JP2015044981A5 - - Google Patents

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JP2015044981A5
JP2015044981A5 JP2014149212A JP2014149212A JP2015044981A5 JP 2015044981 A5 JP2015044981 A5 JP 2015044981A5 JP 2014149212 A JP2014149212 A JP 2014149212A JP 2014149212 A JP2014149212 A JP 2014149212A JP 2015044981 A5 JP2015044981 A5 JP 2015044981A5
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JP
Japan
Prior art keywords
mol
molecular weight
peak molecular
diblock copolymers
pmma diblock
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JP2014149212A
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JP5911534B2 (ja
JP2015044981A (ja
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Priority claimed from FR1357333A external-priority patent/FR3008986B1/fr
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この実施例では、ピーク分子量Ｍｐが８６．２ｇ／ｍｏｌの純粋なＰＳ−ｂ−ＰＭＭＡジブロックコポリマー、または変わらないＰＳ組成（プロトンＮＭＲによって測定して、それぞれ６９．５％および６９．２％である）を有するピーク分子量Ｍｐが７１．７ｇ／ｍｏｌのＰＳ−ｂ−ＰＭＭＡジブロックコポリマーとＰＳホモポリマーとのブレンドの、何れか一方により得られた膜の厚さ間で、比較を行う。
JP2014149212A 2013-07-25 2014-07-22 ブロックコポリマーとブロックの一つの（コ）ポリマーのブレンドから得られる形態を特徴付ける周期の制御方法 Active JP5911534B2 (ja)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
FR1357333A FR3008986B1 (fr) 2013-07-25 2013-07-25 Procede de controle de la periode caracterisant la morphologie obtenue a partir d'un melange de copolymere a blocs et de (co) polymeres de l'un des blocs
FR1357333 2013-07-25
US201361879899P 2013-09-19 2013-09-19
US61/879,899 2013-09-19
FR1451490A FR3008987B1 (fr) 2013-07-25 2014-02-25 Procede de controle de la periode caracterisant la morphologie obtenue a partir d'un melange de copolymere a blocs et de (co) polymeres de l'un des blocs
FR1451490 2014-02-25

Related Child Applications (1)

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JP2015090880A Division JP2015187273A (ja) 2013-07-25 2015-04-27 ブロックコポリマーとブロックの一つの（コ）ポリマーのブレンドから得られる形態を特徴付ける周期の制御方法

Publications (3)

Publication Number Publication Date
JP2015044981A JP2015044981A (ja) 2015-03-12
JP2015044981A5 true JP2015044981A5 (ja) 2015-06-18
JP5911534B2 JP5911534B2 (ja) 2016-04-27

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JP2014149212A Active JP5911534B2 (ja) 2013-07-25 2014-07-22 ブロックコポリマーとブロックの一つの（コ）ポリマーのブレンドから得られる形態を特徴付ける周期の制御方法
JP2015090880A Pending JP2015187273A (ja) 2013-07-25 2015-04-27 ブロックコポリマーとブロックの一つの（コ）ポリマーのブレンドから得られる形態を特徴付ける周期の制御方法

Family Applications After (1)

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JP2015090880A Pending JP2015187273A (ja) 2013-07-25 2015-04-27 ブロックコポリマーとブロックの一つの（コ）ポリマーのブレンドから得られる形態を特徴付ける周期の制御方法

Country Status (8)

Country Link
US (1) US9296014B2 (ja)
JP (2) JP5911534B2 (ja)
KR (1) KR101540883B1 (ja)
CN (1) CN105579498B (ja)
FR (2) FR3008986B1 (ja)
SG (1) SG11201600564SA (ja)
TW (1) TWI595533B (ja)
WO (1) WO2015011035A1 (ja)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6243213B2 (ja) * 2013-12-13 2017-12-06 東邦化学工業株式会社 ブロック共重合体の製造方法
JP6356096B2 (ja) * 2014-06-27 2018-07-11 ダウ グローバル テクノロジーズ エルエルシー ブロックコポリマーを製造するための方法およびそれから製造される物品
JP6122906B2 (ja) 2014-06-27 2017-04-26 ダウ グローバル テクノロジーズ エルエルシー ブロックコポリマーを製造するための方法およびそれから製造される物品
FR3025616A1 (fr) * 2014-09-10 2016-03-11 Arkema France Procede de controle du taux de defauts dans des films obtenus avec des melanges de copolymeres a blocs et de polymeres
FR3029921B1 (fr) * 2014-12-16 2018-06-29 Arkema France Procede de controle de la synthese d'un copolymere a blocs contenant au moins un bloc apolaire et au moins un bloc polaire et utilisation d'un tel copolymere a blocs dans des applications de nano-lithographie par auto-assemblage direct.
FR3031751B1 (fr) * 2015-01-21 2018-10-05 Arkema France Procede de reduction des defauts dans un film ordonne de copolymere a blocs
FR3045643A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'amelioration de l'uniformite de dimension critique de films ordonnes de copolymere a blocs
FR3045645B1 (fr) * 2015-12-18 2019-07-05 Arkema France Procede de reduction des defauts dans un film ordonne de copolymeres a blocs
FR3045644A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs
FR3045642A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede de reduction du temps de structuration de films ordonnes de copolymere a blocs
FR3075800B1 (fr) * 2017-12-21 2020-10-09 Arkema France Couches anti adhesives pour les procedes d'impression par transfert
CN113286833A (zh) * 2019-01-17 2021-08-20 默克专利股份有限公司 在低Tg低聚物的存在下用于形成图案的增强定向自组装
FR3101355A1 (fr) * 2019-10-01 2021-04-02 Arkema France Sous-couche neutre pour copolymère à blocs et empilement polymérique comprenant une telle sous-couche recouverte d’un film de copolymère à blocs
FR3101354A1 (fr) * 2019-10-01 2021-04-02 Arkema France Sous-couche neutre pour copolymère à blocs et empilement polymérique comprenant une telle sous-couche recouverte d’un film de copolymère à blocs

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2679237B1 (fr) 1991-07-19 1994-07-22 Atochem Systeme d'amorcage pour la polymerisation anionique de monomeres (meth) acryliques.
FR2735480B1 (fr) * 1995-06-15 1997-07-18 Atochem Elf Sa Procede de polymerisation anionique en continu d'au moins un monomere (meth)acrylique pour l'obtention de polymeres a haut taux de solide
FR2773158B1 (fr) * 1997-12-30 2000-02-04 Atochem Elf Sa Procede de polymerisation radicalaire controlee faisant intervenir une faible quantite de radical libre stable
US6734256B1 (en) * 1998-12-29 2004-05-11 3M Innovative Properties Company Block copolymer hot-melt processable adhesives, methods of their preparation, and articles therefrom
WO2009151834A2 (en) 2008-05-08 2009-12-17 The Regents Of The University Of California Supramolecular block copolymer compositions for sub-micron lithography
FR2809829B1 (fr) * 2000-06-05 2002-07-26 Rhodia Chimie Sa Nouvelle composition photosensible pour la fabrication de photoresist
JP2002137321A (ja) * 2000-11-01 2002-05-14 Ube Ind Ltd 複合体薄膜とその製造方法
KR100595336B1 (ko) * 2001-07-18 2006-06-30 아사히 가세이 케미칼즈 가부시키가이샤 개질 블록 공중합체
US6991741B2 (en) 2001-11-30 2006-01-31 University Of Maryland Controlled room temperature synthesis of magnetic metal oxide nanoclusters within a diblock copolymer matrix
ITMI20021495A1 (it) * 2002-07-09 2002-10-08 Polimeri Europa Spa Procedimento per la preparazione di copolimeri a blocchi.
US8133534B2 (en) * 2004-11-22 2012-03-13 Wisconsin Alumni Research Foundation Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials
US8287957B2 (en) * 2004-11-22 2012-10-16 Wisconsin Alumni Research Foundation Methods and compositions for forming aperiodic patterned copolymer films
JP5136999B2 (ja) * 2005-11-18 2013-02-06 国立大学法人京都大学 パターン基板の製造方法、パターン転写体、磁気記録用パターン媒体、及び高分子薄膜
US7347953B2 (en) * 2006-02-02 2008-03-25 International Business Machines Corporation Methods for forming improved self-assembled patterns of block copolymers
JP5414011B2 (ja) * 2006-05-23 2014-02-12 国立大学法人京都大学 微細構造体、パターン媒体、及びそれらの製造方法
US7723009B2 (en) * 2006-06-02 2010-05-25 Micron Technology, Inc. Topography based patterning
US7964107B2 (en) 2007-02-08 2011-06-21 Micron Technology, Inc. Methods using block copolymer self-assembly for sub-lithographic patterning
US7790350B2 (en) * 2007-07-30 2010-09-07 International Business Machines Corporation Method and materials for patterning a neutral surface
US7521094B1 (en) 2008-01-14 2009-04-21 International Business Machines Corporation Method of forming polymer features by directed self-assembly of block copolymers
US8426313B2 (en) * 2008-03-21 2013-04-23 Micron Technology, Inc. Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference
EP2151457A1 (en) * 2008-07-28 2010-02-10 Total Petrochemicals France Process to make a diblock copolymer having a monovinylaromatic polymer block
CA2776672A1 (en) * 2008-10-03 2010-04-08 Chamelic Ltd Ab diblock copolymers and applications for their use
JP5281386B2 (ja) * 2008-12-22 2013-09-04 株式会社日立製作所 高分子薄膜及びパターン媒体並びにこれらの製造方法
US8551566B2 (en) * 2009-02-19 2013-10-08 Massachusetts Institute Of Technology Directed material assembly
JP2010234703A (ja) * 2009-03-31 2010-10-21 Fujifilm Corp 積層体
US8834956B2 (en) * 2009-06-22 2014-09-16 Micron Technology, Inc. Methods of utilizing block copolymer to form patterns
US9299381B2 (en) 2011-02-07 2016-03-29 Wisconsin Alumni Research Foundation Solvent annealing block copolymers on patterned substrates
FR2974094A1 (fr) 2011-04-15 2012-10-19 Arkema France Procede de preparation de surfaces
US8513356B1 (en) 2012-02-10 2013-08-20 Dow Global Technologies Llc Diblock copolymer blend composition
WO2013120052A1 (en) * 2012-02-10 2013-08-15 E. I. Du Pont De Nemours And Company Preparation, purification and use of high-x diblock copolymers
US20130209755A1 (en) 2012-02-15 2013-08-15 Phillip Dene Hustad Self-assembled structures, method of manufacture thereof and articles comprising the same
US9372398B2 (en) * 2012-03-02 2016-06-21 Wisconsin Alumni Research Foundation Patterning in the directed assembly of block copolymers using triblock or multiblock copolymers
JP5752655B2 (ja) * 2012-09-10 2015-07-22 株式会社東芝 パターン形成方法
JP5640099B2 (ja) * 2013-01-07 2014-12-10 株式会社日立製作所 微細構造を有する高分子薄膜およびパターン基板の製造方法
TWI645254B (zh) * 2013-01-14 2018-12-21 美國加利福尼亞大學董事會 具經控制之總成及提升排序之含矽嵌段共聚物之組合物

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