JP2020532649A - 被覆金属基材 - Google Patents
被覆金属基材 Download PDFInfo
- Publication number
- JP2020532649A JP2020532649A JP2020512541A JP2020512541A JP2020532649A JP 2020532649 A JP2020532649 A JP 2020532649A JP 2020512541 A JP2020512541 A JP 2020512541A JP 2020512541 A JP2020512541 A JP 2020512541A JP 2020532649 A JP2020532649 A JP 2020532649A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- base material
- metal substrate
- coated metal
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 69
- 239000002184 metal Substances 0.000 title claims abstract description 69
- 239000000758 substrate Substances 0.000 title claims abstract description 46
- 238000000576 coating method Methods 0.000 claims abstract description 86
- 239000011248 coating agent Substances 0.000 claims abstract description 79
- 239000011701 zinc Substances 0.000 claims abstract description 28
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 27
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 17
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000000463 material Substances 0.000 claims description 31
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 28
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 26
- 229910000831 Steel Inorganic materials 0.000 claims description 22
- 239000010959 steel Substances 0.000 claims description 22
- 229910052742 iron Inorganic materials 0.000 claims description 15
- 238000001771 vacuum deposition Methods 0.000 claims description 15
- 229910052759 nickel Inorganic materials 0.000 claims description 14
- 239000011651 chromium Substances 0.000 claims description 13
- 238000000151 deposition Methods 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 13
- 239000010936 titanium Substances 0.000 claims description 13
- 229910052719 titanium Inorganic materials 0.000 claims description 11
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 10
- 229910052804 chromium Inorganic materials 0.000 claims description 10
- 238000001704 evaporation Methods 0.000 claims description 10
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 8
- 238000001540 jet deposition Methods 0.000 claims description 7
- 229910052749 magnesium Inorganic materials 0.000 claims description 7
- 239000011777 magnesium Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 5
- 238000000313 electron-beam-induced deposition Methods 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 238000007740 vapor deposition Methods 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 230000008020 evaporation Effects 0.000 claims description 4
- 238000010298 pulverizing process Methods 0.000 claims description 4
- 238000004381 surface treatment Methods 0.000 claims description 4
- 238000004070 electrodeposition Methods 0.000 claims description 3
- 238000005246 galvanizing Methods 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 238000005422 blasting Methods 0.000 claims description 2
- 239000010941 cobalt Substances 0.000 claims description 2
- 229910017052 cobalt Inorganic materials 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 2
- 238000005328 electron beam physical vapour deposition Methods 0.000 claims description 2
- 238000005530 etching Methods 0.000 claims description 2
- 238000000227 grinding Methods 0.000 claims description 2
- 238000005339 levitation Methods 0.000 claims description 2
- 238000005554 pickling Methods 0.000 claims description 2
- 238000005498 polishing Methods 0.000 claims description 2
- 238000005488 sandblasting Methods 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 230000000694 effects Effects 0.000 description 22
- 230000007797 corrosion Effects 0.000 description 17
- 238000005260 corrosion Methods 0.000 description 17
- 239000010410 layer Substances 0.000 description 13
- 230000004888 barrier function Effects 0.000 description 9
- 239000011247 coating layer Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910001338 liquidmetal Inorganic materials 0.000 description 3
- 229910001092 metal group alloy Inorganic materials 0.000 description 3
- 238000009864 tensile test Methods 0.000 description 3
- 238000003466 welding Methods 0.000 description 3
- 229910000619 316 stainless steel Inorganic materials 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000036316 preload Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
- C23C2/06—Zinc or cadmium or alloys based thereon
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- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
- B32B15/012—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of aluminium or an aluminium alloy
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- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
- B32B15/013—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium
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- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
- B32B15/017—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of aluminium or an aluminium alloy, another layer being formed of an alloy based on a non ferrous metal other than aluminium
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- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/043—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of metal
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C—CHEMISTRY; METALLURGY
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- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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Abstract
Description
−「wt.%」は重量パーセントを意味する。
A.金属基材を設ける工程、
B.任意に金属基材の表面処理を行う工程、
C.アルミニウムからなる第1の被覆を堆積させる工程であって、かかる第1の被覆の厚さが1.0〜4.5μmである、工程並びに
D.亜鉛をベースとする第2の被覆を堆積させる工程であって、かかる第2の被覆の厚さが1.5〜9.0μmであり、及び第2の被覆に対する第1の被覆の厚さ比が0.2〜1.2である、工程を含む。
A.任意に、マグネトロンカソード粉砕装置を含む中間部分、
B.電子ビーム蒸着装置を含む第1の部分及び
C.ジェット蒸着装置を含む第2の部分、
を備える。
LME試験
LME感度を測定するために、スポット溶接条件に可能な限り近似している条件で高温引張試験を実施した。
電気化学的挙動試験
試験体1、試験体3及び試験体4を作成し、電気化学電位試験を行った。
Claims (19)
- アルミニウムからなる少なくとも第1の被覆を備える被覆金属基材であって、かかる第1の被覆は厚さが1.0〜4.5μmであり、及び亜鉛をベースとする第2の被覆によって直接上面が覆われており、かかる第2の被覆の厚さは1.5〜9.0μmであり、並びに第2の被覆に対する第1の被覆の厚さ比は0.2〜1.2である、被覆金属基材。
- 第2の被覆が、Si及びMgから選択される少なくとも1つの元素を含む、請求項1に記載の被覆金属基材。
- 第2の被覆が、0.5重量%未満のマグネシウムを含む、請求項1又は2に記載の被覆金属基材。
- 第2の被覆が、次のマグネシウム、アルミニウム、銅及びシリコンのうちの少なくとも1つの元素を含まない、請求項1〜3のいずれか一項に記載の被覆金属基材。
- 第2の被覆が亜鉛からなる、請求項1〜4のいずれか一項に記載の被覆金属基材。
- 第1の被覆の厚さが2〜4μmである、請求項1〜5のいずれか一項に記載の被覆金属基材。
- 第2の被覆の厚さが1.5〜8.5μmである、請求項1〜6のいずれか一項に記載の被覆金属基材。
- 第2の被覆に対する第1の被覆の厚さ比が、0.2〜0.8である、請求項1〜7のいずれか一項に記載の被覆金属基材。
- 金属基材と第1の被覆との間に中間層を設けており、かかる中間層が鉄、ニッケル、クロム及び任意にチタンを含む、請求項1〜8のいずれか一項に記載の被覆金属基材。
- 金属基材が、アルミニウム基材、鋼基材、ステンレス鋼基材、銅基材、鉄基材、銅合金基材、チタン基材、コバルト基材又はニッケル基材の中から選択される、請求項1〜9のいずれか一項に記載の被覆金属基材。
- 請求項1〜10のいずれか一項に記載の被覆金属基材の製造方法であって、以下の工程、
A.金属基材を設ける工程、
B.任意に前記金属基材の表面処理を行う工程、
C.アルミニウムからなる第1の被覆を堆積させる工程であって、かかる第1の被覆の厚さが1.0〜4.5μmである、工程並びに
D.亜鉛をベースとする第2の被覆を堆積させる工程であって、かかる第2の被覆の厚さが1.5〜9.0μmであり、及び前記第2の被覆に対する前記第1の被覆の厚さ比が0.2〜1.2である、工程
を含む、方法。 - 工程B)が実行されるとき、表面処理は、ショットブラスト、酸洗、エッチング、研磨、サンドブラスト、研削、並びに鉄、ニッケル、クロム及び任意にチタンを含む中間層の堆積から選択される、請求項11に記載の方法。
- 工程C)及び工程D)において、第1及び第2の被覆を堆積させる工程は、互いに独立して、溶融めっき、電着法又は真空蒸着により実行される、請求項11又は12に記載の方法。
- 工程C)及び工程D)において、真空蒸着が実行されるとき、第1及び第2の被覆は、互いに独立して、マグネトロンカソード粉砕法、ジェット蒸着法、電磁浮上蒸着法又は電子ビーム物理蒸着法により蒸着される、請求項13に記載の方法。
- 自動車両の部品の製造のための、請求項1〜10のいずれか一項に記載の、又は請求項11〜14に記載の方法によって得られる被覆金属基材の使用。
- 請求項1〜10のいずれか一項に記載の被覆金属基材を得るための、請求項11〜14のいずれか一項に記載の方法を用いる、走行中の金属基材上に被覆を連続真空蒸着するための設備であって、以下の順序で
A.任意に、マグネトロンカソード粉砕装置を含む中間部分、
B.電子ビーム蒸着装置を含む第1の部分及び
C.ジェット蒸着装置を含む第2の部分、
を備える、設備。 - 中間部分を設けている場合、マグネトロンカソード粉砕装置が、鉄、クロム、ニッケル及び任意にチタンからなる1つのターゲットを含む真空蒸着チャンバ、並びに鉄、ニッケル、クロム及び任意にチタンを含む中間層を金属基材上に蒸着させるプラズマ源を備える、請求項16に記載の設備。
- 第1の部分において、電子ビーム蒸着装置が、アルミニウムからなる金属を含む蒸発るつぼを備える真空蒸着チャンバ、加熱装置及び電子銃を備える、請求項16又は17に記載の設備。
- 第2の部分において、ジェット蒸着装置が、少なくとも蒸発るつぼを含む真空蒸着チャンバ、蒸気ジェットコーター及び亜鉛をベースとする蒸気を前記蒸気ジェットコーターに供給するのに適した、少なくとも1つの蒸発るつぼを備える、請求項16〜18のいずれか一項に記載の設備。
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