JP2800378B2 - Manufacturing method of reticle - Google Patents
Manufacturing method of reticleInfo
- Publication number
- JP2800378B2 JP2800378B2 JP2171173A JP17117390A JP2800378B2 JP 2800378 B2 JP2800378 B2 JP 2800378B2 JP 2171173 A JP2171173 A JP 2171173A JP 17117390 A JP17117390 A JP 17117390A JP 2800378 B2 JP2800378 B2 JP 2800378B2
- Authority
- JP
- Japan
- Prior art keywords
- reticle
- fine
- photosensitive material
- fine irregularities
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Viewfinders (AREA)
- Optical Elements Other Than Lenses (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明はカメラ等に使用される焦点板に関するもので
ある。Description: TECHNICAL FIELD The present invention relates to a reticle used for a camera or the like.
従来一眼レフカメラ等の焦点板の製造方法として、ま
ず表面に微細凹凸を持つ焦点板用母型を製造し、これか
ら金型をとってプラスチック材料の表面に微細凹凸を転
写するといった方法が知られている。Conventionally, as a method of manufacturing a reticle for a single-lens reflex camera or the like, a method has been known in which a master for a reticle having fine irregularities on a surface is first manufactured, and then a mold is formed and the fine irregularities are transferred to the surface of a plastic material. ing.
この焦点板用母型の製造方法としては、従来、ガラス
等の母材の表面に砂掛けをほどこすことにより微細凹凸
を形成させるといった方法がとられていた。このような
方法では製造された焦点板用母型から作られる焦点板
は、ボケ味が自然である点に関しては評価が高い反面、
暗くザラツキが目立つといった欠点があった。その原因
はこのような製法による焦点板の表面の微細凹凸は第７
図に示すように非常にランダム性が高いことにある。Conventionally, as a method of manufacturing the reticle matrix, a method has been employed in which fine irregularities are formed by sanding a surface of a base material such as glass. The reticle made from the reticle matrix produced by such a method is highly evaluated in terms of natural bokeh,
There was a drawback that darkness was noticeable. The reason for this is that fine irregularities on the surface of the reticle due to
As shown in the figure, the randomness is very high.
この欠点をなくす為に、焦点板表面の微細凹凸を第８
図に示すような規則的微細凹凸にすることが考え出さ
れ、種々の製造方法が提案されているが、その中の一つ
として規則的微細パターンを有するマスク原板を用い、
これを基板に塗布された感光材料の表面に近接させて露
光し、その感光材料表面に露光量に応じた微細凹凸を形
成させる焦点板用母型の製造方法がある。In order to eliminate this defect, fine irregularities on the reticle
It has been conceived to make regular fine irregularities as shown in the figure, and various manufacturing methods have been proposed.A mask original plate having a regular fine pattern is used as one of them,
There is a method for manufacturing a reticle master for a reticle in which this is exposed close to the surface of a photosensitive material applied to a substrate and fine irregularities are formed on the surface of the photosensitive material according to the amount of exposure.
この方法は、半導体等の製造に用いられるいわゆるプ
ロキシミティ露光法を焦点板用母型製造にそのまま用い
たもので、第５図に示すような規則的微細パターンのマ
スク原板と表面に感光材料を塗布した基板とを第４図に
示すように距離Δｄ離して露光する（Δｄをプロキシミ
ティと言う）。感光材料表面にマスク原板の規則的委細
パターンとプロキシミティ（Δｄ）に応じた照度分布が
でき、露光後現像処理をすれば、照度分布に応じた微細
凹凸が感光材料表面に形成され、これが焦点板用母型と
なる。In this method, a so-called proximity exposure method used in the manufacture of semiconductors and the like is used as it is in the manufacture of a matrix for a reticle, and a photosensitive material is coated on a mask base plate having a regular fine pattern as shown in FIG. The coated substrate is exposed at a distance Δd as shown in FIG. 4 (Δd is called proximity). An illuminance distribution corresponding to the regular fine pattern of the mask original plate and the proximity (Δd) can be formed on the surface of the photosensitive material, and if development processing is performed after exposure, fine irregularities corresponding to the illuminance distribution are formed on the surface of the photosensitive material. It becomes a matrix for boards.
上記の如き従来の技術において、規則的微細パターン
を有するマスク原板を用いたプロキシミティ露光法によ
る焦点板用母型から作られる焦点板は、ザラツキ感がな
く明るいといった長所がある反面、多線ボケを生じる等
ボケ味が不自然であり、また、狭角拡散光（素通し光に
近い拡散光）が多くなりピント合わせがしずらくなると
いった問題点があった。ボケ味が不自然となるのは、規
則的微細パターンを有するマスク原板を用いているの
で、焦点板表面の微細凹凸も規則的構造となって回折格
子と同等の作用を持つことになり、拡散光が回折の次数
に対応した特定方向に限定されてしまう為である。次に
狭角拡散光が多くなってしまう原因であるが、これはプ
ロキシミティ露光法そのものに起因するものである。と
いうのはΔｄ＝０すなわち密着露光の場合、感光材料表
面に第10図（ａ）に示すような微細凹凸が形成されると
すると、Δｄを大きくしていくと回折効果のため第10図
（ｂ）、さらに大きくしていくと第10図（ｃ）、さらに
さらに大きくしていくと第10図（ｄ）に示すような微細
凹凸となる。微細凹凸と拡散特性との関係は微妙である
が、一般に微細凹凸に平坦部が多いとき、また微細凹凸
の山谷の差が少ないときには狭角拡散光が多くなる。し
かるに、第10図を見ると、Δｄが小さいときには山谷の
差は大きいが平坦部が多く、Δｄを大きくすると逆に平
坦部はなくなるが山谷の差もなくなってしまう。以上の
ことから明らかなように、プロキシミティ露光法は狭角
拡散光が多くなるという問題点をもっている。In the prior art as described above, a reticle made from a reticle master by a proximity exposure method using a mask master having a regular fine pattern has an advantage that it is bright without a feeling of roughness, but has a multi-line blur. And the blurring is unnatural, and there is a problem that narrow-angle diffused light (diffused light close to transparent light) increases and it is difficult to focus. The unnatural bokeh is due to the use of a mask base plate with a regular fine pattern, so the fine irregularities on the reticle surface also have a regular structure and have the same effect as a diffraction grating, and diffusion This is because light is limited to a specific direction corresponding to the order of diffraction. Next, the reason why the narrow-angle diffused light is increased is due to the proximity exposure method itself. This is because, when Δd = 0, that is, in the case of close contact exposure, assuming that fine irregularities as shown in FIG. 10A are formed on the surface of the photosensitive material, as Δd is increased, the diffraction effect is increased due to the diffraction effect. b), as the size is further increased, fine irregularities as shown in FIG. 10 (c) are obtained, and as the size is further increased, fine irregularities are formed as shown in FIG. Although the relationship between the fine irregularities and the diffusion characteristics is subtle, the narrow-angle diffused light generally increases when the fine irregularities have many flat portions and when the difference between the peaks and valleys of the fine irregularities is small. However, looking at FIG. 10, when Δd is small, the difference between the peaks and valleys is large but there are many flat portions, and when Δd is large, the flat portions disappear, but there is no difference between the peaks and valleys. As is apparent from the above, the proximity exposure method has a problem that the amount of narrow-angle diffused light increases.
焦点板の表面の微細凹凸のランダム性が強いと、ボケ
味は自然であるが暗くザラツキが目立ち、逆にランダム
性がなく規則的であると、明るくザラツキ感はないがボ
ケ味が不自然なものになってしまうことは上述した通り
であるが、特開昭63−221329には適度なランダム性を持
たせる方法が提案されている。この方法はプロキシミテ
ィ露光法において、微細パターンの規則的配置に適度な
ランダム性を持たせたマスク原板を使用するというもの
である。このような製法による焦点板は、十分な明るさ
を持ち、ザラツキ感もあまり目立たず、ボケ味もそれほ
ど不自然ではないといった長所がある反面、配置のラン
ダム性ゆえその表面の微細凹凸は第９図に示すように粗
密部分ができ結果として狭角拡散光が多くなってしまう
という問題点があった。またランダム微細パターンを有
するマスク原板は製造コストが高いといった問題点もあ
った。If the randomness of the fine irregularities on the surface of the reticle is strong, the bokeh is natural but dark and grainy is conspicuous.On the contrary, if there is no randomness and it is regular, it is bright and there is no grainy feeling but the bokeh is unnatural As described above, a method of providing a suitable randomness is proposed in JP-A-63-221329. In this method, in a proximity exposure method, an original mask is used in which a regular arrangement of fine patterns has an appropriate randomness. Focusing plates made by such a method have the advantages of having sufficient brightness, less noticeable roughness, and less unnatural bokeh, but the unevenness of the surface is ninth due to random arrangement. As shown in the figure, there is a problem that a dense portion is formed and as a result, the narrow-angle diffused light increases. In addition, there is a problem that a mask original having a random fine pattern has a high manufacturing cost.
本発明の目的は、上述したランダム微細パターンを有
するマスク原板を使用する方法とは異なる方法で適度な
ランダム性を導入し、同時に、プロキシミティ露光法そ
のものの欠点である狭角拡散光が多くなるという問題点
を解決することにより、十分な明るさを持ち、ザラツキ
感もあまり目立たず、ボケ味もそれほど不自然ではな
く、優れた拡散特性をもつ焦点板の製造方法を提供する
ことにある。An object of the present invention is to introduce appropriate randomness in a method different from the method using a mask master having a random fine pattern described above, and at the same time, increase the narrow-angle diffused light which is a disadvantage of the proximity exposure method itself. It is therefore an object of the present invention to provide a manufacturing method of a reticle having a sufficient brightness, less noticeable roughness, less unnatural bokeh, and excellent diffusion characteristics.
上記問題の解決のための本願発明は、不規則な微細凹
凸を設けた基板面に、前記微細凹凸が残存するように感
光材料を塗布し、該感光材料に微細パターンを露光した
後に現像処理して得られる複合微細凹凸を有する焦点板
母型を用いる焦点板の製造方法である。The invention of the present application for solving the above problems is to apply a photosensitive material on the substrate surface provided with irregular fine irregularities so that the fine irregularities remain, and to perform a development process after exposing a fine pattern to the photosensitive material. This is a method for manufacturing a reticle using a reticle matrix having composite fine irregularities obtained by the above method.
更には、不規則な微細凹凸を設けた基板面に、前記微
細凹凸が残存するように感光材料を塗布し、該感光材料
に微細パターンを露光した後に現像処理して得られる複
合微細凹凸を有する焦点板母型の複合微細凹凸を反転型
に写し取り、該反転型の複合微細凹凸を光学材料に転写
する焦点板の製造方法である。Further, on a substrate surface provided with irregular fine irregularities, a photosensitive material is applied so that the fine irregularities remain, and the photosensitive material has composite fine irregularities obtained by performing a developing process after exposing a fine pattern to the photosensitive material. This is a method of manufacturing a reticle in which composite fine irregularities of a reticle matrix are transferred to an inversion mold and the composite fine irregularities of the inversion mold are transferred to an optical material.
また、不規則な微細凹凸を設けた基板面に、前記微細
凹凸が残存するように感光材料を塗布し、該感光材料に
微細パターンを露光した後に現像処理して得られる複合
微細凹凸を有する焦点板用母型である。Further, a focus having a composite fine unevenness obtained by applying a photosensitive material on a substrate surface provided with irregular fine unevenness so that the fine unevenness remains, exposing the photosensitive material to a fine pattern, and then performing development processing. It is a plate mold.
上記いずれに場合も、前記基板に設けた不規則な微細
凹凸は、５〜100μｍの砂かけ実施後に化学腐食によっ
て平均山谷差を５μｍ以下とした凹凸であることが好ま
しい。In any of the above cases, the irregular fine irregularities provided on the substrate are preferably irregularities having an average peak-to-valley difference of 5 μm or less due to chemical corrosion after sanding of 5 to 100 μm.
本発明においては、露光後形成される感光材料表面の
微細凹凸の形状は、従来の平面基板を用いたときに形成
される感光材料表面の微細凹凸とあらかじめ設けられた
基板の微細凹凸とが重なり合った形状となる。このよう
に重ね合わせることで、使用したマスク原板が規則的微
細パターンを持つものであっても、感光材料表面に形成
される微細凹凸はランダム性を持つものとなる。またこ
のような微細凹凸を持つ焦点板による光の拡散は、従来
の平面基板を使用したときの微細凹凸を持つ焦点板によ
る光の拡散よりも、あらかじめ設けられた基板の微細凹
凸による影響で、相対的に広角拡散光が増し、狭角拡散
光が減ることになるので、従来の如き不都合は解消す
る。In the present invention, the shape of the fine irregularities on the surface of the photosensitive material formed after exposure is such that the fine irregularities on the surface of the photosensitive material formed when using a conventional flat substrate and the fine irregularities on the substrate provided in advance overlap. Shape. By superimposing in this way, even if the used mask original has a regular fine pattern, the fine irregularities formed on the surface of the photosensitive material have randomness. In addition, the diffusion of light by the focusing plate having such fine unevenness is more affected by the fine unevenness of the substrate provided in advance than the diffusion of light by the focusing plate having fine unevenness when using a conventional flat substrate, The relatively wide-angle diffused light increases and the narrow-angle diffused light decreases, so that the inconvenience of the related art is solved.
次に本発明の内容を第１図〜第６図に示す実施例によ
って順次説明する。Next, the contents of the present invention will be described sequentially with reference to the embodiments shown in FIGS.
第１図は本発明の実施例に使用する基板20の概略縦断
面図であり、ガラス素材を使用し、感光材料を塗布する
以前の基板面に平均粒子ピッチが５〜100μｍの砂かけ
を実施した後に化学腐食によって平均の山谷差を５μｍ
以下に抑えて微細凹凸を形成した。FIG. 1 is a schematic longitudinal sectional view of a substrate 20 used in an embodiment of the present invention, in which a glass material is used and sanding with an average particle pitch of 5 to 100 μm is performed on the substrate surface before applying a photosensitive material. 5μm average difference between peaks and valleys due to chemical corrosion
Fine irregularities were formed by suppressing the following.
第２図は基板20に感光材料21を塗布した状態を示す概
略縦断面図であり、第２図（Ａ）は本実施例の微細凹凸
を有する基板の使用状態を示し、第２図（Ｂ）は比較の
ために従来の平板基板を使用した状態を示している。FIG. 2 is a schematic longitudinal sectional view showing a state in which a photosensitive material 21 is applied to a substrate 20, and FIG. 2 (A) shows a use state of a substrate having fine irregularities of this embodiment, and FIG. () Shows a state in which a conventional flat substrate is used for comparison.
実施例においては感光材料21にポジ型レジストを用い
て、基板表面にスピンコートを行なった。その結果、塗
布された感光材料21の表面には第２図（Ａ）に示す如
く、すでに基板上に形成された微細凹凸に影響を受けた
新たな微細凹凸が形成される。In the examples, a positive resist was used for the photosensitive material 21 and spin coating was performed on the substrate surface. As a result, new fine irregularities are formed on the surface of the applied photosensitive material 21, as shown in FIG. 2A, affected by the fine irregularities already formed on the substrate.
尚、実施例では感光材料21にポジ型レジストを用いて
基板上にスピンコートで処理したがこれにこだわるもの
ではなく、感光材料として、例えばネガ型レジスト、ゼ
ラチン乾板等を用いてもよく、これらを使用してスプレ
ーコートで処理してもよい。In the examples, the photosensitive material 21 was processed by spin coating on the substrate using a positive resist.However, the present invention is not limited to this. For example, a negative resist, a gelatin dry plate, or the like may be used as the photosensitive material. And may be treated with a spray coat.
第４図は感光材料を塗布した基板に微細パターンを露
光する段階を説明する図である。FIG. 4 is a view for explaining the step of exposing a fine pattern to a substrate coated with a photosensitive material.
第４図において、基板20に塗布された感光材料21は微
細パターン23を有するマスク原板22を介して露光光24に
よって露光される。また、露光に際し、マスク原板22と
感光材料21を塗布した基板20との間隔Δｄは10〜100μ
ｍに設定した。In FIG. 4, a photosensitive material 21 applied to a substrate 20 is exposed by exposure light 24 via a mask base plate 22 having a fine pattern 23. In the exposure, the distance Δd between the mask original plate 22 and the substrate 20 coated with the photosensitive material 21 is 10 to 100 μm.
m.
第５図は実施例で用いてマスク原板を示し、ガラス基
板上にクロムでピッチ15〜30μｍの規則的周期点を中心
とする半径５〜15μｍの円型パターン23を印刷したもの
であり、本実施例の露光にはこれを使用した。FIG. 5 shows a mask original plate used in the embodiment, in which a circular pattern 23 having a radius of 5 to 15 μm centered on a regular periodic point having a pitch of 15 to 30 μm is printed on a glass substrate with chrome. This was used for exposure in the examples.
前記露光後に現像処理をすることによって感光材料21
表面には、あらかじめ基板に設けた微細凹凸とマスク原
板による露光によって得られる微細凹凸による複合され
た微細凹凸が形成される。By performing a development process after the exposure, the photosensitive material 21
On the surface, complex fine irregularities formed by fine irregularities provided in advance on the substrate and fine irregularities obtained by exposure with the mask original plate are formed.
第３図は現像処理を実施した後の基板20に塗布された
感光材料21の状態を示す概略縦断面図であり、第３図
（Ａ）は実施例、第３図（Ｂ）は比較のために従来例を
示している。従来例と実施例とを比較して明らかなよう
に、従来例は感光材料21の表面に規則的な微細凹凸が形
成されているが本実施例は基板20にあらかじめ形成され
た微細凹凸による感光材料21での残存凹凸に新たに微細
凹凸が形成されて、複合微細凹凸が形成されている。以
上のようにして焦点板用の母型を製作した。FIG. 3 is a schematic longitudinal sectional view showing the state of the photosensitive material 21 applied to the substrate 20 after the development processing is performed. FIG. 3 (A) is an example, and FIG. 3 (B) is a comparative example. For this reason, a conventional example is shown. As is clear from the comparison between the conventional example and the embodiment, in the conventional example, regular fine irregularities are formed on the surface of the photosensitive material 21. Fine irregularities are newly formed on the remaining irregularities in the material 21, and composite minute irregularities are formed. A master for the reticle was manufactured as described above.
実施例で明らかのように、規則的微細パターンを備え
たマスク原板22を使用しても不規則（ランダム性のあ
る）微細凹凸を製作することが出来る。As is clear from the embodiment, irregular (random) fine irregularities can be produced even by using the mask original plate 22 having a regular fine pattern.
このようにして製作した母型の複合微細凹凸を電鋳に
よって金属に写しとり、更に光学素材に転写して焦点板
が製造出来る。The composite fine irregularities of the matrix produced in this way are transferred to a metal by electroforming, and then transferred to an optical material to produce a reticle.
またこうして製造した焦点板用母型より作成される焦
点板の拡散特性は、平面基板を用いた第３図（ｂ）を母
型とした場合は第６図（ｂ）のようになるのに対して、
本発明である基板を用いた第３図（ａ）を母型とした場
合には第６図（ａ）のような拡散特性曲線となる。拡散
特性曲線とは、横軸に示した角度より小さい角度範囲に
拡散される光量の、拡散光全体に対する割合（縦軸）を
グラフにしたものであるから、第６図を比較すれば明ら
かなように、本発明の第６図（ａ）の方が相対的に広角
拡散光が多く、狭角拡散光が少なくなってより好ましい
拡散特性になっていることがわかる。The diffusion characteristics of the reticle produced from the reticle matrix thus manufactured are as shown in FIG. 6 (b) when FIG. 3 (b) using the flat substrate is used as the matrix. for,
When FIG. 3 (a) using the substrate of the present invention is used as a matrix, a diffusion characteristic curve as shown in FIG. 6 (a) is obtained. The diffusion characteristic curve is a graph of the ratio (vertical axis) of the amount of light diffused in an angle range smaller than the angle indicated on the horizontal axis to the entire diffused light. As can be seen from FIG. 6 (a) of the present invention, the wide-angle diffused light is relatively large and the narrow-angle diffused light is relatively small, resulting in more favorable diffusion characteristics.
上記実施例で得られる焦点板のランダム性及び拡散特
性は、マスク原板の微細パターン形状と基板の微細凹凸
形状との異なる組合せにより、所望の特性に変化させる
ことができる。またマスク原板の微細パターン形状と基
板の微細凹凸形状の同一の組合せにおいても、基板に塗
布する感光材料の膜厚、露光量あるいはプロキシミティ
（Δｄ）を変えることにより、ランダム性及び拡散特性
の異なったものが得られる。このように本発明によれ
ば、様々なランダム性及び拡散特性を持つ焦点板を製作
することが出来、その中から、所望のランダム性及び拡
散特性を有する焦点板を選択すれば良い。The randomness and diffusion characteristics of the reticle obtained in the above embodiment can be changed to desired characteristics by different combinations of the fine pattern shape of the mask original plate and the fine unevenness shape of the substrate. In addition, even in the same combination of the fine pattern shape of the mask original plate and the fine unevenness shape of the substrate, the randomness and the diffusion characteristics are changed by changing the film thickness, exposure amount or proximity (Δd) of the photosensitive material applied to the substrate. Is obtained. As described above, according to the present invention, a reticle having various randomness and diffusion characteristics can be manufactured, and a reticle having desired randomness and diffusion characteristics may be selected from the reticle.
上記のように本発明によればあらかじめ基板に微細凹
凸を設けて、感光材料を塗布し、その感光材料に微細パ
ターンを露光して現像処理をするようにしたので複合微
細凹凸が得られるので容易に所望のランダム性を導入出
来る効果があるばかりでなく、相対的に狭角拡散光をお
さえ、広角拡散光を増やすことが出来る効果もある。As described above, according to the present invention, fine irregularities are provided on the substrate in advance, a photosensitive material is applied, and a fine pattern is exposed on the photosensitive material to perform development processing. Not only has the effect of introducing desired randomness, but also has the effect of suppressing relatively narrow-angle diffused light and increasing wide-angle diffused light.
よって十分な明るさを持ち、ザラツキ感もあまり目立
たず、ボケ味も不自然でなく、優れた拡散性をもつ焦点
板が得られる。Therefore, a reticle having sufficient brightness, less noticeable roughness, less unnatural blur, and excellent diffusivity can be obtained.
第１図〜第６図は本発明の実施例を説明するための図面
で、このうち第２図、第３図及び第６図は本発明の場合
を（ａ）とし従来のプロキシミティ露光法の場合を
（ｂ）としたものであり、 第１図は微細凹凸を有する基板の断面図、 第２図は感光材料を塗布した基板の断面図、 第３図は感光材料表面に形成された微細凹凸の断面図、 第４図はマスク露光法の説明図、 第５図はマスク原板の説明図、 第６図は拡散特性曲線、 である。 第７図〜第10図は従来技術による焦点板を説明するため
の図面で、 第７図は非常にランダム性のある微細凹凸を有する焦点
板の断面図、 第８図は規則的な微細凹凸を有する焦点板の断面図、 第９図は適度なランダム性のある微細凹凸を有する焦点
板の断面図、 第10図は従来のマスク露光法により形成される微細凹凸
の形状を説明するための説明図であり、プロキシミティ
（Δｄ）の小→大の順に（Ａ）（Ｂ）（Ｃ）（ｄ）と変
化する様子を説明する焦点板の概略縦断面図である。 〔主要部分の符号の説明〕 20……基板、21……感光材料、 22……マスク原板、23……微細パターン。1 to 6 are drawings for explaining an embodiment of the present invention. Among them, FIGS. 2, 3 and 6 show the case of the present invention as (a), and a conventional proximity exposure method. FIG. 1 is a cross-sectional view of a substrate having fine irregularities, FIG. 2 is a cross-sectional view of a substrate coated with a photosensitive material, and FIG. 3 is formed on the surface of the photosensitive material. FIG. 4 is an explanatory view of a mask exposure method, FIG. 5 is an explanatory view of a mask original plate, and FIG. 6 is a diffusion characteristic curve. 7 to 10 are drawings for explaining a conventional focusing screen, FIG. 7 is a cross-sectional view of a focusing screen having fine irregularities with very random characteristics, and FIG. 8 is regular fine irregularities. FIG. 9 is a cross-sectional view of a reticle having fine irregularities with appropriate randomness, and FIG. 10 is a cross-sectional view of the fine irregularities formed by a conventional mask exposure method. It is an explanatory view, and is a schematic longitudinal cross-sectional view of a reticle illustrating how the proximity (Δd) changes from small to large in the order of (A), (B), (C), and (d). [Description of Signs of Main Parts] 20: substrate, 21: photosensitive material, 22: mask original plate, 23: fine pattern.
フロントページの続き (72)発明者 増子 朝治 神奈川県横浜市栄区長尾台町471番地 株式会社ニコン横浜製作所内 (56)参考文献 特開 平１−185535（ＪＰ，Ａ) (58)調査した分野(Int.Cl.6，ＤＢ名) G03B 13/24 G02B 5/02Continuation of the front page (72) Inventor Asaji Masuko 471 Nagaodaicho, Sakae-ku, Yokohama-shi, Kanagawa Prefecture Nikon Yokohama Works (56) References JP-A-1-185535 (JP, A) (58) Fields investigated (Int.Cl. 6 , DB name) G03B 13/24 G02B 5/02
Claims (4)
微細凹凸が残存するように感光材料を塗布し、該感光材
料に微細パターンを露光した後に現像処理して得られる
複合微細凹凸を有する焦点板母型を用いる事を特徴とす
る焦点板の製造方法。1. A composite fine unevenness obtained by applying a photosensitive material on a substrate surface provided with irregular fine unevenness so that the fine unevenness remains, exposing a fine pattern to the photosensitive material, and then performing development processing. A method of manufacturing a reticle, comprising using a reticle matrix having the following.
微細凹凸が残存するように感光材料を塗布し、該感光材
料に微細パターンを露光した後に現像処理して得られる
複合微細凹凸を有する焦点板母型の複合微細凹凸を反転
型に写し取り、該反転型の複合微細凹凸を光学材料に転
写する事を特徴とする焦点板の製造方法。2. A composite fine unevenness obtained by applying a photosensitive material onto a substrate surface provided with irregular fine unevenness so that the fine unevenness remains, exposing the photosensitive material to a fine pattern, and then performing development processing. A method of manufacturing a reticle, comprising: transferring the composite fine irregularities of a reticle matrix having an inversion to an inversion mold; and transferring the inverted fine composite irregularities to an optical material.
微細凹凸が残存するように感光材料を塗布し、該感光材
料に微細パターンを露光した後に現像処理して得られる
複合微細凹凸を有する事を特徴とする焦点板用母型。3. A composite fine unevenness obtained by applying a photosensitive material on a substrate surface provided with irregular fine unevenness so that the fine unevenness remains, exposing the photosensitive material to a fine pattern, and then performing development processing. A reticle matrix that has:
不規則な微細凹凸は、５〜100μｍの砂かけ実施後に化
学腐食によって平均山谷差を５μｍ以下とした凹凸であ
る事を特徴とする焦点板の製造方法、又は焦点板用母
型。4. The method according to claim 1, wherein the irregular fine irregularities provided on the substrate are irregularities having an average peak-valley difference of 5 μm or less by chemical corrosion after sanding of 5 to 100 μm. Reticle manufacturing method or reticle matrix.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2171173A JP2800378B2 (en) | 1990-06-28 | 1990-06-28 | Manufacturing method of reticle |
| US07/630,082 US5119235A (en) | 1989-12-21 | 1990-12-19 | Focusing screen and method of manufacturing same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2171173A JP2800378B2 (en) | 1990-06-28 | 1990-06-28 | Manufacturing method of reticle |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0458234A JPH0458234A (en) | 1992-02-25 |
| JP2800378B2 true JP2800378B2 (en) | 1998-09-21 |
Family
ID=15918355
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2171173A Expired - Lifetime JP2800378B2 (en) | 1989-12-21 | 1990-06-28 | Manufacturing method of reticle |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2800378B2 (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01185535A (en) * | 1988-01-18 | 1989-07-25 | Asahi Optical Co Ltd | Manufacture of mother die for focusing screen |
-
1990
- 1990-06-28 JP JP2171173A patent/JP2800378B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0458234A (en) | 1992-02-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4567123A (en) | Diffusing plate | |
| US5119235A (en) | Focusing screen and method of manufacturing same | |
| US5503902A (en) | Light control material | |
| JP2881877B2 (en) | Reticle | |
| JPH0142134B2 (en) | ||
| JPS63221329A (en) | Focal plate and its production | |
| JP2800378B2 (en) | Manufacturing method of reticle | |
| US6692902B2 (en) | Manufacturing method and structure of slanting diffusive reflector | |
| JPH0544652B2 (en) | ||
| JPH06300905A (en) | Optical component with light scattering surface and its manufacture | |
| JPH0512692B2 (en) | ||
| JPH04277733A (en) | Production of focal plate | |
| US4401750A (en) | Etched photographic imagery | |
| JPH01185535A (en) | Manufacture of mother die for focusing screen | |
| JP3557267B2 (en) | Manufacturing method of reticle master | |
| JPS6354289A (en) | Printing screen and production thereof | |
| JP4100350B2 (en) | Method for producing antiglare film | |
| JPS59121033A (en) | Manufacture of transmission type projection screen | |
| JPH0512693B2 (en) | ||
| JPH039358A (en) | Gravure pringing plate and production thereof | |
| JPH01243436A (en) | Forming method for photo sensitive organic resin film | |
| JPS63303736A (en) | Manufacture of screen printing plate | |
| WO1995023710A1 (en) | Light control material and method for making same | |
| JPH036488B2 (en) | ||
| JP2004333853A (en) | Focusing screen and manufacturing method of focusing screen |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20070710 Year of fee payment: 9 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100710 Year of fee payment: 12 |
|
| EXPY | Cancellation because of completion of term |