JP2013189690A - Plated plastic chassis - Google Patents

Plated plastic chassis Download PDF

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Publication number
JP2013189690A
JP2013189690A JP2012057957A JP2012057957A JP2013189690A JP 2013189690 A JP2013189690 A JP 2013189690A JP 2012057957 A JP2012057957 A JP 2012057957A JP 2012057957 A JP2012057957 A JP 2012057957A JP 2013189690 A JP2013189690 A JP 2013189690A
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Prior art keywords
chassis
plastic chassis
plastic
plating
plated
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JP5965684B2 (en
Inventor
Masahito Nakamoto
正仁 中本
Eiichiro Kawaguchi
英一郎 川口
Hiroshi Sakai
比呂志 酒井
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Techno UMG Co Ltd
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UMG ABS Ltd
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Priority to JP2012057957A priority Critical patent/JP5965684B2/en
Priority to CA2866813A priority patent/CA2866813A1/en
Priority to PCT/JP2013/057136 priority patent/WO2013137375A1/en
Priority to CN201380013541.1A priority patent/CN104206039B/en
Priority to KR1020147025314A priority patent/KR20140138708A/en
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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F1/00Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
    • G06F1/16Constructional details or arrangements
    • G06F1/18Packaging or power distribution
    • G06F1/183Internal mounting support structures, e.g. for printed circuit boards, internal connecting means
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1646Characteristics of the product obtained
    • C23C18/165Multilayered product
    • C23C18/1653Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2046Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
    • C23C18/2053Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment only one step pretreatment
    • C23C18/2066Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/22Roughening, e.g. by etching
    • C23C18/24Roughening, e.g. by etching using acid aqueous solutions
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/30Activating or accelerating or sensitising with palladium or other noble metal
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Theoretical Computer Science (AREA)
  • Power Engineering (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Inorganic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Laminated Bodies (AREA)
  • Casings For Electric Apparatus (AREA)
  • Injection Moulding Of Plastics Or The Like (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a plastic chassis which, through resinification, can be made lighter, thinner and more complex in shape, which, even when made thinner and lighter, has durability under high-temperature conditions and rigidity equivalent to that of a metal chassis made of magnesium, and which can ensure product safety by suppressing decreased dimensional precision and warpage due to being thinner and lighter, and to provide an electrical product component formed by adhering a component substrate made of a thermoplastic resin to the plastic chassis.SOLUTION: A plated plastic chassis has a plastic chassis body formed by a filler reinforced plastic with a bending elastic modulus of 4,000-22,000 MPa according to ISO 178:2001, and a plating layer of 5-50 μm in thickness formed on at least a portion of the surface of the plastic chassis body.

Description

本発明は、電気製品の内部シャーシ等として用いられる、めっき加工されたプラスチックシャーシに関する。   The present invention relates to a plated plastic chassis used as an internal chassis of an electrical product.

携帯電話、ノートパソコン等の弱電製品の筐体には、製品の薄肉化に伴い高い剛性が必要とされている。本用途では、従来からマグネシウムのダイキャストやチクソモールディングで成形された金属筐体が多く用いられている。最近では、金属筐体の代替品として、ポリカーボネート樹脂、ポリカーボネート/ABS樹脂等のプラスチック筐体に電気めっきで金属を厚付けして剛性を高めたものも用いられるようになっている。   High rigidity is required for a housing of a weak electrical product such as a mobile phone or a notebook computer as the product becomes thinner. In this application, a metal casing molded by magnesium die casting or thixomolding has been conventionally used in many cases. Recently, as an alternative to a metal casing, a plastic casing made of polycarbonate resin, polycarbonate / ABS resin, or the like, which is thickened by electroplating to increase rigidity, has been used.

また、電気製品の内部に設けられる内部シャーシにも、高い剛性が必要とされることから、マグネシウム等の金属シャーシが用いられている。最近では、電気製品の内部シャーシについても、金属シャーシの代替として、プラスチックシャーシが検討されてきている。その理由は、樹脂化による複雑な形状の成形が可能となる上、薄肉化、軽量化が可能となるためである。   In addition, a metal chassis made of magnesium or the like is also used for an internal chassis provided in an electric product because high rigidity is required. Recently, as an internal chassis of electrical products, a plastic chassis has been studied as an alternative to a metal chassis. The reason is that it becomes possible to form a complicated shape by resinization, and to reduce the thickness and weight.

ところで、複雑な形状のプラスチックシャーシにも、マグネシウムの金属シャーシと同等の高い剛性、強度および耐久性が要求され、樹脂化により薄肉化や軽量化を図った上での安全性の確保が要求される。しかし、従来のプラスチックシャーシは、これらの要求に充分に応えるものであるとは言えない。   By the way, the plastic chassis with a complicated shape is also required to have the same high rigidity, strength and durability as the magnesium metal chassis, and it is required to secure safety after reducing the thickness and weight by resinization. The However, it cannot be said that the conventional plastic chassis sufficiently satisfies these requirements.

なお、特許文献1には、ABS樹脂とABS樹脂以外の樹脂とを2色成形した筐体本体のABS樹脂部にめっきしたプラスチック筐体が提案されている。しかし、該プラスチック筐体は、プリント配線板に実装された電子部品をシールドするためのものであって、プラスチックシャーシに関するものではない。   Patent Document 1 proposes a plastic casing in which an ABS resin portion of a casing body obtained by molding two colors of ABS resin and resin other than ABS resin is plated. However, the plastic casing is for shielding an electronic component mounted on the printed wiring board, and is not related to a plastic chassis.

また、特許文献2には、プラスチック筐体に厚さ5〜30μmのめっき層を析出させて剛性および硬度を高める方法が提案されている。しかし、該方法は、電気製品の内部シャーシ向けとしては考慮されておらず、該方法のみでは、内部シャーシの樹脂化による形状の複雑化、薄肉化、軽量化に伴う安全性の確保は充分とは言えない。   Patent Document 2 proposes a method of increasing rigidity and hardness by depositing a plating layer having a thickness of 5 to 30 μm on a plastic casing. However, this method is not considered for the internal chassis of electrical products, and the method alone is sufficient to ensure safety due to the complicated shape, thinning, and weight reduction due to the resinization of the internal chassis. I can't say that.

実公平7−1833号公報No. 7-1833 特開2005−154864号公報JP 2005-154864 A

本発明は、樹脂化による形状の複雑化、薄肉化および軽量化が可能であり、薄肉化や軽量化してもマグネシウムの金属シャーシと同等の剛性および高温度条件下での耐久性を有し、かつ薄肉化や軽量化に伴う反りや寸法精度の低下を抑えることによって製品の安全性を確保できるプラスチックシャーシ;該プラスチックシャーシに、熱可塑性樹脂からなる部品基材を密着させた電気製品用部品を提供する。   The present invention can be complicated in shape, thinned and lightened by resinization, and has rigidity and durability under high temperature conditions equivalent to magnesium metal chassis even when thinned and lightened, A plastic chassis that can ensure the safety of the product by suppressing warpage and dimensional accuracy deterioration due to thinning and weight reduction; a component for electrical products in which a component base material made of thermoplastic resin is adhered to the plastic chassis. provide.

本発明のめっき加工されたプラスチックシャーシは、ISO 178:2001の曲げ弾性率が4,000〜22,000MPaである充填剤強化プラスチックを成形してなるプラスチックシャーシ本体と、該プラスチックシャーシ本体の表面の少なくとも一部に形成された、厚さ5〜50μmのめっき層とを有することを特徴とする。   The plated plastic chassis of the present invention includes a plastic chassis body formed by molding a filler reinforced plastic having a flexural modulus of ISO 178: 2001 of 4,000 to 22,000 MPa, and a surface of the plastic chassis body. It has the plating layer of 5-50 micrometers in thickness formed in at least one part.

本発明のめっき加工されたプラスチックシャーシは、下記の要件を満足することが好ましい。
前記充填剤強化プラスチックを成形してなる試験片(12.5mm×127mm×1mm厚)の表面に、前記めっき層と同じ条件にてめっき層を形成してなる、めっき加工試験片のISO 178:2001の曲げ弾性率が、25,000〜60,000MPaである。
The plated plastic chassis of the present invention preferably satisfies the following requirements.
ISO 178 of a plating processing test piece formed by forming a plating layer on the surface of a test piece (12.5 mm × 127 mm × 1 mm thickness) formed by molding the filler reinforced plastic under the same conditions as the plating layer: The flexural modulus of 2001 is 25,000-60,000 MPa.

本発明の電気製品用部品は、本発明のめっき加工されたプラスチックシャーシと、該めっき加工されたプラスチックシャーシに密着した、熱可塑性樹脂からなる部品基材とを有することを特徴とする。   The component for an electrical product of the present invention includes the plated plastic chassis of the present invention and a component base material made of a thermoplastic resin in close contact with the plated plastic chassis.

本発明のめっき加工されたプラスチックシャーシは、樹脂化による形状の複雑化、薄肉化および軽量化が可能であり、薄肉化や軽量化してもマグネシウムの金属シャーシと同等の剛性および高温度条件下での耐久性を有し、かつ薄肉化や軽量化に伴う反りや寸法精度の低下を抑えることによって製品の安全性を確保できる。
本発明の電気製品用部品は、本発明のプラスチックシャーシに、熱可塑性樹脂からなる部品基材を密着させたものであるため、内部シャーシを内蔵した製品により近い部品として仕上げられており、製品の組み立て工程を簡素化できる。
The plated plastic chassis of the present invention can be complicated in shape, thinned and lightened by resinization, and even under thinned and lightened, it has the same rigidity and high temperature conditions as magnesium metal chassis. The safety of the product can be ensured by suppressing the warpage and dimensional accuracy degradation associated with the reduction in thickness and weight.
Since the parts for electrical products of the present invention are made by adhering a component base material made of a thermoplastic resin to the plastic chassis of the present invention, they are finished as parts closer to the product incorporating the internal chassis. The assembly process can be simplified.

本明細書におけるシャーシとは、プリント配線板や電子部品が固定されるベース部材を意味し、これらを収納する筐体(ケース、ハウジングとも呼ばれる。)とは区別される。
本明細書における充填剤強化プラスチックの曲げ弾性率は、12.5mm×127mm×4mm厚の試験片についてISO 178:2001に準拠して測定される曲げ弾性率である。
本明細書におけるめっき加工試験片の曲げ弾性率は、12.5mm×127mm×1mm厚の試験片をめっき加工したものについてISO 178:2001に準拠して測定される曲げ弾性率である。
The chassis in this specification means a base member to which a printed wiring board and electronic components are fixed, and is distinguished from a housing (also referred to as a case or a housing) that houses them.
The flexural modulus of the filler reinforced plastic in this specification is a flexural modulus measured according to ISO 178: 2001 for a test piece having a thickness of 12.5 mm × 127 mm × 4 mm.
The bending elastic modulus of the plating test piece in this specification is a bending elastic modulus measured in accordance with ISO 178: 2001 on a plated test piece having a thickness of 12.5 mm × 127 mm × 1 mm.

<めっき加工されたプラスチックシャーシ>
本発明のめっき加工されたプラスチックシャーシは、充填剤強化プラスチックを成形してなるプラスチックシャーシ本体と、該プラスチックシャーシ本体の表面の少なくとも一部に形成されためっき層とを有する。
<Plated plastic chassis>
The plated plastic chassis of the present invention has a plastic chassis main body formed by molding a filler-reinforced plastic, and a plating layer formed on at least a part of the surface of the plastic chassis main body.

(充填剤強化プラスチック)
充填剤強化プラスチックは、熱可塑性樹脂と、充填剤と、必要に応じて他の成分とを含む。
(Filler reinforced plastic)
The filler-reinforced plastic includes a thermoplastic resin, a filler, and other components as necessary.

熱可塑性樹脂の種類は、特に限定されない。熱可塑性樹脂としては、ポリアミド(ナイロン6、ナイロン66等)、ポリオレフィン(ポリエチレン、ポリプロピレン等)、ポリエステル(ポリエチレンテレフタレート、ポリブチレンテレフタレート等)、ポリカーボネート、ポリアミドイミド、ポリフェニレンサルファイド、ポリフェニレンオキシド、ポリスルホン、ポリエーテルスルホン、ポリエーテルエーテルケトン、ポリエーテルイミド、スチレン系樹脂(ポリスチレン、ABS樹脂等)、液晶ポリエステル等が挙げられる。また、共重合体(アクリロニトリルとスチレンとの共重合体、ナイロン6とナイロン66との共重合体等)であってもよく、前記熱可塑性樹脂の混合物(アロイを含む)であってもよい。   The kind of thermoplastic resin is not particularly limited. Thermoplastic resins include polyamide (nylon 6, nylon 66, etc.), polyolefin (polyethylene, polypropylene, etc.), polyester (polyethylene terephthalate, polybutylene terephthalate, etc.), polycarbonate, polyamideimide, polyphenylene sulfide, polyphenylene oxide, polysulfone, polyether Examples include sulfone, polyether ether ketone, polyether imide, styrene resin (polystyrene, ABS resin, etc.), liquid crystal polyester, and the like. Further, it may be a copolymer (a copolymer of acrylonitrile and styrene, a copolymer of nylon 6 and nylon 66, etc.), or a mixture of thermoplastic resins (including alloys).

充填剤の種類は、特に限定されない。充填剤としては、無機充填剤、有機充填剤、植物系充填剤等が挙げられる。
無機充填剤としては、無機繊維(ガラス繊維、炭素繊維等)、無機繊維に金属コーティングしたもの、無機物(ウオラストナイト、タルク、マイカ、ガラスフレーク、ガラスビーズ、チタン酸カリウム、炭酸カルシウム、炭酸マグネシウム、カーボンブラック、ケッチェンブラック等)、金属や合金(鉄、銅、亜鉛、アルミニウム等)、金属酸化物の繊維、金属酸化物の粉末等が挙げられる。
有機充填剤としては、ポリエチレンテレフタレート繊維、ポリエチレンナフタレート繊維、アラミド繊維、アクリル繊維等が挙げられる。
植物系充填剤としては、ケナフ、竹繊維等が挙げられる。
繊維は、チョップドファイバーであってもよく、ロングファイバーであってもよい。
充填剤としては、少ない配合で高い剛性が得られる点から、ガラス繊維または炭素繊維が好ましい。
The kind of filler is not particularly limited. Examples of the filler include inorganic fillers, organic fillers, plant fillers, and the like.
Inorganic fillers include inorganic fibers (glass fibers, carbon fibers, etc.), inorganic fibers coated with metal, inorganic substances (wollastonite, talc, mica, glass flakes, glass beads, potassium titanate, calcium carbonate, magnesium carbonate) Carbon black, ketjen black, etc.), metals and alloys (iron, copper, zinc, aluminum, etc.), metal oxide fibers, metal oxide powders, and the like.
Examples of the organic filler include polyethylene terephthalate fiber, polyethylene naphthalate fiber, aramid fiber, and acrylic fiber.
Examples of plant fillers include kenaf and bamboo fiber.
The fiber may be a chopped fiber or a long fiber.
As the filler, glass fiber or carbon fiber is preferable because high rigidity can be obtained with a small amount of blending.

他の成分としては、帯電防止剤、難燃剤(臭素系、リン系、水酸化物等)、難燃助剤(三酸化アンチモン、ポリテトラフルオロエチレン等)、表面外観改良剤、耐候性改良剤、酸化防止剤、熱安定剤、紫外線吸収剤、抗菌剤、粘着付与剤、可塑剤、滑剤、着色剤、相溶化剤、導電性フィラー、老化防止剤、防制曇剤等が挙げられる。   Other components include antistatic agents, flame retardants (bromine, phosphorus, hydroxide, etc.), flame retardant aids (antimony trioxide, polytetrafluoroethylene, etc.), surface appearance improvers, weather resistance improvers. , Antioxidants, heat stabilizers, ultraviolet absorbers, antibacterial agents, tackifiers, plasticizers, lubricants, colorants, compatibilizers, conductive fillers, anti-aging agents, anti-fogging agents, and the like.

充填剤強化プラスチックは、熱可塑性樹脂と充填剤、必要に応じて他の成分とを混合装置(ヘンシェルミキサ、タンブラーミキサ、ナウターミキサ等)を用いて混合することによって得られる。さらに、混練装置(単軸押出機、二軸押出機、バンバリーミキサ、コニーダ等)を用いて混練してもよい。   The filler-reinforced plastic is obtained by mixing a thermoplastic resin, a filler, and, if necessary, other components using a mixing device (Henschel mixer, tumbler mixer, Nauter mixer, etc.). Furthermore, kneading may be performed using a kneading apparatus (single-screw extruder, twin-screw extruder, Banbury mixer, conida, etc.).

熱可塑性樹脂および充填剤の配合量は、充填剤強化プラスチックの曲げ弾性率が4,000〜22,000MPaになるような量とする。
充填剤強化プラスチックの曲げ弾性率は、4,000〜22,000MPaであり、8,000〜21,000MPaが好ましい。充填剤強化プラスチックの曲げ弾性率が4.000MPa以上であれば、めっき加工されたプラスチックシャーシの反りが抑えれ、また、ヒートサイクル性に優れる。充填剤強化プラスチックの曲げ弾性率が22,000MPa以下であれば、成形加工性が良好となる。
The blending amount of the thermoplastic resin and the filler is set such that the flexural modulus of the filler-reinforced plastic is 4,000 to 22,000 MPa.
The flexural modulus of the filler reinforced plastic is 4,000 to 22,000 MPa, preferably 8,000 to 21,000 MPa. When the flexural modulus of the filler-reinforced plastic is 4.000 MPa or more, the warp of the plated plastic chassis can be suppressed, and the heat cycle property is excellent. If the flexural modulus of the filler reinforced plastic is 22,000 MPa or less, the moldability will be good.

(プラスチックシャーシ本体)
プラスチックシャーシ本体は、充填剤強化プラスチックを成形したものである。充填剤強化プラスチックの成形加工法としては、射出成形法、射出圧縮成形法、プレス成形法、押出成形法(異型を含む)、ブロー成形法、真空成形法、圧空成形法、カレンダー成形法、インフレーション成形法等が挙げられる。これらの中でも、量産性に優れ、高い寸法精度の成形品を得ることができる点から、射出成形法、射出圧縮成形法が好ましい。
(Plastic chassis body)
The plastic chassis body is formed by molding filler-reinforced plastic. Filler-reinforced plastic molding methods include injection molding, injection compression molding, press molding, extrusion molding (including variants), blow molding, vacuum molding, pressure molding, calendar molding, inflation Examples include molding methods. Among these, the injection molding method and the injection compression molding method are preferable because they are excellent in mass productivity and can obtain a molded product with high dimensional accuracy.

(めっき層)
めっき層の厚さは、5〜50μmであり、10〜45μmが好ましく、15〜40μmがより好ましく、25〜40μmがさらに好ましい。めっき層の厚さが5μm以上であれば、めっき加工されたプラスチックシャーシの剛性が充分に高くなる。めっき層の厚さが50μm以下であれば、反りが抑えれ、また、ヒートサイクル性に優れる。
(Plating layer)
The thickness of the plating layer is 5 to 50 μm, preferably 10 to 45 μm, more preferably 15 to 40 μm, and still more preferably 25 to 40 μm. If the thickness of the plating layer is 5 μm or more, the rigidity of the plated plastic chassis is sufficiently high. If the thickness of the plating layer is 50 μm or less, warpage can be suppressed and heat cycle properties are excellent.

めっき層の厚さの測定方法としては、電解式膜厚計による方法、走査型電子顕微鏡によるめっき層断面観察等が挙げられる。
電解式膜厚計による方法は、めっき層を陽極として電気分解すると、めっき層の溶解量が通電した電気量に比例するというファラデーの法則を基本原理としている。溶解量は、溶解面積〔A〕と厚さ〔t〕の積で表され、電気量は通電時間〔T〕と電流〔I〕の積で表される。
溶解量=A・t=K・I・T
ただし、Kは、めっき層によって異なる定数である。
Examples of the method for measuring the thickness of the plating layer include a method using an electrolytic film thickness meter, and a plating layer section observation using a scanning electron microscope.
The method using an electrolytic film thickness meter is based on Faraday's law that, when electrolysis is performed using a plating layer as an anode, the amount of dissolution of the plating layer is proportional to the amount of electricity applied. The amount of dissolution is expressed by the product of the dissolution area [A] and the thickness [t], and the amount of electricity is expressed by the product of the energization time [T] and the current [I].
Dissolution amount = A · t = K · I · T
However, K is a constant that varies depending on the plating layer.

走査型電子顕微鏡によるめっき層断面観察は、めっき加工されたプラスチックシャーシの断面を切出し、走査型電子顕微鏡で観察する方法である。断面を切出す方法としては、ファインカッタによる方法、レーザーカッタによる方法、FIBによる方法等が挙げられる。ファインカッタによる方法においては、切削面を研磨する必要があり、研磨後の断面(多層皮膜(銅、ニッケル、クロム等))を硝酸エッチングすることによって、多層皮膜の境界を顕著にできる。
本発明においては、正確なめっき層の厚さを測定できる点から、電解式膜厚計による方法が好ましい。
The plating layer cross-section observation with a scanning electron microscope is a method of cutting out a cross section of a plated plastic chassis and observing with a scanning electron microscope. Examples of the method of cutting the cross section include a method using a fine cutter, a method using a laser cutter, and a method using FIB. In the method using a fine cutter, it is necessary to polish the cut surface, and the boundary of the multilayer coating can be made remarkable by nitric acid etching of the polished cross section (multilayer coating (copper, nickel, chromium, etc.)).
In the present invention, a method using an electrolytic film thickness meter is preferable from the viewpoint that an accurate thickness of the plating layer can be measured.

めっき加工の方法としては、湿式めっき方法(無電解めっき、ダイレクトめっき、電気めっき等)、乾式めっき方法(真空蒸着法、スパッタリング法、イオンプレーティング法等)が挙げられる。本発明においては、めっき加工されたプラスチックシャーシの曲げ弾性率が優れ、良好なめっき特性が得られる点から、湿式めっき方法が好ましい。   Examples of the plating method include wet plating methods (electroless plating, direct plating, electroplating, etc.) and dry plating methods (vacuum deposition method, sputtering method, ion plating method, etc.). In the present invention, the wet plating method is preferable because the plated plastic chassis has excellent bending elastic modulus and good plating characteristics can be obtained.

無電解めっき法は、ニッケル、銅等の金属イオンを含む水溶液に還元剤(次亜リン酸ナトリウム、ホウスイ素ナトリウム等)を加え、該水溶液を40〜100℃に加温し、該水溶液にプラスチックシャーシ本体を浸漬させることによって該プラスチックシャーシ本体の表面に均一に金属を析出させ、めっき層を形成する方法である。無電解めっき法においては、プラスチックシャーシ本体の表面をエッチング処理(硫酸/クロム等の混合液)で化学的に粗面化し、感応性付与(触媒化)しておくことが好ましい。   In the electroless plating method, a reducing agent (sodium hypophosphite, sodium borohydride, etc.) is added to an aqueous solution containing metal ions such as nickel and copper, the aqueous solution is heated to 40 to 100 ° C., and plastic is added to the aqueous solution. In this method, a metal layer is uniformly deposited on the surface of the plastic chassis body by immersing the chassis body to form a plating layer. In the electroless plating method, it is preferable that the surface of the plastic chassis main body is chemically roughened by etching treatment (mixed solution of sulfuric acid / chromium or the like) to impart sensitivity (catalyst).

電気めっき法は、無電解めっき法によってプラスチックシャーシ本体の表面に導電性皮膜を形成した被めっき体を陰極とし、陽極にめっきしようとする金属または白金等の不溶性陽極を用い、両極間に直流電源を接続し、適当な電位差を与えることによって、陰極表面に金属イオンから還元された金属を析出させ、めっき層を形成する方法である。析出させる金属としては、銅、ニッケル、クロム、金、銀、合金等が挙げられる。   The electroplating method uses an insoluble anode such as a metal or platinum to be plated on the anode, and a DC power source between the two electrodes. And a metal layer reduced by metal ions is deposited on the surface of the cathode to form a plating layer. Examples of the metal to be deposited include copper, nickel, chromium, gold, silver, and alloys.

(めっき加工試験片の曲げ弾性率)
めっき加工されたプラスチックシャーシは、下記の要件を満足することが好ましい。
充填剤強化プラスチックを成形してなる試験片の表面に、製品のめっき層と同じ条件にて目標とする厚さのめっき層を形成してなる、めっき加工試験片の曲げ弾性率が、25,000〜60,000MPaであり、好ましくは30,000〜50,000MPaである。
(Bending elastic modulus of plating test specimen)
The plated plastic chassis preferably satisfies the following requirements.
The plating processing test piece formed by forming a plating layer with a target thickness under the same conditions as the plating layer of the product on the surface of the test piece formed by molding the filler reinforced plastic has a bending elastic modulus of 25, 000 to 60,000 MPa, preferably 30,000 to 50,000 MPa.

めっき加工試験片の曲げ弾性率が25,000MPa以上であれば、マグネシウム等の金属シャーシ相当の曲げ弾性率が得られる。めっき加工試験片の曲げ弾性率が60,000MPa以下であれば、寸法精度が良好となる。めっき加工試験片の曲げ弾性率は、30,000〜50,000MPaが好ましい。   When the bending elastic modulus of the plating test specimen is 25,000 MPa or more, a bending elastic modulus equivalent to a metal chassis such as magnesium can be obtained. If the bending elastic modulus of the plating test piece is 60,000 MPa or less, the dimensional accuracy is good. The bending elastic modulus of the plating test piece is preferably 30,000 to 50,000 MPa.

(作用効果)
以上説明した本発明のめっき加工されたプラスチックシャーシにあっては、充填剤強化プラスチックを原材料としているため、樹脂化による形状の複雑化、薄肉化および軽量化が可能である。
また、曲げ弾性率が4,000〜22,000MPaである充填剤強化プラスチックを成形してなるプラスチックシャーシ本体の表面の少なくとも一部に厚さ5〜50μmのめっき層を形成しているため、薄肉化や軽量化してもマグネシウムの金属シャーシと同等の剛性を有する。
また、曲げ弾性率が4,000〜22,000MPaである充填剤強化プラスチックを成形してなるプラスチックシャーシ本体をベースにしているため、高温度条件下での耐久性を有する。
このようなめっき加工されたプラスチックシャーシあっては、薄肉化や軽量化に伴う反りや寸法精度の低下を抑えることによって製品の安全性を確保できる。
(Function and effect)
Since the plated plastic chassis of the present invention described above is made of filler-reinforced plastic, it can be made complicated in shape, thinned, and reduced in weight by resinization.
Moreover, since a plating layer having a thickness of 5 to 50 μm is formed on at least a part of the surface of the plastic chassis main body formed by molding a filler reinforced plastic having a flexural modulus of 4,000 to 22,000 MPa, Even if it is made lighter or lighter, it has the same rigidity as a magnesium metal chassis.
Moreover, since it is based on a plastic chassis body formed by molding a filler reinforced plastic having a flexural modulus of 4,000 to 22,000 MPa, it has durability under high temperature conditions.
In such a plated plastic chassis, the safety of the product can be ensured by suppressing the warpage and the decrease in dimensional accuracy accompanying the reduction in thickness and weight.

<電気製品用部品>
本発明の電気製品用部品は、本発明のめっき加工されたプラスチックシャーシと、該めっき加工されたプラスチックシャーシに密着した、熱可塑性樹脂からなる部品基材とを有する。
<Parts for electrical products>
The component for an electrical product of the present invention has the plastic chassis plated with the present invention and a component base material made of a thermoplastic resin in close contact with the plated plastic chassis.

(部品基材)
部品基材は、熱可塑性樹脂を成形してなるものである。めっき加工されたプラスチックシャーシとの密着性が優れる点から、インモールド成形によってめっき加工されたプラスチックシャーシと一体化されたものが好ましい。
(Part base)
The component base material is formed by molding a thermoplastic resin. From the viewpoint of excellent adhesion to a plated plastic chassis, it is preferable to integrate with a plastic chassis plated by in-mold molding.

熱可塑性樹脂の種類は、特に限定されない。熱可塑性樹脂としては、ポリアミド(ナイロン6、ナイロン66等)、ポリオレフィン(ポリエチレン、ポリプロピレン等)、ポリエステル(ポリエチレンテレフタレート、ポリブチレンテレフタレート等)、ポリカーボネート、ポリアミドイミド、ポリフェニレンサルファイド、ポリフェニレンオキシド、ポリスルホン、ポリエーテルスルホン、ポリエーテルエーテルケトン、ポリエーテルイミド、スチレン系樹脂(ポリスチレン、ABS樹脂等)、液晶ポリエステル等が挙げられる。また、共重合体(アクリロニトリルとスチレンとの共重合体、ナイロン6とナイロン66との共重合体等)したもの、ウレタン、軟質材、エラストマーであってもよい。さらに、これらの混合物(アロイを含む)であってもよく、充填剤によって強化されたものであってもよい。   The kind of thermoplastic resin is not particularly limited. Thermoplastic resins include polyamide (nylon 6, nylon 66, etc.), polyolefin (polyethylene, polypropylene, etc.), polyester (polyethylene terephthalate, polybutylene terephthalate, etc.), polycarbonate, polyamideimide, polyphenylene sulfide, polyphenylene oxide, polysulfone, polyether Examples include sulfone, polyether ether ketone, polyether imide, styrene resin (polystyrene, ABS resin, etc.), liquid crystal polyester, and the like. Further, it may be a copolymer (such as a copolymer of acrylonitrile and styrene, a copolymer of nylon 6 and nylon 66), urethane, a soft material, or an elastomer. Furthermore, a mixture thereof (including an alloy) may be used, or one reinforced with a filler may be used.

(インモールド成形)
インモールド成形は、本発明のめっき加工されたプラスチックシャーシを成形金型内に設置し、該成形金型内に熱可塑性樹脂を注入することによって、熱可塑性樹脂からなる部品基材とめっき加工されたプラスチックシャーシとを密着させて複合部品を得る成形法である。
(In-mold molding)
In-mold molding is performed by placing the plated plastic chassis of the present invention in a molding die and injecting the thermoplastic resin into the molding die, thereby plating the component base material made of the thermoplastic resin. This is a molding method for obtaining a composite part by closely contacting a plastic chassis.

(作用効果)
以上説明した本発明の電気製品用部品にあっては、本発明のプラスチックシャーシに、熱可塑性樹脂からなる部品基材を密着させたものであるため、内部シャーシを内蔵した製品により近い部品として仕上げられており、製品の組み立て工程を簡素化できる。
(Function and effect)
In the electrical product parts of the present invention described above, a component base material made of a thermoplastic resin is closely attached to the plastic chassis of the present invention, so that it is finished as a part closer to the product incorporating the internal chassis. The assembly process of the product can be simplified.

以下、実施例および比較例を挙げて本発明をさらに詳しく説明するが、本発明はこれらの実施例に限定されるものではない。   EXAMPLES Hereinafter, although an Example and a comparative example are given and this invention is demonstrated in more detail, this invention is not limited to these Examples.

<測定、評価>
実施例および比較例における各種測定、評価は、以下の方法によって行った。
<Measurement and evaluation>
Various measurements and evaluations in Examples and Comparative Examples were performed by the following methods.

(充填剤強化プラスチックの曲げ弾性率)
表1に示すプラスチックまたは充填剤強化プラスチックについて、12.5mm×127mm×4mm厚の試験片を作製し、ISO 178:2001に準拠して試験片の曲げ弾性率を測定した。
(Bending elastic modulus of filler reinforced plastic)
Test pieces of 12.5 mm × 127 mm × 4 mm thickness were prepared for the plastics or filler reinforced plastics shown in Table 1, and the flexural modulus of the test pieces was measured in accordance with ISO 178: 2001.

(めっき加工試験片の曲げ弾性率)
表1に示すプラスチックまたは充填剤強化プラスチックについて、12.5mm×127mm×1mm厚の試験片を作製し、表2に示す構成、目標合計厚さにて、めっき層を形成した後、ISO 178:2001に準拠してめっき加工試験片の曲げ弾性率を測定した。
(Bending elastic modulus of plating test specimen)
For plastics or filler reinforced plastics shown in Table 1, after preparing a test piece having a thickness of 12.5 mm × 127 mm × 1 mm and forming a plating layer with the configuration and target total thickness shown in Table 2, ISO 178: In accordance with 2001, the flexural modulus of the plated specimen was measured.

(めっき層の厚さ)
めっき層の厚さは、電解式膜厚計(電測社製、CT−2)を用いて、下記のように測定した。
めっき加工されたプラスチックシャーシを電解式膜厚計にセッティングした。まず、電気クロムめっきの厚さを測定するために、R−51電解液(電測社製)をガスケット内に注入し、電気クロムめっきの厚さを測定した。次いで、電気ニッケルめっきの厚さを測定するために、R−54電解液(電測社製)をガスケット内に注入し、電気ニッケルめっきの厚さを測定した。次いで、電気銅めっきの厚さを測定するために、R−44電解液(電測社製)をガスケット内に注入し、電気銅めっきの厚さを測定した。
(Plating layer thickness)
The thickness of the plating layer was measured as follows using an electrolytic film thickness meter (CT-2, manufactured by Denso Co., Ltd.).
The plated plastic chassis was set on an electrolytic film thickness meter. First, in order to measure the thickness of electrochrome plating, R-51 electrolyte (made by Denso Co., Ltd.) was injected into the gasket, and the thickness of electrochrome plating was measured. Subsequently, in order to measure the thickness of electro nickel plating, R-54 electrolyte solution (made by Denso Co., Ltd.) was injected into the gasket, and the thickness of electro nickel plating was measured. Next, in order to measure the thickness of the electrolytic copper plating, R-44 electrolytic solution (manufactured by Denso Co., Ltd.) was injected into the gasket, and the thickness of the electrolytic copper plating was measured.

(ソリ)
めっき加工されたプラスチックシャーシを平滑な標準台に放置し、目視観察によってソリの有無を確認し、下記の基準にて評価した。
◎:ソリ無し。
○:若干ソリ発生。
△:ソリ発生。
×:大きなソリ発生。
(Sledge)
The plated plastic chassis was left on a smooth standard stand, and the presence or absence of warpage was confirmed by visual observation, and evaluated according to the following criteria.
A: No warpage.
○: Some warpage occurred.
Δ: Warp generated.
X: Large warp generated.

(寸法精度)
めっき加工されたプラスチックシャーシのボス部(内径φ4mm、肉厚1mm)に金属ナット(外径φ4mm)を圧入し、目視観察によってボス部のめっき層の割れの有無を確認し、下記の基準にて評価した。
◎:割れ発生無し。
○:一部に小さな割れ発生。
△:割れ発生。
×:プラスチック面まで割れ発生。
(Dimensional accuracy)
A metal nut (outside diameter: 4 mm) is press-fitted into the boss part (inside diameter: 4 mm, wall thickness: 1 mm) of the plated plastic chassis, and the presence or absence of cracks in the plating layer of the boss part is confirmed by visual observation. evaluated.
A: No cracking occurred.
○: Some small cracks occurred.
Δ: Cracking occurred.
X: Cracking occurred to the plastic surface.

(ヒートサイクル性)
めっき加工されたプラスチックシャーシについて、下記のヒートサイクル条件で試験し、目視観察によってめっき層の膨れの有無を確認し、下記の基準にて評価した。
○:膨れなし。
○△:接点部に微小クラック。
△:ゲート近傍に微小膨れ。
×:ゲート部より膨れ。
「ヒートサイクル条件」
−30℃×1時間→23℃×15分→80℃×1時間→23℃×1時間を1サイクルとして、5サイクルを1セットとし、3セット実施した。
(Heat cycle properties)
The plated plastic chassis was tested under the following heat cycle conditions, the presence or absence of swelling of the plating layer was confirmed by visual observation, and evaluated according to the following criteria.
○: No swelling.
○ △: Micro cracks at the contact part.
Δ: Slight swelling near the gate.
X: Swells from the gate.
"Heat cycle conditions"
-30 ° C. × 1 hour → 23 ° C. × 15 minutes → 80 ° C. × 1 hour → 23 ° C. × 1 hour was set as one cycle, and 5 cycles were set as one set, and three sets were performed.

<プラスチック、充填剤強化プラスチック>
実施例および比較例にて用いたプラスチック、充填剤強化プラスチック(以下、材料と記す。)は、下記の通りである。
<Plastics, filler reinforced plastic>
Plastics and filler reinforced plastics (hereinafter referred to as materials) used in Examples and Comparative Examples are as follows.

Figure 2013189690
Figure 2013189690

表中の略号は、下記の意味を表す。
PC:ポリカーボネート、
ASA:アクリロニトリル−スチレン−アクリレート樹脂、
PPA:ポリフタルアミド、
MXD6:ナイロンMXD6、
PPE:ポリフェニレンエーテル、
GF:ガラス繊維、
CF:炭素繊維。
The abbreviations in the table have the following meanings.
PC: Polycarbonate,
ASA: acrylonitrile-styrene-acrylate resin,
PPA: polyphthalamide,
MXD6: nylon MXD6,
PPE: polyphenylene ether,
GF: glass fiber,
CF: Carbon fiber.

<めっき加工>
実施例および比較例におけるめっき層の構成および合計の厚さを表2に示す。また、材料ごとのめっき加工の条件を、めっき加工1、2に示す。
<Plating>
Table 2 shows the configurations and total thicknesses of the plating layers in Examples and Comparative Examples. Moreover, the conditions of the plating process for every material are shown in the plating processes 1 and 2.

Figure 2013189690
Figure 2013189690

(めっき加工1)
対象となる材料:材料A〜E、H。
(Plating process 1)
Target materials: Materials A to E, H.

無電解ニッケルめっき:
〔1〕脱脂(68℃ ×5分)、処理液:荏原ユージライ社製、ENILEX WE。
〔2〕水洗。
〔3〕プリエッチング(40℃×5分)、処理液:荏原ユージライト社製、ENILEX PE−300A,B。
〔4〕水洗。
〔5〕エッチング(68℃ ×10分)、処理液:クロム酸400g/L、硫酸200cc/L。
〔6〕回収。
〔7〕水洗。
〔8〕中和(常温×1分)、処理液:荏原ユージライト社製、ENILEX RD。
〔9〕水洗。
〔10〕特殊中和(常温×2分)、処理液:荏原ユージライト社製、ENILEX NW。
〔11〕水洗。
〔12〕プリディップ(常温×1分)、処理液:35質量%塩酸100cc/L。
〔13〕触媒化処理(30℃×4分)、処理液:荏原ユージライト社製、ENILEX CT−580。
〔14〕水洗。
〔15〕活性化処理(40℃×3分)、処理液:35質量%塩酸100cc/L。
〔16〕水洗。
〔17〕無電解ニッケルめっき(40℃×5分、目標厚さ0.5μm)、処理液:荏原ユージライト社製、ENILEX NI−100。
〔18〕水洗。
Electroless nickel plating:
[1] Degreasing (68 ° C. × 5 minutes), treatment liquid: ENILEX WE manufactured by Sugawara Eugene Corporation.
[2] Washing with water.
[3] Pre-etching (40 ° C. × 5 minutes), treatment liquid: ENILEX PE-300A, B, manufactured by Sugawara Eugene Corporation.
[4] Washing with water.
[5] Etching (68 ° C. × 10 minutes), treatment liquid: chromic acid 400 g / L, sulfuric acid 200 cc / L.
[6] Recovery.
[7] Washing with water.
[8] Neutralization (normal temperature x 1 minute), treatment solution: ENILEX RD, manufactured by Sugawara Eugene Corporation.
[9] Washing with water.
[10] Special neutralization (normal temperature x 2 minutes), treatment solution: ENILEX NW, manufactured by Ebara Eugelite.
[11] Washing with water.
[12] Pre-dip (normal temperature x 1 minute), treatment liquid: 35% by mass hydrochloric acid 100 cc / L.
[13] Catalytic treatment (30 ° C. × 4 minutes), treatment liquid: ENILEX CT-580, manufactured by Sugawara Eugene Corporation.
[14] Washing with water.
[15] Activation treatment (40 ° C. × 3 minutes), treatment liquid: 35% by mass hydrochloric acid 100 cc / L.
[16] Washing with water.
[17] Electroless nickel plating (40 ° C. × 5 minutes, target thickness 0.5 μm), treatment solution: ENILEX NI-100, manufactured by Sugawara Eugene Corporation.
[18] Washing with water.

厚付け無電解ニッケルめっき:
〔1〕脱脂(68℃ ×5分)、処理液:荏原ユージライ社製、ENILEX WE。
〔2〕水洗。
〔3〕プリエッチング(40℃×5分)、処理液:荏原ユージライト社製、ENILEX PE−300A,B。
〔4〕水洗。
〔5〕エッチング(68℃ ×10分)、処理液:クロム酸400g/L、硫酸200cc/L。
〔6〕回収。
〔7〕水洗。
〔8〕中和(常温×1分)、処理液:荏原ユージライト社製、ENILEX RD。
〔9〕水洗。
〔10〕特殊中和(常温×2分)、処理液:荏原ユージライト社製、ENILEX NW。
〔11〕水洗。
〔12〕プリディップ(常温×1分)、処理液:35質量%塩酸100cc/L。
〔13〕触媒化処理(30℃×4分)、処理液:荏原ユージライト社製、ENILEX CT−580。
〔14〕水洗。
〔15〕活性化処理(40℃×3分)、処理液:35質量%塩酸100cc/L。
〔16〕水洗。
〔17〕厚付け無電解ニッケルめっき(90℃×60分、目標厚さ20μmの場合)、処理液:荏原ユージライト社製、ENIPAC MM。
〔18〕水洗。
Thick electroless nickel plating:
[1] Degreasing (68 ° C. × 5 minutes), treatment liquid: ENILEX WE manufactured by Sugawara Eugene Corporation.
[2] Washing with water.
[3] Pre-etching (40 ° C. × 5 minutes), treatment liquid: ENILEX PE-300A, B, manufactured by Sugawara Eugene Corporation.
[4] Washing with water.
[5] Etching (68 ° C. × 10 minutes), treatment liquid: chromic acid 400 g / L, sulfuric acid 200 cc / L.
[6] Recovery.
[7] Washing with water.
[8] Neutralization (normal temperature x 1 minute), treatment solution: ENILEX RD, manufactured by Sugawara Eugene Corporation.
[9] Washing with water.
[10] Special neutralization (normal temperature x 2 minutes), treatment solution: ENILEX NW, manufactured by Ebara Eugelite.
[11] Washing with water.
[12] Pre-dip (normal temperature x 1 minute), treatment liquid: 35% by mass hydrochloric acid 100 cc / L.
[13] Catalytic treatment (30 ° C. × 4 minutes), treatment liquid: ENILEX CT-580, manufactured by Sugawara Eugene Corporation.
[14] Washing with water.
[15] Activation treatment (40 ° C. × 3 minutes), treatment liquid: 35% by mass hydrochloric acid 100 cc / L.
[16] Washing with water.
[17] Thickened electroless nickel plating (90 ° C. × 60 minutes, target thickness 20 μm), treatment liquid: ENIPAC MM, manufactured by Ebara Eugene Corporation.
[18] Washing with water.

電気めっき:
〔1〕硫酸銅めっき(25℃×4A/dm×20分、目標厚さ20μmの場合)、処理液:硫酸銅200g/L、硫酸60g/L、光沢剤 適量。
〔2〕光沢ニッケルめっき(55℃×3.5A/dm×30分、目標厚さ20μmの場合)、処理液:硫酸ニッケル300g/L、塩化ニッケル50g/L、ホウ酸40g/L、光沢剤 適量。
〔3〕クロムめっき(45℃×30A/dm×2分、目標厚さ0.5μm)、処理液:無水クロム酸200g/L、硫酸2g/L、添加剤 適量。
Electroplating:
[1] Copper sulfate plating (25 ° C. × 4 A / dm 2 × 20 minutes, target thickness 20 μm), treatment solution: copper sulfate 200 g / L, sulfuric acid 60 g / L, brightener appropriate amount.
[2] Bright nickel plating (55 ° C. × 3.5 A / dm 2 × 30 minutes, target thickness 20 μm), treatment liquid: nickel sulfate 300 g / L, nickel chloride 50 g / L, boric acid 40 g / L, gloss Agent Appropriate amount.
[3] Chrome plating (45 ° C. × 30 A / dm 2 × 2 minutes, target thickness 0.5 μm), treatment liquid: 200 g / L chromic anhydride, 2 g / L sulfuric acid, appropriate amount of additive.

(めっき加工2)
対象となる材料:材料F、G。
(Plating process 2)
Target material: Materials F and G.

無電解ニッケルめっき:
〔1〕脱脂(68℃ ×5分)、処理液:荏原ユージライ社製、ENILEX WE。
〔2〕水洗。
〔3〕エッチング(35℃×7分)、処理液:35質量%塩酸220cc/L、TNエッチャント200cc/L。
〔4〕ポストエッチング(25℃ ×2分)、処理液:35質量%塩酸60cc/L。
〔5〕水洗。
〔6〕触媒化処理(25℃×3分)、処理液:荏原ユージライト社製、ENILEX CT−580。
〔7〕水洗。
〔8〕アクセレータ(40℃×3分)、処理液:98%硫酸50cc/L。
〔9〕水洗。
〔10〕ポストアクセレータ(40℃×2分)、処理液:水酸化ナトリウム20g/L。
〔11〕水洗。
〔12〕無電解ニッケルめっき(40℃×5分、目標厚さ0.5μm)、処理液:荏原ユージライト社製、ENILEX NI−100。
〔13〕水洗。
Electroless nickel plating:
[1] Degreasing (68 ° C. × 5 minutes), treatment liquid: ENILEX WE manufactured by Sugawara Eugene Corporation.
[2] Washing with water.
[3] Etching (35 ° C. × 7 min), treatment liquid: 35% by mass hydrochloric acid 220 cc / L, TN etchant 200 cc / L.
[4] Post-etching (25 ° C. × 2 minutes), treatment solution: 35% by mass hydrochloric acid 60 cc / L.
[5] Washing with water.
[6] Catalytic treatment (25 ° C. × 3 minutes), treatment liquid: ENILEX CT-580, manufactured by Sugawara Eugene Corporation.
[7] Washing with water.
[8] Accelerator (40 ° C. × 3 minutes), treatment solution: 98% sulfuric acid 50 cc / L.
[9] Washing with water.
[10] Post accelerator (40 ° C. × 2 minutes), treatment liquid: sodium hydroxide 20 g / L.
[11] Washing with water.
[12] Electroless nickel plating (40 ° C. × 5 minutes, target thickness 0.5 μm), treatment solution: ENILEX NI-100, manufactured by Ebara Eugene Corporation.
[13] Washing with water.

電気めっき:
〔1〕硫酸銅めっき(25℃×4A/dm×20分、目標厚さ20μmの場合)、処理液:硫酸銅200g/L、硫酸60g/L、光沢剤 適量。
〔2〕光沢ニッケルめっき(55℃×3.5A/dm×30分、目標厚さ20μmの場合)、処理液:硫酸ニッケル300g/L、塩化ニッケル50g/L、ホウ酸40g/L、光沢剤 適量。
〔3〕クロムめっき(45℃×30A/dm×2分、目標厚さ0.5μm)、処理液:無水クロム酸200g/L、硫酸2g/L、添加剤 適量。
Electroplating:
[1] Copper sulfate plating (25 ° C. × 4 A / dm 2 × 20 minutes, target thickness 20 μm), treatment solution: copper sulfate 200 g / L, sulfuric acid 60 g / L, brightener appropriate amount.
[2] Bright nickel plating (55 ° C. × 3.5 A / dm 2 × 30 minutes, target thickness 20 μm), treatment liquid: nickel sulfate 300 g / L, nickel chloride 50 g / L, boric acid 40 g / L, gloss Agent Appropriate amount.
[3] Chrome plating (45 ° C. × 30 A / dm 2 × 2 minutes, target thickness 0.5 μm), treatment liquid: 200 g / L chromic anhydride, 2 g / L sulfuric acid, appropriate amount of additive.

〔実施例1〕
(充填剤強化プラスチックの曲げ弾性率)
射出成形機を用いて、材料Fを12.5mm×127mm×4mm厚の試験片に成形した。該試験片について曲げ弾性率の測定を行った。結果を表3に示す。
[Example 1]
(Bending elastic modulus of filler reinforced plastic)
Using an injection molding machine, the material F was molded into a test piece having a thickness of 12.5 mm × 127 mm × 4 mm. The test piece was measured for flexural modulus. The results are shown in Table 3.

(めっき加工試験片の曲げ弾性率)
射出成形機を用いて、材料Fを12.5mm×127mm×1mm厚の試験片に成形し、表2に示す構成、目標合計厚さaにて、めっき層を形成し、めっき加工試験片を得た。該めっき加工試験片について曲げ弾性率の測定を行った。結果を表3に示す。
(Bending elastic modulus of plating test specimen)
Using an injection molding machine, the material F is molded into a test piece having a thickness of 12.5 mm × 127 mm × 1 mm, a plating layer is formed with the configuration shown in Table 2, and a target total thickness a, Obtained. The bending elastic modulus was measured for the plated specimen. The results are shown in Table 3.

(めっき加工されたプラスチックシャーシ)
射出成形機を用いて、材料Fを80mm×125mm×1.5mm厚のプラスチックシャーシ本体(モバイル機器用内部シャーシ試験片)に成形し、表2に示す構成、目標合計厚さaにて、めっき層を形成し、めっき加工されたプラスチックシャーシを得た。該めっき加工されたプラスチックシャーシについてめっき層の厚さを測定し、ソリ、寸法精度およびヒートサイクル性を評価した。結果を表3に示す。
(Plated plastic chassis)
Using an injection molding machine, material F is molded into a plastic chassis body (internal chassis test piece for mobile equipment) with a thickness of 80 mm x 125 mm x 1.5 mm, and plated with the configuration shown in Table 2 and the target total thickness a Layers were formed to obtain a plated plastic chassis. The thickness of the plating layer was measured for the plated plastic chassis, and warpage, dimensional accuracy, and heat cycle performance were evaluated. The results are shown in Table 3.

〔実施例2〜25、比較例1〜5〕
材料Fを表3、4に示す材料に変更し、めっき層の構成、目標合計厚さaを表3、4に示す構成、目標合計厚さに変更した以外は、実施例1と同様にして試験片、めっき加工試験片およびめっき加工されたプラスチックシャーシを得た。結果を表3、4に示す。
[Examples 2 to 25, Comparative Examples 1 to 5]
The material F was changed to the materials shown in Tables 3 and 4 and the configuration of the plating layer and the target total thickness a were changed to the configurations and target total thicknesses shown in Tables 3 and 4 in the same manner as in Example 1. A test piece, a plated processed test piece, and a plated plastic chassis were obtained. The results are shown in Tables 3 and 4.

Figure 2013189690
Figure 2013189690

Figure 2013189690
Figure 2013189690

〔考察〕
実施例1〜25のめっき加工されたプラスチックシャーシは、曲げ弾性率が25,000MPa以上の高い剛性が確保されている上に、ソリ、寸法精度、ヒートサイクル性等のめっき特性が優れている。
これに対し、めっき層が薄い比較例1〜3は、曲げ弾性率が25,000MPa以下で剛性が不十分であった。材料の剛性が4,000MPa未満の比較例4、5のめっき加工されたプラスチックシャーシは、曲げ弾性率が25,000MPa以上で剛性は確保されているが、めっき特性が大幅に劣る。
[Discussion]
The plated plastic chassis of Examples 1 to 25 have high rigidity with a flexural modulus of 25,000 MPa or more, and are excellent in plating characteristics such as warpage, dimensional accuracy, and heat cycle properties.
In contrast, Comparative Examples 1 to 3 with a thin plating layer had a flexural modulus of 25,000 MPa or less and insufficient rigidity. The plastic chassis subjected to plating in Comparative Examples 4 and 5 having a material rigidity of less than 4,000 MPa has a bending elastic modulus of 25,000 MPa or more and the rigidity is ensured, but the plating characteristics are significantly inferior.

本発明のめっき加工されたプラスチックシャーシは、ノートブック型のPC、タブレット型のPC、携帯情報端末、携帯電話機、スマートフォン、携帯型ゲーム機、電子辞書、電子ブック端末、携帯型オーディオ/ビデオプレイヤー、カーナビゲーション装置、他のあらゆる電気製品の内部シャーシに適用可能である。また、めっき加工されたプラスチックシャーシを成形金型内に設置して、インモールド成形によって部品基材と密着させた電気製品用部品は、内部シャーシを内蔵した製品により近い部品として仕上げられており、製品の組み立て工程を簡素化できる。   The plated plastic chassis of the present invention includes a notebook PC, a tablet PC, a portable information terminal, a mobile phone, a smartphone, a portable game machine, an electronic dictionary, an electronic book terminal, a portable audio / video player, It can be applied to the internal chassis of car navigation devices and any other electrical products. In addition, the parts for electrical products that have been plated plastic chassis in the mold and brought into close contact with the component base material by in-mold molding are finished as parts that are closer to the product that contains the internal chassis. The product assembly process can be simplified.

Claims (3)

ISO 178:2001の曲げ弾性率が4,000〜22,000MPaである充填剤強化プラスチックを成形してなるプラスチックシャーシ本体と、
該プラスチックシャーシ本体の表面の少なくとも一部に形成された、厚さ5〜50μmのめっき層と
を有する、めっき加工されたプラスチックシャーシ。
A plastic chassis body formed by molding a filler-reinforced plastic having a flexural modulus of ISO 178: 2001 of 4,000 to 22,000 MPa;
A plated plastic chassis having a plated layer having a thickness of 5 to 50 μm formed on at least a part of a surface of the plastic chassis main body.
下記の要件を満足する、請求項1に記載のめっき加工されたプラスチックシャーシ。
前記充填剤強化プラスチックを成形してなる試験片(12.5mm×127mm×1mm厚)の表面に、前記めっき層と同じ条件にてめっき層を形成してなる、めっき加工試験片のISO 178:2001の曲げ弾性率が、25,000〜60,000MPaである。
The plated plastic chassis of claim 1, satisfying the following requirements:
ISO 178 of a plating processing test piece formed by forming a plating layer on the surface of a test piece (12.5 mm × 127 mm × 1 mm thickness) formed by molding the filler reinforced plastic under the same conditions as the plating layer: The flexural modulus of 2001 is 25,000-60,000 MPa.
請求項1または2に記載のめっき加工されたプラスチックシャーシと、
該めっき加工されたプラスチックシャーシに密着した、熱可塑性樹脂からなる部品基材と
を有する、電気製品用部品。
The plated plastic chassis according to claim 1 or 2,
An electrical product component comprising: a component base material made of a thermoplastic resin in close contact with the plated plastic chassis.
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