JP2022106797A - Solar cell panel coating material - Google Patents
Solar cell panel coating material Download PDFInfo
- Publication number
- JP2022106797A JP2022106797A JP2022068403A JP2022068403A JP2022106797A JP 2022106797 A JP2022106797 A JP 2022106797A JP 2022068403 A JP2022068403 A JP 2022068403A JP 2022068403 A JP2022068403 A JP 2022068403A JP 2022106797 A JP2022106797 A JP 2022106797A
- Authority
- JP
- Japan
- Prior art keywords
- silica particles
- weight
- solar cell
- cell panel
- coating material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 25
- 239000011248 coating agent Substances 0.000 title claims abstract description 24
- 239000000463 material Substances 0.000 title claims abstract description 22
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 70
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims abstract description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 24
- 239000002245 particle Substances 0.000 claims abstract description 13
- 239000006185 dispersion Substances 0.000 claims abstract description 12
- 239000000203 mixture Substances 0.000 claims abstract description 12
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical group [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 15
- 239000004115 Sodium Silicate Substances 0.000 claims description 12
- 229910052911 sodium silicate Inorganic materials 0.000 claims description 12
- 239000011521 glass Substances 0.000 abstract description 12
- 210000004027 cell Anatomy 0.000 description 32
- 239000007864 aqueous solution Substances 0.000 description 19
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 239000003960 organic solvent Substances 0.000 description 16
- 150000001282 organosilanes Chemical class 0.000 description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 13
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 13
- 239000011247 coating layer Substances 0.000 description 13
- 239000003054 catalyst Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 10
- 239000005341 toughened glass Substances 0.000 description 10
- 235000010338 boric acid Nutrition 0.000 description 9
- 239000004327 boric acid Substances 0.000 description 9
- 229960002645 boric acid Drugs 0.000 description 9
- -1 silane halide Chemical class 0.000 description 9
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 8
- 239000008119 colloidal silica Substances 0.000 description 8
- 235000019441 ethanol Nutrition 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 8
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 4
- 235000019353 potassium silicate Nutrition 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 3
- 239000000347 magnesium hydroxide Substances 0.000 description 3
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 230000001588 bifunctional effect Effects 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 2
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 2
- 229910021642 ultra pure water Inorganic materials 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- XDVOLDOITVSJGL-UHFFFAOYSA-N 3,7-dihydroxy-2,4,6,8,9-pentaoxa-1,3,5,7-tetraborabicyclo[3.3.1]nonane Chemical compound O1B(O)OB2OB(O)OB1O2 XDVOLDOITVSJGL-UHFFFAOYSA-N 0.000 description 1
- KSCAZPYHLGGNPZ-UHFFFAOYSA-N 3-chloropropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCl KSCAZPYHLGGNPZ-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- NMUBRRLYMADSGF-UHFFFAOYSA-N 3-triethoxysilylpropan-1-ol Chemical compound CCO[Si](OCC)(OCC)CCCO NMUBRRLYMADSGF-UHFFFAOYSA-N 0.000 description 1
- YATIYDNBFHEOFA-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-ol Chemical compound CO[Si](OC)(OC)CCCO YATIYDNBFHEOFA-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- WUBBRNOQWQTFEX-UHFFFAOYSA-N 4-aminosalicylic acid Chemical group NC1=CC=C(C(O)=O)C(O)=C1 WUBBRNOQWQTFEX-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- SXPLZNMUBFBFIA-UHFFFAOYSA-N butyl(trimethoxy)silane Chemical compound CCCC[Si](OC)(OC)OC SXPLZNMUBFBFIA-UHFFFAOYSA-N 0.000 description 1
- VSGNNIFQASZAOI-UHFFFAOYSA-L calcium acetate Chemical compound [Ca+2].CC([O-])=O.CC([O-])=O VSGNNIFQASZAOI-UHFFFAOYSA-L 0.000 description 1
- 239000001639 calcium acetate Substances 0.000 description 1
- 235000011092 calcium acetate Nutrition 0.000 description 1
- 229960005147 calcium acetate Drugs 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- FNAQSUUGMSOBHW-UHFFFAOYSA-H calcium citrate Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O FNAQSUUGMSOBHW-UHFFFAOYSA-H 0.000 description 1
- 239000001354 calcium citrate Substances 0.000 description 1
- 229960004256 calcium citrate Drugs 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 210000005056 cell body Anatomy 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 229940106681 chloroacetic acid Drugs 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- OREAFAJWWJHCOT-UHFFFAOYSA-N dimethylmalonic acid Chemical compound OC(=O)C(C)(C)C(O)=O OREAFAJWWJHCOT-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- VRINOTYEGADLMW-UHFFFAOYSA-N heptyl(trimethoxy)silane Chemical compound CCCCCCC[Si](OC)(OC)OC VRINOTYEGADLMW-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 229940051250 hexylene glycol Drugs 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 1
- 229910052912 lithium silicate Inorganic materials 0.000 description 1
- UEGPKNKPLBYCNK-UHFFFAOYSA-L magnesium acetate Chemical compound [Mg+2].CC([O-])=O.CC([O-])=O UEGPKNKPLBYCNK-UHFFFAOYSA-L 0.000 description 1
- 239000011654 magnesium acetate Substances 0.000 description 1
- 235000011285 magnesium acetate Nutrition 0.000 description 1
- 229940069446 magnesium acetate Drugs 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- 239000004337 magnesium citrate Substances 0.000 description 1
- 235000002538 magnesium citrate Nutrition 0.000 description 1
- 229960005336 magnesium citrate Drugs 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 1
- MSRJTTSHWYDFIU-UHFFFAOYSA-N octyltriethoxysilane Chemical compound CCCCCCCC[Si](OCC)(OCC)OCC MSRJTTSHWYDFIU-UHFFFAOYSA-N 0.000 description 1
- 229960003493 octyltriethoxysilane Drugs 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 125000003544 oxime group Chemical group 0.000 description 1
- VGTPKLINSHNZRD-UHFFFAOYSA-N oxoborinic acid Chemical compound OB=O VGTPKLINSHNZRD-UHFFFAOYSA-N 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- TVTLMXQPHPHCEU-UHFFFAOYSA-N silane triethoxy(octadecyl)silane Chemical compound [SiH4].CCCCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC TVTLMXQPHPHCEU-UHFFFAOYSA-N 0.000 description 1
- 150000003377 silicon compounds Chemical group 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 235000013337 tricalcium citrate Nutrition 0.000 description 1
- ZLGWXNBXAXOQBG-UHFFFAOYSA-N triethoxy(3,3,3-trifluoropropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)F ZLGWXNBXAXOQBG-UHFFFAOYSA-N 0.000 description 1
- SAWDTKLQESXBDN-UHFFFAOYSA-N triethoxy(heptyl)silane Chemical compound CCCCCCC[Si](OCC)(OCC)OCC SAWDTKLQESXBDN-UHFFFAOYSA-N 0.000 description 1
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 1
- FHVAUDREWWXPRW-UHFFFAOYSA-N triethoxy(pentyl)silane Chemical compound CCCCC[Si](OCC)(OCC)OCC FHVAUDREWWXPRW-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- PLSARIKBYIPYPF-UHFFFAOYSA-H trimagnesium dicitrate Chemical compound [Mg+2].[Mg+2].[Mg+2].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O PLSARIKBYIPYPF-UHFFFAOYSA-H 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- HILHCDFHSDUYNX-UHFFFAOYSA-N trimethoxy(pentyl)silane Chemical compound CCCCC[Si](OC)(OC)OC HILHCDFHSDUYNX-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Abstract
Description
本発明は、太陽電池パネル用コーティング材に関する。 The present invention relates to a coating material for a solar cell panel.
太陽電池パネルのカバーガラス(強化ガラス)の表面には、太陽電池本体により多くの太陽光を入射させるために、光反射を低減する反射防止膜が形成されている。このような反射防止膜には、例えば、特許文献1に、透明基体の表面に中空シリカ粒子を含む反射防止膜を有する反射防止膜付き基体が記載されている。 An antireflection film that reduces light reflection is formed on the surface of the cover glass (tempered glass) of the solar cell panel in order to allow more sunlight to enter the solar cell body. As such an antireflection film, for example, Patent Document 1 describes a substrate with an antireflection film having an antireflection film containing hollow silica particles on the surface of the transparent substrate.
ところで、反射防止膜は太陽電池パネルのガラス表面に対する密着性を高めることにより、膜の安定性が保たれ、その結果、太陽光の反射が低減される。
本発明の目的は、太陽電池パネルのガラス表面に塗布することにより太陽光の反射を低減する反射防止膜が形成される太陽電池パネル用コーティング材を提供することにある。
By the way, the antireflection film enhances the adhesion of the solar cell panel to the glass surface to maintain the stability of the film, and as a result, the reflection of sunlight is reduced.
An object of the present invention is to provide a coating material for a solar cell panel, which is applied to the glass surface of the solar cell panel to form an antireflection film that reduces the reflection of sunlight.
本発明によれば、加水分解性オルガノシラン、アルカリ金属ケイ酸塩、平均粒子径1nm~100nmのシリカ粒子を水中に含有する水分散体であって、前記水分散体中に、前記加水分解性オルガノシラン100重量部に対し、前記アルカリ金属ケイ酸塩5重量部~30重量部、前記シリカ粒子1,000重量部~3,000重量部を含有することを特徴とする太陽電池パネル用コーティング材が提供される。
ここで、前記加水分解性オルガノシランは、4官能加水分解性アルコキシシランであることが好ましい。
前記アルカリ金属ケイ酸塩は、ケイ酸ナトリウムであることが好ましい。
さらに、前記シリカ粒子は、平均粒子径1nm~100nmの球状シリカ粒子20重量%~40重量%と、平均長さ30nm~200nmの鎖状シリカ粒子60重量%~80重量%との混合物(但し、混合物中の球状シリカ粒子と鎖状シリカ粒子の合計は100重量%である)であることが好ましい。
According to the present invention, it is an aqueous dispersion containing hydrolyzable organosilane, alkali metal silicate, and silica particles having an average particle diameter of 1 nm to 100 nm in water, and the hydrolyzable in the aqueous dispersion. A coating material for a solar cell panel, which contains 5 to 30 parts by weight of the alkali metal silicate and 1,000 to 3,000 parts by weight of the silica particles with respect to 100 parts by weight of the organosilane. Is provided.
Here, the hydrolyzable organosilane is preferably a tetrafunctional hydrolyzable alkoxysilane.
The alkali metal silicate is preferably sodium silicate.
Further, the silica particles are a mixture of 20% to 40% by weight of spherical silica particles having an average particle diameter of 1 nm to 100 nm and 60% to 80% by weight of chain silica particles having an average length of 30 nm to 200 nm (however, The total of the spherical silica particles and the chain silica particles in the mixture is 100% by weight).
本発明によれば、太陽電池パネルのガラス表面に塗布することにより太陽光の反射を低減する反射防止膜が形成される太陽電池パネル用コーティング材が提供される。 According to the present invention, there is provided a coating material for a solar cell panel, which is applied to the glass surface of the solar cell panel to form an antireflection film that reduces the reflection of sunlight.
以下、本発明を実施するための形態について説明する(以下、実施の形態)。尚、本発明は、以下の実施の形態に限定されるものではなく、その要旨の範囲内で種々変形して実施することができる。 Hereinafter, embodiments for carrying out the present invention will be described (hereinafter, embodiments). The present invention is not limited to the following embodiments, and can be variously modified and implemented within the scope of the gist thereof.
(加水分解性オルガノシラン)
本実施の形態で使用する加水分解性オルガノシランは、分子中に酸性触媒又は塩基性触媒の存在下に加水分解する加水分解基を有するケイ素化合物である。加水分解性オルガノシランが有する加水分解基としては、例えば、アルコキシ基、アセトキシ基、オキシム基、エノキシ基、アミノ基、アミノキシ基、アミド基等が挙げられる。これらの中でもアルコキシ基を有する加水分解性アルコキシシランが好ましい。
(Hydrolyzable organosilane)
The hydrolyzable organosilane used in the present embodiment is a silicon compound having a hydrolyzing group that hydrolyzes in the presence of an acidic catalyst or a basic catalyst in the molecule. Examples of the hydrolyzable group contained in the hydrolyzable organosilane include an alkoxy group, an acetoxy group, an oxime group, an enoxy group, an amino group, an aminox group, and an amide group. Of these, hydrolyzable alkoxysilanes having an alkoxy group are preferable.
加水分解性アルコキシシランとしては、4官能加水分解性アルコキシシラン、3官能加水分解性アルコキシシラン、2官能加水分解性アルコキシシランが挙げられる。これら中でも4官能加水分解性アルコキシシランが好ましい。
4官能加水分解性アルコキシシランとしては、例えば、テトラメトキシシラン、テトラエトキシシラン、テトラプロポキシシラン、テトラブトキシシラン等のテトラアルコキシシラン類が挙げられる。
Examples of the hydrolyzable alkoxysilane include a tetrafunctional hydrolyzable alkoxysilane, a trifunctional hydrolyzable alkoxysilane, and a bifunctional hydrolyzable alkoxysilane. Among these, tetrafunctional hydrolyzable alkoxysilane is preferable.
Examples of the tetrafunctional hydrolyzable alkoxysilane include tetraalkoxysilanes such as tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, and tetrabutoxysilane.
3官能加水分解性アルコキシシランとしては、例えば、メチルトリメトキシシラン、メチルトリエトキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、プロピルトリメトキシシラン、プロピルトリエトキシシラン、ブチルトリメトキシシラン、ブチルトリエトキシシラン、ペンチルトリメトキシシラン、ペンチルトリエトキシシラン、ヘキシルトリメトキシシラン、ヘキシルトリエトキシシラン、ヘプチルトリメトキシシラン、ヘプチルトリエトキシシラン、オクチルトリメトキシシラン、オクチルトリエトキシシラン、ステアリルトリメトキシシラン、ステアリルトリエトキシシラン、3-クロロプロピルトリメトキシシラン、3-クロロプロピルトリエトキシシラン、3-ヒドロキシプロピルトリメトキシシラン、3-ヒドロキシプロピルトリエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、トリフルオロプロピルトリメトキシシラン、トリフルオロプロピルトリエトキシシラン等のトリアルコキシシラン類が挙げられる。 Examples of the trifunctional hydrolyzable alkoxysilane include methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, propyltrimethoxysilane, propyltriethoxysilane, butyltrimethoxysilane, and butyltriethoxy. Silane, pentyltrimethoxysilane, pentyltriethoxysilane, hexyltrimethoxysilane, hexyltriethoxysilane, heptyltrimethoxysilane, heptyltriethoxysilane, octyltrimethoxysilane, octyltriethoxysilane, stearyltrimethoxysilane, stearyltriethoxysilane Silane, 3-chloropropyltrimethoxysilane, 3-chloropropyltriethoxysilane, 3-hydroxypropyltrimethoxysilane, 3-hydroxypropyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, trifluoropropyltrimethoxysilane , Trialkoxysilanes such as trifluoropropyltriethoxysilane.
2官能加水分解性アルコキシシランとしては、例えば、ジメチルジメトキシシラン、ジメチルジエトキシシラン等のジアルコキシシラン類等が挙げられる。これらの化合物は単独で又は2種以上組み合わせて用いることができる。
上記アルコキシシランの中でも、テトラメトキシシラン、テトラエトキシシラン等のテトラアルコキシシラン;メチルトリメトキシシラン、メチルトリエトキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン等のトリアルコキシシランが好ましい。さらに、テトラアルコキシシランが好ましく、テトラエトキシシラン(TEOS)が特に好ましい。
Examples of the bifunctional hydrolyzable alkoxysilane include dialkoxysilanes such as dimethyldimethoxysilane and dimethyldiethoxysilane. These compounds can be used alone or in combination of two or more.
Among the above alkoxysilanes, tetraalkoxysilanes such as tetramethoxysilane and tetraethoxysilane; trialkoxysilanes such as methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane and ethyltriethoxysilane are preferable. Further, tetraalkoxysilane is preferable, and tetraethoxysilane (TEOS) is particularly preferable.
加水分解性アルコキシシランの加水分解反応に使用する酸性触媒としては、例えば、酢酸、クロロ酢酸、クエン酸、安息香酸、ジメチルマロン酸、蟻酸、プロピオン酸、グルタール酸、グリコール酸、マレイン酸、マロン酸、トルエンスルホン酸、シュウ酸等の有機酸;塩酸、硝酸、ハロゲン化シラン等の無機酸が挙げられる。また、塩基性触媒としては、例えば、アンモニア等が挙げられる。これらの触媒を1種又は2種以上使用することができる。酸性触媒の使用量は、加水分解性アルコキシシラン100重量部に対し、通常、0.5重量部~15重量部の範囲である。 Examples of the acidic catalyst used for the hydrolysis reaction of hydrolyzable alkoxysilane include acetic acid, chloroacetic acid, citric acid, benzoic acid, dimethylmalonic acid, formic acid, propionic acid, glutaric acid, glycolic acid, maleic acid and malonic acid. , Organic acids such as toluenesulfonic acid and oxalic acid; and inorganic acids such as hydrochloric acid, nitric acid and silane halide. Moreover, as a basic catalyst, for example, ammonia and the like can be mentioned. One or more of these catalysts can be used. The amount of the acidic catalyst used is usually in the range of 0.5 parts by weight to 15 parts by weight with respect to 100 parts by weight of the hydrolyzable alkoxysilane.
加水分解性アルコキシシランは、通常、疎水性であるため、加水分解反応は加水分解性アルコキシシランと水の双方と混ざり合う有機溶媒を共通溶媒として使用することが好ましい。この場合、加水分解性アルコキシシランと水を別個に有機溶媒で希釈してから、両者を混合することが好ましい。有機溶媒と水との使用量の重量比は、通常、(有機溶媒2~15):(水85~98)の範囲である(但し、有機溶媒と水との合計は100である)。 Since the hydrolyzable alkoxysilane is usually hydrophobic, it is preferable to use an organic solvent that is mixed with both the hydrolyzable alkoxysilane and water as a common solvent in the hydrolysis reaction. In this case, it is preferable that the hydrolyzable alkoxysilane and water are separately diluted with an organic solvent and then mixed. The weight ratio of the amount of the organic solvent used to water is usually in the range of (organic solvent 2 to 15) :( water 85 to 98) (however, the total of the organic solvent and water is 100).
有機溶媒としては、例えば、メタノール、エタノール、プロパノール、ブタノール等のアルコール類;アセトン、メチルエチルケトン等のケトン類;ベンゼン、トルエン、キシレン等の芳香族炭化水素類;エチレングリコール、プロピレングリコール、ヘキシレングリコール等のグリコール類;エチルセロソルブ、ブチルセロソルブ、エチルカルビトール、ブチルカルビトール、ジエチルセロソルブ、ジエチルカルビトール等のグリコールエーテル類;N-メチルピロリドン、ジメチルフォルムアミド等が挙げられる。これらの中でも、アルコール類が好ましく、エタノールが特に好ましい、これらの有機溶媒は単独で又は2種以上混合して使用することができる。 Examples of the organic solvent include alcohols such as methanol, ethanol, propanol and butanol; ketones such as acetone and methyl ethyl ketone; aromatic hydrocarbons such as benzene, toluene and xylene; ethylene glycol, propylene glycol and hexylene glycol and the like. Glycols; glycol ethers such as ethyl cellosolve, butyl cellosolve, ethyl carbitol, butyl carbitol, diethyl cellosolve, diethyl carbitol; N-methylpyrrolidone, dimethylformamide and the like. Among these, alcohols are preferable, and ethanol is particularly preferable. These organic solvents can be used alone or in combination of two or more.
(アルカリ金属ケイ酸塩)
本実施の形態で使用するアルカリ金属ケイ酸塩としては、例えば、ケイ酸ナトリウム(水ガラス)、ケイ酸カリウム、ケイ酸リチウム、ケイ酸アンモニウム等が挙げられる。
アルカリ金属ケイ酸塩は、太陽電池パネル用コーティング材を太陽電池パネルの強化ガラス表面に塗布することにより成膜される反射防止膜のバインダ(結合剤)として作用すると考えられる。
(Alkali metal silicate)
Examples of the alkali metal silicate used in the present embodiment include sodium silicate (water glass), potassium silicate, lithium silicate, ammonium silicate and the like.
The alkali metal silicate is considered to act as a binder (binding agent) for an antireflection film formed by applying a coating material for a solar cell panel to the surface of tempered glass of the solar cell panel.
アルカリ金属ケイ酸塩を添加する場合、硬化剤としてホウ酸又はホウ酸化合物を使用することが好ましい。ここでホウ酸は、(xB2O3・yH2O)の組成を有する酸の総称であって、具体的には、オルトホウ酸(H3BO3)、メタホウ酸(HBO2)、四ホウ酸(H2B4O7)等が挙げられる。アルカリ金属ケイ酸塩とホウ酸又はホウ酸化合物を混合するとアルカリ金属ケイ酸塩がゲル化し、成膜される反射防止膜が太陽電池パネルの強化ガラス表面に固着すると考えられる。ホウ酸又はホウ酸化合物の添加量は、通常、アルカリ金属ケイ酸塩100重量部に対して10重量部~700重量部の範囲である。 When adding an alkali metal silicate, it is preferable to use boric acid or a boric acid compound as a curing agent. Here, boric acid is a general term for acids having a composition of (xB 2 O 3 · yH 2 O), and specifically, orthoboric acid (H 3 BO 3 ), metaboric acid (HBO 2 ), tetraboric acid. Acids (H 2 B 4 O 7 ) and the like can be mentioned. It is considered that when the alkali metal silicate is mixed with boric acid or a boric acid compound, the alkali metal silicate gels and the antireflection film formed is fixed to the surface of the reinforced glass of the solar cell panel. The amount of boric acid or boric acid compound added is usually in the range of 10 parts by weight to 700 parts by weight with respect to 100 parts by weight of the alkali metal silicate.
本実施の形態では、アルカリ金属ケイ酸塩を加える場合、必要に応じてその他の添加剤を加えることができる。添加剤としては、例えば、水酸化マグネシウム、水酸化カルシウム、炭酸マグネシウム、炭酸カルシウム、塩化マグネシウム、塩化カルシウムなどの無機酸塩;酢酸マグネシウム、酢酸カルシウム、クエン酸マグネシウム、クエン酸カルシウム等の有機酸塩が挙げられる。その他の添加剤の添加量は、通常、アルカリ金属ケイ酸塩100重量部に対して5重量部~20重量部の範囲である。 In the present embodiment, when the alkali metal silicate is added, other additives can be added as needed. Examples of the additive include inorganic acid salts such as magnesium hydroxide, calcium hydroxide, magnesium carbonate, calcium carbonate, magnesium chloride and calcium chloride; and organic acid salts such as magnesium acetate, calcium acetate, magnesium citrate and calcium citrate. Can be mentioned. The amount of other additives added is usually in the range of 5 parts by weight to 20 parts by weight with respect to 100 parts by weight of the alkali metal silicate.
(シリカ粒子)
本実施の形態で使用するシリカ粒子は、平均粒子径1nm~100nmの微細シリカ粒子が好ましい。本実施の形態では、このような微細シリカ粒子が液体媒体中に安定して分散している状態のコロイダルシリカを使用する。コロイダルシリカは、固形分としてのシリカ粒子を通常15重量%~50重量%含有しており、この値からシリカ粒子の配合量を決めることができる。
コロイダルシリカとしては、例えば、非水系の有機溶媒分散型コロイダルシリカ(オルガノシリカゾル)が好ましい。オルガノシリカゾルは、有機溶媒にナノレベルのコロイダルシリカを安定的に分散させたコロイド溶液である。このような微細シリカ粒子は、太陽電池パネルのガラス表面に反射防止膜を形成する主剤と考えられる。
(Silica particles)
The silica particles used in this embodiment are preferably fine silica particles having an average particle diameter of 1 nm to 100 nm. In the present embodiment, colloidal silica in a state in which such fine silica particles are stably dispersed in a liquid medium is used. Colloidal silica usually contains 15% by weight to 50% by weight of silica particles as a solid content, and the blending amount of silica particles can be determined from this value.
As the colloidal silica, for example, a non-aqueous organic solvent-dispersed colloidal silica (organosilica sol) is preferable. Organosilica sol is a colloidal solution in which nano-level colloidal silica is stably dispersed in an organic solvent. Such fine silica particles are considered to be the main agent for forming an antireflection film on the glass surface of the solar cell panel.
有機溶媒分散型コロイダルシリカ(オルガノシリカゾル)は市販品として容易に入手することができる。有機溶媒分散型コロイダルシリカの有機溶媒としては、親水性有機溶媒であれば、特に限定されない。例えば、メタノール、エタノール、i-プロパノール、n-ブタノール、i-ブタノール等の低級脂肪族アルコール類;エチレングリコール、エチレングリコールモノブチルエーテル、酢酸エチレングリコールモノエチルエーテル等のエチレングリコール誘導体;ジエチレングリコール、ジエチレングリコールモノブチルエーテル等のジエチレングリコール誘導体;ジアセトンアルコール等が挙げられる。これら親水性有機溶媒は、1種または2種以上の混合物として使用することができる。上記親水性有機溶剤は、トルエン、キシレン、ヘキサン、ヘプタン、酢酸エチル、酢酸ブチル、メチルエチルケトン、メチルイソブチルケトン、メチルエチルケトオキシム等の1種または2種以上の有機溶剤と併用することもできる。 The organic solvent-dispersed colloidal silica (organosilica sol) can be easily obtained as a commercially available product. The organic solvent of the organic solvent-dispersed colloidal silica is not particularly limited as long as it is a hydrophilic organic solvent. For example, lower aliphatic alcohols such as methanol, ethanol, i-propanol, n-butanol, i-butanol; ethylene glycol derivatives such as ethylene glycol, ethylene glycol monobutyl ether, ethylene glycol monoethyl ether acetate; diethylene glycol, diethylene glycol monobutyl ether. Diethylene glycol derivatives such as; diacetone alcohol and the like. These hydrophilic organic solvents can be used as one kind or a mixture of two or more kinds. The hydrophilic organic solvent may be used in combination with one or more organic solvents such as toluene, xylene, hexane, heptane, ethyl acetate, butyl acetate, methyl ethyl ketone, methyl isobutyl ketone and methyl ethyl ketooxime.
微細シリカ粒子の形状としては、球状構造(球状シリカ)、鎖状構造(鎖状シリカ)、パールスライク構造等が挙げられる。球状構造、鎖状構造およびパールスライク構造のコロイダルシリカを併用してもよい。
ここで、球状シリカは、通常、平均粒子径1nm~100nm、好ましくは5nm~80nmの範囲で選択されるシリカ微粒子である。また、鎖状シリカとは、シリカ微粒子がシロキサン結合等の化学結合により連続して鎖状となったものを言い、直線状に伸びた形状、二次元的または三次元的に湾曲した形状のものが挙げられる。鎖状シリカは、通常、平均粒子径10nm~25nmのシリカ微粒子が、平均長さ30nm~200nmを有するまで連続したものである。
Examples of the shape of the fine silica particles include a spherical structure (spherical silica), a chain structure (chain silica), and a pearl-like structure. Colloidal silica having a spherical structure, a chain structure, and a pearl-like structure may be used in combination.
Here, the spherical silica is usually silica fine particles selected in the range of an average particle diameter of 1 nm to 100 nm, preferably 5 nm to 80 nm. Further, the chain silica refers to a chain of silica fine particles continuously formed by a chemical bond such as a siloxane bond, and has a linearly elongated shape, a two-dimensional or three-dimensionally curved shape. Can be mentioned. The chain silica is usually continuous until silica fine particles having an average particle diameter of 10 nm to 25 nm have an average length of 30 nm to 200 nm.
本実施の形態では、シリカ粒子は、球状シリカ粒子20重量%~50重量%と、鎖状シリカ粒子50重量%~80重量%との混合物(但し、混合物中の球状シリカ粒子と鎖状シリカ粒子の合計は100重量%である)であることが好ましい。球状シリカゾルと鎖状シリカゾルの混合物を使用することにより、太陽電池パネルの強化ガラス面に成膜されたコーティング膜の強度が向上し、強化ガラス表面との接着性が増大する傾向がある。 In the present embodiment, the silica particles are a mixture of 20% to 50% by weight of spherical silica particles and 50% to 80% by weight of chain silica particles (provided that the spherical silica particles and chain silica particles in the mixture are mixed. Is preferably 100% by weight). By using a mixture of spherical silica sol and chain silica sol, the strength of the coating film formed on the tempered glass surface of the solar cell panel tends to be improved, and the adhesiveness to the tempered glass surface tends to be increased.
本実施の形態が適用される太陽電池パネル用コーティング材は、上述した加水分解性オルガノシラン、アルカリ金属ケイ酸塩、平均粒子径1nm~100nmのシリカ粒子を水中に含有する水分散体であって、各成分を、前記水分散体中に、加水分解性オルガノシラン100重量部に対し、アルカリ金属ケイ酸塩5重量部~30重量部、シリカ粒子1,000重量部~3,000重量部の範囲で含有している。 The coating material for a solar cell panel to which the present embodiment is applied is an aqueous dispersion containing the above-mentioned hydrolyzable organosilane, alkali metal silicate, and silica particles having an average particle diameter of 1 nm to 100 nm in water. In the aqueous dispersion, 5 to 30 parts by weight of alkali metal silicate and 1,000 to 3,000 parts by weight of silica particles are added to 100 parts by weight of hydrolyzable organosilane. It is contained in the range.
ここで、上記の各成分を含有する水分散体中に使用する水としては、特に制限なく、例えば水道水を使用できる。また、脱イオン水、純水、超純水を使用してもよい。また、金属材料等の腐食のおそれがある場合は脱塩水を使用し、不純物の混入が望ましくない場合は、純水、超純水を使用する。本実施の形態では、純水を使用することが好ましい。
本実施の形態では、水分散体としての太陽電池パネル用コーティング材の加水分解性アルコキシシランの濃度は、通常、0.03重量%~5重量%の範囲である。また、太陽電池パネル用コーティング材の固形分の濃度は、通常、0.5重量%~20重量%であり、好ましくは1重量%~10重量%の範囲である。
Here, the water used in the aqueous dispersion containing each of the above components is not particularly limited, and for example, tap water can be used. Moreover, deionized water, pure water, and ultrapure water may be used. If there is a risk of corrosion of metal materials, demineralized water is used, and if impurities are not desirable, pure water or ultrapure water is used. In this embodiment, it is preferable to use pure water.
In the present embodiment, the concentration of hydrolyzable alkoxysilane in the coating material for solar cell panels as an aqueous dispersion is usually in the range of 0.03% by weight to 5% by weight. The solid content of the coating material for a solar cell panel is usually 0.5% by weight to 20% by weight, preferably 1% by weight to 10% by weight.
(太陽電池パネル用コーティング材の調製方法)
本実施の形態が適用される太陽電池パネル用コーティング材の調製方法は、特に限定されない。例えば、所定の容器中に、上述した加水分解性オルガノシラン、アルカリ金属ケイ酸塩、平均粒子径1nm~100nmのシリカ粒子を、例えば純水に添加し、撹拌混合により調製する方法(一括調製方法);加水分解性オルガノシランの水溶液とアルカリ金属ケイ酸塩の水溶液とを、それぞれ別々に調製し、これらを平均粒子径1nm~100nmのシリカ粒子及び純水と一緒に撹拌混合により調製する方法(分割調製方法)が挙げられる。
(Preparation method of coating material for solar cell panel)
The method for preparing the coating material for a solar cell panel to which this embodiment is applied is not particularly limited. For example, a method in which the above-mentioned hydrolyzable organosilane, alkali metal silicate, and silica particles having an average particle diameter of 1 nm to 100 nm are added to pure water, for example, and prepared by stirring and mixing in a predetermined container (collective preparation method). ); A method in which an aqueous solution of hydrolyzable organosilane and an aqueous solution of alkali metal silicate are prepared separately, and these are prepared by stirring and mixing with silica particles having an average particle diameter of 1 nm to 100 nm and pure water (). Divided preparation method).
上述した分割混合方法の場合、加水分解性オルガノシランの水溶液の調製は、所定量の有機溶媒、酸性触媒又は塩基性触媒の水溶液、加水分解性オルガノシランを添加し、撹拌して調製することが好ましい。有機溶媒は、予め水で希釈して添加する。酸性触媒又は塩基性触媒の水溶液は、濃度1mol/リットル~3mol/リットル程度の水溶液に調製することが好ましい。また、加水分解性オルガノシランも有機溶媒で希釈することが好ましい。かかる水溶液中の加水分解性オルガノシランの濃度は、通常、0.2重量%~10重量%の範囲であり、好ましくは、0.5重量%~5重量%の範囲である。
また、アルカリ金属ケイ酸塩の水溶液中に含まれるアルカリ金属ケイ酸塩の濃度は、通常、0.05重量%~1重量%の範囲であり、好ましくは0.1重量%~0.5重量%の範囲である。
In the case of the above-mentioned divided mixing method, the aqueous solution of hydrolyzable organosilane can be prepared by adding a predetermined amount of an organic solvent, an aqueous solution of an acidic catalyst or a basic catalyst, and hydrolyzable organosilane, and stirring the mixture. preferable. The organic solvent is added by diluting it with water in advance. The aqueous solution of the acidic catalyst or the basic catalyst is preferably prepared as an aqueous solution having a concentration of about 1 mol / liter to 3 mol / liter. The hydrolyzable organosilane is also preferably diluted with an organic solvent. The concentration of hydrolyzable organosilane in such an aqueous solution is usually in the range of 0.2% by weight to 10% by weight, preferably in the range of 0.5% by weight to 5% by weight.
The concentration of the alkali metal silicate contained in the aqueous solution of the alkali metal silicate is usually in the range of 0.05% by weight to 1% by weight, preferably 0.1% by weight to 0.5% by weight. It is in the range of%.
続いて、他の容器に前述した加水分解性オルガノシランの水溶液とアルカリ金属ケイ酸塩の水溶液を混合し、さらに、オルガノシリカゾルを添加し、純水を加えて太陽電池パネル用コーティング材を調製する。ここで、シリカ粒子は、前述したように、平均粒子径1nm~100nmの球状シリカゾルと、平均長さ30nm~200nmの鎖状シリカゾルとを添加することが好ましい。球状シリカゾルと鎖状シリカゾルを添加する方法は、それぞれ個別に添加する、または、予めこれらを混合する、分割して添加する等いずれの方法を適宜選択する。 Subsequently, the aqueous solution of the above-mentioned hydrolyzable organosilane and the aqueous solution of the alkali metal silicate are mixed in another container, the organosilica sol is further added, and pure water is added to prepare a coating material for a solar cell panel. .. Here, as the silica particles, as described above, it is preferable to add a spherical silica sol having an average particle diameter of 1 nm to 100 nm and a chain silica sol having an average length of 30 nm to 200 nm. As a method for adding the spherical silica sol and the chain silica sol, either a method of adding them individually, a method of mixing them in advance, or a method of adding them in portions is appropriately selected.
前述した操作により調製した太陽電池パネル用コーティング材は、太陽電池パネルの強化ガラス面に塗工され、コーティング層が成膜される。塗工方法は特に限定されず、公知の一般的な方法が挙げられる。具体的には、例えば、ハケ塗り、スクリーン印刷法、スプレーコート、スピン塗布法、ディップコート等が挙げられる。
コーティング層の厚さは適宜選択され、特に限定されず、通常、厚さ50nm~100nmの範囲である。
The coating material for a solar cell panel prepared by the above-mentioned operation is applied to the tempered glass surface of the solar cell panel to form a coating layer. The coating method is not particularly limited, and a known general method can be mentioned. Specific examples thereof include brush coating, screen printing method, spray coating, spin coating method, dip coating and the like.
The thickness of the coating layer is appropriately selected and is not particularly limited, and is usually in the range of 50 nm to 100 nm.
太陽電池パネルの強化ガラス面に成膜されたコーティング層は、反射防止膜として機能する。通常、空気と強化ガラスとの屈折率の差が大きいと、反射光が強くなるところ、太陽電池パネルの強化ガラス面にコーティング層を成膜することにより、太陽光の反射が抑制される。この場合、コーティング層は空気と強化ガラスの中間の屈折率であるため、コーティング層の表面から入射する光は、空気→コーティング層→強化ガラスへと入射し、太陽電池セルに到達する透過光が増大する。その結果、太陽電池パネルの発電量が増大することが期待される。 The coating layer formed on the tempered glass surface of the solar cell panel functions as an antireflection film. Normally, when the difference in refractive index between air and tempered glass is large, the reflected light becomes strong, but the reflection of sunlight is suppressed by forming a coating layer on the tempered glass surface of the solar cell panel. In this case, since the coating layer has a refractive index intermediate between that of air and tempered glass, the light incident from the surface of the coating layer enters the air → the coating layer → the tempered glass, and the transmitted light that reaches the solar cell is emitted. Increase. As a result, it is expected that the amount of power generated by the solar cell panel will increase.
以下に、実施例に基づき本実施の形態をさらに詳細に説明する。尚、本実施の形態は以下の実施例に限定されない。 Hereinafter, the present embodiment will be described in more detail based on the examples. The present embodiment is not limited to the following examples.
(太陽電池パネル用コーティング材の調製)
(1)テトラエトキシシラン水溶液
第1の容器に、エチルアルコール(和光純薬工業株式会社製)、塩酸水溶液(濃度2モル/L)、テトラエトキシシラン(東京化成工業株式会社製)を添加し、純水を入れて撹拌しテトラエトキシシラン水溶液を調製した。調製したテトラエトキシシラン水溶液中のテトラエトキシシランの濃度は1.09重量%である。
テトラエトキシシラン水溶液中の各成分の割合は、テトラエトキシシラン100重量部と、これに対しエチルアルコール816重量部、塩酸水溶液(濃度2モル/L)11重量部である。
(2)ケイ酸ナトリウム水溶液
第2の容器に、ホウ酸(和光純薬工業株式会社製)、ケイ酸ナトリウム(水ガラス:関東化学株式会社製)、水酸化マグネシウム(関東化学株式会社製)を添加し、純水を入れて撹拌しケイ酸ナトリウム水溶液を調製した。調製したケイ酸ナトリウム水溶液中のケイ酸ナトリウムの濃度は0.28重量%である。
ケイ酸ナトリウム水溶液中の各成分の割合は、ケイ酸ナトリウム(水ガラス)100重量部と、これに対してホウ酸584重量部、水酸化マグネシウム13重量部である。
(Preparation of coating material for solar cell panels)
(1) Tetraethoxysilane aqueous solution To the first container, ethyl alcohol (manufactured by Wako Pure Chemical Industries, Ltd.), hydrochloric acid aqueous solution (concentration 2 mol / L), and tetraethoxysilane (manufactured by Tokyo Kasei Kogyo Co., Ltd.) were added. Pure water was added and stirred to prepare an aqueous tetraethoxysilane solution. The concentration of tetraethoxysilane in the prepared tetraethoxysilane aqueous solution is 1.09% by weight.
The ratio of each component in the tetraethoxysilane aqueous solution is 100 parts by weight of tetraethoxysilane, 816 parts by weight of ethyl alcohol, and 11 parts by weight of the hydrochloric acid aqueous solution (concentration 2 mol / L).
(2) Sodium silicate aqueous solution In the second container, add boric acid (manufactured by Wako Pure Chemical Industries, Ltd.), sodium silicate (water glass: manufactured by Kanto Chemical Co., Ltd.), magnesium hydroxide (manufactured by Kanto Chemical Co., Ltd.). It was added, pure water was added, and the mixture was stirred to prepare an aqueous sodium silicate solution. The concentration of sodium silicate in the prepared aqueous sodium silicate solution is 0.28% by weight.
The ratio of each component in the sodium silicate aqueous solution is 100 parts by weight of sodium silicate (water glass), 584 parts by weight of boric acid, and 13 parts by weight of magnesium hydroxide.
次に第3の容器に、前述したテトラエトキシシラン水溶液とケイ酸ナトリウム水溶液%とを入れ、さらに、球状シリカ粒子を含むメタノールシリカゾル(固形分30重量%)(日産化学工業株式会社製)、鎖状シリカ粒子を含む鎖状メタノールシリカゾル(固形分20重量%)(日産化学工業株式会社製MA-ST-UP)を添加し、純水を加えて撹拌し、固形分濃度1.53重量%の水分散体の太陽電池パネル用コーティング材を調製した。
上述した水分散体中の各成分の割合は、テトラエトキシシラン100重量部と、これに対しケイ酸ナトリウム15.6重量部、球状シリカ粒子(但し、メタノールシリカゾル(固形分30重量%)に含まれる)577重量部、鎖状シリカ粒子(但し、鎖状メタノールシリカゾル(但し、MA-ST-UP(固形分20重量%)に含まれる)1064重量部である。
Next, in the third container, the above-mentioned tetraethoxysilane aqueous solution and sodium silicate aqueous solution% are placed, and a methanol silica sol (solid content 30% by weight) containing spherical silica particles (manufactured by Nissan Chemical Industry Co., Ltd.) and chains. Chain methanol silica sol (solid content 20% by weight) (MA-ST-UP manufactured by Nissan Chemical Industry Co., Ltd.) containing microscopic silica particles was added, pure water was added and stirred, and the solid content concentration was 1.53% by weight. A coating material for a solar cell panel of an aqueous dispersion was prepared.
The ratio of each component in the above-mentioned aqueous dispersion is 100 parts by weight of tetraethoxysilane, 15.6 parts by weight of sodium silicate, and spherical silica particles (however, methanol silica sol (solid content: 30% by weight) contains it. 577 parts by weight, and 1064 parts by weight of chain silica particles (provided that the chain methanol silica sol (provided to be contained in MA-ST-UP (solid content 20% by weight)).
(可視光線透過率の測定)
ガラス板(厚さ3.2mm)の表面に前述の太陽電池パネル用コーティング材を塗布し、乾燥して、厚さ50nm~100nmのコーティング層を形成した。
次に、市販の可視光線透過率測定計を用いて、前述した表面にコーティング層を形成したガラス板の可視光領域(波長350nm~800nm)の透過率を測定した。尚、比較のため、コーティング層を形成しないガラス板についても同じ条件で透過率を測定した。結果を表1に示す。
(Measurement of visible light transmittance)
The above-mentioned coating material for a solar cell panel was applied to the surface of a glass plate (thickness 3.2 mm) and dried to form a coating layer having a thickness of 50 nm to 100 nm.
Next, using a commercially available visible light transmittance measuring meter, the transmittance in the visible light region (wavelength 350 nm to 800 nm) of the glass plate having the coating layer formed on the surface was measured. For comparison, the transmittance of the glass plate on which the coating layer was not formed was measured under the same conditions. The results are shown in Table 1.
表1の結果から、可視光領域(波長350nm~800nm)における透過率は、前述した太陽電池パネル用コーティング材を塗布してコーティング層が形成されたガラス板が、コーティング層が無いガラス板と比較して、増大することが分かる。
これにより、太陽電池パネル用コーティング材を塗布してコーティング層が形成されたガラス板が採光側に設けられた太陽電池パネルは、太陽電池セルに到達する太陽光が増大し、発電量が増大することが期待される。
From the results in Table 1, the transmittance in the visible light region (wavelength 350 nm to 800 nm) is that the glass plate on which the coating material for the solar cell panel is applied and the coating layer is formed is compared with the glass plate without the coating layer. And it turns out that it increases.
As a result, in the solar cell panel in which the glass plate on which the coating material for the solar cell panel is applied and the coating layer is formed is provided on the light collection side, the sunlight reaching the solar cell increases and the amount of power generation increases. It is expected.
Claims (2)
前記水分散体中に、前記4官能加水分解性アルコキシシラン100重量部に対し、前記アルカリ金属ケイ酸塩5重量部~30重量部、前記シリカ粒子1,000重量部~3,000重量部を含有し、
前記シリカ粒子は、平均粒子径1nm~100nmの球状シリカ粒子20重量%~40重量%と、平均長さ30nm~200nmの鎖状シリカ粒子60重量%~80重量%との混合物(但し、混合物中の球状シリカ粒子と鎖状シリカ粒子の合計は100重量%である)であることを特徴とする太陽電池パネル用コーティング材。 An aqueous dispersion containing tetrafunctional hydrolyzable alkoxysilane, alkali metal silicate, and silica particles having an average particle diameter of 1 nm to 100 nm in water.
In the aqueous dispersion, 5 to 30 parts by weight of the alkali metal silicate and 1,000 to 3,000 parts by weight of the silica particles are added to 100 parts by weight of the tetrafunctional hydrolyzable alkoxysilane. Contains,
The silica particles are a mixture of 20% to 40% by weight of spherical silica particles having an average particle diameter of 1 nm to 100 nm and 60% to 80% by weight of chain silica particles having an average length of 30 nm to 200 nm (however, in the mixture). The total of the spherical silica particles and the chain silica particles is 100% by weight), which is a coating material for a solar cell panel.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022068403A JP7465001B2 (en) | 2017-12-19 | 2022-04-18 | Coating materials for solar panels |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017242415A JP2019110219A (en) | 2017-12-19 | 2017-12-19 | Coating material for solar cell panel |
JP2022068403A JP7465001B2 (en) | 2017-12-19 | 2022-04-18 | Coating materials for solar panels |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017242415A Division JP2019110219A (en) | 2017-12-19 | 2017-12-19 | Coating material for solar cell panel |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2022106797A true JP2022106797A (en) | 2022-07-20 |
JP7465001B2 JP7465001B2 (en) | 2024-04-10 |
Family
ID=67180132
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017242415A Pending JP2019110219A (en) | 2017-12-19 | 2017-12-19 | Coating material for solar cell panel |
JP2022068403A Active JP7465001B2 (en) | 2017-12-19 | 2022-04-18 | Coating materials for solar panels |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017242415A Pending JP2019110219A (en) | 2017-12-19 | 2017-12-19 | Coating material for solar cell panel |
Country Status (1)
Country | Link |
---|---|
JP (2) | JP2019110219A (en) |
Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001042156A1 (en) * | 1999-12-13 | 2001-06-14 | Nippon Sheet Glass Co., Ltd. | Low-reflection film and solar cell panel |
JP2001337211A (en) * | 2000-05-30 | 2001-12-07 | Central Glass Co Ltd | Antifog mirror and method for manufacturing the same |
JP2005010470A (en) * | 2003-06-19 | 2005-01-13 | Asahi Kasei Corp | Coating composition for antireflection film and antireflection film |
JP2011009468A (en) * | 2009-06-25 | 2011-01-13 | Central Glass Co Ltd | Cover glass for solar cell panel, covered with low-reflective film, and method of manufacturing the same |
KR101081746B1 (en) * | 2011-07-22 | 2011-11-09 | 주식회사 네패스 | Anti-reflective coating composition, anti-reflective coating layer and substrate comprising the anti-reflective coating layer |
US20140023854A1 (en) * | 2012-07-23 | 2014-01-23 | Fih (Hong Kong) Limited | Silicon dioxide sol, surface treatment method for metal substrate using the silicon dioxide sol and article manufactured by the same |
JP2014105330A (en) * | 2012-11-30 | 2014-06-09 | Toyo Ink Sc Holdings Co Ltd | Resin composition for joining laminate sheets |
JP2014152180A (en) * | 2013-02-04 | 2014-08-25 | Asaka Riken:Kk | Coating liquid and antireflection film |
JP2014227528A (en) * | 2013-05-27 | 2014-12-08 | 東洋インキScホールディングス株式会社 | Adhesive composition for solar cell protective sheet |
JP2015156462A (en) * | 2014-01-20 | 2015-08-27 | 東洋インキScホールディングス株式会社 | Back surface protective sheet for solar cell, method for manufacturing protective sheet, and solar cell module |
JP2016115927A (en) * | 2014-12-10 | 2016-06-23 | 旭化成株式会社 | Coating film for solar cell |
WO2017150393A1 (en) * | 2016-02-29 | 2017-09-08 | 富士フイルム株式会社 | Aqueous coating composition, anti-reflection film, laminate, method for producing laminate, and solar cell module |
WO2017150132A1 (en) * | 2016-02-29 | 2017-09-08 | 富士フイルム株式会社 | Manufacturing method for laminate, glass with anti-reflection film and solar cell module |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012173428A (en) | 2011-02-18 | 2012-09-10 | Asahi Kasei E-Materials Corp | Antireflective coating composition |
JP2012256640A (en) * | 2011-06-07 | 2012-12-27 | Asahi Kasei E-Materials Corp | Solar cell module and coating method therefor |
JP2013004874A (en) * | 2011-06-20 | 2013-01-07 | Asahi Kasei E-Materials Corp | Solar cell module and coating method thereof |
JP2015053368A (en) * | 2013-09-06 | 2015-03-19 | 日立化成株式会社 | Wavelength conversion material for solar batteries, and solar battery module |
-
2017
- 2017-12-19 JP JP2017242415A patent/JP2019110219A/en active Pending
-
2022
- 2022-04-18 JP JP2022068403A patent/JP7465001B2/en active Active
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001042156A1 (en) * | 1999-12-13 | 2001-06-14 | Nippon Sheet Glass Co., Ltd. | Low-reflection film and solar cell panel |
JP2001337211A (en) * | 2000-05-30 | 2001-12-07 | Central Glass Co Ltd | Antifog mirror and method for manufacturing the same |
JP2005010470A (en) * | 2003-06-19 | 2005-01-13 | Asahi Kasei Corp | Coating composition for antireflection film and antireflection film |
JP2011009468A (en) * | 2009-06-25 | 2011-01-13 | Central Glass Co Ltd | Cover glass for solar cell panel, covered with low-reflective film, and method of manufacturing the same |
KR101081746B1 (en) * | 2011-07-22 | 2011-11-09 | 주식회사 네패스 | Anti-reflective coating composition, anti-reflective coating layer and substrate comprising the anti-reflective coating layer |
US20140023854A1 (en) * | 2012-07-23 | 2014-01-23 | Fih (Hong Kong) Limited | Silicon dioxide sol, surface treatment method for metal substrate using the silicon dioxide sol and article manufactured by the same |
JP2014105330A (en) * | 2012-11-30 | 2014-06-09 | Toyo Ink Sc Holdings Co Ltd | Resin composition for joining laminate sheets |
JP2014152180A (en) * | 2013-02-04 | 2014-08-25 | Asaka Riken:Kk | Coating liquid and antireflection film |
JP2014227528A (en) * | 2013-05-27 | 2014-12-08 | 東洋インキScホールディングス株式会社 | Adhesive composition for solar cell protective sheet |
JP2015156462A (en) * | 2014-01-20 | 2015-08-27 | 東洋インキScホールディングス株式会社 | Back surface protective sheet for solar cell, method for manufacturing protective sheet, and solar cell module |
JP2016115927A (en) * | 2014-12-10 | 2016-06-23 | 旭化成株式会社 | Coating film for solar cell |
WO2017150393A1 (en) * | 2016-02-29 | 2017-09-08 | 富士フイルム株式会社 | Aqueous coating composition, anti-reflection film, laminate, method for producing laminate, and solar cell module |
WO2017150132A1 (en) * | 2016-02-29 | 2017-09-08 | 富士フイルム株式会社 | Manufacturing method for laminate, glass with anti-reflection film and solar cell module |
Also Published As
Publication number | Publication date |
---|---|
JP2019110219A (en) | 2019-07-04 |
JP7465001B2 (en) | 2024-04-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Zhang et al. | A one-pot sol–gel process to prepare a superhydrophobic and environment-resistant thin film from ORMOSIL nanoparticles | |
JP5378771B2 (en) | Base material with antireflection film and coating liquid for forming antireflection film | |
TWI726127B (en) | Photocatalyst laminate | |
JP5142617B2 (en) | Surface treatment method for metal oxide particles, dispersion containing the surface treated metal oxide particles, coating liquid for forming a transparent film, and substrate with transparent film | |
WO2007097284A1 (en) | Uniformly dispersed photocatalyst coating liquid, method for producing same, and photocatalytically active composite material obtained by using same | |
JP2019064913A (en) | Glass article | |
JP2009035594A (en) | Base material with transparent coating, and coating material for forming transparent coating | |
WO2015186360A1 (en) | Transparent article with antifog film | |
KR101774067B1 (en) | Process for production of silica-alumina sol, silica-alumina sol, coating agent for formation of transparent coating film which comprises the sol, and substrate having transparent coating film attached thereto | |
WO2018020989A1 (en) | Glass plate with low reflection coating, method for producing base with low reflection coating, and coating liquid for forming low reflection coating of base with low reflection coating | |
JP6329959B2 (en) | Superhydrophilic antireflection coating composition containing a siloxane compound, superhydrophilic antireflection film using the same, and method for producing the same | |
WO2010071010A1 (en) | Chain-shaped silica-based hollow fine particles and process for producing same, coating fluid for transparent coating film formation containing the fine particles, and substrate with transparent coating film | |
JP6112753B2 (en) | Coating liquid for forming transparent film, substrate with transparent film, and method for producing hydrophobic metal oxide particles | |
WO2018042803A1 (en) | Coating composition and coated article | |
KR20170141703A (en) | Coating composition and optical member | |
JP2018123043A (en) | Method for producing silica-based particle dispersion, silica-based particle dispersion, coating liquid for forming transparent coating film, and substrate with transparent coating film | |
JP6771388B2 (en) | Method for manufacturing a glass plate with a low reflection coating and a glass plate with a low reflection coating | |
WO2019065788A1 (en) | Liquid composition for forming infrared-shielding film, method for producing infrared-shielding film therefrom, and infrared-shielding film | |
JP2004204175A (en) | Coating containing colored pigment particle and substrate with visible light-shading film | |
WO2016121404A1 (en) | Glass plate provided with low-reflection coating, method for manufacturing substrate provided with low-reflection coating, and coating liquid for forming low-reflection coating for substrate provided with low-reflection coating | |
CN104356937A (en) | Production method of ceramic coating for interior of subway car compartment | |
JP7465001B2 (en) | Coating materials for solar panels | |
JP5680372B2 (en) | Substrate with transparent film and coating liquid for forming transparent film | |
JP2014086526A (en) | Light-emitting diode | |
JP5626788B2 (en) | Sealant paint and use thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20220418 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230516 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230713 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20231003 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20231129 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20240312 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20240322 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7465001 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |