JP2013066829A - Discharge nozzle for process liquid and substrate processing device - Google Patents

Discharge nozzle for process liquid and substrate processing device Download PDF

Info

Publication number
JP2013066829A
JP2013066829A JP2011205868A JP2011205868A JP2013066829A JP 2013066829 A JP2013066829 A JP 2013066829A JP 2011205868 A JP2011205868 A JP 2011205868A JP 2011205868 A JP2011205868 A JP 2011205868A JP 2013066829 A JP2013066829 A JP 2013066829A
Authority
JP
Japan
Prior art keywords
nozzle
header pipe
joint
processing liquid
liquid discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP2011205868A
Other languages
Japanese (ja)
Inventor
Munehisa Kodama
宗久 児玉
Kazuhito Miyazaki
一仁 宮崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2011205868A priority Critical patent/JP2013066829A/en
Priority to KR1020120104625A priority patent/KR20130031802A/en
Publication of JP2013066829A publication Critical patent/JP2013066829A/en
Ceased legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/14—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening
    • B05B1/20—Arrangements of several outlets along elongated bodies, e.g. perforated pipes or troughs, e.g. spray booms; Outlet elements therefor
    • B05B1/205—Arrangements of several outlets along elongated bodies, e.g. perforated pipes or troughs, e.g. spray booms; Outlet elements therefor characterised by the longitudinal shape of the elongated body
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/60—Arrangements for mounting, supporting or holding spraying apparatus
    • B05B15/65—Mounting arrangements for fluid connection of the spraying apparatus or its outlets to flow conduits
    • B05B15/658—Mounting arrangements for fluid connection of the spraying apparatus or its outlets to flow conduits the spraying apparatus or its outlet axis being perpendicular to the flow conduit
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Liquid Crystal (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
  • Nozzles (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a long-length discharge nozzle for a process liquid excellent in attachability/detachability and maintenance performance, and not deflecting without a beam type nozzle holding mechanism.SOLUTION: A deflection correction mechanism 74 mounted to the discharge nozzle 64 for a process liquid includes: first and second intermediate joint parts 78 and 80 projectingly provided on a reinforcing surface 68a at first and second intermediate points Pand Pof a nozzle header pipe 68; a central joint part 76 projectingly provided on the reinforcing surface 68a between the first and second intermediate joint parts 78 and 80 of the nozzle header pipe 68, for example, at a center point Pc in a longitudinal direction; a first connecting rod 82 laid between the central joint part 76 and the first intermediate joint part; and a second connecting rod 84 laid between the central joint part 76 and the second intermediate joint part 80.

Description

本発明は、被処理基板に処理液を噴き掛けるための長尺型の処理液吐出ノズルおよびこれを用いる平流し方式の基板処理装置に関する。   The present invention relates to a long processing liquid discharge nozzle for spraying a processing liquid onto a substrate to be processed and a flat-flow type substrate processing apparatus using the same.

近年、フラットパネルディスプレイ（ＦＰＤ）製造におけるレジスト塗布現像処理システムでは、被処理基板（たとえばガラス基板）の大型化に有利に対応できる洗浄処理方法あるいは現像処理方法として、搬送ローラ（コロ）や搬送ベルトを水平方向に敷設してなる搬送路上で基板を搬送しながら洗浄処理あるいは現像処理を行うようにした、いわゆる平流し方式が多用ないし常用されている。このような平流し方式は、基板を回転運動させるスピンナ方式と較べて、基板の取扱いや搬送系および駆動系の構成が簡単である等の利点がある。   In recent years, in resist coating and developing systems in flat panel display (FPD) manufacturing, as a cleaning method or a developing method that can advantageously cope with an increase in the size of a substrate to be processed (for example, a glass substrate), a conveyance roller (roller) or a conveyance belt A so-called flat-flow method, in which a cleaning process or a development process is performed while a substrate is transported on a transport path laid in a horizontal direction, is frequently used. Such a flat flow method has advantages such as a simple substrate handling and a configuration of a transport system and a drive system, as compared with a spinner method in which the substrate is rotated.

このような平流し方式を採る洗浄処理装置は、平流し搬送路上で移動する基板に洗浄液やリンス液を噴き掛けるために、長尺型の処理液吐出ノズルを多く用いている。また、平流し方式の現像処理装置も、平流し搬送路上で移動する基板に現像液を噴き掛けるか、または液盛りするために、長尺型の処理液吐出ノズルを用いている。   A cleaning apparatus that employs such a flat flow system uses many long processing liquid discharge nozzles in order to spray a cleaning liquid or a rinsing liquid onto a substrate that moves on a flat flow conveyance path. Also, a flat-flow type developing processing apparatus uses a long-type processing liquid discharge nozzle in order to spray or deposit a developing solution on a substrate moving on a flat-flow conveying path.

従来のこの種の基板処理装置は、図１０および図１１に示すように、長尺型の処理液吐出ノズルたとえばスプレーノズル２００を平流し搬送路２０２の上に搬送方向と交差（通常は直交）する方向に水平に架け渡して保持するためのノズル保持機構２０６を備えている。このノズル保持機構２０６は、平流し搬送路２０２の両側に立設された一対の支柱２０８，２１０の間に水平に架け渡される梁２１２に一定間隔で多数（たとえば４個）のブラケット２１４を取り付け、これら多数のブラケット２１４の上に１本または複数本（図示の例の場合は２本）のスプレーノズル２００を留め具２１５で固定する。   As shown in FIGS. 10 and 11, a conventional substrate processing apparatus of this type has a long processing liquid discharge nozzle, for example, a spray nozzle 200, which flows flatly on a conveyance path 202 and intersects the conveyance direction (usually orthogonal). A nozzle holding mechanism 206 is provided for horizontally holding in the direction of holding. This nozzle holding mechanism 206 attaches a large number (for example, four) of brackets 214 to a beam 212 that is horizontally stretched between a pair of support columns 208 and 210 erected on both sides of the flat flow conveyance path 202 at regular intervals. One or a plurality of (two in the illustrated example) spray nozzles 200 are fixed on the numerous brackets 214 with fasteners 215.

スプレーノズル２００は、たとえばポリ塩化ビニル（ＰＶＣ）等の可撓性の樹脂からなり、平流し搬送路２０２上を移動する基板Ｇの横幅サイズよりも長いノズルヘッダ管２１６に多数のノズルチップ２１８を長手方向一列に並べて取り付けており、全長が数ｍを越えるものもめずらしくない。このため、平流し搬送路２０２の両側でスプレーノズル２００の両端のみを支持しただけではスプレーノズル２００が自重によってその中心部が沈むように撓んでしまう。スプレーノズル２００が撓むと、スプレーノズル２００の長手方向において各ノズルチップ２１８と平流し搬送路２０２上の基板Ｇとの距離間隔が変動して、基板Ｇ上の液処理にばらつきが生じる。しかし、上記のようなノズル保持機構２０６を備えることで、スプレーノズル２００を水平に保持し、その長手方向において各ノズルチップ２１８と基板Ｇとの距離間隔を均一に保ち、基板Ｇ上の各部に均一な液処理を施すことができる。   The spray nozzle 200 is made of, for example, a flexible resin such as polyvinyl chloride (PVC), and a large number of nozzle tips 218 are placed on a nozzle header pipe 216 that is longer than the lateral width of the substrate G moving on the flat flow path 202. It is not uncommon to have one with a total length exceeding several meters. For this reason, if only the both ends of the spray nozzle 200 are supported on both sides of the flat flow conveyance path 202, the spray nozzle 200 bends so that its center portion sinks due to its own weight. When the spray nozzle 200 bends, the distance between each nozzle chip 218 and the substrate G on the flat conveying path 202 varies in the longitudinal direction of the spray nozzle 200, causing variations in liquid processing on the substrate G. However, by providing the nozzle holding mechanism 206 as described above, the spray nozzle 200 is held horizontally, the distance between each nozzle tip 218 and the substrate G is kept uniform in the longitudinal direction, and each portion on the substrate G is provided. Uniform liquid treatment can be performed.

特開２００７−３００１２９号公報JP 2007-300129 A

上記のような平流し方式の基板処理装置においては、平流し搬送路２０４に沿って設けられるスプレーノズル２００およびその他のツールの修理・部品交換はもちろん、平流し搬送路２０４を構成するコロ２２０の修理・部品交換も随時または定期的に行われる。   In the flat-flow type substrate processing apparatus as described above, the spray nozzle 200 and other tools provided along the flat-flow conveyance path 204 are repaired and parts are replaced, as well as the rollers 220 constituting the flat-flow conveyance path 204. Repairs and parts replacement are also performed at any time or periodically.

ところが、上記のようなノズル保持機構２０６を設置すると、このノズル保持機構２０６でのスプレーノズル２００の取り外しや再装着が非常に面倒で、スプレーノズル２００のメンテナンス性が悪くなるという問題があった。また、作業員がノズル保持機構２０６の真下に位置する平流し搬送路のコロ２２０の点検・修理を行う際に、ノズル保持機構２０６の梁２１２やブラケット２１４等が邪魔になって、コロ２２０へのアクセスが難しいという不便もあった。   However, when the nozzle holding mechanism 206 as described above is installed, it is very troublesome to remove and reattach the spray nozzle 200 by the nozzle holding mechanism 206, and there is a problem that the maintainability of the spray nozzle 200 is deteriorated. In addition, when an operator inspects and repairs the roller 220 of the flat flow conveyance path located directly below the nozzle holding mechanism 206, the beam 212, the bracket 214, and the like of the nozzle holding mechanism 206 get in the way and move to the roller 220. There was also the inconvenience that it was difficult to access.

本発明は、上記従来技術の問題点を解決するものであり、着脱性やメンテナンス性に優れ、梁型のノズル保持機構が無くても撓まない長尺型の処理液吐出ノズルおよびこれを用いる平流し方式の基板処理装置を提供する。   The present invention solves the above-mentioned problems of the prior art, and uses a long-type treatment liquid discharge nozzle that is excellent in detachability and maintenance, and that does not bend even without a beam-type nozzle holding mechanism. A flat-flow type substrate processing apparatus is provided.

本発明の処理液吐出ノズルは、処理液供給源に接続されるノズルヘッダ管と、前記ノズルヘッダ管に長手方向に分布または開口して設けられ、前記処理液供給源より前記ノズルヘッダ管に導入された処理液を噴出する吐出部と、前記ノズルヘッダ管の長手方向の一端と中心との間の第１の中間点で、前記ノズルヘッダ管の前記吐出部とは反対側の補強面に突出して設けられる第１の中間ジョイント部と、前記ノズルヘッダ管の長手方向の他端と中心との間の第２の中間点で、前記ノズルヘッダ管の前記補強面に突出して設けられる第２の中間ジョイント部と、前記ノズルヘッダ管の前記第１の中間点と前記第２の中間点との間で、前記ノズルヘッダ管の前記補強面に突出して設けられる中心ジョイント部と、前記中心ジョイント部と前記第１の中間ジョイント部との間に架け渡される第１の棒状連結部と、前記中心ジョイント部と前記第２の中間ジョイント部との間に架け渡される第２の棒状連結部とを有する。   The processing liquid discharge nozzle of the present invention is provided with a nozzle header pipe connected to a processing liquid supply source, and distributed or opened in the longitudinal direction in the nozzle header pipe, and is introduced into the nozzle header pipe from the processing liquid supply source. At a first intermediate point between one end and the center in the longitudinal direction of the nozzle header pipe and projecting to the reinforcing surface on the opposite side of the nozzle header pipe from the discharge section. A second intermediate point provided between the first intermediate joint portion provided at the second end and the other end in the longitudinal direction of the nozzle header pipe and the center, and protruding from the reinforcing surface of the nozzle header pipe. An intermediate joint part, a central joint part provided on the reinforcing surface of the nozzle header pipe so as to protrude between the first intermediate point and the second intermediate point of the nozzle header pipe; and the central joint part And the first Having a first connecting bar portion to be stretched between the middle joint and a second rod-shaped connecting portion to be stretched between the central joint portion and the second intermediate joint portion.

上記の構成においては、ノズルヘッダ管の中心点（重心）にかかる全体の重力が、中心ジョイント部、第１および第２の棒状連結部ならびに第１および第２の中間ジョイント部を介してノズルヘッダ管の第１および第２の中間点に伝わり、第１および第２の中間点にも下向きの力が作用する。このため、ノズルヘッダ管の中心点が重力（中心重力）によって下に変位しようとしても、第１および第２の中間点が中心点から中心ジョイント部、第１および第２の棒状連結部ならびに第１および第２の中間ジョイント部を介して伝達される重力（中間重力）によって同じく下に変位しようとするので、ノズルヘッダ管全体の湾曲変形つまり撓みが阻止される。これにより、ノズルヘッダ管に取り付けられている多数のノズルチップがたとえば同じ高さ位置で一直線上に並ぶ。したがって、ノズル長手方向で吐出部と平流し搬送路上の基板との距離間隔を均一にすることができる。   In the above configuration, the entire gravity applied to the center point (center of gravity) of the nozzle header pipe is transferred to the nozzle header via the center joint portion, the first and second rod-like connecting portions, and the first and second intermediate joint portions. The force is transmitted to the first and second intermediate points of the tube, and a downward force is also applied to the first and second intermediate points. For this reason, even if the center point of the nozzle header pipe is displaced downward due to gravity (center gravity), the first and second intermediate points move from the center point to the center joint portion, the first and second rod-like connecting portions, and the first point. Since gravity (intermediate gravity) transmitted through the first and second intermediate joint portions also tends to be displaced downward, curved deformation, that is, deflection of the entire nozzle header pipe is prevented. Thereby, a large number of nozzle tips attached to the nozzle header pipe are aligned in a straight line, for example, at the same height position. Therefore, it is possible to make the distance between the discharge unit and the substrate on the flat conveying path uniform in the longitudinal direction of the nozzle.

本発明の基板処理装置は、被処理基板を水平な方向に平流しで搬送するための平流し搬送路を有する搬送部と、前記平流し搬送路上の前記基板に前記処理液を噴き掛けるために、前記平流し搬送路の上方または下方で搬送方向と交差する方向に架け渡される本発明の処理液吐出ノズルと、前記平流し搬送路の両側で前記処理液吐出ノズルの両端部を保持するノズル保持部と、前記処理液吐出ノズルに前記処理液を供給する処理液供給源と、前記搬送路の両側で前記処理液吐出ノズルの両端を支持するノズル支持部とを有する。   The substrate processing apparatus according to the present invention includes a transport unit having a flat flow transport path for transporting a substrate to be processed in a horizontal direction in a horizontal direction, and spraying the processing liquid onto the substrate on the flat flow transport path. The processing liquid discharge nozzle of the present invention spanned in a direction crossing the transport direction above or below the flat flow path, and a nozzle that holds both ends of the processing liquid discharge nozzle on both sides of the flat flow path A holding unit; a processing liquid supply source that supplies the processing liquid to the processing liquid discharge nozzle; and a nozzle support that supports both ends of the processing liquid discharge nozzle on both sides of the transport path.

上記の装置構成においては、処理液吐出ノズルのノズルヘッダ管が撓まないので、ノズルヘッダ管の吐出部が平流し搬送路上の基板に対して一直線上の高さ位置から処理液を長手方向で均一に噴き掛けることが可能であり、それによって基板上の各部に均一な液処理を施すことができる。   In the above apparatus configuration, since the nozzle header pipe of the processing liquid discharge nozzle does not bend, the discharge section of the nozzle header pipe flows flatly, and the processing liquid is discharged in the longitudinal direction from a straight height position with respect to the substrate on the conveyance path. It is possible to spray evenly, whereby a uniform liquid treatment can be applied to each part on the substrate.

本発明の処理液吐出ノズルは、上記のような構成および作用により、着脱性やメンテナンス性に優れ、梁型のノズル保持機構が無くても撓まずにノズルヘッダ管の吐出部をその長手方向で一直線上に保つことができる。   The treatment liquid discharge nozzle of the present invention is excellent in detachability and maintenance due to the above-described configuration and operation, and the discharge portion of the nozzle header pipe is not bent in the longitudinal direction without bending without a beam-type nozzle holding mechanism. It can be kept in line.

本発明の基板処理装置は、上記のような構成および作用により、長尺状の処理液吐出ノズルを使用する平流し方式の液処理の精度および信頼性を向上させることができる。   The substrate processing apparatus of the present invention can improve the accuracy and reliability of flat-flow type liquid processing using a long processing liquid discharge nozzle by the configuration and operation as described above.

本発明の処理液吐出ノズルを適用できる洗浄処理装置の全体構成を示す略断面図である。It is a schematic sectional drawing which shows the whole structure of the washing | cleaning processing apparatus which can apply the process liquid discharge nozzle of this invention. 本発明の一実施形態におけるスプレーノズルおよびノズル支持部の全体構成を示す斜視図である。It is a perspective view which shows the whole structure of the spray nozzle and nozzle support part in one Embodiment of this invention. 上記スプレーノズルおよび上記ノズル支持部ならびにその周囲の構成を示す一部断面正面図である。It is a partial cross section front view which shows the said spray nozzle, the said nozzle support part, and the surrounding structure. 上記ノズル支持部に含まれるクランプの構成（保持状態）を示す側面図である。It is a side view which shows the structure (holding state) of the clamp contained in the said nozzle support part. 上記ノズル支持部に含まれるクランプの構成（開放状態）を示す側面図である。It is a side view which shows the structure (open state) of the clamp contained in the said nozzle support part. たわみ補正機構を取り付ける前の上記スプレーノズルが自重により空中で撓む様子を示す正面図である。It is a front view which shows a mode that the said spray nozzle before attaching a deflection correction mechanism bends in the air with dead weight. 上記スプレーノズルにたわみ補正機構を取り付ける工程の一段階を示す平面図である。It is a top view which shows one step of the process of attaching a deflection | deviation correction mechanism to the said spray nozzle. 上記スプレーノズルにたわみ補正機構を取り付ける工程の一段階を示す平面図である。It is a top view which shows one step of the process of attaching a deflection | deviation correction mechanism to the said spray nozzle. 上記スプレーノズルにたわみ補正機構を取り付ける工程の一段階を示す平面図である。It is a top view which shows one step of the process of attaching a deflection | deviation correction mechanism to the said spray nozzle. たわみ補正機構を取り付けた上記スプレーノズルの設置状態とその作用を示す正面図である。It is a front view which shows the installation state of the said spray nozzle which attached the deflection correction mechanism, and its effect | action. たわみ補正機構よりノズルヘッダ管に与えるノズル長手方向の応力を調節するためのねじ機構の一構成例を示す部分拡大正面図である。It is the elements on larger scale which show one structural example of the screw mechanism for adjusting the stress of the nozzle longitudinal direction given to a nozzle header pipe | tube from a deflection correction mechanism. 上記ねじ機構の別の構成例を示す部分拡大正面図である。It is a partial enlarged front view which shows another structural example of the said screw mechanism. たわみ補正機構を処理液供給路の一部に用いる一構成例を示す図である。It is a figure which shows one structural example which uses a deflection correction mechanism for a part of process liquid supply path. たわみ補正機構を処理液供給路の一部に用いる一構成例を示す図である。It is a figure which shows one structural example which uses a deflection correction mechanism for a part of process liquid supply path. 別の実施形態においてたわみ補正機構を取り付ける前のスプレーノズルが自重により空中で撓む様子を示す正面図である。It is a front view which shows a mode that the spray nozzle before attaching a deflection | deviation correction mechanism in another embodiment bends in the air with dead weight. 上記別の実施形態において上記スプレーノズルにたわみ補正機構を取り付ける工程の一段階を示す正面図である。It is a front view which shows one step of the process of attaching a deflection | deviation correction mechanism to the said spray nozzle in the said another embodiment. 上記別の実施形態において上記スプレーノズルにたわみ補正機構を取り付ける工程の一段階を示す正面図である。It is a front view which shows one step of the process of attaching a deflection | deviation correction mechanism to the said spray nozzle in the said another embodiment. 図９Ａのたわみ補正機構を取り付けた上記スプレーノズルの設置状態を示す図である。It is a figure which shows the installation state of the said spray nozzle which attached the deflection correction mechanism of FIG. 9A. 従来の長尺型処理液吐出ノズルおよびこれを保持するノズル保持機構の構成を示す斜視図である。It is a perspective view which shows the structure of the conventional elongate type process liquid discharge nozzle and the nozzle holding mechanism holding this. 図１０のノズルおよびノズル保持機構の構成を示す側面図である。It is a side view which shows the structure of the nozzle of FIG. 10, and a nozzle holding mechanism.

以下、添付図を参照して本発明の好適な実施の形態を説明する。
［基板処理装置の実施形態］ Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.
[Embodiment of substrate processing apparatus]

図１に、本発明の処理液吐出ノズルおよび基板処理装置を適用できる平流し式洗浄処理装置の全体構成を示す。   FIG. 1 shows the overall configuration of a flat-flow cleaning processing apparatus to which the processing liquid discharge nozzle and the substrate processing apparatus of the present invention can be applied.

この洗浄処理装置は、たとえばＦＰＤ用のレジスト塗布現像処理システムに組み込まれ、被処理基板（たとえばガラス基板）にレジストを塗布する前に基板上の不純物やパーティクルを除去するために用いられる。   This cleaning processing apparatus is incorporated in a resist coating and developing processing system for FPD, for example, and is used to remove impurities and particles on the substrate before applying the resist to the substrate to be processed (for example, a glass substrate).

この洗浄処理装置は、２つのチャンバ１０，１２を並べて配置し、両チャンバ１０，１２の中を縦断するコロ搬送路１４を備えている。上流側の洗浄チャンバ１０は、内部に設けた２つの隔壁１６，１８によって３つの処理室、すなわちブラッシング洗浄室Ｒ1、ブロー洗浄室Ｒ2およびリンス室Ｒ3に分割されている。搬送方向（Ｘ方向）と向き合うチャンバ１０の外壁１０ａ，１０ｂおよび両隔壁１６，１８には、コロ搬送路１４上を移動する基板Ｇが通れるスリット状の開口（基板出入り口）２０，２２，２４，２６がそれぞれ形成されている。ここで、開口２０は、ブラッシング洗浄室Ｒ1の入口である。開口２２は、ブラッシング洗浄室Ｒ1の出口であり、かつブロー洗浄室Ｒ2の入口でもある。開口２４は、ブロー洗浄室Ｒ2の出口であり、かつリンス室Ｒ3の入口でもある。開口２６は、リンス室Ｒ3の出口である。   This cleaning processing apparatus is provided with a roller conveyance path 14 in which two chambers 10 and 12 are arranged side by side and vertically cut through the chambers 10 and 12. The upstream cleaning chamber 10 is divided into three processing chambers, that is, a brushing cleaning chamber R1, a blow cleaning chamber R2, and a rinse chamber R3, by two partition walls 16 and 18 provided therein. In the outer walls 10a, 10b of the chamber 10 facing the transport direction (X direction) and both the partition walls 16, 18, slit-like openings (substrate entrances) 20, 22, 24, through which the substrate G moving on the roller transport path 14 passes. 26 are formed. Here, the opening 20 is an entrance of the brushing cleaning chamber R1. The opening 22 is an outlet of the brushing cleaning chamber R1 and also an inlet of the blow cleaning chamber R2. The opening 24 is an outlet of the blow cleaning chamber R2, and is also an inlet of the rinsing chamber R3. The opening 26 is an outlet of the rinse chamber R3.

ブラッシング洗浄室Ｒ1には、コロ搬送路１４に沿ってその上下両側にプリウエットノズル２８Ｕ／２８Ｌ、ロールブラシ３０Ｕ／３０Ｌおよびリンスノズル３２Ｕ／３２Ｌが配置されている。プリウエットノズル２８Ｕ／２８Ｌは、基板Ｇを横幅方向（Ｙ方向）で端から端までカバーする長さを有しており、薬液供給部（図示せず）より送られてくる薬液を噴き出すようになっている。ロールブラシ３０Ｕ，３０Ｌは、基板Ｇを横幅方向で端から端までカバーする長さを有しており、モータ等のブラシ駆動部（図示せず）により回転駆動されるようになっている。リンスノズル３２Ｕ／３２Ｌは、基板Ｇを横幅方向で端から端までカバーする長さを有しており、リンス液供給部（図示せず）より送られてくるリンス液を噴き出すようになっている。ブラッシング洗浄室Ｒ1には、チャンバ背面側の壁１０ｄの上部に１つまたは複数の排気ポート３４が設けられており、底にドレイン口３６が設けられている。   In the brushing cleaning chamber R1, pre-wet nozzles 28U / 28L, roll brushes 30U / 30L, and rinse nozzles 32U / 32L are arranged on the upper and lower sides along the roller conveyance path 14. The pre-wet nozzles 28U / 28L have a length that covers the substrate G from end to end in the lateral width direction (Y direction) so as to eject the chemical solution sent from the chemical solution supply unit (not shown). It has become. The roll brushes 30U and 30L have a length that covers the substrate G from end to end in the lateral width direction, and are rotationally driven by a brush drive unit (not shown) such as a motor. The rinse nozzles 32U / 32L have a length that covers the substrate G from end to end in the lateral width direction, and eject the rinse liquid sent from the rinse liquid supply unit (not shown). . In the brushing cleaning chamber R1, one or a plurality of exhaust ports 34 are provided in the upper part of the wall 10d on the back side of the chamber, and a drain port 36 is provided in the bottom.

ブロー洗浄室Ｒ2内には、コロ搬送路１４の上下両側に高圧の２流体ノズル３８Ｕ／３８Ｌが配置されている。これらの２流体ノズル３８Ｕ／３８Ｌは、基板Ｇの横幅サイズをカバーする長さを有しており、洗浄液供給部（図示せず）より送られてくる洗浄液と高圧ガス供給部（図示せず）より送られてくる高圧気体とを混合して、粒状の液滴をジェット流で、またはスプレー状に噴射するようになっている。ブロー洗浄室Ｒ2にも、チャンバ背面側の壁１０ｄの上部に１つまたは複数の排気ポート４０が設けられ、底にドレイン口４２が設けられている。   In the blow cleaning chamber R2, high-pressure two-fluid nozzles 38U / 38L are arranged on the upper and lower sides of the roller conveyance path 14. These two-fluid nozzles 38U / 38L have a length that covers the width of the substrate G, and the cleaning liquid and high-pressure gas supply section (not shown) sent from the cleaning liquid supply section (not shown). It mixes with the high-pressure gas sent from more, and a granular droplet is jetted by a jet stream or spray form. Also in the blow cleaning chamber R2, one or a plurality of exhaust ports 40 are provided in the upper part of the wall 10d on the rear side of the chamber, and a drain port 42 is provided in the bottom.

リンス室Ｒ3内には、コロ搬送路１４の上下両側に適当な間隔を空けて複数のリンスノズル４２Ｕ／４２Ｌが配置されている。これらのリンスノズル４２Ｕ／４２Ｌは、基板Ｇの横幅サイズをカバーする長さを有しており、リンス液供給部（図示せず）より送られてくるリンス液を噴き出すようになっている。リンス室Ｒ3においても、チャンバ背面側の壁１０ｄの上部に１つ（または複数）の排気ポート４４が設けられており、底にはドレイン口４６が設けられている。   In the rinse chamber R3, a plurality of rinse nozzles 42U / 42L are arranged on the upper and lower sides of the roller conveyance path 14 with appropriate intervals. These rinse nozzles 42U / 42L have a length that covers the width of the substrate G, and jet the rinse liquid sent from a rinse liquid supply unit (not shown). Also in the rinsing chamber R3, one (or a plurality) of exhaust ports 44 are provided on the upper portion of the wall 10d on the rear side of the chamber, and a drain port 46 is provided on the bottom.

下流側のチャンバ１２は、専用の液切り乾燥室Ｒ4になっている。搬送方向（Ｘ方向）と向き合うチャンバ１２の外壁１２ａ，１２ｂには、コロ搬送路１４上を移動する基板Ｇが通れるスリット状の開口４８，５０がそれぞれ形成されている。ここで、開口４８は入口であり，開口５０は出口である。   The downstream chamber 12 is a dedicated liquid draining and drying chamber R4. In the outer walls 12a and 12b of the chamber 12 facing the transport direction (X direction), slit-shaped openings 48 and 50 through which the substrate G moving on the roller transport path 14 passes are formed. Here, the opening 48 is an inlet and the opening 50 is an outlet.

液切り乾燥室Ｒ4内には、コロ搬送路１４を挟んで搬送方向（Ｘ方向）に対して斜めに上部および下部エアナイフ５２Ｕ，５２Ｌが配置されている。両エアナイフ５２Ｕ，５２Ｌは、基板Ｇの横幅サイズをカバーする長さを有しており、それぞれの吐出口を液切り乾燥室Ｒ4の入口４８側および正面側の中間の方位に向けて、乾燥ガス供給部（図示せず）より送られてくる液切り乾燥用の高圧の気体（通常はエア、場合によっては窒素ガス）を鋭利なナイフ状の気流で噴射するようになっている。   Upper and lower air knives 52U and 52L are disposed in the liquid draining drying chamber R4 obliquely with respect to the transport direction (X direction) with the roller transport path 14 interposed therebetween. Both the air knives 52U and 52L have a length that covers the width of the substrate G, and the respective discharge ports are directed toward the intermediate direction between the inlet 48 side and the front side of the liquid draining drying chamber R4, and the drying gas A high-pressure gas (usually air, in some cases nitrogen gas) for draining and drying sent from a supply unit (not shown) is jetted with a sharp knife-like airflow.

液切り乾燥室Ｒ4には、チャンバ正面側の壁１０ｃの上部に１つ（または複数）の上部排気ポート５４が設けられるとともに、室内の底部に複数（または１つ）の排気ポート５６が設けられている。また、液切り乾燥室Ｒ4には、両エアナイフ５２Ｕ，５２Ｌの後方または下流側の天井に、ＦＦＵ（ファン・フィルタ・ユニット）５８が設置されている。このＦＦＵ５８は、室外の空気を引き込むファンと、空気中の塵を除去するフィルタとを有し、清浄な空気をダウンフローで室内に供給する。液切り乾燥室Ｒ4の底には、ドレイン口６０が設けられている。   In the liquid draining / drying chamber R4, one (or a plurality of) upper exhaust ports 54 are provided at the upper part of the wall 10c on the front side of the chamber, and a plurality (or one) of the exhaust ports 56 are provided at the bottom of the room. ing. In the liquid draining / drying chamber R4, an FFU (fan filter unit) 58 is installed on the ceiling behind or downstream of the air knives 52U and 52L. The FFU 58 has a fan that draws outdoor air and a filter that removes dust in the air, and supplies clean air into the room by downflow. A drain port 60 is provided at the bottom of the liquid draining chamber R4.

コロ搬送路１４には、基板Ｇの幅サイズをカバーする長さの搬送ローラまたはコロ６２が搬送方向（Ｘ方向）に一定間隔で敷設されている。この実施形態では、コロ６２が、チャンバ１０，１２の中に収容され、チャンバ１０，１２の外に配置されている搬送駆動源により伝動機構を介して回転駆動されるようになっている。   In the roller conveyance path 14, conveyance rollers or rollers 62 having a length that covers the width size of the substrate G are laid at regular intervals in the conveyance direction (X direction). In this embodiment, the roller 62 is accommodated in the chambers 10 and 12 and is rotationally driven via a transmission mechanism by a conveyance drive source disposed outside the chambers 10 and 12.

ここで、この洗浄処理装置における全体の動作および作用を説明する。当該レジスト塗布現像処理システムにおいて、カセットステーションよりプロセスラインに投入された基板Ｇは、最初にエキシマＵＶ照射ユニット（図示せず）で紫外線照射処理を受けて基板表面の有機汚染物を除去され、それからコロ搬送路１４上を平流しで移動してこの洗浄処理装置のブラッシング洗浄室Ｒ1に入口２０から搬入される。   Here, the overall operation and action of the cleaning apparatus will be described. In the resist coating and developing system, the substrate G introduced into the process line from the cassette station is first subjected to ultraviolet irradiation processing by an excimer UV irradiation unit (not shown) to remove organic contaminants on the substrate surface, and then It moves on the roller transport path 14 in a flat flow and is carried into the brushing cleaning chamber R1 of this cleaning processing apparatus from the inlet 20.

ブラッシング洗浄室Ｒ1において、基板Ｇは、最初にプリウエット用の上部および下部プリウエットノズル２８Ｕ，２８Ｌにより基板全体にたとえば酸またはアルカリ系の薬液を噴き掛けられる。次いで、基板Ｇは、上部および下部ロールブラシ３０Ｕ，３０Ｌの下を順次擦りながら通り抜ける。両ロールブラシ３０Ｕ，３０Ｌは、ブラシ駆動部の回転駆動力で搬送方向と対抗する向きに回転し、基板表面の異物（塵埃、破片、汚染物等）を擦り取る。その直後に、リンス用の上部および下部リンスノズル３２Ｕ，３２Ｌが基板Ｇにリンス液たとえば純水を噴き掛け、基板上に浮遊している異物を洗い流す。ブラッシング洗浄室Ｒ1内で基板Ｇから底に落ちた液（薬液、リンス液等）は、ドレイン口３６より排出される。   In the brushing cleaning chamber R1, the substrate G is first sprayed with, for example, an acid or alkaline chemical on the entire substrate by the upper and lower prewetting nozzles 28U and 28L for prewetting. Next, the substrate G passes through the upper and lower roll brushes 30U, 30L while rubbing sequentially. Both roll brushes 30U and 30L rotate in a direction opposite to the conveying direction by the rotational driving force of the brush drive unit, and scrape off foreign matters (dust, debris, contaminants, etc.) on the substrate surface. Immediately thereafter, the rinsing upper and lower rinsing nozzles 32U and 32L spray a rinsing liquid such as pure water onto the substrate G to wash away foreign substances floating on the substrate. The liquid (chemical liquid, rinse liquid, etc.) that has dropped from the substrate G to the bottom in the brushing cleaning chamber R1 is discharged from the drain port 36.

基板Ｇは、リンスノズル３２Ｕ，３２Ｌを通り抜けた直後に、隔壁１６の基板出入り口２２を通ってブロー洗浄室Ｒ2に入る。ブロー洗浄室Ｒ2では、上部および下部２流体ノズル３８Ｕ，３８Ｌが、ノズル内で洗浄液を高圧の気体（たとえばエア）と混合して粒状の液滴を生成し、生成した液滴を基板Ｇのおもて面（上面）および裏面（下面）に向けて高圧のジェット流で、またはスプレー状に噴き掛ける。こうして、流状の液滴が基板Ｇの表面に衝突することで、基板表面に残存していた異物が十全に除去される。ブロー洗浄室Ｒ2内で基板Ｇから底に落ちた液（洗浄液等）は、ドレイン口４２より排出される。   Immediately after passing through the rinsing nozzles 32U and 32L, the substrate G enters the blow cleaning chamber R2 through the substrate entrance 22 of the partition wall 16. In the blow cleaning chamber R2, the upper and lower two-fluid nozzles 38U and 38L generate granular droplets by mixing the cleaning liquid with high-pressure gas (for example, air) in the nozzles, and generate the generated droplets on the substrate G. A high-pressure jet stream or spray is sprayed toward the front surface (upper surface) and back surface (lower surface). Thus, when the liquid droplets collide with the surface of the substrate G, the foreign matters remaining on the substrate surface are completely removed. The liquid (cleaning liquid or the like) that has dropped from the substrate G to the bottom in the blow cleaning chamber R2 is discharged from the drain port 42.

ブロー洗浄室Ｒ2の次に基板Ｇはリンス室Ｒ3を通過する。リンス室Ｒ3では、上部および下部リンスノズル４２Ｕ，４２Ｌがコロ搬送路１４上の基板Ｇにリンス液たとえば純水を噴き掛ける。これによって、ブロー洗浄室Ｒ2から持ち込まれた基板Ｇ上の液（異物が浮遊している液）がリンス液に置換される。リンス室Ｒ3内で基板Ｇから底に落ちた液（洗浄液、リンス液等）は、ドレイン口４６より排出される。   Subsequent to the blow cleaning chamber R2, the substrate G passes through the rinsing chamber R3. In the rinse chamber R3, the upper and lower rinse nozzles 42U and 42L spray a rinse liquid such as pure water onto the substrate G on the roller transport path 14. As a result, the liquid on the substrate G brought in from the blow cleaning chamber R2 (liquid in which foreign matter is floating) is replaced with the rinse liquid. The liquid (cleaning liquid, rinsing liquid, etc.) dropped from the substrate G to the bottom in the rinsing chamber R3 is discharged from the drain port 46.

基板Ｇは、リンス室Ｒ3を出ると同時に隣の液切り乾燥室Ｒ4に入る。液切り乾燥室Ｒ4では、コロ搬送路１４上の基板Ｇに対して、上部および下部エアナイフ５２Ｕ，５２Ｌがナイフ状の鋭利な高圧の気体流たとえばエア流を搬送方向に斜め逆らう方向に当てる。これによって、基板Ｇに付いていた液（大部分がリンス液）は高圧エア流の風力で払い落とされ、液切り乾燥室Ｒ4の底に落ちた液はドレイン口６０より排出される。こうして、上部および下部エアナイフ５２Ｕ，５２Ｌの間を通り過ぎた基板Ｇの表面は乾いた状態になる。   The substrate G exits the rinsing chamber R3 and simultaneously enters the adjacent liquid draining and drying chamber R4. In the liquid draining / drying chamber R4, the upper and lower air knives 52U and 52L apply a knife-like sharp high-pressure gas flow, for example, an air flow, to the substrate G on the roller transport path 14 in a direction diagonally opposite to the transport direction. As a result, the liquid (mostly the rinsing liquid) attached to the substrate G is wiped off by the high-pressure airflow of wind, and the liquid that has fallen to the bottom of the liquid draining drying chamber R4 is discharged from the drain port 60. Thus, the surface of the substrate G passing between the upper and lower air knives 52U and 52L becomes dry.

液切り乾燥室Ｒ4の出口５０を出た基板Ｇは、そのままコロ搬送路１４を平流しで移動して後段の熱処理装置（図示せず）へ入る。   The substrate G that has exited the outlet 50 of the liquid drying / drying chamber R4 moves as it flows through the roller transport path 14 as it is, and enters a subsequent heat treatment apparatus (not shown).

この洗浄処理装置においては、ブラッシング洗浄室Ｒ1に設けられるプリウエットノズル２８Ｕ／２８Ｌおよびリンスノズル３２Ｕ／３２Ｌ、ブロー洗浄室Ｒ2に設けられる２流体ノズル３８Ｕ／３８Ｌならびにリンス室Ｒ3に設けられるリンスノズル４２Ｕ／４２Ｌのいずれにも本発明の長尺型処理液吐出ノズルを適用することが可能であり、それによって、基板Ｇ上の各部に均一な液処理（薬液ウエット処理、リンス処理等）を施し、洗浄処理能力および信頼性を向上させている。

［処理液吐出ノズルの実施形態１］ In this cleaning processing apparatus, prewetting nozzles 28U / 28L and rinse nozzles 32U / 32L provided in the brushing cleaning chamber R1, two-fluid nozzles 38U / 38L provided in the blow cleaning chamber R2, and a rinse nozzle 42U provided in the rinse chamber R3. It is possible to apply the long processing liquid discharge nozzle of the present invention to any of / 42L, thereby performing uniform liquid processing (chemical wet processing, rinsing processing, etc.) on each part on the substrate G, Improves cleaning throughput and reliability.

[Embodiment 1 of Treatment Liquid Discharge Nozzle]

次に、本発明の一実施形態における処理液吐出ノズルの構成および作用を説明する。図２および図３に、本発明の一実施形態におけるスプレーノズル（処理液吐出ノズル）６４とこれを支持するためのノズル支持６６の構成を示す。   Next, the configuration and operation of the processing liquid discharge nozzle in one embodiment of the present invention will be described. 2 and 3 show a configuration of a spray nozzle (processing liquid discharge nozzle) 64 and a nozzle support 66 for supporting the spray nozzle 64 in one embodiment of the present invention.

このスプレーノズル６４は、基本構成として、基板Ｇの横幅サイズ（Ｙ方向サイズ）を上回るたとえば２〜３ｍの全長を有する管状のノズル本体またはノズルヘッダ管６８と、このノズルヘッダ管６８に長手方向一列に並んで取り付けられる多数のノズルチップ７０とを有し、これらのノズルチップ７０を下に向けて、その両端部をノズル支持部６６により支持される。   The spray nozzle 64 has, as a basic configuration, a tubular nozzle body or nozzle header pipe 68 having a total length of, for example, 2 to 3 m exceeding the lateral width size (Y-direction size) of the substrate G, and a longitudinal row in the nozzle header pipe 68. A plurality of nozzle tips 70 mounted side by side, and these nozzle tips 70 face downward, and both ends thereof are supported by nozzle support portions 66.

ノズルヘッダ管６８は、一端（図の左端）が処理液供給源（図示せず）に通じている配管７２に接続され、他端（図の右端）が閉塞されている。ノズルヘッダ管６８の材質は、好ましくは加工性および耐薬性にすぐれたポリ塩化ビニル（ＰＶＣ）であるが、他の樹脂あるいはステンレス鋼等の金属を用いてもよい。ノズルチップ７０も、ポリ塩化ビニルあるいは他の樹脂または金属からなり、ノズルヘッダ管６８に着脱可能にねじ込まれ、あるいは溶接で固着される。図３に示すように、各々のノズルチップ７０は、処理液供給源より配管７２を通ってノズルヘッダ管６８に導入された処理液（薬液、リンス液等）をスプレー状に噴出するように構成されている。   One end (left end in the figure) of the nozzle header pipe 68 is connected to a pipe 72 communicating with a processing liquid supply source (not shown), and the other end (right end in the figure) is closed. The material of the nozzle header pipe 68 is preferably polyvinyl chloride (PVC) excellent in workability and chemical resistance, but other resins or metals such as stainless steel may be used. The nozzle tip 70 is also made of polyvinyl chloride, other resin, or metal, and is detachably screwed into the nozzle header pipe 68 or fixed by welding. As shown in FIG. 3, each nozzle chip 70 is configured to spray the processing liquid (chemical liquid, rinsing liquid, etc.) introduced into the nozzle header pipe 68 through the pipe 72 from the processing liquid supply source in a spray form. Has been.

スプレーノズル６４において、ノズルヘッダ管６８のノズルチップ７０を取り付けている底の面とは反対側の頂面（補強面）６８ａには、ノズルヘッダ管６８が重力で撓むのを防止するためのたわみ補正機構７４が取り付けられている。このたわみ補正機構７４は、次のような多数の部品からなる組立体として構成されている。   In the spray nozzle 64, the top surface (reinforcing surface) 68a opposite to the bottom surface to which the nozzle tip 70 of the nozzle header tube 68 is attached is for preventing the nozzle header tube 68 from being bent by gravity. A deflection correction mechanism 74 is attached. The deflection correcting mechanism 74 is configured as an assembly including a number of parts as follows.

すなわち、たわみ補正機構７４は、ノズルヘッダ管６８の長手方向の中心と一端との間の第１の中間点ＰM1でノズルヘッダ管６８の補強面６８ａに突出して設けられる第１の中間ジョイント部７８と、ノズルヘッダ管６８の長手方向の中心と他端との間の第２の中間点ＰM2でノズルヘッダ管６８の補強面６８ａに突出して設けられる第２の中間ジョイント部８０と、ノズルヘッダ管６８の第１および第２の中間ジョイント部７８，８０の間たとえば長手方向の中心点ＰCでノズルヘッダ管６８の補強面６８ａに突出して設けられる中心ジョイント部７６と、中心ジョイント部７６と第１の中間ジョイント部７８との間に架け渡される第１の連結棒８２と、中心ジョイント部７６と第２の中間ジョイント部８０との間に架け渡される第２の連結棒８４とを有している。たわみ補正機構７４の各部（７６〜８４）も、その材質として、ポリ塩化ビニル（ＰＶＣ）を好適に用いてよいが、他の樹脂あるいはステンレス鋼等の金属を用いてもよい。たわみ補正機構７４のより詳細な構成および組立方法については後に説明する。 That is, the deflection correcting mechanism 74 is a first intermediate joint portion provided to protrude from the reinforcing surface 68a of the nozzle header pipe 68 at a first intermediate point P M1 between the longitudinal center and one end of the nozzle header pipe 68. 78, a second intermediate joint portion 80 provided to protrude from the reinforcing surface 68a of the nozzle header pipe 68 at a second intermediate point P M2 between the longitudinal center of the nozzle header pipe 68 and the other end, a nozzle Between the first and second intermediate joint portions 78 and 80 of the header pipe 68, for example, a central joint portion 76 that protrudes from the reinforcing surface 68a of the nozzle header pipe 68 at a longitudinal center point P C , and the central joint portion 76 The first connecting rod 82 spanned between the first intermediate joint portion 78 and the second coupling spanned between the center joint portion 76 and the second intermediate joint portion 80. And a 84. Polyvinyl chloride (PVC) may be suitably used as the material of each part (76 to 84) of the deflection correction mechanism 74, but other resins or metals such as stainless steel may be used. A more detailed configuration and assembling method of the deflection correcting mechanism 74 will be described later.

ノズル支持部６６は、チャンバ１０の正面側および背面側の壁１０ｃ，１０ｄにそれぞれ同じ高さ位置でボルト８６によって固定される一対の取付金具８８と、各々の取付金具８８上でスプレーノズル６４のノズルヘッダ管６８の両端部を着脱可能に保持する１つまたは複数のクランプ９０とを有している。   The nozzle support portion 66 includes a pair of mounting brackets 88 fixed to the front and back side walls 10c and 10d of the chamber 10 by bolts 86 at the same height, and the spray nozzle 64 on each mounting bracket 88. One or more clamps 90 that detachably hold both ends of the nozzle header pipe 68 are provided.

図４Ａおよび図４Ｂに、クランプ９０の構成および作用を示す。クランプ９０は、たとえば樹脂からなる一体成型品として形成され、ベース部９２と、このベース部９２に開閉変位可能に一体結合されている一対の円弧状保持片９４，９６を有している。これら一対の円弧状保持片９４，９６の上端部には、互いに係合可能な凸部または爪部９８および凹部１００がそれぞれ形成されている。円弧状保持片９４，９６をそれぞれの上端部が重なり合うように突き合わせ、円弧状保持片９４の爪部９８と円弧状保持片９６の凹部１００とを係合させることにより、両円弧状保持片９４，９６の内側に装入されたノズルヘッダ管６８をしっかりと保持することができる。この保持状態から爪部９８と凹部１００を外すと、両円弧状保持片９４，９６が分離して開放状態となり、ノズルヘッダ管６８の装入または取り外しが可能となる。このように、ノズル支持部６６は、クランプ９０を通じて、スプレーノズル６４を安定・堅固に保持し、かつその着脱を容易に行えるようになっている。   4A and 4B show the configuration and operation of the clamp 90. FIG. The clamp 90 is formed as an integrally molded product made of, for example, a resin, and includes a base portion 92 and a pair of arc-shaped holding pieces 94 and 96 that are integrally coupled to the base portion 92 so as to be capable of opening and closing. At the upper end portions of the pair of arcuate holding pieces 94, 96, a projecting portion or a claw portion 98 and a recessed portion 100 that can be engaged with each other are formed. The arc-shaped holding pieces 94 and 96 are abutted so that their upper end portions overlap each other, and the claw portion 98 of the arc-shaped holding piece 94 and the concave portion 100 of the arc-shaped holding piece 96 are engaged with each other. , 96 can be firmly held. When the claw portion 98 and the concave portion 100 are removed from this holding state, the two arc-shaped holding pieces 94 and 96 are separated and opened, and the nozzle header pipe 68 can be inserted or removed. Thus, the nozzle support part 66 can hold | maintain the spray nozzle 64 stably and firmly through the clamp 90, and can attach or detach now easily.

再び図３において、コロ搬送路１４は、スプレーノズル６４およびノズル支持部６６の下を通っている。コロ搬送路１４を構成する各コロ６２の両端は、チャンバ１０の正面側および背面側の壁１０ｃ，１０ｄに固定された左右一対の軸受１００，１０２に回転可能にそれぞれ支持されている。コロ６２は、一定の太さ（径）を有する剛体のシャフトを有し、このシャフトの両端部に基板Ｇの両側端（長辺縁部）を支持する円筒形のローラ部６２ａを取り付け、シャフト中間部に基板Ｇの中間部を支持する複数の円筒形ローラ部６２ｂを取り付けている。両端のローラ部６２ａには基板Ｇの下端側の側面を受ける鍔状の太径部が一体に形成されている。搬送駆動部１０４は、チャンバ背面側の壁１０ｄに支持台１０６を介して固定された電気モータ１０８と、この電気モータ１０８の回転駆動力を各コロ６２に伝えるための伝動機構とを有する。この伝動機構は、電気モータ１０８の回転軸に無端ベルト１１０を介して接続された搬送方向（Ｘ方向）に延びる回転駆動シャフト１１２と、この回転駆動シャフト１１２と各コロ６２とを作動結合する交差軸型のギア１１４とを有している。搬送駆動部１０４とコロ搬送路１４とによって、平流し搬送部が構成されている。コロ搬送路１４の下には、基板Ｇ上からこぼれ落ちた処理液、あるいは連続する基板Ｇの合間にスプレーノズル６４から吐出された処理液を受け集めるためのパン１１６が設けられている。   In FIG. 3 again, the roller conveyance path 14 passes under the spray nozzle 64 and the nozzle support portion 66. Both ends of each roller 62 constituting the roller conveyance path 14 are rotatably supported by a pair of left and right bearings 100 and 102 fixed to the front and rear walls 10c and 10d of the chamber 10, respectively. The roller 62 has a rigid shaft having a constant thickness (diameter), and cylindrical roller portions 62a that support both side ends (long side edge portions) of the substrate G are attached to both ends of the shaft. A plurality of cylindrical roller portions 62b that support the intermediate portion of the substrate G are attached to the intermediate portion. The roller portions 62a at both ends are integrally formed with a bowl-shaped large-diameter portion that receives the side surface on the lower end side of the substrate G. The transport driving unit 104 includes an electric motor 108 fixed to the wall 10d on the back side of the chamber via a support base 106, and a transmission mechanism for transmitting the rotational driving force of the electric motor 108 to each roller 62. This transmission mechanism includes a rotation drive shaft 112 extending in the conveying direction (X direction) connected to the rotation shaft of the electric motor 108 via an endless belt 110, and an intersection for operatively coupling the rotation drive shaft 112 and each roller 62. And a shaft-type gear 114. The conveyance drive unit 104 and the roller conveyance path 14 constitute a flat flow conveyance unit. Under the roller conveyance path 14, a pan 116 for collecting the processing liquid spilled from the substrate G or the processing liquid discharged from the spray nozzle 64 between successive substrates G is provided.

次に、図５Ａ〜図５Ｅを参照して、この実施形態におけるたわみ補正機構７４のより詳細な構成および組立方法を説明する。   Next, with reference to FIG. 5A to FIG. 5E, a more detailed configuration and assembling method of the deflection correction mechanism 74 in this embodiment will be described.

先ず、図５Ａに示すように、たわみ補正機構７４を取り付ける前のスプレーノズル６４つまりノズルヘッダ管６８は、その両端部が略同じ高さ位置で支持された状態で空中に置かれると、自重によって中心部が沈むように下に撓む。たとえば、ノズルヘッダ管６８がＰＶＣ製で、その全長ＬＴが約２５００ｍｍの場合、管内が空の状態（処理液が入っていない状態）でも、撓み量（中心部の沈み量）Ｄは約２０ｍｍにもなる。ノズルヘッダ管６８の中に処理液が入っているときは、撓み量Ｄは更に大きくなる。   First, as shown in FIG. 5A, when the spray nozzle 64 before mounting the deflection correction mechanism 74, that is, the nozzle header pipe 68 is placed in the air in a state where both ends thereof are supported at substantially the same height position, by its own weight. It bends down so that the center part sinks. For example, if the nozzle header pipe 68 is made of PVC and its total length LT is about 2500 mm, even if the pipe is empty (the state in which no processing liquid is contained), the amount of deflection (the amount of sinking in the center) D is about 20 mm. Also become. When the processing liquid is contained in the nozzle header pipe 68, the deflection amount D is further increased.

この実施形態においては、図５Ｂに示すように、たわみ補正機構７４を取り付ける前のスプレーノズル６４つまりノズルヘッダ管６８を自重が作用しない状態で、たとえば水平な作業テーブル（図示せず）の上に載せた状態で、まっすぐに延ばす。そして、ノズルヘッダ管６８にたわみ補正機構７４を取り付けるに先立ち、その長さ方向の中心点ＰC、第１および第２の中間点ＰM1，ＰM2の３箇所にて、ノズルヘッダ管６８の補強面６８ａに固定ピン１１８，１２０，１２２をたとえば溶接でそれぞれ固着する。なお、第１および第２の中間点ＰM1，ＰM2は、中心点ＰCとノズルヘッダ管６８の両端との真ん中付近にそれぞれ設定されるのが好ましく、中心点ＰCと第１の中間点ＰM1との間の距離をＬM1、中心点ＰCと第２の中間点ＰM2との間の距離をＬM2とすると、ＬM1＝ＬM2またはＬM1≒ＬM2の関係が好ましい。 In this embodiment, as shown in FIG. 5B, the spray nozzle 64 before mounting the deflection correcting mechanism 74, that is, the nozzle header pipe 68 is not subjected to its own weight, for example, on a horizontal work table (not shown). In the state of being placed, extend straight. Prior to attaching the deflection correction mechanism 74 to the nozzle header pipe 68, the nozzle header pipe 68 is connected to the nozzle header pipe 68 at three points, the center point P C in the length direction and the first and second intermediate points P M1 and P M2 . The fixing pins 118, 120, 122 are fixed to the reinforcing surface 68a by, for example, welding. The first and second intermediate point P M1, P M2 is preferably is set to the vicinity of the middle of the opposite ends of the center point P C and the nozzle header tubes 68, the central point P C and the first intermediate L M1 the distance between the point P M1, the distance between the center point P C and the second intermediate point P M2 When L M2, the relationship L M1 = L M2 or L M1 ≒ L M2 is preferably .

一方、たわみ補正機構７４においては、中心ジョイント部７６、第１および第２の中間ジョイント部７８，８０、第１および第２の連結棒８２，８４の各部品を用意する。ここで、中心ジョイント部７６にはＴ字継手たとえばＴ字管を好適に使用し、第１および第２の中間ジョイント部７８，８０にはエルボ継手たとえばエルボ管を好適に使用することができる。第１および第２の連結棒８２，８４は中空管または中実管のいずれであってもよく、丸棒に限らず、角棒であってもよい。   On the other hand, in the deflection correction mechanism 74, the central joint portion 76, the first and second intermediate joint portions 78 and 80, and the first and second connecting rods 82 and 84 are prepared. Here, a T-shaped joint, for example, a T-shaped tube, can be preferably used for the center joint portion 76, and an elbow joint, for example, an elbow tube, can be preferably used for the first and second intermediate joint portions 78, 80. The first and second connecting rods 82 and 84 may be either hollow tubes or solid tubes, and are not limited to round bars but may be square bars.

そして、第１の連結棒８２の両端部を中心ジョイント部（Ｔ字管）７６の一方の横筒部および第１の中間ジョイント部（エルボ管）７８の横筒部にそれぞれ挿入して、第１の補強組立体１２４を作製する。さらに、第２の連結棒８４の両端部を中心ジョイント部７６の他方の横筒部および第２の中間ジョイント部（エルボ管）８０の横筒部にそれぞれ挿入して、第２の補強組立体１２６を作製する。第１および第２の補強組立体１２４，１２６の強度を高めるために、各々の連結箇所に接着剤を用いるのも好ましい。第１および第２の補強組立体１２４，１２６がこのように一体的に合わさって、たわみ補正機構７４の組立体が出来上がる。   Then, both end portions of the first connecting rod 82 are inserted into one horizontal tube portion of the center joint portion (T-shaped tube) 76 and the horizontal tube portion of the first intermediate joint portion (elbow tube) 78, respectively. One reinforcing assembly 124 is produced. Further, both ends of the second connecting rod 84 are respectively inserted into the other horizontal tube portion of the center joint portion 76 and the horizontal tube portion of the second intermediate joint portion (elbow pipe) 80, so that the second reinforcing assembly is provided. 126 is produced. In order to increase the strength of the first and second reinforcing assemblies 124 and 126, it is also preferable to use an adhesive at each connection point. The first and second reinforcing assemblies 124 and 126 are integrally combined in this manner, and the assembly of the deflection correction mechanism 74 is completed.

次に、図５Ｃに示すように、自重が作用しない作業テーブル上で、たわみ補正機構７４の中心ジョイント部７６ならびに第１および第２の中間ジョイント部７８，８０をノズルヘッダ管６８の固定ピン１１８，１２０，１２２にそれぞれ対向させる。ここで、たわみ補正機構７４において、中心ジョイント部７６の中心縦軸と第１の中間ジョイント部７８の中心縦軸との間の距離つまり第１の補強組立体１２４の有効長をＬH1とし、中心ジョイント部７６の中心縦軸と第２の中間ジョイント部８０の中心縦軸との間の距離つまり第２の補強組立体１２６の有効長をＬH2とすると、ＬM1＜ＬH1、ＬM2＜ＬH2の関係が好ましい。一例として、ＬM1，ＬM2＝７００ｍｍの場合は、ＬH1、ＬH2＝７１０ｍｍに選ばれるのが好ましい。 Next, as shown in FIG. 5C, the center joint portion 76 of the deflection correction mechanism 74 and the first and second intermediate joint portions 78 and 80 are connected to the fixing pin 118 of the nozzle header pipe 68 on the work table where no self-weight acts. , 120 and 122 are opposed to each other. Here, in the deflection correction mechanism 74, the distance between the central longitudinal axis of the central joint portion 76 and the central longitudinal axis of the first intermediate joint portion 78, that is, the effective length of the first reinforcing assembly 124 is L H1 . Assuming that the distance between the central longitudinal axis of the central joint portion 76 and the central longitudinal axis of the second intermediate joint portion 80, that is, the effective length of the second reinforcing assembly 126 is L H2 , L M1 <L H1 , L M2 The relationship <L H2 is preferred. As an example, when L M1 and L M2 = 700 mm, L H1 and L H2 = 710 mm are preferably selected.

そして、中心ジョイント部（Ｔ字管）７６の縦筒部を固定ピン１１８に嵌合させるとともに、第１および第２の中間ジョイント部（エルボ管）７８，８０の縦筒部を固定ピン１２０，１２２にそれぞれ嵌合させる。そうすると、図５Ｄに示すように、自重が作用しない作業テーブル上の組立状態では、上記のようなＬM1＜ＬH1、ＬM2＜ＬH2の関係により、たわみ補正機構７４（第１および第２の補強組立体１２４，１２６）が外側に位置し、ノズルヘッダ管６８が内側に位置する関係で、両者（７４，６８）が略同心円状に撓む。この場合、たわみ補正機構７４の中心ジョイント部７６とノズルヘッダ管６８の中心部の間に生じる応力ＦMが、互いに湾曲変形を生じさせるモーメントとして作用する。こうして、ノズルヘッダ管６８の補強面６８ａにたわみ補正機構７４が一体的に取り付けられる。 The vertical cylindrical portion of the center joint portion (T-shaped tube) 76 is fitted to the fixing pin 118, and the vertical cylindrical portions of the first and second intermediate joint portions (elbow pipes) 78, 80 are fixed to the fixing pin 120, Each is fitted to 122. Then, as shown in FIG. 5D, in the assembled state on the work table where the self-weight does not act, the deflection correction mechanism 74 (first and second) due to the relationship of L M1 <L H1 and L M2 <L H2 as described above. The reinforcing assemblies 124 and 126) are located on the outer side, and the nozzle header pipe 68 is located on the inner side, so that both (74 and 68) bend substantially concentrically. In this case, the stress F M that occurs between the center portion of the center joint portion 76 and the nozzle header pipe 68 of the deflection correction mechanism 74 acts as a moment causing bending deformation together. In this way, the deflection correcting mechanism 74 is integrally attached to the reinforcing surface 68a of the nozzle header pipe 68.

次に、上記のようにしてたわみ補正機構７４を取り付けたスプレーノズル６４を平流し搬送路の上に架かるようにして両側のノズル支持部６６，６６に取り付ける。そうすると、図５Ｅに示すように、スプレーノズル６４を空中に設置した状態では、スプレーノズル６４全体に重力が作用することにより、各部に作用する力のバランスでノズルヘッダ管６８がまっすぐな姿勢になり、たわみ補正機構７４の第１および第２の連結棒８２，８４もまっすぐになる。ここで、第１および第２の連結棒８２，８４がノズルヘッダ管６８と平行に一直線上に並んで延びるのが好ましい。   Next, the spray nozzle 64 to which the deflection correcting mechanism 74 is attached as described above is attached to the nozzle support portions 66 and 66 on both sides so as to flow flat and hang over the conveyance path. Then, as shown in FIG. 5E, in the state where the spray nozzle 64 is installed in the air, the gravity acts on the entire spray nozzle 64, so that the nozzle header pipe 68 is in a straight posture with a balance of forces acting on each part. The first and second connecting rods 82 and 84 of the deflection correcting mechanism 74 are also straightened. Here, it is preferable that the first and second connecting rods 82 and 84 extend in a straight line parallel to the nozzle header pipe 68.

この場合、空中に架けられたスプレーノズル６４においては、ノズルヘッダ管６８の中心点ＰC（重心）にかかる重力Ｆcが上記モーメント力ＦMに打ち勝つ。さらに、この重心重力Ｆcが、中心ジョイント部７６、第１および第２の連結棒８２，８４ならびに第１および第２の中間ジョイント部７８，８０を介してノズルヘッダ管６８の第１および第２の中間点ＰM1，ＰM2に伝わり、第１および第２の中間点ＰM1，ＰM2にも下向きの力ＦM1，ＦM2が作用する。このため、ノズルヘッダ管６８の中心点ＰCが重心重力Ｆcによって下に変位しようとしても、第１および第２の中間点ＰM1，ＰM2が中心点ＰCからたわみ補正機構７４を介して伝達される重力（中間重力）ＦM1，ＦM2によって同じく下に変位しようとするので、ノズルヘッダ管６８全体の湾曲変形つまり撓みが阻止される。 In this case, in the spray nozzle 64 which is hung in the air, gravity F c according to the center point of the nozzle header tubes 68 P C (center of gravity) overcomes the aforementioned moment force F M. Further, the center of gravity of gravity F c is the center joint portion 76, first and second of the first and second connecting rods 82, 84 and the first and second nozzle header pipe 68 via the intermediate joint portion 78, 80 transmitted to the midpoint of the 2 P M1, P M2, downward force to the first and second intermediate point P M1, P M2 F M1, F M2 acts. For this reason, even if the center point P C of the nozzle header pipe 68 tries to be displaced downward by the gravity gravity F c , the first and second intermediate points P M1 and P M2 are deflected from the center point P C via the deflection correction mechanism 74. Since the gravity (intermediate gravity) F M1 and F M2 that are transmitted in the same manner are going to be displaced downward, the entire nozzle header pipe 68 is prevented from being bent or bent.

さらに、この実施形態では、上記のようにＬM1＜ＬH1、ＬM2＜ＬH2の関係の下で中心ジョイント部７６の縦筒部を固定ピン１１８に嵌合させるとともに、第１および第２の中間ジョイント部７８，８０の縦筒部を固定ピン１２０，１２２にそれぞれ嵌合させているので、中心ジョイント部７６と第１および第２の中間ジョイント部７８，８０との間で第１および第２の連結棒８２，８４が縮む方向に応力を受けてごく僅かであるが変形している。したがって、第１および第２の連結棒８２，８４は、この変形状態から原状態に復帰しようとして中心ジョイント部７６と第１および第２の中間ジョイント部７８，８０に横方向外向きの力（反作用）ＦN1，ＦN2を及ぼし、ひいてはノズルヘッダ管６８の第１および第２の中間点ＰM1，ＰM2に横方向（ノズル長手方向）外向きの応力ＦT1，ＦT2を与える。これらノズル長手方向の応力ＦT1，ＦT2も、ノズルヘッダ管６８の湾曲変形つまり撓みを阻止する方向に働く。 Further, in this embodiment, the vertical cylindrical portion of the center joint portion 76 is fitted to the fixing pin 118 under the relationship of L M1 <L H1 and L M2 <L H2 as described above, and the first and second Since the vertical cylindrical portions of the intermediate joint portions 78 and 80 are fitted to the fixing pins 120 and 122, respectively, the first and second intermediate joint portions 78 and 80 are connected to each other by the first and second intermediate joint portions 78 and 80. The second connecting rods 82 and 84 are slightly deformed by receiving stress in the shrinking direction. Therefore, the first and second connecting rods 82 and 84 are caused to have a laterally outward force on the center joint portion 76 and the first and second intermediate joint portions 78 and 80 in an attempt to return to the original state from the deformed state ( Reaction) F N1 and F N2 are exerted, and as a result, lateral (nozzle longitudinal direction) outward stresses F T1 and F T2 are applied to the first and second intermediate points P M1 and P M2 of the nozzle header pipe 68. These nozzles longitudinal stress F T1, F T2 also acts in a direction to prevent the bending deformation that is, the deflection of the nozzle header tubes 68.

このように、この実施形態の処理液吐出ノズル６４は、ノズルヘッダ管６８に上記構成のたわみ補正機構７４を一体的に取り付けることにより、ノズル支持部６６によってノズルヘッダ管６８の両端部だけを支持されればそれで十分であり、ノズルヘッダ管６８の中心部が重力で沈むように撓むことはなく、常に水平一直線の姿勢を保つことができる。   As described above, the treatment liquid discharge nozzle 64 of this embodiment supports only the both end portions of the nozzle header pipe 68 by the nozzle support section 66 by integrally attaching the deflection correction mechanism 74 having the above configuration to the nozzle header pipe 68. If so, it is sufficient, and the center portion of the nozzle header pipe 68 is not bent so as to sink due to gravity, and the horizontal straight line posture can always be maintained.

こうして、処理液吐出ノズル６４においては、図３に示すように、ノズルヘッダ管６８に取り付けられている多数のノズルチップ７０が同じ高さ位置で一直線上に並び、ノズル長手方向で各ノズルチップ７０とコロ搬送路１４上の基板Ｇとの距離間隔が均一になる。これにより、基板Ｇ上の各部に均一な液処理（薬液ウエット処理、リンス処理等）が施される。

［他の実施形態または変形例］ In this way, in the treatment liquid discharge nozzle 64, as shown in FIG. 3, a large number of nozzle chips 70 attached to the nozzle header pipe 68 are aligned in a straight line at the same height position, and each nozzle chip 70 in the nozzle longitudinal direction. And the distance between the substrate G on the roller transport path 14 is uniform. Thereby, uniform liquid processing (chemical liquid wet processing, rinsing processing, etc.) is performed on each part on the substrate G.

[Other Embodiments or Modifications]

上記実施形態のスプレーノズル６４においては、たわみ補正機構７４よりノズルヘッダ管６８に与えられるノズル長手方向の応力ＦT1，ＦT2を調整するためのねじ機構を備えることができる。 In the spray nozzle 64 of the above embodiments may comprise a screw mechanism for adjusting the deflection correction mechanism nozzle longitudinal given nozzle header tubes 68 than 74 direction of stress F T1, F T2.

図６に示す構成例は、ノズルヘッダ管６８の第１の中間点ＰM1に与えるノズル長手方向の応力ＦT1を調整するために、第１のエルボ継手７８に第１の連結棒８２を螺合させている。より詳細には、エルボ継手７８の横筒部を貫通させて、その横筒部に雌ねじ部１３０を形成するとともに、エルボ継手７８の横筒部を貫通する連結棒８２の胴部にエルボ継手７８の雌ねじ部１３０と螺合可能な雄ねじ部１３２を形成する。Ｔ字継手７６には、連結棒８２の先端部を受け入れる横筒部にざぐり穴（盲孔）１３４が形成している。このざぐり穴１３４の終端面に連結棒８２の先端が当たるようにする。エルボ継手７８の外側に出ている連結棒８２の頭部１３８を回し、その回転の向きと回転量に応じて、連結棒８２を軸方向で双方向に動かすことができる。 Configuration example shown in FIG. 6, in order to adjust the first nozzle longitudinal stress F T1 to be supplied to the intermediate point P M1 of the nozzle header tubes 68, threadedly first connecting rod 82 to the first elbow fitting 78 It is combined. More specifically, the horizontal cylinder portion of the elbow joint 78 is penetrated to form a female thread portion 130 in the horizontal cylinder portion, and the elbow joint 78 is formed in the body portion of the connecting rod 82 that penetrates the horizontal cylinder portion of the elbow joint 78. The external thread part 132 that can be screwed with the internal thread part 130 is formed. In the T-shaped joint 76, a counterbore (blind hole) 134 is formed in a horizontal cylindrical portion that receives the tip of the connecting rod 82. The tip of the connecting rod 82 is brought into contact with the end face of the counterbore 134. The head 138 of the connecting rod 82 protruding outside the elbow joint 78 is turned, and the connecting rod 82 can be moved in both directions in the axial direction according to the direction and amount of rotation.

この場合、第１の連結棒８２を前進させる向きにその頭部１３８を回すと、第１の補強組立体１２４の有効長ＬH1が長くなって、ノズルヘッダ管６８の中心点ＰCおよび第１の中間点ＰM1にそれぞれ与えられる長手方向の応力ＦTC，ＦT1が増大する。反対に、第１の連結棒８２を後退させる向きにその頭部１３８を回すと、第１の補強組立体１２４の有効長ＬH1が短くなって、ノズルヘッダ管６８の中心点ＰCおよび第１の中間点ＰM1にそれぞれ与えられる長手方向の応力ＦTC，ＦT1が減少する。 In this case, when the head 138 is turned in the direction in which the first connecting rod 82 is advanced, the effective length L H1 of the first reinforcing assembly 124 is increased, and the center point P C of the nozzle header pipe 68 and the first point Longitudinal stresses F TC and F T1 respectively applied to one intermediate point P M1 increase. On the contrary, when the head 138 is turned in the direction in which the first connecting rod 82 is retracted, the effective length L H1 of the first reinforcing assembly 124 is shortened, and the center point P C of the nozzle header pipe 68 and the first The longitudinal stresses F TC and F T1 applied to the intermediate point P M1 of 1 respectively decrease.

図示省略するが、ノズルヘッダ管６８の第２の中間点ＰM2に与えるノズル長手方向の応力ＦT2を調整するために、第２の連結棒８４回りにも上記と同様のねじ機構を設けることができる。また、図示省略するが、連結棒８２（８４）の胴部を、長手方向で頭部１３８側の雌ねじ部１３２と、ねじ山の無い部分１３３とに２分割することも可能である。 Although not illustrated, in order to adjust the second nozzle longitudinal stress F T2 given to the intermediate point P M2 of the nozzle header tubes 68, also be provided the same screw mechanism and the the second connecting rod 84 around Can do. Although not shown, it is also possible to divide the body portion of the connecting rod 82 (84) into a female screw portion 132 on the head 138 side in the longitudinal direction and a portion 133 without a thread.

図７に示す構成例は、第１の連結棒８２をダブル雄ねじの中間連結棒１４０を挟んで第１および第２の片側連結棒１４２，１４４に２分割し、中間連結棒１４０に対して第１および第２の片側連結部を逆向きで螺合させている。より詳細には、第１および第２の片側連結棒１４２，１４４の相対向する先端部に雌ねじ部１４６，１４８をそれぞれ形成し、中間連結棒１４０の一方の雄ねじ部１４０ａを第１の片側連結棒１４２の雌ねじ部１４６に螺合させ、中間連結棒１４０の他方の雄ねじ部１４０ｂを第２の片側連結棒１４４の雌ねじ部１４８に螺合させている。ここで、中間連結棒１４０の一方の雄ねじ部１４０ａと他方の雄ねじ部１４０ｂはねじ山の螺旋方向が逆向きになっている。これにより、中間連結棒１４０の中心部に設けられたつまみ部１４９を回すと、その回転方向および回転量に応じて、第１および第２の片側連結棒１４２，１４４を同時に互いに接近する方向もしくは互いに遠ざかる方向に動かすことができる。エルボ継手７８およびＴ字継手７６には、片側連結棒１４２，１４４の他方の端部を受け入れる横筒部にざぐり穴（盲孔）１５０，１５２がそれぞれ形成されている。これらのざぐり穴（盲孔）１５０，１５２の終端面に片側連結棒１４２，１４４の先端がそれぞれ当たるようにする。   In the configuration example shown in FIG. 7, the first connecting rod 82 is divided into two first and second one-side connecting rods 142 and 144 with the double male screw intermediate connecting rod 140 interposed therebetween. The first and second one-side connecting portions are screwed in opposite directions. More specifically, female thread portions 146 and 148 are respectively formed at opposite ends of the first and second one-side connecting rods 142 and 144, and one male screw portion 140a of the intermediate connecting rod 140 is connected to the first one-side connecting rod. The other threaded portion 140b of the intermediate connecting rod 140 is threadedly engaged with the internally threaded portion 148 of the second one-side connecting rod 144. Here, the spiral direction of the screw thread is opposite in one male screw portion 140a and the other male screw portion 140b of the intermediate connecting rod 140. Accordingly, when the knob portion 149 provided at the center of the intermediate connecting rod 140 is turned, the first and second one-side connecting rods 142 and 144 are simultaneously approached to each other according to the rotation direction and the rotation amount, or It can be moved away from each other. In the elbow joint 78 and the T-shaped joint 76, counterbore holes (blind holes) 150 and 152 are formed in the horizontal cylinder portion that receives the other ends of the one side connecting rods 142 and 144, respectively. The tip ends of the one-side connecting rods 142 and 144 are made to contact the terminal surfaces of these counterbored holes (blind holes) 150 and 152, respectively.

この場合、第１および第２の片側連結棒１４２，１４４を互いに遠ざける向きに中間連結棒１４０のつまみ部１４９を回すと、第１の補強組立体１２４の有効長ＬH1が長くなって、ノズルヘッダ管６８の中心点ＰCおよび第１の中間点ＰM1にそれぞれ与えられる長手方向の応力ＦTC，ＦT1が増大する。反対に、第１および第２の片側連結棒１４２，１４４を互いに近づける向きに中間連結棒１４０のつまみ部１４９を回すと、第１の補強組立体１２４の有効長ＬH1が短くなって、ノズルヘッダ管６８の中心点ＰCおよび第１の中間点ＰM1にそれぞれ与えられる長手方向の応力ＦTC，ＦT1が減少する。図７の構成例は、第２の連結棒８４回りにも同様に適用可能である。 In this case, when the knob portion 149 of the intermediate connecting rod 140 is turned in the direction in which the first and second one-side connecting rods 142 and 144 are moved away from each other, the effective length L H1 of the first reinforcing assembly 124 becomes longer, and the nozzle Longitudinal stresses F TC and F T1 applied to the center point P C and the first intermediate point P M1 of the header pipe 68 are increased. On the contrary, when the knob portion 149 of the intermediate connecting rod 140 is turned in the direction in which the first and second one-side connecting rods 142 and 144 are brought close to each other, the effective length L H1 of the first reinforcing assembly 124 is shortened, and the nozzle The longitudinal stresses F TC and F T1 applied to the center point P C and the first intermediate point P M1 of the header pipe 68 are reduced. The configuration example of FIG. 7 can be similarly applied around the second connecting rod 84.

上記実施形態の処理液吐出ノズル６４においては、別の変形例として、図８Ａに示すように、たわみ補正機構７４のＴ字継手（Ｔ字管）７６、第１および第２のエルボ継手（エルボ管）７８，８０に流路コネクタ１６０，１６２，１６４を介して処理液供給管７２（またはその分岐管）に接続する構成も可能である。この場合、処理液供給源からの処理液は、処理液供給管７２、流路コネクタ１６０，１６２，１６４、Ｔ字継手（Ｔ字管）７６、第１および第２のエルボ継手（エルボ管）７８，８０を通ってノズルヘッダ管６８内に導入される。   In the treatment liquid discharge nozzle 64 of the above-described embodiment, as another modification, as shown in FIG. 8A, a T-shaped joint (T-shaped pipe) 76, a first and second elbow joint (elbow) of a deflection correction mechanism 74 are provided. It is also possible to connect the processing liquid supply pipe 72 (or its branch pipe) to the pipes 78, 80 via the flow path connectors 160, 162, 164. In this case, the processing liquid from the processing liquid supply source is processed liquid supply pipe 72, flow path connectors 160, 162, and 164, T-shaped joint (T-shaped pipe) 76, and first and second elbow joints (elbow pipe). 78 and 80 are introduced into the nozzle header tube 68.

あるいは、図８Ｂに示すように、たわみ補正機構７４の第１および第２の連結棒８２，８４に中空管を用いて、Ｔ字継手（Ｔ字管）７６と第１および第２のエルボ継手（エルボ管）７８，８０とを連通させ、処理液供給管７２をたとえばＴ字継手（Ｔ字管）７６だけに接続する構成も可能である。   Alternatively, as shown in FIG. 8B, a hollow tube is used for the first and second connecting rods 82 and 84 of the deflection correcting mechanism 74, so that a T-shaped joint (T-shaped tube) 76 and the first and second elbows are used. It is also possible to connect the joints (elbow pipes) 78 and 80 and connect the processing liquid supply pipe 72 only to, for example, a T-shaped joint (T-shaped pipe) 76.

上記実施形態の処理液吐出ノズル６４におけるたわみ補正機構７４は、多数の部品（７６〜８４）からなる組立体として構成された。しかし、上記実施形態の中心ジョイント部７６、第１および第２の中間ジョイント部７８，８０および第１および第２の連結棒８２，８４に相当する各部を有する一体成型品として、たわみ補正機構７４を構成することも可能である。   The deflection correction mechanism 74 in the processing liquid discharge nozzle 64 of the above embodiment is configured as an assembly made up of a large number of parts (76 to 84). However, the deflection correction mechanism 74 is an integrally molded product having parts corresponding to the center joint portion 76, the first and second intermediate joint portions 78 and 80, and the first and second connecting rods 82 and 84 of the above embodiment. It is also possible to configure.

さらに、別の実施形態のたわみ補正機構７４'として、図９Ｂに示すように、中心ジョイント部７６'を第１および第２の中間ジョイント部７８'，８０'よりも短くする構成を好適に採ることができる。なお、図９Ｂは、たわみ補正機構７４'を取り付ける前のスプレーノズル６４つまりノズルヘッダ管６８を自重が作用しない水平な作業テーブル（図示せず）の上に載せてまっすぐに延ばしている状態を示している。この場合も、図９Ａに示すように、たわみ補正機構７４'を取り付ける前のスプレーノズル６４つまりノズルヘッダ管６８をその両端部を支持して空中に置くと、自重によって中心部が沈むように下に撓む。   Furthermore, as shown in FIG. 9B, a configuration in which the center joint portion 76 ′ is shorter than the first and second intermediate joint portions 78 ′ and 80 ′ is suitably employed as the deflection correction mechanism 74 ′ of another embodiment. be able to. FIG. 9B shows a state in which the spray nozzle 64, that is, the nozzle header pipe 68 before mounting the deflection correcting mechanism 74 ′ is placed on a horizontal work table (not shown) where its own weight does not act and is extended straight. ing. Also in this case, as shown in FIG. 9A, when the spray nozzle 64 before mounting the deflection correction mechanism 74 ′, that is, the nozzle header pipe 68 is placed in the air while supporting both ends thereof, the center portion is lowered so that the center portion sinks due to its own weight. Bend.

たわみ補正機構７４'においては、図９Ｂに示すように、中心ジョイント部７６'、第１および第２の中間ジョイント部７８'，８０'、第１および第２の棒状連結部８２'，８４'を一体成型品で構成するのが好ましい。ここで、たわみ補正機構７４'をノズルヘッダ管６８に取り付ける前に、中心ジョイント部７６'をノズルヘッダ管６８の中心点Ｐcに対向させたときに、第１および第２の中間ジョイント部７８'，８０'の下端が第１および第２の中間点ＰM1，ＰM2よりも中心点Ｐc寄りに位置する構成、つまり第１および第２の棒状連結部８２'，８４'の長さをそれぞれＬ1，Ｌ2とすると、Ｌ1＜ＬM1、Ｌ2＜ＬM2の関係が好ましい。 In the deflection correcting mechanism 74 ′, as shown in FIG. 9B, the center joint portion 76 ′, the first and second intermediate joint portions 78 ′ and 80 ′, and the first and second rod-like connecting portions 82 ′ and 84 ′. Is preferably formed of an integrally molded product. Here, before the deflection correction mechanism 74 ′ is attached to the nozzle header tube 68, the first and second intermediate joint portions 78 are formed when the center joint portion 76 ′ is opposed to the center point P c of the nozzle header tube 68. The lower end of ', 80' is positioned closer to the center point P c than the first and second intermediate points P M1 , P M2 , that is, the lengths of the first and second rod-like connecting portions 82 ', 84' Are preferably L 1 and L 2 , the relationship of L 1 <L M1 and L 2 <L M2 is preferable.

そして、図９Ｃに示すように、自重が作用しない作業テーブル上で、たわみ補正機構７４'の中心ジョイント部７６'、第１および第２の中間ジョイント部７８'，８０'のそれぞれの端（下端）をノズルヘッダ管６８の中心点Ｐc、第１および第２の中間点ＰM1，ＰM2に溶接で結合する。こうしてたわみ補正機構７４'をノズルヘッダ管６８に結合すると、可撓性のノズルヘッダ管６８が、第１および第２の中間点ＰM1，ＰM2の間で第１および第２の棒状連結部８２'，８４'に寄るように変形して、水平な作業テーブル上で図示のように撓む。 Then, as shown in FIG. 9C, on the work table where the dead weight does not act, the respective ends (lower ends) of the center joint portion 76 ′ and the first and second intermediate joint portions 78 ′ and 80 ′ of the deflection correcting mechanism 74 ′. ) To the center point P c of the nozzle header pipe 68 and the first and second intermediate points P M1 and P M2 by welding. When the deflection correction mechanism 74 ′ is coupled to the nozzle header pipe 68 in this way, the flexible nozzle header pipe 68 is connected to the first and second rod-like connecting portions between the first and second intermediate points P M1 and P M2. It is deformed so as to be close to 82 'and 84', and is bent as shown in the figure on a horizontal work table.

次に、上記のようにしてたわみ補正機構７４'を取り付けたスプレーノズル６４を平流し搬送路の上に架かるようにして両側のノズル支持部６６，６６に取り付ける。そうすると、図９Ｄに示すように、スプレーノズル６４を空中に設置した状態では、スプレーノズル６４全体に重力が作用することにより、各部に作用する力のバランスでノズルヘッダ管６８がまっすぐな姿勢になる。   Next, the spray nozzle 64 to which the deflection correcting mechanism 74 ′ is attached as described above is attached to the nozzle support portions 66 and 66 on both sides so as to flow over the transport path. Then, as shown in FIG. 9D, in the state where the spray nozzle 64 is installed in the air, the gravity acts on the entire spray nozzle 64, so that the nozzle header pipe 68 is in a straight posture with a balance of forces acting on each part. .

たわみ補正機構７４'においては、第１の中間ジョイント部７８'と第１の棒状連結部８２'との接続点Ａ1および第２の中間ジョイント部８０'と第２の棒状連結部８４'との接続点Ａ2がさらに中心点Ｐc寄りにシフトする。つまり、たわみ補正機構７４'の方が変形する。たわみ補正機構７４'がこの変形状態から図９Ｃの原状態に復帰しようとして、ノズルヘッダ管６８の第１および第２の中間点ＰM1，ＰM2には横方向（ノズル長手方向）の内向きの応力ＦT1，ＦT2を与え、ノズルヘッダ管６８の中心点Ｐcには上向きの応力ＦUを与える。これらノズル長手方向の応力ＦT1，ＦT2および上向きの応力ＦUは、第１および第２の中間点ＰM1，ＰM2に与えられる中間重力ＦM1，ＦM2と共に、ノズルヘッダ管６８全体の湾曲変形つまり撓みを阻止する方向に働く。 In the deflection correction mechanism 74 ′, the connection point A 1 between the first intermediate joint portion 78 ′ and the first rod-like connecting portion 82 ′, the second intermediate joint portion 80 ′, and the second rod-like connecting portion 84 ′ Connection point A 2 further shifts closer to the center point P c . That is, the deflection correcting mechanism 74 ′ is deformed. When the deflection correcting mechanism 74 ′ tries to return to the original state of FIG. 9C from this deformed state, the first and second intermediate points P M1 and P M2 of the nozzle header pipe 68 are inward in the lateral direction (nozzle longitudinal direction). Stresses F T1 and F T2 , and an upward stress F U is applied to the center point P c of the nozzle header pipe 68. These longitudinal stresses F T1 and F T2 and the upward stress F U , together with the intermediate gravity F M1 and F M2 applied to the first and second intermediate points P M1 and P M2 , It works in a direction to prevent bending deformation, that is, deflection.

したがって、この実施形態においても、ノズルヘッダ管６８に上記構成のたわみ補正機構７４'を一体的に取り付けることにより、ノズル支持部６６によってノズルヘッダ管６８の両端部だけを支持されればそれで十分であり、ノズルヘッダ管６８の中心部が重力で落ち込むように撓むことはなく、常に水平一直線の姿勢を保つことができる。   Therefore, also in this embodiment, it is sufficient if only the both end portions of the nozzle header tube 68 are supported by the nozzle support portion 66 by integrally attaching the deflection correction mechanism 74 ′ having the above configuration to the nozzle header tube 68. Yes, the center portion of the nozzle header pipe 68 is not bent so as to drop due to gravity, and the horizontal straight line posture can always be maintained.

他にも種種の変形が可能である。たとえば、上記実施形態のたわみ補正機構７４（７４'）は、ノズルヘッダ管６８の中心点Ｐcの両側に一対の中間点ＰM1，ＰM2を設定し、一対の中間ジョイント部７８，８０を設けたが、二対以上の中間点および中間ジョイント部を設けることも可能である。また、本発明において中心ジョイント部７６と結合するノズルヘッダ管６８の部位は、必ずしもノズルヘッダ管６８の中心点Ｐcである必要はなく、中心点Ｐcから長手方向にずれていてもよい。一対の中間点ＰM1，ＰM2を設ける場合も、それらの中間点ＰM1，ＰM2が必ずしもノズルヘッダ管６８上で中心点Ｐcと両端との真ん中である必要はなく、そこから長手方向にずれていても構わない。したがって、第１および第２の棒状連結部（連結棒）８２，８４の長さが違っていてもよい。 Various other variations are possible. For example, in the deflection correction mechanism 74 (74 ′) of the above embodiment, a pair of intermediate points P M1 and P M2 are set on both sides of the center point P c of the nozzle header pipe 68, and the pair of intermediate joint portions 78 and 80 are provided. Although provided, two or more pairs of intermediate points and intermediate joint portions can be provided. Further, in the present invention, the portion of the nozzle header pipe 68 that is coupled to the center joint portion 76 is not necessarily the center point P c of the nozzle header pipe 68, and may be shifted in the longitudinal direction from the center point P c . Even when the pair of intermediate points P M1 and P M2 are provided, the intermediate points P M1 and P M2 do not necessarily have to be in the middle between the center point P c and both ends on the nozzle header pipe 68, and from there in the longitudinal direction It does not matter if it is shifted to. Therefore, the lengths of the first and second rod-like connecting portions (connecting rods) 82 and 84 may be different.

また、本発明の処理液吐出ノズルの吐出部においても種種の変形が可能である。たとえば、上記実施形態では、ノズルヘッダ管６８に長手方向一列に並んで分布する多数の離散型吐出口（開口）にノズルチップ７０を取り付けている。一変形例として、ノズルヘッダ管６８の離散型吐出口にノズルチップ７０を取り付けずに、各吐出口（開口）から処理液をそのまま噴出させることも可能である。また、ノズルヘッダ管６８に多数の離散型吐出口またはノズルチップ７０をたとえば千鳥状に複数列設けることも可能である。さらに、別の変形例として、ノズルヘッダ管６８に長手方向に延びるスリット状の吐出口を設け、そのスリット吐出口より処理液を帯状に噴出させることも可能である。   Various modifications can also be made in the discharge portion of the treatment liquid discharge nozzle of the present invention. For example, in the above embodiment, the nozzle tips 70 are attached to a large number of discrete discharge ports (openings) distributed in a line in the longitudinal direction of the nozzle header pipe 68. As a modification, it is possible to eject the processing liquid as it is from each discharge port (opening) without attaching the nozzle tip 70 to the discrete discharge port of the nozzle header pipe 68. It is also possible to provide a plurality of discrete discharge ports or nozzle chips 70 in the nozzle header pipe 68 in a plurality of rows, for example in a staggered manner. Furthermore, as another modified example, a slit-like discharge port extending in the longitudinal direction may be provided in the nozzle header pipe 68, and the processing liquid may be ejected from the slit discharge port in a band shape.

また、搬送系においては、コロ搬送路８４に代えて、たとえばベルトコンベア等の他の平流し搬送路を用いてもよい。本発明の平流し搬送において、基板は任意の姿勢をとることが可能であり、水平姿勢の平流し搬送であってもよいが、傾斜姿勢の平流し搬送も可能である。   Further, in the transport system, instead of the roller transport path 84, another flat flow transport path such as a belt conveyor may be used. In the flat flow transfer according to the present invention, the substrate can take an arbitrary posture and may be a horizontal flow transfer in a horizontal posture, but a flat flow transfer in an inclined posture is also possible.

上記実施形態の基板処理装置は平流し方式の洗浄処理装置に係るものであったが、本発明は長尺型の処理液吐出ノズルを備える任意の基板処理装置に適用可能であり、たとえば平流し方式の現像処理装置にも適用可能である。その場合、たとえば現像液ノズルやリンスノズル等に本発明の長尺型の処理液吐出ノズルを適用することができる。   The substrate processing apparatus of the above embodiment relates to a flat-flow type cleaning processing apparatus, but the present invention is applicable to any substrate processing apparatus having a long processing liquid discharge nozzle, for example, a flat-flow type. It can also be applied to a development processing apparatus of the type. In that case, for example, the long processing liquid discharge nozzle of the present invention can be applied to a developer nozzle, a rinse nozzle, or the like.

本発明における被処理基板はＬＣＤ基板に限らず、他のフラットパネルディスプレイ用基板、太陽電池用基板、半導体ウエハ、ＣＤ基板、ガラス基板、フォトマスク、プリント基板等も可能である。   The substrate to be treated in the present invention is not limited to an LCD substrate, but may be other flat panel display substrates, solar cell substrates, semiconductor wafers, CD substrates, glass substrates, photomasks, printed substrates, and the like.

１４ 平流し搬送路
２８Ｕ，２８Ｌ プリウエットノズル
３２Ｕ，３２Ｌ リンスノズル
３８Ｕ，３８Ｌ ２流体ノズル
４２Ｕ，４２Ｌ リンスノズル
６４ 処理液吐出ノズル
６６ ノズル支持部
６８ ノズルヘッダ管
７２ 配管（処理液供給管）
７４，７４' たわみ補正機構
７６ 中心ジョイント部
７８ 第１の中間ジョイント部
８０ 第２の中間ジョイント部
８２ 第１の棒状連結部（連結棒）
８４ 第２の棒状連結部（連結棒）
９０ クランプ 14 Flat flow conveying path 28U, 28L Pre-wet nozzle 32U, 32L Rinse nozzle 38U, 38L 2 fluid nozzle 42U, 42L Rinse nozzle 64 Treatment liquid discharge nozzle 66 Nozzle support part 68 Nozzle header pipe 72 Piping (treatment liquid supply pipe)
74, 74 'Deflection correction mechanism 76 Center joint part 78 First intermediate joint part 80 Second intermediate joint part 82 First rod-like connecting part (connecting bar)
84 Second rod-like connecting portion (connecting rod)
90 clamp

Claims (23)

処理液供給源に接続されるノズルヘッダ管と、
前記ノズルヘッダ管に長手方向に分布または開口して設けられ、前記処理液供給源より前記ノズルヘッダ管に導入された処理液を噴出する吐出部と、
前記ノズルヘッダ管の長手方向の一端と中心との間の第１の中間点で、前記ノズルヘッダ管の前記吐出部とは反対側の補強面に突出して設けられる第１の中間ジョイント部と、
前記ノズルヘッダ管の長手方向の他端と中心との間の第２の中間点で、前記ノズルヘッダ管の前記補強面に突出して設けられる第２の中間ジョイント部と、
前記ノズルヘッダ管の前記第１の中間点と前記第２の中間点との間で、前記ノズルヘッダ管の前記補強面に突出して設けられる中心ジョイント部と、
前記中心ジョイント部と前記第１の中間ジョイント部との間に架け渡される第１の棒状連結部と、
前記中心ジョイント部と前記第２の中間ジョイント部との間に架け渡される第２の棒状連結部と
を有する処理液吐出ノズル。 A nozzle header pipe connected to the processing liquid supply source;
A discharge section that is provided in the nozzle header pipe in a longitudinal distribution or opening, and ejects the processing liquid introduced into the nozzle header pipe from the processing liquid supply source;
A first intermediate joint portion provided at a first intermediate point between the longitudinal end of the nozzle header tube and the center thereof and protruding from a reinforcing surface on the opposite side of the discharge portion of the nozzle header tube;
A second intermediate joint provided to protrude from the reinforcing surface of the nozzle header pipe at a second intermediate point between the other end in the longitudinal direction of the nozzle header pipe and the center;
A center joint portion provided between the first intermediate point and the second intermediate point of the nozzle header pipe so as to protrude from the reinforcing surface of the nozzle header pipe;
A first rod-like connecting portion that is spanned between the central joint portion and the first intermediate joint portion;
A treatment liquid discharge nozzle comprising: a second rod-like connecting portion that is spanned between the center joint portion and the second intermediate joint portion. 前記中心ジョイント部が、前記ノズルヘッダ管の長手方向の中心付近に設けられる、請求項１に記載の処理液吐出ノズル。   The processing liquid discharge nozzle according to claim 1, wherein the center joint portion is provided in the vicinity of the center in the longitudinal direction of the nozzle header pipe. 前記吐出部が、前記ノズルヘッダ管に長手方向一列または複数列に並んで形成され、前記処理液供給源より前記ノズルヘッダ管に導入された処理液をそれぞれ噴出する多数の離散型吐出口を有する、請求項１または請求項２に記載の処理液吐出ノズル。   The discharge section has a large number of discrete discharge ports that are formed in the nozzle header pipe in a row or a plurality of rows in the longitudinal direction, and each ejects the processing liquid introduced into the nozzle header pipe from the processing liquid supply source. The processing liquid discharge nozzle according to claim 1 or 2. 前記離散型吐出口に、処理液をスプレー状に噴出するノズルチップが取り付けられる、請求項３に記載の処理液吐出ノズル。   The processing liquid discharge nozzle according to claim 3, wherein a nozzle chip that ejects the processing liquid in a spray form is attached to the discrete discharge port. 前記吐出部が、前記ノズルヘッダ管に長手方向に延びて形成され、前記処理液供給源より前記ノズルヘッダ管に導入された処理液を帯状に噴出するスリット状の吐出口を有する、請求項１または請求項２に記載の処理液吐出ノズル。   The said discharge part is extended in the longitudinal direction at the said nozzle header pipe | tube, and has a slit-shaped discharge port which ejects the process liquid introduce | transduced into the said nozzle header pipe | tube from the said process liquid supply source in strip shape. Or the process liquid discharge nozzle of Claim 2. 前記第１および第２の棒状連結部の長さが等しい、請求項１〜５のいずれか一項に記載の処理液吐出ノズル。   The treatment liquid discharge nozzle according to any one of claims 1 to 5, wherein the first and second rod-like connecting portions have equal lengths. 前記第１および第２の棒状連結部が、前記ノズルヘッダ管と平行である、請求項１〜６のいずれか一項に記載の処理液吐出ノズル。   The processing liquid discharge nozzle according to claim 1, wherein the first and second rod-shaped connecting portions are parallel to the nozzle header pipe. 前記中心ジョイント部、前記第１および第２の中間ジョイント部ならびに前記第１および第２の棒状連結部が一体成型されている、請求項１〜７のいずれか一項に記載の処理液吐出ノズル。   The processing liquid discharge nozzle according to claim 1, wherein the center joint part, the first and second intermediate joint parts, and the first and second rod-like connecting parts are integrally molded. . 前記中心ジョイント部が、前記第１および第２の棒状連結部の一方の端部と結合するＴ字継手を有し、
前記第１および第２の中間ジョイント部が、前記第１および第２の棒状連結部の他方の端部と結合する第１および第２のエルボ継手をそれぞれ有する、
請求項１〜７のいずれか一項に記載の処理液吐出ノズル。 The center joint portion has a T-shaped joint that is coupled to one end of the first and second rod-like connecting portions,
The first and second intermediate joint portions have first and second elbow joints respectively coupled to the other ends of the first and second rod-like connecting portions;
The processing liquid discharge nozzle as described in any one of Claims 1-7. 前記中心ジョイント部が、前記Ｔ字継手の縦筒部に嵌合可能で、前記ノズルヘッダ管に固着される中心支持ピンを有し、
前記第１および第２の中間ジョイント部が、前記第１および第２のエルボ継手の縦筒部とそれぞれ嵌合可能で、前記ノズルヘッダ管に固着される第１および第２の中間支持ピンを有する、
請求項９に記載の処理液吐出ノズル。 The center joint part can be fitted to the vertical tube part of the T-shaped joint, and has a center support pin fixed to the nozzle header pipe,
The first and second intermediate support pins can be fitted to the vertical cylindrical portions of the first and second elbow joints, respectively, and are fixed to the nozzle header pipe. Have
The treatment liquid discharge nozzle according to claim 9. 前記中心支持ピンと嵌合する前の前記Ｔ字継手と前記第１の棒状連結部と前記第１のエルボ継手とが一体化された第１の補強組立体の有効長が、前記第１の中間ジョイント部と前記中心ジョイント部との間の距離よりも長く、
前記中心支持ピンと嵌合する前の前記Ｔ字継手と前記第２の棒状連結部と前記第２のエルボ継手とが一体化された第２の補強組立体の有効長が、前記第２の中間ジョイント部と前記中心ジョイント部との間の距離よりも長い、
請求項１０に記載の処理液吐出ノズル。 The effective length of the first reinforcing assembly in which the T-shaped joint, the first rod-shaped connecting portion, and the first elbow joint before being fitted to the center support pin are integrated is the first intermediate Longer than the distance between the joint and the central joint,
The effective length of the second reinforcing assembly in which the T-shaped joint, the second rod-shaped connecting portion, and the second elbow joint before being fitted to the center support pin are integrated is the second intermediate Longer than the distance between the joint part and the central joint part,
The treatment liquid discharge nozzle according to claim 10. 前記第１の補強組立体または前記第２の補強組立体より前記ノズルヘッダ管に与えられる長手方向の応力を調整するためのねじ機構を有する、請求項１１に記載の処理液吐出ノズル。   The processing liquid discharge nozzle according to claim 11, further comprising a screw mechanism for adjusting a longitudinal stress applied to the nozzle header pipe from the first reinforcement assembly or the second reinforcement assembly. 前記ねじ機構が、前記第１のエルボ継手または前記第２のエルボ継手に前記第１の棒状連結部または前記第２の棒状連結部を螺合させている、請求項１２に記載の処理液吐出ノズル。   The process liquid discharge according to claim 12, wherein the screw mechanism is configured to screw the first rod-like connecting portion or the second rod-like connecting portion into the first elbow joint or the second elbow joint. nozzle. 前記ねじ機構が、前記第１の棒状連結部または前記第２の棒状連結部を棒状の中間連結部を挟んで第１および第２の片側連結部に２分割し、前記中間連結部に対して前記第１および第２の片側連結部を逆向きで螺合させている、請求項１２記載の処理液吐出ノズル。   The screw mechanism divides the first rod-like connecting portion or the second rod-like connecting portion into two first and second one-side connecting portions sandwiching the rod-like intermediate connecting portion, and with respect to the intermediate connecting portion. The processing liquid discharge nozzle according to claim 12, wherein the first and second one-side connecting portions are screwed in opposite directions. 前記第１および第２の棒状連結部が、前記中心ジョイント部ならびに前記第１および第２の中間ジョイント部に接着剤で接合される、請求項８〜１４のいずれか一項に記載の処理液吐出ノズル。   The processing liquid according to any one of claims 8 to 14, wherein the first and second rod-like connecting portions are bonded to the central joint portion and the first and second intermediate joint portions with an adhesive. Discharge nozzle. 前記中心ジョイント部が、前記第１および第２の中間ジョイント部よりも短い、請求項１〜６のいずれか一項に記載の処理液吐出ノズル。   The processing liquid discharge nozzle according to claim 1, wherein the central joint portion is shorter than the first and second intermediate joint portions. 前記中心ジョイント部、前記第１および第２の中間ジョイント部ならびに前記第１および第２の棒状連結部が一体成型されている、請求項１６に記載の処理液吐出ノズル。   The processing liquid discharge nozzle according to claim 16, wherein the central joint portion, the first and second intermediate joint portions, and the first and second rod-like connecting portions are integrally formed. 前記中心ジョイント部ならびに前記第１および第２の中間ジョイント部が前記ノズルヘッダ管に溶接で結合される、請求項１６または請求項１７に記載の処理液吐出ノズル。   The processing liquid discharge nozzle according to claim 16 or 17, wherein the central joint part and the first and second intermediate joint parts are joined to the nozzle header pipe by welding. 前記第１の棒状連結部が、前記第１の中間ジョイント部と前記中心ジョイント部との間の距離よりも短く、
前記第２の棒状連結部が、前記第２の中間ジョイント部と前記中心ジョイント部との間の距離よりも短い、
請求項１〜８，１６〜１８のいずれかき一項に記載の処理液吐出ノズル。 The first rod-like connecting portion is shorter than the distance between the first intermediate joint portion and the central joint portion;
The second rod-like connecting portion is shorter than the distance between the second intermediate joint portion and the central joint portion;
The processing liquid discharge nozzle according to any one of claims 1 to 8 and 16 to 18. 前記処理液供給源からの処理液が前記中心ジョイント部ならびに前記第１および第２の中間ジョイント部を介して前記ノズルヘッダ管に導入される、請求項１〜１９のいずれか一項に記載の処理液吐出ノズル。   The processing liquid from the processing liquid supply source is introduced into the nozzle header pipe through the central joint portion and the first and second intermediate joint portions. Treatment liquid discharge nozzle. 前記ノズルヘッダ管がポリ塩化ビニルからなる、請求項１〜２０のいずれか一項に記載の処理液吐出ノズル。   21. The processing liquid discharge nozzle according to claim 1, wherein the nozzle header pipe is made of polyvinyl chloride. 前記中心ジョイント部、前記第１および第２の中間ジョイント部ならびに前記第１および第２の棒状連結部がいずれもポリ塩化ビニルからなる、請求項２１に記載の処理液吐出ノズル。   The treatment liquid discharge nozzle according to claim 21, wherein each of the center joint portion, the first and second intermediate joint portions, and the first and second rod-like connecting portions is made of polyvinyl chloride. 被処理基板を水平な方向に平流しで搬送するための平流し搬送路を有する搬送部と、
前記平流し搬送路上の前記基板に前記処理液を噴き掛けるために、前記平流し搬送路の上方または下方で搬送方向と交差する方向に架け渡される、請求項１〜２２のいずれか一項に記載の処理液吐出ノズルと、
前記処理液吐出ノズルに前記処理液を供給する処理液供給源と、
前記搬送路の両側で前記処理液吐出ノズルの両端を支持するノズル支持部と
を有する基板処理装置。 A transport unit having a flat flow path for transporting the substrate to be processed in a horizontal flow in a horizontal direction;
23. The method according to any one of claims 1 to 22, wherein the processing solution is sprayed on the substrate on the flat flow conveyance path so as to cross the conveyance direction above or below the flat flow conveyance path. The described treatment liquid discharge nozzle;
A treatment liquid supply source for supplying the treatment liquid to the treatment liquid discharge nozzle;
The substrate processing apparatus which has a nozzle support part which supports the both ends of the said process liquid discharge nozzle in the both sides of the said conveyance path.
JP2011205868A 2011-09-21 2011-09-21 Discharge nozzle for process liquid and substrate processing device Ceased JP2013066829A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011205868A JP2013066829A (en) 2011-09-21 2011-09-21 Discharge nozzle for process liquid and substrate processing device
KR1020120104625A KR20130031802A (en) 2011-09-21 2012-09-20 Processing solution discharge nozzle and substrate processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011205868A JP2013066829A (en) 2011-09-21 2011-09-21 Discharge nozzle for process liquid and substrate processing device

Publications (1)

Publication Number Publication Date
JP2013066829A true JP2013066829A (en) 2013-04-18

Family

ID=48180859

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011205868A Ceased JP2013066829A (en) 2011-09-21 2011-09-21 Discharge nozzle for process liquid and substrate processing device

Country Status (2)

Country Link
JP (1) JP2013066829A (en)
KR (1) KR20130031802A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10661411B2 (en) 2014-11-20 2020-05-26 Ebara Corporation Apparatus for cleaning a polishing surface, polishing apparatus, and method of manufacturing an apparatus for cleaning a polishing surface
JP2020099900A (en) * 2018-12-21 2020-07-02 寧波富佳実業股▲分▼有限公司Ｎｉｎｇｂｏ Ｆｕｊｉａ Ｉｎｄｕｓｔｒｉａｌ Ｃｏ．， Ｌｔｄ． Automatic floor cleaning device
WO2022044296A1 (en) * 2020-08-28 2022-03-03 三菱重工業株式会社 Spray tube support structure of flue gas desulfurisation device

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6578243B2 (en) * 2015-07-17 2019-09-18 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ Gas supply nozzle, substrate processing apparatus, semiconductor device manufacturing method and program
CN111250454A (en) * 2018-12-03 2020-06-09 河南森源重工有限公司 Nozzle reciprocating mechanism and cleaning equipment using same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10661411B2 (en) 2014-11-20 2020-05-26 Ebara Corporation Apparatus for cleaning a polishing surface, polishing apparatus, and method of manufacturing an apparatus for cleaning a polishing surface
JP2020099900A (en) * 2018-12-21 2020-07-02 寧波富佳実業股▲分▼有限公司Ｎｉｎｇｂｏ Ｆｕｊｉａ Ｉｎｄｕｓｔｒｉａｌ Ｃｏ．， Ｌｔｄ． Automatic floor cleaning device
WO2022044296A1 (en) * 2020-08-28 2022-03-03 三菱重工業株式会社 Spray tube support structure of flue gas desulfurisation device

Also Published As

Publication number Publication date
KR20130031802A (en) 2013-03-29

Similar Documents

Publication Publication Date Title
JP2013066829A (en) Discharge nozzle for process liquid and substrate processing device
JP5630808B2 (en) Water-saving cleaning system for transfer type substrate processing equipment
TWI326620B (en) Apparatus and method for photoresist removal processing
BRPI0810796B1 (en) steel sheet cleaning method and continuous steel sheet cleaning system.
JP4859242B2 (en) Substrate processing equipment
JP4421956B2 (en) Substrate processing apparatus and processing method
TW201040476A (en) Processing device of substrate
JP2013026490A (en) Substrate processor
KR100742678B1 (en) Apparatus for treating substrates
JP2007165554A (en) Substrate processor and substrate processing method
KR101204725B1 (en) Apparatus for treating substrates
CN108940684B (en) Electromechanical electrostatic powder spraying equipment
CN113996573A (en) Wafer cleaning mechanism
JP5908078B2 (en) Chemical treatment equipment
JP5890018B2 (en) Chemical treatment equipment
JP2004275989A (en) Substrate processing apparatus
JP2007038089A5 (en)
KR101904027B1 (en) Apparatus for processing a substrate
JP3857265B2 (en) Slit shower unit
JP3766968B2 (en) Substrate processing method and substrate processing apparatus
JP2014069126A (en) Substrate treatment apparatus
US9859135B2 (en) Substrate rinsing systems and methods
CN219660032U (en) Automatic cleaning machine for printed circuit board
KR102223760B1 (en) Unit for suppying fluid and substrate processing apparatus using the same
CN219273818U (en) Surface cleaning device for steel structure manufacturing

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20130808

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20131212

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140121

A045 Written measure of dismissal of application [lapsed due to lack of payment]

Free format text: JAPANESE INTERMEDIATE CODE: A045

Effective date: 20140617