JP2018526254A - Sls設備又はslm設備の少なくとも1つの走査システムを較正するための方法 - Google Patents
Sls設備又はslm設備の少なくとも1つの走査システムを較正するための方法 Download PDFInfo
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Abstract
Description
2 構造フィールド
3 レーザ
4 ビーム
5 ビームスプリッタ
6a/b 走査格子、走査システム
7 プロセッサ及びメモリ
8a/b 走査格子
8c/d 位置ラインパターン
9 較正されたカメラ
10 出口
11 入口
15 ディスプレイ
16 キーボード
Claims (11)
- レーザ焼結(SLS)設備又はレーザ溶融(SLM)設備(1)の少なくとも1つの走査システム(6a/6b)を較正するための方法であって、前記設備内では、構造過程において構造フィールドで焼結可能な又は溶融可能な構造材料を溶解又は溶融させ、これによりこの冷却後に選択的に凝固化させるために、少なくとも1つのビーム源、特にレーザ(3)の、焦点が集められたビーム(4)が前記少なくとも1つの走査システム(6a/6b)を用いて構造フィールド(2)へ偏向される、前記方法において、
以下の較正方法ステップ:
−少なくとも1つのラインパターン、特に走査格子(8a/8b)を前記少なくとも1つの走査システム(6a/6b)によって前記構造フィールド(2)の平面内の表面に生成するステップであって、
−前記ラインパターンが該ラインパターンを表示する平面要素上に一時的に、又は永続的に映写され、その像が、前記少なくとも1つのラインパターンの生成中に、又は、次に、前記構造フィールド(2)の上方に配置された較正されたカメラ(9)によって検出されメモリ(7)に読み込まれるか、又は
−前記少なくとも1つのラインパターンが、既に設けられた目標ラインパターンを有する較正プレートの表面へ映写され、前記少なくとも1つの走査システム(6a/6b)によって生成される前記ラインパターンの前記目標ラインパターンとの差異が、前記構造フィールド(2)の上方に配置されたカメラ(9)によって検出され、メモリ(7)に読み込まれる、上記ステップと、
−前記ラインパターン、特に前記走査格子(8a/8b)のあり得るひずみの補正のために必要な情報を含む、本質的に1つの走査システム(6a/6b)に関する補正データの演算によって前記リニアパターンのフィールド補正を行うステップと、
−結像エラーを回避するために前記ラインパターンをその後補正するステップと
を行うことを特徴とする方法。 - −1つかつ同一の構造フィールド(2)の上方に複数の走査システム(6a/6b)がある場合に、前記ラインパターンのひずみの補正後、露光と、前記構造フィールド(2)の上方における較正されたカメラ(9)を用いて、それぞれ複数の走査システム(6a/6b)の、あり得るひずみについて既に補正されている位置ラインパターン、特に位置格子(8c,8d)の読み込みとが行われること、
−回転、オフセット、スケーリング及び/又は前記システム(6a/6b)についての互いに対する変位に関する別の補正データを、該別の補正データを複数の走査システム(6a/6b)に適用することで、複数の走査システム(6a/6b)及びこれら走査システムによって生成された位置格子(8c,8d)の相互の整向及び調節が互いに対してなされるように演算すること
を特徴とする請求項1に記載の方法。 - 前記別の補正データの前記演算が、各走査システム(6a/6b)について個別に行われることを特徴とする請求項1又は2に記載の方法。
- 各走査システム(6a/6b)について算出された補正データが、全てのシステム(6a/6b)に関する全体補正データセットへ統合されることを特徴とする請求項3に記載の方法。
- 前記別の補正データの前記演算が、前記構造フィールド(2)の外側の境界に関して行われることを特徴とする請求項2又は3に記載の方法。
- 互いに並んで配置された走査システム(6a/6b)の前記位置ラインパターン(8c,8d)が、範囲ごとに重なることを特徴とする請求項2〜5のいずれか1項に記載の方法。
- 互いに隣接する走査システム(6a/6b)の前記位置ラインパターン(8c,8d)が、不連続に互いに並んで配置されていることを特徴とする請求項2〜5のいずれか1項に記載の方法。
- 互いに隣接する位置ラインパターン(8c,8d)又範囲ごとに重なる位置ラインパターン(8c,8d)の相互の回転、相互のオフセット、相互のスケーリング若しくは変位についての差異が数字によってディスプレイ(15)に表示されることを特徴とする請求項2〜7のいずれか1項に記載の方法。
- 走査システム(6a/6b)のレーザビーム(4)が、前記構造フィールド(2)の上方におけるカメラ(9)によって検出可能な、永続的に視認可能なラインパターン又は位置ラインパターン(8c,8d)を積層部において生成するように、平面要素が積層されていることを特徴とする請求項1〜8のいずれか1項に記載の方法。
- 較正プレートを使用する場合に、一時的に前記較正プレートの表面上で視認可能で、前記構造フィールド(2)の上方における前記カメラ(9)によって検出可能なラインパターンの、前記較正プレートの表面へ永続的にもたらされる目標パターンとの差異が測定され、該差異が、前記走査システム(6a/6b)によって一時的に生成されるラインパターンが前記目標ラインパターンと一致するように補正されることを特徴とする請求項1〜9のいずれか1項に記載の方法。
- 1つのみの走査システム(6a/6b)を備える場合に、回転、スケーリング及び変位についての算出された補正値が、構造チャンバ内におけるラインパターンの位置又は構造チャンバエッジ部に関するものであることを特徴とする請求項1〜10のいずれか1項に記載の方法。
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DE102016106403.3 | 2016-04-07 | ||
DE102016106403.3A DE102016106403A1 (de) | 2016-04-07 | 2016-04-07 | Verfahren zur Kalibrierung wenigstens eines Scannsystems, einer SLS- oder SLM-Anlage |
PCT/EP2017/052273 WO2017174226A1 (de) | 2016-04-07 | 2017-02-02 | Verfahren zur kalibrierung wenigstens eines scannsystems, einer sls- oder slm-anlage |
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US (1) | US11014196B2 (ja) |
EP (1) | EP3439854B1 (ja) |
JP (1) | JP6591068B2 (ja) |
CN (1) | CN107708971B (ja) |
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2017
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- 2017-02-02 EP EP17703945.0A patent/EP3439854B1/de active Active
- 2017-02-02 US US16/083,840 patent/US11014196B2/en active Active
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EP0186625A1 (de) * | 1984-12-20 | 1986-07-02 | Schweizerische Aluminium Ag | Fahrzeug-Chassis |
JPH09511854A (ja) * | 1994-10-18 | 1997-11-25 | イーオーエス ゲゼルシャフト ミット ベシュレンクテル ハフツング イレクトロ オプティカル システムズ | レーザビームを偏向させるための制御装置を較正するための方法および装置 |
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JP2022545820A (ja) * | 2019-08-27 | 2022-10-31 | エスエルエム ソルーションズ グループ アーゲー | 機器と装置 |
JP7385743B2 (ja) | 2019-08-27 | 2023-11-22 | エスエルエム ソルーションズ グループ アーゲー | 機器と装置 |
Also Published As
Publication number | Publication date |
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CN107708971B (zh) | 2020-12-22 |
WO2017174226A1 (de) | 2017-10-12 |
EP3439854B1 (de) | 2020-08-05 |
US20190134747A1 (en) | 2019-05-09 |
JP6591068B2 (ja) | 2019-10-16 |
EP3439854A1 (de) | 2019-02-13 |
DE102016106403A1 (de) | 2017-10-12 |
US11014196B2 (en) | 2021-05-25 |
CN107708971A (zh) | 2018-02-16 |
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