JP2510054B2 - Method for manufacturing optical information recording medium - Google Patents
Method for manufacturing optical information recording mediumInfo
- Publication number
- JP2510054B2 JP2510054B2 JP4006163A JP616392A JP2510054B2 JP 2510054 B2 JP2510054 B2 JP 2510054B2 JP 4006163 A JP4006163 A JP 4006163A JP 616392 A JP616392 A JP 616392A JP 2510054 B2 JP2510054 B2 JP 2510054B2
- Authority
- JP
- Japan
- Prior art keywords
- information recording
- optical information
- film
- recording medium
- inorganic oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Manufacturing Optical Record Carriers (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、光ディスク、ビデオデ
ィスクあるいはデジタルオーディオディスクなどとして
適用しうる光情報記録媒体の製造方法に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an optical information recording medium applicable as an optical disc, a video disc, a digital audio disc or the like.
【０００２】[0002]
【従来技術】近年、透明な基板の片面に光エネルギーに
よって変化可能な記録層を形成し、基板側からレーザー
光線によって記録・再生を行う光情報記録媒体が、急速
に実用化されつつある。記録層の材料開発のみならず記
録層の水分や酸素による劣化を防止する保護膜の開発も
行われている（特開昭５９−６８８５０号公報）。2. Description of the Related Art In recent years, an optical information recording medium in which a recording layer that can be changed by light energy is formed on one surface of a transparent substrate and recording / reproducing is performed by a laser beam from the substrate side has been rapidly put into practical use. Not only the material for the recording layer has been developed, but also a protective film for preventing the deterioration of the recording layer due to moisture or oxygen has been developed (Japanese Patent Laid-Open No. 59-68850).
【０００３】保護層は透湿性の低い材質からなり、無機
物では、ＳｉＯ2 、ＭｇＯ、Ａｌ2Ｏ3 等の酸化膜が用
いられている。また、有機物としては、ポリプロピレ
ン、エチレン−酢酸ビニル共重合体、ポリ塩化ビニリデ
ン等が用いられている。The protective layer is made of a material having low moisture permeability, and as an inorganic material, an oxide film of SiO 2 , MgO, Al 2 O 3 or the like is used. As the organic substance, polypropylene, ethylene-vinyl acetate copolymer, polyvinylidene chloride or the like is used.
【０００４】以上のように構成された光情報記録媒体に
ついて、以下その防湿手段について説明する。まず、基
板を通って侵入する水分を防ぐため、酸化物やフッ化物
を基板の表面に設けている。これらの無機材料は一般に
透湿率が低いので、光情報記録媒体が、高湿度雰囲気中
に放置されても記録層の腐食をある程度改善できる。ま
た、これらの無機材料の代わりに、ポリ塩化ビニリデン
等比較的透湿率の低い有機高分子を用いて、同じように
記録層の腐食を防いでいる。さらに有機高分子系保護膜
としてエポキシ樹脂等の架橋型樹脂が提案されている
（特開昭５７−７０６９４号公報）。With respect to the optical information recording medium constructed as described above, the moistureproof means will be described below. First, an oxide or a fluoride is provided on the surface of the substrate in order to prevent moisture from entering through the substrate. Since these inorganic materials generally have low moisture permeability, even if the optical information recording medium is left in a high humidity atmosphere, the corrosion of the recording layer can be improved to some extent. Further, instead of these inorganic materials, an organic polymer having a relatively low moisture permeability such as polyvinylidene chloride is used to similarly prevent the corrosion of the recording layer. Further, a cross-linking resin such as an epoxy resin has been proposed as an organic polymer-based protective film (JP-A-57-70694).
【０００５】[0005]
【発明が解決しようとする課題】しかしながら上記のよ
うな保護層では、次のような問題がある。 （１）酸化物やフッ化物等の無機材料は、透明基板との
接着力が弱く、高温高湿中に放置すると、剥離やクラッ
クが生じる。 （２）酸化物やフッ化物はち密な薄膜をつくりにくい。 （３）有機高分子材料では透湿率が低くても、水分のバ
リヤー性に限界があり、高温高湿中に長時間保存すると
防湿効果がなくなる。 （４）高温高湿下で長期保存する場合、架橋型樹脂は、
空隙が多く透湿率が高いので水分による記録層の劣化が
生じやすい。However, the above-mentioned protective layer has the following problems. (1) Inorganic materials such as oxides and fluorides have weak adhesion to the transparent substrate, and peeling and cracking occur when left in high temperature and high humidity. (2) It is difficult to form a dense thin film of oxide or fluoride. (3) Even if the organic polymer material has a low moisture permeability, its moisture barrier property is limited, and the moisture-proof effect is lost when it is stored in high temperature and high humidity for a long time. (4) For long-term storage under high temperature and high humidity, the crosslinkable resin is
Since there are many voids and the moisture permeability is high, the recording layer is apt to deteriorate due to moisture.
【０００６】これらの理由で、高温高湿中で光情報記録
媒体を保存すると、記録層が腐食し劣化するという問題
を有していた。本発明は上記の欠点に鑑み、防湿性、耐
食性にすぐれた光情報記録媒体の製造方法を提供するこ
とを目的とする。For these reasons, when the optical information recording medium is stored in high temperature and high humidity, there is a problem that the recording layer is corroded and deteriorated. The present invention has been made in view of the above drawbacks, and an object of the present invention is to provide a method of manufacturing an optical information recording medium excellent in moisture resistance and corrosion resistance.
【０００７】[0007]
【発明を解決するための手段】前記目的を達成するため
に、本発明の第１番目の光情報記録媒体の製造方法は、
光情報記録層を設けた透明基板の表面に、気相でハロゲ
ン化シラン系化学吸着剤を接触させ、次に水分と反応さ
せることにより化学吸着膜を形成するという構成を備え
たものである。In order to achieve the above object, the first method of manufacturing an optical information recording medium of the present invention comprises:
The structure is such that a chemical adsorption film is formed by bringing a halogenated silane-based chemical adsorbent into contact with the surface of a transparent substrate provided with an optical information recording layer and then reacting it with water.
【０００８】次に本発明の第２番目の発明の光情報記録
媒体の製造方法は、基板の片面に設けられた光情報記録
層の表面に無機酸化物層を形成し、前記無機酸化物層表
面もしくは前記無機酸化物層と前記透明基板の両面に、
気相でクロロシラン系化学吸着剤を接触させ、次に水分
と反応させることにより化学吸着膜を形成するという構
成を備えたものである。Next, in the method for producing an optical information recording medium of the second invention of the present invention, an inorganic oxide layer is formed on the surface of the optical information recording layer provided on one surface of the substrate, and the inorganic oxide layer is formed. On the surface or both surfaces of the inorganic oxide layer and the transparent substrate,
The chemical adsorption film is formed by bringing the chlorosilane-based chemical adsorbent into contact in the gas phase and then reacting it with water.
【０００９】前記第１〜２番目の発明においては、化学
吸着剤がフッ化アルキル基を含む化合物であることが好
ましい。また前記第１〜２番目の発明においては、化学
吸着膜が単分子膜であることが好ましい。In the first to second inventions, the chemical adsorbent is preferably a compound containing a fluorinated alkyl group. Further, in the first to second inventions, it is preferable that the chemical adsorption film is a monomolecular film.
【００１０】また前記第１〜２番目の発明においては、
基板が実質的に透明な樹脂製であることが好ましい。ま
た前記第２番目の発明においては、無機酸化物層がＳｉ
Ｏ2 、ＴｉＯ2 、Ａｌ2 Ｏ3 の少なくとも一つから選ば
れる層であることが好ましい。Further, in the first to second inventions,
It is preferable that the substrate is made of a substantially transparent resin. In the second invention, the inorganic oxide layer is Si.
It is preferably a layer selected from at least one of O 2 , TiO 2 , and Al 2 O 3 .
【００１１】また前記第２番目の発明においては、無機
酸化物層の厚さが１〜５００ｎｍであることが好まし
い。In the second aspect of the invention, it is preferable that the inorganic oxide layer has a thickness of 1 to 500 nm.
【００１２】[0012]
【作用】前記した本発明の製造方法によれば、光情報記
録層を設けた透明基板の外側表面に形成した化学吸着膜
はち密でクラックが発生しにくく、水分子を透過しにく
い。また、化学吸着膜と無機酸化物層あるいは透明基板
とはシロキサン結合を介して化学結合しているので、剥
離しない。ゆえに本発明で得られる光情報記録媒体は、
防湿性、耐食性が優れている。According to the above-described manufacturing method of the present invention, the chemisorption film formed on the outer surface of the transparent substrate provided with the optical information recording layer is dense and is less likely to generate cracks and less likely to transmit water molecules. Further, since the chemical adsorption film and the inorganic oxide layer or the transparent substrate are chemically bonded through a siloxane bond, they do not peel off. Therefore, the optical information recording medium obtained by the present invention is
Excellent moisture resistance and corrosion resistance.
【００１３】また、化学吸着膜を気相で形成させるた
め、有機溶媒に可溶の基板でも使用できる。すなわち有
機溶媒を使わないからである。また、化学吸着膜がフッ
化アルキル基を含有するという本発明の好ましい構成に
よれば、フッ素の撥水性を利用してさらに防湿性、耐食
性を向上することができる。Further, since the chemisorption film is formed in the gas phase, it is possible to use a substrate soluble in an organic solvent. That is, no organic solvent is used. Further, according to the preferable constitution of the present invention in which the chemical adsorption film contains a fluorinated alkyl group, the water repellency of fluorine can be utilized to further improve the moisture resistance and corrosion resistance.
【００１４】また、化学吸着膜が単分子膜であるという
本発明の好ましい構成によれば、きわめて薄く透明性の
良好な保護膜とすることができる。また、無機酸化物層
がＳｉＯ2 、ＴｉＯ2 、Ａｌ2 Ｏ3 の少なくとも一つか
ら選ばれる層であるという本発明の好ましい構成によれ
ば、これらの無機酸化物層も防湿性、耐食性を発揮する
から、さらに優れた防湿性、耐食性を有する。とくにＳ
ｉＯ2 層の場合は、シロキサン結合の密度を高くできる
ので、緻密な化学吸着膜を形成することができる。Further, according to the preferable constitution of the present invention in which the chemical adsorption film is a monomolecular film, an extremely thin protective film having good transparency can be obtained. Further, according to the preferable constitution of the present invention that the inorganic oxide layer is a layer selected from at least one of SiO 2 , TiO 2 and Al 2 O 3 , these inorganic oxide layers also exhibit moisture resistance and corrosion resistance. Therefore, it has more excellent moisture resistance and corrosion resistance. Especially S
In the case of the iO 2 layer, since the density of siloxane bonds can be increased, a dense chemisorption film can be formed.
【００１５】さらに、透明基板が樹脂製であるという本
発明の好ましい構成によれば、取扱いの良好な光情報記
録媒体を提供することができる。Further, according to the preferable constitution of the present invention in which the transparent substrate is made of resin, it is possible to provide an optical information recording medium which is easily handled.
【００１６】[0016]
【実施例】以下本発明の実施例について、図面を参照し
ながら説明する。図１〜図３は本発明の第１番目の発明
の一実施例における光情報記録媒体の製造方法を示す。
図１〜図３において、１は透明基板、２は光情報記録
層、３はクロロシラン系化学吸着剤、４はシロキサン結
合、５は化学吸着膜である。クロロシラン系化学吸着剤
３の蒸気に光情報記録層２を設けた透明基板１をさらす
と（図１）、基板表面の水酸基とクロロシラン系化学吸
着剤が脱塩酸反応してシロキサン結合４を介して化学吸
着膜５を形成する（図２）。次に空気中に放置すると、
空気中の水分と反応して吸着分子間にもシロキサン結合
４を形成させる（図３）。Embodiments of the present invention will be described below with reference to the drawings. 1 to 3 show a method of manufacturing an optical information recording medium in one embodiment of the first invention of the present invention.
1 to 3, 1 is a transparent substrate, 2 is an optical information recording layer, 3 is a chlorosilane-based chemical adsorbent, 4 is a siloxane bond, and 5 is a chemisorption film. When the transparent substrate 1 provided with the optical information recording layer 2 is exposed to the vapor of the chlorosilane-based chemical adsorbent 3 (FIG. 1), the hydroxyl groups on the surface of the substrate and the chlorosilane-based chemical adsorbent undergo a dehydrochlorination reaction to form a siloxane bond 4. The chemisorption film 5 is formed (FIG. 2). Then leave it in the air,
It also reacts with the water in the air to form siloxane bonds 4 between adsorbed molecules (FIG. 3).
【００１７】次に図５〜図６は本発明の第２番目の発明
の一実施例における光情報記録媒体の断面図である。図
５〜図７において、１１は透明基板、１２は光情報記録
層、１３は無機酸化物層、１４はクロロシラン系化学吸
着剤、１５はシロキサン結合、１６は化学吸着膜であ
る。クロロシラン系活性剤１４の蒸気に光情報記録層１
２を設けた透明基板１１をさらすと、無機酸化物層１３
の水酸基とクロロシラン系化学吸着剤が脱塩酸反応して
シロキサン結合１５を介して化学吸着膜１６を形成す
る。次に空気中に放置すると、空気中の水分と反応して
吸着分子どうしもシロキサン結合４を形成する。Next, FIGS. 5 to 6 are sectional views of an optical information recording medium in one embodiment of the second invention of the present invention. 5 to 7, 11 is a transparent substrate, 12 is an optical information recording layer, 13 is an inorganic oxide layer, 14 is a chlorosilane-based chemical adsorbent, 15 is a siloxane bond, and 16 is a chemisorption film. Optical information recording layer 1 with vapor of chlorosilane-based activator 14
When the transparent substrate 11 provided with 2 is exposed, the inorganic oxide layer 13
And the chlorosilane-based chemical adsorbent undergo a dehydrochlorination reaction to form a chemical adsorption film 16 via the siloxane bond 15. Next, when it is left in the air, it reacts with the water in the air to form siloxane bonds 4 between the adsorbed molecules.
【００１８】本発明で使用できる透明基板１，１１の例
としては、ガラス、ポリカーボネート、アクリル樹脂等
が上げられる。無機酸化物層１３としてはＳｉＯ2 、Ｔ
ｉＯ2 、Ａｌ2 Ｏ3 等が透明性の点から、好ましい。ま
た、ＳｉＯ2 の場合は、通常のガラス基板と同じように
表面に水酸基が高密度で存在するので、テトラクロロシ
ランで前処理しなくてもクロロシラン系化学吸着剤を高
密度で形成できる。Examples of the transparent substrates 1 and 11 usable in the present invention include glass, polycarbonate, acrylic resin and the like. As the inorganic oxide layer 13, SiO 2 , T
From the viewpoint of transparency, iO 2 , Al 2 O 3 and the like are preferable. Further, in the case of SiO 2 , since hydroxyl groups are present at a high density on the surface like a normal glass substrate, a chlorosilane-based chemical adsorbent can be formed at a high density without pretreatment with tetrachlorosilane.
【００１９】無機酸化物層１３を形成するにあたって
は、スパッタリング法、真空蒸着法等の方法で形成する
ことができる。本発明により、光情報記録層１２上に、
無機酸化物層１３を形成する場合、その膜厚は１〜５０
０ｎｍが好ましい。前記膜厚を５００ｎｍより大きくす
ると、剥離あるいはクラックが生じやすくなる。また、
１ｎｍより小さくすると、ピンホールが生じやすくなっ
て、化学吸着膜を形成しにくくなる。The inorganic oxide layer 13 can be formed by a method such as a sputtering method or a vacuum vapor deposition method. According to the present invention, on the optical information recording layer 12,
When forming the inorganic oxide layer 13, the film thickness is 1 to 50.
0 nm is preferred. When the film thickness is larger than 500 nm, peeling or cracking is likely to occur. Also,
If it is less than 1 nm, pinholes are likely to occur, and it becomes difficult to form a chemisorption film.
【００２０】本発明の光情報記録媒体において、化学吸
着膜５、１６を構成する材料としては、一例としてフッ
化アルキル基を有するクロロシラン系化学吸着剤を用い
ることができる。In the optical information recording medium of the present invention, as a material forming the chemical adsorption films 5 and 16, for example, a chlorosilane chemical adsorption agent having a fluorinated alkyl group can be used.
【００２１】フッ化アルキル基を有するクロロシラン系
化学吸着剤としては、例えばＣＦ3（ＣＦ2 ）7 （ＣＨ
2 ）2 ＳｉＣｌ3 ，ＣＦ3 ＣＨ2 Ｏ（ＣＨ2 ）15ＳｉＣ
ｌ3，ＣＦ3 （ＣＨ2 ）2 Ｓｉ（ＣＨ3 ）2 （ＣＨ2 ）
15ＳｉＣｌ3 ，Ｆ（ＣＦ2 ） 4 （ＣＨ2 ）2 Ｓｉ（ＣＨ
3 ）2 （ＣＨ2 ）9 ＳｉＣｌ3 ，Ｆ（ＣＦ2 ）8 （ＣＨ
2 ）2 Ｓｉ（ＣＨ3 ）2 （ＣＨ2 ）9 ＳｉＣｌ3 ，Ｆ
（ＣＦ2 ）8 （ＣＨ2 ） 2 Ｓｉ（ＣＨ3 ）2 （ＣＨ2 ）
10ＳｉＣｌ3 ，ＣＦ3 ＣＯＯ（ＣＨ2 ）15ＳｉＣｌ3 ，
ＣＦ3 （ＣＦ2 ）5 （ＣＨ2 ）2 ＳｉＣｌ3 などのよう
なトリクロロシラン系化学吸着剤をはじめ、例えばＣＦ
3 （ＣＦ2 ）7 （ＣＨ2 ）2 ＳｉＣｌn （Ｃ
Ｈ3 ）3-n ，ＣＦ3 （ＣＦ2 ）7 （ＣＨ2 ）2 ＳｉＣｌ
n （Ｃ2 Ｈ5 ）3-n ，ＣＦ3 ＣＨ2 Ｏ（ＣＨ2 ）15Ｓｉ
Ｃｌn （ＣＨ3 ）3-n ，ＣＦ3 ＣＨ2 Ｏ（ＣＨ 2 ）15Ｓ
ｉＣｌn （Ｃ2 Ｈ5 ）3-n ，ＣＦ3 （ＣＨ2 ）2 Ｓｉ
（ＣＨ3 ）2 （ＣＨ2 ）15ＳｉＣｌn （ＣＨ3 ）3-n ，
Ｆ（ＣＦ2 ）4 （ＣＨ2 ）2 Ｓｉ（ＣＨ3）2 （Ｃ
Ｈ2 ）9 ＳｉＣｌn （Ｃ2 Ｈ5 ）3-n ，Ｆ（ＣＦ2 ）8
（ＣＨ2 ）2 Ｓｉ（ＣＨ3 ）2 （ＣＨ2 ）9 ＳｉＣｌn
（ＣＨ3 ）3-n ，ＣＦ3 ＣＯＯ（ＣＨ2）15ＳｉＣｌn
（ＣＨ3 ）3-n ，ＣＦ3 （ＣＦ2 ）5 （ＣＨ2 ）2 Ｓｉ
Ｃｌn （ＣＨ3 ）3-n （但し式中のｎはいずれも１又は
２）等のような低級アルキル基置換のモノクロロシラン
系あるいはジクロロシラン系化学吸着剤が挙げられる。Chlorosilane type having a fluorinated alkyl group
As the chemical adsorbent, for example, CF3(CF2)7(CH
2)2SiCl3, CF3CH2O (CH2)FifteenSiC
l3, CF3(CH2)2Si (CH3)2(CH2)
FifteenSiCl3, F (CF2) Four(CH2)2Si (CH
3)2(CH2)9SiCl3, F (CF2)8(CH
2)2Si (CH3)2(CH2)9SiCl3, F
(CF2)8(CH2) 2Si (CH3)2(CH2)
TenSiCl3, CF3COO (CH2)FifteenSiCl3,
CF3(CF2)Five(CH2)2SiCl3Like
Such as various trichlorosilane-based chemical adsorbents such as CF
3(CF2)7(CH2)2SiCln(C
H3)3-n, CF3(CF2)7(CH2)2SiCl
n(C2HFive)3-n, CF3CH2O (CH2)FifteenSi
Cln(CH3)3-n, CF3CH2O (CH 2)FifteenS
iCln(C2HFive)3-n, CF3(CH2)2Si
(CH3)2(CH2)FifteenSiCln(CH3)3-n,
F (CF2)Four(CH2)2Si (CH3)2(C
H2)9SiCln(C2HFive)3-n, F (CF2)8
(CH2)2Si (CH3)2(CH2)9SiCln
(CH3)3-n, CF3COO (CH2)FifteenSiCln
(CH3)3-n, CF3(CF2)Five(CH2)2Si
Cln(CH3)3-n(However, n in the formula is 1 or
2) Monochlorosilane substituted with a lower alkyl group such as
System or dichlorosilane based chemical adsorbents.
【００２２】これらの中でもとくにトリクロロシラン系
化学吸着剤は、親水性基と結合したクロロシリル結合以
外のクロロシリル結合が、隣合うクロロシラン基とシロ
キサン結合で分子間結合を形成するため、より強固な化
学吸着膜となる。この理由からトリクロロシラン系化学
吸着剤は、好ましい化学吸着膜の材料である。また、Ｃ
Ｆ3 （ＣＦ2 ）n ＣＨ2 ＣＨ2 ＳｉＣｌ3 （但し式中の
ｎは整数であり、３〜２５程度が最も扱いやすい）が、
化学吸着性と撥水・防汚性等の機能性との釣合が取れて
いるため好ましい。Among them, the trichlorosilane-based chemical adsorbent is more robust because the chlorosilyl bond other than the chlorosilyl bond bonded to the hydrophilic group forms an intermolecular bond with the adjacent chlorosilane group and the siloxane bond. It becomes a film. For this reason, trichlorosilane-based chemisorbents are the preferred chemisorption membrane materials. Also, C
F 3 (CF 2 ) n CH 2 CH 2 SiCl 3 (where n is an integer and about 3 to 25 is the easiest to handle)
It is preferable because the chemical adsorption and the functionality such as water repellency and antifouling property are balanced.
【００２３】以下、化学吸着剤の一例であるＣＦ3 （Ｃ
Ｆ2 ）n ＣＨ2 ＣＨ2 ＳｉＣｌ3 を取り上げて、本発明
の反応プロセスを説明する。容器または槽の中に、表面
に水酸基（−ＯＨ）を有する透明基板を置き、その表面
に気相で前記化学吸着剤のガスを接触させると、次式
（化１）に示す反応が起こる。Hereinafter, CF 3 (C
The reaction process of the present invention will be described by taking F 2 ) n CH 2 CH 2 SiCl 3 . When a transparent substrate having a hydroxyl group (—OH) on the surface is placed in a container or tank and the gas of the chemical adsorbent is brought into contact with the surface of the transparent substrate, the reaction represented by the following formula (Formula 1) occurs.
【００２４】[0024]
【化１】 Embedded image
【００２５】次に前記化学吸着剤のガスを排気し、水分
を含むガス（大気でも良い）を導入すると、次式（化
２）に示す反応が起こる。Next, when the gas of the chemical adsorbent is exhausted and a gas containing water (or air) may be introduced, the reaction shown in the following formula (Formula 2) occurs.
【００２６】[0026]
【化２】 Embedded image
【００２７】次に透明基板を空気中にさらすかまたは放
置すると、次式（化３）に示す反応が起こり、化学吸着
単分子膜が形成される。Next, when the transparent substrate is exposed to air or left to stand, the reaction represented by the following formula (Formula 3) occurs and a chemisorption monomolecular film is formed.
【００２８】[0028]
【化３】 Embedded image
【００２９】前記化学吸着剤の分子中にフッ化アルキル
鎖部分にエチレン基やアセチレン基を組み込んでおけ
ば、化学吸着膜形成後５メガラド程度の電子線照射で架
橋できるのでさらに化学吸着膜自体の硬度を向上させる
ことも可能である。If an ethylene group or an acetylene group is incorporated into the molecule of the chemical adsorbent in the fluoroalkyl chain portion, it can be crosslinked by electron beam irradiation of about 5 megarads after the chemical adsorption film is formed. It is also possible to improve hardness.
【００３０】本発明に使用できるクロロシラン系化学吸
着剤は、上述に例示したように直鎖状だけではなく、フ
ッ化アルキル基又は炭化水素基が分岐した形状でも、又
は末端の珪素にフッ化アルキル基もしくは炭化水素基が
置換した形状（即ちＲ、Ｒ1、Ｒ2 、Ｒ3 をフッ化アル
キル基又は炭化水素基として一般式Ｒ2 ＳｉＣｌ2 、Ｒ
3 ＳｉＣｌ、Ｒ1 Ｒ2 ＳｉＣｌ2 もしくはＲ1 Ｒ2 Ｒ3
ＳｉＣｌ等）であってもよいが、吸着密度を高めるため
には一般には直鎖状が好ましい。The chlorosilane-based chemical adsorbent that can be used in the present invention is not only linear as described above, but also has a branched fluorinated alkyl group or hydrocarbon group, or has a fluorinated alkyl group at the terminal silicon. Group substituted with a group or a hydrocarbon group (that is, R, R 1 , R 2 and R 3 are substituted with a fluoroalkyl group or a hydrocarbon group and represented by the general formula R 2 SiCl 2 , R 3
3 SiCl, R 1 R 2 SiCl 2 or R 1 R 2 R 3
SiCl, etc.) may be used, but the linear form is generally preferable in order to increase the adsorption density.
【００３１】前記においてはクロロシラン系化学吸着剤
を一例として挙げたが、他のハロゲン化シランとして
は、例えばブロモシラン系化学吸着剤、ヨードシラン系
化学吸着剤、フロロシラン系化学吸着剤なども同様に使
用できる。In the above description, the chlorosilane-based chemical adsorbent is given as an example, but other halogenated silanes such as bromosilane-based chemical adsorbent, iodosilane-based chemical adsorbent and fluorosilane-based chemical adsorbent can be used in the same manner. .
【００３２】さらに、例えば次の化合物を用いて、あら
かじめ内層膜を形成し、その上に前記ハロゲン化シラン
系化学吸着剤を接触させることもできる。このような内
層膜用化合物としては、ＳｉＣｌ4 、ＳｉＨＣｌ3 、Ｓ
ｉＨ2 Ｃｌ2 、Ｃｌ（ＳｉＣｌ2 Ｏ）n ＳｉＣｌ3 （但
し式中ｎは自然数）、ＳｉＣｌm （ＣＨ3 ）4-m 、Ｓｉ
Ｃｌm （Ｃ2 Ｈ5 ）4-m （但し式中ｍは１〜３の整
数）、ＨＳｉＣｌp （ＣＨ 3 ）3-p 、ＨＳｉＣｌp （Ｃ
2 Ｈ5 ）3-p （但し式中ｐは１又は２）等を挙げること
ができる。このようなクロロシリル結合を複数個含む物
質を化学吸着させた後、水と反応すると、表面のクロロ
シリル結合が親水性のシラノール結合に変わり、無機酸
化物層や透明基板の水酸基密度を増加させることができ
る。Further, using the following compounds, for example,
The inner layer film is formed, and the halogenated silane is formed on the inner layer film.
A system chemical adsorbent can also be contacted. Within such
As the compound for the layer film, SiClFour, SiHCl3, S
iH2Cl2, Cl (SiCl2O)nSiCl3(However
In the formula, n is a natural number), SiClm(CH3)4-m, Si
Clm(C2HFive)4-m(However, in the formula, m is an integer from 1 to 3
Number), HSiClp(CH 3)3-p, HSiClp(C
2HFive)3-p(However, in the formula, p is 1 or 2)
Can be. Products containing multiple such chlorosilyl bonds
After chemisorption of the substance, if it reacts with water, surface chloro
The silyl bond turns into a hydrophilic silanol bond, and the inorganic acid
Can increase the hydroxyl group density of the oxide layer and the transparent substrate
You.
【００３３】なお、このクロロシリル基を複数個含む物
質の中でも、テトラクロロシラン（ＳｉＣｌ4 ）は反応
性が高く分子量も小さいためより高密度にシラノール結
合を付与できるため好ましい。Among these substances containing a plurality of chlorosilyl groups, tetrachlorosilane (SiCl 4 ) is preferable because it has a high reactivity and a small molecular weight and can give a silanol bond at a higher density.
【００３４】このようにして親水基密度を増加させる
と、透明基板の酸化処理よりも水酸基密度をより高くす
ることができる。この上に例えばフッ化アルキル基を含
むクロロシラン系化学吸着剤を化学吸着でき、このよう
にして得た化学吸着膜はより高密度化されるため、防湿
性、耐食性等の機能がより高められる。By increasing the hydrophilic group density in this way, the hydroxyl group density can be made higher than that in the oxidation treatment of the transparent substrate. For example, a chlorosilane-based chemical adsorbent containing a fluorinated alkyl group can be chemisorbed thereon, and the chemisorption film thus obtained can be more highly densified, so that functions such as moisture resistance and corrosion resistance can be further enhanced.
【００３５】前記透明基板表面を酸化処理する手段とし
ては、例えば酸素プラズマ処理、コロナ処理等通常の手
法が適用される。また、本発明の光記録媒体表面に形成
される化学吸着膜は、単分子化学吸着膜一層だけでも充
分に機能が発揮される。化学吸着膜は単分子膜が累積し
ていても良いこと勿論である。このように、化学吸着膜
が累積膜を形成すると、付与された機能性を示す基が配
向し、密度も向上するためより高機能を発揮できる。As a means for oxidizing the surface of the transparent substrate, usual methods such as oxygen plasma treatment and corona treatment are applied. Further, the chemical adsorption film formed on the surface of the optical recording medium of the present invention can sufficiently exhibit its function even if only one monomolecular chemical adsorption film is formed. As a matter of course, the chemisorption film may be a monomolecular film accumulated. As described above, when the chemisorption film forms a cumulative film, the imparted functional groups are oriented and the density is improved, so that the chemical adsorption film can exhibit higher functions.
【００３６】次に具体的実施例を用いて本発明を説明す
る。 実施例１ 厚み１．２ｍｍ、直径１２０ｍｍのポリカーボネート基
板１の片面に、真空蒸着でＴｅ，ＴｅＯ2 を主成分とす
る光情報記録層２を設け、さらにその上に、ＵＶ硬化型
接着剤を用いて前記ポリカーボネート基板１と同じもの
をはりつける。このようにしてつくったディスクを用
い、ＵＶドライ・ストリッパー（ＵＶ−１、サムコイン
ターナショナル製）中で酸素流量１ｌ／ｍｉｎの条件で
酸素プラズマ処理を１０分間施して表面を酸化処理した
後、デシケータ中でフッ化アルキル基を含むクロロシラ
ン系化学吸着剤としてヘプタデカフルオロデシルトリク
ロロシランの蒸気に１２０分間さらし、フッ化アルキル
基を含むシロキサン結合４を介した化学吸着単分子膜５
をポリカーボネート基板１表面に形成した。引き続いて
空気中に６０分間放置し、吸着分子間にもシロキサン結
合４を形成させた。The present invention will be described with reference to specific examples. Example 1 An optical information recording layer 2 containing Te and TeO 2 as a main component was provided on one surface of a polycarbonate substrate 1 having a thickness of 1.2 mm and a diameter of 120 mm by vacuum deposition, and a UV curable adhesive was used on the optical information recording layer 2. Then, the same one as the polycarbonate substrate 1 is attached. Using the disk thus prepared, an oxygen plasma treatment was performed for 10 minutes at a flow rate of oxygen of 1 l / min in a UV dry stripper (UV-1, manufactured by Samco International) to oxidize the surface, and then in a desiccator. Is exposed to vapor of heptadecafluorodecyltrichlorosilane as a chlorosilane-based chemical adsorbent containing a fluoroalkyl group for 120 minutes, and the chemisorption monomolecular film 5 through the siloxane bond 4 containing a fluoroalkyl group
Was formed on the surface of the polycarbonate substrate 1. Subsequently, it was allowed to stand in air for 60 minutes to form a siloxane bond 4 also between adsorbed molecules.
【００３７】実施例２ 実施例１の、ヘプタデカフルオロデシルトリクロロシラ
ンをトリデカフルオロオクチルトリクロルシランに、変
えて実施例１と同様に実験をした。Example 2 An experiment was conducted in the same manner as in Example 1 except that the heptadecafluorodecyltrichlorosilane of Example 1 was changed to tridecafluorooctyltrichlorosilane.
【００３８】実施例３ 実施例１のヘプタデカフルオロオクチルトリクロロシラ
ンをパーフルオロドデシルトリクロルシランに変えて、
実施例１と同様の実験をした。Example 3 Replacing the heptadecafluorooctyltrichlorosilane of Example 1 with perfluorododecyltrichlorosilane,
The same experiment as in Example 1 was performed.
【００３９】実施例４ 実施例１において酸素プラズマ処理した後、まずテトラ
クロロシランの蒸気に６０分間さらし、さらに空気中に
６０分間放置した後、実施例１と同様の実験をした。Example 4 After the oxygen plasma treatment in Example 1, the sample was first exposed to tetrachlorosilane vapor for 60 minutes and left in the air for 60 minutes, and the same experiment as in Example 1 was performed.
【００４０】比較例１ 実施例１において透明基板上に化学吸着膜の代わりに、
窒化ケイ素膜をプラズマＣＶＤ法により１５０ｎｍ設け
た。Comparative Example 1 Instead of the chemisorption film on the transparent substrate in Example 1,
A silicon nitride film was formed to a thickness of 150 nm by a plasma CVD method.
【００４１】比較例２ 実施例１において透明基板上に化学吸着膜の代わりに、
ＳｉＯ2 膜を真空蒸着法により１５０ｎｍ設けた。Comparative Example 2 Instead of the chemisorption film on the transparent substrate in Example 1,
A SiO2 film having a thickness of 150 nm was formed by a vacuum evaporation method.
【００４２】比較例３ 実施例１において透明基板上に化学吸着膜の代わりに、
エチレンー酢酸ビニル共重合体を１５０ｎｍ設けた。Comparative Example 3 Instead of the chemisorption film on the transparent substrate in Example 1,
An ethylene-vinyl acetate copolymer having a thickness of 150 nm was provided.
【００４３】比較例４ 保護膜なし。 以上の試料を７０℃、８０％ＲＨ中に放置し、光（８３
０ｎｍ）の透過率の時間変化を調べた。その結果を（図
４）に示す。図４において、曲線Ａは実施例１〜４、Ｂ
は比較例１、Ｃは比較例２、Ｄは比較例３、Ｅは比較例
４のそれぞれの透過率の時間変化を示す。Comparative Example 4 No protective film. The above sample was left to stand at 70 ° C and 80% RH and exposed to light (83
The change with time in the transmittance of (0 nm) was examined. The results are shown in (Fig. 4). In FIG. 4, a curve A indicates Examples 1 to 4 and B.
Shows a change with time in the transmittance of Comparative Example 1, C is a comparative example 2, D is a comparative example 3, and E is a comparative example 4.
【００４４】図４からも明らかなように、本実施例の光
情報記録媒体はいずれも１０００時間後においても透過
率がほとんど変化せず、記録膜が高温高湿中で腐食劣化
せずに安定であることがわかる。それに反して比較例の
ものは１０〜１００時間で保護膜の剥離、クラック等に
より記録膜が腐食劣化し、透過率が著しく低下した。As is clear from FIG. 4, the optical information recording mediums of the present examples show almost no change in transmittance even after 1000 hours, and the recording film is stable in high temperature and high humidity without corrosion deterioration. It can be seen that it is. On the contrary, in the case of Comparative Example, the recording film was corroded and deteriorated due to peeling and cracks of the protective film in 10 to 100 hours, and the transmittance was remarkably lowered.
【００４５】実施例５ 厚み１．２ｍｍ、直径１２０ｍｍのポリカーボネート基
板１１の片面に、真空蒸着でＴｅ，ＴｅＯ2 を主成分と
する光情報記録層１２を設け、さらにその上に、スパッ
タ法により、膜厚１０ｎｍのＳｉＯ2 を無機酸化物層１
３として形成した。このようにしてつくったディスクを
用い、ＵＶドライ・ストリッパー（ＵＶ−１、サムコイ
ンターナショナル製）中で酸素流量１ｌ／ｍｉｎの条件
で酸素プラズマ処理を１０分間施してポリカーボネート
基板表面を酸化処理した後、デシケータ中でフッ化アル
キル基を含むクロロシラン系化学吸着剤としてヘプタデ
カフルオロデシルトリクロロシランの蒸気に１２０分間
さらし、フッ化アルキル基を含むシロキサン結合１５を
介した化学吸着単分子膜１６をＳｉＯ2 層１３表面およ
びポリカーボネート基板表面１１に形成した。引き続い
て空気中に６０分間放置し、吸着分子間にもシロキサン
結合１５を形成させた。Example 5 A polycarbonate substrate 11 having a thickness of 1.2 mm and a diameter of 120 mm was provided with an optical information recording layer 12 containing Te and TeO 2 as a main component by vacuum deposition on one surface, and further thereon, by a sputtering method. Inorganic oxide layer 1 with SiO 2 having a thickness of 10 nm
Formed as 3. Using the disk thus prepared, an oxygen plasma treatment was performed for 10 minutes in a UV dry stripper (UV-1, manufactured by Samco International) at an oxygen flow rate of 1 l / min to oxidize the surface of the polycarbonate substrate. The chemical adsorption monomolecular film 16 is exposed to vapor of heptadecafluorodecyltrichlorosilane for 120 minutes as a chlorosilane-based chemical adsorbent containing a fluorinated alkyl group in a desiccator, and the chemisorption monomolecular film 16 via the siloxane bond 15 containing a fluorinated alkyl group is formed into a SiO 2 layer. 13 surface and polycarbonate substrate surface 11. Subsequently, it was allowed to stand in air for 60 minutes to form a siloxane bond 15 between adsorbed molecules.
【００４６】実施例６ 実施例５の無機酸化物層をＳｉＯ2 からＴｉＯ2 に変え
て、実施例５と同様に実験をした。Example 6 An experiment was conducted in the same manner as in Example 5, except that the inorganic oxide layer of Example 5 was changed from SiO 2 to TiO 2 .
【００４７】実施例７ 実施例５の無機酸化物層をＳｉＯ2 からＡｌ2 Ｏ3 に変
えて、実施例５と同様の実験をした。Example 7 An experiment similar to that of Example 5 was carried out by changing the inorganic oxide layer of Example 5 from SiO 2 to Al 2 O 3 .
【００４８】実施例８ 実施例５において酸素プラズマ処理した後、まずテトラ
クロロシランの蒸気に６０分間さらし、さらに空気中に
６０分間放置した後、実施例５と同様の実験をした。Example 8 After the oxygen plasma treatment in Example 5, the sample was first exposed to tetrachlorosilane vapor for 60 minutes and then left in the air for 60 minutes, and the same experiment as in Example 5 was performed.
【００４９】実施例９ 実施例５において、ヘプタデカフルオロデシルトリクロ
ロシランを９−（ヘプタデカフルオロデシルジメチルシ
リルノニルトイリクロロシランに変えて、実施例１と同
様の実験をした。Example 9 In Example 5, the same experiment as in Example 1 was carried out, except that heptadecafluorodecyltrichlorosilane was changed to 9- (heptadecafluorodecyldimethylsilylnonyltoylchlorosilane.
【００５０】比較例５ 実施例５において化学吸着膜を形成しない試料を作っ
た。 以上の試料を７０℃、８０％ＲＨ中に放置し、光（８３
０ｎｍ）の透過率の時間変化を調べた。その結果を図８
に示す。図８において、曲線Ｆは実施例１〜５、Ｇは比
較例１の透過率の時間変化を示す。Comparative Example 5 A sample in which a chemisorption film was not formed in Example 5 was prepared. The above sample was left to stand at 70 ° C and 80% RH and exposed to light (83
The change with time in the transmittance of (0 nm) was examined. The result is shown in Fig. 8.
Shown in In FIG. 8, the curve F shows the changes over time in the transmittance of Examples 1 to 5, and G shows the change over time in the transmittance of Comparative Example 1.
【００５１】図８からも明らかなように、本実施例の光
情報記録媒体はいずれも１０００時間後においても透過
率がほとんど変化せず、記録膜が高温高湿中で腐食劣化
せずに安定であることがわかる。これに対して比較例の
ものは１０〜１００時間で保護膜の剥離、クラック等に
より記録膜が腐食劣化し、透過率が著しく低下した。As is clear from FIG. 8, in all the optical information recording media of the present example, the transmittance hardly changed even after 1000 hours, and the recording film was stable in high temperature and high humidity without being corroded and deteriorated. It can be seen that it is. On the other hand, in the case of the comparative example, the recording film was corroded and deteriorated due to peeling and cracks of the protective film in 10 to 100 hours, and the transmittance was remarkably lowered.
【００５２】なお実施例では、光情報記録層はＴｅ，Ｔ
ｅＯ2 系の記録膜を用いて説明したが、これに限定され
るものではなく、Ｔｂ・Ｆｅ・Ｃｏ系膜、Ａｌ系膜など
他の光情報記録膜でも同様の効果が期待できる。In the embodiment, the optical information recording layer is made of Te, T
Although the description has been made using the eO 2 -based recording film, the present invention is not limited to this, and the same effect can be expected with other optical information recording films such as a Tb / Fe / Co-based film and an Al-based film.
【００５３】以上のように本実施例によれば、光情報記
録層を内側に設けた透明基板の外側表面にシロキサン結
合を有する化学吸着膜を気相法で設けることにより、基
板を劣化させずに防湿性、防食性を向上させることがで
き、その実用効果は大なるものがある。As described above, according to this embodiment, the chemical adsorption film having a siloxane bond is provided on the outer surface of the transparent substrate having the optical information recording layer on the inner side by the vapor phase method, so that the substrate is not deteriorated. In addition, it is possible to improve the moisture-proof property and the anticorrosive property, and there are great practical effects.
【００５４】また、透明基板の片面に設けられた光情報
記録層上に無機酸化物層を形成し、その無機酸化物層表
面もしくは前記無機酸化物層と前記透明基板の両面にシ
ロキサン結合を有する化学吸着膜を気相法で設けること
により、基板を劣化させずにさらに防湿性、防食性を向
上させることができ、その実用効果は大なるものがあ
る。Further, an inorganic oxide layer is formed on the optical information recording layer provided on one surface of the transparent substrate, and the surface of the inorganic oxide layer or both surfaces of the inorganic oxide layer and the transparent substrate have a siloxane bond. By providing the chemical adsorption film by the vapor phase method, it is possible to further improve the moistureproof property and the anticorrosive property without deteriorating the substrate, and there are great practical effects.
【００５５】[0055]
【発明の効果】以上説明した通り本発明方法によれば、
光情報記録層を設けた透明基板の外側表面に形成した化
学吸着膜はち密でクラックが発生しにくく、水分子を透
過しにくい。また、化学吸着膜と無機酸化物層あるいは
透明基板とはシロキサン結合を介して化学結合している
ので、剥離しにくく、かつ防湿性、耐食性、耐久性に優
れている。また、有機溶媒を使わずに化学吸着膜を気相
で形成させるため、有機溶媒に可溶の基板でも使用でき
る。さらに気相で化学吸着膜を形成するので、得られる
極薄膜中へのコンタミネーションの混入の防止もでき
る。As described above, according to the method of the present invention,
The chemically adsorbed film formed on the outer surface of the transparent substrate provided with the optical information recording layer is dense and less likely to cause cracks, and less likely to transmit water molecules. Further, since the chemical adsorption film and the inorganic oxide layer or the transparent substrate are chemically bonded via a siloxane bond, they are difficult to peel off and are excellent in moisture resistance, corrosion resistance and durability. Further, since the chemisorption film is formed in the vapor phase without using the organic solvent, it is possible to use a substrate soluble in the organic solvent. Furthermore, since the chemical adsorption film is formed in the gas phase, it is possible to prevent contamination from being mixed into the obtained ultrathin film.
【図１】本発明の第１番目の発明の一実施例の光情報記
録媒体の製造方法を分子レベルまで拡大した断面モデル
図であり、化学吸着反応直前を示す図である。FIG. 1 is a cross-sectional model view in which a method for manufacturing an optical information recording medium according to an embodiment of the first aspect of the present invention is enlarged to a molecular level, showing a state immediately before a chemical adsorption reaction.
【図２】同実施例の光情報記録媒体の製造方法を分子レ
ベルまで拡大した断面モデル図であり、化学吸着反応直
後を示す図である。FIG. 2 is a cross-sectional model view in which the method for manufacturing the optical information recording medium of the same example is enlarged to a molecular level, showing a state immediately after a chemical adsorption reaction.
【図３】同実施例の光情報記録媒体の製造方法を分子レ
ベルまで拡大した断面モデル図であり、水分と反応させ
た後の化学吸着膜を示す図である。FIG. 3 is a cross-sectional model view in which the method for manufacturing the optical information recording medium of the same example is enlarged to a molecular level, and is a diagram showing a chemical adsorption film after being reacted with water.
【図４】同実施例および比較例における光情報記録媒体
の７０℃、８０％ＲＨ中における、光（８３０ｎｍ）透
過率の経時変化を示す図である。FIG. 4 is a diagram showing changes with time in light (830 nm) transmittance of the optical information recording media in the same example and comparative example at 70 ° C. and 80% RH.
【図５】本発明の第２番目の発明の一実施例の光情報記
録媒体の製造方法を分子レベルまで拡大した断面モデル
図であり、化学吸着反応直前を示す図である。FIG. 5 is a cross-sectional model view in which a method for manufacturing an optical information recording medium according to an example of the second invention of the present invention is enlarged to a molecular level, and is a view immediately before a chemical adsorption reaction.
【図６】同実施例の光情報記録媒体の製造方法を分子レ
ベルまで拡大した断面モデル図であり、化学吸着反応直
後を示す図である。FIG. 6 is a cross-sectional model view in which the method for manufacturing the optical information recording medium of the same example is enlarged to the molecular level, showing a state immediately after the chemical adsorption reaction.
【図７】同実施例の光情報記録媒体の製造方法を分子レ
ベルまで拡大した断面モデル図であり、水分と反応させ
た後の化学吸着膜を示す図である。FIG. 7 is a cross-sectional model view in which the method for manufacturing the optical information recording medium of the same example is enlarged to a molecular level, and is a diagram showing a chemical adsorption film after being reacted with water.
【図８】同実施例および比較例における光情報記録媒体
の７０℃、８０％ＲＨ中における、光（８３０ｎｍ）透
過率の経時変化を示す図である。FIG. 8 is a diagram showing changes with time in light (830 nm) transmittance of the optical information recording media in the same example and comparative example at 70 ° C. and 80% RH.
１ 透明基板 ２ 光情報記録層 ３ クロロシラン系化学吸着剤 ４ シロキサン結合 ５ 化学吸着膜膜 １１ 透明基板 １２ 光情報記録層 １３ 無機酸化物層 １４ クロロシラン系化学吸着剤 １５ シロキサン結合 １６ 化学吸着膜 Ａ 実施例１〜４の透過率変化曲線 Ｂ 比較例１の透過率変化曲線 Ｃ 比較例２の透過率変化曲線 Ｄ 比較例３の透過率変化曲線 Ｅ 比較例４の透過率変化曲線 Ｆ 実施例５〜９の透過率変化曲線 Ｇ 比較例５の透過率変化曲線 1 Transparent Substrate 2 Optical Information Recording Layer 3 Chlorosilane Chemical Adsorbent 4 Siloxane Bond 5 Chemisorption Film 5 11 Transparent Substrate 12 Optical Information Recording Layer 13 Inorganic Oxide Layer 14 Chlorosilane Chemical Adsorbent 15 Siloxane Bond 16 Chemical Adsorption Film A Implementation Transmittance change curve of Examples 1 to 4 B Transmittance change curve of Comparative Example 1 C Transmittance change curve of Comparative Example 2 D Transmittance change curve of Comparative Example 3 E Transmittance change curve of Comparative Example 4 F Example 5 9 transmittance change curve G G transmittance change curve of Comparative Example 5
Claims (7)
に、気相でハロゲン化シラン系化学吸着剤を接触させ、
次に水分と反応させることにより化学吸着膜を形成する
光情報記録媒体の製造方法。1. A halogenated silane-based chemical adsorbent is brought into contact with the surface of a transparent substrate provided with an optical information recording layer in a vapor phase,
Next, a method for manufacturing an optical information recording medium, in which a chemical adsorption film is formed by reacting with water.
表面に無機酸化物層を形成し、前記無機酸化物層表面も
しくは前記無機酸化物層と前記透明基板の両面に、気相
でクロロシラン系化学吸着剤を接触させ、次に水分と反
応させることにより化学吸着膜を形成する光情報記録媒
体の製造方法。2. An inorganic oxide layer is formed on the surface of an optical information recording layer provided on one surface of a substrate, and the surface of the inorganic oxide layer or both surfaces of the inorganic oxide layer and the transparent substrate are vapor-phased. A method for producing an optical information recording medium, which comprises forming a chemical adsorption film by bringing a chlorosilane-based chemical adsorbent into contact and then reacting with water.
化合物である請求項１または２に記載の光情報記録媒体
の製造方法。3. The method for producing an optical information recording medium according to claim 1, wherein the chemical adsorbent is a compound containing a fluorinated alkyl group.
たは２に記載の光情報記録媒体。4. The optical information recording medium according to claim 1, wherein the chemical adsorption film is a monomolecular film.
ｌ2 Ｏ3 の少なくとも一つから選ばれる層である請求項
２に記載の光情報記録媒体の製造方法。5. The inorganic oxide layer comprises SiO 2 , TiO 2 , and A.
The method for producing an optical information recording medium according to claim 2, wherein the layer is a layer selected from at least one of l 2 O 3 .
項１または２に記載の光情報記録媒体の製造方法。6. The method for manufacturing an optical information recording medium according to claim 1, wherein the substrate is made of a substantially transparent resin.
ある請求項２に記載の光情報記録媒体の製造方法。7. The method for producing an optical information recording medium according to claim 2, wherein the inorganic oxide layer has a thickness of 1 to 500 nm.
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4006163A JP2510054B2 (en) | 1992-01-17 | 1992-01-17 | Method for manufacturing optical information recording medium |
| US07/848,914 US5268211A (en) | 1991-01-17 | 1992-03-10 | Optical recording medium |
| US08/002,163 US5296263A (en) | 1992-01-07 | 1993-01-07 | Method of manufacturing a recording medium |
| EP93100297A EP0552636B1 (en) | 1992-01-17 | 1993-01-11 | Method of manufacturing a recording medium |
| DE69324281T DE69324281T2 (en) | 1992-01-17 | 1993-01-11 | Process for producing a recording medium |
| US08/092,871 US5397597A (en) | 1991-01-17 | 1993-07-19 | Optical recording medium and method of manufacturing the same |
| US08/130,721 US5366762A (en) | 1992-01-17 | 1993-10-04 | Method of manufacturing a recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4006163A JP2510054B2 (en) | 1992-01-17 | 1992-01-17 | Method for manufacturing optical information recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0644617A JPH0644617A (en) | 1994-02-18 |
| JP2510054B2 true JP2510054B2 (en) | 1996-06-26 |
Family
ID=11630864
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4006163A Expired - Fee Related JP2510054B2 (en) | 1991-01-17 | 1992-01-17 | Method for manufacturing optical information recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2510054B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4590758B2 (en) * | 2000-04-10 | 2010-12-01 | Ｔｄｋ株式会社 | Optical information medium |
| TW583642B (en) | 2001-03-23 | 2004-04-11 | Matsushita Electric Ind Co Ltd | Optical information recording medium and method for manufacturing the same |
| EP1443088A4 (en) | 2001-09-19 | 2005-01-19 | Tdk Corp | Artificial finger print liquid, testing method for optical information medium using it and optical information medium |
| WO2004040564A1 (en) | 2002-10-30 | 2004-05-13 | Tdk Corporation | Method for evaluating optical information medium and optical information medium |
| JP3799025B2 (en) | 2003-03-18 | 2006-07-19 | Ｔｄｋ株式会社 | Evaluation method for optical information media |
-
1992
- 1992-01-17 JP JP4006163A patent/JP2510054B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0644617A (en) | 1994-02-18 |
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