JP2012521660A - 原子層堆積法により製造された量子閉じ込め型太陽電池 - Google Patents
原子層堆積法により製造された量子閉じ込め型太陽電池 Download PDFInfo
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Abstract
【選択図】図1
Description
Claims (22)
- 本発明は、太陽電池において量子閉じ込め(QC)を提供する方法であって、
太陽電池におけるp−i−nダイオードの真性領域に組み込まれた少なくとも1つのQC構造体を提供すべく、原子層堆積法(ALD)を用いるステップを含み、
前記量子閉じ込め構造体の光学的性質及び電気的性質が、前記閉じ込め構造体の少なくとも1つの次元に基づいて調節されることを特徴とする方法。 - 請求項1に記載の方法であって、
前記QC構造体が、量子ドット、量子ウェル、量子ワイヤ及び量子チューブを含む群より選択されることを特徴とする方法。 - 請求項2に記載の方法であって、
前記量子ドットが、核形成制限型成長法(nucleation limited growth)を用いた前記QC構造体の島形成、リソグラフィーレジスト材料からのナノパターニング法、または自己集合単分子層からのナノパターニング法を用いて製造されることを特徴とする方法。 - 請求項2に記載の方法であって、
前記量子ウェルが、半導体材料の薄膜を前記ALD法によって堆積させることによって製造され、
前記薄膜を、前記量子ウェル層よりも高いバンドギャップを有する第2の材料間に層状構造をなして堆積させたことを特徴とする方法。 - 請求項2に記載の方法であって、
前記量子ワイヤが、テンプレート式成長機構を使用して前記ALDにより製造され、ナノ多孔性材料への堆積を含むることを特徴とする方法。 - 請求項1に記載の方法であって、
前記p−i−nダイオードの前記真性領域内への前記QC構造体の堆積は、前記QC構造を有する少なくとも1つの材料を含む前駆体分子をALDチャンバへ提供することを含むことを特徴とする方法。 - 請求項1に記載の方法であって、
前記p−i−nダイオードの前記真性領域内への前記QC構造体の堆積は、前駆体としてリモートプラズマ源を使用することを含むことを特徴とする方法。 - 請求項1に記載の方法であって、
前記p−i−nダイオードの前記真性領域内への前記QC構造体の堆積は、ALD膜のポストアニーリング法または過飽和材料の相分離法を用いることを含むことを特徴とする方法。 - 請求項1に記載の方法であって、
前記QC構造体の製造は、0.0〜1.5eVの範囲のバンドギャップを有する材料を使用することを含み、
前記材料が前記QC構造体の状態となったとき、前記バンドギャップは前記太陽電池に有用なバンドギャップまで増加することを特徴とする方法。 - 請求項1に記載の方法であって、
前記QC構造体の製造は、1〜100nmの範囲の励起子ボーア半径、及び、0.01*m0〜0.9*m0の範囲の有効質量を有する材料を使用することを含むことを特徴とする方法。 - 請求項1に記載の方法であって、
前記QC構造体が、0.0〜1.5eVの範囲のバンドギャップを有する低バンドギャップ材料を含むことを特徴とする方法。 - 請求項1に記載の方法であって、
前記太陽電池が、底部電極、p型バリア、前記真性領域、n型バリア及び上部バリアを含み、少なくとも1つの前記QC構造体が前記真性領域内に配置されることを特徴とする方法。 - 請求項12に記載の方法であって、
前記p型バリアまたは前記n型バリアが、1.0〜4.0eVの範囲のバンドギャップを有する高バンドギャップ材料を含むことを特徴とする方法。 - 請求項1に記載の方法であって、
前記太陽電池が、前記真性層に配置されたフェルミレベルが互いに異なる少なくとも2つのQC層を含み、
前記互いに異なるフェルミレベルは、(i)サイズの違い、(ii)形状の違い、(iii)材質の違い、(i)と(ii)との組み合わせ、(i)と(iii)との組み合わせ、(ii)と(iii)との組み合わせ、または、(i)と(ii)と(iii)との組み合わせに基づいて生じることを特徴とする方法。 - 請求項1に記載の方法であって、
前記真性領域が誘電材料を含むことを特徴とする方法。 - 請求項1に記載の方法であって、
前記太陽電池がバルクヘテロ接合構造体を含み、
前記ヘテロ接合がn型材料及びp型材料を含むことを特徴とする方法。 - 請求項1に記載の方法であって、
前記p−i−nダイオードが、少なくとも1つの垂直方向要素を有する第1のダイオード材料を含む基板を含み、
前記少なくとも1つのQC構造体が組み込まれた前記真性領域が、前記少なくとも1つの垂直方向要素の表面上に配置され、
前記前記真性領域上に、第2のダイオード層が配置され、
前記第2のダイオード材料から前記第1のダイオード材料までの拡散距離が、前記太陽電池の吸収長から切り離されていることを特徴とする方法。 - 請求項17に記載の方法であって、
前記第1のダイオード材料が、n型半導体材料またはp型半導体材料を含み、
前記第2のダイオード材料が、p型半導体材料またはn型半導体材料を含むことを特徴とする方法。 - 請求項17に記載の方法であって、
前記垂直方向要素が、1nm〜100μmの範囲の直径を有する円錐体または柱状体であることを特徴とする方法。 - 請求項17に記載の方法であって、
前記n型半導体材料が、1.0〜4.0eVの範囲のバンドギャップを有する半導体材料を含むことを特徴とする方法。 - 請求項17に記載の方法であって、
前記p型半導体材料が、1.0〜4.0eVの範囲のバンドギャップを有する半導体材料を含むことを特徴とする方法。 - 請求項17に記載の方法であって、
前記垂直方向要素が、ナノ粒子リソグラフィー法、反応性イオンエッチング法、スタンピング法またはフォトリソグラフィー法を用いて形成されることを特徴とする方法。
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