JP2013096937A - 洗浄装置、測定方法および校正方法 - Google Patents
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Abstract
【解決手段】この発明に従った校正方法は、液体に溶存する気体の濃度を測定する測定装置を校正する校正方法であって、液体に溶存する気体の濃度を変化させて、液体に超音波を照射したときに生じる発光の強度がピークを示す当該気体の濃度を基準濃度として予め決定する工程(S10)を実施する。次に、液体中の気体の濃度を変化させながら液体に超音波を照射することにより、発光の強度がピークを示すときに、校正する対象である測定装置により洗浄液中の窒素の濃度を測定して、当該窒素の濃度の測定値を決定する工程(S20)を実施する。測定値と基準濃度とに基づいて、校正する対象である測定装置を校正する工程(S30)を実施する。
【選択図】図1
Description
図1〜図5を参照して、本発明による溶存窒素濃度計の校正方法を説明する。本発明による校正方法は、具体的には、図2に示した超音波洗浄装置1について、この超音波洗浄装置1を構成するモニタリング手段40である溶存窒素濃度計を校正する方法である。
なお、上述のようにC0は6.3ppmであり、CAは5.0ppmであったため、上述した式は次のように表現される。
したがって、このような校正係数を含む式により、溶存窒素濃度計からの測定値を換算して正確な溶存窒素濃度を求めることができる。たとえば、溶存窒素濃度計からの測定値のデータを受信した制御装置において、当該測定値に上記のような校正係数を乗じることにより正確な溶存窒素濃度の計算値を算出し、当該計算値を外部表示装置などへと出力する、といった処理を行なってもよい。
図6および図7を参照して、本発明による溶存窒素濃度の測定方法および本発明による洗浄装置を説明する。
Claims (7)
- 液体に溶存する気体の濃度を測定する測定装置を校正する校正方法であって、
前記液体に溶存する前記気体の濃度を変化させて、前記液体に超音波を照射したときに生じる発光の強度がピークを示す前記気体の濃度を基準濃度として予め決定する工程と、
前記液体中の前記気体の濃度を変化させながら前記液体に超音波を照射することにより、前記発光の強度がピークを示すときに、校正する対象である前記測定装置により前記液体中の前記気体の濃度を測定して、前記気体の濃度の測定値を決定する工程と、
前記測定値と前記基準濃度とに基づいて、前記測定装置を校正する工程と、を備える、校正方法。 - 前記液体は水である、請求項1に記載の校正方法。
- 前記発光の強度は、イメージインテンシファイヤーおよび光電子増倍管のいずれか一方を用いて測定される、請求項1または2に記載の校正方法。
- 前記気体は窒素である、請求項1〜3のいずれか1項に記載の校正方法。
- 前記液体は、半導体基板を洗浄する洗浄液であり、
前記測定装置は前記半導体基板を洗浄する洗浄装置に含まれる、請求項1〜4のいずれか1項に記載の校正方法。 - 液体に溶存する気体の濃度を測定する測定方法であって、
測定対象である前記液体に超音波を照射することにより生じた発光の強度を発光強度測定装置により測定して、前記発光の強度の測定値を得る工程と、
予め求められていた、前記液体に溶存する前記気体の濃度と、前記液体に超音波を照射したときに生じる発光の強度との相関関係に基づき、前記発光の強度の測定値から前記気体の濃度を導出する工程とを備える、測定方法。 - 請求項6に記載の測定方法を用いた基板の洗浄装置であって、
前記基板を洗浄するための洗浄液を保持する洗浄槽と、
前記洗浄液に超音波を照射するための超音波発生部とを備え、
前記超音波発生部は、前記洗浄槽中の前記洗浄液に超音波を伝えることが可能な媒体を介して前記洗浄槽と接続されており、さらに、
前記洗浄液に前記超音波が照射されたときに生じる発光の強度を測定するための発光強度測定装置と、
前記発光強度測定装置により測定された前記発光の強度の測定値と、予め求められていた前記洗浄液に溶存する気体の濃度と前記発光の強度との相関関係とから、前記洗浄液に溶存する前記気体の濃度を導出する演算部とを備える、洗浄装置。
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JP2011242129A JP5398806B2 (ja) | 2011-11-04 | 2011-11-04 | 洗浄装置、測定方法および校正方法 |
EP12180106.2A EP2589951B1 (en) | 2011-11-04 | 2012-08-10 | Calibration method |
US13/618,624 US8575571B2 (en) | 2011-11-04 | 2012-09-14 | Cleaning apparatus, measurement method and calibration method |
SG2012078507A SG189662A1 (en) | 2011-11-04 | 2012-10-22 | Cleaning apparatus, measurement method and calibration method |
MYPI2012004687A MY155665A (en) | 2011-11-04 | 2012-10-22 | Cleaning apparatus, measurement method and calibration method |
TW101139461A TWI480547B (zh) | 2011-11-04 | 2012-10-25 | 清潔設備、測量方法及校正方法 |
KR1020120122903A KR101412829B1 (ko) | 2011-11-04 | 2012-11-01 | 세정 장치, 측정 방법 및 교정 방법 |
CN201210433444.5A CN103094146B (zh) | 2011-11-04 | 2012-11-02 | 清洁设备、测量方法和校正方法 |
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US (1) | US8575571B2 (ja) |
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JP6362280B1 (ja) * | 2017-03-14 | 2018-07-25 | 独立行政法人国立高等専門学校機構 | 気泡数密度計測装置 |
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JP6812570B2 (ja) | 2017-10-24 | 2021-01-13 | 日本たばこ産業株式会社 | エアロゾル生成装置並びにこれを動作させる方法及びプログラム |
KR102425243B1 (ko) | 2017-10-24 | 2022-07-27 | 니뽄 다바코 산교 가부시키가이샤 | 에어로졸 생성 장치 및 이를 동작시키는 방법 및 프로그램 |
CN111432671A (zh) | 2017-10-24 | 2020-07-17 | 日本烟草产业株式会社 | 气溶胶生成装置以及使其动作的方法及程序 |
EP3744195B1 (en) | 2018-01-26 | 2023-08-02 | Japan Tobacco Inc. | Aerosol generation device |
CN111655053B (zh) | 2018-01-26 | 2024-06-11 | 日本烟草产业株式会社 | 气溶胶生成装置、使其工作的方法以及存储介质 |
EP4070678A1 (en) | 2018-01-26 | 2022-10-12 | Japan Tobacco Inc. | Aerosol generation device |
US11028686B2 (en) * | 2019-06-12 | 2021-06-08 | Saudi Arabian Oil Company | Sono tool and related systems and methods |
US11586230B2 (en) * | 2019-12-27 | 2023-02-21 | Taiwan Semiconductor Manufacturing Co., Ltd. | Systems and methods for automatic concentration control |
CN113053781A (zh) | 2019-12-27 | 2021-06-29 | 台湾积体电路制造股份有限公司 | 半导体制程的***和方法 |
CN114046001B (zh) * | 2021-11-16 | 2023-03-28 | 重庆大学 | 一种建筑外墙自清洗雨棚及清洗方法 |
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CN103094146B (zh) | 2016-04-27 |
MY155665A (en) | 2015-11-13 |
SG189662A1 (en) | 2013-05-31 |
JP5398806B2 (ja) | 2014-01-29 |
CN103094146A (zh) | 2013-05-08 |
TWI480547B (zh) | 2015-04-11 |
EP2589951A1 (en) | 2013-05-08 |
KR20130049731A (ko) | 2013-05-14 |
US20130112900A1 (en) | 2013-05-09 |
KR101412829B1 (ko) | 2014-06-27 |
US8575571B2 (en) | 2013-11-05 |
EP2589951B1 (en) | 2013-10-23 |
TW201319560A (zh) | 2013-05-16 |
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