JP2013041136A - Method for forming ink film on substrate with partition wall - Google Patents

Method for forming ink film on substrate with partition wall Download PDF

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JP2013041136A
JP2013041136A JP2011178289A JP2011178289A JP2013041136A JP 2013041136 A JP2013041136 A JP 2013041136A JP 2011178289 A JP2011178289 A JP 2011178289A JP 2011178289 A JP2011178289 A JP 2011178289A JP 2013041136 A JP2013041136 A JP 2013041136A
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ink
partition
partition wall
substrate
opening
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Shigenobu Yoneyama
茂信 米山
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Toppan Inc
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Toppan Printing Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide means for flatly solidifying ink when the ink is applied to an opening part of a substrate with a partition wall that has the partition wall on the substrate and is dried in the partition wall.SOLUTION: The method for forming an ink film 16 on a substrate 10 with a partition wall includes the steps of: at least forming a plurality of sections (opening parts) 11 partitioned by the partition wall 12, on the substrate; stepwise or continuously changing wettability of the ink 15 on a partition wall side face 13 so as to become low at a part near the partition wall top part and high towards the base part; and applying the ink 15 to the inside of the sections 11 and drying it.

Description

本発明は、基板上に隔壁を敷設して得られる区画内にインクを塗布し、平坦なインク皮膜を形成する技術に係わり、特には隔壁側面と区画内底面の表面処理技術に関するものである。   The present invention relates to a technique for forming a flat ink film by applying ink in a partition obtained by laying a partition wall on a substrate, and particularly relates to a surface treatment technique for the side surface of the partition wall and the bottom surface in the partition.

液晶ディスプレイ、有機ELディスプレイ等においては、基板上に所定の周期で隔壁パターンを形成し、隔壁で囲まれた区画(以下、開口部とも記す)を着色インクや発光性インクで埋設した基板が用いられる。開口部は画素領域とも呼ばれ、この領域における光の透過や発光を制御することによって所望の画像が表示できるようになる。   In liquid crystal displays, organic EL displays, etc., a substrate is used in which a partition pattern is formed on a substrate at a predetermined cycle, and a section surrounded by the partition (hereinafter also referred to as an opening) is embedded with colored ink or luminescent ink. It is done. The opening is also called a pixel region, and a desired image can be displayed by controlling light transmission and light emission in this region.

例えば、LCD用カラーフィルタ基板の場合、遮光性を有する黒色感光性樹脂を用い、開口部の形状が短冊型、正方型、あるいはくの字の形をしたブーメラン型になるように隔壁(ブラックマトリックス)を形成し、各々の開口部には赤(R)、緑(G)、あるいは青(B)の顔料インクの薄膜層が所定パターンに形成される。最終的にはカラーフィルタ基板を液晶を挟んでTFT基板に貼り合わせることにより液晶ディスプレイ化され、光の遮光と透過を電気的に制御して所望のカラー画像が表示される。   For example, in the case of a color filter substrate for LCD, a black photosensitive resin having a light shielding property is used, and a partition (black matrix) is formed so that the shape of the opening is a strip shape, a square shape, or a boomerang shape having a square shape. ) And a thin film layer of red (R), green (G), or blue (B) pigment ink is formed in a predetermined pattern in each opening. Finally, a color filter substrate is bonded to the TFT substrate with the liquid crystal sandwiched therebetween to form a liquid crystal display, and a desired color image is displayed by electrically controlling light shielding and transmission.

有機ELディスプレイの場合には、開口部に先ず、PEDOTやポリアニリン等の正孔輸送性インクを塗布・乾燥して正孔輸送性皮膜を形成し、その後赤、緑、青に発光する高分子蛍光インクが所定のパターンで正孔輸送性皮膜の上に塗布される。これら有機発光層が対抗する電極間に保持されているのが有機ELディスプレイである。   In the case of an organic EL display, first, a hole transporting ink such as PEDOT or polyaniline is applied to the opening and dried to form a hole transporting film, and then polymer fluorescence that emits red, green, and blue light. Ink is applied on the hole transporting film in a predetermined pattern. An organic EL display is held between the electrodes opposed to these organic light emitting layers.

隔壁で囲まれた開口部に薄膜を形成する方法としては、印刷方式および蒸着方式がある。印刷方式ではインクを塗布・乾燥させるという簡便な工程であるため、設備投資が少なくて済み、大量かつ低コストで製品を生産できる製造方法と言える。一方、蒸着方式は、真空設備を必要とするため大規模な投資が必要であり、加えて、真空装置の規模により生産面積が限定されるため、印刷方式に比べると生産性が低くコストの高い製造方法と言える。   As a method for forming a thin film in the opening surrounded by the partition wall, there are a printing method and a vapor deposition method. Since the printing method is a simple process of applying and drying ink, it can be said to be a manufacturing method that requires less equipment investment and can produce a product in a large amount and at a low cost. On the other hand, the vapor deposition method requires a large-scale investment because it requires vacuum equipment. In addition, because the production area is limited by the scale of the vacuum device, the productivity is lower and the cost is higher than the printing method. It can be said that it is a manufacturing method.

一方、開口部に膜厚が均一な薄膜を形成することに関しては、蒸着方式の方が印刷方式よりも優れている。蒸着方式の場合には、原子・分子単位で材料物質が堆積していくので蒸着膜は一般に平坦性が高い。印刷方式の場合、版上のインクが所定量だけバルク状に開口部内に移転され開口部内に押し拡がる。すると、一般にインク表面は表面張力により特定のメニスカス形状を呈するが、インクが隔壁を這い上がった状態でインクが乾燥・固化すると、開口部の隔壁に近い部分でインク皮膜の膜厚が厚くなり、開口部中央で膜厚が薄い皮膜となる。   On the other hand, regarding the formation of a thin film having a uniform film thickness in the opening, the vapor deposition method is superior to the printing method. In the case of the vapor deposition method, since the material substance is deposited in units of atoms and molecules, the vapor deposition film generally has high flatness. In the case of the printing method, a predetermined amount of ink on the plate is transferred into the opening in a bulk shape and pushed into the opening. Then, in general, the surface of the ink exhibits a specific meniscus shape due to surface tension, but when the ink dries up and solidifies in a state where the ink crawls up the partition, the film thickness of the ink film increases in the portion near the partition of the opening, A thin film is formed at the center of the opening.

インク皮膜の乾燥膜厚の不均一性は画像の輪郭を不明瞭にするため問題になる。特に、最近の隔壁付基板の開口部サイズは100μm×数10μmと微細になってきており、開口部内の僅かな乾燥膜厚分布が画質に大きく影響する。   The non-uniformity of the dry film thickness of the ink film is a problem because the outline of the image is obscured. In particular, the size of the opening of a substrate with a recent partition is becoming as fine as 100 μm × several tens of μm, and a slight dry film thickness distribution in the opening greatly affects the image quality.

隔壁付基板の開口部に塗布されたインクの膜厚を均一にする塗布方法として、開口部底面のインクに対する親液性を高め、インクを塗布した後に超音波振動を基板に与えてインクの移動と広がりを促進する技術が開示されている(特許文献1)。しかし、この方法の場合、超音波振動によって開口部内のインクが開口部の外、例えば、隔壁上面や基板外に飛散して周囲を汚染してしまうという問題がある。また、振動を利用しているため、振動
発生機から床に振動が伝わり、周囲の装置に影響を及ぼす可能性がある。特に、周囲に微細な加工・操作を行う機器・装置が配置されている場合、振動は問題になる。
As a coating method to make the film thickness of the ink applied to the opening of the substrate with a partition uniform, the lyophilicity to the ink on the bottom of the opening is increased, and after applying the ink, ultrasonic vibration is applied to the substrate to move the ink. A technique for promoting the spread is disclosed (Patent Document 1). However, in the case of this method, there is a problem in that the ink in the opening is scattered outside the opening, for example, the upper surface of the partition wall or the substrate by ultrasonic vibration, and the surroundings are contaminated. In addition, since vibration is used, vibration is transmitted from the vibration generator to the floor, which may affect surrounding devices. In particular, vibration is a problem when a device or apparatus that performs fine processing / operation is arranged around the device.

特開2003−139934号公報JP 2003-139934 A

そこで本発明は、基板上に隔壁を有する隔壁付基板の開口部にインクが塗布され隔壁内でインクが乾燥する際に、インクを平坦に固化させる手段を提供することを目的とした。   Accordingly, an object of the present invention is to provide means for flattening ink when ink is applied to an opening of a substrate with a partition wall having a partition wall on the substrate and the ink is dried in the partition wall.

上記課題を解決するための請求項1に係る発明としては、少なくとも、基板上に隔壁により仕切られた複数の区画を形成する工程と、隔壁側面のインクに対する濡れ性を隔壁頂部近傍で低く基部にかけて高くなるように段階的若しくは連続的に変化させる工程と、インクを区画内に塗布し乾燥する工程と、を有することを特徴とする隔壁付基板に対するインク皮膜の形成方法としたものである。   The invention according to claim 1 for solving the above problems includes at least a step of forming a plurality of sections partitioned by a partition wall on a substrate, and lowering the wettability to the ink on the side surface of the partition wall near the top of the partition wall toward the base. It is a method for forming an ink film on a substrate with a partition wall, comprising a step of changing stepwise or continuously so as to increase, and a step of applying and drying ink in a compartment.

請求項2に係る発明としては、少なくとも、基板上に隔壁により仕切られた複数の区画を形成する工程と、インクに対する撥液性が隔壁の頂部近傍で高く親液性が隔壁基部で高くなるように、隔壁側面のインクに対する親和性を撥液性から親液性へと段階的若しくは連続的に変化させる工程と、インクを区画内に塗布し乾燥する工程と、を有することを特徴とする隔壁付基板に対するインク皮膜の形成方法としたものである。   According to the second aspect of the present invention, at least the step of forming a plurality of partitions partitioned by the partition on the substrate, and the liquid repellency with respect to the ink is high near the top of the partition, and the lyophilicity is increased at the partition base. And a step of changing the affinity of the side wall of the partition wall to the ink stepwise or continuously from liquid repellency to lyophilic property, and a step of applying and drying the ink in the partition. This is a method for forming an ink film on an attached substrate.

請求項3に係る発明としては、前記区画内底面のインクに対する濡れ性若しくは親液性が、隔壁基部のインクに対する濡れ性若しくは親液性に比較して高いことを特徴とする請求項1又は請求項2に記載の隔壁付基板に対するインク皮膜の形成方法としたものである。   The invention according to claim 3 is characterized in that the wettability or lyophilicity of the bottom surface in the compartment with respect to the ink is higher than the wettability or lyophilicity of the partition wall base with respect to the ink. Item 2. A method for forming an ink film on a substrate with a partition according to Item 2.

請求項4に係る発明としては、前記隔壁側面のインクに対する濡れ性もしくは親和性を変更する手段がプラズマ照射もしくはフッ素系樹脂処理であることを特徴とする請求項1から請求項3のいずれか1項に記載のインク皮膜の形成方法としたものである。   The invention according to claim 4 is characterized in that the means for changing the wettability or affinity for the ink on the side wall of the partition wall is plasma irradiation or fluorine resin treatment. The method for forming an ink film according to the item.

請求項5に係る発明としては、請求項1から請求項3のいずれか1項に記載の隔壁付基板に対するインク皮膜の形成方法を使用したことを特徴とするカラーフィルタ基板としたものである。   According to a fifth aspect of the present invention, there is provided a color filter substrate characterized by using the ink film forming method for the partition wall-attached substrate according to any one of the first to third aspects.

請求項6に係る発明としては、請求項1から請求項3のいずれか1項に記載の隔壁付基板に対するインク皮膜の形成方法を使用したことを特徴とする有機ELディスプレイとしたものである。   According to a sixth aspect of the present invention, there is provided an organic EL display using the method for forming an ink film on the partition wall-attached substrate according to any one of the first to third aspects.

本発明によれば、隔壁側面と底面のインクに対する濡れ性の制御により区画内のインクの平坦化が自発的に行われる。この自発的な平坦化によりインクの乾燥膜厚が区画内で均一になるので、機械的な振動、あるいは電気的な流動のような外力を利用することがない。したがって、これらの方法と比較して開口部以外の箇所をインクで汚染したり、他に悪影響を与えることが少ない。
インク皮膜の乾燥膜厚が均一になる結果、この隔壁付基板を使用したLCD用カラーフィルタ、有機ELディスプレイは画像のボケが少ないシャープで高品質の画像表示が可能と
なる。
According to the present invention, the ink in the compartments is spontaneously flattened by controlling the wettability of the side and bottom surfaces of the partition walls with respect to the ink. This spontaneous flattening makes the dry film thickness of the ink uniform within the compartment, so that no external force such as mechanical vibration or electrical flow is used. Therefore, compared with these methods, it is less likely that a portion other than the opening is contaminated with ink or has other adverse effects.
As a result of uniform dry film thickness of the ink film, LCD color filters and organic EL displays using this substrate with partition walls can display sharp and high-quality images with little blurring of images.

本発明の隔壁付基板を、インクを塗布する向きから見たとき、およびインクを塗布する方向から切断したときの断面の一例を示す模式図である。It is a schematic diagram which shows an example of a cross section when the board | substrate with a partition of this invention is seen from the direction which applies an ink, and is cut | disconnected from the direction which applies an ink. (a)、(b)本発明の隔壁付基板の開口部にインクを塗布したとき(a)、およびインクが固化した状態の一例を示す模式図である。(A), (b) It is a schematic diagram which shows an example when the ink is apply | coated to the opening part of the board | substrate with a partition of this invention, and the ink solidified. (a)、(b)本発明の隔壁付基板の開口部にインクを一方の隔壁に片寄って塗布したとき(a)、およびインクが固化した状態の一例を示す模式図である。(A), (b) It is a schematic diagram which shows an example of the state which the ink solidified to the opening part of the board | substrate with a partition wall of this invention (a), and the ink solidified. (a)、(b)濡れ性の傾斜構造を持たない隔壁を有する隔壁付基板の開口部にインクを塗布したとき(a)、およびインクが固化した状態の一例を示す模式図である。(A), (b) It is a schematic diagram which shows an example when the ink is apply | coated to the opening part of the board | substrate with a partition which has a partition which does not have a wettable inclination structure, and the ink solidified. (a)、(b)濡れ性の傾斜構造を持たない隔壁を有する隔壁付基板の開口部にインクを一方の隔壁に片寄って塗布したとき(a)、およびインクが固化した状態の一例を示す模式図である。(A), (b) When the ink is applied to one of the partition walls in an opening of a partition wall substrate having a partition wall having no wetting gradient structure (a), and an example in which the ink is solidified is shown. It is a schematic diagram. 本発明のプラズマ照射の実施の一例を示す模式図である。It is a schematic diagram which shows an example of implementation of the plasma irradiation of this invention. 本発明のフッ素樹脂処理の実施の一例を示す模式図である。It is a schematic diagram which shows an example of implementation of the fluororesin process of this invention. 本発明の比較例における一例を示す模式図である。It is a schematic diagram which shows an example in the comparative example of this invention. 本発明のプラズマ照射の実施の一例を示す模式図である。It is a schematic diagram which shows an example of implementation of the plasma irradiation of this invention. 本発明の比較例における一例を示す模式図である。It is a schematic diagram which shows an example in the comparative example of this invention.

本発明は、液晶ディスプレイ(LCD)用カラーフィルタ、有機エレクトロルミネッセンス(EL)ディスプレイ等で用いられる画素仕切り用の隔壁を有する隔壁付基板の開口部にインクを塗布した後、隔壁内で溶媒が蒸発しインク固形分が被膜化する際、できるだけ平坦に固化するように隔壁側面と底面を化学的に処理する方法に関するものである。   In the present invention, after applying ink to an opening of a partition wall substrate having a partition wall for pixel partition used in a liquid crystal display (LCD) color filter, an organic electroluminescence (EL) display, etc., the solvent evaporates in the partition wall. Further, the present invention relates to a method of chemically treating the side walls and the bottom surface of the partition so that the solid matter of the ink is solidified as flatly as possible when the ink solid is formed into a film.

そこで、先ず隔壁付基板上の開口部に塗布されたインクが平坦に固化する原因を図面を使って説明する。隔壁付基板の上面視の図および矢印Aと矢印Bの方向に垂直に切ったときの断面図を図1に示す。断面視の図は、中央の上面視図の右側と下側に記載してある。隔壁付基板10は、縦方向に走る隔壁12と横方向に走る隔壁12’、及びこれらにより区画されることで四方を隔壁に囲まれた開口部11で構成されている。インクは開口部11の底面に塗布されるか滴下される。   First, the reason why the ink applied to the opening on the substrate with a partition is solidified flat will be described with reference to the drawings. FIG. 1 shows a top view of a substrate with a partition wall and a cross-sectional view taken perpendicularly to the directions of arrows A and B. Cross-sectional views are shown on the right and bottom sides of the central top view. The partition wall-equipped substrate 10 includes a partition wall 12 that runs in the vertical direction, a partition wall 12 ′ that runs in the horizontal direction, and an opening 11 surrounded by the partition walls by being partitioned by these. Ink is applied to or dripped onto the bottom surface of the opening 11.

隔壁12、12’は、隔壁の上端で最も撥液性が高く、開口部11に向かって徐々に親液性が高くなり、隔壁基部で最も親液性が高くなるような濡れ性(親和力)の傾斜構造を有している。このように、隔壁12、12’の上端から基部にかけて表面の濡れ性が撥液性から親液性へと徐々に変化する構造とすることで、図2に示すように開口部11の底面にインク15を塗布した際、隔壁側面13に接するインク15の接触線が隔壁基部の方向に引き付けられるように移動する。その結果、インク15が隔壁側面13を濡れ上がることがなくなる。この状態で乾燥・固化するとインク15は平坦性に優れた皮膜16を形成する。皮膜16の平坦性が優れている場合、画素における色ムラのない、輪郭が明瞭な高品質の画像を得ることができる。   The partition walls 12, 12 ′ have the highest liquid repellency at the upper end of the partition wall, gradually increase in lyophilicity toward the opening 11, and wettability (affinity) that increases the lyophilic property at the partition wall base. It has an inclined structure. In this manner, the surface wettability is gradually changed from the liquid repellency to the lyophilicity from the upper end to the base of the partition walls 12 and 12 ', so that the bottom surface of the opening 11 as shown in FIG. When the ink 15 is applied, the contact line of the ink 15 in contact with the partition wall side surface 13 moves so as to be attracted toward the partition wall base. As a result, the ink 15 does not wet the partition side surface 13. When dried and solidified in this state, the ink 15 forms a film 16 having excellent flatness. When the flatness of the film 16 is excellent, it is possible to obtain a high-quality image having a clear outline without color unevenness in pixels.

加えて、例えば、図3に示すように開口部11内にインク15を塗布した際、開口部11の底面と一方の隔壁12Aに乗り上げた状態で片寄ってインク液滴が存在する場合、隔壁13の濡れ性の傾斜構造、および開口部11の親液性作用により、インク液滴はもう一方の側の隔壁12Bに向かって開口部11の底面を濡れ広がりながら移動するようになる。最終的にはインク15は開口部11の全体に広がり、かつ隔壁における濡れ性の傾斜構造によってインクが濡れ上がることがないため、結果として平坦性に優れた皮膜を形成することができる。   In addition, for example, when the ink 15 is applied in the opening 11 as shown in FIG. 3, when ink droplets are present in a state where the ink 15 rides on the bottom surface of the opening 11 and the one partition 12 </ b> A, the partition 13 Due to the wettability gradient structure and the lyophilic action of the opening 11, the ink droplet moves while wetting and spreading on the bottom surface of the opening 11 toward the partition wall 12B on the other side. Eventually, the ink 15 spreads over the entire opening 11, and the ink does not wet up due to the wettability gradient structure in the partition wall. As a result, a film having excellent flatness can be formed.

一方、図4に示すように、隔壁側面に表面処理を行わなかった場合、開口部11にインク15を塗布すると、インク15は隔壁側面を濡れ上がる(図4(a))。この状態でインク15を乾燥・固化するとインク15は隔壁12により近い部分で厚くなり、開口部11の中央部で最も薄いような谷型となる(図4(b))。皮膜16の平坦性が劣る場合、画素に色ムラが生じ輪郭がぼやけた画質となる。   On the other hand, as shown in FIG. 4, when the surface treatment is not performed on the side wall of the partition wall, when the ink 15 is applied to the opening 11, the ink 15 wets the side surface of the partition wall (FIG. 4A). When the ink 15 is dried and solidified in this state, the ink 15 becomes thicker at a portion closer to the partition wall 12, and becomes a valley shape that is thinnest at the center portion of the opening 11 (FIG. 4B). When the flatness of the film 16 is inferior, color unevenness occurs in the pixels, resulting in an image with a blurred outline.

加えて、例えば、開口部11内にインク15を塗布した際、図5に示すように、開口部11の底面と一方の隔壁側面13に乗り上げた状態で片寄ってインク液滴が存在する場合、隔壁13の濡れ性の傾斜構造、および開口部11の親和性が無いため、インク液滴は移動することなく塗布された位置に拘束されたまま乾燥・固化し、結果として不良な画素となる。   In addition, for example, when the ink 15 is applied in the opening 11, as shown in FIG. 5, when ink droplets are present in the state of running on the bottom surface of the opening 11 and the one side wall 13, Since the wettability inclined structure of the partition wall 13 and the affinity of the opening 11 are not present, the ink droplets are dried and solidified while being restrained at the applied position without moving, resulting in a defective pixel.

このように、隔壁上端から基部にかけて表面の濡れ性(親和力)が撥液性から親液性へと徐々に変化するような傾斜構造を有することによって、隔壁側面に接するインク液滴の接触線が自発的に隔壁基部の方向に移動する。この状態でインクを乾燥・固化すると、平坦性に優れた色ムラのない皮膜が得られる。したがって、LCD用カラーフィルタ、有機ELディスプレイ、無機ELディスプレイ等のパネルにおいて色ムラのない、明瞭な輪郭を有する高品質な画像を得ることができる。   In this manner, the ink wettability (affinity) of the surface gradually changes from liquid repellency to lyophilicity from the upper end to the base of the partition wall, so that the contact line of the ink droplet contacting the side surface of the partition wall can be obtained. It moves spontaneously in the direction of the partition wall base. When the ink is dried and solidified in this state, a film having excellent flatness and no color unevenness can be obtained. Therefore, it is possible to obtain a high-quality image having a clear outline without color unevenness in panels such as LCD color filters, organic EL displays, and inorganic EL displays.

更には、開口部の底面をインクに対して親和性を持たせているため、底面に着地したインク液滴が濡れ広がり易くなっている。このためインクの拡散不良に起因する画素不良になり難く、しかも機械的な振動、あるいは電気的な流動のような外力を利用した方法と比較して開口部以外の箇所をインクで汚染することがない。   Furthermore, since the bottom surface of the opening has an affinity for the ink, the ink droplets that land on the bottom surface are easily spread. For this reason, it is difficult to cause pixel defects due to defective diffusion of ink, and more than the method using an external force such as mechanical vibration or electrical flow, the portion other than the opening may be contaminated with ink. Absent.

以下、先ずカラーフィルタ(CF)を製造する工程を一例として本発明を具体的に説明する。CF用隔壁付基板の開口部にはインクジェット(IJ)法を用いてカラーインクを塗布するものとする。IJ法を用いた開口部の塗布は本発明を説明するための一例に過ぎず、その他、スクリーンコート法、グラビアコート法、ダイコート法、スピンコート法、カーテンコート法、スプレーコート法、エアナイフコート法、ロールブラッシュ法等の従来公知の塗布方法を使用することができる。   In the following, the present invention will be specifically described by taking as an example a process for producing a color filter (CF). Color ink is applied to the opening of the substrate with a partition wall for CF using an inkjet (IJ) method. The application of the opening using the IJ method is only an example for explaining the present invention. In addition, the screen coating method, the gravure coating method, the die coating method, the spin coating method, the curtain coating method, the spray coating method, and the air knife coating method. A conventionally known coating method such as a roll brushing method can be used.

[実施例1]
まず、基板上に遮光性を有する黒色レジストを塗布した。レジストの材料としては、カルド樹脂やアクリル樹脂にモノマー、重合開始剤、顔料を添加したものが使用できる。レジストの塗布としては、スクリーンコート法、グラビアコート法、ダイコート法、スピンコート法、カーテンコート法、スプレーコート法、エアナイフコート法、IJ法、ロールブラッシュ法等の従来公知の塗布方法を使用することができる。
[Example 1]
First, a black resist having a light shielding property was applied on the substrate. As a resist material, a cardo resin or an acrylic resin to which a monomer, a polymerization initiator, and a pigment are added can be used. As the resist coating, a conventionally known coating method such as a screen coating method, a gravure coating method, a die coating method, a spin coating method, a curtain coating method, a spray coating method, an air knife coating method, an IJ method, or a roll brush method should be used. Can do.

続いて、格子状のマスクで基板を覆って露光した後、現像を行い、基板上にレジストからなる格子状の隔壁および隔壁により区分けされた開口部11を備える隔壁付基板10を得た。   Subsequently, the substrate was covered with a lattice-shaped mask, exposed, and developed to obtain a substrate 10 with a partition provided with a lattice-shaped partition made of resist and an opening 11 partitioned by the partition on the substrate.

前記工程の終了後、プロピレングリコールモノメチルエーテルアセテート(PGMEA)を隔壁レジスト表面に滴下して液滴の静的接触角を測定したところ5°程度と低く、親液性であった。   After completion of the above step, propylene glycol monomethyl ether acetate (PGMEA) was dropped onto the partition wall resist surface, and the static contact angle of the droplets was measured. As a result, it was as low as about 5 ° and was lyophilic.

次に、前記工程で得られた隔壁付基板を微細な貫通孔を有するマスクで覆い、CFプラズマを照射して隔壁側面を撥液処理した。マスク貫通孔の区画内の分布に関しては、図
6のドットの濃淡で示すようになっている。濃く見える部分は貫通孔(黒丸部分)の密度が高い部分であり、隔壁基部になるほど貫通孔密度は低くなっている。したがって、図6の濃淡は、貫通孔密度が隔壁側面の上端ほど高く基部にかけて段階的に低くなっているマスクで被覆してプラズマ照射した後の照射面積に比例するものである。貫通孔に対応する隔壁側面がプラズマ処理されて撥液性を付与される。貫通孔数が多いと親液性から撥液性に変わる部分の面積が広くなる。
Next, the partition wall-provided substrate obtained in the above step was covered with a mask having fine through-holes, and CF 4 plasma was irradiated to liquid-repellent the side surfaces of the partition walls. The distribution of the mask through-holes in the section is indicated by the shading of dots in FIG. The dark portion is a portion where the density of the through hole (black circle portion) is high, and the density of the through hole becomes lower as the partition wall becomes the base. Therefore, the shading in FIG. 6 is proportional to the irradiation area after the plasma is irradiated with a mask in which the through-hole density is increased toward the upper end of the partition wall and gradually decreased toward the base. The side walls of the partition walls corresponding to the through holes are plasma treated to impart liquid repellency. When the number of through-holes is large, the area of the portion that changes from lyophilic to lyophobic increases.

続いて、隔壁12領域を遮蔽して開口部11の底面領域は開口しているマスクで隔壁付基板10を覆い、プラズマ処理によって開口部11の底面を親液処理し、本発明になる隔壁付基板を得た。プラズマ処理に関しては、真空容器内にブタジエン、および酸素をガス供給系別にかつ同時に導入して行った。プラズマ処理としては、熱印加法、電子ビーム照射法,プラズマCVD法、スパッタリング法、イオンプレーティング法、イオンビームアシスト法、大気圧プラズマ法等の従来公知の方法を使用できる。   Subsequently, the partition wall 12 region is shielded, and the bottom region of the opening 11 covers the partition-coated substrate 10 with an open mask, and the bottom surface of the opening 11 is subjected to lyophilic treatment by plasma treatment, thereby providing the partition wall according to the present invention. A substrate was obtained. The plasma treatment was performed by introducing butadiene and oxygen into the vacuum vessel separately and simultaneously for each gas supply system. As the plasma treatment, conventionally known methods such as a heat application method, an electron beam irradiation method, a plasma CVD method, a sputtering method, an ion plating method, an ion beam assist method, and an atmospheric pressure plasma method can be used.

上記の隔壁付基板10の開口部11にIJ法を用いてカラーインクを吐出し、開口部11にインクを塗布したところ、四方の隔壁側面13に接したインクの接触線が隔壁基部方向に移動し、インクは隔壁側面13を濡れ上がらなかった。このときの様子はマイクロスコープによって観察・確認した。   When color ink is ejected to the opening 11 of the above-mentioned substrate 10 with a partition wall using the IJ method and the ink is applied to the opening 11, the contact line of the ink in contact with the four side walls 13 moves toward the partition base. However, the ink did not wet the partition side surface 13. The situation at this time was observed and confirmed with a microscope.

続いて、カラーインクが隔壁側面13を濡れ上がっていない状態で隔壁付基板10を加熱して、カラーインクを蒸発乾燥させて固化した。皮膜の形状を透過型電子顕微鏡(TEM)で断面観察したところ、平坦であることが確認された。   Subsequently, the substrate with partition 10 was heated in a state where the color ink did not wet the partition side surface 13, and the color ink was evaporated and dried to solidify. When the cross section of the shape of the film was observed with a transmission electron microscope (TEM), it was confirmed to be flat.

このカラーフィルタを用いてLCDにパネル化にしたところ、画素における色ムラのない、輪郭が明瞭な高品質の画像を得ることができた。   When this color filter was used to form a panel on an LCD, a high-quality image with a clear outline and no color unevenness in the pixels could be obtained.

[実施例2]
実施例1と同様の手順で隔壁12および開口部11の底面の濡れ性を制御する前の隔壁付基板10を得た。
[Example 2]
A substrate 10 with a partition wall before controlling the wettability of the bottom surface of the partition wall 12 and the opening 11 was obtained in the same procedure as in Example 1.

前記工程の終了後、PGMEAをレジスト表面に滴下して液滴の静的接触角を測定したところ5°程度と低く、親液性であった。   After completion of the above step, PGMEA was dropped on the resist surface and the static contact angle of the droplet was measured. As a result, it was as low as about 5 ° and was lyophilic.

次に、前記の隔壁付基板の隔壁12の一領域13A以外をマスクで覆い、フッ素含有撥液剤フロロサーフFS−6110(株式会社フロロテクノロジー製)を純水で10重量%に希釈したものをスプレーコート法で塗布・乾燥させ、隔壁12の隔壁の一領域12A表面をフッ素系樹脂で撥液処理した(図7を参照のこと)。   Next, the region other than one region 13A of the partition wall 12 of the partition wall substrate is covered with a mask, and a fluorine-containing liquid repellent fluorosurf FS-6110 (manufactured by Fluoro Technology Co., Ltd.) diluted to 10% by weight with pure water is spray coated. Then, the surface of one partition 12A of the partition 12 was subjected to a liquid repellent treatment with a fluorine-based resin (see FIG. 7).

続いて、隔壁付基板の隔壁12の隔壁の一領域13B以外をマスクで覆い、フッ素含有撥液剤フロロサーフFS−6110(株式会社フロロテクノロジー製)を純水で5重量%に希釈したものをスプレーコート法で塗布・乾燥させ、隔壁12の隔壁の一領域12B表面をフッ素系樹脂で撥液処理した。   Subsequently, the area other than one area 13B of the partition wall 12 of the partition wall 12 of the partition wall substrate is covered with a mask, and a fluorine-containing liquid repellent fluorosurf FS-6110 (manufactured by Fluoro Technology Co., Ltd.) diluted to 5% by weight with pure water is spray coated. Then, the surface of one partition 12B of the partition 12 was subjected to a liquid repellent treatment with a fluorine-based resin.

続いて、隔壁付基板の隔壁12の隔壁の一領域13C以外をマスクで覆い、フッ素含有撥液剤フロロサーフFS−6110(株式会社フロロテクノロジー製)を純水で2重量%に希釈したものをスプレーコート法で塗布・乾燥させ、隔壁12の隔壁の一領域13C表面をフッ素系樹脂で撥液処理した。   Subsequently, the region other than one region 13C of the partition wall 12 of the partition wall 12 of the partition wall substrate is covered with a mask, and a fluorine-containing liquid repellent fluorosurf FS-6110 (manufactured by Fluoro Technology Co., Ltd.) diluted to 2% by weight with pure water is spray coated. Then, the surface of the partition wall 13C of the partition wall 12 was subjected to a liquid repellent treatment with a fluorine resin.

続いて、隔壁付基板の隔壁12の隔壁の一領域12D以外をマスクで覆い、フッ素含有撥液剤フロロサーフFS−6110(株式会社フロロテクノロジー製)を純水で1重量%
に希釈したものをスプレーコート法で塗布・乾燥させ、隔壁12の隔壁の一領域13D表面をフッ素系樹脂で撥液処理した。
Subsequently, the region other than one region 12D of the partition wall 12 of the partition wall 12 of the substrate with a partition wall is covered with a mask, and a fluorine-containing liquid repellent fluorosurf FS-6110 (manufactured by Fluoro Technology Co., Ltd.) is added at 1% by weight with pure water.
The diluted solution was applied and dried by a spray coating method, and the surface of one region 13D of the partition wall 12 was subjected to a liquid repellent treatment with a fluororesin.

続いて、隔壁付基板の開口部11の底面以外をマスクで覆い、含フッ素系界面活性剤サーフロンS−221(AGCセイミケミカル株式会社製)を純水で0.1重量%に希釈したものをスプレーコート法で塗布・乾燥させることによって親液処理し、本発明に係る隔壁付基板10を得た。   Subsequently, a part other than the bottom surface of the opening 11 of the partition wall substrate is covered with a mask, and a fluorine-containing surfactant Surflon S-221 (manufactured by AGC Seimi Chemical Co., Ltd.) is diluted to 0.1% by weight with pure water. A lyophilic treatment was performed by applying and drying by a spray coating method to obtain a substrate with partition walls 10 according to the present invention.

上記の隔壁付基板10の開口部11にIJ法を用いてカラーインクを吐出し、開口部11にインクを塗布したところ、四方の隔壁側面13に接したインクの接触線が隔壁基部方向に移動し、インクは隔壁側面13を濡れ上がらなかった。このときの様子はマイクロスコープによって観察・確認した。   When color ink is ejected to the opening 11 of the above-mentioned substrate 10 with a partition wall using the IJ method and the ink is applied to the opening 11, the contact line of the ink in contact with the four side walls 13 moves toward the partition base. However, the ink did not wet the partition side surface 13. The situation at this time was observed and confirmed with a microscope.

続いて、カラーインクが隔壁側面13を濡れ上がっていない状態で隔壁付基板10を加熱して、カラーインクを蒸発乾燥させて固化した。皮膜の形状をTEMで断面観察したところ、平坦であることが確認された。   Subsequently, the substrate with partition 10 was heated in a state where the color ink did not wet the partition side surface 13, and the color ink was evaporated and dried to solidify. When the cross section of the shape of the film was observed with a TEM, it was confirmed to be flat.

このカラーフィルタを用いてLCDにパネル化にしたところ、画素における色ムラのない、輪郭が明瞭な高品質の画像を得ることができた。   When this color filter was used to form a panel on an LCD, a high-quality image with a clear outline and no color unevenness in the pixels could be obtained.

[比較例1]
実施例1と同様に隔壁12および開口部11の底面の濡れ性を制御する前の隔壁付基板を得た。
[Comparative Example 1]
Similarly to Example 1, a substrate with partition walls before controlling the wettability of the bottom surfaces of the partition walls 12 and the openings 11 was obtained.

前記工程の終了後、PGMEAをレジスト表面に滴下して液滴の静的接触角を測定したところ5°程度と低く、親液性であった。   After completion of the above step, PGMEA was dropped on the resist surface and the static contact angle of the droplet was measured. As a result, it was as low as about 5 ° and was lyophilic.

上記の隔壁付基板10の開口部11にIJ法を用いてカラーインクを吐出し、開口部11にインクを塗布したところ、四方の隔壁側面13に接したインクの接触線が隔壁側面13を濡れ上がった。濡れ上がりの様子はマイクロスコープによって観察・確認した。   When color ink was ejected to the opening 11 of the above-described substrate 10 with the partition wall using the IJ method and the ink was applied to the opening 11, the contact line of the ink in contact with the four side walls 13 wetted the side wall 13. Rose. The state of wetting was observed and confirmed with a microscope.

続いて、カラーインクが隔壁側面13を濡れ上がっている状態で隔壁付基板10を加熱して、カラーインクを蒸発乾燥させて固化した。皮膜の形状をTEMで断面観察したところ、隔壁12により近い部分で厚くなり、開口部11の中央部で最も薄いような谷型であることが確認された。   Subsequently, the substrate 10 with the partition wall was heated in a state where the color ink wets the partition side surface 13, and the color ink was evaporated and dried to be solidified. When the cross section of the shape of the film was observed with a TEM, it was confirmed that the film was thicker at a portion closer to the partition wall 12 and was the thinnest at the center portion of the opening portion 11.

このカラーフィルタを用いてLCDにパネル化にしたところ、画素に色ムラが生じているため、輪郭がぼやけた画質となった。   When the LCD was made into a panel using this color filter, the color was uneven in the pixels, resulting in blurred image quality.

本発明の実施例1および2では、隔壁の側面においては濡れ性が異なる領域を4つとしたが、領域の分割数は4に限るものではない。一般に、分割数が多いほど隔壁側面のインク液滴の接触線は隔壁基部方向へより円滑に移動するが、目的に合った分割数として構わない。   In Embodiments 1 and 2 of the present invention, four regions having different wettability are provided on the side surfaces of the partition walls, but the number of divided regions is not limited to four. In general, the larger the number of divisions, the smoother the ink droplet contact line on the side of the partition wall moves in the direction of the partition wall base, but the number of divisions may match the purpose.

次に,有機ELパネルを製造する工程を一例として本発明を具体的に説明する.有機ELパネルの基板にはTFT基板を使用し,TFT基板の開口部にはIJ法を用いて正孔注入層および発光層を塗布するものとする.IJ法を用いた開口部の塗布は本発明を説明するための一例に過ぎず、その他、スクリーンコート法、グラビアコート法、ダイコート法、スピンコート法、カーテンコート法、スプレーコート法、エアナイフコート法、ロールブラッシュ法等の従来公知の塗布方法を使用することができる。   Next, the present invention will be described in detail by taking an example of a process for manufacturing an organic EL panel. A TFT substrate is used as the substrate of the organic EL panel, and a hole injection layer and a light emitting layer are applied to the opening of the TFT substrate using the IJ method. The application of the opening using the IJ method is only an example for explaining the present invention. In addition, the screen coating method, the gravure coating method, the die coating method, the spin coating method, the curtain coating method, the spray coating method, and the air knife coating method. A conventionally known coating method such as a roll brushing method can be used.

[実施例3]
まず,TFT基板の開口部11以外をマスクで覆い,スパッタリング法によりITO薄膜の陽極層を形成した.ITO層の形成には,熱印加法、電子ビーム照射法,プラズマCVD法、スパッタリング法、イオンプレーティング法、イオンビームアシスト法、大気圧プラズマ法等のプラズマ処理方法,あるいはスクリーンコート法、グラビアコート法、ダイコート法、スピンコート法、カーテンコート法、スプレーコート法、エアナイフコート法、IJ法、ロールブラッシュ法等の塗布方法のような従来公知の処理方法を使用することができる。
[Example 3]
First, a portion other than the opening 11 of the TFT substrate was covered with a mask, and an anode layer of an ITO thin film was formed by sputtering. For the formation of the ITO layer, a heat treatment method, an electron beam irradiation method, a plasma CVD method, a sputtering method, an ion plating method, an ion beam assist method, a plasma processing method such as an atmospheric pressure plasma method, a screen coating method, a gravure coating Conventionally known processing methods such as coating methods such as coating, die coating, spin coating, curtain coating, spray coating, air knife coating, IJ, and roll brushing can be used.

次に、前記工程で得られたTFT基板を微細な貫通孔を有するマスクで覆い、CFプラズマを照射して隔壁側面を撥液処理した。マスク貫通孔の区画内の分布に関しては、図9のドットの濃淡で示すようになっている。濃く見える部分は貫通孔(黒丸部分)の密度が高い部分であり、隔壁基部になるほど貫通孔密度は低くなっている。したがって、図9の濃淡は、貫通孔密度が隔壁側面の上端ほど高く基部にかけて段階的に低くなっているマスクで被覆してプラズマ照射した後の照射面積に比例するものである。貫通孔に対応する隔壁側面がプラズマ処理されて撥液性を付与される。貫通孔数が多いと親液性から撥液性に変わる部分の面積が広くなる。 Next, the TFT substrate obtained in the above step was covered with a mask having fine through-holes, and CF 4 plasma was irradiated to repel the side walls of the partition walls. The distribution of the mask through-holes in the compartments is indicated by the shading of dots in FIG. The dark portion is a portion where the density of the through hole (black circle portion) is high, and the density of the through hole becomes lower as the partition wall becomes the base. Therefore, the shading in FIG. 9 is proportional to the irradiation area after the plasma is irradiated with a mask in which the through hole density is increased toward the upper end of the partition wall and gradually decreased toward the base. The side walls of the partition walls corresponding to the through holes are plasma treated to impart liquid repellency. When the number of through-holes is large, the area of the portion that changes from lyophilic to lyophobic increases.

続いて、隔壁12領域を遮蔽して開口部11の底面領域は開口しているマスクでTFT基板10を覆い、プラズマ処理によって開口部11の底面を親液処理し、本発明になる隔壁付基板を得た。プラズマ処理に関しては、真空容器内にブタジエン、および酸素をガス供給系別にかつ同時に導入して行った。プラズマ処理としては、熱印加法、電子ビーム照射法,プラズマCVD法、スパッタリング法、イオンプレーティング法、イオンビームアシスト法、大気圧プラズマ法等の従来公知の方法を使用できる。   Subsequently, the partition wall 12 region is shielded, and the bottom surface region of the opening 11 covers the TFT substrate 10 with an open mask, and the bottom surface of the opening 11 is subjected to lyophilic treatment by plasma treatment, whereby the substrate with a partition wall according to the present invention. Got. The plasma treatment was performed by introducing butadiene and oxygen into the vacuum vessel separately and simultaneously for each gas supply system. As the plasma treatment, conventionally known methods such as a heat application method, an electron beam irradiation method, a plasma CVD method, a sputtering method, an ion plating method, an ion beam assist method, and an atmospheric pressure plasma method can be used.

上記隔壁付基板10の開口部11にIJ法を用いて正孔注入層材料であるポリチオフェン−ポリスチレンスルホン酸(PEDOT−PSS)を水に分散させた溶液を吐出し、開口部11に溶液を塗布したところ、四方の隔壁側面13に接した溶液の接触線が隔壁基部方向に移動し、溶液は隔壁側面13を濡れ上がらなかった。このときの様子はマイクロスコープによって観察・確認した。   A solution in which polythiophene-polystyrene sulfonic acid (PEDOT-PSS), which is a hole injection layer material, is dispersed in water is discharged to the opening 11 of the substrate 10 with a partition wall using the IJ method, and the solution is applied to the opening 11. As a result, the contact line of the solution in contact with the four side walls 13 moved toward the partition base, and the solution did not wet the side walls 13. The situation at this time was observed and confirmed with a microscope.

上記PEDOT−PSS溶液が隔壁側面13を濡れ上がっていない状態で隔壁付基板10を加熱して、溶液を蒸発乾燥させて固化した。   The partition-attached substrate 10 was heated in a state where the PEDOT-PSS solution did not wet the partition side surface 13, and the solution was evaporated and dried to solidify.

続いて,上記隔壁付基板10の開口部11にIJ法を用いて発光層材料である芳香族ポリマーをメチルエチルケトン溶媒に分散させたインクを吐出し、開口部11にインクを塗布したところ、四方の隔壁側面13に接した溶液の接触線が隔壁基部方向に移動し、溶液は隔壁側面13を濡れ上がらなかった。このときの様子はマイクロスコープによって観察・確認した。   Subsequently, an ink in which an aromatic polymer, which is a light emitting layer material, is dispersed in a methyl ethyl ketone solvent by using the IJ method is ejected to the opening 11 of the substrate 10 with a partition wall, and the ink is applied to the opening 11. The contact line of the solution in contact with the partition side surface 13 moved toward the partition base, and the solution did not wet the partition side surface 13. The situation at this time was observed and confirmed with a microscope.

続いて、インクが隔壁側面13を濡れ上がっていない状態で隔壁付基板10を加熱して、インクを蒸発乾燥させて固化した。皮膜の形状をTEMで断面観察したところ、正孔注入層,および発光層ともに平坦であることが確認された。   Subsequently, the substrate 10 with partition was heated in a state where the ink did not wet the partition side surface 13, and the ink was evaporated and dried to be solidified. When the cross section of the shape of the film was observed with a TEM, it was confirmed that both the hole injection layer and the light emitting layer were flat.

上記隔壁付基板10の発光層上にAlLi薄膜の陰極層をスパッタリング法により形成し,更に陰極層の上部に乾燥材を挿入し,最後にガラス板で全体を封止して有機ELパネルを得た.
このパネルを発光させたところ、画素における色ムラのない、輪郭が明瞭な高品質の画像を得ることができた。
A cathode layer of an AlLi thin film is formed on the light emitting layer of the substrate 10 with a partition by a sputtering method, and a desiccant is inserted above the cathode layer, and finally the whole is sealed with a glass plate to obtain an organic EL panel. It was.
When this panel was made to emit light, it was possible to obtain a high-quality image with clear outlines without color unevenness in the pixels.

[比較例2]
実施例2と同様に隔壁12および開口部11の底面の濡れ性を制御する前の隔壁付基板を得た。
[Comparative Example 2]
Similarly to Example 2, a substrate with partition walls before controlling the wettability of the bottom surfaces of the partition walls 12 and the openings 11 was obtained.

上記の隔壁付基板10の開口部11にIJ法を用いて正孔注入層材料であるPEDOT−PSSを水に分散させた溶液を吐出し、開口部11に溶液を塗布したところ、四方の隔壁側面13に接した溶液の接触線が隔壁側面13を濡れ上がった。濡れ上がりの様子はマイクロスコープによって観察・確認した。   When a solution in which PEDOT-PSS, which is a hole injection layer material, was dispersed in water by using the IJ method was discharged to the opening 11 of the substrate 10 with a partition wall, and the solution was applied to the opening 11, a four-way partition wall was obtained. The contact line of the solution in contact with the side surface 13 wets the partition side surface 13. The state of wetting was observed and confirmed with a microscope.

上記PEDOT−PSS溶液が隔壁側面13を濡れ上がっている状態で隔壁付基板10を加熱して、溶液を蒸発乾燥させて固化した。   The partition-attached substrate 10 was heated while the PEDOT-PSS solution was wet on the partition side surface 13, and the solution was evaporated and dried to solidify.

上記隔壁付基板10の開口部11にIJ法を用いて発光層材料である芳香族ポリマーをメチルエチルケトン溶媒に分散させたインクを吐出し、開口部11にインクを塗布したところ、四方の隔壁側面13に接したインクの接触線が隔壁側面13を濡れ上がった。濡れ上がりの様子はマイクロスコープによって観察・確認した。   When an ink in which an aromatic polymer as a light emitting layer material is dispersed in a methyl ethyl ketone solvent is ejected to the opening 11 of the substrate 10 with the partition using the IJ method and the ink is applied to the opening 11, the side walls 13 on the four sides of the partition are formed. The contact line of the ink in contact with the liquid wets the side wall 13. The state of wetting was observed and confirmed with a microscope.

続いて、インクが隔壁側面13を濡れ上がっている状態で隔壁付基板10を加熱して、インクを蒸発乾燥させて固化した。皮膜の形状をTEMで断面観察したところ、正孔注入層,および発光層ともに隔壁12により近い部分で厚くなり、開口部11の中央部で最も薄いような谷型であることが確認された。   Subsequently, the substrate with a partition wall 10 was heated in a state where the ink wets the partition wall side surface 13, and the ink was evaporated and dried to be solidified. When the cross section of the shape of the film was observed with a TEM, it was confirmed that both the hole injection layer and the light emitting layer were thicker at the portion closer to the partition wall 12 and were the thinnest at the center portion of the opening portion 11.

上記隔壁付基板10の発光層上にAlLi薄膜の陰極層をスパッタリング法により形成し,更に陰極層の上部に乾燥材を挿入し,最後にガラス板で全体を封止して有機ELパネルを得た.
このパネルを発光させたところ、画素に色ムラが生じているため、輪郭がぼやけた画質となった。
A cathode layer of an AlLi thin film is formed on the light emitting layer of the substrate 10 with a partition by a sputtering method, and a desiccant is inserted above the cathode layer, and finally the whole is sealed with a glass plate to obtain an organic EL panel. It was.
When this panel was made to emit light, color unevenness occurred in the pixels, resulting in an image with a blurred outline.

本発明の実施例3では、隔壁の側面においては濡れ性が異なる領域を5つとしたが、領域の分割数は5に限るものではない。一般に、分割数が多いほど隔壁側面のインク液滴の接触線は隔壁基部方向へより円滑に移動するが、目的に合った分割数として構わない。   In Example 3 of the present invention, five regions having different wettability are provided on the side surfaces of the partition walls, but the number of divided regions is not limited to five. In general, the larger the number of divisions, the smoother the ink droplet contact line on the side of the partition wall moves in the direction of the partition wall base, but the number of divisions may match the purpose.

本発明においては、隔壁付基板の隔壁上端で最も撥液性が高く、開口部に向かって隔壁基部に至るまでに徐々に親液性が高くなり、ついに隔壁基部で最も親液性が高くなるような濡れ性の傾斜構造とすることにより、開口部に塗布されたインクの隔壁との接触線が隔壁基部の方向に移動するので、インクが隔壁を濡れ上がることがない。この状態でインクを乾燥・固化すると、平坦性に優れた色ムラのない皮膜を得ることができる。   In the present invention, the liquid repellency is highest at the upper end of the partition wall of the substrate with the partition wall, gradually becomes more lyophilic until reaching the partition base toward the opening, and finally has the highest lyophilic property at the partition base. By adopting such a wetting gradient structure, the contact line of the ink applied to the opening with the partition wall moves in the direction of the partition base, so that the ink does not wet the partition wall. When the ink is dried and solidified in this state, a film having excellent flatness and no color unevenness can be obtained.

加えて、本発明の隔壁付基板は、開口部に塗布されたインクが開口部全体に自発的に濡れ広がるため、機械的な振動、あるいは電気的な流動のような外力を利用した方法を必要としないことから開口部以外の箇所をインクで汚染することがない。したがって、本発明により、LCD用カラーフィルタ、有機ELディスプレイ、無機ELディスプレイ等の微細な隔壁付基板を用いた製品の印刷品質を向上することが可能になる。   In addition, the substrate with a partition wall of the present invention requires a method using an external force such as mechanical vibration or electrical flow because the ink applied to the opening spontaneously wets and spreads over the entire opening. In other words, no part other than the opening is contaminated with ink. Therefore, according to the present invention, it is possible to improve the print quality of products using a fine substrate with partition walls such as a color filter for LCD, an organic EL display, and an inorganic EL display.

10、隔壁付基板
11、開口部
12、隔壁
13、隔壁側面
14、隔壁頂部
15、インク
16、皮膜
10, a substrate 11 with a partition, an opening 12, a partition 13, a partition side surface 14, a partition top 15, an ink 16, a coating

Claims (6)

少なくとも、基板上に隔壁により仕切られた複数の区画を形成する工程と、隔壁側面のインクに対する濡れ性を隔壁頂部近傍で低く基部にかけて高くなるように段階的若しくは連続的に変化させる工程と、インクを区画内に塗布し乾燥する工程と、を有することを特徴とする隔壁付基板に対するインク皮膜の形成方法。   At least a step of forming a plurality of sections partitioned by a partition on the substrate, a step of changing the wettability of the side wall of the partition to the ink stepwise or continuously so as to increase toward the base near the top of the partition, and the ink A method of forming an ink film on a substrate with a partition wall, comprising: applying a coating solution in a partition and drying the solution. 少なくとも、基板上に隔壁により仕切られた複数の区画を形成する工程と、インクに対する撥液性が隔壁の頂部近傍で高く親液性が隔壁基部で高くなるように、隔壁側面のインクに対する親和性を撥液性から親液性へと段階的若しくは連続的に変化させる工程と、インクを区画内に塗布し乾燥する工程と、を有することを特徴とする隔壁付基板に対するインク皮膜の形成方法。   At least the step of forming a plurality of partitions partitioned by the partition on the substrate, and the affinity for the ink on the side wall of the partition so that the liquid repellency to the ink is high near the top of the partition and the lyophilicity is high at the base of the partition A method for forming an ink film on a substrate with a partition wall, comprising: a step of changing the lyophobic property from liquid repellency to lyophilic stepwise or continuously, and a step of applying and drying ink in the compartment. 前記区画内底面のインクに対する濡れ性若しくは親液性が、隔壁基部のインクに対する濡れ性若しくは親液性に比較して高いことを特徴とする請求項1又は請求項2に記載の隔壁付基板に対するインク皮膜の形成方法。   3. The substrate with a partition wall according to claim 1, wherein wettability or lyophilicity with respect to the ink in the bottom surface of the partition is higher than wettability or lyophilicity with respect to the ink in the partition wall base part. Ink film formation method. 前記隔壁側面のインクに対する濡れ性もしくは親和性を変更する手段がプラズマ照射もしくはフッ素系樹脂処理であることを特徴とする請求項1から請求項3のいずれか1項に記載のインク皮膜の形成方法。   The method for forming an ink film according to any one of claims 1 to 3, wherein the means for changing wettability or affinity for the ink on the side wall of the partition wall is plasma irradiation or fluorine resin treatment. . 請求項1から請求項4のいずれか1項に記載の隔壁付基板に対するインク皮膜の形成方法を使用したことを特徴とするカラーフィルタ基板。   A color filter substrate using the method for forming an ink film on the partition wall-attached substrate according to any one of claims 1 to 4. 請求項1から請求項4のいずれか1項に記載の隔壁付基板に対するインク皮膜の形成方法を使用したことを特徴とする有機ELディスプレイ。   An organic EL display using the method for forming an ink film on a partition wall-attached substrate according to any one of claims 1 to 4.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104518175A (en) * 2013-10-08 2015-04-15 精工爱普生株式会社 Organic el element manufacturing method, organic el apparatus, and electronic equipment
WO2019085631A1 (en) * 2017-10-31 2019-05-09 京东方科技集团股份有限公司 Display substrate and manufacturing method therefor, and display panel

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104518175A (en) * 2013-10-08 2015-04-15 精工爱普生株式会社 Organic el element manufacturing method, organic el apparatus, and electronic equipment
WO2019085631A1 (en) * 2017-10-31 2019-05-09 京东方科技集团股份有限公司 Display substrate and manufacturing method therefor, and display panel
US11404502B2 (en) 2017-10-31 2022-08-02 Hefei Xinsheng Optoelectronics Technology Co., Ltd. Display substrate and manufacturing method thereof, display panel

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