JP2020007173A - Power generation system using hydrogen and hydrogen generator - Google Patents
Power generation system using hydrogen and hydrogen generator Download PDFInfo
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- 239000001257 hydrogen Substances 0.000 title claims abstract description 212
- 229910052739 hydrogen Inorganic materials 0.000 title claims abstract description 212
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 title claims abstract description 197
- 238000010248 power generation Methods 0.000 title claims abstract description 81
- 239000007864 aqueous solution Substances 0.000 claims abstract description 230
- 239000002994 raw material Substances 0.000 claims abstract description 160
- 230000007246 mechanism Effects 0.000 claims abstract description 94
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims abstract description 27
- 238000006243 chemical reaction Methods 0.000 claims abstract description 27
- 150000002431 hydrogen Chemical class 0.000 claims abstract description 17
- 239000011777 magnesium Substances 0.000 claims abstract description 12
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 80
- 239000007789 gas Substances 0.000 claims description 78
- 238000005192 partition Methods 0.000 claims description 47
- 239000012535 impurity Substances 0.000 claims description 35
- 238000000746 purification Methods 0.000 claims description 35
- 239000006227 byproduct Substances 0.000 claims description 17
- 230000018044 dehydration Effects 0.000 claims description 16
- 238000006297 dehydration reaction Methods 0.000 claims description 16
- 238000001035 drying Methods 0.000 claims description 10
- 238000009530 blood pressure measurement Methods 0.000 claims description 7
- 238000005259 measurement Methods 0.000 claims description 5
- 239000002244 precipitate Substances 0.000 claims description 2
- 239000000243 solution Substances 0.000 abstract description 3
- 229910012375 magnesium hydride Inorganic materials 0.000 description 15
- 238000011144 upstream manufacturing Methods 0.000 description 12
- 238000003756 stirring Methods 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 239000000446 fuel Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000003929 acidic solution Substances 0.000 description 6
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 5
- 239000000347 magnesium hydroxide Substances 0.000 description 5
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 5
- 239000002808 molecular sieve Substances 0.000 description 5
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 5
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 4
- 238000011049 filling Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000001307 helium Substances 0.000 description 3
- 229910052734 helium Inorganic materials 0.000 description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000000638 solvent extraction Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 229910001629 magnesium chloride Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011859 microparticle Substances 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- -1 ammonium ions Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/02—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen
- C01B3/06—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by reaction of inorganic compounds containing electro-positively bound hydrogen, e.g. water, acids, bases, ammonia, with inorganic reducing agents
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/02—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen
- C01B3/06—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by reaction of inorganic compounds containing electro-positively bound hydrogen, e.g. water, acids, bases, ammonia, with inorganic reducing agents
- C01B3/08—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by reaction of inorganic compounds containing electro-positively bound hydrogen, e.g. water, acids, bases, ammonia, with inorganic reducing agents with metals
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
- C01B3/56—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by contacting with solids; Regeneration of used solids
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M8/00—Fuel cells; Manufacture thereof
- H01M8/04—Auxiliary arrangements, e.g. for control of pressure or for circulation of fluids
- H01M8/04298—Processes for controlling fuel cells or fuel cell systems
- H01M8/04313—Processes for controlling fuel cells or fuel cell systems characterised by the detection or assessment of variables; characterised by the detection or assessment of failure or abnormal function
- H01M8/0438—Pressure; Ambient pressure; Flow
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M8/00—Fuel cells; Manufacture thereof
- H01M8/04—Auxiliary arrangements, e.g. for control of pressure or for circulation of fluids
- H01M8/04298—Processes for controlling fuel cells or fuel cell systems
- H01M8/04694—Processes for controlling fuel cells or fuel cell systems characterised by variables to be controlled
- H01M8/04746—Pressure; Flow
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M8/00—Fuel cells; Manufacture thereof
- H01M8/06—Combination of fuel cells with means for production of reactants or for treatment of residues
- H01M8/0606—Combination of fuel cells with means for production of reactants or for treatment of residues with means for production of gaseous reactants
- H01M8/065—Combination of fuel cells with means for production of reactants or for treatment of residues with means for production of gaseous reactants by dissolution of metals or alloys; by dehydriding metallic substances
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/36—Hydrogen production from non-carbon containing sources, e.g. by water electrolysis
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/50—Fuel cells
Abstract
Description
本発明は水素を用いた発電システム、及び、水素発生装置に関する。 The present invention relates to a power generation system using hydrogen and a hydrogen generator.
特許文献１には、単位時間当たりの水素発生量が安定しないと、発生した水素を燃料電池に供給して発電するような場合、電力の出力が安定しなくなるという問題に対応して、水素化マグネシウムの加水分解反応が行われる反応容器を備え、該反応容器へ水又は酸性溶液を供給することによって、水素を発生させる水素発生装置において、反応容器の底部に、水素化マグネシウム装填用の高さが異なる複数の筒部が立設してあり、更に、最も高い筒部の上方から、該筒部に装填された水素化マグネシウムに水又は酸性溶液を滴下する滴下部を備えることを特徴とする水素発生装置が開示されている。 Patent Literature 1 addresses the problem that if the amount of hydrogen generated per unit time is not stable, and if the generated hydrogen is supplied to a fuel cell to generate power, the output of power becomes unstable, A hydrogen generating apparatus that includes a reaction vessel in which a hydrolysis reaction of magnesium is performed and supplies hydrogen or an acidic solution to the reaction vessel to generate hydrogen, wherein a height for loading magnesium hydride is provided at the bottom of the reaction vessel. A plurality of cylinders different from each other, and further comprising a dropping part for dropping water or an acidic solution onto the magnesium hydride loaded in the cylinder from above the highest cylinder. A hydrogen generator is disclosed.
そして、特許文献１では、高さが高い筒部に水又は酸性溶液が滴下されるため、最も高い筒部に装填された水素化マグネシウムから加水分解反応が開始され、水素を発生し、水又は酸性溶液の滴下が続くと、最も高い筒部から水又は酸性溶液が溢れて、次に高さが高い筒部へ水又は酸性溶液が供給され、水素を発生することで、単位時間当たりの水素発生量の変動を抑えて、水素を安定的に生成することが可能になることが説明されている。 Then, in Patent Document 1, since water or an acidic solution is dropped into a high cylinder, a hydrolysis reaction is started from magnesium hydride charged in the highest cylinder to generate hydrogen and generate water or water. When the acidic solution continues to be dropped, water or the acidic solution overflows from the highest cylinder, and water or the acidic solution is supplied to the next highest cylinder to generate hydrogen. It is described that it becomes possible to stably generate hydrogen while suppressing fluctuations in the generation amount.
ところで、例えば、水素化マグネシウムに水を滴下させ、加水分解反応で水素が発生すると、副生成物として水酸化マグネシウムが生成されることになる。 By the way, for example, when water is dropped into magnesium hydride and hydrogen is generated by a hydrolysis reaction, magnesium hydroxide is generated as a by-product.
このため、水素化マグネシウムが装填された筒部に水を滴下させると、充填された水素化マグネシウムの表面上には、水の滴下によって生成された水酸化マグネシウムの層が形成される。 Therefore, when water is dropped on the cylindrical portion loaded with magnesium hydride, a layer of magnesium hydroxide generated by the dropping of water is formed on the surface of the filled magnesium hydride.
そうすると、後続の水の滴下の際に、水素化マグネシウムの加水分解反応が阻害され、効率よく、水素を発生できないおそれがある。 Then, at the time of the subsequent dropping of water, the hydrolysis reaction of magnesium hydride may be inhibited, and hydrogen may not be generated efficiently.
本発明は、このような事情に鑑みてなされたものであり、水素の発生量の制御が行いやすく、効率よく水素を発生させることが可能な水素発生装置、及び、水素発生装置で発生した水素を用いた発電システムを提供することを目的とする。 The present invention has been made in view of such circumstances, and it is easy to control the amount of generated hydrogen, and a hydrogen generator capable of efficiently generating hydrogen, and hydrogen generated by the hydrogen generator. It is an object of the present invention to provide a power generation system using the same.
本発明は、上記目的を達成するために、以下の構成によって把握される。
（１）本発明の発電システムは、水素を用いた発電システムであって、前記発電システムは、発電装置と、前記発電装置に供給する前記水素を発生させる水素発生装置と、を備え、前記水素発生装置は、水溶液を貯蔵する水溶液貯蔵部と、前記水溶液との反応で前記水素の発生が可能な状態のマグネシウムを含む原料を貯蔵する原料貯蔵部と、前記原料貯蔵部から前記水溶液貯蔵部に向けて前記原料を供給する原料供給機構と、を備える。
The present invention is grasped by the following configurations in order to achieve the above object.
(1) A power generation system according to the present invention is a power generation system using hydrogen, the power generation system including: a power generation device; and a hydrogen generation device that generates the hydrogen supplied to the power generation device. The generator is an aqueous solution storage unit that stores an aqueous solution, a raw material storage unit that stores a raw material containing magnesium in a state in which the hydrogen can be generated by a reaction with the aqueous solution, and from the raw material storage unit to the aqueous solution storage unit. A raw material supply mechanism for supplying the raw material to the raw material.
（２）上記（１）の構成において、前記水溶液貯蔵部は、前記水溶液より上側となる前記水溶液の存在しない上部空間を備え、前記原料供給機構は、前記上部空間側から前記水溶液に向けて前記原料を供給するように設けられており、前記水素発生装置は、前記上部空間の圧力を測定する圧力測定装置と、前記圧力測定装置の圧力の測定結果に基づいて、前記原料供給機構を駆動させ、前記水溶液に向けて供給する前記原料の供給量を制御する制御部と、を備える。 (2) In the configuration of the above (1), the aqueous solution storage unit includes an upper space above the aqueous solution, in which the aqueous solution does not exist, and the raw material supply mechanism moves the aqueous solution from the upper space side toward the aqueous solution. It is provided so as to supply a raw material, the hydrogen generator is a pressure measuring device that measures the pressure in the upper space, and based on the pressure measurement result of the pressure measuring device, drives the raw material supply mechanism And a control unit for controlling a supply amount of the raw material supplied toward the aqueous solution.
（３）上記（２）の構成において、前記水溶液貯蔵部は、前記上部空間の下側となる前記水溶液の存在する下部空間と、前記下部空間内を上下に仕切る仕切部と、前記仕切部より下側に設けられ、前記水溶液を排水する排水口と、前記仕切部より上側に設けられ、前記水溶液を供給する給水口と、を備え、前記仕切部は、前記原料と前記水溶液との反応で生成した副生成物が前記仕切部より下側に沈殿可能に設けられた複数の貫通孔を備える。 (3) In the configuration of (2), the aqueous solution storage unit includes a lower space below the upper space where the aqueous solution exists, a partition unit that vertically partitions the lower space, and a partition unit. A drain port provided on the lower side for draining the aqueous solution, and a water supply port provided above the partition section to supply the aqueous solution are provided, and the partition section is configured to react with the raw material and the aqueous solution. A plurality of through-holes are provided so that generated by-products can settle below the partition.
（４）上記（３）の構成において、前記水素発生装置は、前記排水口からの前記水溶液の排水を制御する排水制御弁と、前記給水口からの前記水溶液の給水を制御する給水制御弁と、を備え、前記制御部は、前記水溶液に向けて供給する前記原料の供給量に基づいて、前記排水制御弁、及び、前記給水制御弁を制御する。 (4) In the configuration of (3), the hydrogen generator includes a drainage control valve that controls drainage of the aqueous solution from the drainage port, and a water supply control valve that controls water supply of the aqueous solution from the water supply port. The control unit controls the drainage control valve and the water supply control valve based on a supply amount of the raw material supplied toward the aqueous solution.
（５）上記（１）から（４）のいずれか１つの構成において、前記発電システムは、前記水素が前記水溶液貯蔵部から前記発電装置に至るまでの間に設けられ、前記水溶液貯蔵部で発生した前記水素を貯蔵できるバッファ機構を備える。 (5) In any one of the constitutions (1) to (4), the power generation system is provided between the aqueous solution storage section and the power generation device, and the hydrogen is generated in the aqueous solution storage section. A buffer mechanism capable of storing the hydrogen.
（６）上記（５）の構成において、前記発電システムは、前記水素が前記水溶液貯蔵部から前記発電装置及び前記バッファ機構に至るまでの間に設けられた純化機構を備え、前記純化機構は、第１脱水部及び第１不純物気体除去部を有する第１純化部と、第２脱水部及び第２不純物気体除去部を有する第２純化部と、を備え、前記第１純化部を通過させて前記水素を前記発電装置又は前記バッファ機構に供給するときに前記第２純化部の前記第２脱水部を乾燥処理可能とされ、前記第２純化部を通過させて前記水素を前記発電装置又は前記バッファ機構に供給するときに前記第１純化部の前記第１脱水部を乾燥処理可能とされている。 (6) In the configuration of the above (5), the power generation system includes a purification mechanism provided between the aqueous solution storage unit and the power generation device and the buffer mechanism, and the purification mechanism includes: A first purifying section having a first dehydrating section and a first impurity gas removing section; and a second purifying section having a second dehydrating section and a second impurity gas removing section, and passing through the first purifying section. When the hydrogen is supplied to the power generation device or the buffer mechanism, the second dehydration unit of the second purification unit can be dried, and the hydrogen is passed through the second purification unit and the hydrogen is supplied to the power generation device or the buffer unit. The first dehydrating section of the first purifying section can be dried when supplying to the buffer mechanism.
（７）上記（１）から（４）のいずれか１つの構成において、前記発電システムは、前記水素が前記水溶液貯蔵部から前記発電装置に至るまでの間に設けられた純化機構を備え、前記純化機構は、第１脱水部及び第１不純物気体除去部を有する第１純化部と、第２脱水部及び第２不純物気体除去部を有する第２純化部と、を備え、前記第１純化部を通過させて前記水素を前記発電装置に供給するときに前記第２純化部の前記第２脱水部が乾燥処理可能とされ、前記第２純化部を通過させて前記水素を前記発電装置に供給するときに前記第１純化部の前記第１脱水部が乾燥処理可能とされている。 (7) In any one of the constitutions (1) to (4), the power generation system includes a purification mechanism provided between the aqueous solution storage unit and the power generation device, wherein the hydrogen is provided. The purifying mechanism includes: a first purifying unit having a first dehydrating unit and a first impurity gas removing unit; and a second purifying unit having a second dehydrating unit and a second impurity gas removing unit. When the hydrogen is supplied to the power generating device by passing through the second purifying unit, the second dehydrating unit of the second purifying unit can be dried, and the hydrogen is supplied to the power generating device through the second purifying unit. Then, the first dehydration section of the first purification section can be dried.
（８）本発明の水素発生装置は、水溶液を貯蔵する水溶液貯蔵部と、前記水溶液との反応で水素の発生が可能な状態のマグネシウムを含む原料を貯蔵する原料貯蔵部と、前記原料貯蔵部から前記水溶液貯蔵部に向けて前記原料を供給する原料供給機構と、を備える。 (8) The hydrogen generator of the present invention includes an aqueous solution storage unit that stores an aqueous solution, a raw material storage unit that stores a raw material containing magnesium in a state where hydrogen can be generated by a reaction with the aqueous solution, and the raw material storage unit. And a raw material supply mechanism for supplying the raw material to the aqueous solution storage unit from the above.
（９）上記（８）の構成において、前記水溶液貯蔵部は、前記水溶液より上側となる前記水溶液の存在しない上部空間を備え、前記原料供給機構は、前記上部空間側から前記水溶液に向けて前記原料を供給するように設けられており、前記水素発生装置は、前記上部空間の圧力を測定する圧力測定装置と、前記圧力測定装置の圧力の測定結果に基づいて、前記原料供給機構を駆動させ、前記水溶液に向けて供給する前記原料の供給量を制御する制御部と、を備える。 (9) In the configuration of the above (8), the aqueous solution storage unit includes an upper space above the aqueous solution where the aqueous solution does not exist, and the raw material supply mechanism is configured to move the aqueous solution from the upper space side toward the aqueous solution. It is provided so as to supply a raw material, the hydrogen generator is a pressure measuring device that measures the pressure in the upper space, and based on the pressure measurement result of the pressure measuring device, drives the raw material supply mechanism And a control unit for controlling a supply amount of the raw material supplied toward the aqueous solution.
（１０）上記（９）の構成において、前記水溶液貯蔵部は、前記上部空間の下側となる前記水溶液の存在する下部空間と、前記下部空間内を上下に仕切る仕切部と、前記仕切部より下側に設けられ、前記水溶液を排水する排水口と、前記仕切部より上側に設けられ、前記水溶液を供給する給水口と、を備え、前記仕切部は、前記原料と前記水溶液との反応で生成した副生成物が前記仕切部より下側に沈殿可能に設けられた複数の貫通孔を備える。 (10) In the configuration of the above (9), the aqueous solution storage section includes a lower space in which the aqueous solution is located below the upper space, a partition section for vertically partitioning the lower space, and a partition section. A drain port provided on the lower side for draining the aqueous solution, and a water supply port provided above the partition section to supply the aqueous solution are provided, and the partition section is configured to react with the raw material and the aqueous solution. A plurality of through-holes are provided so that generated by-products can settle below the partition.
（１１）上記（１０）の構成において、前記水素発生装置は、前記排水口から排水される前記水溶液の排水量を制御する排水制御弁と、前記給水口から給水される前記水溶液の給水量を制御する給水制御弁と、を備え、前記制御部は、前記水溶液に向けて供給する前記原料の供給量に基づいて、前記排水制御弁、及び、前記給水制御弁を制御する。 (11) In the configuration of the above (10), the hydrogen generator includes a drainage control valve for controlling a drainage amount of the aqueous solution drained from the drainage port, and controls a water supply amount of the aqueous solution supplied from the water supply port. A water supply control valve for controlling the drainage control valve and the water supply control valve based on a supply amount of the raw material supplied toward the aqueous solution.
本発明によれば、水素の発生量の制御が行いやすく、効率よく水素を発生させることが可能な水素発生装置、及び、水素発生装置で発生した水素を用いた発電システムを提供することができる。 According to the present invention, it is possible to provide a hydrogen generator capable of easily controlling the amount of generated hydrogen and efficiently generating hydrogen, and a power generation system using hydrogen generated by the hydrogen generator. .
以下、添付図面を参照して、本発明を実施するための形態（以下、実施形態）について詳細に説明する。
なお、実施形態の説明の全体を通して同じ要素には同じ番号を付している。
Hereinafter, embodiments for implementing the present invention (hereinafter, embodiments) will be described in detail with reference to the accompanying drawings.
Note that the same elements are denoted by the same reference numerals throughout the description of the embodiments.
（第１実施形態）
図１は、本発明に係る第１実施形態の発電システム１を説明するための断面図である。
なお、以下では、発電システム１の説明を行いながら、本発明に係る第１実施形態の水素発生装置２の説明も行う。
(1st Embodiment)
FIG. 1 is a cross-sectional view illustrating a power generation system 1 according to a first embodiment of the present invention.
In the following, the hydrogen generator 2 according to the first embodiment of the present invention will be described while describing the power generation system 1.
図１に示すように、発電システム１は、発電装置（図示せず）と、これから詳細に説明する、発電装置に供給する水素を発生させる水素発生装置２と、を備えている。 As shown in FIG. 1, the power generation system 1 includes a power generation device (not shown) and a hydrogen generation device 2 that generates hydrogen to be supplied to the power generation device, which will be described in detail hereinafter.
図示しない発電装置は、例えば、本実施形態では、水素を燃料としてタービンを駆動させる一般的なタービン発電機を想定している。
ただし、後述する別の実施形態のように、図示しない発電装置は燃料電池であってもよい。
The power generation device (not shown) is, for example, a general turbine generator that drives a turbine using hydrogen as a fuel in the present embodiment.
However, as in another embodiment described later, the power generation device (not shown) may be a fuel cell.
水素発生装置２は、水溶液１１を貯蔵する水溶液貯蔵部１０と、水溶液１１との反応で水素の発生が可能な状態のマグネシウムを含む原料２１を貯蔵する原料貯蔵部２０と、原料貯蔵部２０から水溶液貯蔵部１０に向けて原料２１を供給する原料供給機構３０と、を備えている。 The hydrogen generator 2 includes an aqueous solution storage unit 10 that stores an aqueous solution 11, a raw material storage unit 20 that stores a raw material 21 containing magnesium in a state where hydrogen can be generated by a reaction with the aqueous solution 11, and a raw material storage unit 20. A raw material supply mechanism 30 that supplies the raw material 21 to the aqueous solution storage unit 10.
水溶液１１は、水であってもよいし、アンモニア等を含有するアルカリ性の水溶液であってもよいし、塩酸や硝酸等の酸性の水溶液であってもよい。
なお、発電システム１を稼働させるときのランニングコストの面では、水溶液１１は水である方が有利であり、一方、原料２１との反応性の面では、水溶液１１はアンモニウムイオンを含むアルカリ性の水溶液、もしくは塩酸等の酸性の水溶液の方が有利である。
The aqueous solution 11 may be water, an alkaline aqueous solution containing ammonia or the like, or an acidic aqueous solution such as hydrochloric acid or nitric acid.
In terms of running cost when operating the power generation system 1, it is advantageous that the aqueous solution 11 is water. On the other hand, in terms of reactivity with the raw material 21, the aqueous solution 11 is an alkaline aqueous solution containing ammonium ions. Alternatively, an acidic aqueous solution such as hydrochloric acid is more advantageous.
原料２１は、水溶液１１との反応性を高めるため、平均粒子径が小さい粒子状（マイクロ粒子やナノ粒子の状態）であることが好ましく、例えば、水溶液１１との反応で水素の発生が可能な状態のマグネシウムとしては、金属マグネシウム、水素化マグネシウム等があげられる。 The raw material 21 is preferably in the form of particles having a small average particle diameter (in the state of microparticles or nanoparticles) in order to enhance the reactivity with the aqueous solution 11. For example, hydrogen can be generated by the reaction with the aqueous solution 11. Examples of magnesium in a state include metallic magnesium and magnesium hydride.
ただし、粒子と言っても形状が球状であることを限定するものではなく、各粒子の最大外径を平均したときの平均外径がマイクロメータオーダーの場合はマイクロ粒子であり、マイクロメータオーダーよりも小さい場合（サブミクロン含む）はナノ粒子であるものと解されるべきである。 However, it does not limit that the shape is spherical even if it is referred to as particles, and when the average outer diameter when averaging the maximum outer diameter of each particle is on the order of micrometer, it is a microparticle, and it is more than the micrometer order. If they are also small (including submicron), they should be interpreted as nanoparticles.
なお、原料２１は金属マグネシウムと水素化マグネシウムの混合されたものであってもよい。
また、原料２１には、金属マグネシウムや水素化マグネシウムを生成するために用いた材料が金属マグネシウムや水素化マグネシウムにならずに残留して一部含まれているものであってもよい。
The raw material 21 may be a mixture of metallic magnesium and magnesium hydride.
In addition, the raw material 21 may include a material used for producing metallic magnesium or magnesium hydride, which is partially left as it is instead of being metallic magnesium or magnesium hydride.
水溶液貯蔵部１０は、原料２１と水溶液１１が反応する反応室としても機能し、水溶液１１及び反応で発生した水素等が外部に漏洩しない密閉構造の容器を構成するようになっている。 The aqueous solution storage unit 10 also functions as a reaction chamber in which the raw material 21 and the aqueous solution 11 react, and constitutes a container having a closed structure in which the aqueous solution 11 and hydrogen generated by the reaction do not leak to the outside.
水溶液貯蔵部１０には、水溶液１１より上側となる水溶液１１の存在しない上部空間ＵＳが形成されるように、水溶液１１の給水が行われることで、水溶液貯蔵部１０は、水溶液１１より上側となる水溶液１１の存在しない上部空間ＵＳを備えるものになっている。 The water supply of the aqueous solution 11 is performed so that the upper space US in which the aqueous solution 11 which is higher than the aqueous solution 11 does not exist is formed in the aqueous solution storage unit 10, so that the aqueous solution storage unit 10 is positioned above the aqueous solution 11. The upper space US in which the aqueous solution 11 does not exist is provided.
具体的に上部空間ＵＳを形成する構成について説明すると、まず、水溶液貯蔵部１０は、水溶液１１の水面ＬＳＦの上限位置を決めるために設けられ、水面ＬＳＦを検知する上側レベルセンサ１２と、水溶液１１の水面ＬＳＦの下限位置を決めるために設けられ、水面ＬＳＦを検知する下側レベルセンサ１３と、を備えている。 More specifically, the configuration for forming the upper space US will be described. First, the aqueous solution storage unit 10 is provided to determine the upper limit position of the water surface LSF of the aqueous solution 11, and the upper level sensor 12 for detecting the water surface LSF, and the aqueous solution 11 And a lower level sensor 13 for detecting the water surface LSF.
また、水溶液貯蔵部１０は、上部空間ＵＳの下側となる水溶液１１の存在する下部空間ＬＳと、下部空間ＬＳ内を上下に仕切る仕切部１４と、仕切部１４より下側に設けられ、水溶液１１を排水する排水口１５と、仕切部１４より上側に設けられ、水溶液１１を供給する給水口１６と、を備えるとともに、仕切部１４は、水溶液１１が通過可能な複数の貫通孔１４Ａを備えている。 Further, the aqueous solution storage unit 10 is provided with a lower space LS in which an aqueous solution 11 below the upper space US is present, a partition unit 14 for vertically partitioning the lower space LS, and a lower portion of the aqueous solution solution provided below the partition unit 14. The partition 14 has a plurality of through holes 14 </ b> A through which the aqueous solution 11 can pass, while a drain port 15 for draining the aqueous solution 11 and a water supply port 16 provided above the partition 14 to supply the aqueous solution 11 are provided. ing.
そして、水素発生装置２は、排水口１５に接続され、水溶液貯蔵部１０内の水溶液１１を排水するための排水ライン１５Ａ（排水配管ともいう。）と、排水口１５寄りの排水ライン１５Ａ上に設けられ、排水口１５からの水溶液１１の排水（排水の有無）を制御する排水制御弁１５Ｂと、を備えている。 The hydrogen generator 2 is connected to a drain port 15 and is provided on a drain line 15A (also referred to as a drain pipe) for draining the aqueous solution 11 in the aqueous solution storage unit 10 and a drain line 15A near the drain port 15. A drain control valve 15B for controlling drainage of the aqueous solution 11 from the drain port 15 (whether or not there is drainage).
同様に、水素発生装置２は、給水口１６に接続され、水溶液貯蔵部１０内に新しい水溶液１１を供給するための給水ライン１６Ａ（給水配管ともいう。）と、給水口１６寄りの給水ライン１６Ａ上に設けられ、給水口１６からの水溶液１１の給水（給水の有無）を制御する給水制御弁１６Ｂと、を備えている。 Similarly, the hydrogen generator 2 is connected to the water supply port 16 and supplies a new water solution 11 into the aqueous solution storage unit 10 (also referred to as a water supply pipe), and a water supply line 16A near the water supply port 16. A water supply control valve 16 </ b> B that is provided above and controls water supply (whether or not water is supplied) of the aqueous solution 11 from the water supply port 16.
このため、後ほど説明する排給水する所定のタイミングになると、図示しない水素発生装置２の制御部（以下、単に制御部という。）が、まず、排水制御弁１５Ｂを開にして、水溶液貯蔵部１０内の水溶液１１の排水を行った後、排水制御弁１５Ｂを閉にするとともに、給水制御弁１６Ｂを開にして水溶液１１の水面ＬＳＦが上側レベルセンサ１２と下側レベルセンサ１３との間に位置するように、水溶液貯蔵部１０内に水溶液１１を給水して給水制御弁１６Ｂを、再び、閉にする。 For this reason, at a predetermined timing for drainage and supply of water, which will be described later, a control unit (hereinafter simply referred to as a control unit) of the hydrogen generator 2 (not shown) first opens the drainage control valve 15B to open the aqueous solution storage unit 10. After draining the aqueous solution 11 in the inside, the drainage control valve 15B is closed, and the water supply control valve 16B is opened to position the water surface LSF of the aqueous solution 11 between the upper level sensor 12 and the lower level sensor 13. Then, the aqueous solution 11 is supplied into the aqueous solution storage unit 10, and the water supply control valve 16B is closed again.
例えば、排水時には、下側レベルセンサ１３が水溶液１１の水面ＬＳＦを検知したのを基準にして、仕切部１４のところまで水溶液１１の水面ＬＳＦが低下する程度の水溶液１１の排水を行う。 For example, at the time of drainage, the aqueous solution 11 is drained to such an extent that the water surface LSF of the aqueous solution 11 drops to the partition portion 14 based on the fact that the lower level sensor 13 detects the water surface LSF of the aqueous solution 11.
具体的には、排水制御弁１５Ｂを開にしたときの単位時間当たりの排水量は、あらかじめ調べておくことができるため、下側レベルセンサ１３が水溶液１１の水面ＬＳＦを検知したのをスタート点に仕切部１４のところまで水溶液１１の水面ＬＳＦが低下するのに必要な排水量の水溶液１１の排水に係る時間が経過したことをもって、排水制御弁１５Ｂを閉にすればよい。 Specifically, since the drainage amount per unit time when the drainage control valve 15B is opened can be checked in advance, the start point is that the lower level sensor 13 detects the water level LSF of the aqueous solution 11. The drainage control valve 15B may be closed when the time required for drainage of the aqueous solution 11 with the amount of drainage necessary for lowering the water level LSF of the aqueous solution 11 to the partition portion 14 has elapsed.
そして、その水溶液１１の排水が終わった後、水溶液１１の給水を開始し、下側レベルセンサ１３が水溶液１１の水面ＬＳＦを検知したのを基準にして、水溶液１１の水面ＬＳＦが上側レベルセンサ１２と下側レベルセンサ１３との間に位置する程度の水溶液１１の給水を行ったところで給水を終了するようにし、水溶液１１の水面ＬＳＦが上側レベルセンサ１２と下側レベルセンサ１３との間に位置することで、水溶液貯蔵部１０が水溶液１１より上側となる水溶液１１の存在しない上部空間ＵＳを備えるものとされている。 Then, after the drainage of the aqueous solution 11 is completed, the water supply of the aqueous solution 11 is started, and the water level LSF of the aqueous solution 11 is changed to the upper level sensor 12 based on the detection of the water level LSF of the aqueous solution 11 by the lower level sensor 13. When the water supply of the aqueous solution 11 is performed so as to be located between the upper level sensor 12 and the lower level sensor 13, the water level is stopped between the upper level sensor 12 and the lower level sensor 13. By doing so, the aqueous solution storage unit 10 has an upper space US above the aqueous solution 11 where the aqueous solution 11 does not exist.
具体的には、給水制御弁１６Ｂを開にしたときの単位時間当たりの給水量は、あらかじめ調べておくことができるため、下側レベルセンサ１３が水溶液１１の水面ＬＳＦを検知したのをスタート点に水溶液１１の水面ＬＳＦが上側レベルセンサ１２と下側レベルセンサ１３との間に位置するのに必要な給水量の水溶液１１の給水に係る時間が経過したことをもって、給水制御弁１６Ｂを閉にすればよい。 Specifically, since the water supply amount per unit time when the water supply control valve 16B is opened can be checked in advance, it is determined that the lower level sensor 13 has detected the water level LSF of the aqueous solution 11 at the start point. The water supply control valve 16B is closed when the time required for supplying the aqueous solution 11 of the water supply amount necessary for the water level LSF of the aqueous solution 11 to be located between the upper level sensor 12 and the lower level sensor 13 has elapsed. do it.
なお、排給水する所定のタイミング以外のときに、上側レベルセンサ１２が水溶液１１の水面ＬＳＦを検知すると、図示しない制御部は、排水制御弁１５Ｂを開にして、水溶液１１の水面ＬＳＦが上側レベルセンサ１２と下側レベルセンサ１３との間に位置する程度の水溶液１１の排水を行った後、排水制御弁１５Ｂを閉にする。 When the upper level sensor 12 detects the water level LSF of the aqueous solution 11 at a time other than the predetermined timing for draining and supplying water, a control unit (not shown) opens the drainage control valve 15B to raise the water level LSF of the aqueous solution 11 to the upper level. After draining the aqueous solution 11 to such an extent that it is located between the sensor 12 and the lower level sensor 13, the drain control valve 15B is closed.
逆に、排給水する所定のタイミング以外のときに、下側レベルセンサ１３が水溶液１１の水面ＬＳＦを検知すると、図示しない制御部は、給水制御弁１６Ｂを開にして、水溶液１１の水面ＬＳＦが上側レベルセンサ１２と下側レベルセンサ１３との間に位置する程度の水溶液１１の給水を行った後、給水制御弁１６Ｂを閉にする。 Conversely, when the lower level sensor 13 detects the water level LSF of the aqueous solution 11 at a time other than the predetermined timing of drainage, the control unit (not shown) opens the water supply control valve 16B, and the water level LSF of the aqueous solution 11 becomes lower. After supplying the aqueous solution 11 to such an extent that it is located between the upper level sensor 12 and the lower level sensor 13, the water supply control valve 16B is closed.
そして、上述した仕切部１４の複数の貫通孔１４Ａの内径が原料２１と水溶液１１との反応で生成する水酸化マグネシウム等の副生成物の通過を妨げない大きさとされている。 The inner diameter of the plurality of through-holes 14A of the partition 14 is set to a size that does not prevent the passage of by-products such as magnesium hydroxide generated by the reaction between the raw material 21 and the aqueous solution 11.
つまり、仕切部１４は、原料２１と水溶液１１との反応で生成した副生成物が仕切部１４より下側に沈殿可能に設けられた複数の貫通孔１４Ａを備えるものになっている。 That is, the partition 14 has a plurality of through-holes 14 </ b> A provided so that by-products generated by the reaction between the raw material 21 and the aqueous solution 11 can settle below the partition 14.
このため、仕切部１４より下側に設けられた排水口１５からは、副生成物の含有濃度の高い水溶液１１が排水される。 For this reason, the aqueous solution 11 having a high concentration of by-products is drained from the drain port 15 provided below the partition part 14.
なお、仕切部１４の複数の貫通孔１４Ａの内径は、仮に、原料２１が仕切部１４より下側に沈殿して、仕切部１４より下側で水素が発生したときに、その水素による気泡が邪魔されずに仕切部１４より上側に通過できる、又は、仕切部１４の下面に一時的に水素溜まりができたとしても、自然と仕切部１４の上側に移動することになる程度の大きさにもなっている。 The inner diameter of the plurality of through-holes 14A of the partition 14 is such that when the raw material 21 precipitates below the partition 14 and hydrogen is generated below the partition 14, bubbles due to the hydrogen are generated. The size is such that it can pass above the partition 14 without disturbing, or even if hydrogen accumulates temporarily on the lower surface of the partition 14, it naturally moves to the upper side of the partition 14. Has also become.
一方、図１に示すように、水素発生装置２は、仕切部１４より上側の水溶液１１を攪拌する攪拌機構４０を備えている。 On the other hand, as shown in FIG. 1, the hydrogen generator 2 includes a stirring mechanism 40 that stirs the aqueous solution 11 above the partition 14.
具体的には、攪拌機構４０は、水溶液貯蔵部１０の上部の壁部の外側に設けられたモータ４１と、仕切部１４より上側の水溶液１１内に配置され、水溶液１１を攪拌するプロペラ４２と、モータ４１の回転力をプロペラ４２に伝達し、水溶液１１を攪拌するようにプロペラ４２を回転させるシャフト４３と、を備えている。
なお、シャフト４３が水溶液貯蔵部１０内に挿入される挿入部は、回転を阻害せず、機密を維持可能な機密構造とされている。
Specifically, the stirring mechanism 40 includes a motor 41 provided outside the upper wall of the aqueous solution storage unit 10, and a propeller 42 disposed in the aqueous solution 11 above the partition unit 14 and agitating the aqueous solution 11. And a shaft 43 for transmitting the rotational force of the motor 41 to the propeller 42 and rotating the propeller 42 so as to agitate the aqueous solution 11.
The insertion section into which the shaft 43 is inserted into the aqueous solution storage section 10 has a confidential structure that does not hinder rotation and can maintain confidentiality.
この攪拌機構４０は、水溶液１１と反応していない原料２１が仕切部１４上に溜まるのを抑制するために設けられているものであり、後ほど説明するように、本発明の構成によれば、原料２１と水溶液１１の反応効率が高いため、必ずしも必要というわけではない。 The stirring mechanism 40 is provided to prevent the raw material 21 that has not reacted with the aqueous solution 11 from accumulating on the partitioning portion 14. According to the configuration of the present invention, as described later, It is not always necessary because the reaction efficiency between the raw material 21 and the aqueous solution 11 is high.
そして、図示しない制御部は、定期的に攪拌機構４０を駆動させ、原料２１と水溶液１１の反応を促進する。
なお、攪拌機構４０を、常時、駆動させるようにしてもよいが、定期的に駆動させることで、仕切部１４より下側に副生成物が沈殿しやすくすることができ、仕切部１４より上側の水溶液１１中の副生成物の含有濃度を低下させ、原料２１と水溶液１１の反応効率を高めることができる。
The control unit (not shown) drives the stirring mechanism 40 periodically to promote the reaction between the raw material 21 and the aqueous solution 11.
The stirring mechanism 40 may be driven at all times, but by driving the stirring mechanism at regular intervals, by-products can be easily precipitated below the partition 14, and the stirring mechanism 40 may be driven above the partition 14. The concentration of by-products in the aqueous solution 11 can be reduced, and the reaction efficiency between the raw material 21 and the aqueous solution 11 can be increased.
また、仕切部１４が設けられていることで、攪拌機構４０を駆動させたときに、仕切部１４よりも下側に沈殿した副生成物が巻き上げられて、仕切部１４より上側の水溶液１１中の副生成物の含有濃度が上昇することを抑制することができるため、攪拌機構４０の駆動により、原料２１と水溶液１１の反応効率が低下するのを抑制することができる。 In addition, by providing the partition part 14, when the stirring mechanism 40 is driven, by-products precipitated below the partition part 14 are wound up, and the aqueous solution 11 above the partition part 14 Since it is possible to suppress an increase in the concentration of the by-product, the drive of the stirring mechanism 40 can suppress a decrease in the reaction efficiency of the raw material 21 and the aqueous solution 11.
一方、水素発生装置２は、上部空間ＵＳに連通するように水溶液貯蔵部１０に接続された緊急排気ライン５０（緊急排気配管ともいう。）と、緊急排気ライン５０の上部空間ＵＳに連通する連通部寄りの位置に設けられ、緊急排気の有無を制御する電磁弁５１と、電磁弁５１から水溶液貯蔵部１０に至るまでの間の緊急排気ライン５０上に接続され、上部空間ＵＳの圧力を測定する圧力測定装置５２（例えば、デジタルマノスターゲージ）と、を備えている。 On the other hand, the hydrogen generator 2 has an emergency exhaust line 50 (also referred to as an emergency exhaust pipe) connected to the aqueous solution storage unit 10 so as to communicate with the upper space US, and a communication that communicates with the upper space US of the emergency exhaust line 50. A solenoid valve 51 provided at a position close to the head and controlling the presence or absence of emergency exhaust, and connected to an emergency exhaust line 50 from the solenoid valve 51 to the aqueous solution storage unit 10 to measure the pressure in the upper space US And a pressure measuring device 52 (for example, a digital Manostar gauge).
したがって、上部空間ＵＳの圧力を測定する圧力測定装置５２の圧力測定の結果が、異常に高い圧力を示した場合には、図示しない制御部が、電磁弁５１を開にすることで上部空間ＵＳ内の圧力が所定の第１圧力（求められる一次圧）になるように降圧制御を行う。
なお、所定の第１圧力（求められる一次圧）になれば、図示しない制御部は、再び、電磁弁５１を閉の状態にする。
Therefore, when the pressure measurement result of the pressure measuring device 52 that measures the pressure in the upper space US indicates an abnormally high pressure, the control unit (not shown) opens the solenoid valve 51 to open the upper space US. Pressure control is performed so that the internal pressure becomes a predetermined first pressure (a required primary pressure).
When the predetermined first pressure (the required primary pressure) is reached, the control unit (not shown) closes the solenoid valve 51 again.
原料貯蔵部２０は、上側に原料２１の充填作業のときに開閉される作業扉２２を有しているが、この作業扉２２を閉めると、密閉構造の容器を構成するようになっている。 The raw material storage unit 20 has a work door 22 that is opened and closed at the time of filling work of the raw material 21 on the upper side. When the work door 22 is closed, a container having a closed structure is configured.
また、原料貯蔵部２０は、作業扉２２に隣接して上側に設けられ、貯蔵している原料２１の表面までの距離を測定する距離測定器２４（例えば、変位センサ）を備えており、この距離測定器２４が測定する原料２１までの距離が長くなることで原料２１を追加する時期の把握ができるようになっている。 In addition, the raw material storage unit 20 includes a distance measuring device 24 (for example, a displacement sensor) that is provided on the upper side adjacent to the work door 22 and measures a distance to the surface of the stored raw material 21. By increasing the distance to the raw material 21 measured by the distance measuring device 24, it is possible to know when to add the raw material 21.
なお、原料２１は水溶液１１のように表面が必ずしもフラットに近い状態になるとは言えないが、後述する原料供給機構３０の駆動によって、原料２１全体に振動等が発生するため、比較的フラットな状態を保つことができ、距離測定器２４が測定する原料２１までの距離の測定結果は、原料２１を追加する時期の一つの目安とすることができる。 Although the surface of the raw material 21 is not necessarily almost flat like the aqueous solution 11, the whole raw material 21 is vibrated by the driving of the raw material supply mechanism 30, which will be described later. Can be maintained, and the measurement result of the distance to the raw material 21 measured by the distance measuring device 24 can be used as one measure of the time when the raw material 21 is added.
ただし、後述するように、本実施形態では、水溶液１１に供給された原料２１の供給量を把握できるため、水溶液１１に供給された原料２１の供給量が所定の分量に到達したことを基準として原料２１を追加するようにしてもよく、この場合、距離測定器２４は不要となる。 However, as will be described later, in the present embodiment, since the supply amount of the raw material 21 supplied to the aqueous solution 11 can be grasped, the supply amount of the raw material 21 supplied to the aqueous solution 11 is based on reaching a predetermined amount. The raw material 21 may be added, and in this case, the distance measuring device 24 becomes unnecessary.
そして、原料貯蔵部２０は、底部の壁部の少なくとも一部が、水溶液貯蔵部１０の上部の壁部の外側と密着するように設けられ、その密着している箇所の底部の壁部には、底部の壁部を貫通する原料２１を水溶液貯蔵部１０内に供給するための原料供給孔２３が形成されている。 The raw material storage unit 20 is provided such that at least a part of the bottom wall portion is in close contact with the outside of the upper wall portion of the aqueous solution storage unit 10, and the bottom wall portion of the closely contacted portion is provided on the bottom wall portion. A raw material supply hole 23 for supplying the raw material 21 penetrating the bottom wall into the aqueous solution storage unit 10 is formed.
また、水溶液貯蔵部１０も原料貯蔵部２０の原料供給孔２３に対応する位置に、上部の壁部を貫通する原料２１を受け入れるための原料受入孔１７が形成されている。 The raw material receiving hole 17 for receiving the raw material 21 penetrating the upper wall portion is formed at a position corresponding to the raw material supply hole 23 of the raw material storage unit 20 also in the aqueous solution storage unit 10.
一方、原料貯蔵部２０内には、原料供給機構３０が設けられている。
具体的には、原料供給機構３０は、原料貯蔵部２０の上部の壁部の内側に設置されたモータ３１と、原料貯蔵部２０の底部の壁部の内側に隣接して配置され、原料２１を原料供給孔２３の位置に運搬する円板３２と、モータ３１の回転力を円板３２に伝達し、円板３２を回転させるシャフト３３と、を備えている。
On the other hand, a raw material supply mechanism 30 is provided in the raw material storage unit 20.
Specifically, the raw material supply mechanism 30 includes a motor 31 installed inside the upper wall of the raw material storage unit 20 and a motor 31 installed adjacent to the inside of the bottom wall of the raw material storage unit 20. And a shaft 33 that transmits the rotational force of the motor 31 to the disk 32 and rotates the disk 32.
なお、図示を省略しているが、原料貯蔵部２０は、原料供給機構３０を内蔵させる作業のために、底部とそれよりも上側の部分が分離可能に構成され、それらを一体化して形成されたものになっている。 Although not shown, the raw material storage unit 20 is configured such that a bottom part and a part above the bottom part are separable for the operation of incorporating the raw material supply mechanism 30, and are integrally formed. It has become.
そして、図１の左側に点線枠で囲んで示す円板３２の斜視図のように、円板３２は、回転中心Ｏを挟んで対向し、回転中心Ｏからほぼ同じ距離離れた位置に位置する、一対の貫通孔（貫通孔３２Ａと貫通孔３２Ｂ）が形成されている。 Then, as shown in the perspective view of the disk 32 surrounded by a dotted frame on the left side of FIG. 1, the disk 32 faces the rotation center O and is located at a position substantially the same distance from the rotation center O. , A pair of through holes (a through hole 32A and a through hole 32B) are formed.
ここで、図１を見るとわかるように、原料貯蔵部２０は、原料供給孔２３に対応する部分の上側に、円板３２の一部を受け入れる横方向に窪んだ凹部を備えており、その凹部に位置する円板３２の貫通孔（貫通孔３２Ｂ参照）の上側の開口に凹部の内面が近接して開口をほぼ塞いだ状態となるようになっている。 Here, as can be seen from FIG. 1, the raw material storage unit 20 includes a concave portion that is recessed in a lateral direction that receives a part of the disk 32, above a portion corresponding to the raw material supply hole 23. The inner surface of the concave portion is close to the opening above the through hole (see the through hole 32B) of the disc 32 located in the concave portion, so that the opening is almost closed.
このため、上部空間ＵＳ内の気体（主に水素）が原料貯蔵部２０側に侵入しようとしても原料供給孔２３上に円板３２の貫通孔（貫通孔３２Ｂ参照）の開口が位置するときには、その開口がほぼ閉塞状態であるため、上部空間ＵＳ内の気体（主に水素）が原料貯蔵部２０側に侵入できないようになっている。 For this reason, even if the gas (mainly hydrogen) in the upper space US attempts to enter the raw material storage unit 20 side, when the opening of the through hole (see the through hole 32B) of the disk 32 is located above the raw material supply hole 23, Since the opening is almost closed, the gas (mainly, hydrogen) in the upper space US cannot enter the raw material storage unit 20 side.
そして、その円板３２の一部を受け入れる横方向に窪んだ凹部以外の位置に円板３２の貫通孔（貫通孔３２Ａ、貫通孔３２Ｂ）が位置（例えば、貫通孔３２Ａの位置参照）するときに、この貫通孔（貫通孔３２Ａ参照）内に原料２１が入り込み、円板３２が回転して円板３２の一部を受け入れる横方向に窪んだ凹部の位置に貫通孔（貫通孔３２Ａ、貫通孔３２Ｂ）が位置（貫通孔３２Ｂの位置参照）するようになると、貫通孔（貫通孔３２Ａ、貫通孔３２Ｂ）内に充填された原料２１が、原料供給孔２３及び原料受入孔１７を介して、上部空間ＵＳ側から水溶液１１に向けて供給されることになる。 Then, when the through-holes (through-holes 32A and 32B) of the disc 32 are located at positions other than the laterally concave recesses that receive a part of the disc 32 (for example, see the position of the through-hole 32A). The raw material 21 enters into the through hole (see the through hole 32A), and the disc 32 rotates to receive a part of the disc 32, and the through hole (the through hole 32A, When the hole 32B) is positioned (see the position of the through hole 32B), the raw material 21 filled in the through hole (the through hole 32A and the through hole 32B) passes through the raw material supply hole 23 and the raw material receiving hole 17. Are supplied from the upper space US toward the aqueous solution 11.
また、本実施形態では、水素発生装置２が、原料貯蔵部２０の原料２１より上側の原料２１の存在しない上側空間ＵＳ１の圧力を測定する圧力測定装置６１（例えば、デジタルマノスターゲージ）と、上側空間ＵＳ１に気体（例えば、露点の低い窒素等の活性の低いガスや露点の低いヘリウム、アルゴン等の不活性ガス）を供給する気体供給ライン６２（気体供給配管ともいう。）と、気体供給ライン６２上に設けられ、上側空間ＵＳ１への気体の供給の有無を制御する電磁弁６３と、を備えている。 In the present embodiment, the hydrogen generator 2 includes a pressure measuring device 61 (for example, a digital manostar gauge) that measures the pressure in the upper space US1 where the raw material 21 above the raw material 21 in the raw material storage unit 20 does not exist. A gas supply line 62 (also referred to as a gas supply pipe) for supplying a gas (for example, a low-activity gas such as nitrogen with a low dew point or an inert gas such as helium or argon with a low dew point) to the upper space US1; And a solenoid valve 63 provided on the line 62 for controlling whether or not gas is supplied to the upper space US1.
そして、図示しない制御部は、上側空間ＵＳ１の圧力測定装置６１が測定する圧力の測定結果に基づいて、上側空間ＵＳ１内の圧力が所定の圧力（例えば、水溶液貯蔵部１０の上部空間ＵＳ内の圧力と同程度の圧力）となるように、電磁弁６３の開閉制御を行う。 The control unit (not shown) adjusts the pressure in the upper space US1 to a predetermined pressure (for example, in the upper space US of the aqueous solution storage unit 10) based on the measurement result of the pressure measured by the pressure measuring device 61 in the upper space US1. The opening / closing control of the electromagnetic valve 63 is performed so that the pressure becomes approximately the same as the pressure).
なお、図示は省略しているが、水素発生装置２は、上側空間ＵＳ１内の気体を排気する気体排気ライン（気体供給配管ともいう。）と、その気体排気ラインを通じて上側空間ＵＳ１内の気体の排気の有無を制御する電磁弁も有している。 Although not shown, the hydrogen generator 2 includes a gas exhaust line (also referred to as a gas supply pipe) for exhausting gas in the upper space US1 and a gas exhaust line in the upper space US1 through the gas exhaust line. It also has a solenoid valve that controls the presence or absence of exhaust.
したがって、より正確には、図示しない制御部が、上述した電磁弁６３と気体の排気の有無を制御する電磁弁とを制御することで上側空間ＵＳ１内の圧力が所定の圧力（例えば、水溶液貯蔵部１０の上部空間ＵＳ内の圧力と同程度の圧力）となるように制御される。 Therefore, more precisely, the control unit (not shown) controls the electromagnetic valve 63 and the electromagnetic valve that controls the presence or absence of gas exhaust so that the pressure in the upper space US1 becomes a predetermined pressure (for example, aqueous solution storage). (The same pressure as the pressure in the upper space US of the section 10).
そして、上側空間ＵＳ１が昇圧されていることで、より一層、上部空間ＵＳ内の気体（主に水素）が原料貯蔵部２０側に侵入するのを抑制できるとともに、円板３２の一部を受け入れる横方向に窪んだ凹部以外の位置に円板３２の貫通孔（貫通孔３２Ａ、貫通孔３２Ｂ）が位置（例えば、貫通孔３２Ａの位置参照）するときに、この貫通孔（貫通孔３２Ａ、貫通孔３２Ｂ）内に原料２１が効率的に入り込む。 Since the upper space US1 is pressurized, the gas (mainly, hydrogen) in the upper space US can be further prevented from entering the raw material storage unit 20 side, and a part of the disk 32 is received. When the through-holes (through-holes 32A and 32B) of the disc 32 are located at positions other than the recesses recessed in the lateral direction (for example, see the position of the through-hole 32A), the through-holes (through-holes 32A and The raw material 21 efficiently enters the holes 32B).
なお、本実施形態では、円板３２の一部を受け入れる横方向に窪んだ凹部の位置に貫通孔（貫通孔３２Ａ、貫通孔３２Ｂ）が位置するようになると、貫通孔（貫通孔３２Ａ、貫通孔３２Ｂ）内に充填された原料２１が、自重で原料供給孔２３及び原料受入孔１７を介して、上部空間ＵＳ側から水溶液１１に向けて落下することで水溶液１１に供給されるものとしている。 In the present embodiment, when the through-holes (through-holes 32A and 32B) are located at the positions of the concave portions that are recessed in the lateral direction for receiving a part of the disc 32, the through-holes (through-holes 32A and The raw material 21 filled in the hole 32B) is supplied to the aqueous solution 11 by dropping from the upper space US side toward the aqueous solution 11 through the raw material supply hole 23 and the raw material receiving hole 17 by its own weight. .
しかし、水素発生装置２が、原料供給孔２３及び原料受入孔１７の直上に位置する貫通孔（貫通孔３２Ａ、貫通孔３２Ｂ）に対して棒状体を挿入し、貫通孔（貫通孔３２Ａ、貫通孔３２Ｂ）内の原料２１を強制的に押し出す原料押出機構を備えるものとしてもよく、そうすることで、確実に原料２１を水溶液１１に向けて供給することが可能となる。 However, the hydrogen generator 2 inserts the rod into the through holes (through holes 32A and 32B) located immediately above the raw material supply holes 23 and the raw material receiving holes 17, and the through holes (through holes 32A, through holes 32A). A raw material extruding mechanism for forcibly extruding the raw material 21 in the hole 32B) may be provided, so that the raw material 21 can be reliably supplied to the aqueous solution 11.
このような原料押出機構を設ける場合には、円板３２の貫通孔（貫通孔３２Ａ、貫通孔３２Ｂ）が原料供給孔２３及び原料受入孔１７の直上に位置するところで円板３２の回転を停止し、その貫通孔（貫通孔３２Ａ、貫通孔３２Ｂ）に棒状体を挿入して原料２１を水溶液１１に向けて供給した後、その貫通孔（貫通孔３２Ａ、貫通孔３２Ｂ）から棒状体を抜いて、再び、円板３２を回転させるという動作を繰り返すことになる。 When such a raw material pushing mechanism is provided, the rotation of the disk 32 is stopped when the through holes (the through holes 32A and 32B) of the disk 32 are located immediately above the raw material supply holes 23 and the raw material receiving holes 17. Then, after inserting a rod into the through-hole (through-hole 32A, through-hole 32B) and supplying the raw material 21 toward the aqueous solution 11, the rod is removed from the through-hole (through-hole 32A, through-hole 32B). Then, the operation of rotating the disk 32 is repeated again.
なお、本実施形態では、先に説明したように、円板３２の回転中心Ｏを挟んで対向し、回転中心Ｏからほぼ同じ距離離れた位置に、一対の貫通孔（貫通孔３２Ａと貫通孔３２Ｂ）が形成されたものとしたが、これに限定される必要はない。 In the present embodiment, as described above, a pair of through-holes (through-hole 32A and through-hole 32A) are opposed to each other with the rotation center O of the disc 32 interposed therebetween and at substantially the same distance from the rotation center O. 32B) is formed, but it is not necessary to be limited to this.
例えば、回転中心Ｏからほぼ同じ距離離れた位置に、同じサイズの貫通孔が円板３２の回転方向に均等間隔で３つ（この場合、円板３２の周方向で見た隣接する貫通孔間の角度ピッチは１２０°ピッチとなる。）を設けるようにしてもよく、回転方向に均等間隔で４つの貫通孔（この場合、円板３２の周方向で見た隣接する貫通孔間の角度ピッチは９０°ピッチとなる。）を設けるようにしてもよい。 For example, three through holes of the same size are provided at substantially the same distance from the rotation center O at equal intervals in the rotation direction of the disk 32 (in this case, between adjacent through holes viewed in the circumferential direction of the disk 32). May be provided at an angle pitch of 120 °. In this case, four through-holes (in this case, the angular pitch between adjacent through-holes viewed in the circumferential direction of the disk 32) at equal intervals in the rotation direction may be provided. Is 90 ° pitch).
また、貫通孔が１つであったとしても、その１つの貫通孔が円板３２の一部を受け入れる横方向に窪んだ凹部以外の位置と、円板３２の一部を受け入れる横方向に窪んだ凹部の位置と、に交互に位置するように制御すれば原料２１を水溶液１１に供給することが可能であるため問題はない。 Even if there is only one through-hole, the one through-hole is recessed in the lateral direction for receiving a part of the disk 32 and a position other than the concave part which is recessed in the horizontal direction for receiving a part of the disk 32. The raw material 21 can be supplied to the aqueous solution 11 by controlling so as to be alternately positioned between the concave portion and the concave portion, so that there is no problem.
ただし、貫通孔の数が多くなると、円板３２の一部を受け入れる横方向に窪んだ凹部が形成し難くなるので、貫通孔の数は４つ以下であることが好ましい。 However, when the number of through holes increases, it becomes difficult to form a concave portion that is recessed in the lateral direction for receiving a part of the disk 32. Therefore, the number of through holes is preferably four or less.
また、貫通孔のサイズは、発生させる水素量に応じた原料２１を供給できるサイズが選択されればよい。
例えば、水素化マグネシウムの質量（１ｍｏｌ当たりの重さ）は２６.３２ｇであり、水素化マグネシウムの密度は２．３６ｇ／ｃｍ３程度であるので、体積約１１．２ｃｍ３弱（約１ｍｏｌ）の水素化マグネシウムからなる原料２１を水溶液１１に投入すれば、標準状態で４５リットル弱（約２ｍｏｌ）の水素が発生する。
Further, the size of the through-hole may be selected so that the raw material 21 can be supplied according to the amount of hydrogen to be generated.
For example, the mass of the magnesium hydride (weight per 1 mol) is 26.32G, the density of the magnesium hydride is about 2.36 g / cm 3, a volume of about 11.2 cm 3 weak (about 1 mol) When the raw material 21 composed of magnesium hydride is charged into the aqueous solution 11, less than 45 liters (about 2 mol) of hydrogen is generated in a standard state.
そして、１０ＭＷ程度の発電を行う水素ガスタービン型の発電装置で約０．６憶ｍ３／年の水素を使用すると考えると、１分当たり約１１４ｍ３の水素が必要になり、これに対応する貫通孔を一例として考えれば、以下のようになる。 Then, assuming that about 0.6 billion m 3 / year of hydrogen is used in a hydrogen gas turbine type power generation apparatus that generates about 10 MW of power, about 114 m 3 of hydrogen is required per minute. Taking a through hole as an example, the following is obtained.
例えば、円板３２の厚さを約１０ｃｍとし、円板３２の直径を約７０ｃｍとして、回転中心Ｏから約１０ｃｍオフセットした位置に、直径が約２１ｃｍの貫通孔の内側の端（貫通孔の中心は回転中心Ｏから約２０．５ｃｍオフセット）が位置するディメンジョンを考えれば、その貫通孔の容積は約３３４６ｃｍ３弱となる。 For example, the thickness of the disc 32 is about 10 cm, the diameter of the disc 32 is about 70 cm, and the inner end of the through hole having a diameter of about 21 cm (center of the through hole) is located at about 10 cm offset from the rotation center O. (20.5 cm offset from the rotation center O), the volume of the through-hole is about 3346 cm 3 or less.
このため、上記のようなディメンジョンの貫通孔には、約３００ｍｏｌ（＝３３４６［ｃｍ３］／１１．２［ｃｍ３］）程度の原料２１が充填できることになり、この分量の水素化マグネシウムからなる原料２１を水溶液１１に投入したとすれば、約６００ｍｏｌ（約１３．４ｍ３）の水素が発生することになる。 For this reason, about 300 mol (= 3346 [cm 3 ] / 11.2 [cm 3 ]) of the raw material 21 can be filled in the through-hole of the dimension as described above, and this amount of magnesium hydride is used. Assuming that the raw material 21 is charged into the aqueous solution 11, about 600 mol (about 13.4 m 3 ) of hydrogen is generated.
そうすると、本実施形態の貫通孔３２Ａ、貫通孔３２Ｂのように、円板３２に貫通孔を２つ設けた場合を考えれば、１回転当たりに２回貫通孔（貫通孔３２Ａが１回、貫通孔３２Ｂが１回）から原料２１が水溶液１１に供給されることになるので、円板３２を１２秒で１回転（１分間５回転）させると、１分間当たりでは、１０回水溶液１１に向けて原料２１が供給されることになり、十分に１分当たり１１４ｍ３を超える水素（約１３４ｍ３）を発生させるだけの原料２１を供給することができる。 Then, considering the case where two through holes are provided in the disc 32 like the through holes 32A and 32B of the present embodiment, the through holes are formed twice per rotation (the through hole 32A Since the raw material 21 is supplied to the aqueous solution 11 from the hole 32B once), when the disk 32 is rotated once in 12 seconds (5 rotations per minute), the disk 21 is directed to the aqueous solution 11 10 times per minute. As a result, the raw material 21 is supplied, and the raw material 21 that can generate enough hydrogen (about 134 m 3 ) more than 114 m 3 per minute can be supplied.
したがって、小型（約１万ＫＷ）の水素ガスタービン型の発電装置を想定する場合、円板３２に２つの貫通孔を設けるようにすれば、その貫通孔の容積は、約３３４６ｃｍ３弱でよいと考えられる。 Therefore, when assuming a small-sized (about 10,000 KW) hydrogen gas turbine type power generator, if the disk 32 is provided with two through holes, the volume of the through holes may be less than about 3346 cm 3. it is conceivable that.
ただし、発電装置の発電量が大きくなれば、必要な原料２１の供給量が増加することになるため、発電量が１０倍程度の発電装置までを想定するとすれば、貫通孔の容積は、約３３４６０ｃｍ３弱までを想定しておくことが好ましい。 However, if the power generation amount of the power generation device increases, the supply amount of the necessary raw material 21 increases. Therefore, assuming a power generation device having a power generation amount of about 10 times, the volume of the through hole is approximately It is preferable to assume up to less than 33460 cm 3 .
したがって、貫通孔の容積は、３０００ｃｍ３から３５０００ｃｍ３程度とすることが好ましい。
なお、このことを考えれば、原料供給機構３０は、１分当たり、１００ｍ３から１０００ｍ３程度の水素を発生させることができる原料２１を水溶液１１に供給できることが好ましい。
Accordingly, the volume of the through-hole is preferably in a 35,000 3 order of 3000 cm 3.
In view of this, it is preferable that the raw material supply mechanism 30 can supply the raw material 21 capable of generating about 100 m 3 to about 1000 m 3 of hydrogen per minute to the aqueous solution 11.
なお、上述した原料供給機構３０は、あくまでも一例であって、原料供給機構３０は、上部空間ＵＳ側から水溶液１１に向けて原料２１を供給するように設けられ、原料２１が上部空間ＵＳ側から水溶液１１に向けて供給できるような構成であればよい。 The above-described raw material supply mechanism 30 is merely an example, and the raw material supply mechanism 30 is provided so as to supply the raw material 21 from the upper space US side toward the aqueous solution 11, and the raw material 21 is supplied from the upper space US side. What is necessary is just a structure which can be supplied toward the aqueous solution 11.
一方、本実施形態では、図示しない制御部が、水溶液貯蔵部１０の上部空間ＵＳの圧力を測定する圧力測定装置５２の圧力の測定結果に基づいて、原料供給機構３０のモータ３１を駆動させ、上部空間ＵＳ内の圧力が所定の第１圧力（求められる一次圧）となるように、水溶液１１に向けて供給する原料２１の供給量を制御するものになっている。 On the other hand, in the present embodiment, the control unit (not shown) drives the motor 31 of the raw material supply mechanism 30 based on the pressure measurement result of the pressure measurement device 52 that measures the pressure of the upper space US of the aqueous solution storage unit 10, The supply amount of the raw material 21 supplied to the aqueous solution 11 is controlled so that the pressure in the upper space US becomes a predetermined first pressure (a required primary pressure).
このように、図示しない制御部が、水溶液１１に向けて供給する原料２１の供給量を制御しているため、図示しない制御部は、どれだけの原料２１が水溶液１１に供給されたのかを把握することが可能であり、水溶液１１に供給されたトータルの原料２１の供給量から水溶液１１中の水酸化マグネシウム等の副生成物の含有濃度の増加を予想（例えば実験的に濃度変化のデータを採取しておき、そのデータに基づいて予想）することが可能である。
なお、このような実験的な手法に代えて、副生成物の含有濃度の増加予想を理論計算で行うこともできる。
As described above, since the control unit (not shown) controls the supply amount of the raw material 21 to be supplied to the aqueous solution 11, the control unit (not shown) grasps how much raw material 21 is supplied to the aqueous solution 11. It is possible to predict an increase in the concentration of by-products such as magnesium hydroxide in the aqueous solution 11 based on the total supply amount of the raw material 21 supplied to the aqueous solution 11 (for example, data of the concentration change is experimentally obtained). It is possible to make predictions based on that data.
Instead of such an experimental method, an increase in the concentration of by-products can be predicted by theoretical calculation.
そこで、図示しない制御部は、水溶液１１に向けて供給する原料２１の供給量に基づいて、先ほど説明したように、排水制御弁１５Ｂ、及び、給水制御弁１６Ｂを制御し、本実施形態では、原料２１と水溶液１１の反応効率が低下しないように、水溶液１１中の副生成物の含有濃度が高くなり過ぎないようにする管理を行っている。 Therefore, the control unit (not shown) controls the drainage control valve 15B and the water supply control valve 16B based on the supply amount of the raw material 21 supplied to the aqueous solution 11, as described above. In order to prevent the reaction efficiency between the raw material 21 and the aqueous solution 11 from decreasing, management is performed so that the concentration of by-products in the aqueous solution 11 does not become too high.
一方、図１に示すように、水溶液貯蔵部１０は、上部空間ＵＳ内の水素を発電装置（図示せず）に向けて排出するための水素排出口１８を備えており、発電システム１は、水素排出口１８に接続され、水溶液貯蔵部１０で発生した水素を発電装置（図示せず）に供給する水素供給部７０（水素供給主配管ともいう。）を備えている。 On the other hand, as shown in FIG. 1, the aqueous solution storage unit 10 includes a hydrogen discharge port 18 for discharging hydrogen in the upper space US toward a power generation device (not shown). A hydrogen supply unit 70 (also referred to as a hydrogen supply main pipe) connected to the hydrogen discharge port 18 and supplying hydrogen generated in the aqueous solution storage unit 10 to a power generation device (not shown) is provided.
また、発電システム１は、水素供給部７０上の水素排出口１８寄りの位置に設けられ、水素排出口１８からの水素の排出の有無を制御する電磁弁７１と、電磁弁７１よりも水素排出口１８から離れた水素供給部７０上に設けられた減圧弁７２と、減圧弁７２よりも更に水素排出口１８から離れた水素供給部７０上に設けられた電磁弁７３と、を備えている。 Further, the power generation system 1 is provided at a position near the hydrogen discharge port 18 on the hydrogen supply unit 70, and controls an electromagnetic valve 71 that controls whether hydrogen is discharged from the hydrogen discharge port 18. It has a pressure reducing valve 72 provided on the hydrogen supply part 70 remote from the outlet 18, and an electromagnetic valve 73 provided on the hydrogen supply part 70 further away from the hydrogen discharge port 18 than the pressure reducing valve 72. .
なお、減圧弁７２は、上部空間ＵＳ内の所定の第１圧力（求められる一次圧）から図示しない発電装置に供給するための所定の第２圧力（求められる二次圧）に水素の圧力を減圧するためのものである。 The pressure reducing valve 72 changes the pressure of hydrogen from a predetermined first pressure (determined primary pressure) in the upper space US to a predetermined second pressure (determined secondary pressure) to be supplied to a power generator (not shown). It is for reducing the pressure.
さらに、発電システム１は、図示しない発電装置に水素を供給可能に貯蔵するバッファ機構３を備えている。 Further, the power generation system 1 includes a buffer mechanism 3 that stores hydrogen so as to be supplied to a power generation device (not shown).
具体的には、バッファ機構３は、バッファタンク８０と、一端が水素供給部７０の減圧弁７２と電磁弁７３の間の位置に接続されるとともに他端がバッファタンク８０に接続され、水素をバッファタンク８０に引き込むための引込分岐ライン８１（分岐配管ともいう。）と、引込分岐ライン８１上に設けられた昇圧装置８２と、昇圧装置８２とバッファタンク８０の間の引込分岐ライン８１上に設けられた電磁弁８３と、を備えている。 Specifically, the buffer mechanism 3 is connected to the buffer tank 80 at one end at a position between the pressure reducing valve 72 and the solenoid valve 73 of the hydrogen supply unit 70 and at the other end to the buffer tank 80, A drop branch line 81 (also referred to as a branch pipe) for drawing into the buffer tank 80, a booster 82 provided on the drop branch line 81, and a drop branch line 81 between the booster 82 and the buffer tank 80. And an electromagnetic valve 83 provided.
また、バッファ機構３は、一端がバッファタンク８０に接続されるとともに他端が電磁弁７３よりも図示しない発電装置側となる水素供給部７０に接続され、水素をバッファタンク８０から水素供給部７０に戻すための返送ライン８４（返送配管ともいう。）と、返送ライン８４上に設けられた電磁弁８５と、電磁弁８５と水素供給部７０の間の返送ライン８４上に設けられた減圧弁８６と、を備えている。 The buffer mechanism 3 has one end connected to the buffer tank 80 and the other end connected to the hydrogen supply unit 70 on the power generation device side (not shown) with respect to the electromagnetic valve 73. Return line 84 (also referred to as a return pipe) for returning to the above, an electromagnetic valve 85 provided on the return line 84, and a pressure reducing valve provided on the return line 84 between the electromagnetic valve 85 and the hydrogen supply unit 70 86.
なお、減圧弁８６も先ほどの減圧弁７２と同様に、バッファタンク８０の後述する圧力から図示しない発電装置に供給するための所定の第２圧力（求められる二次圧）に水素の圧力を減圧するためのものである。 Similarly to the pressure reducing valve 72, the pressure reducing valve 86 reduces the pressure of hydrogen to a predetermined second pressure (a required secondary pressure) to be supplied to a power generator (not shown) from a pressure of the buffer tank 80 described later. It is for doing.
そして、バッファ機構３には、図示しない発電装置からの水素の供給要求がないときを利用して水素の充填処理が行われる。 Then, the buffer mechanism 3 is filled with hydrogen by utilizing the time when there is no request for supplying hydrogen from a power generator (not shown).
具体的には、図示しない制御部によって、電磁弁７１及び電磁弁８３が開とされるとともに、電磁弁７３及び電磁弁８５が閉とされる制御が行われ、更に、制御部によって、水素発生装置２が水素を発生させるように制御が行われるとともに、昇圧装置８２の駆動制御が行われる。 Specifically, a control unit (not shown) controls the solenoid valve 71 and the solenoid valve 83 to be opened and the solenoid valve 73 and the solenoid valve 85 to be closed. Control is performed so that the device 2 generates hydrogen, and drive control of the booster 82 is performed.
このため、水素発生装置２で発生した水素は、減圧弁７２によって所定の第２圧力（求められる二次圧）の状態で引込分岐ライン８１に供給されるが、昇圧装置８２によって昇圧が行われるので、バッファタンク８０内の圧力が上部空間ＵＳ内の所定の第１圧力（求められる一次圧）と同様の第１圧力又は第１圧力よりも高めの所定の第３圧力となるように、バッファタンク８０に水素を充填することができる。 Therefore, the hydrogen generated by the hydrogen generator 2 is supplied to the branch branch line 81 at a predetermined second pressure (the required secondary pressure) by the pressure reducing valve 72, but the pressure is increased by the pressure increasing device 82. Therefore, the buffer is set so that the pressure in the buffer tank 80 becomes the same first pressure as the predetermined first pressure (the required primary pressure) in the upper space US or the predetermined third pressure higher than the first pressure. The tank 80 can be filled with hydrogen.
なお、バッファ機構３は、バッファタンク８０内の圧力を測定する圧力測定装置８７（例えば、デジタルマノスターゲージ）を備えており、上述したバッファタンク８０への水素の充填処理は、この圧力測定装置８７が測定するバッファタンク８０内の圧力の測定結果に基づいて、第１圧力又は第１圧力よりも高めの所定の第３圧力となるように、行われ、目標の圧力になれば、水素発生装置２の駆動が停止されるとともに、電磁弁７１及び電磁弁８３が閉とされる。 Note that the buffer mechanism 3 includes a pressure measuring device 87 (for example, a digital Manostar gauge) that measures the pressure in the buffer tank 80. The above-described process of filling the buffer tank 80 with hydrogen is performed by the pressure measuring device 87. Based on the measurement result of the pressure in the buffer tank 80 measured by 87, the pressure is adjusted to the first pressure or a predetermined third pressure higher than the first pressure, and when the target pressure is reached, hydrogen generation is performed. The drive of the device 2 is stopped, and the solenoid valves 71 and 83 are closed.
また、バッファ機構３は、バッファタンク８０と緊急排気ライン５０を接続する接続ライン８８（接続配管ともいう。）と、接続ライン８８上に設けられ、緊急排気の有無を制御する電磁弁８９と、を備えており、圧力測定装置８７が測定するバッファタンク８０内の圧力の測定結果が異常に高い圧力を示した場合には、図示しない制御部が、電磁弁８９を開にすることでバッファタンク８０内の圧力が、先に説明した第１圧力又は第１圧力よりも高めの所定の第３圧力になるように降圧制御を行う。 Further, the buffer mechanism 3 includes a connection line 88 (also referred to as a connection pipe) connecting the buffer tank 80 and the emergency exhaust line 50, an electromagnetic valve 89 provided on the connection line 88 and controlling the presence or absence of emergency exhaust. When the measurement result of the pressure in the buffer tank 80 measured by the pressure measuring device 87 indicates an abnormally high pressure, the control unit (not shown) opens the solenoid valve 89 to open the buffer tank. The pressure reduction control is performed so that the pressure in 80 becomes the first pressure described above or a predetermined third pressure higher than the first pressure.
ただし、本実施形態では、水素供給部７０から分岐する形態でバッファ機構３を設ける場合について示したが、バッファ機構３は、水素供給部７０上に設けられるものとしてもよい。 However, in the present embodiment, the case where the buffer mechanism 3 is provided in a form branched from the hydrogen supply unit 70 has been described, but the buffer mechanism 3 may be provided on the hydrogen supply unit 70.
例えば、バッファ機構３の変形例としては、減圧弁７２を省略し、電磁弁７１と電磁弁７３の間の水素供給部７０上に水溶液貯蔵部１０側から図示しない発電装置側に向けて、電磁弁８３、バッファタンク８０を設けるとともに、電磁弁７３よりも発電装置側となる水素供給部７０上に減圧弁８６を設けるような構成が考えられ、この場合には、水溶液貯蔵部１０で発生した水素が、必ず、バッファ機構３を介して発電装置に供給されることになる。 For example, as a modified example of the buffer mechanism 3, the pressure reducing valve 72 is omitted, and the electromagnetic valve 71 is provided on the hydrogen supply unit 70 between the electromagnetic valves 73 from the aqueous solution storage unit 10 toward the power generation device (not shown). In addition to providing the valve 83 and the buffer tank 80, a configuration is conceivable in which the pressure reducing valve 86 is provided on the hydrogen supply unit 70 which is closer to the power generator than the electromagnetic valve 73. Hydrogen is always supplied to the power generator via the buffer mechanism 3.
そして、バッファ機構３は、本実施形態、及び、変形例のどちらにおいても、水素が水溶液貯蔵部１０から図示しない発電装置に至るまでの間に設けられ、水溶液貯蔵部１０で発生した水素を貯蔵できるようにされることになる。 In both the present embodiment and the modification, the buffer mechanism 3 is provided between the aqueous solution storage unit 10 and the power generator (not shown), and stores the hydrogen generated in the aqueous solution storage unit 10. Will be able to do it.
なお、このバッファ機構３の変形例の場合でも、バッファ機構３がバッファタンク８０内の圧力を測定する圧力測定装置８７（例えば、デジタルマノスターゲージ）と、バッファタンク８０と緊急排気ライン５０を接続する接続ライン８８（接続配管ともいう。）と、接続ライン８８上に設けられ、緊急排気の有無を制御する電磁弁８９と、を備えるものとすることが好ましく、水素供給部７０上に設けられることになる電磁弁８３と電磁弁７１の間の水素供給部７０上に昇圧装置８２を設けるようにしてもよい。 Even in the case of the modified example of the buffer mechanism 3, the buffer mechanism 3 connects the pressure measuring device 87 (for example, a digital manostar gauge) for measuring the pressure in the buffer tank 80 to the buffer tank 80 and the emergency exhaust line 50. And a solenoid valve 89 provided on the connection line 88 for controlling the presence or absence of emergency exhaust, and is provided on the hydrogen supply unit 70. The pressure increasing device 82 may be provided on the hydrogen supply unit 70 between the electromagnetic valve 83 and the electromagnetic valve 71.
また、バッファ機構３の制御は、水素発生装置２の制御部が行う方がシンプルなものとなると考えられるため、水素発生装置２がバッファ機構３を含むとともに、水素発生装置２がそのバッファ機構３との関連で必要な位置までの水素供給部７０を含むものであってもよい。 Since the control of the buffer mechanism 3 is considered to be simpler by the control unit of the hydrogen generator 2, the hydrogen generator 2 includes the buffer mechanism 3 and the hydrogen generator 2 includes the buffer mechanism 3. May include the hydrogen supply unit 70 up to a necessary position in relation to the above.
次に、以上のような構成からなる発電システム１の動作等について説明する。
ただし、これまでの説明で細部の動作については十分に理解が得られる説明を行っているため、主要な動作についてだけ説明するものとする。
また、以下では、既にバッファタンク８０に水素が充填されているものとして説明する。
Next, the operation and the like of the power generation system 1 configured as described above will be described.
However, only the main operations will be described since the detailed operation has been described so far that the operation can be sufficiently understood.
In the following, description will be made on the assumption that the buffer tank 80 has already been filled with hydrogen.
例えば、図示しない発電装置から水素発生装置２に水素供給の要求（指令）が届くと、水素発生装置２の制御部は、水溶液貯蔵部１０の上部空間ＵＳ内の圧力を確認し、上部空間ＵＳ内の圧力が所定の第１圧力（求められる一次圧）前後の圧力になっていれば、電磁弁７１及び電磁弁７３を開にして、発電装置への水素の供給を開始するとともに、その水素の供給によって減少する水溶液貯蔵部１０の上部空間ＵＳ内の圧力を所定の第１圧力（求められる一次圧）に保つように原料供給機構３０の駆動を制御する。 For example, when a request (command) for hydrogen supply reaches the hydrogen generator 2 from a power generator (not shown), the control unit of the hydrogen generator 2 checks the pressure in the upper space US of the aqueous solution storage unit 10, and checks the upper space US If the internal pressure is about the predetermined first pressure (the required primary pressure), the solenoid valves 71 and 73 are opened to start supplying hydrogen to the power generator, The driving of the raw material supply mechanism 30 is controlled so that the pressure in the upper space US of the aqueous solution storage unit 10 reduced by the supply of the water is maintained at a predetermined first pressure (a required primary pressure).
一方、水素発生装置２の制御部は、水溶液貯蔵部１０の上部空間ＵＳ内の圧力を確認した結果、上部空間ＵＳ内の圧力が低すぎる場合、電磁弁８５を開にしてバッファタンク８０内の水素が図示しない発電装置に供給されるようにするとともに、水溶液貯蔵部１０の上部空間ＵＳ内の圧力が所定の第１圧力（求められる一次圧）になるように原料供給機構３０の駆動を制御する。 On the other hand, the control unit of the hydrogen generator 2 confirms the pressure in the upper space US of the aqueous solution storage unit 10, and as a result, if the pressure in the upper space US is too low, opens the solenoid valve 85 to open the buffer tank 80. The hydrogen is supplied to a power generator (not shown), and the driving of the raw material supply mechanism 30 is controlled so that the pressure in the upper space US of the aqueous solution storage unit 10 becomes a predetermined first pressure (a required primary pressure). I do.
本実施形態の場合、水溶液貯蔵部１０に貯められた大量の水溶液１１に向けて原料２１を供給することになるため、原料２１と水溶液１１の反応で水酸化マグネシウム等の副生成物が生成したとしても、その副生成物は、水溶液１１内に速やかに拡散するため、反応が阻害されることなく、効率よく速やかに反応が進むため、水溶液貯蔵部１０の上部空間ＵＳ内の圧力を短時間で所定の第１圧力（求められる一次圧）にすることができる。 In the case of the present embodiment, since the raw material 21 is supplied toward the large amount of the aqueous solution 11 stored in the aqueous solution storage unit 10, a by-product such as magnesium hydroxide is generated by the reaction between the raw material 21 and the aqueous solution 11. Even so, the by-product quickly diffuses into the aqueous solution 11, so that the reaction proceeds quickly and efficiently without being hindered. Therefore, the pressure in the upper space US of the aqueous solution storage unit 10 is reduced for a short time. To a predetermined first pressure (a required primary pressure).
そして、水素発生装置２の制御部は、水溶液貯蔵部１０の上部空間ＵＳ内の圧力が所定の第１圧力（求められる一次圧）になると、電磁弁７１及び電磁弁７３を開にするとともに、電磁弁８５を閉にして、図示しない発電装置への水素の供給をバッファタンク８０から水溶液貯蔵部１０に切り替える。 When the pressure in the upper space US of the aqueous solution storage unit 10 reaches a predetermined first pressure (the required primary pressure), the control unit of the hydrogen generator 2 opens the electromagnetic valves 71 and 73, The electromagnetic valve 85 is closed, and the supply of hydrogen to the power generator (not shown) is switched from the buffer tank 80 to the aqueous solution storage unit 10.
なお、上述のように、本実施形態では、原料２１と水溶液１１の反応効率が良いため、図示しない発電装置に水素を供給することに伴う水溶液貯蔵部１０の上部空間ＵＳ内の圧力の低下を抑制するための制御も行いやすい。 As described above, in the present embodiment, since the reaction efficiency between the raw material 21 and the aqueous solution 11 is high, the decrease in the pressure in the upper space US of the aqueous solution storage unit 10 due to the supply of hydrogen to the power generation device (not shown) is prevented. Control for suppression is also easy to perform.
また、十分に用意された水溶液１１に向けて原料２１を供給する形態であるため、その高い反応効率を持続的に維持することが可能である。 In addition, since the raw material 21 is supplied to the sufficiently prepared aqueous solution 11, the high reaction efficiency can be continuously maintained.
一方、水素発生装置２の制御部は、水溶液貯蔵部１０から図示しない発電装置に水素を供給する状態のときに、何らかの原因で水溶液貯蔵部１０の上部空間ＵＳ内の圧力が水素の供給に適さない圧力まで低下しそうな場合、再び、電磁弁７１を閉にするとともに電磁弁８５を開にして、発電装置への水素の供給を停止させることなく、水溶液貯蔵部１０の上部空間ＵＳ内の圧力の復旧を行う。 On the other hand, when the control unit of the hydrogen generator 2 supplies hydrogen from the aqueous solution storage unit 10 to the power generation device (not shown), the pressure in the upper space US of the aqueous solution storage unit 10 becomes unsuitable for supplying hydrogen for some reason. If the pressure is likely to drop to an unsatisfactory level, the solenoid valve 71 is closed and the solenoid valve 85 is opened again to stop the supply of hydrogen to the power generator without stopping the pressure in the upper space US of the aqueous solution storage unit 10. Perform recovery.
そして、水素発生装置２の制御部は、図示しない発電装置から水素の供給停止の要求（指令）を受けると、水素発生装置２の動作を停止させる前に、バッファタンク８０内の圧力を確認し、バッファタンク８０に水素の充填が必要であれば、その充填を行ってから水素発生装置２の動作を停止させる処理を行う。
一方、水素発生装置２の制御部は、バッファタンク８０に水素の充填が必要ない場合には、充填を行わずに水素発生装置２の動作を停止させる処理を行う。
When the control unit of the hydrogen generator 2 receives a request (command) for stopping the supply of hydrogen from a power generator (not shown), it checks the pressure in the buffer tank 80 before stopping the operation of the hydrogen generator 2. If the buffer tank 80 needs to be filled with hydrogen, a process of stopping the operation of the hydrogen generator 2 is performed after the filling.
On the other hand, when it is not necessary to fill the buffer tank 80 with hydrogen, the control unit of the hydrogen generator 2 performs a process of stopping the operation of the hydrogen generator 2 without performing filling.
なお、本実施形態では、バッファ機構３を設けることで、図示しない発電装置への水素の供給開始時の水素供給の迅速性、及び、水素供給中の水素供給量安定性を、一層、高めたものになっている。 In the present embodiment, the provision of the buffer mechanism 3 further enhances the speed of hydrogen supply at the start of supply of hydrogen to the power generator (not shown) and the stability of the amount of hydrogen supply during hydrogen supply. It has become something.
しかしながら、先に説明したように、本実施形態では、水溶液貯蔵部１０に貯められた大量の水溶液１１に向けて原料２１を供給することで、原料２１と水溶液１１の反応効率が高いものとなっており、図示しない発電装置への水素の供給開始時において、速やかに必要な量の水素を発生させやすく、また、水素供給中の水素供給量の制御性も高いものとなっているため、バッファ機構３を設けることが必須の要件というわけではなく、バッファ機構３を省略してもよい。
なお、さらに、原料２１と水溶液１１の反応効率が高いものとするために、水素発生装置２が水溶液１１の温度を高める温調手段（例えば、水溶液１１が沸騰しない程度の温度範囲内で水溶液１１を加熱する温調手段）を備えていてもよい。
However, as described above, in the present embodiment, by supplying the raw material 21 toward the large amount of the aqueous solution 11 stored in the aqueous solution storage unit 10, the reaction efficiency between the raw material 21 and the aqueous solution 11 becomes high. At the start of the supply of hydrogen to the power generator (not shown), the required amount of hydrogen is easily generated quickly, and the controllability of the hydrogen supply during hydrogen supply is high. The provision of the mechanism 3 is not an essential requirement, and the buffer mechanism 3 may be omitted.
In order to further increase the reaction efficiency between the raw material 21 and the aqueous solution 11, the hydrogen generator 2 may use a temperature control means for increasing the temperature of the aqueous solution 11 (for example, within a temperature range where the aqueous solution 11 does not boil). (A temperature control means for heating).
（第２実施形態）
次に図２を参照しながら第２実施形態の発電システム１について説明する。
図２は、本発明に係る第２実施形態の発電システム１を説明するための断面図である。
(2nd Embodiment)
Next, a power generation system 1 according to a second embodiment will be described with reference to FIG.
FIG. 2 is a cross-sectional view illustrating a power generation system 1 according to a second embodiment of the present invention.
第１実施形態では、図示しない発電装置が水素を燃料としてタービンを駆動させるタービン発電機を想定していた。 In the first embodiment, a turbine generator in which a power generation device (not shown) drives a turbine using hydrogen as fuel has been assumed.
一方、第２実施形態では、図示しない発電装置が一般的な燃料電池である場合を想定しており、第１実施形態の構成に対して、発電装置に燃料電池を用いる場合に適する構成を付加したものになっている。 On the other hand, in the second embodiment, it is assumed that a power generator not shown is a general fuel cell, and a configuration suitable for using a fuel cell as the power generator is added to the configuration of the first embodiment. It has become.
このため第２実施形態の発電システム１も基本的な構成は、第１実施形態と同様であるため、以下では、主に異なる点について説明し、同様の点については説明を省略する場合がある。 For this reason, the basic configuration of the power generation system 1 of the second embodiment is the same as that of the first embodiment, and therefore, different points will be mainly described below, and description of the same points may be omitted. .
図２に示すように、第２実施形態の発電システム１は、第１実施形態の構成に加え、減圧弁７２からバッファ機構３（より具体的には、引込分岐ライン８１）に至るまでに水溶液貯蔵部１０から図示しない発電装置（及びバッファ機構３）に向かって供給される水素の純度を高める純化機構４を備えている。 As shown in FIG. 2, in addition to the configuration of the first embodiment, the power generation system 1 according to the second embodiment includes an aqueous solution from the pressure reducing valve 72 to the buffer mechanism 3 (more specifically, from the drop branch line 81). A purification mechanism 4 for increasing the purity of hydrogen supplied from the storage unit 10 to the power generation device (and the buffer mechanism 3) (not shown) is provided.
なお、純化機構４の制御は、水素発生装置２の制御部が行う方がシンプルなものとなると考えられるため、水素発生装置２が純化機構４を含むものであってもよい。 Since the control of the purification mechanism 4 is considered to be simpler by the control unit of the hydrogen generator 2, the hydrogen generator 2 may include the purification mechanism 4.
純化機構４は、減圧弁７２と引込分岐ライン８１の間の水素供給部７０上に設けられた第１脱水部９１Ａ（例えば、モレキュラーシーブ）と、第１脱水部９１Ａよりも引込分岐ライン８１側となる水素供給部７０上に設けられた第１不純物気体除去部９２Ａと、減圧弁７２と第１脱水部９１Ａの間の水素供給部７０上に設けられた第１上流側電磁弁９３Ａと、第１不純物気体除去部９２Ａと引込分岐ライン８１の間の水素供給部７０上に設けられた第１下流側電磁弁９４Ａと、を備えている。 The purifying mechanism 4 includes a first dehydrating unit 91A (for example, a molecular sieve) provided on the hydrogen supply unit 70 between the pressure reducing valve 72 and the incoming branch line 81, and a side closer to the incoming branch line 81 than the first dewatering unit 91A. A first impurity gas removal unit 92A provided on the hydrogen supply unit 70 serving as a first supply unit, a first upstream electromagnetic valve 93A provided on the hydrogen supply unit 70 between the pressure reducing valve 72 and the first dehydration unit 91A, A first downstream solenoid valve 94A provided on the hydrogen supply unit 70 between the first impurity gas removal unit 92A and the incoming branch line 81;
なお、第１脱水部９１Ａと第１不純物気体除去部９２Ａとが純化機構４の第１純化部として機能する。
また、第１実施形態で触れたように、バッファ機構３は省略可能であるため、この場合には、引込分岐ライン８１や電磁弁７３は不要となる。
The first dehydrating unit 91A and the first impurity gas removing unit 92A function as a first purifying unit of the purifying mechanism 4.
Further, as mentioned in the first embodiment, the buffer mechanism 3 can be omitted, and in this case, the lead-in branch line 81 and the solenoid valve 73 become unnecessary.
このため、バッファ機構３が省略される場合には、純化機構４は、減圧弁７２と減圧弁７２よりも図示しない発電装置の間の水素供給部７０上に設けられた第１脱水部９１Ａ（例えば、モレキュラーシーブ）と、第１脱水部９１Ａよりも図示しない発電装置側となる水素供給部７０上に設けられた第１不純物気体除去部９２Ａと、減圧弁７２と第１脱水部９１Ａの間の水素供給部７０上に設けられた第１上流側電磁弁９３Ａと、第１不純物気体除去部９２Ａと図示しない発電装置の間の水素供給部７０上に設けられた第１下流側電磁弁９４Ａと、を備えるものとなる。 For this reason, when the buffer mechanism 3 is omitted, the purification mechanism 4 includes the first dehydrating unit 91A provided on the hydrogen supply unit 70 between the pressure reducing valve 72 and the power generator (not shown) rather than the pressure reducing valve 72. For example, a molecular sieve), a first impurity gas removal unit 92A provided on the hydrogen supply unit 70 on the power generation device side (not shown) with respect to the first dehydration unit 91A, and a pressure reducing valve 72 and the first dehydration unit 91A. A first upstream solenoid valve 93A provided on the hydrogen supply unit 70 of the first embodiment, and a first downstream solenoid valve 94A provided on the hydrogen supply unit 70 between the first impurity gas removal unit 92A and the power generation device (not shown). And
例えば、本実施形態では、第１脱水部９１Ａに低温（例えば１００℃以下程度）で露点の低い加熱気体を供給することで乾燥処理が可能なシリカゲル系のモレキュラーシーブを用いている。 For example, in the present embodiment, a silica gel molecular sieve that can be dried by supplying a heating gas having a low dew point at a low temperature (for example, about 100 ° C. or less) to the first dehydrating unit 91A is used.
このため、本実施形態では、純化機構４が、乾燥気体（例えば露点の低い窒素等の活性の低いガスや露点の低いヘリウム、アルゴン等の不活性ガス）の第１脱水部９１Ａへの供給の有無を制御する第１供給制御電磁弁９５Ａを有し、第１脱水部９１Ａと第１不純物気体除去部９２Ａの間の水素供給部７０に接続された乾燥気体供給ライン９５（乾燥気体供給配管ともいう。）と、乾燥気体を排気するときに開とされる第１排気制御電磁弁９６Ａを有し、第１上流側電磁弁９３Ａと第１脱水部９１Ａの間の水素供給部７０に接続された乾燥気体排気ライン９６（乾燥気体排気配管ともいう。）と、を備え、後ほど説明するように、一旦、第１脱水部９１Ａが水分を吸収しても、第１脱水部９１Ａの乾燥処理を行うことで水分の吸収性能を再生できるようになっている。
なお、乾燥気体は図示しない加熱装置で若干加熱され、室温（例えば２５℃）より高い温度（例えば、５０℃以上）であって１００℃以下の温度の状態で供給される。
For this reason, in the present embodiment, the purification mechanism 4 supplies the dry gas (for example, a low-activity gas such as nitrogen with a low dew point or an inert gas such as helium or argon with a low dew point) to the first dehydrating unit 91A. A dry gas supply line 95 (including a dry gas supply pipe) having a first supply control solenoid valve 95A for controlling the presence / absence and connected to the hydrogen supply unit 70 between the first dehydration unit 91A and the first impurity gas removal unit 92A. ) And a first exhaust control solenoid valve 96A that is opened when exhausting the dry gas, and is connected to the hydrogen supply unit 70 between the first upstream solenoid valve 93A and the first dehydration unit 91A. A dry gas exhaust line 96 (also referred to as a dry gas exhaust pipe) is provided. As will be described later, once the first dehydrating unit 91A absorbs moisture, the drying process of the first dehydrating unit 91A is performed. By regenerating moisture absorption performance by doing It has become to so that.
The drying gas is slightly heated by a heating device (not shown) and supplied at a temperature higher than room temperature (for example, 25 ° C.) (for example, 50 ° C. or higher) and 100 ° C. or lower.
また、本実施形態では、第１不純物気体除去部９２Ａに、例えば、原料２１を生成するための材料に塩化マグネシウムが用いられている場合、原料２１を生成するときに、未反応の状態で原料２１内に残留している塩化マグネシウム中の塩素に関連して発生する不純物気体（例えば、塩素ガス、塩酸ガス等）を除去できるケミカルフィルタを用いている。
なお、本実施形態では、第１不純物気体除去部９２Ａとして、塩素ガスを除去するフィルタと塩酸ガスを除去するフィルタを直列で並べるようにしている。
Further, in the present embodiment, for example, when magnesium chloride is used as a material for generating the raw material 21 in the first impurity gas removing unit 92A, the raw material 21 is generated in an unreacted state when the raw material 21 is generated. A chemical filter capable of removing impurity gas (for example, chlorine gas, hydrochloric acid gas, etc.) generated in association with chlorine in magnesium chloride remaining in 21 is used.
In the present embodiment, a filter for removing chlorine gas and a filter for removing hydrochloric acid gas are arranged in series as the first impurity gas removing unit 92A.
ただし、第１不純物気体除去部９２Ａは、水溶液貯蔵部１０で水素を発生させたときに、発生する不純物気体を除去することを目的としているので、どのようなケミカルフィルタを用いるかは、原料２１や水溶液１１に合わせて選択される。 However, since the first impurity gas removing section 92A is intended to remove the impurity gas generated when hydrogen is generated in the aqueous solution storage section 10, the type of the chemical filter to be used depends on the raw material 21. And the aqueous solution 11 are selected.
一方、本実施形態では、純化機構４は、一端が減圧弁７２と第１上流側電磁弁９３Ａの間の水素供給部７０に接続されるとともに、他端が第１下流側電磁弁９４Ａと引込分岐ライン８１の間の水素供給部７０に接続された迂回ライン７０Ａ（迂回配管ともいう。）を備えている。 On the other hand, in the present embodiment, one end of the purification mechanism 4 is connected to the hydrogen supply unit 70 between the pressure reducing valve 72 and the first upstream solenoid valve 93A, and the other end is connected to the first downstream solenoid valve 94A. A bypass line 70A (also referred to as a bypass pipe) connected to the hydrogen supply unit 70 between the branch lines 81 is provided.
なお、先に触れたように、バッファ機構３は省略可能であるため、この場合には、引込分岐ライン８１や電磁弁７３は不要となるため、迂回ライン７０Ａの他端は、第１下流側電磁弁９４Ａよりも図示しない発電装置側の水素供給部７０に接続されたものとなる。 As mentioned earlier, since the buffer mechanism 3 can be omitted, in this case, the drop branch line 81 and the solenoid valve 73 are not required, so the other end of the bypass line 70A is connected to the first downstream side. This is connected to the hydrogen supply unit 70 on the power generation device side (not shown) with respect to the solenoid valve 94A.
そして、純化機構４は、迂回ライン７０Ａ上に設けられた第２脱水部９１Ｂ（例えば、モレキュラーシーブ）と、第２脱水部９１Ｂよりも図示しない発電装置側となる迂回ライン７０Ａ上に設けられた第２不純物気体除去部９２Ｂと、第２脱水部９１Ｂより減圧弁７２側の迂回ライン７０Ａ上（第２脱水部９１Ｂより迂回ライン７０Ａの一端側の迂回ライン７０Ａ上）に設けられた第２上流側電磁弁９３Ｂと、第２不純物気体除去部９２Ｂより図示しない発電装置側の迂回ライン７０Ａ上（第２不純物気体除去部９２Ｂより迂回ライン７０Ａの他端側の迂回ライン７０Ａ上）に設けられた第２下流側電磁弁９４Ｂと、を備えている。 The purifying mechanism 4 is provided on a second dehydrating section 91B (for example, molecular sieve) provided on the bypass line 70A and on a bypass line 70A on the power generation device side (not shown) with respect to the second dehydrating section 91B. The second impurity gas removing unit 92B and the second upstream provided on the bypass line 70A on the pressure reducing valve 72 side from the second dehydrating unit 91B (on the bypass line 70A on one end side of the bypass line 70A from the second dehydrating unit 91B). The side solenoid valve 93B and the second impurity gas removal unit 92B are provided on a bypass line 70A on the power generation device side (not shown) (on the other side of the bypass line 70A from the second impurity gas removal unit 92B on the bypass line 70A). A second downstream solenoid valve 94B.
なお、第２脱水部９１Ｂと第２不純物気体除去部９２Ｂとが第１純化部と同様の役目を果たす純化機構４の第２純化部として機能し、第２脱水部９１Ｂには、第１脱水部９１Ａと同様に、低温（例えば１００℃以下程度）で露点の低い加熱気体を供給することで乾燥処理が可能なシリカゲル系のモレキュラーシーブが用いられている。 Note that the second dehydrating unit 91B and the second impurity gas removing unit 92B function as a second purifying unit of the purifying mechanism 4 that performs the same function as the first purifying unit. Similarly to the part 91A, a silica gel molecular sieve that can be dried by supplying a heating gas having a low dew point at a low temperature (for example, about 100 ° C. or less) is used.
また、第２不純物気体除去部９２Ｂにも第１不純物気体除去部９２Ａと同様に、塩素ガス、塩酸ガス等を除去できるケミカルフィルタが用いられ、具体的な構成においても、塩素ガスを除去するフィルタと塩酸ガスを除去するフィルタを直列で並べるものとしている。 Similarly to the first impurity gas removing section 92A, a chemical filter capable of removing chlorine gas, hydrochloric acid gas, etc. is used for the second impurity gas removing section 92B. And a filter for removing hydrochloric acid gas are arranged in series.
そして、乾燥気体供給ライン９５が第２脱水部９１Ｂと第２不純物気体除去部９２Ｂの間の迂回ライン７０Ａに接続されるとともに、乾燥気体排気ライン９６が第２上流側電磁弁９３Ｂと第２脱水部９１Ｂの間の迂回ライン７０Ａに接続され、純化機構４が、第１供給制御電磁弁９５Ａより迂回ライン７０Ａ側の乾燥気体供給ライン９５上に設けられ、乾燥気体（例えば露点の低い窒素等の活性の低いガスや露点の低いヘリウム、アルゴン等の不活性ガス）の第２脱水部９１Ｂへの供給の有無を制御する第２供給制御電磁弁９５Ｂと、乾燥気体排気ライン９６の第１排気制御電磁弁９６Ａより迂回ライン７０Ａ側の乾燥気体排気ライン９６上に設けられ、乾燥気体を排気するときに開とされる第２排気制御電磁弁９６Ｂと、を備えるものになっている。 The drying gas supply line 95 is connected to the bypass line 70A between the second dehydrating section 91B and the second impurity gas removing section 92B, and the drying gas exhaust line 96 is connected to the second upstream solenoid valve 93B and the second dehydrating section 93B. The purification mechanism 4 is connected to the detour line 70A between the sections 91B, and is provided on the drying gas supply line 95 on the detour line 70A side from the first supply control solenoid valve 95A, and the drying gas (for example, nitrogen or the like having a low dew point) is provided. A second supply control solenoid valve 95B for controlling whether or not a low-activity gas or an inert gas having a low dew point, such as helium or argon, is supplied to the second dehydrating section 91B; A second exhaust control electromagnetic valve 96B provided on the dry gas exhaust line 96 closer to the bypass line 70A than the electromagnetic valve 96A and opened when exhausting the dry gas. To have.
なお、乾燥気体供給ライン９５への乾燥気体の供給は、第１供給制御電磁弁９５Ａと第２供給制御電磁弁９５Ｂの間の乾燥気体供給ライン９５の位置で行われるようになっており、乾燥気体排気ライン９６からの乾燥気体の排気は、第１排気制御電磁弁９６Ａと第２排気制御電磁弁９６Ｂの間の乾燥気体排気ライン９６の位置で行われるようになっている。 The supply of the dry gas to the dry gas supply line 95 is performed at the position of the dry gas supply line 95 between the first supply control solenoid valve 95A and the second supply control solenoid valve 95B. The exhaust of the dry gas from the gas exhaust line 96 is performed at a position of the dry gas exhaust line 96 between the first exhaust control electromagnetic valve 96A and the second exhaust control electromagnetic valve 96B.
したがって、第２脱水部９１Ｂにおいても、一旦、第２脱水部９１Ｂが水分を吸収しても、第２脱水部９１Ｂの乾燥処理を行うことで水分の吸収性能を再生できるようになっている。 Therefore, even in the second dehydrating unit 91B, even if the second dehydrating unit 91B once absorbs water, the moisture absorbing performance can be regenerated by performing the drying process of the second dehydrating unit 91B.
次に、純化機構４の動作について説明する。
なお、この動作の説明は、水素が水溶液貯蔵部１０から図示しない発電装置又はバッファタンク８０に向けて供給されている状態であることを前提として行い、第１実施形態で説明した水素の供給開始時等の説明は省略するものとする。
Next, the operation of the purification mechanism 4 will be described.
Note that this operation is described on the assumption that hydrogen is being supplied from the aqueous solution storage unit 10 to the power generation device or the buffer tank 80 (not shown), and the supply of hydrogen described in the first embodiment is started. Description of time and the like will be omitted.
例えば、水素発生装置２の制御部は、第１上流側電磁弁９３Ａ及び第１下流側電磁弁９４Ａを開とし、第２上流側電磁弁９３Ｂ、第２下流側電磁弁９４Ｂ、第１供給制御電磁弁９５Ａ、及び、第１排気制御電磁弁９６Ａを閉として、水素が純化機構４の第１純化部（第１脱水部９１Ａ及び第１不純物気体除去部９２Ａ）を通過して図示しない発電装置に供給されるように制御しているときには、乾燥気体が第２脱水部９１Ｂを通過するように、第２供給制御電磁弁９５Ｂ、及び、第２排気制御電磁弁９６Ｂを開とする制御も行う。 For example, the control unit of the hydrogen generator 2 opens the first upstream solenoid valve 93A and the first downstream solenoid valve 94A, and opens the second upstream solenoid valve 93B, the second downstream solenoid valve 94B, and the first supply control. The electromagnetic valve 95A and the first exhaust control electromagnetic valve 96A are closed, and hydrogen passes through the first purifying section (the first dehydrating section 91A and the first impurity gas removing section 92A) of the purifying mechanism 4 to generate power (not shown). Is controlled to open the second supply control solenoid valve 95B and the second exhaust control solenoid valve 96B so that the dry gas passes through the second dehydrating section 91B. .
したがって、第１脱水部９１Ａが水素中の水分を吸収するように動作している間に、第２脱水部９１Ｂの乾燥処理が行われ、第２脱水部９１Ｂの水分を吸収する性能が再生される。 Therefore, while the first dehydrating unit 91A operates to absorb the moisture in the hydrogen, the drying process of the second dehydrating unit 91B is performed, and the performance of the second dehydrating unit 91B to absorb the moisture is reproduced. You.
一方、水素発生装置２の制御部は、所定の量の水素が第１脱水部９１Ａを通過すると、第２上流側電磁弁９３Ｂ、及び、第２下流側電磁弁９４Ｂを開とし、第１上流側電磁弁９３Ａ、第１下流側電磁弁９４Ａ、第２供給制御電磁弁９５Ｂ、及び、第２排気制御電磁弁９６Ｂを閉として、水素が純化機構４の第２純化部（第２脱水部９１Ｂ及び第２不純物気体除去部９２Ｂ）を通過して図示しない発電装置に供給されるように制御を切り替え、このときには、乾燥気体が第１脱水部９１Ａを通過するように、水素発生装置２の制御部は、第１供給制御電磁弁９５Ａ、及び、第１排気制御電磁弁９６Ａを開とする制御も行う。 On the other hand, when a predetermined amount of hydrogen passes through the first dehydrating unit 91A, the control unit of the hydrogen generator 2 opens the second upstream solenoid valve 93B and the second downstream solenoid valve 94B, and the first upstream The side solenoid valve 93A, the first downstream side solenoid valve 94A, the second supply control solenoid valve 95B, and the second exhaust control solenoid valve 96B are closed, and hydrogen is purified by the second purification section (second dehydration section 91B) of the purification mechanism 4. And the control is switched so that the dry gas passes through the first dehydrating unit 91A at this time so that the dry gas passes through the first dehydrating unit 91A. The unit also performs control to open the first supply control solenoid valve 95A and the first exhaust control solenoid valve 96A.
したがって、第２脱水部９１Ｂが水素中の水分を吸収するように動作している間に、第１脱水部９１Ａの乾燥処理が行われ、第１脱水部９１Ａの水分を吸収する性能が再生される。 Therefore, while the second dehydrating unit 91B operates to absorb the moisture in the hydrogen, the drying process of the first dehydrating unit 91A is performed, and the performance of the first dehydrating unit 91A to absorb the moisture is regenerated. You.
このように、純化機構４が、第１純化部（第１脱水部９１Ａ及び第１不純物気体除去部９２Ａ）と、第２純化部（第２脱水部９１Ｂ及び第２不純物気体除去部９２Ｂ）と、を備えるものとし、第１純化部を通過させて水素を図示しない発電装置又はバッファタンク８０に供給するときに第２純化部の第２脱水部９１Ｂが乾燥処理可能とされ、第２純化部を通過させて水素を図示しない発電装置又はバッファタンク８０に供給するときに第１純化部の第１脱水部９１Ａが乾燥処理可能とされているので、水素の図示しない発電装置又はバッファタンク８０への供給を停止させることなく、第１脱水部９１Ａ、及び、第２脱水部９１Ｂの再生処理を行うことができるようになっている。 As described above, the purifying mechanism 4 includes the first purifying section (the first dehydrating section 91A and the first impurity gas removing section 92A) and the second purifying section (the second dehydrating section 91B and the second impurity gas removing section 92B). The second dehydration unit 91B of the second purification unit can be dried when supplying hydrogen to the power generator or the buffer tank 80 (not shown) through the first purification unit, and the second purification unit When the hydrogen is supplied to the power generation device or the buffer tank 80 (not shown), the first dehydrating unit 91A of the first purification unit can be dried, so that the hydrogen is supplied to the power generation device or the buffer tank 80 (not shown). The regeneration processing of the first dehydrating unit 91A and the second dehydrating unit 91B can be performed without stopping the supply of water.
また、必要に応じて、第１純化部を通過させて水素を図示しない発電装置又はバッファタンク８０に供給するときに第２純化部の第２不純物気体除去部９２Ｂを交換し、第２純化部を通過させて水素を図示しない発電装置又はバッファタンク８０に供給するときに第１純化部の第１不純物気体除去部９２Ａを交換することも可能なため、第１不純物気体除去部９２Ａ、及び、第２不純物気体除去部９２Ｂの交換作業も水素の図示しない発電装置又はバッファタンク８０への供給を停止させることなく行うことができる。 Further, if necessary, when the hydrogen is supplied to the power generator or the buffer tank 80 (not shown) through the first purifying section, the second impurity gas removing section 92B of the second purifying section is replaced, and the second purifying section is replaced. When the hydrogen is supplied to the power generation device or the buffer tank 80 (not shown) by passing through the first purifying section, the first impurity gas removing section 92A of the first purifying section can be exchanged, so that the first impurity gas removing section 92A, The replacement operation of the second impurity gas removing unit 92B can also be performed without stopping the supply of hydrogen to the power generator (not shown) or the buffer tank 80.
そして、水素が水溶液貯蔵部１０から図示しない発電装置及びバッファ機構３に至るまでの間に、純化機構４が設けられているため、発電装置である燃料電池に純度の高い水素を供給することができる。 Further, since the purification mechanism 4 is provided between the aqueous solution storage unit 10 and the power generation device and the buffer mechanism 3 (not shown), high-purity hydrogen can be supplied to the fuel cell as the power generation device. it can.
以上、具体的な実施形態に基づいて、本発明について説明してきたが、本発明は、上記の具体的な実施形態に限定されるものではなく、適宜、変形や改良を施したものも本発明の技術的範囲に含まれるものであり、そのことは、当業者にとって特許請求の範囲の記載から明らかである。 As described above, the present invention has been described based on the specific embodiments. However, the present invention is not limited to the above-described specific embodiments, and may be appropriately modified or improved. , Which will be apparent to those skilled in the art from the description of the claims.
１ 発電システム
２ 水素発生装置
３ バッファ機構
４ 純化機構
１０ 水溶液貯蔵部
１１ 水溶液
１２ 上側レベルセンサ
１３ 下側レベルセンサ
１４ 仕切部
１４Ａ 貫通孔
１５ 排水口
１５Ａ 排水ライン
１５Ｂ 排水制御弁
１６ 給水口
１６Ａ 給水ライン
１６Ｂ 給水制御弁
１７ 原料受入孔
１８ 水素排出口
２０ 原料貯蔵部
２１ 原料
２２ 作業扉
２３ 原料供給孔
２４ 距離測定器
３０ 原料供給機構
３１ モータ
３２ 円板
３２Ａ、３２Ｂ 貫通孔
３３ シャフト
４０ 攪拌機構
４１ モータ
４２ プロペラ
４３ シャフト
５０ 緊急排気ライン
５１ 電磁弁
５２ 圧力測定装置
６１ 圧力測定装置
６２ 気体供給ライン
６３ 電磁弁
７０ 水素供給部
７０Ａ 迂回ライン
７１ 電磁弁
７２ 減圧弁
７３ 電磁弁
８０ バッファタンク
８１ 引込分岐ライン
８２ 昇圧装置
８３ 電磁弁
８４ 返送ライン
８５ 電磁弁
８６ 減圧弁
８７ 圧力測定装置
８８ 接続ライン
８９ 電磁弁
９１Ａ 第１脱水部
９１Ｂ 第２脱水部
９２Ａ 第１不純物気体除去部
９２Ｂ 第２不純物気体除去部
９３Ａ 第１上流側電磁弁
９３Ｂ 第２上流側電磁弁
９４Ａ 第１下流側電磁弁
９４Ｂ 第２下流側電磁弁
９５ 乾燥気体供給ライン
９５Ａ 第１供給制御電磁弁
９５Ｂ 第２供給制御電磁弁
９６ 乾燥気体排気ライン
９６Ａ 第１排気制御電磁弁
９６Ｂ 第２排気制御電磁弁
ＬＳ 下部空間
ＬＳＦ 水面
Ｏ 回転中心
ＵＳ 上部空間
ＵＳ１ 上側空間
DESCRIPTION OF SYMBOLS 1 Power generation system 2 Hydrogen generator 3 Buffer mechanism 4 Purification mechanism 10 Aqueous solution storage unit 11 Aqueous solution 12 Upper level sensor 13 Lower level sensor 14 Partition unit 14A Through hole 15 Drainage port 15A Drainage line 15B Drainage control valve 16 Water supply port 16A Water supply line 16B Water supply control valve 17 Raw material receiving hole 18 Hydrogen outlet 20 Raw material storage unit 21 Raw material 22 Work door 23 Raw material supply hole 24 Distance measuring device 30 Raw material supply mechanism 31 Motor 32 Disk 32A, 32B Through hole 33 Shaft 40 Stirring mechanism 41 Motor 42 Propeller 43 Shaft 50 Emergency exhaust line 51 Solenoid valve 52 Pressure measuring device 61 Pressure measuring device 62 Gas supply line 63 Solenoid valve 70 Hydrogen supply unit 70A Detour line 71 Solenoid valve 72 Pressure reducing valve 73 Solenoid valve 80 Buffer tank 81 Retraction branch line 82 Booster device 83 Solenoid valve 84 Sending line 85 Solenoid valve 86 Pressure reducing valve 87 Pressure measuring device 88 Connection line 89 Solenoid valve 91A First dehydrating section 91B Second dehydrating section 92A First impurity gas removing section 92B Second impurity gas removing section 93A First upstream electromagnetic valve 93B Second upstream solenoid valve 94A First downstream solenoid valve 94B Second downstream solenoid valve 95 Dry gas supply line 95A First supply control solenoid valve 95B Second supply control solenoid valve 96 Dry gas exhaust line 96A First exhaust control solenoid Valve 96B Second exhaust control solenoid valve LS Lower space LSF Water surface O Center of rotation US Upper space US1 Upper space
Claims (11)
前記発電システムは、
発電装置と、
前記発電装置に供給する前記水素を発生させる水素発生装置と、を備え、
前記水素発生装置は、
水溶液を貯蔵する水溶液貯蔵部と、
前記水溶液との反応で前記水素の発生が可能な状態のマグネシウムを含む原料を貯蔵する原料貯蔵部と、
前記原料貯蔵部から前記水溶液貯蔵部に向けて前記原料を供給する原料供給機構と、を備えることを特徴とする発電システム。 A power generation system using hydrogen,
The power generation system,
A power generator,
A hydrogen generator that generates the hydrogen to be supplied to the power generator,
The hydrogen generator,
An aqueous solution storage unit for storing the aqueous solution;
A raw material storage unit that stores a raw material containing magnesium in a state where the hydrogen can be generated in the reaction with the aqueous solution,
A power supply system for supplying the raw material from the raw material storage unit to the aqueous solution storage unit.
前記原料供給機構は、前記上部空間側から前記水溶液に向けて前記原料を供給するように設けられており、
前記水素発生装置は、
前記上部空間の圧力を測定する圧力測定装置と、
前記圧力測定装置の圧力の測定結果に基づいて、前記原料供給機構を駆動させ、前記水溶液に向けて供給する前記原料の供給量を制御する制御部と、を備えることを特徴とする請求項１に記載の発電システム。 The aqueous solution storage unit includes an upper space where the aqueous solution does not exist above the aqueous solution,
The raw material supply mechanism is provided to supply the raw material toward the aqueous solution from the upper space side,
The hydrogen generator,
A pressure measuring device for measuring the pressure of the upper space,
A control unit that drives the raw material supply mechanism based on a pressure measurement result of the pressure measurement device and controls a supply amount of the raw material supplied toward the aqueous solution. A power generation system according to claim 1.
前記上部空間の下側となる前記水溶液の存在する下部空間と、
前記下部空間内を上下に仕切る仕切部と、
前記仕切部より下側に設けられ、前記水溶液を排水する排水口と、
前記仕切部より上側に設けられ、前記水溶液を供給する給水口と、を備え、
前記仕切部は、前記原料と前記水溶液との反応で生成した副生成物が前記仕切部より下側に沈殿可能に設けられた複数の貫通孔を備えることを特徴とする請求項２に記載の発電システム。 The aqueous solution storage unit includes:
A lower space in which the aqueous solution is located below the upper space,
A partition part for vertically dividing the lower space,
A drain port provided below the partition portion to drain the aqueous solution,
A water supply port provided above the partition portion to supply the aqueous solution,
3. The partition according to claim 2, wherein the partition has a plurality of through-holes provided so that by-products generated by a reaction between the raw material and the aqueous solution can precipitate below the partition. 3. Power generation system.
前記排水口からの前記水溶液の排水を制御する排水制御弁と、
前記給水口からの前記水溶液の給水を制御する給水制御弁と、を備え、
前記制御部は、前記水溶液に向けて供給する前記原料の供給量に基づいて、前記排水制御弁、及び、前記給水制御弁を制御することを特徴とする請求項３に記載の発電システム。 The hydrogen generator,
A drainage control valve that controls drainage of the aqueous solution from the drainage port,
A water supply control valve for controlling water supply of the aqueous solution from the water supply port,
The power generation system according to claim 3, wherein the control unit controls the drainage control valve and the water supply control valve based on a supply amount of the raw material supplied toward the aqueous solution.
前記純化機構は、
第１脱水部及び第１不純物気体除去部を有する第１純化部と、
第２脱水部及び第２不純物気体除去部を有する第２純化部と、を備え、
前記第１純化部を通過させて前記水素を前記発電装置又は前記バッファ機構に供給するときに前記第２純化部の前記第２脱水部を乾燥処理可能とされ、前記第２純化部を通過させて前記水素を前記発電装置又は前記バッファ機構に供給するときに前記第１純化部の前記第１脱水部を乾燥処理可能とされていることを特徴とする請求項５に記載の発電システム。 The power generation system includes a purification mechanism provided between the aqueous solution storage unit and the hydrogen generator to reach the power generation device and the buffer mechanism,
The purification mechanism,
A first purification section having a first dehydration section and a first impurity gas removal section;
A second dehydration unit and a second purification unit having a second impurity gas removal unit,
When the hydrogen is supplied to the power generation device or the buffer mechanism by passing through the first purifying section, the second dehydrating section of the second purifying section can be dried and passed through the second purifying section. The power generation system according to claim 5, wherein the first dehydration unit of the first purification unit can be dried when supplying the hydrogen to the power generation device or the buffer mechanism.
前記純化機構は、
第１脱水部及び第１不純物気体除去部を有する第１純化部と、
第２脱水部及び第２不純物気体除去部を有する第２純化部と、を備え、
前記第１純化部を通過させて前記水素を前記発電装置に供給するときに前記第２純化部の前記第２脱水部が乾燥処理可能とされ、前記第２純化部を通過させて前記水素を前記発電装置に供給するときに前記第１純化部の前記第１脱水部が乾燥処理可能とされていることを特徴とする請求項１から請求項４のいずれか１項に記載の発電システム。 The power generation system includes a purification mechanism provided between the aqueous solution storage unit and the hydrogen to the power generation device,
The purification mechanism,
A first purification section having a first dehydration section and a first impurity gas removal section;
A second dehydration unit and a second purification unit having a second impurity gas removal unit,
When the hydrogen is supplied to the power generation device by passing through the first purification unit, the second dehydration unit of the second purification unit can be dried, and the hydrogen is passed through the second purification unit to remove the hydrogen. The power generation system according to any one of claims 1 to 4, wherein the first dehydration unit of the first purification unit is capable of performing a drying process when supplying the power to the power generation device.
前記水素発生装置は、
水溶液を貯蔵する水溶液貯蔵部と、
前記水溶液との反応で水素の発生が可能な状態のマグネシウムを含む原料を貯蔵する原料貯蔵部と、
前記原料貯蔵部から前記水溶液貯蔵部に向けて前記原料を供給する原料供給機構と、を備えることを特徴とする水素発生装置。 A hydrogen generator,
The hydrogen generator,
An aqueous solution storage unit for storing the aqueous solution;
A raw material storage unit for storing a raw material containing magnesium capable of generating hydrogen by reaction with the aqueous solution,
A hydrogen supply device for supplying the raw material from the raw material storage unit to the aqueous solution storage unit.
前記原料供給機構は、前記上部空間側から前記水溶液に向けて前記原料を供給するように設けられており、
前記水素発生装置は、
前記上部空間の圧力を測定する圧力測定装置と、
前記圧力測定装置の圧力の測定結果に基づいて、前記原料供給機構を駆動させ、前記水溶液に向けて供給する前記原料の供給量を制御する制御部と、を備えることを特徴とする請求項８に記載の水素発生装置。 The aqueous solution storage unit includes an upper space where the aqueous solution does not exist above the aqueous solution,
The raw material supply mechanism is provided to supply the raw material toward the aqueous solution from the upper space side,
The hydrogen generator,
A pressure measuring device for measuring the pressure of the upper space,
9. A control unit that drives the raw material supply mechanism based on a measurement result of the pressure of the pressure measuring device and controls a supply amount of the raw material supplied to the aqueous solution. The hydrogen generator according to item 1.
前記上部空間の下側となる前記水溶液の存在する下部空間と、
前記下部空間内を上下に仕切る仕切部と、
前記仕切部より下側に設けられ、前記水溶液を排水する排水口と、
前記仕切部より上側に設けられ、前記水溶液を供給する給水口と、を備え、
前記仕切部は、前記原料と前記水溶液との反応で生成した副生成物が前記仕切部より下側に沈殿可能に設けられた複数の貫通孔を備えることを特徴とする請求項９に記載の水素発生装置。 The aqueous solution storage unit includes:
A lower space in which the aqueous solution is located below the upper space,
A partition part for vertically dividing the lower space,
A drain port provided below the partition portion to drain the aqueous solution,
A water supply port provided above the partition portion to supply the aqueous solution,
10. The partition according to claim 9, wherein the partition has a plurality of through-holes provided so that a by-product generated by a reaction between the raw material and the aqueous solution can be precipitated below the partition. Hydrogen generator.
前記排水口から排水される前記水溶液の排水量を制御する排水制御弁と、
前記給水口から給水される前記水溶液の給水量を制御する給水制御弁と、を備え、
前記制御部は、前記水溶液に向けて供給する前記原料の供給量に基づいて、前記排水制御弁、及び、前記給水制御弁を制御することを特徴とする請求項１０に記載の発電システム。 The hydrogen generator,
A drainage control valve for controlling the drainage amount of the aqueous solution drained from the drainage port,
A water supply control valve that controls a water supply amount of the aqueous solution supplied from the water supply port,
The power generation system according to claim 10, wherein the control unit controls the drainage control valve and the water supply control valve based on a supply amount of the raw material supplied toward the aqueous solution.
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