JP2014508086A - 第13列および第15列の元素を含有する混合粒子の組成物の製造方法 - Google Patents
第13列および第15列の元素を含有する混合粒子の組成物の製造方法 Download PDFInfo
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- JP2014508086A JP2014508086A JP2013543793A JP2013543793A JP2014508086A JP 2014508086 A JP2014508086 A JP 2014508086A JP 2013543793 A JP2013543793 A JP 2013543793A JP 2013543793 A JP2013543793 A JP 2013543793A JP 2014508086 A JP2014508086 A JP 2014508086A
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- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- ZXLNWYWHXZVAMF-UHFFFAOYSA-N 3,3,4,4,5,5-hexaethylazaborole Chemical compound C(C)C1(C(C(N=B1)(CC)CC)(CC)CC)CC ZXLNWYWHXZVAMF-UHFFFAOYSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- LOQGIWVDZZOXTL-UHFFFAOYSA-N C(C)(C)(C)[Al](C(C)(C)C)C(C)(C)C.CC1=C(C(=C(C1([In])C)C)C)C Chemical compound C(C)(C)(C)[Al](C(C)(C)C)C(C)(C)C.CC1=C(C(=C(C1([In])C)C)C)C LOQGIWVDZZOXTL-UHFFFAOYSA-N 0.000 description 1
- CJORMZAJIWJXSW-UHFFFAOYSA-N C[Si](C)(C)C1=C(C=CC=C1)[In]N Chemical compound C[Si](C)(C)C1=C(C=CC=C1)[In]N CJORMZAJIWJXSW-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910010082 LiAlH Inorganic materials 0.000 description 1
- BELGZFLOEKOASN-UHFFFAOYSA-N P.[AlH3] Chemical class P.[AlH3] BELGZFLOEKOASN-UHFFFAOYSA-N 0.000 description 1
- MXPAIBMSSAOXPX-UHFFFAOYSA-N [AlH2][SiH3] Chemical compound [AlH2][SiH3] MXPAIBMSSAOXPX-UHFFFAOYSA-N 0.000 description 1
- RQMIWLMVTCKXAQ-UHFFFAOYSA-N [AlH3].[C] Chemical class [AlH3].[C] RQMIWLMVTCKXAQ-UHFFFAOYSA-N 0.000 description 1
- BPGDAMSIGCZZLK-UHFFFAOYSA-N acetyloxymethyl acetate Chemical compound CC(=O)OCOC(C)=O BPGDAMSIGCZZLK-UHFFFAOYSA-N 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 125000005234 alkyl aluminium group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical compound [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 description 1
- CEGOLXSVJUTHNZ-UHFFFAOYSA-K aluminium tristearate Chemical compound [Al+3].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O CEGOLXSVJUTHNZ-UHFFFAOYSA-K 0.000 description 1
- 229940063655 aluminum stearate Drugs 0.000 description 1
- PMTNABPGINFFGB-UHFFFAOYSA-N aluminum;trimethylsilicon Chemical compound C[Si](C)(C)[Al]([Si](C)(C)C)[Si](C)(C)C PMTNABPGINFFGB-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910000074 antimony hydride Inorganic materials 0.000 description 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229910000072 bismuth hydride Inorganic materials 0.000 description 1
- BPBOBPIKWGUSQG-UHFFFAOYSA-N bismuthane Chemical compound [BiH3] BPBOBPIKWGUSQG-UHFFFAOYSA-N 0.000 description 1
- KKAXNAVSOBXHTE-UHFFFAOYSA-N boranamine Chemical class NB KKAXNAVSOBXHTE-UHFFFAOYSA-N 0.000 description 1
- BGECDVWSWDRFSP-UHFFFAOYSA-N borazine Chemical compound B1NBNBN1 BGECDVWSWDRFSP-UHFFFAOYSA-N 0.000 description 1
- 150000001638 boron Chemical class 0.000 description 1
- 150000004657 carbamic acid derivatives Chemical class 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- XOYLJNJLGBYDTH-UHFFFAOYSA-M chlorogallium Chemical compound [Ga]Cl XOYLJNJLGBYDTH-UHFFFAOYSA-M 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001913 cyanates Chemical class 0.000 description 1
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- ZTJBELXDHFJJEU-UHFFFAOYSA-N dimethylboron Chemical class C[B]C ZTJBELXDHFJJEU-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- SPRIOUNJHPCKPV-UHFFFAOYSA-N hydridoaluminium Chemical compound [AlH] SPRIOUNJHPCKPV-UHFFFAOYSA-N 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- UWNADWZGEHDQAB-UHFFFAOYSA-N i-Pr2C2H4i-Pr2 Natural products CC(C)CCC(C)C UWNADWZGEHDQAB-UHFFFAOYSA-N 0.000 description 1
- CXQHBGCUHODCNP-UHFFFAOYSA-N indigane Chemical class [InH3] CXQHBGCUHODCNP-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000012280 lithium aluminium hydride Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052987 metal hydride Inorganic materials 0.000 description 1
- 150000004681 metal hydrides Chemical class 0.000 description 1
- SAWKFRBJGLMMES-UHFFFAOYSA-N methylphosphine Chemical compound PC SAWKFRBJGLMMES-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- KAQADGSKDGBNFN-UHFFFAOYSA-N n,n-diethylethanamine;triethylborane Chemical compound CCB(CC)CC.CCN(CC)CC KAQADGSKDGBNFN-UHFFFAOYSA-N 0.000 description 1
- UYNMRJHVKXIMHA-UHFFFAOYSA-N n,n-dimethylmethanamine;trimethylindigane Chemical compound CN(C)C.C[In](C)C UYNMRJHVKXIMHA-UHFFFAOYSA-N 0.000 description 1
- KCFRGNTWICAUIP-UHFFFAOYSA-N n-[bis(diethylamino)boranyl]-n-ethylethanamine Chemical group CCN(CC)B(N(CC)CC)N(CC)CC KCFRGNTWICAUIP-UHFFFAOYSA-N 0.000 description 1
- BCADLFWESKJZKD-UHFFFAOYSA-N n-diethylboranyl-n-ethylaniline Chemical compound CCB(CC)N(CC)C1=CC=CC=C1 BCADLFWESKJZKD-UHFFFAOYSA-N 0.000 description 1
- ATKTZRIOBPKLRL-UHFFFAOYSA-N n-dimethylindiganyl-n-methylaniline Chemical compound C[In](C)N(C)C1=CC=CC=C1 ATKTZRIOBPKLRL-UHFFFAOYSA-N 0.000 description 1
- WIOPHQBOVIUQBX-UHFFFAOYSA-N n-methylmethanamine;trimethylalumane Chemical compound CNC.C[Al](C)C WIOPHQBOVIUQBX-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- OHFDBBFDFZXHJQ-UHFFFAOYSA-N phenylarsane Chemical compound [AsH2]C1=CC=CC=C1 OHFDBBFDFZXHJQ-UHFFFAOYSA-N 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- OGHBATFHNDZKSO-UHFFFAOYSA-N propan-2-olate Chemical compound CC(C)[O-] OGHBATFHNDZKSO-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000008247 solid mixture Substances 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- OUULRIDHGPHMNQ-UHFFFAOYSA-N stibane Chemical compound [SbH3] OUULRIDHGPHMNQ-UHFFFAOYSA-N 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- ZVTQDOIPKNCMAR-UHFFFAOYSA-N sulfanylidene(sulfanylideneboranylsulfanyl)borane Chemical compound S=BSB=S ZVTQDOIPKNCMAR-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- ZGNPLWZYVAFUNZ-UHFFFAOYSA-N tert-butylphosphane Chemical compound CC(C)(C)P ZGNPLWZYVAFUNZ-UHFFFAOYSA-N 0.000 description 1
- BXJGLLKRUQQYTC-UHFFFAOYSA-N thallium(1+);sulfide Chemical class [S-2].[Tl+].[Tl+] BXJGLLKRUQQYTC-UHFFFAOYSA-N 0.000 description 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-L thiosulfate(2-) Chemical compound [O-]S([S-])(=O)=O DHCDFWKWKRSZHF-UHFFFAOYSA-L 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- OVZUSPADPSOQQN-UHFFFAOYSA-N tri(propan-2-yloxy)indigane Chemical compound [In+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] OVZUSPADPSOQQN-UHFFFAOYSA-N 0.000 description 1
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 1
- LALRXNPLTWZJIJ-UHFFFAOYSA-N triethylborane Chemical compound CCB(CC)CC LALRXNPLTWZJIJ-UHFFFAOYSA-N 0.000 description 1
- OTRPZROOJRIMKW-UHFFFAOYSA-N triethylindigane Chemical compound CC[In](CC)CC OTRPZROOJRIMKW-UHFFFAOYSA-N 0.000 description 1
- HVCAAGXCKQGSLC-UHFFFAOYSA-N triethylthallane Chemical compound CC[Tl](CC)CC HVCAAGXCKQGSLC-UHFFFAOYSA-N 0.000 description 1
- WRECIMRULFAWHA-UHFFFAOYSA-N trimethyl borate Chemical compound COB(OC)OC WRECIMRULFAWHA-UHFFFAOYSA-N 0.000 description 1
- GYRSDRWMRBYREA-UHFFFAOYSA-N trimethylalumane;trimethylphosphane Chemical compound C[Al](C)C.CP(C)C GYRSDRWMRBYREA-UHFFFAOYSA-N 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 1
- VYRLPDUIQPFWPC-UHFFFAOYSA-N trimethylthallane Chemical compound C[Tl](C)C VYRLPDUIQPFWPC-UHFFFAOYSA-N 0.000 description 1
- USDXXMFGMXFNQS-UHFFFAOYSA-N triphenylthallane Chemical compound C1=CC=CC=C1[Tl](C=1C=CC=CC=1)C1=CC=CC=C1 USDXXMFGMXFNQS-UHFFFAOYSA-N 0.000 description 1
- RSCASNFKRQQQDK-UHFFFAOYSA-N tritert-butylgallane Chemical compound CC(C)(C)[Ga](C(C)(C)C)C(C)(C)C RSCASNFKRQQQDK-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/0632—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with gallium, indium or thallium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/072—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with aluminium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B25/00—Phosphorus; Compounds thereof
- C01B25/08—Other phosphides
- C01B25/082—Other phosphides of boron, aluminium, gallium or indium
- C01B25/087—Other phosphides of boron, aluminium, gallium or indium of gallium or indium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G15/00—Compounds of gallium, indium or thallium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/40—Electric properties
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Luminescent Compositions (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
−ナノ粒子:形状の如何にかかわらず、少なくとも、幅および厚さのいずれもが100nm未満、典型的には、1nmから20nmの間である、すべての粒子。
−非水性溶媒媒体:配位錯体などの少なくとも1つの化合物と接触させたときに溶液を形成することができるすべての組成物であって、この組成物は、水がこの組成物において溶剤として作用しないという意味で非水性であるが、微量の水は含んでいてもよい。同組成物は、最初から液体状態であってもよく、または逆に、可溶化する1つまたは複数の化合物との接触後にしか液体状態に移行しないものであってもよい。同組成物は、単純組成物、すなわち、単一の化合物で構成されたものであってもよく、また逆に、複合組成物であり、複数の化合物を含有していてもよい。特に、同組成物は、溶剤として作用する1つまたは複数の化合物のみならず、1つまたは複数の配位錯体の溶解に対して実質的に中立の反応によって消費されず、反応に関与するか、もしくは関与しない、任意の他の化合物を含有していてもよい。
−元素の配位錯体:構造が、少なくとも1つの錯体形成分子またはイオン(アニオン)に、共有結合、配位結合、水素結合または静電結合により結合した、少なくとも1つの前記元素の原子からなる、すべての化合物。
−付加物:化学種ABであって、各分子成分が、2つの別々の分子成分AとBとの直接結合によって形成されているもの。
−水素化物:周期表の元素の原子と水素原子との間に少なくとも1つの化学結合を有する化合物。
−第13列の少なくとも1つの元素E1を含む少なくとも1つの前駆体を選択し、
−第15列の少なくとも1つの元素E2を含む少なくとも1つの前駆体を選択し、
−配位子と称する、前駆体に対して非還元性であり、混合単結晶ナノ粒子の形成を促進するために選択される少なくとも1つの化合物の存在下で、第13列の少なくとも1つの元素E1を含む配位錯体から選択される少なくとも1つの第1の前駆体を非水性溶媒媒体へ可溶化させることにより、溶液を作製し、
−前記溶液を、第15列の少なくとも1つの元素E2の水素化物から選択される少なくとも1つの第2の前駆体に接触させ、前記溶液を、前駆体の接触を可能にし、混合結晶粒子の生成反応を引き起こすのに適切な反応条件に供し、
反応を100℃未満の温度で行うことを特徴とする方法に関する。
化学反応器内で、第13列(第III族)の元素の給源である第1の前駆体を、有機溶媒中に、不活性雰囲気下、周囲温度で溶解する。この溶液に配位子を導入する。第15列(第V族)の元素の給源である、気体状の第2の前駆体を化学反応器内に:
−有機媒体中で形成され、第1の前駆体と配位子とを含有する溶液中に、不活性雰囲気下、周囲温度で、または、50℃以下の温度へ軽度に加熱して、第2の前駆体をバブリングすることによるか、
−前記溶液を、周囲温度で、または、50℃以下の温度へ軽度に加熱して、第2の前駆体の気体雰囲気下に置くことによるか、
−有機媒体中で形成され、第1の前駆体と配位子とを含有する溶液中に、不活性雰囲気下、周囲温度で、第2の前駆体をバブリングし、次いで、バブリング停止後に、前記溶体を50℃以下の温度へ加熱することによるか、
−前記溶液を、周囲温度で、第2の前駆体の気体雰囲気下に第1の期間置き、次いで、前記溶体を、引き続く第2の期間、50℃以下の温度へ加熱することにより、
導入する。
下表1は、この実施例で使用した試薬およびその量をまとめたものである。
下表2は、この実施例で使用した試薬およびその量をまとめたものである。
下表3は、この実施例で使用した試薬およびその量をまとめたものである。
下表4は、この実施例で使用した試薬およびその量をまとめたものである。
下表5は、この実施例で使用した試薬およびその量をまとめたものである。
下表6は、この実施例で使用した試薬およびその量をまとめたものである。
下表7は、この実施例で使用した試薬およびその量をまとめたものである。
Claims (15)
- 元素周期表の第13列の少なくとも1つの元素と、第15列の少なくとも1つの元素とを含む、混合結晶粒子の組成物の製造方法であって、該方法において:
−第13列の少なくとも1つの元素E1を含む少なくとも1つの前駆体を選択し、
−第15列の少なくとも1つの元素E2を含む少なくとも1つの前駆体を選択し、
−配位子と称する、前駆体に対して非還元性であり、混合単結晶ナノ粒子の形成を促進するために選択される少なくとも1つの化合物の存在下で、第13列の少なくとも1つの元素E1を含む配位錯体から選択される少なくとも1つの第1の前駆体を非水性溶媒媒体に可溶化させることにより、溶液を作製し、
−前記溶液を、第15列の少なくとも1つの元素E2の水素化物から選択される少なくとも1つの第2の前駆体に接触させ、前記溶液を、前駆体の接触を可能にし、混合結晶粒子の生成反応を引き起こすのに適切な反応条件に供し、
反応を100℃未満の温度で行うことを特徴とする方法。 - ナノ粒子形成反応を、ナノ粒子形成反応のための還元剤の機能を有する剤の非存在下で行うことを特徴とする、請求項1に記載の方法。
- 反応を50℃以下の温度で行うことを特徴とする、請求項1または2に記載の方法。
- 反応を、周囲圧力および周囲温度で、熱処理なしに行うことを特徴とする、請求項1から3のいずれか一項に記載の方法。
- 第13列の少なくとも1つの元素E1と、少なくとも1つのE1−A1結合とを含む配位錯体の群から選択される、少なくとも1つの第1の前駆体を使用することを特徴とし、A1は、炭素、窒素、酸素、水素、リン、ケイ素、硫黄およびセレンから選択される元素である、請求項1から4のいずれか一項に記載の方法。
- 第13列の少なくとも1つの元素E1と、アミド、アミジネート、炭素含有基、シリル、酸素含有基、水素化物、リン含有基、硫黄含有基、セレン含有基を含む群から選択される少なくとも1つの基とを含み、それにより第13列の少なくとも1つの元素E1を含む配位錯体のアミン付加物、ホスフィン付加物、酸素含有付加物、硫黄含有付加物およびセレン含有付加物から選択される少なくとも1つの第1の前駆体を使用することを特徴とする、請求項5に記載の方法。
- 気体の状態の少なくとも1つの第2の前駆体を使用することを特徴とする、請求項1から6のいずれか一項に記載の方法。
- 気体状の少なくとも1つの第2の前駆体を、前記溶液中でバブリングすることを特徴とする、請求項7に記載の方法。
- 前記溶液を、気体状の少なくとも1つの第2の前駆体を含有する気体雰囲気下に置くことを特徴とする、請求項7または8に記載の方法。
- 第15列の少なくとも1つの元素E2、少なくとも1つのE2−H結合、および少なくとも1つのE2−A2結合を含む水素化物の群から選択される少なくとも1つの第2の前駆体を使用することを特徴とし、ここで、A2は、炭素、窒素、酸素、水素、リンおよびケイ素から選択される元素である、請求項1から9のいずれか一項に記載の方法。
- E2が第15列の元素であり、nおよびmが0ではない整数である、式E2nHmの単純水素化物の群から選択される少なくとも1つの第2の前駆体を使用することを特徴とする、請求項1から10のいずれか一項に記載の方法。
- 少なくとも1つの配位子を前記溶液に加えることを特徴とする、請求項1から11のいずれか一項に記載の方法。
- アミン、窒素酸化物、アミノアルコール、ニトリル(特にシアノ)、アミノ酸、イミン(シッフ塩基)、ジアゾ化合物、カルバミン酸塩、アンモニウム、シアン酸塩、イソシアン酸塩、シロキサン、シラン、シラザン、尿素、カルボニル、ヒドロキシル、エポキシド、シクロデキストリン、グリコシド、チオール、アミノチオール、チオシアン酸塩、イソチオシアン酸塩、キサントゲン酸塩(R−OC(S)SR’)、チオ尿素、亜硫酸塩、チオニル、チオ硫酸塩、硫酸塩、ホスフィン、ホスフィン酸化物、ホスフィン硫化物、ホスホン酸塩、ホスホン酸、ホスフィン酸塩、ホスフィン酸、リン酸塩、カルボン酸塩、カルボン酸、カルベン、アルキン、アルケン、アレーン、および、ルイス酸からなる群から選択される少なくとも1つの配位子を使用することを特徴とする、請求項12に記載の方法。
- ヘキサデシルアミン、ドデシルアミン、オクチルアミン、オレイルアミン、エチレンジアミン、ピリジン、オクタンチオール、ドデカンチオール、ヘキサデカンチオール、トリオクチルホスフィン、酸化トリオクチルホスフィン、オクタン酸、ミリスチン酸、ステアリン酸、オレイン酸、ラウリル酸、ヘキシルホスホン酸、テトラデシルホスホン酸、式H2NC3H6[−OCH2CH2]n−OC3H6NH2で表され、約1500g.mol−1の分子量を有するポリ(エチレングリコール)ビス(3−プロピルアミン)、式H2NC2H4[−OCH2CH2]n−OC2H4NH2で表され、約3000g.mol−1から10,000g.mol−1の分子量を有するポリ(エチレングリコール)ビス(2−エチルアミン)、式H3C[−OCH2CH2]n−OC2H4NH2で表され、約750g.mol−1の分子量を有するα−(2−エチルアミン)−メトキシ(エチレングリコール)、式HOOC−CH2[−OCH2CH2]n−O−CH2−COOHで表され、約600g.mol−1の分子量を有するポリ(エチレングリコール)ジカルボン酸、式H3C[−OCH2CH2]n−O−CH2−COOHで表され、約3000g.mol−1の分子量を有するメチルエーテル−ポリ(エチレングリコール)カルボン酸を含む群から選択される少なくとも1つの配位子を使用することを特徴とする、請求項12または13に記載の方法。
- THF、DMF、DMSO、ジエチエルエーテル、メチルtertブチルエーテル、ジイソプロピルエーテル、トルエン、アニソール、アセトン、ベンゼン、トリクロロエチレン、酢酸エチル、ヘプタン、ヘキサン、ペンタン、シクロヘキサン、アセトニトリル、クロロホルム、ジクロロメタン、ジオキサン、キシレンから選択される有機溶媒を含む溶媒媒体を使用することを特徴とする、請求項1から14のいずれか一項に記載の方法。
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JP2017160078A (ja) * | 2016-03-09 | 2017-09-14 | 三菱マテリアル株式会社 | InAsコロイド粒子の製造方法 |
WO2018139447A1 (ja) * | 2017-01-25 | 2018-08-02 | 日立化成株式会社 | 半導体ナノ粒子の製造方法 |
WO2018139446A1 (ja) * | 2017-01-25 | 2018-08-02 | 国立研究開発法人産業技術総合研究所 | 半導体ナノ粒子製造装置及び半導体ナノ粒子の製造方法 |
JP2019151832A (ja) * | 2018-03-02 | 2019-09-12 | 株式会社アルバック | コアシェル型量子ドット分散液の製造方法及び量子ドット分散液の製造方法 |
WO2022070854A1 (ja) * | 2020-09-30 | 2022-04-07 | スタンレー電気株式会社 | Iii族窒化物半導体ナノ粒子、コアシェル型粒子、及びその製造方法 |
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FR3057471B1 (fr) | 2016-10-17 | 2018-12-07 | Centre National De La Recherche Scientifique | Nano-catalyseur triptyque et son utilisation pour la photo-catalyse |
FR3102169B1 (fr) | 2019-10-18 | 2021-12-31 | Centre Nat Rech Scient | procédé de fabrication de motifs micro- et nanostructurés |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6424006A (en) * | 1987-07-13 | 1989-01-26 | Ibm | Synthesis of iiia group and va group compounds |
JP2006143526A (ja) * | 2004-11-19 | 2006-06-08 | National Institute Of Advanced Industrial & Technology | ナノ粒子の低温合成法 |
WO2008016154A1 (en) * | 2006-07-31 | 2008-02-07 | Hoya Corporation | Method for production of microparticle, and method for production of indium organocarboxylate |
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US7335345B2 (en) * | 2004-05-24 | 2008-02-26 | Drexel University | Synthesis of water soluble nanocrystalline quantum dots and uses thereof |
US20100240770A1 (en) * | 2005-03-11 | 2010-09-23 | Jifa Qi | Synthesis and use of colloidal III-V nanoparticles |
US7488384B2 (en) * | 2006-05-03 | 2009-02-10 | Ohio University | Direct pyrolysis route to GaN quantum dots |
US7935419B1 (en) * | 2008-02-07 | 2011-05-03 | Los Alamos National Security, Llc | Thick-shell nanocrystal quantum dots |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6424006A (en) * | 1987-07-13 | 1989-01-26 | Ibm | Synthesis of iiia group and va group compounds |
JP2006143526A (ja) * | 2004-11-19 | 2006-06-08 | National Institute Of Advanced Industrial & Technology | ナノ粒子の低温合成法 |
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JP2017160078A (ja) * | 2016-03-09 | 2017-09-14 | 三菱マテリアル株式会社 | InAsコロイド粒子の製造方法 |
WO2018139447A1 (ja) * | 2017-01-25 | 2018-08-02 | 日立化成株式会社 | 半導体ナノ粒子の製造方法 |
WO2018139446A1 (ja) * | 2017-01-25 | 2018-08-02 | 国立研究開発法人産業技術総合研究所 | 半導体ナノ粒子製造装置及び半導体ナノ粒子の製造方法 |
CN110268035A (zh) * | 2017-01-25 | 2019-09-20 | 日立化成株式会社 | 半导体纳米粒子的制造方法 |
JP2019151832A (ja) * | 2018-03-02 | 2019-09-12 | 株式会社アルバック | コアシェル型量子ドット分散液の製造方法及び量子ドット分散液の製造方法 |
JP7098555B2 (ja) | 2018-03-02 | 2022-07-11 | 株式会社アルバック | コアシェル型量子ドット分散液の製造方法及び量子ドット分散液の製造方法 |
WO2022070854A1 (ja) * | 2020-09-30 | 2022-04-07 | スタンレー電気株式会社 | Iii族窒化物半導体ナノ粒子、コアシェル型粒子、及びその製造方法 |
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