JP2016515950A - 低放射率の多層で被覆された基材 - Google Patents
低放射率の多層で被覆された基材 Download PDFInfo
- Publication number
- JP2016515950A JP2016515950A JP2015559539A JP2015559539A JP2016515950A JP 2016515950 A JP2016515950 A JP 2016515950A JP 2015559539 A JP2015559539 A JP 2015559539A JP 2015559539 A JP2015559539 A JP 2015559539A JP 2016515950 A JP2016515950 A JP 2016515950A
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- JP
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- Prior art keywords
- film
- substrate
- oxide
- multilayer
- transparent conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000758 substrate Substances 0.000 title claims abstract description 106
- 239000000463 material Substances 0.000 claims abstract description 30
- 230000004888 barrier function Effects 0.000 claims abstract description 21
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 14
- 239000001301 oxygen Substances 0.000 claims abstract description 14
- 239000010409 thin film Substances 0.000 claims abstract description 13
- 229910052751 metal Inorganic materials 0.000 claims abstract description 6
- 239000002184 metal Substances 0.000 claims abstract description 6
- 239000010408 film Substances 0.000 claims description 198
- 239000011521 glass Substances 0.000 claims description 47
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 38
- 238000005452 bending Methods 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 25
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 20
- 239000011229 interlayer Substances 0.000 claims description 19
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 18
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 18
- 239000000377 silicon dioxide Substances 0.000 claims description 16
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 16
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- 230000001186 cumulative effect Effects 0.000 claims description 10
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- 238000005728 strengthening Methods 0.000 claims description 8
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
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- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 6
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- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 4
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- 239000010955 niobium Substances 0.000 claims description 4
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 4
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- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 3
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- 239000000203 mixture Substances 0.000 claims description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 3
- 229910001887 tin oxide Inorganic materials 0.000 claims description 3
- 239000011787 zinc oxide Substances 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052787 antimony Inorganic materials 0.000 claims description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 2
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910000416 bismuth oxide Inorganic materials 0.000 claims description 2
- 229910052793 cadmium Inorganic materials 0.000 claims description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 2
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 claims description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910000484 niobium oxide Inorganic materials 0.000 claims description 2
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 2
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims description 2
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- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 claims description 2
- BNEMLSQAJOPTGK-UHFFFAOYSA-N zinc;dioxido(oxo)tin Chemical compound [Zn+2].[O-][Sn]([O-])=O BNEMLSQAJOPTGK-UHFFFAOYSA-N 0.000 claims description 2
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 claims description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 229940071182 stannate Drugs 0.000 claims 1
- 239000012528 membrane Substances 0.000 description 38
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 25
- 238000005496 tempering Methods 0.000 description 13
- 230000005855 radiation Effects 0.000 description 11
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 10
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- 238000000576 coating method Methods 0.000 description 6
- KYKLWYKWCAYAJY-UHFFFAOYSA-N oxotin;zinc Chemical compound [Zn].[Sn]=O KYKLWYKWCAYAJY-UHFFFAOYSA-N 0.000 description 6
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- 230000005540 biological transmission Effects 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 239000002019 doping agent Substances 0.000 description 5
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 4
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- 230000003287 optical effect Effects 0.000 description 4
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- 239000004332 silver Substances 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
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- 238000002425 crystallisation Methods 0.000 description 3
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- 230000006870 function Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000004408 titanium dioxide Substances 0.000 description 3
- 238000013519 translation Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
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- 238000004140 cleaning Methods 0.000 description 2
- 229910000428 cobalt oxide Inorganic materials 0.000 description 2
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 2
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- 125000006850 spacer group Chemical group 0.000 description 2
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- 229910052786 argon Inorganic materials 0.000 description 1
- CFJRGWXELQQLSA-UHFFFAOYSA-N azanylidyneniobium Chemical compound [Nb]#N CFJRGWXELQQLSA-UHFFFAOYSA-N 0.000 description 1
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- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
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- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- HEHINIICWNIGNO-UHFFFAOYSA-N oxosilicon;titanium Chemical compound [Ti].[Si]=O HEHINIICWNIGNO-UHFFFAOYSA-N 0.000 description 1
- DOVLZBWRSUUIJA-UHFFFAOYSA-N oxotin;silicon Chemical compound [Si].[Sn]=O DOVLZBWRSUUIJA-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
- B32B17/10005—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
- B32B17/10165—Functional features of the laminated safety glass or glazing
- B32B17/10174—Coatings of a metallic or dielectric material on a constituent layer of glass or polymer
- B32B17/10201—Dielectric coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
- B32B17/10005—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
- B32B17/1055—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer
- B32B17/10761—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer containing vinyl acetal
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
- B32B17/10005—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
- B32B17/1055—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer
- B32B17/1077—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer containing polyurethane
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B23/00—Re-forming shaped glass
- C03B23/02—Re-forming glass sheets
- C03B23/023—Re-forming glass sheets by bending
- C03B23/0235—Re-forming glass sheets by bending involving applying local or additional heating, cooling or insulating means
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B25/00—Annealing glass products
- C03B25/02—Annealing glass products in a discontinuous way
- C03B25/025—Glass sheets
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B27/00—Tempering or quenching glass products
- C03B27/012—Tempering or quenching glass products by heat treatment, e.g. for crystallisation; Heat treatment of glass products before tempering by cooling
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
- C23C14/5813—Thermal treatment using lasers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
- C03C2217/948—Layers comprising indium tin oxide [ITO]
-
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
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Abstract
Description
・例えばシリカをベースとする、又は本質的にシリカからなる、固着膜、
・第1のTCO(特にITO)膜、
・例えばシリカ、窒化ケイ素又は亜鉛スズ酸化物をベースとする、又は本質的にこれからなる、誘電性中間膜、
・第2のTCO(特にITO)膜、
・例えば窒化ケイ素をベースとする、又は本質的にこれからなる、酸素バリア膜、及び、
・例えばケイ素をベースとする、又は本質的にこれからなる、低屈折率膜、
を含む(又はこれらからなる)。
・例えばシリカをベースとする、又は本質的にシリカからなる、(任意選択的な)固着膜、
・中性化膜又は中性化多層(特に高屈折率膜、次に低屈折率膜)、例えば本質的に窒化ケイ素からなる膜、次に本質的にシリカからなる膜、
・第1のTCO(特にITO)膜、
・例えばシリカ、窒化ケイ素又は亜鉛スズ酸化物をベースとする、又は本質的にこれからなる、特に誘電性の中間膜、
・第2のTCO(特にITO)膜、
・例えば窒化ケイ素をベースとする、又は本質的にこれからなる、酸素バリア膜、及び、
・例えばシリカをベースとする、又は本質的にこれからなる、低屈折率膜、
を含む(又はこれらからなる)。
1. 基材/SiOx/ITO/SiNx又はSiOx又はSnZnOx/ITO/SiNx/SiOx
2. 基材/SiNx/SiOx/ITO/SiNx又はSiOx又はSnZnOx/ITO/SiNx/SiOx
3. 基材/SiOx/SiNx/SiOx/ITO/SiNx又はSiOx又はSnZnOx/ITO/SiNx/SiOx
4. 基材/SiOx/ITO/SiNx又はSiOx又はSnZnOx/ITO/SiNx/SiOx/TiOx
5. 基材/SiNx/SiOx/ITO/SiNx又はSiOx又はSnZnOx/ITO/SiNx/SiOx/TiOx
6. 基材/SiOx/SiNx/SiOx/ITO/SiNx又はSiOx又はSnZnOx/ITO/SiNx/SiOx/TiOx
・酸素バリア膜6(典型的には窒化ケイ素で製作された)上の、低屈折率膜7(例えばシリカで製作された膜)、及び保護膜10(典型的には、光触媒作用を有することができる、TiO2で製作された膜)、並びに、
・TCO膜3の下の、低屈折率膜8(典型的にはシリカで製作された膜)、及び高屈折率膜9(典型的には窒化ケイ素で製作された膜)、
である。
・ガラスの種類(「T」は暗灰色を帯びたガラス、「C」はクリアガラス)、
・表1で使用する参照符合によって示す多層のタイプ、
・曲げ加工/熱強化処理の前及び後に測定したシート抵抗、
・曲げ加工のタイプ: 凸(CV)又は凹(CC)、
・曲げ加工後の割れの量を目視検査によって評価した定性的尺度を提供する0〜10の評点であって、評点0が割れの存在しないことを示すもの、及び、
・曲げ加工後の曇りを目視検査によって評価した定性的尺度を提供する0〜10の評点であって、評点0が曇りの存在しないことを示すもの、
を示している。
Claims (14)
- 基材(1)を含む材料であって、基材の面のうちの少なくとも1つのものの少なくとも一部が、透明導電性酸化物をベースとする少なくとも2つの膜(2、3)を含む薄膜多層で被覆されており、前記膜は物理的厚さが最大で50nmの少なくとも1つの誘電性中間膜(4)によって分離されており、透明導電性酸化物をベースとする前記膜(2、3)の間には金属膜が被着されておらず、前記多層はさらに、当該基材(1)から最も離れた透明導電性酸化物をベースとする膜(2)の上方に少なくとも1つの酸素バリア膜(6)を含んでいて、透明導電性酸化物をベースとする各膜(2、3)が20〜80nmの範囲に含まれる物理的厚さを有している、基材(1)を含む材料。
- 前記基材(1)がガラス製である、請求項1に記載の材料。
- 各透明導電性酸化物(2、3)が、混合インジウムスズ酸化物、混合インジウム亜鉛酸化物、ガリウム又はアルミニウムをドープした酸化亜鉛、ニオブをドープした酸化チタン、スズ酸亜鉛、スズ酸カドミウム、及びアンチモン及び/又はフッ素をドープした酸化スズから選択される、請求項1又は2に記載の材料。
- 透明導電性酸化物をベースとする各膜(2、3)が30〜80nmの範囲に含まれる物理的厚さを有している、請求項1から3までの1項に記載の材料。
- 透明導電性酸化物をベースとする全ての前記膜(2、3)の累積物理的厚さが40〜400nmの範囲、特に60〜300nmの範囲に含まれる、請求項1から4までの1項に記載の材料。
- 前記薄膜多層が透明導電性酸化物をベースとする2つの膜(2、3)を含み、当該膜が最大で2つの誘電性中間膜(4)によって、特に単一の誘電性中間膜(4)によって分離されている、請求項1から5までの1項に記載の材料。
- 前記誘電性中間膜(4)が、ケイ素、アルミニウム、チタン、スズ、亜鉛、ジルコニウム、ニオブ、ニッケル、クロムの酸化物、窒化物又は酸窒化物から選択された化合物、又はそれらの混合物のうちの1つをベースとしている、請求項1から6までの1項に記載の材料。
- 前記誘電性中間膜(4)の物理的厚さが2〜20nmの範囲、特に5〜15nmの範囲に含まれる、請求項1から7までの1項に記載の材料。
- 前記バリア膜(6)が、窒化ケイ素、酸化ニオブ、酸化タングステン、酸化ビスマス、酸化チタン、窒化ジルコニウム及び窒化アルミニウムから選択された化合物をベースとする、請求項1から8までの1項に記載の材料。
- 前記多層が、前記基材に最も近い透明導電性酸化物をベースとする膜(3)の下に、特にシリカで作製した、少なくとも1つの固着膜(5)を含む、請求項1から9までの1項に記載の材料。
- 請求項1から10までの1項に記載の材料を得るための方法であって、前記膜を特に陰極スパッタリングによって被着させ、次いでこれに熱強化、曲げ加工、アニーリング処理及び急速アニーリング処理から選択された熱処理を施す、請求項1から10までの1項に記載の材料を得るための方法。
- 前記急速アニーリング処理を、火炎、プラズマトーチ又はレーザー照射を用いて行う、請求項11に記載の方法。
- 請求項1から10までの1項に記載の材料を少なくとも1つ含む、特に陸上、鉄道、水上又は空中乗り物に装備するための、グレージングユニット、とりわけ自動車用フロントガラス、リアガラス又はサイドウインドウ又は自動車用ルーフ、或いは建築物に装備するためのグレージングユニット、又は耐火性グレージングユニット、或いはオーブン又は冷蔵庫のドア。
- 湾曲グレージングユニットである、請求項13に記載のグレージングユニット。
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FR1351729A FR3002534B1 (fr) | 2013-02-27 | 2013-02-27 | Substrat revetu d'un empilement bas-emissif. |
PCT/FR2014/050392 WO2014131980A1 (fr) | 2013-02-27 | 2014-02-25 | Substrat revêtu d'un empilement bas-emissif |
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Cited By (6)
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---|---|---|---|---|
JP2019518963A (ja) * | 2016-06-27 | 2019-07-04 | サン−ゴバン グラス フランス | 基材上に堆積される薄層のスタックに影響を与える欠陥の発生源の位置を特定するための方法及び装置 |
WO2019181421A1 (ja) * | 2018-03-20 | 2019-09-26 | Agc株式会社 | 積層膜付きガラス基板及び窓ガラス |
US10501369B2 (en) | 2013-05-09 | 2019-12-10 | AGC Inc. | Translucent substrate, organic LED element and method of manufacturing translucent substrate |
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Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
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US11155493B2 (en) | 2010-01-16 | 2021-10-26 | Cardinal Cg Company | Alloy oxide overcoat indium tin oxide coatings, coated glazings, and production methods |
US9745792B2 (en) | 2015-03-20 | 2017-08-29 | Cardinal Cg Company | Nickel-aluminum blocker film multiple cavity controlled transmission coating |
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FR3061172B1 (fr) * | 2016-12-26 | 2020-03-27 | Saint-Gobain Glass France | Dispositif chauffant comprenant un substrat verrier revetu sur ses deux faces |
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WO2019131660A1 (ja) * | 2017-12-28 | 2019-07-04 | Agc株式会社 | 積層膜付き透明基板 |
US11028012B2 (en) * | 2018-10-31 | 2021-06-08 | Cardinal Cg Company | Low solar heat gain coatings, laminated glass assemblies, and methods of producing same |
EP4118046A1 (en) * | 2020-03-12 | 2023-01-18 | Pilkington Group Limited | Coated glazing |
US20230098954A1 (en) * | 2020-03-12 | 2023-03-30 | Pilkington Group Limited | Coated glazing |
Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0373335A (ja) * | 1988-11-04 | 1991-03-28 | Asahi Glass Co Ltd | 透明導電ガラス |
JPH0370202B2 (ja) * | 1981-11-25 | 1991-11-06 | Toyoda Chuo Kenkyusho Kk | |
JPH0558681A (ja) * | 1991-02-20 | 1993-03-09 | Saint Gobain Vitrage Internatl | 保護皮膜を備えた導電性基材を含む製品及びその製造方法 |
JPH11149063A (ja) * | 1997-09-09 | 1999-06-02 | Asahi Optical Co Ltd | 反射防止膜付き眼鏡レンズ |
JP2000294980A (ja) * | 1999-04-06 | 2000-10-20 | Nippon Sheet Glass Co Ltd | 透光性電磁波フィルタおよびその製造方法 |
JP2001114534A (ja) * | 1999-10-20 | 2001-04-24 | Nippon Sheet Glass Co Ltd | 金属酸化物膜付きガラス板およびその製造方法、ならびにこれを用いた複層ガラス |
WO2003010104A1 (fr) * | 2001-07-23 | 2003-02-06 | Nippon Sheet Glass Company, Limited | Verre a faible emissivite et procede de production de celui-ci |
JP2003522088A (ja) * | 1999-03-18 | 2003-07-22 | ピーピージー・インダストリーズ・オハイオ・インコーポレイテッド | 低曇り度コーティングの製法並びにそれにより製造したコーティング及び被覆された物品 |
JP2008013420A (ja) * | 2006-07-10 | 2008-01-24 | Fujikura Ltd | 熱線反射ガラス |
JP2009502479A (ja) * | 2005-07-26 | 2009-01-29 | ピルキングトン・ノースアメリカ・インコーポレイテッド | 銀フリー・低放射率の日照調整コーティング |
JP2009084143A (ja) * | 1995-02-23 | 2009-04-23 | Saint-Gobain Glass France | 反射防止コーティングを有する透明基材 |
JP2010514666A (ja) * | 2007-01-05 | 2010-05-06 | サン−ゴバン グラス フランス | 薄層を堆積させる方法、およびこのように得られた製品 |
WO2011122152A1 (ja) * | 2010-03-30 | 2011-10-06 | 日本電気硝子株式会社 | 電磁波遮蔽膜及び電磁波遮蔽部材 |
JP2013533202A (ja) * | 2010-07-28 | 2013-08-22 | サン−ゴバン グラス フランス | グレージングパネル |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004050158B3 (de) * | 2004-10-15 | 2006-04-06 | Saint-Gobain Sekurit Deutschland Gmbh & Co. Kg | Transparente Scheibe mit einer beheizbaren Beschichtung |
FR2889182B1 (fr) * | 2005-07-29 | 2007-10-26 | Saint Gobain | Vitrage muni d'un empilement de couches minces agissant sur le rayonnement solaire |
DE102005039707B4 (de) * | 2005-08-23 | 2009-12-03 | Saint-Gobain Glass Deutschland Gmbh | Thermisch hoch belastbares Low-E-Schichtsystem für transparente Substrate, insbesondere für Glasscheiben |
FR2893023B1 (fr) * | 2005-11-08 | 2007-12-21 | Saint Gobain | Substrat muni d'un empilement a proprietes thermiques |
FR2893610B1 (fr) * | 2005-11-23 | 2008-07-18 | Saint Gobain | Procede de structuration de surface d'un produit verrier, produit verrier a surface structuree et utilisations |
EP2381745A1 (fr) * | 2006-09-07 | 2011-10-26 | Saint-Gobain Glass France | Substrat pour dispositif electroluminescent organique, utilisation et procede de fabrication de ce substrat, ainsi que dispositif electroluminescent organique |
FR2931147B1 (fr) * | 2008-05-19 | 2010-11-19 | Saint Gobain | Vitrage muni d'un empilement de couches minces |
FR2946639B1 (fr) * | 2009-06-12 | 2011-07-15 | Saint Gobain | Procede de depot de couche mince et produit obtenu. |
FR2949226B1 (fr) * | 2009-08-21 | 2011-09-09 | Saint Gobain | Substrat muni d'un empilement a proprietes thermiques, en particulier pour realiser un vitrage chauffant. |
FR2955915B1 (fr) * | 2010-02-01 | 2012-03-09 | Saint Gobain | Vitrage multiple lumineux a diodes electroluminescentes |
US8304045B2 (en) * | 2010-02-26 | 2012-11-06 | Guardian Industries Corp. | Articles including anticondensation coatings and/or methods of making the same |
US8834976B2 (en) * | 2010-02-26 | 2014-09-16 | Guardian Industries Corp. | Articles including anticondensation and/or low-E coatings and/or methods of making the same |
US8815059B2 (en) * | 2010-08-31 | 2014-08-26 | Guardian Industries Corp. | System and/or method for heat treating conductive coatings using wavelength-tuned infrared radiation |
-
2013
- 2013-02-27 FR FR1351729A patent/FR3002534B1/fr active Active
-
2014
- 2014-02-25 PL PL14713175T patent/PL2961711T3/pl unknown
- 2014-02-25 CA CA2902130A patent/CA2902130A1/fr not_active Abandoned
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- 2014-02-25 MX MX2015010827A patent/MX370002B/es active IP Right Grant
- 2014-02-25 WO PCT/FR2014/050392 patent/WO2014131980A1/fr active Application Filing
- 2014-02-25 EA EA201591585A patent/EA029723B1/ru not_active IP Right Cessation
- 2014-02-25 CN CN201480010838.7A patent/CN105026330B/zh active Active
- 2014-02-25 US US14/770,269 patent/US9950951B2/en active Active
- 2014-02-25 EP EP14713175.9A patent/EP2961711B1/fr active Active
Patent Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0370202B2 (ja) * | 1981-11-25 | 1991-11-06 | Toyoda Chuo Kenkyusho Kk | |
JPH0373335A (ja) * | 1988-11-04 | 1991-03-28 | Asahi Glass Co Ltd | 透明導電ガラス |
JPH0558681A (ja) * | 1991-02-20 | 1993-03-09 | Saint Gobain Vitrage Internatl | 保護皮膜を備えた導電性基材を含む製品及びその製造方法 |
JP2009084143A (ja) * | 1995-02-23 | 2009-04-23 | Saint-Gobain Glass France | 反射防止コーティングを有する透明基材 |
JPH11149063A (ja) * | 1997-09-09 | 1999-06-02 | Asahi Optical Co Ltd | 反射防止膜付き眼鏡レンズ |
JP2003522088A (ja) * | 1999-03-18 | 2003-07-22 | ピーピージー・インダストリーズ・オハイオ・インコーポレイテッド | 低曇り度コーティングの製法並びにそれにより製造したコーティング及び被覆された物品 |
JP2000294980A (ja) * | 1999-04-06 | 2000-10-20 | Nippon Sheet Glass Co Ltd | 透光性電磁波フィルタおよびその製造方法 |
WO2001028949A1 (en) * | 1999-10-20 | 2001-04-26 | Nippon Sheet Glass Co., Ltd. | Glass sheet with metal oxide film, method of manufacturing the same, and double-glazing unit using the same |
JP2001114534A (ja) * | 1999-10-20 | 2001-04-24 | Nippon Sheet Glass Co Ltd | 金属酸化物膜付きガラス板およびその製造方法、ならびにこれを用いた複層ガラス |
WO2003010104A1 (fr) * | 2001-07-23 | 2003-02-06 | Nippon Sheet Glass Company, Limited | Verre a faible emissivite et procede de production de celui-ci |
JP2009502479A (ja) * | 2005-07-26 | 2009-01-29 | ピルキングトン・ノースアメリカ・インコーポレイテッド | 銀フリー・低放射率の日照調整コーティング |
JP2008013420A (ja) * | 2006-07-10 | 2008-01-24 | Fujikura Ltd | 熱線反射ガラス |
JP2010514666A (ja) * | 2007-01-05 | 2010-05-06 | サン−ゴバン グラス フランス | 薄層を堆積させる方法、およびこのように得られた製品 |
WO2011122152A1 (ja) * | 2010-03-30 | 2011-10-06 | 日本電気硝子株式会社 | 電磁波遮蔽膜及び電磁波遮蔽部材 |
JP2013533202A (ja) * | 2010-07-28 | 2013-08-22 | サン−ゴバン グラス フランス | グレージングパネル |
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US10501369B2 (en) | 2013-05-09 | 2019-12-10 | AGC Inc. | Translucent substrate, organic LED element and method of manufacturing translucent substrate |
JP2019518963A (ja) * | 2016-06-27 | 2019-07-04 | サン−ゴバン グラス フランス | 基材上に堆積される薄層のスタックに影響を与える欠陥の発生源の位置を特定するための方法及び装置 |
JP7110121B2 (ja) | 2016-06-27 | 2022-08-01 | サン-ゴバン グラス フランス | 基材上に堆積される薄層のスタックに影響を与える欠陥の発生源の位置を特定するための方法及び装置 |
JP2020515492A (ja) * | 2017-04-18 | 2020-05-28 | サン−ゴバン グラス フランス | 加熱可能なtcoコーティングを有するペイン |
KR20200038277A (ko) * | 2017-08-04 | 2020-04-10 | 비트로 플랫 글래스 엘엘씨 | 기능성 코팅 위의 보호층 |
KR20200038276A (ko) * | 2017-08-04 | 2020-04-10 | 비트로 플랫 글래스 엘엘씨 | 매립 필름을 갖는 투명 전도성 산화물 |
JP2020529345A (ja) * | 2017-08-04 | 2020-10-08 | ビトロ フラット グラス エルエルシー | 埋め込みフィルムを有する透明導電性酸化物 |
JP7296364B2 (ja) | 2017-08-04 | 2023-06-22 | ビトロ フラット グラス エルエルシー | 埋め込みフィルムを有する透明導電性酸化物 |
KR102638082B1 (ko) * | 2017-08-04 | 2024-02-16 | 비트로 플랫 글래스 엘엘씨 | 매립 필름을 갖는 투명 전도성 산화물 |
KR102642712B1 (ko) * | 2017-08-04 | 2024-03-05 | 비트로 플랫 글래스 엘엘씨 | 기능성 코팅 위의 보호층 |
WO2019181421A1 (ja) * | 2018-03-20 | 2019-09-26 | Agc株式会社 | 積層膜付きガラス基板及び窓ガラス |
JPWO2019181421A1 (ja) * | 2018-03-20 | 2021-03-18 | Agc株式会社 | 積層膜付きガラス基板及び窓ガラス |
Also Published As
Publication number | Publication date |
---|---|
CA2902130A1 (fr) | 2014-09-04 |
CN105026330A (zh) | 2015-11-04 |
US20160002098A1 (en) | 2016-01-07 |
EA029723B1 (ru) | 2018-05-31 |
FR3002534B1 (fr) | 2018-04-13 |
MX2015010827A (es) | 2015-12-03 |
EA201591585A1 (ru) | 2015-12-30 |
JP6546097B2 (ja) | 2019-07-17 |
KR20150123241A (ko) | 2015-11-03 |
BR112015019816A2 (pt) | 2017-07-18 |
BR112015019816B1 (pt) | 2021-07-06 |
EP2961711A1 (fr) | 2016-01-06 |
EP2961711B1 (fr) | 2021-08-18 |
US9950951B2 (en) | 2018-04-24 |
FR3002534A1 (fr) | 2014-08-29 |
PL2961711T3 (pl) | 2022-01-10 |
CN105026330B (zh) | 2018-11-09 |
KR102140136B1 (ko) | 2020-07-31 |
MX370002B (es) | 2019-11-28 |
WO2014131980A1 (fr) | 2014-09-04 |
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