JP2015532667A - スチリル系化合物、前記スチリル系化合物を含む色材、これを含む感光性樹脂組成物、前記感光性樹脂組成物で製造された感光材、これを含むカラーフィルタおよび前記カラーフィルタを含むディスプレイ装置 - Google Patents

スチリル系化合物、前記スチリル系化合物を含む色材、これを含む感光性樹脂組成物、前記感光性樹脂組成物で製造された感光材、これを含むカラーフィルタおよび前記カラーフィルタを含むディスプレイ装置 Download PDF

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JP2015532667A
JP2015532667A JP2015527399A JP2015527399A JP2015532667A JP 2015532667 A JP2015532667 A JP 2015532667A JP 2015527399 A JP2015527399 A JP 2015527399A JP 2015527399 A JP2015527399 A JP 2015527399A JP 2015532667 A JP2015532667 A JP 2015532667A
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group
substituted
unsubstituted
carbon atoms
styryl compound
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パク、ジョンホ
スー キム、ハン
スー キム、ハン
キム、スンヒュン
チョ、チャンホ
キム、スンファ
リュ、ジャンヒュン
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エルジー・ケム・リミテッド
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00—Carboxylic acid nitriles
    • C07C255/01—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms
    • C07C255/32—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring
    • C07C255/34—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring with cyano groups linked to the six-membered aromatic ring, or to the condensed ring system containing that ring, by unsaturated carbon chains
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00—Carboxylic acid nitriles
    • C07C255/01—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms
    • C07C255/32—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring
    • C07C255/42—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring the carbon skeleton being further substituted by singly-bound nitrogen atoms, not being further bound to other hetero atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/0008—Methine or polymethine dyes, e.g. cyanine dyes substituted on the polymethine chain
    • C09B23/005—Methine or polymethine dyes, e.g. cyanine dyes substituted on the polymethine chain the substituent being a COOH and/or a functional derivative thereof
    • C09B23/0058—Methine or polymethine dyes, e.g. cyanine dyes substituted on the polymethine chain the substituent being a COOH and/or a functional derivative thereof the substituent being CN
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/10—The polymethine chain containing an even number of >CH- groups
    • C09B23/105—The polymethine chain containing an even number of >CH- groups two >CH- groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/14—Styryl dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C09B57/008—Triarylamine dyes containing no other chromophores
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0041—Photosensitive materials providing an etching agent upon exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Ceramic Engineering (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
JP2015527399A 2012-08-31 2013-08-30 スチリル系化合物、前記スチリル系化合物を含む色材、これを含む感光性樹脂組成物、前記感光性樹脂組成物で製造された感光材、これを含むカラーフィルタおよび前記カラーフィルタを含むディスプレイ装置 Pending JP2015532667A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
KR20120096343 2012-08-31
KR10-2012-0096343 2012-08-31
KR20130000370 2013-01-02
KR10-2013-0000370 2013-01-02
PCT/KR2013/007864 WO2014035203A1 (ko) 2012-08-31 2013-08-30 스티릴계 화합물, 상기 스티릴계 화합물을 포함하는 색재, 이를 포함하는 감광성 수지 조성물, 상기 감광성 수지 조성물로 제조된 감광재, 상기 감광재를 포함하는 컬러필터 및 상기 컬러필터를 포함하는 디스플레이 장치

Publications (1)

Publication Number Publication Date
JP2015532667A true JP2015532667A (ja) 2015-11-12

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JP2015527399A Pending JP2015532667A (ja) 2012-08-31 2013-08-30 スチリル系化合物、前記スチリル系化合物を含む色材、これを含む感光性樹脂組成物、前記感光性樹脂組成物で製造された感光材、これを含むカラーフィルタおよび前記カラーフィルタを含むディスプレイ装置

Country Status (5)

Country Link
JP (1) JP2015532667A (ko)
KR (1) KR101538848B1 (ko)
CN (1) CN104768925B (ko)
TW (1) TW201422645A (ko)
WO (1) WO2014035203A1 (ko)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017198787A (ja) * 2016-04-26 2017-11-02 凸版印刷株式会社 緑色感光性着色組成物、それを用いたカラーフィルタ及びカラー表示装置
JP2017207676A (ja) * 2016-05-20 2017-11-24 Jsr株式会社 カラーフィルタ材料用着色組成物、カラーフィルタ材料用着色硬化膜、カラーフィルタ、表示素子及び受光素子
JP2017210615A (ja) * 2016-05-24 2017-11-30 エルジー・ケム・リミテッド 化合物およびこれを含む色材組成物およびこれを含む樹脂組成物
WO2021044860A1 (ja) * 2019-09-06 2021-03-11 大塚化学株式会社 ブラックマトリックス用着色組成物およびカラーフィルタ

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014152251A (ja) * 2013-02-08 2014-08-25 Toyo Ink Sc Holdings Co Ltd 反応性化合物、およびそれを用いた重合性組成物
KR102131481B1 (ko) * 2016-07-26 2020-07-07 주식회사 엘지화학 감광성 수지 조성물 및 이를 포함하는 컬러필터
KR102385559B1 (ko) * 2017-07-20 2022-04-12 동우 화인켐 주식회사 청색 착색 경화성 수지 조성물, 컬러 필터 및 표시 장치
KR102662536B1 (ko) * 2018-12-06 2024-04-30 주식회사 엘지화학 색재 조성물, 감광성 수지 조성물, 감광재, 컬러필터, 및 디스플레이 장치

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58111942A (ja) * 1981-12-25 1983-07-04 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
JPS6113245A (ja) * 1984-06-11 1986-01-21 マイクロサイ，インコーポレイテッド スピンキヤスタブルレジスト組成物およびその使用方法
JPS61180242A (ja) * 1984-12-20 1986-08-12 マイクロサイ，インコーポレイテッド 光食刻法
WO1990013435A1 (en) * 1989-05-02 1990-11-15 Dai Nippon Insatsu Kabushiki Kaisha Thermal transfer sheet
JPH08109335A (ja) * 1994-10-12 1996-04-30 Hodogaya Chem Co Ltd カチオン染料
JP2008520352A (ja) * 2004-11-22 2008-06-19 アドバンスト メディカル オプティクス， インコーポレーテッド 共重合性メチンおよびアントラキノン化合物およびそれらを含有する物品
WO2012039286A1 (ja) * 2010-09-22 2012-03-29 株式会社Adeka 染料及び着色感光性組成物
WO2012144421A1 (ja) * 2011-04-20 2012-10-26 株式会社Adeka α－シアノアクリル酸エステル構造を有する新規化合物、染料及び着色感光性組成物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0392860A (ja) * 1989-09-05 1991-04-18 Fuji Photo Film Co Ltd 感光性樹脂組成物
EP0600064A1 (en) * 1992-06-19 1994-06-08 F. Hoffmann-La Roche Ag Optical non-linear polymers
JP3676510B2 (ja) * 1996-09-13 2005-07-27 富士写真フイルム株式会社 反射防止膜材料用組成物

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58111942A (ja) * 1981-12-25 1983-07-04 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
JPS6113245A (ja) * 1984-06-11 1986-01-21 マイクロサイ，インコーポレイテッド スピンキヤスタブルレジスト組成物およびその使用方法
JPS61180242A (ja) * 1984-12-20 1986-08-12 マイクロサイ，インコーポレイテッド 光食刻法
WO1990013435A1 (en) * 1989-05-02 1990-11-15 Dai Nippon Insatsu Kabushiki Kaisha Thermal transfer sheet
JPH08109335A (ja) * 1994-10-12 1996-04-30 Hodogaya Chem Co Ltd カチオン染料
JP2008520352A (ja) * 2004-11-22 2008-06-19 アドバンスト メディカル オプティクス， インコーポレーテッド 共重合性メチンおよびアントラキノン化合物およびそれらを含有する物品
WO2012039286A1 (ja) * 2010-09-22 2012-03-29 株式会社Adeka 染料及び着色感光性組成物
WO2012144421A1 (ja) * 2011-04-20 2012-10-26 株式会社Adeka α－シアノアクリル酸エステル構造を有する新規化合物、染料及び着色感光性組成物

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017198787A (ja) * 2016-04-26 2017-11-02 凸版印刷株式会社 緑色感光性着色組成物、それを用いたカラーフィルタ及びカラー表示装置
JP2017207676A (ja) * 2016-05-20 2017-11-24 Jsr株式会社 カラーフィルタ材料用着色組成物、カラーフィルタ材料用着色硬化膜、カラーフィルタ、表示素子及び受光素子
JP2017210615A (ja) * 2016-05-24 2017-11-30 エルジー・ケム・リミテッド 化合物およびこれを含む色材組成物およびこれを含む樹脂組成物
WO2021044860A1 (ja) * 2019-09-06 2021-03-11 大塚化学株式会社 ブラックマトリックス用着色組成物およびカラーフィルタ
JP2021043250A (ja) * 2019-09-06 2021-03-18 大塚化学株式会社 ブラックマトリックス用着色組成物およびカラーフィルタ
JP7308700B2 (ja) 2019-09-06 2023-07-14 大塚化学株式会社 ブラックマトリックス用着色組成物およびカラーフィルタ

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Publication number Publication date
TW201422645A (zh) 2014-06-16
KR20140029322A (ko) 2014-03-10
CN104768925B (zh) 2017-03-08
KR101538848B1 (ko) 2015-07-23
CN104768925A (zh) 2015-07-08
WO2014035203A1 (ko) 2014-03-06

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