JP2019075554A - 撮像装置 - Google Patents
撮像装置 Download PDFInfo
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- JP2019075554A JP2019075554A JP2018186654A JP2018186654A JP2019075554A JP 2019075554 A JP2019075554 A JP 2019075554A JP 2018186654 A JP2018186654 A JP 2018186654A JP 2018186654 A JP2018186654 A JP 2018186654A JP 2019075554 A JP2019075554 A JP 2019075554A
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- 238000003384 imaging method Methods 0.000 title claims abstract description 70
- 238000006243 chemical reaction Methods 0.000 claims abstract description 128
- 239000004065 semiconductor Substances 0.000 claims abstract description 74
- 239000000758 substrate Substances 0.000 claims abstract description 69
- 239000011368 organic material Substances 0.000 claims description 5
- 206010034972 Photosensitivity reaction Diseases 0.000 abstract 1
- 230000036211 photosensitivity Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 106
- 238000004088 simulation Methods 0.000 description 21
- 239000010408 film Substances 0.000 description 18
- 230000009467 reduction Effects 0.000 description 12
- 230000007423 decrease Effects 0.000 description 11
- 239000011229 interlayer Substances 0.000 description 10
- 238000001514 detection method Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 206010034960 Photophobia Diseases 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 208000013469 light sensitivity Diseases 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- ORQBXQOJMQIAOY-UHFFFAOYSA-N nobelium Chemical compound [No] ORQBXQOJMQIAOY-UHFFFAOYSA-N 0.000 description 3
- 238000013041 optical simulation Methods 0.000 description 3
- 230000008832 photodamage Effects 0.000 description 3
- 230000003321 amplification Effects 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14603—Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14603—Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
- H01L27/14605—Structural or functional details relating to the position of the pixel elements, e.g. smaller pixel elements in the center of the imager compared to pixel elements at the periphery
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14625—Optical elements or arrangements associated with the device
- H01L27/14627—Microlenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14634—Assemblies, i.e. Hybrid structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14636—Interconnect structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
- H01L27/14645—Colour imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14665—Imagers using a photoconductor layer
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/80—Constructional details
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K39/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic radiation-sensitive element covered by group H10K30/00
- H10K39/30—Devices controlled by radiation
- H10K39/32—Organic image sensors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1462—Coatings
- H01L27/14621—Colour filter arrangements
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Abstract
Description
開示された実施形態の追加的な効果および利点は、明細書および図面から明らかになる。効果および/または利点は、明細書および図面に開示の様々な実施形態または特徴によって個々に提供され、これらの1つ以上を得るために全てを必要とはしない。
イメージセンサにおいて、光感度が重視されている。光感度を高めるために、一般的にマイクロレンズが用いられる。図1は、マイクロレンズを搭載した、参考例に係るイメージセンサ101の概略断面図である。イメージセンサ101には、受光素子102以外の領域103に光が入射されることを防止するために、層間絶縁膜105内に光遮蔽層104が形成されている。層間絶縁膜105上には、カラーフィルター106a、106b、106cを含むカラーフィルター層106が形成されている。カラーフィルター層106の上には、平坦化または光透過度の向上を目的として、平坦な上面を有する保護絶縁膜107が形成されている。保護絶縁膜107上には、光を集光するためのマイクロレンズ108が形成されている。
第1面を有する半導体基板と、
前記半導体基板の前記第1面の上方に位置するマイクロレンズと、
前記半導体基板の前記第1面と前記マイクロレンズとの間に位置し、それぞれが、第1電極と、前記第1電極よりも前記マイクロレンズに近い第2電極と、
前記第1電極と前記第2電極との間に位置し、光を電荷に変換する光電変換層とを有する、少なくとも一つの光電変換部と、
を備え、
前記マイクロレンズの焦点は、前記少なくとも一つの光電変換部のうち前記半導体基板の前記第1面に最も近い第1の光電変換部の前記光電変換層の最下面よりも下方に位置する、
撮像装置。
前記マイクロレンズの前記焦点は、前記第1の光電変換部の前記光電変換層の前記最下面と前記半導体基板の前記第1面との間に位置する、項目1に記載の撮像装置。
前記半導体基板の前記第1面と前記第1の光電変換部の前記光電変換層との間に位置する配線層をさらに備え、
前記マイクロレンズの前記焦点は、平面視において前記配線層と重なる、項目1または2に記載の撮像装置。
前記マイクロレンズと前記光電変換部との間に位置するカラーフィルターをさらに備える、項目1から3のいずれか1項に記載の撮像装置。
前記少なくとも一つの光電変換部は、前記第1の光電変換部と前記マイクロレンズとの間に位置する第2の光電変換部を含む、項目1から4のいずれか1項に記載の撮像装置。
前記光電変換層は有機材料を含む、項目1から4のいずれか1項に記載の撮像装置。
図2は、本実施の形態に係る撮像装置200の断面図である。
201 層間絶縁層
202、402 下部電極
203、403 光電変換層
204、404 上部電極
205、405 絶縁膜
206a 緑カラーフィルター
206b 青カラーフィルター
206c 赤カラーフィルター
206 カラーフィルター層
207 平坦化膜
208 マイクロレンズ
209 信号検出部
210 半導体基板
211 画素
212、412 光電変換部
Claims (6)
- 第1面を有する半導体基板と、
前記半導体基板の前記第1面の上方に位置するマイクロレンズと、
前記半導体基板の前記第1面と前記マイクロレンズとの間に位置し、それぞれが、第1電極と、前記第1電極よりも前記マイクロレンズに近い第2電極と、
前記第1電極と前記第2電極との間に位置し、光を電荷に変換する光電変換層とを有する、少なくとも一つの光電変換部と、
を備え、
前記マイクロレンズの焦点は、前記少なくとも一つの光電変換部のうち前記半導体基板の前記第1面に最も近い第1の光電変換部の前記光電変換層の最下面よりも下方に位置する、
撮像装置。 - 前記マイクロレンズの前記焦点は、前記第1の光電変換部の前記光電変換層の前記最下面と前記半導体基板の前記第1面との間に位置する、
請求項1に記載の撮像装置。 - 前記半導体基板の前記第1面と前記第1の光電変換部の前記光電変換層との間に位置する配線層をさらに備え、
前記マイクロレンズの前記焦点は、平面視において前記配線層と重なる、
請求項1または請求項2に記載の撮像装置。 - 前記マイクロレンズと前記光電変換部との間に位置するカラーフィルターをさらに備える、請求項1から請求項3のいずれか一項に記載の撮像装置。
- 前記少なくとも一つの光電変換部は、前記第1の光電変換部と前記マイクロレンズとの間に位置する第2の光電変換部を含む、
請求項1から請求項4のいずれか一項に記載の撮像装置。 - 前記光電変換層は有機材料を含む、
請求項1から請求項5のいずれか一項に記載の撮像装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2017200556 | 2017-10-16 | ||
JP2017200556 | 2017-10-16 |
Publications (2)
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JP2019075554A true JP2019075554A (ja) | 2019-05-16 |
JP7474943B2 JP7474943B2 (ja) | 2024-04-26 |
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JP2018186654A Active JP7474943B2 (ja) | 2017-10-16 | 2018-10-01 | 撮像装置 |
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US (3) | US10847555B2 (ja) |
JP (1) | JP7474943B2 (ja) |
CN (1) | CN109671730A (ja) |
Cited By (1)
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WO2023002949A1 (ja) * | 2021-07-21 | 2023-01-26 | 凸版印刷株式会社 | 固体撮像素子 |
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EP3869564A1 (en) * | 2020-02-18 | 2021-08-25 | Imec VZW | Spectral sensors |
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2018
- 2018-09-27 CN CN201811132204.5A patent/CN109671730A/zh active Pending
- 2018-09-27 US US16/145,008 patent/US10847555B2/en active Active
- 2018-10-01 JP JP2018186654A patent/JP7474943B2/ja active Active
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2020
- 2020-10-22 US US17/077,013 patent/US11594562B2/en active Active
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2023
- 2023-01-26 US US18/101,834 patent/US20230170358A1/en active Pending
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WO2016013410A1 (ja) * | 2014-07-22 | 2016-01-28 | ソニー株式会社 | 固体撮像素子および電子機器 |
JP2016192645A (ja) * | 2015-03-31 | 2016-11-10 | 株式会社ニコン | 撮像素子、焦点調節装置および撮像装置 |
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WO2023002949A1 (ja) * | 2021-07-21 | 2023-01-26 | 凸版印刷株式会社 | 固体撮像素子 |
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