JP2016179453A - Coating apparatus, coating method and coating film formation system - Google Patents

Coating apparatus, coating method and coating film formation system Download PDF

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JP2016179453A
JP2016179453A JP2015061965A JP2015061965A JP2016179453A JP 2016179453 A JP2016179453 A JP 2016179453A JP 2015061965 A JP2015061965 A JP 2015061965A JP 2015061965 A JP2015061965 A JP 2015061965A JP 2016179453 A JP2016179453 A JP 2016179453A
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coating
porous substrate
nozzle
smooth plate
liquid
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JP6473644B2 (en
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佳浩 安谷
yoshihiro Yasutani
佳浩 安谷
錦内　栄史
Yoshifumi Nishikiuchi
栄史 錦内
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Screen Holdings Co Ltd
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Screen Holdings Co Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254—Coating heads with slot-shaped outlet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C13/00—Means for manipulating or holding work, e.g. for separate articles
    • B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/14—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/04—Processes of manufacture in general
    • H01M4/0402—Methods of deposition of the material
    • H01M4/0419—Methods of deposition of the material involving spraying
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/13—Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
    • H01M4/139—Processes of manufacture
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Coating Apparatus (AREA)
  • Materials Engineering (AREA)
  • Cell Electrode Carriers And Collectors (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Spray Control Apparatus (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a coating apparatus and a coating method which enable both front and rear faces of a substrate of a base material to be coated with a coating liquid by means of one coating nozzle and a film coating formation system incorporating the coating apparatus.SOLUTION: A porous base material 5 that is a metal long porous foil with a plurality of holes 5a drilled is continuously transported. A coating nozzle 20 that discharges a coating liquid for an electrode material is disposed below the porous base material 5, and a smooth plate 30 is disposed above the same. A part of the coating liquid exudes out of the plurality of holes 5a to the porous base material 5 by discharging the coating liquid out of the coating nozzle 20 to the rear face of the porous base material 5 to get both front and rear faces of the porous base material 5 coated, so that both front and rear faces of the porous base material 5 can be coated with a coating liquid by means of one coating nozzle 20.SELECTED DRAWING: Figure 4

Description

本発明は、多孔基材に化学電池材料などの塗工液を塗工する塗工装置および塗工方法、並びに、その塗工装置を組み込んだ塗膜形成システムに関する。   The present invention relates to a coating apparatus and a coating method for coating a porous substrate with a coating solution such as a chemical battery material, and a coating film forming system incorporating the coating apparatus.

従来より、リチウムイオン電池などの化学電池の製造においては、金属箔等の基材をロールトゥロール方式にて搬送しつつ、その基材の表面に電極材料の塗工液を吐出して塗膜を形成する。また、電極を多層構造とするために、基材の表裏両面に塗膜を形成することが多く、基材の両面に電極材料の塗工液を吐出して塗膜を形成する両面塗工装置が知られている。このような両面塗工装置としては、まず基材の一方面に塗工液を塗工してから乾燥処理を行い、次に基材の他方面に塗工液を塗工して再度乾燥処理を行うものがある。このような手法によっても、基材の両面に塗工処理を行うことは可能であるが、１つのラインに乾燥炉が２台必要となり、装置の全長が長くなってコストが増大する。   Conventionally, in the manufacture of a chemical battery such as a lithium ion battery, a substrate such as a metal foil is transported by a roll-to-roll method, and a coating solution is ejected onto the surface of the substrate by discharging an electrode material coating liquid. Form. Moreover, in order to make an electrode into a multilayer structure, a coating film is often formed on both front and back surfaces of a substrate, and a coating film is formed by discharging a coating solution of an electrode material on both surfaces of the substrate. It has been known. As such a double-sided coating device, first, the coating liquid is applied to one side of the base material, followed by a drying treatment, and then the coating liquid is applied to the other side of the base material, followed by a drying treatment again. There is something to do. Even with such a technique, it is possible to perform the coating treatment on both surfaces of the base material, but two drying furnaces are required for one line, which increases the overall length of the apparatus and increases the cost.

このため、乾燥処理を行う前に基材の両面に塗工液を同時に塗工し、基材の両面に対して一括して乾燥処理を行う装置が開発されている。例えば、特許文献１，２には、基材を挟んで表面側と裏面側とに相対向するようにダイ（塗工ノズル）を１本ずつ配置し、双方の塗工ノズルから基材の表裏両面に塗工液を同時に吐出して両面同時塗工を行う両面塗工装置が開示されている。特許文献１，２に開示されるような両面塗工装置では、基材の表裏両面に塗工液を塗工してから一括して乾燥処理を行うため、乾燥炉が１台で足りるとともに、電極の生産性が高まる。このような両面塗工装置においては、塗膜の塗工形状の調整は表裏の塗工ノズルの基材に対する相対位置を変更することで行い、また塗工膜厚は各塗工ノズルからの塗工液の吐出流量によって制御している。   For this reason, an apparatus has been developed in which a coating liquid is simultaneously applied to both surfaces of a substrate before the drying treatment, and the drying treatment is collectively performed on both surfaces of the substrate. For example, in Patent Documents 1 and 2, a die (coating nozzle) is arranged one by one so that the front side and the back side are opposed to each other with the base material in between, and the front and back sides of the base material are provided from both coating nozzles. A double-sided coating apparatus is disclosed in which a coating liquid is simultaneously discharged on both sides to perform simultaneous double-sided coating. In the double-sided coating apparatus as disclosed in Patent Documents 1 and 2, the coating liquid is applied to both the front and back surfaces of the base material to perform a drying process in a lump, so that one drying furnace is sufficient, Increased electrode productivity. In such a double-sided coating device, the coating shape of the coating film is adjusted by changing the relative positions of the front and back coating nozzles with respect to the base material, and the coating film thickness is applied from each coating nozzle. It is controlled by the discharge flow rate of the working fluid.

特開２００８−２８４５２８号公報JP 2008-284528 A 特開２０１３−１０７０５３号公報JP 2013-107053 A

塗工ノズルから基材に塗工液を吐出する塗工方式においては、高い塗工均一性を実現するために塗工ノズルの加工精度、特に吐出口近傍の加工精度が極めて重要である。しかしながら、そのような高い加工精度にて製作された塗工ノズルは高額であり、塗工ノズルを２本搭載することによって塗工装置の製造コストが高騰する要因となっていた。加えて、塗工ノズルを２本搭載した場合には、塗工ノズルに塗工液を送給するポンプ等の塗工液供給機構も塗工ノズルの本数に応じて２組設ける必要があるため、塗工装置の製造コストがさらに高騰することとなる。   In a coating method in which a coating liquid is discharged from a coating nozzle onto a substrate, the processing accuracy of the coating nozzle, particularly the processing accuracy near the discharge port, is extremely important in order to achieve high coating uniformity. However, the coating nozzle manufactured with such a high processing accuracy is expensive, and mounting two coating nozzles is a factor that increases the manufacturing cost of the coating apparatus. In addition, when two coating nozzles are installed, it is necessary to provide two sets of coating liquid supply mechanisms such as a pump for feeding the coating liquid to the coating nozzles according to the number of coating nozzles. The manufacturing cost of the coating apparatus will further increase.

また、塗工装置に２本の塗工ノズルを設置した場合、双方の塗工ノズルの設置位置が僅かでもずれると、基材の表面と裏面とで塗膜の塗工端がずれるという問題も発生していた。   In addition, when two coating nozzles are installed in the coating apparatus, if the installation positions of both coating nozzles are slightly shifted, there is a problem that the coating end of the coating film is shifted between the front surface and the back surface of the substrate. It has occurred.

本発明は、上記課題に鑑みてなされたものであり、１本の塗工ノズルにて基材の表裏両面に塗工液を塗工することができる塗工装置および塗工方法、並びに、その塗工装置を組み込んだ塗膜形成システムを提供することを目的とする。   The present invention has been made in view of the above problems, and a coating apparatus and a coating method capable of coating a coating liquid on both the front and back surfaces of a substrate with a single coating nozzle, and its It aims at providing the coating-film formation system incorporating the coating apparatus.

上記課題を解決するため、請求項１の発明は、多孔基材に塗工液を塗工する塗工装置において、第１ローラから送り出された多孔基材を第２ローラで巻き取ることによって多孔基材を連続して搬送する搬送機構と、前記搬送機構によって搬送される多孔基材の一方面に塗工液を吐出する塗工ノズルと、前記搬送機構によって搬送される多孔基材を挟んで前記塗工ノズルと対向する位置に設けられた平滑板と、を備え、前記塗工ノズルは、前記平滑板と平行な塗工面および前記塗工面の一部に形成された吐出口を有し、前記平滑板は少なくとも前記吐出口を覆う位置に設けられることを特徴とする。   In order to solve the above-mentioned problems, the invention of claim 1 is a coating apparatus for coating a porous substrate with a coating liquid, and is made porous by winding the porous substrate fed from the first roller with the second roller. A conveyance mechanism that conveys the substrate continuously, a coating nozzle that discharges a coating liquid onto one surface of the porous substrate conveyed by the conveyance mechanism, and a porous substrate conveyed by the conveyance mechanism A smooth plate provided at a position facing the coating nozzle, and the coating nozzle has a coating surface parallel to the smooth plate and a discharge port formed in a part of the coating surface, The smooth plate is provided at a position covering at least the discharge port.

また、請求項２の発明は、請求項１の発明に係る塗工装置において、前記搬送機構による多孔基材の搬送方向に沿って下流側の前記平滑板の端部が前記塗工ノズルの前記塗工面の下流側端部に対向する位置に前記平滑板が設置されることを特徴とする。   Moreover, invention of Claim 2 is the coating apparatus which concerns on invention of Claim 1, The edge part of the said smooth plate of the downstream is along the conveyance direction of the porous base material by the said conveyance mechanism, The said coating nozzle The smooth plate is installed at a position facing the downstream end of the coating surface.

また、請求項３の発明は、請求項１または請求項２の発明に係る塗工装置において、前記平滑板と前記塗工ノズルの前記塗工面との間隔を測定するリニアスケールをさらに備えることを特徴とする。   Moreover, invention of Claim 3 is a coating apparatus which concerns on invention of Claim 1 or Claim 2, It is further provided with the linear scale which measures the space | interval of the said smooth plate and the said coating surface of the said coating nozzle. Features.

また、請求項４の発明は、塗膜形成システムであって、請求項１から請求項３のいずれかの発明に係る塗工装置と、前記塗工装置によって基材に形成された塗工液の塗膜を乾燥させる乾燥部と、を備えることを特徴とする。   Moreover, invention of Claim 4 is a coating-film formation system, Comprising: The coating liquid which was formed in the base material by the coating apparatus which concerns on invention in any one of Claims 1-3, and the said coating apparatus And a drying section for drying the coating film.

また、請求項５の発明は、多孔基材に塗工液を塗工する塗工方法において、第１ローラから送り出された多孔基材を第２ローラで巻き取ることによって多孔基材を連続して搬送する搬送工程と、搬送される多孔基材の一方面に塗工ノズルから塗工液を吐出する吐出工程と、を備え、前記吐出工程では、搬送される多孔基材を挟んで前記塗工ノズルと対向する位置に設けられた平滑板によって少なくとも塗工ノズルの吐出口を覆いつつ前記塗工ノズルから塗工液を吐出することを特徴とする。   The invention of claim 5 is a coating method for applying a coating liquid to a porous substrate, and the porous substrate is continuously wound by winding the porous substrate fed from the first roller with the second roller. And a discharge step of discharging a coating liquid from a coating nozzle to one surface of the porous substrate to be transferred, and in the discharge step, the coating is sandwiched between the porous substrates to be transferred. The coating liquid is discharged from the coating nozzle while covering at least the discharge port of the coating nozzle by a smooth plate provided at a position facing the coating nozzle.

また、請求項６の発明は、請求項５の発明に係る塗工方法において、前記塗工ノズルは、前記平滑板と平行な塗工面を有し、前記吐出口は前記塗工面の一部に形成され、前記吐出工程では、多孔基材の搬送方向に沿って下流側の前記平滑板の端部が前記塗工ノズルの前記塗工面の下流側端部に対向しつつ前記塗工ノズルから塗工液を吐出することを特徴とする。   The invention of claim 6 is the coating method according to the invention of claim 5, wherein the coating nozzle has a coating surface parallel to the smooth plate, and the discharge port is part of the coating surface. In the discharging step, the coating plate is coated from the coating nozzle while the downstream end portion of the smoothing plate faces the downstream end portion of the coating surface of the coating nozzle along the conveying direction of the porous substrate. It is characterized by discharging the working fluid.

請求項１から請求項４の発明によれば、塗工ノズルの吐出口を覆う位置に平滑板を設けて多孔基材の一方面に塗工ノズルから塗工液を吐出するため、多孔基材の他方面に塗工液が滲出して塗工ノズルと平滑板との間に塗工液の液溜まりが形成され、１本の塗工ノズルにて基材の表裏両面に塗工液を塗工することができる。   According to the first to fourth aspects of the present invention, a smooth plate is provided at a position covering the discharge port of the coating nozzle, and the coating liquid is discharged from the coating nozzle onto one surface of the porous substrate. The coating liquid oozes out on the other side of the coating to form a liquid pool of coating liquid between the coating nozzle and the smooth plate, and the coating liquid is applied to both the front and back surfaces of the substrate with one coating nozzle. Can be crafted.

特に、請求項２の発明によれば、搬送機構による多孔基材の搬送方向に沿って下流側の平滑板の端部が塗工ノズルの塗工面の下流側端部に対向する位置に平滑板が設置されるため、多孔基材の走行位置が塗工面と平滑板との間に形成された塗工液の液溜まりの中央部に規制され、多孔基材の両面に等しい膜厚にて塗工液の塗膜を形成することができる。   In particular, according to the invention of claim 2, the smooth plate is located at a position where the end of the downstream smooth plate faces the downstream end of the coating surface of the coating nozzle along the transport direction of the porous substrate by the transport mechanism. Therefore, the travel position of the porous substrate is regulated at the center of the liquid pool of the coating liquid formed between the coating surface and the smooth plate, and it is applied with the same film thickness on both surfaces of the porous substrate. A coating film of the working liquid can be formed.

請求項５および請求項６の発明によれば、平滑板によって少なくとも塗工ノズルの吐出口を覆いつつ塗工ノズルから多孔基材の一方面に塗工液を吐出するため、多孔基材の他方面に塗工液が滲出して塗工ノズルと平滑板との間に塗工液の液溜まりが形成され、１本の塗工ノズルにて基材の表裏両面に塗工液を塗工することができる。   According to the invention of claim 5 and claim 6, in order to discharge the coating liquid from the coating nozzle to one surface of the porous substrate while covering at least the discharge port of the coating nozzle with the smooth plate, The coating liquid oozes out in the direction and a liquid pool of the coating liquid is formed between the coating nozzle and the smooth plate, and the coating liquid is applied to both the front and back surfaces of the substrate with one coating nozzle. be able to.

特に、請求項６の発明によれば、多孔基材の搬送方向に沿って下流側の平滑板の端部が塗工ノズルの塗工面の下流側端部に対向しつつ塗工ノズルから塗工液を吐出するため、多孔基材の走行位置が塗工面と平滑板との間に形成された塗工液の液溜まりの中央部に規制され、多孔基材の両面に等しい膜厚にて塗工液の塗膜を形成することができる。   In particular, according to the invention of claim 6, coating from the coating nozzle while the end of the downstream smooth plate faces the downstream end of the coating surface of the coating nozzle along the transport direction of the porous substrate. In order to discharge the liquid, the travel position of the porous substrate is regulated at the center of the liquid reservoir of the coating liquid formed between the coating surface and the smooth plate, and it is applied with the same film thickness on both surfaces of the porous substrate. A coating film of the working liquid can be formed.

本発明に係る塗工装置を組み込んだ塗膜形成システムの全体構成を示す図である。It is a figure which shows the whole structure of the coating-film formation system incorporating the coating device which concerns on this invention. 平滑板と塗工ノズルとの配置関係を示す図である。It is a figure which shows the arrangement | positioning relationship between a smooth plate and a coating nozzle. 平滑板と塗工ノズルとの配置関係を示す図である。It is a figure which shows the arrangement | positioning relationship between a smooth plate and a coating nozzle. 多孔基材の一方面に塗工液を吐出したときに生じる現象を示す図である。It is a figure which shows the phenomenon which arises when a coating liquid is discharged to one side of a porous base material. 塗膜形成システムによって製造された電極の部分断面図である。It is a fragmentary sectional view of the electrode manufactured by the coating-film formation system. 平滑板と塗工ノズルとの配置関係の他の例を示す図である。It is a figure which shows the other example of arrangement | positioning relationship between a smooth plate and a coating nozzle. 平滑板と塗工ノズルとの配置関係の他の例を示す図である。It is a figure which shows the other example of arrangement | positioning relationship between a smooth plate and a coating nozzle.

以下、図面を参照しつつ本発明の実施の形態について詳細に説明する。   Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

図１は、本発明に係る塗工装置を組み込んだ塗膜形成システム１の全体構成を示す図である。なお、図１および以降の各図には、それらの方向関係を明確にするためＺ軸方向を鉛直方向とし、ＸＹ平面を水平面とするＸＹＺ直交座標系を適宜付している。また、図１および以降の各図においては、理解容易のため、必要に応じて各部の寸法や数を誇張または簡略化して描いている。   FIG. 1 is a diagram showing an overall configuration of a coating film forming system 1 incorporating a coating apparatus according to the present invention. In addition, in FIG. 1 and each figure after that, in order to clarify those directional relationships, an XYZ orthogonal coordinate system in which the Z-axis direction is a vertical direction and the XY plane is a horizontal plane is appropriately attached. Further, in FIG. 1 and the subsequent drawings, the dimensions and numbers of the respective parts are exaggerated or simplified as necessary for easy understanding.

この塗膜形成システム１は、長尺の多孔基材をロールトゥロール(Roll-to-Roll)方式にて連続搬送しつつ、その多孔基材に電極材料である活物質を含む塗工液を塗工し、その塗工液の乾燥処理を行ってリチウムイオン二次電池の電極製造を行う装置である。塗膜形成システム１は、塗工装置１０に乾燥部８０を備えて構成される。また、塗膜形成システム１は、システム全体を管理する制御部９０を備える。   The coating film forming system 1 is configured to continuously convey a long porous substrate by a roll-to-roll method, and apply a coating liquid containing an active material as an electrode material to the porous substrate. This is an apparatus for producing an electrode of a lithium ion secondary battery by coating and drying the coating solution. The coating film forming system 1 is configured by including a drying unit 80 in the coating apparatus 10. The coating film forming system 1 includes a control unit 90 that manages the entire system.

本発明に係る塗工装置１０は、主たる要素として塗工ノズル２０、平滑板３０および搬送機構６０を備える。また、塗工装置１０は、塗工ノズル２０に塗工液を送給する塗工液供給機構２８を備える。制御部９０は、塗工装置１０の各機構部も制御しており、塗工装置１０の制御部としても機能する。   The coating apparatus 10 according to the present invention includes a coating nozzle 20, a smooth plate 30, and a transport mechanism 60 as main elements. Further, the coating apparatus 10 includes a coating liquid supply mechanism 28 that feeds the coating liquid to the coating nozzle 20. The control unit 90 also controls each mechanism unit of the coating apparatus 10 and functions as a control unit of the coating apparatus 10.

搬送機構６０は、巻き出しローラ（第１ローラ）６１、巻き取りローラ（第２ローラ）６２および複数の補助ローラ６３を備える。長尺の多孔基材５は、巻き出しローラ６１から送り出されて複数の補助ローラ６３に案内されつつ巻き取りローラ６２によって巻き取られることにより、塗工装置１０、乾燥部８０の順にロールトゥロール方式にて連続して搬送される。なお、補助ローラ６３の個数および配置位置については、図１の例に限定されるものではなく、必要に応じて適宜に増減することができる。   The transport mechanism 60 includes a winding roller (first roller) 61, a winding roller (second roller) 62, and a plurality of auxiliary rollers 63. The long porous substrate 5 is rolled out by the coating device 10 and the drying unit 80 in this order by being fed from the winding roller 61 and being wound by the winding roller 62 while being guided by the plurality of auxiliary rollers 63. It is continuously conveyed by the method. Note that the number and arrangement position of the auxiliary rollers 63 are not limited to the example in FIG. 1 and can be increased or decreased as necessary.

塗工ノズル２０は、搬送機構６０によって略水平方向に沿って搬送される多孔基材５の下方に配置されている。塗工ノズル２０は、例えばステンレススチールにて形成され、多孔基材５の幅方向に沿ったスリット状の吐出口２１を備えたスリットノズルである。塗工ノズル２０は、搬送機構６０によって搬送される多孔基材５の裏面に電極材料の塗工液を吐出する。なお、多孔基材５の「裏面」とは、多孔基材５の２つの面のうちの下方を向いた一方面であり、「表面」とはその反対側の他方面である。すなわち、多孔基材５の表面および裏面は、多孔基材５の両面を単に識別するための表記であり、いずれか特定の面が表面または裏面に限定されるものではない。   The coating nozzle 20 is disposed below the porous substrate 5 that is transported along the substantially horizontal direction by the transport mechanism 60. The coating nozzle 20 is a slit nozzle that is formed of, for example, stainless steel and includes a slit-like discharge port 21 along the width direction of the porous substrate 5. The coating nozzle 20 discharges an electrode material coating liquid onto the back surface of the porous substrate 5 transported by the transport mechanism 60. The “back surface” of the porous substrate 5 is one surface facing downward of the two surfaces of the porous substrate 5, and the “surface” is the other surface on the opposite side. That is, the front surface and the back surface of the porous substrate 5 are notations for simply identifying both surfaces of the porous substrate 5, and any specific surface is not limited to the front surface or the back surface.

塗工ノズル２０には、塗工液供給機構２８から塗工液が送給される。塗工液供給機構２８は、塗工液を貯留するタンク、当該タンクから塗工液を塗工ノズル２０に向けて圧送するポンプ、当該ポンプが塗工ノズル２０に塗工液を圧送する送液圧を測定する圧力センサ等（いずれも図示省略）を備える。制御部９０は塗工液供給機構２８のポンプを制御する。   The coating liquid is fed from the coating liquid supply mechanism 28 to the coating nozzle 20. The coating liquid supply mechanism 28 is a tank that stores the coating liquid, a pump that pumps the coating liquid from the tank toward the coating nozzle 20, and a liquid feed that pumps the coating liquid to the coating nozzle 20. A pressure sensor or the like (not shown) for measuring pressure is provided. The control unit 90 controls the pump of the coating liquid supply mechanism 28.

塗工ノズル２０は、搬送機構６０による多孔基材５の搬送経路のうち搬送方向が略水平方向となる部分にて多孔基材５の下方に設けられる。塗工ノズル２０は、そのスリット状の吐出口２１が上側を向くように（つまり、多孔基材５の裏面に対向するように）設けられる。塗工ノズル２０は、スリット状の吐出口２１に繋がる流路を規定するためのシムおよびマニホールド等を備える。塗工液供給機構２８から送給された塗工液は、当該流路を流れて吐出口２１から上方に向けて多孔基材５の裏面に吐出される。   The coating nozzle 20 is provided below the porous substrate 5 at a portion where the conveyance direction is substantially horizontal in the conveyance path of the porous substrate 5 by the conveyance mechanism 60. The coating nozzle 20 is provided so that the slit-shaped discharge port 21 faces upward (that is, so as to face the back surface of the porous substrate 5). The coating nozzle 20 includes a shim and a manifold for defining a flow path connected to the slit-like discharge port 21. The coating liquid supplied from the coating liquid supply mechanism 28 flows through the flow path and is discharged from the discharge port 21 upward to the back surface of the porous substrate 5.

また、塗工ノズル２０の鉛直方向に沿った高さ位置は駆動部２６によって調整される。駆動部２６は、例えばパルスモータとボールネジとを備えた駆動機構であり、塗工ノズル２０を鉛直方向に沿って昇降移動させる。なお、駆動部２６は、塗工ノズル２０の姿勢を調整する機構をさらに備えていても良い。   The height position of the coating nozzle 20 along the vertical direction is adjusted by the drive unit 26. The drive unit 26 is a drive mechanism including, for example, a pulse motor and a ball screw, and moves the coating nozzle 20 up and down along the vertical direction. The drive unit 26 may further include a mechanism for adjusting the posture of the coating nozzle 20.

平滑板３０は、搬送機構６０によって搬送される多孔基材５を挟んで塗工ノズル２０と対向する位置に設けられる。すなわち、平滑板３０は、搬送機構６０による多孔基材５の搬送経路のうち搬送方向が略水平方向となる部分にて多孔基材５の上方に設けられる。図２および図３は、平滑板３０と塗工ノズル２０との配置関係を示す図である。図２は多孔基材５の搬送経路の側方から見た図であり、図３は多孔基材５の搬送経路に沿った方向から見た図である。   The smooth plate 30 is provided at a position facing the coating nozzle 20 with the porous substrate 5 conveyed by the conveyance mechanism 60 interposed therebetween. That is, the smooth plate 30 is provided above the porous substrate 5 at a portion where the conveyance direction is substantially horizontal in the conveyance path of the porous substrate 5 by the conveyance mechanism 60. 2 and 3 are diagrams showing the arrangement relationship between the smooth plate 30 and the coating nozzle 20. FIG. 2 is a view seen from the side of the transport path of the porous substrate 5, and FIG. 3 is a view seen from the direction along the transport path of the porous substrate 5.

平滑板３０は、例えばステンレススチールにて形成された平面視で矩形の板状部材である。平滑板３０の表面のうち少なくとも搬送機構６０によって搬送される多孔基材５に対向する面は、高い精度にて平滑な面とされている。平滑板３０は、多孔基材５に対向する面が水平方向に沿うように固定設置される。   The smooth plate 30 is a rectangular plate-like member formed of, for example, stainless steel in a plan view. Of the surface of the smooth plate 30, at least the surface facing the porous substrate 5 transported by the transport mechanism 60 is a smooth surface with high accuracy. The smooth plate 30 is fixedly installed so that the surface facing the porous substrate 5 is along the horizontal direction.

図２および図３に示すように、塗工ノズル２０には、平滑板３０の多孔基材５に対向する面と平行な塗工面２２が形成されている。すなわち、塗工面２２も水平方向に沿う平面である。搬送機構６０による多孔基材５の搬送方向ＤＲ（図２）に沿った塗工面２２の長さは例えば約４ｍｍである。スリット状の吐出口２１は塗工面２２の一部に形成されている。   As shown in FIGS. 2 and 3, the coating nozzle 20 is formed with a coating surface 22 parallel to the surface of the smooth plate 30 facing the porous substrate 5. That is, the coating surface 22 is also a plane along the horizontal direction. The length of the coating surface 22 along the conveyance direction DR (FIG. 2) of the porous substrate 5 by the conveyance mechanism 60 is, for example, about 4 mm. The slit-shaped discharge port 21 is formed in a part of the coating surface 22.

本実施形態においては、搬送機構６０による多孔基材５の搬送方向ＤＲ（図２）に沿って下流側の平滑板３０の端部３１が塗工ノズル２０の塗工面２２の搬送方向ＤＲに沿った下流側の端部２３に対向する位置に平滑板３０が設置されている。すなわち、多孔基材５の搬送方向ＤＲに沿って平滑板３０の下流側の端部３１が塗工面２２の下流側の端部２３の鉛直方向直上となるように平滑板３０が設置されている。   In the present embodiment, the end 31 of the smooth plate 30 on the downstream side is along the transport direction DR of the coating surface 22 of the coating nozzle 20 along the transport direction DR (FIG. 2) of the porous substrate 5 by the transport mechanism 60. A smooth plate 30 is installed at a position facing the downstream end 23. That is, the smooth plate 30 is installed so that the downstream end portion 31 of the smooth plate 30 is directly above the downstream end portion 23 of the coating surface 22 along the transport direction DR of the porous substrate 5. .

平滑板３０の搬送方向ＤＲに沿った長さは塗工面２２の長さよりも長い。よって、平滑板３０は、塗工ノズル２０の吐出口２１の鉛直方向直上を覆う位置に設けられていることとなる。   The length of the smooth plate 30 along the conveyance direction DR is longer than the length of the coating surface 22. Therefore, the smooth plate 30 is provided at a position covering the vertical direction of the discharge port 21 of the coating nozzle 20.

また、図３に示すように、塗工ノズル２０には、リニアスケール４０が付設されている。リニアスケール４０は、先端を平滑板３０に接触させることによって、平滑板３０の多孔基材５に対向する面と塗工ノズル２０の塗工面２２との間隔を測定する。リニアスケール４０による測定結果は制御部９０に伝達される。制御部９０は、リニアスケール４０による測定結果に基づいて、平滑板３０の多孔基材５に対向する面と塗工ノズル２０の塗工面２２との間隔が予め設定された設定値となるように駆動部２６を制御して塗工ノズル２０を昇降させる。平滑板３０の多孔基材５に対向する面と塗工ノズル２０の塗工面２２との間隔の設定値は、例えば１００μｍ以上２００μｍ以下の範囲内である。   Further, as shown in FIG. 3, a linear scale 40 is attached to the coating nozzle 20. The linear scale 40 measures the distance between the surface of the smooth plate 30 facing the porous substrate 5 and the coating surface 22 of the coating nozzle 20 by bringing the tip into contact with the smooth plate 30. The measurement result by the linear scale 40 is transmitted to the control unit 90. Based on the measurement result by the linear scale 40, the control unit 90 sets the interval between the surface of the smooth plate 30 facing the porous substrate 5 and the coating surface 22 of the coating nozzle 20 to a preset setting value. The drive part 26 is controlled and the coating nozzle 20 is raised / lowered. The set value of the distance between the surface of the smooth plate 30 facing the porous substrate 5 and the coating surface 22 of the coating nozzle 20 is, for example, in the range of 100 μm to 200 μm.

図１に戻り、多孔基材５の搬送経路に沿って一対の第１ピンチローラ７１，７１および一対の第２ピンチローラ７２，７２が設けられている。一対の第１ピンチローラ７１，７１は、多孔基材５の搬送経路に沿って塗工ノズル２０および平滑板３０よりも上流側に設置されている。第１ピンチローラ７１，７１は、円筒形状のローラである。   Returning to FIG. 1, a pair of first pinch rollers 71, 71 and a pair of second pinch rollers 72, 72 are provided along the conveyance path of the porous substrate 5. The pair of first pinch rollers 71, 71 are installed upstream of the coating nozzle 20 and the smooth plate 30 along the transport path of the porous substrate 5. The first pinch rollers 71 and 71 are cylindrical rollers.

一方、一対の第２ピンチローラ７２，７２は、多孔基材５の搬送経路に沿って塗工ノズル２０および平滑板３０よりも下流側に設置されている。各第２ピンチローラ７２は、回転軸の両端に一対の円板状のローラを固設して構成されており、多孔基材５の幅方向両縁部と接触する。第２ピンチローラ７２，７２は、塗工直後の多孔基材５と接触することとなるが、多孔基材５の幅方向両縁部と接触するため塗膜に直接接触することはなく、塗膜の損傷を防止するとともに、第２ピンチローラ７２，７２の汚染を防ぐこともできる。   On the other hand, the pair of second pinch rollers 72, 72 are installed on the downstream side of the coating nozzle 20 and the smooth plate 30 along the transport path of the porous substrate 5. Each of the second pinch rollers 72 is configured by fixing a pair of disk-shaped rollers to both ends of the rotation shaft, and is in contact with both edges in the width direction of the porous substrate 5. The second pinch rollers 72 and 72 are in contact with the porous substrate 5 immediately after coating, but are not in direct contact with the coating film because they are in contact with both edges in the width direction of the porous substrate 5. In addition to preventing damage to the film, contamination of the second pinch rollers 72 and 72 can also be prevented.

巻き出しローラ６１から巻き取りローラ６２に至る多孔基材５の搬送経路の全体において多孔基材５に作用する張力を規定しているのは、巻き出しローラ６１および巻き取りローラ６２である。典型的には、巻き取りローラ６２による巻き取り速度の方が巻き出しローラ６１による送り出し速度よりも若干大きく設定されており、それによって多孔基材５に張力が与えられる。多孔基材５の搬送経路のうち第１ピンチローラ７１，７１および第２ピンチローラ７２，７２の間の区間、すなわち塗工ノズル２０が設けられた区間においては、巻き出しローラ６１および巻き取りローラ６２によって規定される張力から独立して第１ピンチローラ７１，７１および第２ピンチローラ７２，７２によって多孔基材５の張力を調整することができる。   The unwinding roller 61 and the winding roller 62 define the tension acting on the porous substrate 5 in the entire transport path of the porous substrate 5 from the unwinding roller 61 to the winding roller 62. Typically, the winding speed by the winding roller 62 is set to be slightly higher than the feeding speed by the winding roller 61, whereby tension is applied to the porous substrate 5. In the section between the first pinch rollers 71 and 71 and the second pinch rollers 72 and 72 in the conveying path of the porous substrate 5, that is, in the section where the coating nozzle 20 is provided, the unwinding roller 61 and the winding roller The tension of the porous substrate 5 can be adjusted by the first pinch rollers 71 and 71 and the second pinch rollers 72 and 72 independently of the tension defined by 62.

また、多孔基材５の搬送経路に沿って乾燥部８０よりも下流側にはダンサーローラ７５が設けられている。ダンサーローラ７５は、位置が固定された２つの補助ローラ６３の間に配置されている。ダンサーローラ７５は、上下方向に可動のローラである。すなわち、ダンサーローラ７５は、回転軸が固定されておらず、多孔基材５に作用する張力によって上下動する。換言すれば、ダンサーローラ７５は、上下方向についての位置が拘束されていないため、その高さ位置にかかわらず常に一定の張力を多孔基材５に与える。ダンサーローラ７５が多孔基材５に付与する張力はダンサーローラ７５自体の質量によって規定される。なお、ダンサーローラ７５には、多孔基材５に付与する張力を調整するための錘が付設されていても良い。   A dancer roller 75 is provided downstream of the drying unit 80 along the transport path of the porous substrate 5. The dancer roller 75 is disposed between two auxiliary rollers 63 whose positions are fixed. The dancer roller 75 is a roller movable in the vertical direction. That is, the dancer roller 75 does not have a rotating shaft fixed, and moves up and down by the tension acting on the porous substrate 5. In other words, since the dancer roller 75 is not restrained in the vertical direction, it always applies a constant tension to the porous substrate 5 regardless of its height position. The tension applied to the porous substrate 5 by the dancer roller 75 is defined by the mass of the dancer roller 75 itself. The dancer roller 75 may be provided with a weight for adjusting the tension applied to the porous substrate 5.

乾燥部８０は、塗工ノズル２０によって多孔基材５に塗工された塗工液の塗膜の乾燥処理を行う。乾燥部８０は、搬送機構６０によって搬送される多孔基材５を加熱することによって、塗工液から溶剤を蒸発させて乾燥処理を行う。乾燥部８０は、例えば、塗工液の塗膜を緩やかに昇温させる予熱部、塗膜を所定温度にまで昇温して主たる加熱を行うメイン乾燥部、塗膜をより高温に加熱して膜中の歪みや残留応力を除去するアニール部、加熱された塗膜を冷却する冷却部などを備えていても良い。   The drying unit 80 performs a drying process of the coating film of the coating liquid applied to the porous substrate 5 by the coating nozzle 20. The drying unit 80 performs the drying process by evaporating the solvent from the coating liquid by heating the porous substrate 5 transported by the transport mechanism 60. The drying unit 80 includes, for example, a preheating unit that gradually raises the coating film of the coating liquid, a main drying unit that heats up the coating film to a predetermined temperature and performs main heating, and heats the coating film to a higher temperature. You may provide the annealing part which removes the distortion and residual stress in a film | membrane, the cooling part which cools the heated coating film, etc.

制御部９０は、塗膜形成システム１に設けられた各動作機構を制御して多孔基材５に対する塗工処理を進行させる。制御部９０のハードウェアとしての構成は一般的なコンピュータと同様である。すなわち、制御部９０は、各種演算処理を行うＣＰＵ、基本プログラムを記憶する読み出し専用のメモリであるＲＯＭ、各種情報を記憶する読み書き自在のメモリであるＲＡＭおよび制御用ソフトウェアやデータなどを記憶しておく磁気ディスクを備えて構成される。制御部９０のＣＰＵが所定の処理プログラムを実行することによって塗膜形成システム１における塗工処理が進行する。   The control unit 90 controls each operation mechanism provided in the coating film forming system 1 to advance the coating process on the porous substrate 5. The configuration of the control unit 90 as hardware is the same as that of a general computer. That is, the control unit 90 stores a CPU that performs various arithmetic processes, a ROM that is a read-only memory that stores basic programs, a RAM that is a readable and writable memory that stores various information, control software, data, and the like. It is configured with a magnetic disk. The coating process in the coating film forming system 1 proceeds by the CPU of the control unit 90 executing a predetermined processing program.

上述のような構成を備える塗膜形成システム１にて電極製造を行うときには、搬送機構６０によって多孔基材５をロールトゥロールで連続搬送しつつ、塗工ノズル２０から多孔基材５に対して塗工液を塗工する。本実施形態において塗工の対象となる多孔基材５は、リチウムイオン二次電池の集電体として機能する金属の多孔箔である。多孔箔とは複数の穴が穿設された金属箔である。塗膜形成システム１にてリチウムイオン二次電池の正極を製造する場合には、多孔基材５として例えばアルミニウム（Ａｌ）の多孔箔を用いることができる。また、塗膜形成システム１にて負極を製造する場合には、多孔基材５として例えば銅（Ｃｕ）の多孔箔を用いることができる。多孔基材５は長尺のシート状の多孔箔であり、その幅および厚さについては特に限定されるものではないが、例えば幅６００ｍｍ〜７００ｍｍ、厚さ１０μｍ〜２０μｍとすることができる。また、多孔基材５として用いる多孔箔に穿設された穴の径は例えばφ０．１ｍｍであり、穴の開口率（複数の穴の総面積／金属箔の面積）は１０％〜５０％（本実施形態では３０％）とすることができる。複数の穴は金属箔の全面に均一な密度にて穿設されている。   When the electrode is manufactured in the coating film forming system 1 having the above-described configuration, the porous substrate 5 is continuously conveyed by roll-to-roll by the conveyance mechanism 60, and from the coating nozzle 20 to the porous substrate 5. Apply the coating solution. In the present embodiment, the porous substrate 5 to be coated is a metal porous foil that functions as a current collector of a lithium ion secondary battery. The porous foil is a metal foil having a plurality of holes. When the positive electrode of a lithium ion secondary battery is manufactured by the coating film forming system 1, for example, an aluminum (Al) porous foil can be used as the porous substrate 5. Moreover, when manufacturing a negative electrode with the coating-film formation system 1, the porous base material 5 can use the porous foil of copper (Cu), for example. The porous substrate 5 is a long sheet-like porous foil, and the width and thickness thereof are not particularly limited. For example, the width may be 600 mm to 700 mm and the thickness may be 10 μm to 20 μm. Moreover, the diameter of the hole drilled in the porous foil used as the porous substrate 5 is, for example, φ0.1 mm, and the aperture ratio (total area of the plurality of holes / area of the metal foil) is 10% to 50% ( In this embodiment, it can be 30%). The plurality of holes are formed at a uniform density on the entire surface of the metal foil.

このような多孔基材５としての多孔箔が巻き出しローラ６１から送り出されて巻き取りローラ６２によって巻き取られることにより、塗工装置１０、乾燥部８０の順にロールトゥロール方式にて連続して搬送される。塗工装置１０においては、搬送機構６０によって搬送される多孔基材５の下方に塗工ノズル２０が配置される。塗工ノズル２０は、搬送機構６０によって略水平方向に搬送される多孔基材５の裏面に吐出口２１から電極材料の塗工液を吐出する。すなわち、塗工ノズル２０は、多孔基材５の下側から塗工液を吐出する。   Such a porous foil as the porous substrate 5 is fed out from the unwinding roller 61 and wound up by the winding roller 62, so that the coating device 10 and the drying unit 80 are successively roll-to-rolled in this order. Be transported. In the coating apparatus 10, the coating nozzle 20 is disposed below the porous substrate 5 that is transported by the transport mechanism 60. The coating nozzle 20 discharges the coating liquid of the electrode material from the discharge port 21 to the back surface of the porous substrate 5 that is transported in a substantially horizontal direction by the transport mechanism 60. That is, the coating nozzle 20 discharges the coating liquid from the lower side of the porous substrate 5.

塗膜形成システム１にて正極を製造する場合には、正極材料の塗工液として、例えば正極活物質であるコバルト酸リチウム（ＬｉＣｏＯ２）、導電助剤であるカーボン（Ｃ）、結着剤であるポリフッ化ビニリデン（ＰＶＤＦ）、溶剤であるＮ−メチル−２−ピロリドン（ＮＭＰ）の混合液を用いる。コバルト酸リチウムに代えて、正極活物質としてニッケル酸リチウム（ＬｉＮｉＯ２）、マンガン酸リチウム（ＬｉＭｎ２Ｏ４）、燐酸鉄リチウム（ＬｉＦｅＰＯ４）などを用いることもできる。 When the positive electrode is manufactured by the coating film forming system 1, as a positive electrode material coating liquid, for example, lithium cobaltate (LiCoO 2 ) as a positive electrode active material, carbon (C) as a conductive additive, binder A mixed liquid of polyvinylidene fluoride (PVDF) as a solvent and N-methyl-2-pyrrolidone (NMP) as a solvent is used. Instead of lithium cobaltate, lithium nickelate (LiNiO 2 ), lithium manganate (LiMn 2 O 4 ), lithium iron phosphate (LiFePO 4 ), or the like can be used as the positive electrode active material.

一方、塗膜形成システム１にて負極を製造する場合には、負極材料の塗工液として、例えば負極活物質である黒鉛（グラファイト）、結着剤であるＰＶＤＦ、溶剤であるＮＭＰの混合液を用いる。黒鉛に代えて、負極活物質としてハードカーボン、チタン酸リチウム（Ｌｉ４Ｔｉ５Ｏ１２）、シリコン合金、スズ合金などを用いることもできる。また、正極材料および負極材料の双方において、結着剤としてＰＶＤＦに代えてスチレン−ブタジエンゴム（ＳＢＲ）などを使用することができ、溶剤としてＮＭＰに代えて水（Ｈ２Ｏ）などを使用することができる。さらに、結着剤としてＳＢＲ、溶剤として水を用いる場合には、増粘剤としてカルボキシメチルセルロース（ＣＭＣ）を併用することもできる。これら正極材料および負極材料の塗工液は固体（微粒子）が分散されたスラリーであってその粘度はいずれも１Ｐａ・ｓ（パスカル秒）以上であり、一般的にチクソトロピー性を有する。 On the other hand, when the negative electrode is manufactured by the coating film forming system 1, as a negative electrode material coating liquid, for example, a mixed liquid of graphite (graphite) as a negative electrode active material, PVDF as a binder, and NMP as a solvent. Is used. Instead of graphite, hard carbon, lithium titanate (Li 4 Ti 5 O 12 ), silicon alloy, tin alloy, or the like can be used as the negative electrode active material. In both the positive electrode material and the negative electrode material, styrene-butadiene rubber (SBR) or the like can be used as a binder instead of PVDF, and water (H 2 O) or the like can be used as a solvent instead of NMP. be able to. Furthermore, when using SBR as a binder and water as a solvent, carboxymethylcellulose (CMC) can be used in combination as a thickener. The coating liquid for these positive electrode material and negative electrode material is a slurry in which solids (fine particles) are dispersed, the viscosity of which is 1 Pa · s (pascal second) or more, and generally has thixotropic properties.

本実施形態においては、下方の塗工ノズル２０から多数の穴が穿設された多孔基材５の裏面に塗工液を吐出すると、裏面に着液した塗工液がそれら多数の穴を通って多孔基材５の表面側に滲出する。その結果、多孔基材５の裏面にのみ塗工液を吐出するだけで多孔基材５の表裏両面に塗工液を塗工できることとなる。   In the present embodiment, when the coating liquid is discharged from the lower coating nozzle 20 to the back surface of the porous substrate 5 having a large number of holes, the coating liquid deposited on the back surface passes through the numerous holes. And exudes to the surface side of the porous substrate 5. As a result, the coating liquid can be applied to both the front and back surfaces of the porous substrate 5 only by discharging the coating liquid only to the back surface of the porous substrate 5.

図４は、多孔基材５の一方面に塗工液を吐出したときに生じる現象を示す図である。搬送機構６０によって搬送方向ＤＲとして示す向きに搬送される多孔基材５には複数の穴５ａが穿設されている。複数の穴５ａが穿設された多孔基材５の裏面に塗工ノズル２０から塗工液を吐出すると、多孔基材５の裏面に着液した塗工液の一部が複数の穴５ａから多孔基材５の表面側に滲出する。これにより、多孔基材５の表面にも塗工液が塗工されたのと同じこととなる。   FIG. 4 is a diagram showing a phenomenon that occurs when the coating liquid is discharged onto one surface of the porous substrate 5. A plurality of holes 5 a are formed in the porous substrate 5 that is transported in the direction indicated by the transport mechanism 60 as the transport direction DR. When the coating liquid is discharged from the coating nozzle 20 to the back surface of the porous substrate 5 in which the plurality of holes 5a are formed, a part of the coating liquid deposited on the back surface of the porous substrate 5 is discharged from the plurality of holes 5a. It exudes to the surface side of the porous substrate 5. Thereby, it will be the same as that the coating liquid was applied also to the surface of the porous base material 5.

複数の穴５ａを通って多孔基材５の表面側に滲出した塗工液は、多孔基材５を挟んで塗工ノズル２０と対向する位置に設けられた平滑板３０に到達する。その結果、図４に示すように、塗工ノズル２０の塗工面２２と平滑板３０との間に塗工液の液溜まりが形成されることとなる。そして、その液溜まり中を搬送方向ＤＲに示す向きに多孔基材５が搬送されることによって、多孔基材５の表裏両面に塗工液が塗工される。   The coating liquid that has oozed to the surface side of the porous substrate 5 through the plurality of holes 5a reaches the smooth plate 30 provided at a position facing the coating nozzle 20 with the porous substrate 5 interposed therebetween. As a result, as shown in FIG. 4, a coating liquid pool is formed between the coating surface 22 of the coating nozzle 20 and the smooth plate 30. Then, the coating liquid is applied to both the front and back surfaces of the porous substrate 5 by conveying the porous substrate 5 in the direction indicated by the conveying direction DR in the liquid reservoir.

ここで、本実施形態においては、多孔基材５の搬送方向ＤＲに沿って下流側の平滑板３０の端部３１が塗工ノズル２０の塗工面２２の搬送方向ＤＲに沿った下流側の端部２３の鉛直方向直上となるように平滑板３０が設置されている。すなわち、多孔基材５の搬送方向ＤＲに沿って下流側の平滑板３０の端部３１と塗工面２２の端部２３とが相対向しており、塗工ノズル２０のリアリップ面（塗工面２２のうちの吐出口２１よりも搬送方向ＤＲに沿って下流側の面）が過不足無く平滑板３０によって覆われることとなる。   Here, in the present embodiment, the end 31 of the downstream smooth plate 30 along the transport direction DR of the porous substrate 5 is the downstream end along the transport direction DR of the coating surface 22 of the coating nozzle 20. A smooth plate 30 is installed so as to be directly above the portion 23 in the vertical direction. That is, the end 31 of the smooth plate 30 on the downstream side and the end 23 of the coating surface 22 face each other along the transport direction DR of the porous substrate 5, and the rear lip surface (the coating surface 22 of the coating nozzle 20). The surface on the downstream side of the discharge port 21 along the transport direction DR) is covered with the smooth plate 30 without excess or deficiency.

このような状態の場合、塗工ノズル２０の塗工面２２と平滑板３０との間に形成された塗工液の液溜まりの鉛直方向中央部を多孔基材５が通過すると、多孔基材５よりも上方の液溜まりの液圧と下方の液溜まりの液圧とが等しくなる。多孔基材５の走行位置は、多孔基材５よりも上方の液圧と下方の液圧とのバランスによって規制される。換言すれば、多孔基材５よりも上方の液圧と下方の液圧とが等しくなるように、多孔基材５の走行位置が塗工面２２と平滑板３０との間に形成された塗工液の液溜まりの鉛直方向中央部に規制されるのである。なお、多孔基材５の上下の液圧バランスによって多孔基材５の走行位置が容易に規制できるように、塗工ノズル２０近傍における多孔基材５の張力を一対の第１ピンチローラ７１，７１および第２ピンチローラ７２，７２によって調整しておくのが望ましい。   In such a state, when the porous substrate 5 passes through the central part in the vertical direction of the liquid pool of the coating liquid formed between the coating surface 22 of the coating nozzle 20 and the smooth plate 30, the porous substrate 5 The liquid pressure in the upper liquid reservoir is equal to the liquid pressure in the lower liquid reservoir. The travel position of the porous substrate 5 is regulated by the balance between the hydraulic pressure above and below the porous substrate 5. In other words, the coating in which the traveling position of the porous substrate 5 is formed between the coating surface 22 and the smooth plate 30 so that the hydraulic pressure above and below the porous substrate 5 is equal. It is restricted to the central part in the vertical direction of the liquid pool. Note that the tension of the porous substrate 5 in the vicinity of the coating nozzle 20 is set to a pair of first pinch rollers 71 and 71 so that the traveling position of the porous substrate 5 can be easily regulated by the hydraulic pressure balance between the upper and lower sides of the porous substrate 5. It is desirable that the adjustment is performed by the second pinch rollers 72 and 72.

多孔基材５の上下の液溜まりの液圧は、平滑板３０と塗工ノズル２０の塗工面２２との間隔および塗工ノズル２０からの塗工液の吐出流量によって規定される。平滑板３０と塗工ノズル２０の塗工面２２との間隔は、リニアスケール４０（図３）によって測定されており、その測定結果に基づいて当該間隔が所定値となるように制御部９０によって駆動部２６が制御される。   The liquid pressure in the upper and lower liquid pools of the porous substrate 5 is defined by the distance between the smooth plate 30 and the coating surface 22 of the coating nozzle 20 and the discharge flow rate of the coating liquid from the coating nozzle 20. The interval between the smooth plate 30 and the coating surface 22 of the coating nozzle 20 is measured by the linear scale 40 (FIG. 3), and is driven by the control unit 90 so that the interval becomes a predetermined value based on the measurement result. The unit 26 is controlled.

塗工面２２と平滑板３０との間に形成された塗工液の液溜まりの鉛直方向中央部を通過するように多孔基材５が搬送されると、多孔基材５の表裏両面に形成される塗工液の塗膜の膜厚が等しくなる。すなわち、多孔基材５の表裏両面に均一な膜厚にて塗工液が塗工されたこととなる。多孔基材５の表面および裏面のそれぞれに形成される塗工液の塗膜の膜厚は、塗工ノズル２０からの塗工液の吐出流量、搬送機構６０による多孔基材５の搬送速度、および、平滑板３０と塗工面２２との間隔によって規定される。   When the porous substrate 5 is conveyed so as to pass through the central part in the vertical direction of the liquid pool of the coating liquid formed between the coating surface 22 and the smooth plate 30, it is formed on both front and back surfaces of the porous substrate 5. The coating film thickness of the coating liquid becomes equal. That is, the coating liquid is applied to the front and back surfaces of the porous substrate 5 with a uniform film thickness. The coating film thickness of the coating liquid formed on each of the front surface and the back surface of the porous substrate 5 is determined by the coating liquid discharge flow rate from the coating nozzle 20, the transport speed of the porous substrate 5 by the transport mechanism 60, And it is prescribed | regulated by the space | interval of the smooth plate 30 and the coating surface 22. FIG.

塗工ノズル２０によって表裏両面に塗工液が塗工された多孔基材５は乾燥部８０に搬送され、多孔基材５が加熱されて塗工液から溶剤が蒸発し、塗工液の塗膜の乾燥処理が行われる。多孔基材５が乾燥部８０から搬出される時点では塗工液の塗膜が十分に乾燥されている。そして、乾燥部８０から搬出された多孔基材５は巻き取りローラ６２によって巻き取られる。なお、乾燥処理後の多孔基材５に作用する張力は、ダンサーローラ７５によって一定に調整される。   The porous substrate 5 coated with the coating liquid on both the front and back surfaces by the coating nozzle 20 is conveyed to the drying unit 80, and the porous substrate 5 is heated to evaporate the solvent from the coating liquid. The membrane is dried. When the porous substrate 5 is carried out of the drying unit 80, the coating film of the coating liquid is sufficiently dried. The porous substrate 5 carried out from the drying unit 80 is taken up by the take-up roller 62. The tension acting on the porous substrate 5 after the drying process is adjusted to be constant by the dancer roller 75.

本実施形態においては、複数の穴５ａが穿設された多孔基材５の裏面に塗工ノズル２０から塗工液を吐出することにより、塗工液の一部を複数の穴５ａから多孔基材５の表面に滲出させて多孔基材５の表裏両面に塗工液を塗工している。すなわち、１本の塗工ノズル２０のみによって多孔基材５の表裏両面に塗工液を塗工することができるのである。   In the present embodiment, by discharging the coating liquid from the coating nozzle 20 to the back surface of the porous substrate 5 having a plurality of holes 5a, a part of the coating liquid is removed from the plurality of holes 5a through the porous substrate 5a. The coating liquid is applied to both the front and back surfaces of the porous substrate 5 by leaching onto the surface of the material 5. That is, the coating liquid can be applied to both the front and back surfaces of the porous substrate 5 by only one coating nozzle 20.

両面塗工を行うことができる塗工装置１０に搭載する高価な塗工ノズル２０が１本で足りれば、装置の製造コスト高騰を抑制することができる。また、塗工装置１０に搭載する塗工ノズル２０が１本であれば、２本の塗工ノズルを搭載した場合に必須となる双方の設置位置の整合作業等は不要となる。さらに、塗工装置１０に搭載した１本の塗工ノズル２０についてのみパラメータ（塗工ノズル２０の傾き等）の調整を行えば良いため、塗工条件の最適化が容易となる。   If only one expensive coating nozzle 20 is mounted on the coating apparatus 10 capable of performing double-sided coating, an increase in the manufacturing cost of the apparatus can be suppressed. Moreover, if the coating nozzle 20 mounted in the coating apparatus 10 is one, the alignment operation | work of both installation positions etc. which become indispensable when mounting the two coating nozzles will become unnecessary. Furthermore, since it is only necessary to adjust parameters (such as the inclination of the coating nozzle 20) for only one coating nozzle 20 mounted on the coating apparatus 10, it is easy to optimize the coating conditions.

また、本実施形態では、多孔基材５を挟んで塗工ノズル２０と対向する位置に平滑板３０を設けているため、塗工ノズル２０の塗工面２２と平滑板３０との間に塗工液の液溜まりが保持されるとともに、多孔基材５の表面側における塗膜の膜厚を均一にすることができる。塗膜形成システム１によって製造された電極の幅方向での膜厚（但し、多孔基材５の表裏両面の合計膜厚）のバラツキは±２％程度であり、塗工ノズルを２本設けて両面同時塗工を行った場合のバラツキ（±１％）と比較しても遜色のないものである。   Moreover, in this embodiment, since the smooth plate 30 is provided in the position which opposes the coating nozzle 20 on both sides of the porous base material 5, it coats between the coating surface 22 of the coating nozzle 20, and the smooth plate 30. FIG. While the liquid pool is maintained, the film thickness of the coating film on the surface side of the porous substrate 5 can be made uniform. The variation in the film thickness in the width direction of the electrode manufactured by the coating film forming system 1 (however, the total film thickness on both the front and back surfaces of the porous substrate 5) is about ± 2%, and two coating nozzles are provided. Even if compared with the variation (± 1%) when the double-sided simultaneous coating is performed, it is comparable.

特に、本実施形態においては、搬送機構６０による多孔基材５の搬送方向ＤＲに沿って下流側の平滑板３０の端部３１が塗工ノズル２０の塗工面２２の搬送方向ＤＲに沿った下流側の端部２３に対向する位置に平滑板３０が設置されているため、多孔基材５の走行位置が塗工面２２と平滑板３０との間に形成された塗工液の液溜まりの鉛直方向中央部に規制される。その結果、多孔基材５の表裏両面に形成される塗工液の塗膜の膜厚が等しくなる。   In particular, in this embodiment, the end 31 of the downstream smooth plate 30 along the transport direction DR of the porous substrate 5 by the transport mechanism 60 is downstream along the transport direction DR of the coating surface 22 of the coating nozzle 20. Since the smooth plate 30 is installed at a position facing the end 23 on the side, the traveling position of the porous base material 5 is the vertical of the liquid pool of the coating liquid formed between the coating surface 22 and the smooth plate 30. Regulated in the center of the direction. As a result, the film thickness of the coating film of the coating liquid formed on both front and back surfaces of the porous substrate 5 becomes equal.

また、図５は、塗膜形成システム１によって製造された電極の部分断面図である。塗膜形成システム１では、多孔基材５の裏面に吐出された塗工液を穴５ａを介して多孔基材５の表面に滲出させた状態で乾燥処理を行っているため、乾燥処理後の固化した塗膜は穴５ａの部分によって多孔基材５の表裏で一体化されたものとなっている。すなわち、乾燥処理後の多孔基材５の表面側の塗膜と裏面側の塗膜とは穴５ａの部分であたかもリベットで鋲着されたかのようになっており、強固に連結されている。このため、乾燥処理後の電極において、多孔基材５の表面または裏面から塗膜が剥離するという不具合を防止することができる。その結果、塗工液中の結着剤を減らして活物質の濃度を高めることができ、電極性能を向上させることができる。   FIG. 5 is a partial cross-sectional view of an electrode manufactured by the coating film forming system 1. In the coating film forming system 1, since the drying process is performed in a state where the coating liquid discharged on the back surface of the porous substrate 5 is leached to the surface of the porous substrate 5 through the holes 5a, The solidified coating film is integrated on the front and back of the porous substrate 5 by the hole 5a. That is, the coating film on the front surface side and the coating film on the back surface side of the porous substrate 5 after the drying treatment are as if they were attached to the hole 5a with rivets, and are firmly connected. For this reason, in the electrode after a drying process, the malfunction that a coating film peels from the surface or the back surface of the porous base material 5 can be prevented. As a result, the binder in the coating solution can be reduced to increase the concentration of the active material, and the electrode performance can be improved.

以上、本発明の実施の形態について説明したが、この発明はその趣旨を逸脱しない限りにおいて上述したもの以外に種々の変更を行うことが可能である。例えば、上記実施形態においては、平滑板３０の端部３１と塗工ノズル２０の塗工面２２の端部２３とが対向していたが、これに限定されるものではなく、平滑板３０の端部３１と塗工面２２の端部２３とはずれていても良い。   While the embodiments of the present invention have been described above, the present invention can be modified in various ways other than those described above without departing from the spirit of the present invention. For example, in the above embodiment, the end portion 31 of the smooth plate 30 and the end portion 23 of the coating surface 22 of the coating nozzle 20 are opposed to each other. The part 31 and the end part 23 of the coating surface 22 may be displaced.

図６および図７は、平滑板３０と塗工ノズル２０との配置関係の他の例を示す図である。図６および図７において、第１実施形態と同一の要素については同一の符号を付している。図６には、平滑板３０の端部３１が塗工ノズル２０の塗工面２２の端部２３よりもさらに搬送方向ＤＲに沿って下流側に位置している例を示す。このような状態の場合、多孔基材５よりも上方の液溜まりの液圧が上記実施形態よりも大きくなり、多孔基材５の上下の液圧が等しくなるように、多孔基材５の走行位置は上記実施形態よりも下方へと押し下げられる。その結果、多孔基材５の走行位置は塗工面２２と平滑板３０との間に形成された塗工液の液溜まりの鉛直方向中央部よりも下方に規制され、多孔基材５の上面（表面）の塗膜の膜厚が下面（裏面）の塗膜の膜厚よりも厚くなる。すなわち、多孔基材５の表面側の塗膜の膜厚を裏面側よりも意図的に厚くする場合には、平滑板３０の端部３１が塗工面２２の端部２３よりも搬送方向ＤＲに沿って下流側となるように平滑板３０を配置すれば良い。   6 and 7 are diagrams illustrating another example of the arrangement relationship between the smooth plate 30 and the coating nozzle 20. In FIG. 6 and FIG. 7, the same code | symbol is attached | subjected about the element same as 1st Embodiment. FIG. 6 shows an example in which the end portion 31 of the smooth plate 30 is located further downstream in the transport direction DR than the end portion 23 of the coating surface 22 of the coating nozzle 20. In such a state, the porous substrate 5 travels so that the fluid pressure in the liquid reservoir above the porous substrate 5 is larger than that in the above embodiment, and the upper and lower fluid pressures of the porous substrate 5 are equal. The position is pushed downward from the above embodiment. As a result, the travel position of the porous substrate 5 is regulated below the central portion in the vertical direction of the coating liquid reservoir formed between the coating surface 22 and the smooth plate 30, and the upper surface ( The film thickness of the coating film on the front surface is thicker than the film thickness of the coating film on the lower surface (back surface). That is, when the thickness of the coating film on the front surface side of the porous substrate 5 is intentionally thicker than that on the back surface side, the end portion 31 of the smooth plate 30 is more in the transport direction DR than the end portion 23 of the coating surface 22. What is necessary is just to arrange | position the smooth plate 30 so that it may become a downstream side along.

一方、図７には、平滑板３０の端部３１が塗工ノズル２０の塗工面２２の端部２３よりも搬送方向ＤＲに沿って上流側に位置している例を示す。このような状態の場合、多孔基材５よりも下方の液溜まりの液圧が上記実施形態よりも大きくなり、多孔基材５の上下の液圧が等しくなるように、多孔基材５の走行位置は上記実施形態よりも上方へと押し上げられる。その結果、多孔基材５の走行位置は塗工面２２と平滑板３０との間に形成された塗工液の液溜まりの鉛直方向中央部よりも上方に規制され、多孔基材５の上面の塗膜の膜厚が下面の塗膜の膜厚よりも薄くなる。すなわち、多孔基材５の裏面側の塗膜の膜厚を表面側よりも意図的に厚くする場合には、平滑板３０の端部３１が塗工面２２の端部２３よりも搬送方向ＤＲに沿って上流側となるように平滑板３０を配置すれば良い。但し、平滑板３０は、少なくとも塗工ノズル２０の吐出口２１の鉛直方向直上を覆う位置に設けられている必要があるため、平滑板３０の端部３１は塗工ノズル２０のリアリップ面（塗工面２２のうちの吐出口２１よりも搬送方向ＤＲに沿って下流側の面）のいずれかと対向することとなる。   On the other hand, FIG. 7 shows an example in which the end portion 31 of the smooth plate 30 is located upstream of the end portion 23 of the coating surface 22 of the coating nozzle 20 along the transport direction DR. In such a state, the porous substrate 5 travels so that the fluid pressure in the liquid reservoir below the porous substrate 5 is larger than that in the above embodiment, and the upper and lower fluid pressures of the porous substrate 5 are equal. The position is pushed up from the above embodiment. As a result, the travel position of the porous substrate 5 is regulated above the central portion in the vertical direction of the liquid pool of the coating liquid formed between the coating surface 22 and the smooth plate 30, and The film thickness of the coating film becomes thinner than the film thickness of the coating film on the lower surface. That is, when the thickness of the coating film on the back surface side of the porous substrate 5 is intentionally thicker than that on the front surface side, the end portion 31 of the smooth plate 30 is more in the transport direction DR than the end portion 23 of the coating surface 22. What is necessary is just to arrange | position the smooth plate 30 so that it may become an upstream side along. However, since the smooth plate 30 needs to be provided at a position that covers at least a position directly above the discharge port 21 of the coating nozzle 20 in the vertical direction, the end 31 of the smooth plate 30 has a rear lip surface (coating). Of the work surface 22, it faces one of the downstream surfaces along the transport direction DR from the discharge port 21.

このように、平滑板３０は、少なくとも塗工ノズル２０の吐出口２１の鉛直方向直上を覆う位置に設けられていれば良く、平滑板３０の位置を調整することによって多孔基材５の表裏面に形成される塗膜の膜厚を制御することができる。   Thus, the smooth plate 30 should just be provided in the position which covers at least the vertical direction of the discharge outlet 21 of the coating nozzle 20, and the front and back of the porous base material 5 are adjusted by adjusting the position of the smooth plate 30. It is possible to control the film thickness of the coating film formed on the film.

また、上記実施形態においては、搬送機構６０によって搬送される多孔基材５の下方に塗工ノズル２０を設置していたが、多孔基材５の上方に塗工ノズル２０を設けるようにしても良い。多孔基材５の上方に塗工ノズル２０を設けた場合、スリット状の吐出口２１から下方に向けて多孔基材５の表面に塗工液を吐出する。この場合、平滑板３０は、搬送機構６０によって搬送される多孔基材５を挟んで塗工ノズル２０と対向する位置、すなわち多孔基材５の下方に設けられる。このようにしても上記実施形態と同様の効果を得ることができる。もっとも、多孔基材５の上方に塗工ノズル２０を設けた場合には、吐出停止時に吐出口２１からの塗工液の液だれを防止するための機構（例えば、サックバック機構）を設ける必要が生じるため、上記実施形態のように多孔基材５の下方に塗工ノズル２０を設ける方が好ましい。   Moreover, in the said embodiment, although the coating nozzle 20 was installed below the porous base material 5 conveyed by the conveyance mechanism 60, you may make it provide the coating nozzle 20 above the porous base material 5. FIG. good. When the coating nozzle 20 is provided above the porous substrate 5, the coating liquid is discharged onto the surface of the porous substrate 5 from the slit-shaped discharge port 21 downward. In this case, the smooth plate 30 is provided at a position facing the coating nozzle 20 across the porous substrate 5 conveyed by the conveyance mechanism 60, that is, below the porous substrate 5. Even if it does in this way, the effect similar to the said embodiment can be acquired. However, when the coating nozzle 20 is provided above the porous substrate 5, it is necessary to provide a mechanism (for example, a suck back mechanism) for preventing dripping of the coating liquid from the discharge port 21 when the discharge is stopped. Therefore, it is preferable to provide the coating nozzle 20 below the porous substrate 5 as in the above embodiment.

また、上記実施形態においては、多孔基材５を金属の多孔箔としていたが、多孔基材５は多孔箔に限定されるものではなく、多数の気孔を有する多孔質体であっても良い。すなわち、多孔基材５は、塗工液が通過可能な穴または気孔を有する基材であれば良い。   Moreover, in the said embodiment, although the porous base material 5 was made into the metal porous foil, the porous base material 5 is not limited to porous foil, The porous body which has many pores may be sufficient. That is, the porous substrate 5 may be a substrate having holes or pores through which the coating liquid can pass.

また、塗工ノズル２０は、１本のスリット状の吐出口２１を有するスリットノズルに限定されるものではなく、複数本のスリットを有するものであっても良いし、略円形の吐出口から塗工液を吐出するノズルであっても良い。   Further, the coating nozzle 20 is not limited to a slit nozzle having a single slit-like discharge port 21, and may have a plurality of slits, or may be applied from a substantially circular discharge port. It may be a nozzle that discharges the working fluid.

また、本発明に係る技術を用いて塗工処理を行う対象となる塗工液はリチウムイオン二次電池の電極材料に限定されるものではなく、例えばリチウムイオンキャパシタや太陽電池材料（電極材、封止材）の塗工液または電子材料の絶縁膜や保護膜の塗工液であっても良い。   In addition, the coating liquid to be coated using the technology according to the present invention is not limited to the electrode material of the lithium ion secondary battery, for example, a lithium ion capacitor or a solar cell material (electrode material, It may be a coating liquid for a sealing material or an insulating film or a protective film for an electronic material.

１ 塗膜形成システム
５ 多孔基材
１０ 塗工装置
２０ 塗工ノズル
２１ 吐出口
２２ 塗工面
２６ 駆動部
２８ 塗工液供給機構
３０ 平滑板
４０ リニアスケール
６０ 搬送機構
６１ 巻き出しローラ
６２ 巻き取りローラ
８０ 乾燥部
９０ 制御部 DESCRIPTION OF SYMBOLS 1 Coating film formation system 5 Porous base material 10 Coating apparatus 20 Coating nozzle 21 Discharge port 22 Coating surface 26 Drive part 28 Coating liquid supply mechanism 30 Smooth plate 40 Linear scale 60 Conveying mechanism 61 Unwinding roller 62 Winding roller 80 Drying unit 90 Control unit

Claims (6)

多孔基材に塗工液を塗工する塗工装置であって、
第１ローラから送り出された多孔基材を第２ローラで巻き取ることによって多孔基材を連続して搬送する搬送機構と、
前記搬送機構によって搬送される多孔基材の一方面に塗工液を吐出する塗工ノズルと、
前記搬送機構によって搬送される多孔基材を挟んで前記塗工ノズルと対向する位置に設けられた平滑板と、
を備え、
前記塗工ノズルは、前記平滑板と平行な塗工面および前記塗工面の一部に形成された吐出口を有し、
前記平滑板は少なくとも前記吐出口を覆う位置に設けられることを特徴とする塗工装置。 A coating device for coating a porous substrate with a coating liquid,
A transport mechanism for continuously transporting the porous substrate by winding the porous substrate fed from the first roller with the second roller;
A coating nozzle for discharging a coating liquid onto one surface of a porous substrate transported by the transport mechanism;
A smooth plate provided at a position facing the coating nozzle across the porous substrate transported by the transport mechanism;
With
The coating nozzle has a discharge surface formed in a part of the coating surface and the coating surface parallel to the smooth plate,
The smoothing plate is provided at a position covering at least the discharge port. 請求項１記載の塗工装置において、
前記搬送機構による多孔基材の搬送方向に沿って下流側の前記平滑板の端部が前記塗工ノズルの前記塗工面の下流側端部に対向する位置に前記平滑板が設置されることを特徴とする塗工装置。 The coating apparatus according to claim 1,
The smooth plate is installed at a position where the end of the smooth plate on the downstream side faces the downstream end of the coating surface of the coating nozzle along the transport direction of the porous substrate by the transport mechanism. Feature coating equipment. 請求項１または請求項２記載の塗工装置において、
前記平滑板と前記塗工ノズルの前記塗工面との間隔を測定するリニアスケールをさらに備えることを特徴とする塗工装置。 In the coating apparatus of Claim 1 or Claim 2,
The coating apparatus further comprising a linear scale for measuring a distance between the smooth plate and the coating surface of the coating nozzle. 請求項１から請求項３のいずれかに記載の塗工装置と、
前記塗工装置によって基材に形成された塗工液の塗膜を乾燥させる乾燥部と、
を備えることを特徴とする塗膜形成システム。 A coating apparatus according to any one of claims 1 to 3,
A drying section for drying the coating film of the coating liquid formed on the substrate by the coating apparatus;
A coating film forming system comprising: 多孔基材に塗工液を塗工する塗工方法であって、
第１ローラから送り出された多孔基材を第２ローラで巻き取ることによって多孔基材を連続して搬送する搬送工程と、
搬送される多孔基材の一方面に塗工ノズルから塗工液を吐出する吐出工程と、
を備え、
前記吐出工程では、搬送される多孔基材を挟んで前記塗工ノズルと対向する位置に設けられた平滑板によって少なくとも塗工ノズルの吐出口を覆いつつ前記塗工ノズルから塗工液を吐出することを特徴とする塗工方法。 A coating method for applying a coating liquid to a porous substrate,
A conveying step of continuously conveying the porous substrate by winding the porous substrate sent out from the first roller with the second roller;
A discharge step of discharging the coating liquid from the coating nozzle on one side of the porous substrate to be conveyed;
With
In the discharging step, the coating liquid is discharged from the coating nozzle while covering at least the discharge port of the coating nozzle by a smooth plate provided at a position facing the coating nozzle across the porous substrate to be conveyed. A coating method characterized by that. 請求項５記載の塗工方法において、
前記塗工ノズルは、前記平滑板と平行な塗工面を有し、
前記吐出口は前記塗工面の一部に形成され、
前記吐出工程では、多孔基材の搬送方向に沿って下流側の前記平滑板の端部が前記塗工ノズルの前記塗工面の下流側端部に対向しつつ前記塗工ノズルから塗工液を吐出することを特徴とする塗工方法。 In the coating method according to claim 5,
The coating nozzle has a coating surface parallel to the smooth plate,
The discharge port is formed in a part of the coating surface,
In the discharge step, the coating liquid is applied from the coating nozzle while the end of the smooth plate on the downstream side faces the downstream end of the coating surface of the coating nozzle along the transport direction of the porous substrate. A coating method characterized by discharging.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4228019A1 (en) * 2022-02-14 2023-08-16 VARTA Microbattery GmbH Method and device for manufacturing tape-like electrodes

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108296126A (en) * 2017-03-13 2018-07-20 上海展枭新能源科技有限公司 A kind of apparatus for coating and coating method being suitable for porous substrate
CN111001532A (en) * 2019-11-21 2020-04-14 四川新敏雅电池科技有限公司 Automatic coating control system and control method thereof
KR102456715B1 (en) * 2022-02-07 2022-10-20 주식회사 이디에스 Apparatus for coating porous electrode thin film for secondary battery

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5407702A (en) * 1993-05-05 1995-04-18 Aluminum Company Of America Method for coating a metal strip
JPH10216598A (en) * 1997-02-04 1998-08-18 Toray Ind Inc Method and device for coating and method and device for manufacture of color filter
JP2001015105A (en) * 1999-06-30 2001-01-19 Matsushita Electric Ind Co Ltd Continuously manufacturing device for battery electrode plate
KR101309275B1 (en) * 2011-12-20 2013-09-16 주식회사 나래나노텍 Device and Method of Coating Both Sides of Film, and Coating Apparatus Having the Same
JP2014079708A (en) * 2012-10-17 2014-05-08 Tokyo Ohka Kogyo Co Ltd Double-side coating device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY131661A (en) * 1993-12-29 2007-08-30 Faustel Inc Process and apparatus for resin impregnation of a porous web
US6492012B1 (en) * 2000-02-02 2002-12-10 Tilak M. Shah Polymer penetrated porous substrates
JP4953182B2 (en) * 2001-08-27 2012-06-13 大王製紙株式会社 SAP dispersion slurry coating apparatus and sheet absorbent manufacturing method
BRPI0620798A2 (en) * 2005-12-30 2011-11-22 3M Innovative Properties Co functionalized substrates
KR20140016283A (en) * 2011-02-16 2014-02-07 다우 코닝 코포레이션 Method of coating a porous substrate
JP6157391B2 (en) * 2014-03-20 2017-07-05 Ｊｘｔｇエネルギー株式会社 COATING APPARATUS AND COATING METHOD FOR FORMING DISCONTINUOUS COATING ON A SHEET-shaped FILM

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5407702A (en) * 1993-05-05 1995-04-18 Aluminum Company Of America Method for coating a metal strip
JPH10216598A (en) * 1997-02-04 1998-08-18 Toray Ind Inc Method and device for coating and method and device for manufacture of color filter
JP2001015105A (en) * 1999-06-30 2001-01-19 Matsushita Electric Ind Co Ltd Continuously manufacturing device for battery electrode plate
KR101309275B1 (en) * 2011-12-20 2013-09-16 주식회사 나래나노텍 Device and Method of Coating Both Sides of Film, and Coating Apparatus Having the Same
JP2014079708A (en) * 2012-10-17 2014-05-08 Tokyo Ohka Kogyo Co Ltd Double-side coating device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4228019A1 (en) * 2022-02-14 2023-08-16 VARTA Microbattery GmbH Method and device for manufacturing tape-like electrodes
WO2023152402A1 (en) * 2022-02-14 2023-08-17 Varta Microbattery Gmbh Method and apparatus for manufacturing strip-shaped electrodes

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