JP2016145849A - トリヒドロキシナフタレンノボラック樹脂を含むレジスト下層膜形成組成物 - Google Patents

トリヒドロキシナフタレンノボラック樹脂を含むレジスト下層膜形成組成物 Download PDF

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Publication number
JP2016145849A
JP2016145849A JP2013126459A JP2013126459A JP2016145849A JP 2016145849 A JP2016145849 A JP 2016145849A JP 2013126459 A JP2013126459 A JP 2013126459A JP 2013126459 A JP2013126459 A JP 2013126459A JP 2016145849 A JP2016145849 A JP 2016145849A
Authority
JP
Japan
Prior art keywords
underlayer film
resist
resist underlayer
group
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2013126459A
Other languages
English (en)
Japanese (ja)
Inventor
涼 柄澤
Ryo Karasawa
涼 柄澤
顕司 高瀬
Kenji Takase
顕司 高瀬
徹也 新城
Tetsuya Shinjo
徹也 新城
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Priority to JP2013126459A priority Critical patent/JP2016145849A/ja
Priority to PCT/JP2014/065228 priority patent/WO2014203757A1/ja
Priority to TW103120840A priority patent/TW201512296A/zh
Publication of JP2016145849A publication Critical patent/JP2016145849A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2013126459A 2013-06-17 2013-06-17 トリヒドロキシナフタレンノボラック樹脂を含むレジスト下層膜形成組成物 Pending JP2016145849A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2013126459A JP2016145849A (ja) 2013-06-17 2013-06-17 トリヒドロキシナフタレンノボラック樹脂を含むレジスト下層膜形成組成物
PCT/JP2014/065228 WO2014203757A1 (ja) 2013-06-17 2014-06-09 トリヒドロキシナフタレンノボラック樹脂を含むレジスト下層膜形成組成物
TW103120840A TW201512296A (zh) 2013-06-17 2014-06-17 含有三羥基萘酚醛清漆樹脂之抗蝕下層膜形成組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013126459A JP2016145849A (ja) 2013-06-17 2013-06-17 トリヒドロキシナフタレンノボラック樹脂を含むレジスト下層膜形成組成物

Publications (1)

Publication Number Publication Date
JP2016145849A true JP2016145849A (ja) 2016-08-12

Family

ID=52104495

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013126459A Pending JP2016145849A (ja) 2013-06-17 2013-06-17 トリヒドロキシナフタレンノボラック樹脂を含むレジスト下層膜形成組成物

Country Status (3)

Country Link
JP (1) JP2016145849A (zh)
TW (1) TW201512296A (zh)
WO (1) WO2014203757A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3623867A1 (en) 2018-09-13 2020-03-18 Shin-Etsu Chemical Co., Ltd. Patterning process

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI770204B (zh) * 2017-06-23 2022-07-11 日商日產化學工業股份有限公司 平坦化性經改善之阻劑下層膜形成組成物

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5257009B2 (ja) * 2008-11-14 2013-08-07 Ｊｓｒ株式会社 レジスト下層膜形成用組成物、レジスト下層膜の形成方法、及びパターン形成方法
EP2479198B1 (en) * 2009-09-15 2016-02-17 Mitsubishi Gas Chemical Company, Inc. Aromatic hydrocarbon resin and composition for forming underlayer film for lithography
JP5867732B2 (ja) * 2010-12-09 2016-02-24 日産化学工業株式会社 水酸基含有カルバゾールノボラック樹脂を含むレジスト下層膜形成組成物
JP5485188B2 (ja) * 2011-01-14 2014-05-07 信越化学工業株式会社 レジスト下層膜材料及びこれを用いたパターン形成方法
JP5859420B2 (ja) * 2012-01-04 2016-02-10 信越化学工業株式会社 レジスト下層膜材料、レジスト下層膜材料の製造方法、及び前記レジスト下層膜材料を用いたパターン形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3623867A1 (en) 2018-09-13 2020-03-18 Shin-Etsu Chemical Co., Ltd. Patterning process

Also Published As

Publication number Publication date
TW201512296A (zh) 2015-04-01
WO2014203757A1 (ja) 2014-12-24

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