JP2785923B2 - Work cleaning device - Google Patents
Work cleaning deviceInfo
- Publication number
- JP2785923B2 JP2785923B2 JP5145504A JP14550493A JP2785923B2 JP 2785923 B2 JP2785923 B2 JP 2785923B2 JP 5145504 A JP5145504 A JP 5145504A JP 14550493 A JP14550493 A JP 14550493A JP 2785923 B2 JP2785923 B2 JP 2785923B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- cleaning liquid
- liquid
- tank
- work
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Detergent Compositions (AREA)
Description
【０００１】[0001]
【産業上の利用分野】この発明は、例えば、電気部品、
電子部品、プレス部品等のワークを洗浄処理するために
用いられるワーク洗浄装置に関する。The present invention relates to, for example, electric parts,
The present invention relates to a work cleaning apparatus used for cleaning a work such as an electronic component and a pressed component.
【０００２】[0002]
【従来の技術】従来、上述例のようなワークの洗浄方法
としては、例えば、超音波洗浄槽に貯液された塩素系溶
剤を主成分とする洗浄液中にワーク全体を浸漬して、超
音波振動子による洗浄液のキャビテーションによりワー
ク表面に付着した切粉や油分等の異物を剥離除去する洗
浄方法がある。2. Description of the Related Art Conventionally, as a method of cleaning a work as described above, for example, an entire work is immersed in a cleaning liquid containing a chlorine-based solvent as a main component and stored in an ultrasonic cleaning tank. There is a cleaning method in which foreign substances such as cutting chips and oil adhering to the work surface are removed by cavitation of a cleaning liquid by a vibrator.
【０００３】しかし、上述のように塩素系溶剤を主成分
とする洗浄液でワークを洗浄処理する場合、塩素系溶剤
は人体および環境に有害であるだけでなく、樹脂材料を
溶解しやすいため、プリント基板等の樹脂製品を洗浄処
理するのに不向きである。かつ、洗浄時において、ワー
クから剥離された切粉や油分等の不純物が洗浄液中に混
入するため、洗浄回数が多くなるほど洗浄液中に混入す
る不純物の量が増加し、洗浄液による洗浄力が短期間で
低下する。また、熱容量の小さなワークを洗浄処理した
場合、ワークを乾燥した時に結露が発生し、結露部分に
塵埃やゴミ等の付着した跡が残るため、洗浄効果が損な
われてしまうという問題点を有している。However, when a workpiece is cleaned with a cleaning solution containing a chlorine-based solvent as a main component as described above, the chlorine-based solvent is not only harmful to the human body and the environment, but also easily dissolves the resin material. It is not suitable for cleaning resin products such as substrates. In addition, at the time of cleaning, impurities such as cutting chips and oils separated from the work are mixed into the cleaning liquid. Therefore, as the number of times of cleaning increases, the amount of impurities mixed into the cleaning liquid increases, and the cleaning power by the cleaning liquid is short. It falls with. In addition, when a work having a small heat capacity is cleaned, dew condensation occurs when the work is dried, and traces of dust and dirt are left on the condensed portion, thereby deteriorating the cleaning effect. ing.
【０００４】[0004]
【発明が解決しようとする課題】この発明は、炭化水素
系溶剤を主成分とする一次洗浄液でワークを洗浄処理し
た後、蒸留再生された不活性溶剤を主成分とする二次洗
浄液でワークを洗浄処理することにより、高度な技術を
必要とする残渣のない洗浄処理が簡単に行え、ワーク全
体を確実かつ綺麗に洗浄処理することができると共に、
比重分離により上層側に分離された二次洗浄液を含む一
次洗浄液の中から該一次洗浄液を分離して二次洗浄液の
みを蒸留再生して洗浄工程に返還することで、二次洗浄
液の回収効率を高めて、再利用性の向上を図ることがで
き、しかも不活性溶剤を主成分とする二次洗浄液が貯溜
されたワーク洗浄手段の液面にワーク洗浄により浮遊し
た一次洗浄液を、二次洗浄液の液面吐出により上述の比
重分離手段へオーバフローさせることで、ワーク洗浄手
段に貯溜される二次洗浄液の純度を一定の高純度に保
ち、高洗浄効率を長期にわたって維持することができる
ワーク洗浄装置の提供を目的とする。SUMMARY OF THE INVENTION According to the present invention, a work is washed with a primary washing liquid containing a hydrocarbon solvent as a main component, and then the work is washed with a secondary washing liquid containing an inert solvent as a main component, which is regenerated by distillation. By performing the cleaning process, it is possible to easily perform a cleaning process without residues that requires advanced technology, and it is possible to clean the entire work reliably and neatly.
By separating the primary cleaning liquid from the primary cleaning liquid containing the secondary cleaning liquid separated into the upper layer by specific gravity separation, distilling and regenerating only the secondary cleaning liquid and returning to the cleaning step, the recovery efficiency of the secondary cleaning liquid is improved. It is possible to improve the reusability, and furthermore, the primary cleaning liquid floated by the work cleaning on the surface of the work cleaning means in which the secondary cleaning liquid containing an inert solvent as a main component is stored is used as the secondary cleaning liquid. By overflowing the specific gravity separation means by the liquid surface discharge, the purity of the secondary cleaning liquid stored in the work cleaning means can be maintained at a constant high purity, and the work cleaning apparatus can maintain high cleaning efficiency for a long time. For the purpose of providing.
【０００５】[0005]
【課題を解決するための手段】この発明は、炭化水素系
溶剤を主成分とする一次洗浄液により洗浄処理されたワ
ークを不活性溶剤を主成分とする二次洗浄液により洗浄
処理するワーク洗浄装置であって、蒸気化された二次洗
浄液の蒸気領域を上部に形成し、上記一次洗浄液により
洗浄処理されたワークを二次洗浄液により洗浄処理する
ワーク洗浄手段（５）と、前記ワーク洗浄手段と蒸気発
生手段とに隣接配置され、洗浄処理に使用された一次洗
浄液を含む二次洗浄液を比重分離し、蒸気発生手段から
オーバフローする二次洗浄液を受入れる蒸気発生手段
と、上記洗浄処理に使用され一次洗浄液を含む二次洗浄
液を比重分離する比重分離手段と、上記比重分離により
上層側に分離された二次洗浄液を含む一次洗浄液の中か
ら該一次洗浄液を分離して二次洗浄液のみを蒸留再生し
て上記蒸気発生手段に返還する蒸留再生手段と、上記ワ
ーク洗浄手段の液面に浮遊した一次洗浄液を二次洗浄液
の液面吐出により上記比重分離手段にオーバフローさせ
る液面洗浄手段とを備えたワーク洗浄装置であることを
特徴とする。SUMMARY OF THE INVENTION The present invention relates to a workpiece cleaning apparatus for cleaning a workpiece cleaned by a primary cleaning liquid mainly containing a hydrocarbon solvent with a secondary cleaning liquid mainly containing an inert solvent. there are, to form a vapor region of vaporized by secondary washing solution at the top, a workpiece cleaning means (5) for cleaning processing by the secondary cleaning liquid washed treated workpiece by the primary cleaning liquid, the workpiece cleaning means and steam Departure
Disposed adjacent to the raw device, the secondary cleaning liquid containing a primary washing solution used in the cleaning process by gravity separation, from the steam generating unit
A vapor generating means for receiving the overflowing secondary cleaning liquid, a specific gravity separating means for specific gravity separating the secondary cleaning liquid used for the above-mentioned cleaning treatment and containing the primary cleaning liquid, A distillation / regeneration means for separating the primary cleaning liquid from the cleaning liquid and distilling / regenerating only the secondary cleaning liquid and returning it to the vapor generating means; and a primary cleaning liquid floating on the liquid surface of the work cleaning means as a secondary cleaning liquid The apparatus is characterized in that it is a work cleaning apparatus provided with a liquid level cleaning means for causing the specific gravity separation means to overflow by surface discharge.
【０００６】[0006]
【作用】この発明によれば、炭化水素系溶剤を主成分と
する一次洗浄液でワークを洗浄処理した後、ワーク洗浄
手段により不活性溶剤（例えば、ハイドロフルオロカー
ボン）を主成分とする二次洗浄液でワークを洗浄処理す
る。この時、ワークに付着した一次洗浄液は二次洗浄液
にて剥離され、二次洗浄液に対して比重が小さい一次洗
浄液はワーク洗浄手段の液面に浮遊するが、この液面に
浮遊した一次洗浄液を二次洗浄液の液面吐出により二次
洗浄液と共に比重分離手段へ導き、ここで比重分離され
た後に、この比重分離により上層側に分離された二次洗
浄液を含む一次洗浄液の中から、一次洗浄液が分離され
た二次洗浄液のみを蒸留再生手段で蒸留再生して洗浄工
程に返還供給するので、ワークの洗浄処理が効率よく行
える。さらに、ワーク洗浄手段の二次洗浄液中からワー
クを引上げたとき、ワークを上部蒸気領域に放出された
二次洗浄液の蒸気で乾燥処理されて外部に搬出する。ま
た、蒸気発生手段に供給された二次洗浄液がオーバフロ
ーしたとき、該二次洗浄液は比重分離手段に回収され
る。 According to the present invention, after the work is cleaned with the primary cleaning liquid containing a hydrocarbon solvent as a main component, the work is washed with a secondary cleaning liquid containing an inert solvent (for example, hydrofluorocarbon) as a main component by the work cleaning means. The work is cleaned. At this time, the primary cleaning liquid adhering to the work is separated by the secondary cleaning liquid, and the primary cleaning liquid having a lower specific gravity than the secondary cleaning liquid floats on the liquid surface of the work cleaning means. The secondary cleaning liquid is guided to the specific gravity separation means together with the secondary cleaning liquid by discharging the surface of the secondary cleaning liquid, where the primary cleaning liquid is separated from the primary cleaning liquid containing the secondary cleaning liquid separated into the upper layer by the specific gravity separation. Since only the separated secondary cleaning liquid is distilled and regenerated by the distillation and regenerating means and supplied back to the cleaning step, the workpiece can be cleaned efficiently. Further, when the work is pulled up from the secondary cleaning liquid of the work cleaning means, the work is dried by the vapor of the secondary cleaning liquid discharged to the upper vapor region and is carried out. Ma
Also, the secondary cleaning liquid supplied to the steam generation means overflows.
The secondary washing liquid is collected by specific gravity separation means.
You.
【０００７】[0007]
【発明の効果】このように、この発明によれば、炭化水
素系溶剤を主成分とする一次洗浄液によりワークを洗浄
処理した後、蒸留再生された不活性溶剤（例えば、ハイ
ドロフルオロカーボン）を主成分とする二次洗浄液によ
りワークを洗浄処理するので、従来方法では除去するこ
とが困難であった一次洗浄液の残液をも確実に剥離除去
することができ、高度な技術を必要とする残渣のない洗
浄処理が簡単かつ容易に行える。また、蒸留再生された
不純物の少ない二次洗浄液でワークを洗浄処理するた
め、ワーク全体を確実かつ綺麗に洗浄処理でき、電子部
品や電気部品等の精密部品を洗浄処理するのに最適であ
る。As described above, according to the present invention, an inert solvent (for example, hydrofluorocarbon) that has been distilled and regenerated after cleaning a workpiece with a primary cleaning liquid mainly containing a hydrocarbon solvent is used as a main component. Since the workpiece is cleaned with the secondary cleaning liquid, the residual liquid of the primary cleaning liquid, which was difficult to remove by the conventional method, can be reliably removed and removed, and there is no residue requiring advanced technology. The washing process can be performed simply and easily. In addition, since the work is cleaned with the secondary cleaning liquid having a small amount of impurities regenerated by distillation, the entire work can be reliably and cleanly cleaned, and is optimal for cleaning precision parts such as electronic parts and electric parts.
【０００８】加えて、比重分離により上層側に分離され
て二次洗浄液を含む一次洗浄液の中から該一次洗浄液を
分離して二次洗浄液のみを蒸留再生して洗浄工程に返還
するので、二次洗浄液の回収効率を高めて、この二次洗
浄液の再利用性の向上を図ることができる効果がある。In addition, since the primary cleaning solution is separated from the primary cleaning solution containing the secondary cleaning solution by being separated into the upper layer by specific gravity separation, only the secondary cleaning solution is distilled and regenerated and returned to the washing step. There is an effect that the recovery efficiency of the cleaning liquid can be enhanced and the reusability of the secondary cleaning liquid can be improved.
【０００９】しかも不活性溶剤を主成分とする二次洗浄
液が貯溜されたワーク洗浄手段の液面には、ワークの洗
浄により一次洗浄液が浮遊するが、この一次洗浄液を液
面洗浄手段からの二次洗浄液の液面吐出により積極的に
上述の比重分離手段へオーバフローさせるので、一次洗
浄液がワークに再付着することがないのは勿論、ワーク
洗浄手段に貯溜される二次洗浄液の純度を高純度に保つ
ことができ、長期にわたる高洗浄効率を維持、確保する
ことができる効果があり、上述の各構成要素を有機的に
結合して採用することにより、ワークの洗浄効率の向上
を図ることができる効果がある。In addition, the primary cleaning liquid floats on the liquid surface of the work cleaning means in which the secondary cleaning liquid containing an inert solvent as a main component is stored by washing the work. Since the surface of the next cleaning liquid is positively overflown to the above-mentioned specific gravity separation means, the primary cleaning liquid does not re-adhere to the work, and of course, the purity of the secondary cleaning liquid stored in the work cleaning means is high. Has the effect of maintaining and securing high cleaning efficiency over a long period of time. By using the above-mentioned components in an organically combined manner, it is possible to improve the cleaning efficiency of the workpiece. There is an effect that can be done.
【００１０】さらに、二次洗浄液中からワークを引上げ
てその上部の蒸気領域で乾燥させるので、乾燥処理中に
一次洗浄液を含む二次洗浄液の再付着が防止できると共
に、ワークの引上げ工程で乾燥処理ができ、処理操作が
簡単化される。Further, since the workpiece is pulled up from the secondary cleaning liquid and dried in the vapor region above the secondary cleaning liquid, it is possible to prevent the secondary cleaning liquid including the primary cleaning liquid from re-adhering during the drying processing, and to perform the drying processing in the work lifting step. And the processing operation is simplified.
【００１１】さらに、比重分離手段は、ワーク洗浄手段
と蒸気発生手段とに隣接配置しているので、洗浄処理さ
れた一次洗浄液を含む二次洗浄液を比重分離すると共
に、蒸気発生手段からオーバフローした二次洗浄液を受
入れることができ、これによって、蒸気発生手段にはオ
ーバフローする二次洗浄液を回収する回収樋や該液を貯
留する貯留槽などの回収処理手段が不要となり、また蒸
気発生手段の余分な二次洗浄液が比重分離手段に回収さ
れることにより、蒸気発生手段を必要限度に小型に形成
してコンパクト化を図ることができる。 Further, the specific gravity separating means is a work washing means.
And steam generation means,
Separation of the secondary cleaning solution containing the primary cleaning solution
Receives the overflowed secondary cleaning liquid from the steam generator.
The steam generation means
A collection gutter for collecting the secondary cleaning liquid
This eliminates the need for recovery processing means such as storage tanks,
Excess secondary washing liquid from the gas generation means is collected by the specific gravity separation means.
The steam generation means as small as necessary
Thus, compactness can be achieved.
【００１２】[0012]
【実施例】この発明の一実施例を以下図面に基づいて詳
述する。図面は炭化水素系溶剤を主成分とする一次洗浄
液でプリント基板を洗浄処理した後、不活性溶剤を主成
分とする二次洗浄液でワークとしてのプリント基板を洗
浄処理するワーク洗浄装置を示し、図１において、この
ワーク洗浄装置１は、気密状態に密閉される洗浄室２内
部に、例えば、ナフテゾール（商品名、日本石油化学株
式会社製）等の炭化水素系溶剤を主成分とする一次洗浄
液Ｌでプリント基板Ｗを洗浄除去した後、例えば、ハイ
ドロフルオロカーボンつまりＨＦＣ等の不活性溶剤を主
成分とする二次洗浄液Ｆでプリント基板Ｗを洗浄処理す
る洗浄槽３と、プリント基板Ｗの洗浄処理に使用された
二次洗浄液Ｆを蒸留再生する蒸留再生槽４とを備えてい
る。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below in detail with reference to the drawings. The drawing shows a work cleaning apparatus that cleans a printed circuit board with a primary cleaning liquid mainly containing a hydrocarbon solvent and then cleans a printed circuit board as a work with a secondary cleaning liquid mainly containing an inert solvent. 1, a work cleaning apparatus 1 includes a primary cleaning liquid L containing a hydrocarbon-based solvent such as naphthesol (trade name, manufactured by Nippon Petrochemical Co., Ltd.) inside a cleaning chamber 2 that is hermetically sealed. After cleaning and removing the printed circuit board W by, for example, a cleaning tank 3 for cleaning the printed circuit board W with a secondary cleaning liquid F containing an inert solvent such as hydrofluorocarbon, ie, HFC as a main component, and a cleaning process for the printed circuit board W A distillation regeneration tank 4 for distilling and regenerating the used secondary washing liquid F is provided.
【００１３】上述の洗浄槽３は、該洗浄槽３の下部にプ
リント基板Ｗ全体を二次洗浄液Ｆ中に浸漬して超音波洗
浄する超音波洗浄槽５と、二次洗浄液Ｆ（ＨＦＣの比重
＝１．５８）中に含まれる一次洗浄液Ｌ（ＨＣの比重＝
０．８１５）を比重分離する比重分離槽６と、蒸留再生
された二次洗浄液Ｆを蒸発気化する蒸気発生槽７とを配
設し、この上記発生槽７の上部の側部壁面に凝縮液化さ
れた二次洗浄液Ｆを水分離するための水分離槽８を接続
している。The cleaning tank 3 includes an ultrasonic cleaning tank 5 provided under the cleaning tank 3 for immersing the entire printed circuit board W in a secondary cleaning liquid F for ultrasonic cleaning, and a secondary cleaning liquid F (specific gravity of HFC). = 1.58) contained in the primary cleaning liquid L (specific gravity of HC =
0.815), and a steam generating tank 7 for evaporating and evaporating the secondary cleaning liquid F regenerated by distillation, and condensed and liquefied on the upper side wall of the generating tank 7. A water separation tank 8 for separating the separated secondary cleaning liquid F into water is connected.
【００１４】また、洗浄槽３における超音波洗浄槽５と
対応する直上位置にプリント基板Ｗの出入れが許容され
る大きさに形成したワーク出入口９を開口し、超音波洗
浄槽５の上部蒸気領域と対応する内側壁面に冷却ジャケ
ット１０を配管し、この内側壁面に接続した水分離槽８
の上部蒸気領域に冷却コイル１１を配管し、例えば、適
宜温度に冷却された冷媒を冷却ジャケット１０および冷
却コイル１１に循環供給して、洗浄槽３内部の上部蒸気
領域に放出された二次洗浄液Ｆの蒸気Ｆａおよび槽内部
に侵入する大気中の水分が凝縮液化する温度に冷却ジャ
ケット１０および冷却コイル１１を保温する。A work inlet / outlet 9 formed in the cleaning tank 3 at a position directly above the ultrasonic cleaning tank 5 corresponding to the ultrasonic cleaning tank 5 and having a size permitting the entry and exit of the printed circuit board W is opened. A cooling jacket 10 is piped on an inner wall surface corresponding to the region, and a water separation tank 8 connected to the inner wall surface is provided.
A cooling coil 11 is piped in the upper steam area of the cleaning tank 3, for example, a coolant cooled to an appropriate temperature is circulated and supplied to the cooling jacket 10 and the cooling coil 11, and the secondary cleaning liquid discharged to the upper steam area in the cleaning tank 3. The temperature of the cooling jacket 10 and the cooling coil 11 is kept at a temperature at which the vapor Fa of F and the moisture in the atmosphere entering the tank are condensed and liquefied.
【００１５】前述の超音波洗浄槽５は、プリント基板Ｗ
全体が浸漬される貯液レベルまで二次洗浄液Ｆを所定量
貯液し、この超音波洗浄槽５の内部の底部壁面に二次洗
浄液Ｆを超音波振動させるための超音波振動子１２を配
設し、例えば、２７KHz 〜２００KHz の振動周波数で超
音波振動子１２を振動させて二次洗浄液Ｆに超音波振動
を誘起する。かつ、超音波洗浄槽５に貯液された二次洗
浄液Ｆの液面部分（換言すればワーク洗浄により二次洗
浄液Ｆ上に浮遊する一次洗浄液Ｌの部分）と対応する上
流側壁面に液面洗浄手段としての液面洗浄ノズル１３を
接続し、この液面洗浄ノズル１３の吐出方向を下流側に
配設した比重分離槽６側に向けて水平固定している。か
つ、上流側に配設した超音波洗浄槽５と、下流側に配設
した比重分離槽６との上端側壁部間に、上流側の超音波
洗浄槽５から下流側の比重分離槽６に向けて液面部分の
二次洗浄液Ｆ（一次洗浄液Ｌを含んだ状態の二次洗浄
液）をオーバーフローさせるための流下板１４を斜設し
ている。The above-described ultrasonic cleaning tank 5 includes a printed circuit board W
A predetermined amount of the secondary cleaning liquid F is stored to a liquid level at which the whole is immersed, and an ultrasonic vibrator 12 for ultrasonically vibrating the secondary cleaning liquid F is arranged on the bottom wall inside the ultrasonic cleaning tank 5. The ultrasonic vibrator 12 is vibrated at a vibration frequency of, for example, 27 KHz to 200 KHz to induce ultrasonic vibration in the secondary cleaning liquid F. In addition, the liquid surface portion of the secondary cleaning liquid F stored in the ultrasonic cleaning tank 5 (in other words, the portion of the primary cleaning liquid L floating on the secondary cleaning liquid F due to the work cleaning) corresponds to the liquid level on the upstream side wall surface. A liquid level cleaning nozzle 13 as a cleaning means is connected, and the discharge direction of the liquid level cleaning nozzle 13 is horizontally fixed toward the specific gravity separation tank 6 disposed downstream. In addition, between the upstream ultrasonic cleaning tank 5 and the downstream specific gravity separation tank 6, between the upper end side walls of the ultrasonic cleaning tank 5 disposed on the upstream side and the specific gravity separation tank 6 disposed on the downstream side. A flow-down plate 14 for causing the secondary cleaning liquid F (the secondary cleaning liquid containing the primary cleaning liquid L) to overflow toward the liquid surface is inclined.
【００１６】前述の比重分離槽６は、該比重分離槽６の
内部の下部貯液領域を左右分割する位置に２枚の各仕切
り板６ｃ，６ｄを垂設して各分離槽６ａ，６ｂを分割形
成し、一方の分離槽６ａの液面部分に浮上した一次洗浄
液Ｌと対応する側部壁面に各排出用バルブ１５，１６
と、排出用ポンプ１７とを介して液排出路１８の一端側
を接続し、この液排出路１８の他端側を後述する蒸留再
生槽４に貯液される二次洗浄液Ｆの液面部分よりも上部
壁面に接続している。The above-mentioned specific gravity separation tank 6 is provided with two partition plates 6c and 6d vertically suspended at the position where the lower liquid storage area inside the specific gravity separation tank 6 is divided into right and left parts. Each of the discharge valves 15 and 16 is formed on a side wall surface corresponding to the primary cleaning liquid L which has been divided and floated on the liquid surface portion of one of the separation tanks 6a.
And one end of a liquid discharge passage 18 via a discharge pump 17, and the other end of the liquid discharge passage 18 is connected to a liquid surface portion of a secondary cleaning liquid F stored in a distillation regeneration tank 4 described later. Than the upper wall.
【００１７】かつ、他方の分離槽６ｂの下部貯液領域と
対応する底部壁面に循環用バルブ１９と、循環用ポンプ
２０と、フィルタ２１と、熱交換器２２とを介して液循
環路２３の一端側を接続し、この液循環路２３の他端側
を各循環用バルブ２４，２５を介して超音波洗浄槽５の
上部貯液領域と対応する側部壁面と、上流側壁面に固定
した液面洗浄ノズル１３とにそれぞれ接続している。す
なわち、循環用ポンプ２０を駆動して、比重分離槽６の
他方の分離槽６ｂ側に貯液された二次洗浄液Ｆをフィル
ター２１および熱交換器２２を介して超音波洗浄槽５と
液面洗浄ノズル１３とに供給する。On the bottom wall surface corresponding to the lower liquid storage area of the other separation tank 6b, a circulation valve 19, a circulation pump 20, a filter 21 and a heat exchanger 22 One end is connected, and the other end of the liquid circulation path 23 is fixed to the side wall surface corresponding to the upper liquid storage region of the ultrasonic cleaning tank 5 and the upstream side wall surface via the respective circulation valves 24 and 25. It is connected to the liquid level cleaning nozzle 13 respectively. That is, the circulation pump 20 is driven, and the secondary cleaning liquid F stored in the other separation tank 6 b side of the specific gravity separation tank 6 is separated from the ultrasonic cleaning tank 5 through the filter 21 and the heat exchanger 22. The cleaning nozzle 13 is supplied.
【００１８】前述の蒸気発生槽７は、この蒸気発生槽７
の内部の底部壁面に二次洗浄液Ｆを加熱するための加熱
管２６を配管し、例えば、適宜温度に加熱されたオイル
や水溶液等の加熱媒体を加熱管２６に循環供給して、こ
の蒸気発生槽７の内部に貯液された二次洗浄液Ｆが蒸発
気化する沸点温度に加熱管２６を加熱する。かつ、蒸気
発生槽７の下部貯液領域と対応する側部壁面に各返還用
バルブ２７，２８が介設された各液返還路２９，３０の
一端側を接続し、これら各液返還路２９，３０の他端側
を上述した水分離槽８の底部壁面および後述する水分離
槽４１の底部壁面に接続している。かつ、下流側に配設
した比重分離槽６と、上流側に配設した蒸気発生槽７と
の上端側壁部間に、上流側の蒸気発生槽７から下流側の
比重分離槽６に向けて蒸留再生された二次洗浄液Ｆをオ
ーバーフローするための流下板３１を斜設している。The above-mentioned steam generating tank 7 is
A heating pipe 26 for heating the secondary cleaning liquid F is piped to the bottom wall surface of the inside, and a heating medium such as an oil or an aqueous solution heated to an appropriate temperature is circulated and supplied to the heating pipe 26 to generate steam. The heating pipe 26 is heated to a boiling point at which the secondary cleaning liquid F stored in the tank 7 evaporates. In addition, one end of each of liquid return paths 29 and 30 in which return valves 27 and 28 are interposed are connected to side wall surfaces corresponding to the lower liquid storage area of the steam generation tank 7, and these liquid return paths 29 are connected. , 30 are connected to the bottom wall surface of the water separation tank 8 described above and the bottom wall surface of the water separation tank 41 described later. In addition, between the upstream-side steam generation tank 7 and the downstream-side specific gravity separation tank 6, between the upper end side wall portions of the specific gravity separation tank 6 provided on the downstream side and the steam generation tank 7 provided on the upstream side. A falling plate 31 for overflowing the distilled and regenerated secondary washing liquid F is provided obliquely.
【００１９】前述の蒸留再生槽４は、該蒸留再生槽４の
内部の底部壁面に二次洗浄液Ｆを加熱するための加熱管
３２を配管し、例えば、適宜温度に加熱されたオイルや
水溶液等の加熱媒体を加熱管３２に循環供給して、該蒸
留再生槽４の内部に回収された二次洗浄液Ｆが蒸発気化
する沸点温度に加熱管３２を加熱する。かつ、蒸留再生
槽４の上部貯液領域と対応する側部壁面に循環用バルブ
３３と、循環用ポンプ３４とを介して液循環路３５の一
端側を接続し、この液循環路３５の他端側を循環用バル
ブ３６と、溶剤分離槽３７とを介して蒸留再生槽４の下
部貯液領域と対応する側部壁面に接続している。すなわ
ち、循環用ポンプ３４を駆動して、蒸留再生槽４に回収
された一次洗浄液Ｌを溶剤分離槽３７に供給し、例え
ば、沸点や比重等の特性を利用して二次洗浄液Ｆから一
次洗浄液Ｌのみを分離すると共に、分離された二次洗浄
液Ｆを蒸留再生槽４に返還供給する。The above-mentioned distillation regeneration tank 4 is provided with a heating pipe 32 for heating the secondary cleaning liquid F on the bottom wall inside the distillation regeneration tank 4, for example, oil or aqueous solution heated to an appropriate temperature. Is circulated and supplied to the heating tube 32 to heat the heating tube 32 to a boiling point at which the secondary cleaning liquid F recovered in the distillation regeneration tank 4 evaporates. Further, one end of a liquid circulation path 35 is connected to a side wall surface corresponding to the upper liquid storage area of the distillation regeneration tank 4 via a circulation valve 33 and a circulation pump 34, The end is connected to a side wall surface corresponding to a lower storage area of the distillation and regeneration tank 4 via a circulation valve 36 and a solvent separation tank 37. That is, the circulating pump 34 is driven to supply the primary cleaning liquid L collected in the distillation and regeneration tank 4 to the solvent separation tank 37. For example, the secondary cleaning liquid F is converted from the primary cleaning liquid F using characteristics such as a boiling point and specific gravity. While separating only L, the separated secondary washing liquid F is returned and supplied to the distillation and regeneration tank 4.
【００２０】かつ、蒸留再生槽４の上部蒸気領域と対応
する内側壁面に冷却ジャケット３８を配管し、例えば、
適宜温度に冷却された冷媒を冷却ジャケット３８に循環
供給して、この蒸留再生槽４内部の上部蒸気領域に放出
された二次洗浄液Ｆの蒸気Ｆａが凝縮液化する温度に冷
却ジャケット３８を保温する。かつ、冷却ジャケット３
８と対応する下部壁面に凝縮液化された二次洗浄液Ｆを
滴下するための液滴下槽３９を配設し、この液滴下槽３
９の下部貯液領域と対応する側部壁面に液排出口４０を
接続すると共に、液排出口４０と対応する下部壁面に凝
縮液化された二次洗浄液Ｆを水分離するための水分離槽
４１を接続している。In addition, a cooling jacket 38 is provided on the inner wall surface corresponding to the upper steam region of the distillation regeneration tank 4, and for example,
The coolant cooled to an appropriate temperature is circulated and supplied to the cooling jacket 38 to keep the temperature of the cooling jacket 38 at a temperature at which the vapor Fa of the secondary cleaning liquid F discharged into the upper vapor region inside the distillation regeneration tank 4 is condensed and liquefied. . And cooling jacket 3
A lower drop tank 39 for dropping the condensed and liquefied secondary cleaning liquid F is disposed on the lower wall surface corresponding to 8 and the lower drop tank 3 is provided.
9 is connected to a side wall surface corresponding to the lower liquid storage area of the liquid storage tank 9 and a water separation tank 41 for separating the condensed and liquefied secondary cleaning liquid F from the lower wall surface corresponding to the liquid discharge port 40. Are connected.
【００２１】図示実施例は上記の如く構成するものにし
て、以下、ワーク洗浄装置１によるプリント基板Ｗの洗
浄作用についてを説明する。まず、図１に示すように、
蒸気発生槽７に貯液されたハイドロフルオロカーボンを
主成分とする二次洗浄液Ｆを加熱管２６により適宜温度
に加熱して、洗浄槽３内部の上部蒸気領域に二次洗浄液
Ｆの蒸気Ｆａを放出した後、炭化水素系溶剤を主成分と
する一次洗浄液Ｌで予め洗浄処理したプリント基板Ｗを
洗浄槽３内部に搬入し、洗浄槽３内部に放出された二次
洗浄液Ｆの蒸気Ｆａ中を通過させて、超音波洗浄槽５に
貯液された二次洗浄液Ｆ中にプリント基板Ｗ全体を浸漬
する。The illustrated embodiment is configured as described above, and the operation of cleaning the printed circuit board W by the work cleaning apparatus 1 will be described below. First, as shown in FIG.
The secondary cleaning liquid F containing hydrofluorocarbon as a main component and stored in the vapor generation tank 7 is heated to an appropriate temperature by the heating pipe 26, and the vapor Fa of the secondary cleaning liquid F is discharged to the upper vapor region inside the cleaning tank 3. After that, the printed circuit board W preliminarily cleaned with the primary cleaning liquid L containing a hydrocarbon solvent as a main component is carried into the cleaning tank 3 and passes through the vapor Fa of the secondary cleaning liquid F discharged into the cleaning tank 3. Then, the entire printed circuit board W is immersed in the secondary cleaning liquid F stored in the ultrasonic cleaning tank 5.
【００２２】この後、超音波振動子１２を振動させて、
二次洗浄液Ｆのキャビテーションによりプリント基板Ｗ
に付着した一次洗浄液Ｌを剥離除去し、剥離除去した一
次洗浄液Ｌと二次洗浄液Ｆとを互いに乳化させると共
に、超音波洗浄槽５の液面部分に比重が小さい一次洗浄
液Ｌを浮上させる。同時に、循環用ポンプ２０を駆動し
て、比重分離槽６の分離槽６ｂに貯液された二次洗浄液
Ｆを超音波洗浄槽５および液面洗浄ノズル１３に供給
し、この液面洗浄ノズル１３から吐出する二次洗浄液Ｆ
の噴流により超音波洗浄槽５の液面部分に浮上した一次
洗浄液Ｌを比重分離槽６の分離槽６ａ側にオーバーフロ
ーさせる。Thereafter, the ultrasonic vibrator 12 is vibrated to
Printed circuit board W by cavitation of secondary cleaning solution F
The primary cleaning liquid L adhered to the substrate is peeled and removed, and the peeled and removed primary cleaning liquid L and the secondary cleaning liquid F are emulsified with each other, and the primary cleaning liquid L having a small specific gravity floats on the liquid surface portion of the ultrasonic cleaning tank 5. At the same time, the circulation pump 20 is driven to supply the secondary cleaning liquid F stored in the separation tank 6 b of the specific gravity separation tank 6 to the ultrasonic cleaning tank 5 and the liquid level cleaning nozzle 13. Cleaning liquid F discharged from
The primary cleaning liquid L that has floated on the liquid surface portion of the ultrasonic cleaning tank 5 by the jet flow overflows to the separation tank 6 a side of the specific gravity separation tank 6.
【００２３】次に、一次洗浄液Ｌと二次洗浄液Ｆとを乳
化した状態のまま比重分離槽６の分離槽６ａ側にオーバ
ーフローして比重分離する。すなわち、比重分離槽６の
分離槽６ａに貯液された二次洗浄液Ｆの液面部分に比重
が小さい一次洗浄液Ｌを浮上させ、排出用ポンプ１７を
駆動して、分離槽６ａの液面部分に浮上した比重が小さ
い一次洗浄液Ｌ（二次洗浄液Ｆを含んだ状態の一次洗浄
液Ｌ）を蒸留再生槽４に供給する。一方、分離槽６ａの
底部に降下した比重が大きい二次洗浄液Ｆを分離槽６ｂ
側にオーバーフローさせ、循環用ポンプ２０を駆動し
て、比重分離槽６の分離槽６ｂに貯液された二次洗浄液
Ｆを超音波洗浄槽５および液面洗浄ノズル１３に供給す
る。Next, the primary washing liquid L and the secondary washing liquid F are overflowed to the separation tank 6a side of the specific gravity separation tank 6 in an emulsified state to be separated by specific gravity. That is, the primary cleaning liquid L having a small specific gravity is floated on the liquid surface portion of the secondary cleaning liquid F stored in the separation tank 6a of the specific gravity separation tank 6, and the discharge pump 17 is driven to drive the liquid surface portion of the separation tank 6a. The primary cleaning liquid L having a small specific gravity (the primary cleaning liquid L containing the secondary cleaning liquid F) is supplied to the distillation regeneration tank 4. On the other hand, the secondary cleaning liquid F having a large specific gravity that has dropped to the bottom of the separation tank 6a is supplied to the separation tank 6b.
The secondary cleaning liquid F stored in the separation tank 6 b of the specific gravity separation tank 6 is supplied to the ultrasonic cleaning tank 5 and the liquid level cleaning nozzle 13 by driving the circulation pump 20.
【００２４】同時に、循環用ポンプ３４を駆動して、蒸
留再生槽４に回収された一次洗浄液Ｌ（二次洗浄液を含
んだ状態の一次洗浄液）を溶剤分離槽３７に供給し、こ
の溶剤分離槽３７で一次洗浄液Ｌと二次洗浄液Ｆとを分
離して、分離された二次洗浄液Ｆのみを蒸留再生槽４に
返還する。蒸留再生槽４に貯液された二次洗浄液Ｆを加
熱管３２により加熱して蒸発気化させ、この蒸留再生槽
４の内部に放出された二次洗浄液Ｆの蒸気Ｆａを冷却ジ
ャケット３８で凝縮液化して液滴下槽３９に滴下し、こ
の液滴下槽３９に滴下された二次洗浄液Ｆを水分離槽４
１にオーバーフローする。かつ、洗浄槽３内部に放出さ
れた二次洗浄液Ｆの蒸気Ｆａを冷却ジャケット１０およ
び冷却コイル１１で凝縮液化して水分離槽８に滴下す
る。At the same time, the circulation pump 34 is driven to supply the primary cleaning liquid L (the primary cleaning liquid containing the secondary cleaning liquid) collected in the distillation and regeneration tank 4 to the solvent separation tank 37, At 37, the primary cleaning liquid L and the secondary cleaning liquid F are separated, and only the separated secondary cleaning liquid F is returned to the distillation regeneration tank 4. The secondary cleaning liquid F stored in the distillation regeneration tank 4 is heated by the heating pipe 32 to evaporate and evaporate, and the vapor Fa of the secondary cleaning liquid F discharged into the distillation regeneration tank 4 is condensed and liquefied by the cooling jacket 38. Then, the secondary cleaning liquid F dropped into the droplet lowering tank 39 is dropped into the water separating tank 4.
Overflows to 1. In addition, the vapor Fa of the secondary cleaning liquid F discharged into the cleaning tank 3 is condensed and liquefied by the cooling jacket 10 and the cooling coil 11 and dropped into the water separation tank 8.
【００２５】かつ、上述の各水分離槽８，４１に貯液さ
れた二次洗浄液Ｆを蒸気発生槽７に返還し、この蒸気発
生槽７に貯液された二次洗浄液Ｆを加熱管２６により加
熱して、洗浄槽３内部の上部蒸気領域に二次洗浄液Ｆの
蒸気Ｆａを放出することで、蒸留再生された不純物の少
ない二次洗浄液Ｆの蒸気Ｆａでプリント基板Ｗを蒸気洗
浄することができる。一方、蒸気発生槽７に貯液された
二次洗浄液Ｆを比重分離槽６の分離槽６ｂ側にオーバー
フローし、循環用ポンプ２０を駆動して、比重分離槽６
の分離槽６ｂに貯液された二次洗浄液Ｆを超音波洗浄槽
５および液面洗浄ノズル１３に供給することで、超音波
洗浄槽５に貯液される二次洗浄液Ｆの純度を一定の高純
度に保つことができ、蒸留再生された高純度の二次洗浄
液Ｆでプリント基板Ｗを洗浄処理することができる。The secondary cleaning liquid F stored in each of the water separation tanks 8 and 41 is returned to the steam generation tank 7, and the secondary cleaning liquid F stored in the steam generation tank 7 is returned to the heating pipe 26. To discharge the vapor Fa of the secondary cleaning liquid F into the upper vapor region inside the cleaning tank 3 to vapor-clean the printed circuit board W with the vapor-repelled secondary cleaning liquid F containing less impurities. Can be. On the other hand, the secondary cleaning liquid F stored in the steam generation tank 7 overflows to the separation tank 6 b side of the specific gravity separation tank 6, and the circulation pump 20 is driven to drive the specific cleaning tank 6.
By supplying the secondary cleaning liquid F stored in the separation tank 6b to the ultrasonic cleaning tank 5 and the liquid level cleaning nozzle 13, the purity of the secondary cleaning liquid F stored in the ultrasonic cleaning tank 5 is kept constant. The printed circuit board W can be cleaned with the high-purity secondary cleaning solution F that can be maintained at a high purity and is distilled and regenerated.
【００２６】次に、洗浄処理後において、超音波洗浄槽
５に貯液された二次洗浄液Ｆ中からプリント基板Ｗを取
り出し、洗浄槽３内部の上部蒸気領域に放出された二次
洗浄液Ｆの蒸気Ｆａでプリント基板Ｗを適宜温度に加熱
して乾燥処理する。この後、洗浄処理されたプリント基
板Ｗを洗浄室２外に搬出することで、一つのプリント基
板Ｗの洗浄処理が終了する。Next, after the cleaning processing, the printed circuit board W is taken out of the secondary cleaning liquid F stored in the ultrasonic cleaning tank 5 and the secondary cleaning liquid F discharged into the upper vapor region inside the cleaning tank 3 is removed. The printed circuit board W is heated to an appropriate temperature with the steam Fa and dried. Thereafter, the printed circuit board W that has been subjected to the cleaning process is carried out of the cleaning chamber 2 to complete the cleaning process for one printed circuit board W.
【００２７】以上のように、炭化水素系溶剤を主成分と
する一次洗浄液Ｌによりプリント基板Ｗを洗浄処理した
後、蒸留再生されたハイドロフルオロカーボンを主成分
とする二次洗浄液Ｆによりプリント基板Ｗを洗浄処理す
るので、従来方法では除去することが困難であった一次
洗浄液Ｌの残液をも確実に剥離除去することができ、高
度な技術を必要とする残渣のない洗浄処理が簡単かつ容
易に行える。また、蒸留再生された高純度の二次洗浄液
Ｆでプリント基板Ｗを洗浄処理するため、プリント基板
Ｗ全体を確実かつ綺麗に洗浄処理でき、電子部品や電気
部品等の精密部品を洗浄処理するのに最適である。As described above, after cleaning the printed circuit board W with the primary cleaning liquid L containing a hydrocarbon solvent as a main component, the printed circuit board W is washed with a secondary cleaning liquid F containing a hydrofluorocarbon as a main component, which has been recycled. Since the cleaning treatment is performed, the residual liquid of the primary cleaning liquid L, which has been difficult to remove by the conventional method, can be reliably peeled and removed, and the residue-free cleaning treatment that requires advanced technology can be easily and easily performed. I can do it. Further, since the printed circuit board W is washed with the high-purity secondary cleaning liquid F that has been distilled and regenerated, the entire printed circuit board W can be reliably and neatly cleaned, and the precision processing of electronic components and electric components can be performed. Ideal for
【００２８】加えて、比重分離により上層側に分離され
て二次洗浄液Ｆを含む一次洗浄液Ｌの中から該一次洗浄
液Ｌを分離して二次洗浄液Ｆのみを蒸留再生して洗浄工
程に返還するので、二次洗浄液Ｆの回収効率を高めて、
この二次洗浄液Ｆの再利用性の向上を図ることができる
効果がある。In addition, the primary cleaning solution L is separated from the primary cleaning solution L containing the secondary cleaning solution F by the specific gravity separation, and only the secondary cleaning solution F is distilled and regenerated to return to the cleaning step. Therefore, the recovery efficiency of the secondary cleaning solution F is increased,
There is an effect that the reusability of the secondary cleaning liquid F can be improved.
【００２９】しかも不活性溶剤を主成分とする二次洗浄
液Ｆが貯溜されたワーク洗浄手段（超音波洗浄槽５参
照）の液面には、ワークＷの洗浄により一次洗浄液Ｌが
浮遊するが、この一次洗浄液Ｌを液面洗浄手段（液面洗
浄ノズル１３参照）からの二次洗浄液Ｆの液面吐出によ
り積極的に上述の比重分離手段（比重分離槽６参照）ヘ
オーバフローさせるので、一次洗浄液ＬがワークＷに再
付着することがないのは勿論、ワーク洗浄手段（超音波
洗浄槽５参照）に貯溜される二次洗浄液Ｆの純度を高純
度に保つことができて、長期にわたる高洗浄効率を維
持、確保することができる効果があり、上述の各構成要
素を有機的に結合して採用することにより、ワークの洗
浄効率の向上を図ることができる効果がある。Moreover, the primary cleaning liquid L floats on the liquid surface of the work cleaning means (see the ultrasonic cleaning tank 5) in which the secondary cleaning liquid F containing an inert solvent as a main component is stored by cleaning the work W. Since the primary cleaning liquid L positively overflows to the above-described specific gravity separation means (see the specific gravity separation tank 6) by the liquid level discharge of the secondary cleaning liquid F from the liquid level cleaning means (see the liquid level cleaning nozzle 13), the primary cleaning liquid L Not to prevent L from re-adhering to the workpiece W, the secondary cleaning liquid F stored in the workpiece cleaning means (refer to the ultrasonic cleaning tank 5) can be kept at a high purity, and high cleaning for a long time can be maintained. There is an effect that the efficiency can be maintained and ensured, and there is an effect that the efficiency of cleaning the work can be improved by organically combining and adopting the above-described respective components.
【００３０】この発明の構成と、上述の実施例との対応
において、この発明のワークは、実施例のプリント基板
Ｗに対応し、以下同様に、ワーク洗浄手段は、超音波洗
浄槽５に対応し、蒸留再生手段は、蒸留再生槽４に対応
し、比重分離手段は、比重分離槽６に対応し、液面洗浄
手段は、液面洗浄ノズル１３に対応するも、この発明
は、上述の実施例の構成のみに限定されるものではな
い。In the correspondence between the configuration of the present invention and the above-described embodiment, the work of the present invention corresponds to the printed circuit board W of the embodiment, and similarly, the work cleaning means corresponds to the ultrasonic cleaning tank 5. The distillation regeneration means corresponds to the distillation regeneration tank 4, the specific gravity separation means corresponds to the specific gravity separation tank 6, and the liquid level cleaning means corresponds to the liquid level cleaning nozzle 13. The configuration is not limited only to the configuration of the embodiment.
【００３１】例えば、上記実施例においては不活性溶剤
としてハイドロフルオロカーボンを例示したが、ＰＦＣ
（パーフロオロカーボン）などの他の不活性溶剤やその
他の完全フッ素化溶剤であってもよいことは勿論であ
る。For example, in the above embodiment, hydrofluorocarbon is exemplified as the inert solvent.
Of course, other inert solvents such as (perfluorocarbon) and other completely fluorinated solvents may be used.
【図１】本発明のワーク洗浄装置を示す全体構成図。FIG. 1 is an overall configuration diagram showing a work cleaning apparatus of the present invention.
Ｌ…一次洗浄液 Ｆ…二次洗浄液 Ｗ…ワーク ４…蒸留再生槽 ５…超音波洗浄槽 ６…比重分離槽 １３…液面洗浄のノズル L: Primary cleaning liquid F: Secondary cleaning liquid W: Workpiece 4: Distillation regeneration tank 5: Ultrasonic cleaning tank 6: Specific gravity separation tank 13: Nozzle for liquid surface cleaning
Claims (1)
（Ｌ）により洗浄処理されたワーク（Ｗ）を不活性溶剤
を主成分とする二次洗浄液（Ｆ）により洗浄処理するワ
ーク洗浄装置であって、 蒸気化された二次洗浄液（Ｆ）の蒸気領域を上部に形成
し、上記一次洗浄液（Ｌ）により洗浄処理されたワーク
（Ｗ）を二次洗浄液（Ｆ）により洗浄処理するワーク洗
浄手段（５）と、 二次洗浄液（Ｆ）を蒸気化して上記ワーク洗浄手段
（５）の蒸気領域に放出する蒸気発生手段（７）と、前記ワーク洗浄手段（５）と蒸気発生手段（７）とに隣
接配置され、 洗浄処理に使用された一次洗浄液（Ｌ）を
含む二次洗浄液（Ｆ）を比重分離し、蒸気発生手段
（７）からオーバフローする二次洗浄液を受入れる比重
分離手段（６）と、 上記比重分離により上層側に分離された二次洗浄液
（Ｆ）を含む一次洗浄液（Ｌ）の中から該一次洗浄液
（Ｌ）を分離して二次洗浄液（Ｆ）のみを蒸留再生して
上記蒸気発生手段（７）に返還する蒸留再生手段（４）
と、 上記ワーク洗浄手段（５）の液面に浮遊した一次洗浄液
（Ｌ）を二次洗浄液（Ｆ）の液面吐出により上記比重分
離手段（６）にオーバフローさせる液面洗浄手段（１
３）とを備えたワーク洗浄装置。1. A workpiece cleaning apparatus for cleaning a workpiece (W) cleaned by a primary cleaning liquid (L) mainly containing a hydrocarbon solvent with a secondary cleaning liquid (F) mainly containing an inert solvent. A work in which a vapor region of the vaporized secondary cleaning liquid (F) is formed at an upper portion, and the work (W) cleaned by the primary cleaning liquid (L) is cleaned by the secondary cleaning liquid (F). A cleaning means (5); a steam generating means (7) for vaporizing the secondary cleaning liquid (F) and releasing the vaporized secondary cleaning liquid (F) into a steam area of the work cleaning means (5); a work cleaning means (5) and a steam generating means ( 7) next to
Is contact disposed, the secondary cleaning fluid (F) and gravity separation including primary cleaning liquid used in the cleaning process (L), steam generating means
A specific gravity separation means (6 ) for receiving the secondary cleaning liquid overflowing from (7); and a primary cleaning liquid (L) containing a secondary cleaning liquid (F) separated into an upper layer by the above specific gravity separation. ), And only the secondary washing liquid (F) is distilled and regenerated and returned to the steam generating means (7).
A liquid surface cleaning means (1) for causing the primary cleaning liquid (L) floating on the liquid surface of the work cleaning means (5) to overflow to the specific gravity separation means (6) by discharging the liquid surface of the secondary cleaning liquid (F);
3) A work cleaning apparatus comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5145504A JP2785923B2 (en) | 1993-05-24 | 1993-05-24 | Work cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5145504A JP2785923B2 (en) | 1993-05-24 | 1993-05-24 | Work cleaning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06328052A JPH06328052A (en) | 1994-11-29 |
| JP2785923B2 true JP2785923B2 (en) | 1998-08-13 |
Family
ID=15386792
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5145504A Expired - Lifetime JP2785923B2 (en) | 1993-05-24 | 1993-05-24 | Work cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2785923B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4557742B2 (en) * | 2005-02-15 | 2010-10-06 | 三洋電機株式会社 | Distillation equipment with solvent recovery function |
| JP5008171B2 (en) * | 2006-04-14 | 2012-08-22 | Ｊｘ日鉱日石エネルギー株式会社 | Cleaning method and cleaning composition |
| IT201900007257A1 (en) * | 2019-05-27 | 2020-11-27 | Meg Srl | PROCESS OF WASHING INDUSTRIAL ITEMS IN GENERAL SUCH AS PRECISION SMALL PARTS, MECHANICAL PARTS, PRINTED CIRCUITS, LENSES, WATCHES, JEWELERY, GLASSES OR OTHER PLANT IMPLEMENTING THIS PROCESS |
| CN114558837B (en) * | 2022-02-23 | 2023-03-31 | 惠州市飞世尔实业有限公司 | LCD Panel cleaning method and cleaning equipment |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04272194A (en) * | 1991-02-25 | 1992-09-28 | Toshiba Corp | Nonaqueous washing method |
| JPH04290586A (en) * | 1991-03-15 | 1992-10-15 | Japan Field Kk | Method and device for rinsing wash |
-
1993
- 1993-05-24 JP JP5145504A patent/JP2785923B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06328052A (en) | 1994-11-29 |
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