JP2017110293A - カーボン膜の成膜方法および成膜装置 - Google Patents
カーボン膜の成膜方法および成膜装置 Download PDFInfo
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- JP2017110293A JP2017110293A JP2016219861A JP2016219861A JP2017110293A JP 2017110293 A JP2017110293 A JP 2017110293A JP 2016219861 A JP2016219861 A JP 2016219861A JP 2016219861 A JP2016219861 A JP 2016219861A JP 2017110293 A JP2017110293 A JP 2017110293A
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- Prior art keywords
- carbon film
- film forming
- gas
- etching
- carbon
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- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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US15/377,141 US20170170065A1 (en) | 2015-12-15 | 2016-12-13 | Carbon film forming method, carbon film forming apparatus, and storage medium |
Applications Claiming Priority (2)
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JP2015244234 | 2015-12-15 | ||
JP2015244234 | 2015-12-15 |
Publications (2)
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JP2017110293A true JP2017110293A (ja) | 2017-06-22 |
JP2017110293A5 JP2017110293A5 (zh) | 2019-07-11 |
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Family Applications (1)
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JP2016219861A Pending JP2017110293A (ja) | 2015-12-15 | 2016-11-10 | カーボン膜の成膜方法および成膜装置 |
Country Status (1)
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JP (1) | JP2017110293A (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021504936A (ja) * | 2017-11-27 | 2021-02-15 | インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Machines Corporation | 超電導部分tsvを用いたトランスモン・キュービット用の後面結合 |
WO2022185916A1 (ja) * | 2021-03-02 | 2022-09-09 | 東京エレクトロン株式会社 | 成膜方法、処理装置及び処理システム |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014033186A (ja) * | 2012-07-09 | 2014-02-20 | Tokyo Electron Ltd | カーボン膜の成膜方法および成膜装置 |
US20140094035A1 (en) * | 2012-05-18 | 2014-04-03 | Novellus Systems, Inc. | Carbon deposition-etch-ash gap fill process |
-
2016
- 2016-11-10 JP JP2016219861A patent/JP2017110293A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20140094035A1 (en) * | 2012-05-18 | 2014-04-03 | Novellus Systems, Inc. | Carbon deposition-etch-ash gap fill process |
JP2014033186A (ja) * | 2012-07-09 | 2014-02-20 | Tokyo Electron Ltd | カーボン膜の成膜方法および成膜装置 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021504936A (ja) * | 2017-11-27 | 2021-02-15 | インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Machines Corporation | 超電導部分tsvを用いたトランスモン・キュービット用の後面結合 |
JP7212439B2 (ja) | 2017-11-27 | 2023-01-25 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 超電導部分tsvを用いたトランスモン・キュービット用の後面結合 |
WO2022185916A1 (ja) * | 2021-03-02 | 2022-09-09 | 東京エレクトロン株式会社 | 成膜方法、処理装置及び処理システム |
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