、このろ液をガラス基
板に回転塗布器を用いて塗布し、80℃10分加熱乾燥した
後ストライプパターンマスクを介し露光した。2.0%テ
トラメチルアンモニウムヒドロキシド水溶液による現像
後の膜厚が約1.0μmに一定となった露光量をもって感
度とした。(露光はすべて空気中で行った。)この時の
感度は80mj/cm2であった。1.5 g of the obtained polymer was dissolved in 9 ml of methyl cellosolve with stirring. Furthermore, 0.045 g of the monoazide compound of (a-1)
Was dissolved in 1 ml of N-methyl-2-pyrrolidone, mixed with the previous solution, dissolved and filtered, and the filtrate was applied to a glass substrate using a spin coater, and dried by heating at 80 ° C. for 10 minutes. Exposure was performed through a stripe pattern mask. The sensitivity was defined as the exposure amount at which the film thickness after development with a 2.0% tetramethylammonium hydroxide aqueous solution became constant at about 1.0 μm. (All exposures were performed in air.) At this time, the sensitivity was 80 mj / cm 2 .
実施例2 実施例1のモノアジド化合物の代わりに(a−1)の
ジアジド化合物を用いて同様に露光現像した。この時の
感度は70mj/cm2であった。Example 2 Exposure development was carried out in the same manner as in Example 1 except that the diazide compound (a-1) was used in place of the monoazide compound. At this time, the sensitivity was 70 mj / cm 2 .
参考例 実施例1のポリマー1.5g、(n−1)の1,2−ナフト
キノン−2−ジアジド−5−スルホン酸フェニルエステ
ル化合物0.3gを10mlのメチルセロソルブに撹拌溶解して
ろ過した後、このろ液をガラス基板に回転塗布器を用い
て塗布し、80℃10分加熱乾燥した後露光した。露光量は
60mj/cm2であった。続いて1.5%テトラメチルアンモニ
ウムヒドロキシド水溶液により現像した。残留した膜の
厚さは約1.0μmであった。Reference Example 1.5 g of the polymer of Example 1 and 0.3 g of (n-1) 1,2-naphthoquinone-2-diazido-5-sulfonic acid phenyl ester compound were stirred and dissolved in 10 ml of methyl cellosolve, and the mixture was filtered. The filtrate was applied on a glass substrate using a spin coater, dried at 80 ° C. for 10 minutes, and then exposed. Exposure is
It was 60 mj / cm 2 . Subsequently, development was performed with a 1.5% aqueous solution of tetramethylammonium hydroxide. The thickness of the remaining film was about 1.0 μm.
実施例4 実施例1のポリマー1.5gをメチルセルソルブ9mlに撹
拌溶解した。さらに、(a−3)のジアジド化合物0.04
5g、増感剤として1−メチル−2−ベンゾイルメチレン
−β−ナフトチアゾリン0.075gをN−メチル−2−ピロ
リドン1mlに溶解したものを先の溶液と混合溶解しろ過
した後、このろ液をガラス基板に回転塗布器を用いて塗
布し、80℃10分加熱乾燥した後436nmの紫外線で露光し
た。(露光は空気中で行った。)2.0%テトラメチルア
ンモニウムヒドロキシド水溶液で現像後の膜厚が約1.0
μmに一定となった露光量をもって感度とした。この時
の感度は、300mj/cm2であった。Example 4 1.5 g of the polymer of Example 1 was stirred and dissolved in 9 ml of methylcellosolve. Further, the diazide compound of (a-3) 0.04
5 g, a solution obtained by dissolving 0.075 g of 1-methyl-2-benzoylmethylene-β-naphthothiazoline in 1 ml of N-methyl-2-pyrrolidone as a sensitizer was mixed and dissolved with the above solution, followed by filtration. The composition was applied to a glass substrate using a spin coater, dried by heating at 80 ° C. for 10 minutes, and then exposed to ultraviolet light of 436 nm. (Exposure was performed in air.) The film thickness after development with a 2.0% tetramethylammonium hydroxide aqueous solution was about 1.0.
The sensitivity was defined as the exposure amount that became constant at μm. At this time, the sensitivity was 300 mj / cm 2 .
比較例1 ポリビニルフェノール1.5gをメチルセロソルブ9mlに
撹拌溶解した。さらに、(a−3)のジアジド化合物0.
045g、1−メチル−2−ベンゾイルメチレン−β−ナフ
トチアゾリン0.075gをN−メチル−2−ピロリドン1ml
に溶解したものを先の溶液と混合溶解しろ過した後、こ
のろ液をガラス基板に回転塗布器を用いて塗布し、80℃
20分加熱乾燥した後436nmの紫外線で露光した。(露光
は空気中で行った。)0.95%テトラメチルアンモニウム
ヒドロキシド水溶液で現像した。露光量800mj/cm2でも
硬化画像は得られなかった。Comparative Example 1 1.5 g of polyvinyl phenol was stirred and dissolved in 9 ml of methyl cellosolve. Further, the diazide compound (a-3)
045 g, 1-methyl-2-benzoylmethylene-β-naphthothiazoline 0.075 g in N-methyl-2-pyrrolidone 1 ml
The solution dissolved in the above was mixed with the previous solution, dissolved and filtered, and the filtrate was applied to a glass substrate using a spin coater at 80 ° C.
After heating and drying for 20 minutes, it was exposed to ultraviolet light of 436 nm. (Exposure was performed in air.) Development was performed with a 0.95% aqueous solution of tetramethylammonium hydroxide. Even at an exposure of 800 mj / cm 2 , no cured image was obtained.
応用例1 2−(2−ヒドロキシフェノキシ)エチルメタクリラ
ート12g、N−(3−ジメチルアミノプロピル)メタク
リルアミド24g、2−ヒドロキシエチルメタクリレート4
g及びα,α′−アゾビスイソブチロニトリル0.18gをメ
チルセロソルブ111gに溶解し窒素ガス置換した封管中65
℃6時間加熱すると重合溶液が得られた。この重合溶液
を酢酸エチル2000mlに注ぎ、生じた白色の沈殿物をろ過
し乾燥して白色重合体15gを得た。Application Example 1 2- (2-hydroxyphenoxy) ethyl methacrylate 12 g, N- (3-dimethylaminopropyl) methacrylamide 24 g, 2-hydroxyethyl methacrylate 4
g and 0.18 g of α, α'-azobisisobutyronitrile were dissolved in 111 g of methyl cellosolve, and sealed in a sealed tube purged with nitrogen gas.
When heated at 6 ° C. for 6 hours, a polymerization solution was obtained. The polymerization solution was poured into 2000 ml of ethyl acetate, and the resulting white precipitate was filtered and dried to obtain 15 g of a white polymer.
次に、得られたポリマー1.5gをメチルセロソルブ9ml
に撹拌溶解した。さらに、(a−3)のジアジド化合物
0.045gをN−メチル−2−ピロリドン1mlに溶解したも
のを先の溶液と混合溶解してろ過し感光液を得た。この
感光液を用い実施例1と同様にして良好なストライプパ
ターンレリーフ画像を得た。Next, 1.5 ml of the obtained polymer was added to 9 ml of methyl cellosolve.
Was stirred and dissolved. Further, the diazide compound of (a-3)
A solution obtained by dissolving 0.045 g in 1 ml of N-methyl-2-pyrrolidone was mixed and dissolved with the above solution and filtered to obtain a photosensitive solution. Using this photosensitive liquid, a good stripe pattern relief image was obtained in the same manner as in Example 1.
このレリーフ画像を染料として赤24c(日本化薬
製)、緑51p(日本化薬製)、青43p(日本化薬製)を用
い、60℃10分染色した。各色とも鮮明な色調が得られ、
本発明に関わる感光性組成物がカラー液晶表示素子など
に用いられるカラーフィルターの基材として有用である
ことを示した。This relief image was dyed at 60 ° C. for 10 minutes using red 24c (manufactured by Nippon Kayaku), green 51p (manufactured by Nippon Kayaku), and blue 43p (manufactured by Nippon Kayaku) as dyes. A vivid color tone is obtained for each color,
It has been shown that the photosensitive composition according to the present invention is useful as a base material of a color filter used in a color liquid crystal display device or the like.
[発明の効果] 本発明の感光性組成物は、得られるレリーフ画像の機
械的強度も良好であり、かつ空気中においても少ない露
光量で感光するため従来の感光性組成物より、生産性、
省エネルギー、設備の点で有利である。またアルカリ水
溶液で容易に露光部または未露光部を除去できるためプ
ロセス上の安全性も高い。[Effects of the Invention] The photosensitive composition of the present invention has good mechanical strength of the resulting relief image, and is exposed with a small exposure amount even in the air.
It is advantageous in terms of energy saving and equipment. In addition, since exposed or unexposed portions can be easily removed with an alkaline aqueous solution, process safety is high.
本発明実施例1の単独重合体のIRスペクトルを第1図に
示す。FIG. 1 shows the IR spectrum of the homopolymer of Example 1 of the present invention.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平1−102467(JP,A) 特開 平1−179146(JP,A) 特開 平2−97517(JP,A) 特開 平2−103215(JP,A) 特開 平2−103225(JP,A) 特開 平2−166453(JP,A) 特開 平3−149554(JP,A) (58)調査した分野(Int.Cl.6,DB名) G03F 7/033 G03F 7/008──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-1-102467 (JP, A) JP-A-1-179146 (JP, A) JP-A-2-97517 (JP, A) JP-A-2- 103215 (JP, A) JP-A-2-103225 (JP, A) JP-A-2-166453 (JP, A) JP-A-3-149554 (JP, A) (58) Fields investigated (Int. 6 , DB name) G03F 7/033 G03F 7/008
Claims (2)
1以上の整数であり、mは1〜4までの整数を表す。) で表される構造単位を分子構造中に有する高分子化合物
に、感光性付与剤としてアジド化合物を添加してなるこ
とを特徴とする感光性組成物。(1) General formula (Wherein, R 1 represents a hydrogen atom, a CH 3 or a C 2 H 5 group, n is an integer of 1 or more, and m represents an integer of 1 to 4). A photosensitive composition comprising a polymer compound in a structure and an azide compound added as a photosensitizer.
チレン、メチルスチレン、アクリル酸、メタアクリル
酸、アクリル酸メチル、アクリル酸エチル、アクリル酸
n−ブチル、アクリル酸イソブチル、メタアクリル酸メ
チル、メタアクリル酸エチル、メタアクリル酸n−ブチ
ル、メタアクリル酸イソブチル若しくは酢酸ビニルから
選ばれた一以上の化合物を使用してなる特許請求の範囲
第(1)項に記載の感光性組成物。2. Structural units constituting a polymer compound include styrene, methylstyrene, acrylic acid, methacrylic acid, methyl acrylate, ethyl acrylate, n-butyl acrylate, isobutyl acrylate, methyl methacrylate, and methyl methacrylate. The photosensitive composition according to claim 1, wherein the photosensitive composition comprises at least one compound selected from the group consisting of ethyl acrylate, n-butyl methacrylate, isobutyl methacrylate and vinyl acetate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13192390A JP2822096B2 (en) | 1990-05-22 | 1990-05-22 | Photosensitive composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13192390A JP2822096B2 (en) | 1990-05-22 | 1990-05-22 | Photosensitive composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0426848A JPH0426848A (en) | 1992-01-30 |
JP2822096B2 true JP2822096B2 (en) | 1998-11-05 |
Family
ID=15069362
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13192390A Expired - Lifetime JP2822096B2 (en) | 1990-05-22 | 1990-05-22 | Photosensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2822096B2 (en) |
-
1990
- 1990-05-22 JP JP13192390A patent/JP2822096B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0426848A (en) | 1992-01-30 |
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