JP2597552Y2 - Pure water production equipment - Google Patents
Pure water production equipmentInfo
- Publication number
- JP2597552Y2 JP2597552Y2 JP1992058435U JP5843592U JP2597552Y2 JP 2597552 Y2 JP2597552 Y2 JP 2597552Y2 JP 1992058435 U JP1992058435 U JP 1992058435U JP 5843592 U JP5843592 U JP 5843592U JP 2597552 Y2 JP2597552 Y2 JP 2597552Y2
- Authority
- JP
- Japan
- Prior art keywords
- exchange resin
- pure water
- tower
- anion
- regeneration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Treatment Of Water By Ion Exchange (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本考案は複数のイオン交換塔を並
設してなる純水製造設備の改良に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement in a pure water production facility in which a plurality of ion exchange towers are juxtaposed.
【０００２】[0002]
【従来の技術】半導体ウエハーなどの洗浄には不純物質
を可能な限り除去した超純水が用いられるが、この超純
水を得るための一次側純水製造ライン中には陽イオン交
換樹脂と陰イオン交換樹脂のイオン交換機能を利用した
純水製造設備を付設することが行われている。そして、
この純水製造設備には、原水中のイオンを吸着して飽和
状態となったイオン交換樹脂を再生させるための再生設
備が付設されるのが一般的である。図３は従来の純水製
造設備の一例を示すものであり、図中３０は原水、３１
は陽イオン交換樹脂を充填してなるカチオン塔、３２は
カチオン塔３１を通過してきた処理水中の溶存炭酸ガス
を除去するための脱炭酸塔、３３は陰イオン交換樹脂を
充填してなるアニオン塔、３４は陽イオン交換樹脂と陰
イオン交換樹脂を混合して同一の塔内に充填した混床式
ポリシャー、３５は当該混床式ポリシャー３４を通った
処理水を溜めておく純水貯槽である。そして、カチオン
塔３１、アニオン塔３３および混床式ポリシャー３４内
のイオン交換樹脂が飽和状態に達すると、各イオン交換
塔内のイオン交換樹脂を再生する必要が生ずる。2. Description of the Related Art Ultrapure water from which impurities are removed as much as possible is used for cleaning semiconductor wafers and the like. A cation exchange resin is used in a primary side pure water production line for obtaining the ultrapure water. 2. Description of the Related Art A pure water production facility utilizing an ion exchange function of an anion exchange resin has been provided. And
The pure water production facility is generally provided with a regeneration facility for regenerating a saturated ion exchange resin by absorbing ions in raw water. FIG. 3 shows an example of a conventional pure water production facility.
Is a cation tower filled with a cation exchange resin, 32 is a decarbonation tower for removing dissolved carbon dioxide in the treated water passing through the cation tower 31, and 33 is an anion tower filled with an anion exchange resin And 34, a mixed-bed polisher in which a cation exchange resin and an anion-exchange resin are mixed and filled in the same tower, and 35 is a pure water storage tank for storing treated water passing through the mixed-bed polisher 34. . When the ion exchange resins in the cation tower 31, the anion tower 33 and the mixed bed type polisher 34 reach a saturated state, it becomes necessary to regenerate the ion exchange resins in the respective ion exchange towers.
【０００３】３６は陽イオン交換樹脂の再生剤となる例
えば塩酸の水溶液、３７は陰イオン交換樹脂の再生剤と
なる例えば苛性ソーダ溶液で、従来は図３に示すように
それぞれのイオン交換塔に専用の再生設備が付設されて
いた。すなわち、３８は塩酸水溶液３６の計量槽で、レ
ベルスイッチによって制御された必要量の塩酸水溶液３
６はカチオン塔３１内にのみ供給されるようになってい
る。また、３９は苛性ソーダ溶液３７の計量槽で、ここ
で計量された苛性ソーダ溶液３７はアニオン塔３３内に
のみ供給されるようになっている。さらに、混床式ポリ
シャー３４用の再生設備として、独立した塩酸水溶液３
６の計量槽４０と苛性ソーダ溶液３７の計量槽４１が用
意されていた。なお、陰イオン交換樹脂を再生するには
再生剤を４０〜５５℃程度に加温しなけばならず、その
ためスチーム源４２から供給される蒸気を苛性ソーダ溶
液の供給配管中に吹込んで苛性ソーダ溶液３７を加温す
るための蒸気吹込用のエゼクター４３，４４が二基付設
されている。Reference numeral 36 denotes an aqueous solution of, for example, hydrochloric acid as a regenerating agent for a cation exchange resin, and 37 denotes, for example, a caustic soda solution as a regenerating agent for an anion exchange resin. Conventionally, as shown in FIG. Was installed. That is, reference numeral 38 denotes a measuring tank for the hydrochloric acid aqueous solution 36, and a required amount of the hydrochloric acid aqueous solution 3 controlled by a level switch.
6 is supplied only into the cation tower 31. Reference numeral 39 denotes a measuring tank for the caustic soda solution 37, and the caustic soda solution 37 measured here is supplied only into the anion tower 33. Furthermore, as a regeneration facility for the mixed-bed polisher 34, an independent hydrochloric acid aqueous solution 3
6 and a measuring tank 41 for the caustic soda solution 37 were prepared. In order to regenerate the anion exchange resin, the regenerant must be heated to about 40 to 55 ° C. Therefore, the steam supplied from the steam source 42 is blown into the supply pipe of the caustic soda solution 37 There are provided two ejectors 43 and 44 for injecting steam for heating the heater.
【０００４】[0004]
【考案が解決しようとする課題】前記したように、従来
は純水製造ライン中に複数あるイオン交換塔にそれぞれ
専用の再生設備が付設され、当該専用の再生設備によっ
てイオン交換塔内のイオン交換樹脂を再生するようにし
ていた。しかしながら、このような従来設備によった場
合には、保守・点検が煩雑になると共に、設備費が大幅
に嵩みさらに設置スペースも余分に必要になるという問
題点があった。そこで本考案は、前記した従来の純水製
造設備の問題点を解消し、両イオン交換樹脂の再生設備
をそれぞれ一基づつ付設して複数のイオン交換塔内のイ
オン交換樹脂を再生することができるようになした純水
製造設備を提供することを目的とするものである。As described above, conventionally, a plurality of ion exchange towers in a pure water production line are each provided with a dedicated regeneration facility, and the dedicated regeneration facility provides ion exchange in the ion exchange tower. I was trying to regenerate the resin. However, in the case of using such conventional equipment, there has been a problem that maintenance and inspection are complicated, the equipment cost is significantly increased, and an extra installation space is required. Therefore, the present invention solves the above-mentioned problems of the conventional pure water production equipment, and it is possible to regenerate the ion exchange resins in a plurality of ion exchange towers by installing one regeneration equipment for both ion exchange resins. It is an object of the present invention to provide a pure water production facility which can be used.
【０００５】[0005]
【課題を解決するための手段】上記目的を達成するため
の本考案の構成を詳述すれば、陽イオン交換樹脂及び／
又は陰イオン交換樹脂が充填された複数のイオン交換塔
が併設された純水製造装置において、これらの陽イオン
交換樹脂と陰イオン交換樹脂のそれぞれの共通する再生
設備を一基づつ付設すると共に、これらの再生設備は、
対応する樹脂が充填されている異なるイオン交換塔に再
生剤を送り込めるように接続されていると共に、これら
各イオン交換塔に充填されているイオン交換樹脂を再生
するのに必要な量の再生剤を計量する計量槽が各再生設
備にそれぞれ設けられていることを特徴とする純水製造
設備であり、本考案によれば再生設備は陽イオン交換樹
脂用と陰イオン交換樹脂用の二基のみとなり、再生設備
に要する費用を大幅に節約することができるようになる
と共に、点検・保守に要する手間もかなり削減される
し、設備スペースも少なくて済むようになる。The constitution of the present invention for achieving the above object is described in detail below.
Or in a pure water production apparatus equipped with a plurality of ion exchange towers filled with an anion exchange resin, while installing one common regeneration equipment for each of these cation exchange resin and anion exchange resin, These regeneration facilities
The regenerant is connected so that the regenerant can be sent to the different ion exchange towers filled with the corresponding resin, and the amount of regenerant required to regenerate the ion exchange resin charged in each of these ion exchange towers each play set is measuring tank for measuring the
And that pure water production facility, characterized in that provided Bei respectively, play equipment according to the present invention is only the second base for the cation exchange resin for the anion exchange resin, the cost of reconditioning facility It is possible to save a great deal of money, to considerably reduce the labor required for inspection and maintenance, and to reduce the equipment space.
【０００６】[0006]
【実施例】以下、本考案純水製造設備の一実施例を図面
に基づき詳細に説明する。図１は本考案の一実施例を示
す全体のフロー図、図２は二基の計量槽のうち陰イオン
交換樹脂再生用の計量槽の概略を示す断面図である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the pure water production equipment of the present invention will be described below in detail with reference to the drawings. FIG. 1 is an overall flow chart showing one embodiment of the present invention, and FIG. 2 is a sectional view schematically showing a measuring tank for regenerating anion exchange resin among two measuring tanks.
【０００７】図中１は原水、２は陽イオン交換樹脂３を
充填してなるカチオン塔、４はカチオン塔２を通過して
ナトリウムイオンやカルシウムイオン、マグネシウムイ
オンの取り除かれた処理水中に溶存している炭酸ガスを
除去するための脱炭酸塔、５は溶存炭酸ガスの除去され
た処理水中の不純物陰イオンを除去するアニオン塔で、
内部には陰イオン交換樹脂６が充填されている。なお、
カチオン塔２、脱炭酸塔４およびアニオン塔５からなる
一連の装置を、通常２床３塔式の純水装置と呼んでい
る。７はアニオン塔５を通過した処理水の品質をさらに
向上させるための混床式ポリシャーであり、当該混床式
ポリシャー７には陽イオン交換樹脂３と陰イオン交換樹
脂６が充填されていて、純水製造時にはこれら両イオン
交換樹脂を混合した状態で使用し、再生時にはこれら両
イオン交換樹脂を水流によって比重分離して、図１に示
したように下部に陽イオン交換樹脂３の層を、その上部
に陰イオン交換樹脂６の層を形成させるものである。８
は混床式ポリシャー７を通過した処理水を溜めておく純
水貯槽である。In the figure, 1 is a raw water, 2 is a cation tower filled with a cation exchange resin 3, and 4 is a cation tower, which passes through the cation tower 2 and is dissolved in treated water from which sodium ions, calcium ions and magnesium ions have been removed. The decarbonation tower 5 for removing the carbon dioxide gas is an anion tower for removing impurity anions in the treated water from which the dissolved carbon dioxide gas has been removed.
The inside is filled with an anion exchange resin 6. In addition,
A series of devices consisting of the cation tower 2, the decarbonation tower 4 and the anion tower 5 is usually called a two-bed three-column type pure water apparatus. Reference numeral 7 denotes a mixed-bed polisher for further improving the quality of the treated water passed through the anion tower 5, and the mixed-bed polisher 7 is filled with a cation exchange resin 3 and an anion exchange resin 6, At the time of pure water production, both ion-exchange resins are used in a mixed state, and at the time of regeneration, these both ion-exchange resins are separated by specific gravity by a water flow, and as shown in FIG. A layer of an anion exchange resin 6 is formed thereon. 8
Is a pure water storage tank for storing the treated water that has passed through the mixed-bed polisher 7.
【０００８】このような純水製造ラインを通じて原水中
の不純物イオンが取り除かれるのであるが、これら複数
のイオン交換塔、すなわちカチオン塔２、アニオン塔
５、混床式ポリシャー７内にそれぞれ充填してあるイオ
ン交換樹脂がイオンを吸着して飽和状態となったときに
は、イオン交換塔内のイオン交換樹脂を再生しなければ
ならない。[0008] The impurity ions in the raw water are removed through such a pure water production line. These ion exchange towers, that is, the cation tower 2, the anion tower 5, and the mixed-bed polisher 7 are filled respectively. When a certain ion exchange resin is saturated by adsorption of ions, the ion exchange resin in the ion exchange tower must be regenerated.
【０００９】図中９は陽イオン交換樹脂３の再生設備を
示し、１０は陰イオン交換樹脂６の再生設備を示す。陽
イオン交換樹脂３の再生設備９は、再生剤となる例え
ば、塩酸溶液の供給源１１と、この塩酸溶液の供給源１
１から送られてくる塩酸溶液を計量する計量槽１２と、
この計量槽１２内の塩酸溶液をカチオン塔２および混床
式ポリシャー７内の下部に送り込むための配管１３，１
４，１５，１６からなっている。また、陰イオン交換樹
脂６の再生設備１０は、再生剤となる例えば、苛性ソー
ダ溶液の供給源１７と、この供給源１７から送られてく
る苛性ソーダ溶液を計量する計量槽１８と、この計量槽
１８内の苛性ソーダ溶液をアニオン塔５および混床式ポ
リシャー７内の上部に送り込むための配管１９，２０，
２１と、苛性ソーダ溶液を４０〜５５℃程度に間接的に
加熱するための、配管１９中に付設した熱交換器２２か
らなっている。なお、苛性ソーダ溶液を加温するため
に、熱交換器２２を用いたのは、エゼクターによって蒸
気を苛性ソーダ溶液中に直接吹込む従来の加温方式で
は、蒸気中に含まれる微粒子等の不純物がイオン交換塔
内に持込まれ、その結果再生後の純水製造時に処理水の
品質を低下させる虞れがあるからである。In the figure, reference numeral 9 denotes a facility for regenerating the cation exchange resin 3, and reference numeral 10 denotes a facility for regenerating the anion exchange resin 6. The regeneration facility 9 for the cation exchange resin 3 includes, for example, a supply source 11 of a hydrochloric acid solution serving as a regenerant and a supply source 1 of the hydrochloric acid solution.
A measuring tank 12 for measuring the hydrochloric acid solution sent from 1;
Pipes 13 and 1 for feeding the hydrochloric acid solution in the measuring tank 12 to the cation tower 2 and the lower part in the mixed-bed polisher 7.
4, 15, and 16. Further, the regeneration equipment 10 for the anion exchange resin 6 includes a supply source 17 of a caustic soda solution serving as a regenerating agent, a measuring tank 18 for measuring the caustic soda solution sent from the supply source 17, and a measuring tank 18 for this purpose. Pipes 19, 20, for feeding the caustic soda solution into the anion tower 5 and the upper part in the mixed-bed polisher 7
And a heat exchanger 22 provided in the pipe 19 for indirectly heating the caustic soda solution to about 40 to 55 ° C. In order to heat the caustic soda solution, the heat exchanger 22 is used. In the conventional heating method in which steam is directly blown into the caustic soda solution by an ejector, impurities such as fine particles contained in the steam are ionized. This is because they are brought into the exchange tower, and as a result, there is a possibility that the quality of the treated water may be reduced during the production of pure water after regeneration.
【００１０】陰イオン交換樹脂用の計量槽１８は図２に
示すように、共通電極２３および張込終了レベルを検出
する電極２４のほかに、アニオン塔５内に送り込む苛性
ソーダ溶液の分量を規定する電極２５と、混床式ポリシ
ャー７の上部に送り込む苛性ソーダ溶液の分量を規定す
る電極２６の計４つの検出電極が配設されており、アニ
オン塔５内の陰イオン交換樹脂６を再生する場合には、
電極２４と電極２５とで規定される、図２にＢで示した
高さ分の苛性ソーダ溶液が供給され、混床式ポリシャー
７内の陰イオン交換樹脂６を再生する場合には、電極２
４と電極２６とで規定される、図２にＡで示した高さ分
の苛性ソーダ溶液が供給されるようになっている。な
お、特に図示しないが、陽イオン交換樹脂３を再生する
塩酸溶液を計量する計量槽１２にも前記計量槽１８と同
様に４つの検出電極が配設されている。その他図中の２
７は熱交換器２２に熱源を供給する蒸気発生器、２８は
再生時に純水貯槽８内の純水を塩酸溶液や苛性ソーダ溶
液の希釈水等として圧送する再生用ポンプ、２９はこの
再生用ポンプ２８によって圧送される圧力水を利用して
計量槽１２，１８内の再生剤を吸引、希釈し、それぞれ
のイオン交換塔内に送り込むためのエゼクターを示す。
なお、前記した各配管系には実際には各種バルブが付設
されるが、当該バルブ類は図示を省略してある。As shown in FIG. 2, the metering tank 18 for the anion exchange resin regulates the amount of the caustic soda solution to be fed into the anion tower 5 in addition to the common electrode 23 and the electrode 24 for detecting the level at which the filling is completed. the electrode 25, is disposed a total of four detection electrodes of the electrode 26 which defines the amount of sodium hydroxide solution fed to the upper portion of the mixed-bed polisher 7, when playing the anion exchange resin 6 in the anion column 5 In
When a caustic soda solution having a height indicated by B in FIG. 2 defined by the electrode 24 and the electrode 25 is supplied and the anion exchange resin 6 in the mixed-bed polisher 7 is regenerated, the electrode 2
The caustic soda solution of the height indicated by A in FIG. 2, which is defined by the electrode 4 and the electrode 26, is supplied. Although not particularly shown, the measuring tank 12 for measuring the hydrochloric acid solution for regenerating the cation exchange resin 3 is also provided with four detection electrodes similarly to the measuring tank 18. Other 2 in the figure
Reference numeral 7 denotes a steam generator for supplying a heat source to the heat exchanger 22, reference numeral 28 denotes a regeneration pump for pumping pure water in the pure water storage tank 8 as hydrochloric acid solution or dilution water of caustic soda solution at the time of regeneration, and reference numeral 29 denotes this regeneration pump. An ejector for sucking and diluting the regenerating agent in the measuring tanks 12 and 18 by using the pressurized water pumped by 28 and feeding the diluted reagent into the respective ion exchange towers is shown.
In addition, various valves are actually attached to each piping system described above, but the valves are not shown.
【００１１】次に、本考案純水製造設備の動作例につき
説明すれば、カチオン塔２内の陽イオン交換樹脂３を再
生する場合、計量槽１２で計量された規定量の塩酸溶液
はエゼクター２９によって吸引されて配管１３および配
管１４を通じてカチオン塔２内に供給され陽イオン交換
樹脂３を再生する。また、混床式ポリシャー７内に充填
されている陽イオン交換樹脂３は配管１５，１６を介し
て供給される同じ計量槽１２内で計量された規定量の塩
酸溶液によって再生が行われる。アニオン塔５内の陰イ
オン交換樹脂６を再生する場合には、計量槽１８内の苛
性ソーダ溶液を、図２におけるＢの高さに相当する液量
をエゼクター２９によって吸引し、配管１９，２０を介
してアニオン塔５内に送り込むもので、当該苛性ソーダ
溶液は送られる途中で熱交換器２２により４０〜５５℃
程度に間接的に加温される。また、混床式ポリシャー７
内に充填されている陰イオン交換樹脂６は配管１９，２
１を通じ、熱交換器２２によって加温された、図２にお
いてＡの高さに相当する液量の苛性ソーダ溶液によって
再生が図られる。なお、上記実施例に示したような、２
床３塔式の純水装置と混床式ポリシャーとを組合せてな
る純水製造設備においては、２床３塔式の純水装置が通
常１日〜２日に１回の再生頻度であるのに対して、その
後段に設置される混床式ポリシャーは１週間に１回程度
の頻度で再生すればよく、両者を同時に再生しなければ
ならないというような事態はほとんど生じないものであ
る。Next, an operation example of the pure water production equipment of the present invention will be described. When the cation exchange resin 3 in the cation tower 2 is regenerated, a specified amount of hydrochloric acid solution measured in the measuring tank 12 is ejected by the ejector 29. The cation exchange resin 3 is supplied into the cation tower 2 through the pipes 13 and 14 to regenerate the cation exchange resin 3. The cation exchange resin 3 filled in the mixed-bed type polisher 7 is regenerated by a specified amount of hydrochloric acid solution measured in the same measuring tank 12 supplied through pipes 15 and 16. When the anion exchange resin 6 in the anion tower 5 is to be regenerated, the caustic soda solution in the measuring tank 18 is sucked by the ejector 29 at a liquid amount corresponding to the height B in FIG. The caustic soda solution is sent to the anion tower 5 through the heat exchanger 22 at 40 to 55 ° C. while being sent.
Indirectly heated to a degree. In addition, mixed-bed polisher 7
The anion exchange resin 6 filled in the inside is connected to pipes 19 and 2.
Through 1, regeneration is achieved by a caustic soda solution of a liquid amount corresponding to the height of A in FIG. 2 heated by the heat exchanger 22. In addition, as shown in the above embodiment, 2
In a pure water production facility combining a three-bed type pure water apparatus and a mixed-bed type polisher, a two-bed three tower type pure water apparatus usually has a regeneration frequency of once a day or two days. On the other hand, the mixed-bed polisher installed at the subsequent stage only needs to be regenerated at a frequency of about once a week, and there is almost no need to regenerate both at the same time.
【００１２】このように、本考案純水製造設備では、複
数のイオン交換塔にそれぞれ専用の再生設備が設けられ
ている従来の純水製造設備と異なり、一基の陽イオン交
換樹脂の再生設備９によってカチオン塔２内と混床式ポ
リシャー７内の陽イオン交換樹脂の再生が図られるもの
であり、また一基の陰イオン交換樹脂の再生設備１０に
よってアニオン塔５内と混床式ポリシャー７内の陰イオ
ン交換樹脂の再生が行われるものである。なお、図示す
る実施例では２床３塔式の純水装置と混床式ポリシャー
とを組合せた純水製造設備を示しているが、本考案はこ
のような構成の純水製造設備に限定されるものではな
く、複数のイオン交換塔を並設してなる純水製造装置で
あればいかなるものであってもよく、例えば半導体製造
におけるフッ酸や塩酸を含む酸性の洗浄排水を処理して
純水となすための回収系に設置される、アニオン塔と混
床式ポリシャーとからなる純水製造設備等にも適用する
ことができるものである。As described above, in the pure water production equipment of the present invention, unlike the conventional pure water production equipment in which a plurality of ion exchange towers are each provided with a dedicated regeneration equipment, a single cation exchange resin regeneration equipment is provided. 9 regenerates the cation exchange resin in the cation tower 2 and the mixed-bed polisher 7, and regenerates an anion exchange resin 10 in the anion tower 5 and the mixed-bed polisher 7. The regeneration of the anion exchange resin is performed. In the illustrated embodiment, a pure water production facility combining a two-bed three-column pure water apparatus and a mixed-bed polisher is shown. However, the present invention is limited to the pure water production facility having such a configuration. Instead, any apparatus may be used as long as it is a pure water production apparatus having a plurality of ion exchange towers arranged side by side, for example, by treating acidic cleaning wastewater containing hydrofluoric acid and hydrochloric acid in semiconductor production. The present invention can also be applied to a pure water production facility or the like, which is installed in a recovery system for forming water and comprises an anion tower and a mixed-bed polisher.
【００１３】したがって本考案によれば、再生設備は陽
イオン交換樹脂用と陰イオン交換樹脂用の二基のみとな
り、再生設備に要する費用を大幅に削減できるようにな
ると共に、点検・保守に要する手間もかなり削減され、
且つ設置スペースも少なくて済むという利点を奏するこ
とができる。また、上述実施例で説明したように、各イ
オン交換塔の再生頻度が異なることに応じ、更に異なる
樹脂量に応じて適切な再生剤の送り込みができて、再生
処理の無駄がないという利点も奏される。 Therefore, according to the present invention, there are only two regeneration facilities, one for the cation exchange resin and the other for the anion exchange resin, so that the cost required for the regeneration facility can be greatly reduced and the inspection and maintenance are required. The labor is also considerably reduced,
In addition, there is an advantage that the installation space is small. Further, as described in the above embodiment, each
Different depending on the frequency of regeneration of on-exchange tower
The appropriate regenerant can be fed according to the amount of resin, and
Another advantage is that there is no waste of processing.
【図１】本考案の一実施例を示す全体のフロー図であ
る。FIG. 1 is an overall flowchart showing an embodiment of the present invention.
【図２】陰イオン交換樹脂再生用の計量槽の概略を示す
断面図である。FIG. 2 is a cross-sectional view schematically showing a measuring tank for regenerating an anion exchange resin.
【図３】従来の純水製造設備の一例を示す全体のフロー
図である。FIG. 3 is an overall flowchart showing an example of a conventional pure water production facility.
１：原水 ２：カチオン塔 ３：陽イオン交換樹脂 ４：脱炭酸塔 ５：アニオン塔 ６：陰イオン交
換樹脂 ７：混床式ポリシャー ８：純水貯槽 ９：陽イオン交換樹脂の再生設備 １０：陰イオン交
換樹脂の再生設備 １１：塩酸溶液の供給源 １２：計量槽 １３：配管 １４：配管 １５：配管 １６：配管 １７：苛性ソーダ溶液の供給源 １８：計量槽 １９：配管 ２０：配管 ２１：配管 ２２：熱交換器 ２３：共通電極 ２４：張込終了
電極 ２５：電極 ２６：電極 ２７：蒸気発生器 ２８：再生用ポ
ンプ ２９：エゼクター1: Raw water 2: Cation tower 3: Cation exchange resin 4: Decarbonation tower 5: Anion tower 6: Anion exchange resin 7: Mixed bed polisher 8: Pure water storage tank 9: Cation exchange resin regeneration equipment 10: Anion exchange resin regeneration equipment 11: Supply source of hydrochloric acid solution 12: Measuring tank 13: Piping 14: Piping 15: Piping 16: Piping 17: Supply source of caustic soda solution 18: Measuring tank 19: Piping 20: Piping 21: Piping 22: Heat exchanger 23: Common electrode 24: Ending electrode 25: Electrode 26: Electrode 27: Steam generator 28: Regeneration pump 29: Ejector
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭57−144040（ＪＰ，Ａ) 大矢 晴彦監修，「純水・純水製造法 −要素技術と応用システム」，第１版, 株式会社幸書房，昭和60年３月20日, ｐ．36〜40 (58)調査した分野(Int.Cl.6，ＤＢ名) C02F 1/42 B01J 47/02 B01J 49/00 ────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-57-144040 (JP, A) Supervised by Haruhiko Oya, “Pure water / pure water production method-element technology and application system”, 1st edition, Yuki Co., Ltd. Shobo, March 20, 1985, p. 36-40 (58) Fields investigated (Int. Cl. 6 , DB name) C02F 1/42 B01J 47/02 B01J 49/00
Claims (1)
換樹脂が充填された複数のイオン交換塔が併設された純
水製造装置において、これらの陽イオン交換樹脂と陰イ
オン交換樹脂のそれぞれの共通する再生設備を一基づつ
付設すると共に、これらの再生設備は、対応する樹脂が
充填されている異なるイオン交換塔に再生剤を送り込め
るように接続されていると共に、これら各イオン交換塔
に充填されているイオン交換樹脂を再生するのに必要な
量の再生剤を計量する計量槽が各再生設備にそれぞれ設
けられていることを特徴とする純水製造設備。In a pure water production apparatus provided with a plurality of ion exchange towers filled with a cation exchange resin and / or an anion exchange resin, each of the cation exchange resin and the anion exchange resin has a common property. The regeneration equipment is installed one by one, and these regeneration equipments are connected so that the regenerant can be sent to different ion exchange towers filled with the corresponding resin, and each of these ion exchange towers can be charged. A pure water production facility, wherein each of the regeneration facilities is provided with a measuring tank for measuring an amount of a regenerant required for regenerating the ion exchange resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1992058435U JP2597552Y2 (en) | 1992-07-29 | 1992-07-29 | Pure water production equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1992058435U JP2597552Y2 (en) | 1992-07-29 | 1992-07-29 | Pure water production equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0615786U JPH0615786U (en) | 1994-03-01 |
| JP2597552Y2 true JP2597552Y2 (en) | 1999-07-05 |
Family
ID=13084320
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1992058435U Expired - Lifetime JP2597552Y2 (en) | 1992-07-29 | 1992-07-29 | Pure water production equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2597552Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102515390A (en) * | 2011-12-14 | 2012-06-27 | 河南科技大学 | Device for preparing pure water for analytical laboratory by ion exchange method |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4807193B2 (en) * | 2006-09-04 | 2011-11-02 | 三浦工業株式会社 | Water softener |
-
1992
- 1992-07-29 JP JP1992058435U patent/JP2597552Y2/en not_active Expired - Lifetime
Non-Patent Citations (1)
| Title |
|---|
| 大矢 晴彦監修，「純水・純水製造法−要素技術と応用システム」，第１版，株式会社幸書房，昭和６０年３月２０日，ｐ．３６〜４０ |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102515390A (en) * | 2011-12-14 | 2012-06-27 | 河南科技大学 | Device for preparing pure water for analytical laboratory by ion exchange method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0615786U (en) | 1994-03-01 |
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